JPH058101B2 - - Google Patents
Info
- Publication number
- JPH058101B2 JPH058101B2 JP60167731A JP16773185A JPH058101B2 JP H058101 B2 JPH058101 B2 JP H058101B2 JP 60167731 A JP60167731 A JP 60167731A JP 16773185 A JP16773185 A JP 16773185A JP H058101 B2 JPH058101 B2 JP H058101B2
- Authority
- JP
- Japan
- Prior art keywords
- laminate
- plating
- weight
- resin
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007747 plating Methods 0.000 claims description 37
- 239000000126 substance Substances 0.000 claims description 26
- 239000012790 adhesive layer Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- 239000002245 particle Substances 0.000 claims description 10
- 229920005989 resin Polymers 0.000 claims description 10
- 239000011347 resin Substances 0.000 claims description 10
- 229910052809 inorganic oxide Inorganic materials 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 6
- 239000002344 surface layer Substances 0.000 claims description 6
- 229920001187 thermosetting polymer Polymers 0.000 claims description 6
- 238000010521 absorption reaction Methods 0.000 claims description 2
- 230000001747 exhibiting effect Effects 0.000 claims description 2
- 229920003051 synthetic elastomer Polymers 0.000 claims description 2
- 239000005061 synthetic rubber Substances 0.000 claims description 2
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 15
- 239000000853 adhesive Substances 0.000 description 12
- 230000001070 adhesive effect Effects 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 10
- 239000003822 epoxy resin Substances 0.000 description 8
- 229920000647 polyepoxide Polymers 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 6
- 230000007547 defect Effects 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- 239000011134 resol-type phenolic resin Substances 0.000 description 4
- 239000005060 rubber Substances 0.000 description 4
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical class OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- OCWYEMOEOGEQAN-UHFFFAOYSA-N bumetrizole Chemical compound CC(C)(C)C1=CC(C)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O OCWYEMOEOGEQAN-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 239000002966 varnish Substances 0.000 description 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- JHDNFMVFXUETMC-UHFFFAOYSA-N 2-(2H-benzotriazol-4-yl)-4-methylphenol Chemical compound CC1=CC=C(O)C(C=2C=3N=NNC=3C=CC=2)=C1 JHDNFMVFXUETMC-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ZCILGMFPJBRCNO-UHFFFAOYSA-N 4-phenyl-2H-benzotriazol-5-ol Chemical class OC1=CC=C2NN=NC2=C1C1=CC=CC=C1 ZCILGMFPJBRCNO-UHFFFAOYSA-N 0.000 description 1
- YBZYWVUXLILCGV-UHFFFAOYSA-N 5-chloro-4-(2-methylphenyl)-2H-benzotriazole Chemical compound CC1=CC=CC=C1C1=C(Cl)C=CC2=NNN=C12 YBZYWVUXLILCGV-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- TUKWPCXMNZAXLO-UHFFFAOYSA-N ethyl 2-nonylsulfanyl-4-oxo-1h-pyrimidine-6-carboxylate Chemical compound CCCCCCCCCSC1=NC(=O)C=C(C(=O)OCC)N1 TUKWPCXMNZAXLO-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- QUAMTGJKVDWJEQ-UHFFFAOYSA-N octabenzone Chemical compound OC1=CC(OCCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 QUAMTGJKVDWJEQ-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
- H05K3/387—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive for electroless plating
Landscapes
- Laminated Bodies (AREA)
- Chemically Coating (AREA)
Description
[産業上の利用分野]
本発明は、紫外線の透過防止に極めて優れた効
果をもつ化学めつき用積層板の製造方法に関する
ものである。
[従来技術]
化学めつき用積層板を周知のアデイテイブプロ
セスによりプリント配線板に加工する場合、高精
度微細パターンの製造方法の1つとして、時開昭
59−151495号に詳細に説明されているように、次
のような工程がある。
A 化学めつき用積層板のNCドリルによる穴あ
け
B 接着剤表面の化学エツチング
C 接着剤表面及び穴内全てに対する化学めつき
用触媒付与
D 接着剤表面への液状めつきレジストの塗工
E めつきレジストの露光、現像、パターンニン
グ
F 化学めつき
G プリント配線板
前記工程において、工程Dの液状めつきレジス
トの塗工事、工程Aで形成した穴内にめつきレジ
ストが入り、工程Eの露光により穴内に入つため
つきレジストが感光、硬化し、工程Fの化学めつ
き時に穴内のめつきレジスト上にめつきが析出せ
ず、スルホール内のめつき析出不良の原因となる
ことがある。
この原因、機構については、めつきレジスト層
を通過した光が、化学めつき用積層板の基材であ
るガラスクロスのガラスフイラメントにより屈折
し、穴壁上のめつきレジストを感光、硬化させる
ことが考えられる。
[発明の目的]
本発明者らは、前記のような穴壁に付着しため
つきレジストが感光、硬化しないように鋭意研究
した結果、接着剤層に紫外線透過防止の機能を付
与することにより、前記目的を達成できることを
見い出し本発明を完成したものである。
[発明の構成]
本発明は、合成ゴムを含む硬化性樹脂よりなる
接着剤層を熱硬化性樹脂積層板の両表面に形成し
た化学めつき用積層板の製造方法において、前記
熱硬化性樹脂積層板の表面層を構成する樹脂含浸
基材の樹脂中に10nm〜450nmに吸収ピークを示
す有機紫外線吸収物質を0.1〜5.0重量%配合し、
更に前記接着剤層中に最大粒径20μm以下の無機
酸化物を0.1〜20重量%配合することを特徴とす
る科学めつき用積層板の製造方法である。
本発明に用いられる有機紫外線吸収物質は、ヒ
ドロキシベンゾフエノン類、ヒドロキシフエニル
ベンゾトリアゾール類であり、例えば、2−ヒド
ロキシ−4オクトキシベンゾフエノン、2−
(2′−ヒドロキシ−5′−メチルフエニル)−ベンゾ
トリアゾール、2−(2′−ヒドロキシ−3′−t−
ブチル−5′−メチルフエニル)−5−クロロベン
ゾトリアゾール、2−(2′−ヒドロキシ−5′−t
−オクチルフエニル)−ベンゾトリアゾール、2
−(3−t−ブチル−5−メチル−2−ヒドロキ
シフエニル)−5−クロロベンゾトリアゾールな
どをあげることができる。これらはいずれも10n
m〜450nmの波長領域で光吸収ピークを示すも
のである。本発明に使用するのに特に適したもの
は、2