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JPH0574901B2 - - Google Patents
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JPH0574901B2 - - Google Patents

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Publication number
JPH0574901B2
JPH0574901B2 JP60034372A JP3437285A JPH0574901B2 JP H0574901 B2 JPH0574901 B2 JP H0574901B2 JP 60034372 A JP60034372 A JP 60034372A JP 3437285 A JP3437285 A JP 3437285A JP H0574901 B2 JPH0574901 B2 JP H0574901B2
Authority
JP
Japan
Prior art keywords
electrode
electrodes
ion source
ions
divided
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP60034372A
Other languages
Japanese (ja)
Other versions
JPS61195550A (en
Inventor
Shinya Sekimoto
Isao Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60034372A priority Critical patent/JPS61195550A/en
Publication of JPS61195550A publication Critical patent/JPS61195550A/en
Publication of JPH0574901B2 publication Critical patent/JPH0574901B2/ja
Granted legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明はイオン源に係わり、特に、イオンを引
き出すための少なくとも2個重ね配置された電極
を備えているイオン源に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to an ion source, and more particularly to an ion source including at least two stacked electrodes for extracting ions.

〔発明の背景〕[Background of the invention]

従来のイオン源の電極に関しては、例えば、特
開昭57−78800号公報に記載のように、イオンが
加速される方向に数個の長方形、又は円形、ある
いは球面形状した電極が重ね配置されていた。
Regarding the electrodes of conventional ion sources, for example, as described in JP-A-57-78800, several rectangular, circular, or spherical electrodes are stacked in the direction in which ions are accelerated. Ta.

しかし、イオン源が多様化し、大型化や多種類
の電極材料が使用されるようになると、電極の熱
変形などにより支持構造が難しくなること、ま
た、大きな電極の材料が製作できないこと、更
に、メンテナンス時にも電極全体を解体しなけれ
ばならず、メンテナンスに長時間かかること等の
難点があるが、上記公知例では、この点について
は配慮されていなかつた。
However, as ion sources become more diverse, larger in size, and a variety of electrode materials are used, support structures become difficult due to thermal deformation of the electrodes, and large electrode materials cannot be manufactured. There are drawbacks such as the need to dismantle the entire electrode during maintenance, which requires a long time for maintenance, but the above-mentioned known examples did not take this point into consideration.

〔発明の目的〕[Purpose of the invention]

本発明は上述の点に鑑みなされたもので、その
目的とするところは、大型化や多種類の電極材料
が使用されるようになつても熱変形が小さくて大
きな面積の電極が得られることは勿論、大きな電
極の材料を製作する必要がなく、かつ、電極のメ
ンテナンスを短時間に行なうことのできるイオン
源を提供するにある。
The present invention has been made in view of the above points, and its purpose is to provide an electrode with a large area and minimal thermal deformation even as the size of the electrode increases and a wide variety of electrode materials are used. Of course, it is an object of the present invention to provide an ion source that does not require the manufacture of large electrode materials and allows maintenance of the electrodes to be carried out in a short period of time.

〔発明の概要〕[Summary of the invention]

イオンを加速するための電極は、少なくとも2
個の電極間を絶縁物で保持し、電圧を印加してイ
オンを加速するようになつており、この電極は、
フイラメントによる輻射熱とイオンの衝突による
発熱のため温度上昇するが、この温度上昇は電極
の変形を招き、従つて、イオンの方向性が悪くな
るものであつた。
There are at least two electrodes for accelerating ions.
An insulator is held between the electrodes, and a voltage is applied to accelerate the ions.
The temperature rises due to the heat radiated by the filament and the heat generated by the collision of ions, but this temperature rise leads to deformation of the electrode, and therefore, the directionality of the ions deteriorates.

このことは、大口径になればなるほど変形量も
多くなり、また、大口径になると電極の材料につ
いて問題があり、製造不可能になるということが
生じてくるし、メンテナンス時にも電極全体を解
体しなければならず時間がかかるものであつた。
そのため、重ね配置された各々の電極を複数個に
分割し、この分割したブロツクは、各々の電極が
組合わされて独立していることより、大きな面積
で、かつ、変形の少ない電極が得られることは勿
論、各ブロツクごとに電極が製造でき、かつ、解
体できる構造とし、前述の目的を達成するように
したものである。
This means that the larger the diameter, the greater the amount of deformation, and the larger the diameter, the more problems arise with the material of the electrode, making it impossible to manufacture it, and the entire electrode must be disassembled for maintenance. It was necessary and time consuming.
Therefore, each stacked electrode is divided into a plurality of blocks, and each block is combined with each electrode to become independent. Therefore, it is possible to obtain an electrode with a large area and less deformation. Needless to say, the structure allows electrodes to be manufactured and disassembled for each block, thereby achieving the above-mentioned purpose.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の一実施例を第1図、及び第2図
に基づいて説明する。
An embodiment of the present invention will be described below with reference to FIGS. 1 and 2.

該図に示すごとく、プラズマ室1には、フイラ
メント電流を導きフイラメント2を加熱するため
の電流導入端子3と、水素やアルゴンなどのガス
を導入するためのガス導入口4がある。一方、イ
オンを加速するための加速電極5、減速電極6、
接地電極7は、各々の電極間をセラミツクスなど
の絶縁物スペーサ8でギヤツプを保ちながら電極
支持金具9に固定されている。
As shown in the figure, the plasma chamber 1 has a current introduction terminal 3 for introducing a filament current to heat the filament 2, and a gas introduction port 4 for introducing a gas such as hydrogen or argon. On the other hand, an acceleration electrode 5 for accelerating ions, a deceleration electrode 6,
The ground electrodes 7 are fixed to an electrode support fitting 9 while maintaining a gap between each electrode with an insulating spacer 8 made of ceramic or the like.

そして、本実施例では、各々の電極を第2図に
示すように、加速されるイオンと直角方向の平面
において複数個に分割し、分割したブロツクは加
速、減速、接地の各電極5,6,7が組合わされ
独立している。
In this embodiment, each electrode is divided into a plurality of blocks in a plane perpendicular to the ions to be accelerated, as shown in FIG. , 7 are combined and independent.

このようにすれば、電極は複数個のブロツクに
分割されているため、個々のブロツク内の熱変形
が小さいイオン源電極が得られる。また、大型化
しても一体の大きな電極を製作する必要がなく、
個々のブロツクごとに製作可能となるので製作が
容易となる。更に、メンテナンスの時に、電極全
体を解決せず必要な個所のブロツクのみ取外しで
きるため、メンテナンス時間の短縮が図れるとい
う効果をも有する。
In this way, since the electrode is divided into a plurality of blocks, an ion source electrode can be obtained in which thermal deformation within each block is small. In addition, even if the size is increased, there is no need to manufacture a large integrated electrode.
Manufacturing is facilitated because each block can be manufactured individually. Furthermore, at the time of maintenance, only the necessary blocks can be removed without having to solve the entire electrode, which has the effect of shortening the maintenance time.

〔発明の効果〕〔Effect of the invention〕

以上説明した本発明のイオン源によれば、プラ
ズマ室よりイオンを引出すための少なくとも2個
重ね配置された各々の電極を複数個に分割し、分
割された電極のブロツクは、各々の電極が組合わ
され独立しているものであるから、大型化や多種
類の電極材料が使用されるようになつても熱変形
が小さくて大きな面積の電極が得られることは勿
論、大きな電極の材料を製作する必要がなく、か
つ、電極のメンテナンスを短時間に行なうことの
できるイオン源を得ることができる。
According to the ion source of the present invention as described above, each of the at least two stacked electrodes for extracting ions from the plasma chamber is divided into a plurality of blocks, and each divided electrode block is formed into a block in which each electrode is assembled. Because they are combined and independent, it is possible to obtain large-area electrodes with small thermal deformation even when larger sizes and a variety of electrode materials are used, and it is also possible to manufacture large electrode materials. It is possible to obtain an ion source that does not require maintenance of electrodes and can be performed in a short time.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示すイオン源の側
面断面図、第2図は第1図のA−A線に沿う断面
図である。 1……プラズマ室、2……フイラメント、3…
…電流導入端子、4……ガス導入口、5……加速
電極、6……減速電極、7……接地電極、8……
絶縁スペーサ、9……電極支持金具、10……ブ
ロツク電極。
FIG. 1 is a side sectional view of an ion source showing an embodiment of the present invention, and FIG. 2 is a sectional view taken along line A--A in FIG. 1. 1... plasma chamber, 2... filament, 3...
...Current introduction terminal, 4...Gas introduction port, 5...Acceleration electrode, 6...Deceleration electrode, 7...Grounding electrode, 8...
Insulating spacer, 9...electrode support fitting, 10...block electrode.

Claims (1)

【特許請求の範囲】 1 ガス等を導入し、このガス等をプラズマ化す
るプラズマ室と、そのプラズマ室よりイオンを引
出すための少なくとも2個重ね配置された電極と
を備えたイオン源において、 少なくとも2個重ね配置された前記各々の電極
は複数個に分割され、分割された電極のブロツク
は、前記各々の電極が組合わされ独立しているこ
とを特徴とするイオン源。
[Scope of Claims] 1. An ion source comprising a plasma chamber for introducing gas, etc. and turning the gas, etc. into plasma, and at least two stacked electrodes for extracting ions from the plasma chamber, comprising at least An ion source characterized in that each of the two electrodes stacked one on top of the other is divided into a plurality of blocks, and each block of divided electrodes is a combination of the two electrodes and is independent.
JP60034372A 1985-02-25 1985-02-25 ion source Granted JPS61195550A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60034372A JPS61195550A (en) 1985-02-25 1985-02-25 ion source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60034372A JPS61195550A (en) 1985-02-25 1985-02-25 ion source

Publications (2)

Publication Number Publication Date
JPS61195550A JPS61195550A (en) 1986-08-29
JPH0574901B2 true JPH0574901B2 (en) 1993-10-19

Family

ID=12412338

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60034372A Granted JPS61195550A (en) 1985-02-25 1985-02-25 ion source

Country Status (1)

Country Link
JP (1) JPS61195550A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0724205B2 (en) * 1986-10-08 1995-03-15 株式会社日立製作所 Ion beam processing equipment
JP5589916B2 (en) * 2011-03-17 2014-09-17 日新イオン機器株式会社 Slit electrode and charged particle beam generator provided with the same

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5740246U (en) * 1980-08-15 1982-03-04
JPS5778800A (en) * 1980-11-04 1982-05-17 Hitachi Ltd Ion source for netral particle incident device

Also Published As

Publication number Publication date
JPS61195550A (en) 1986-08-29

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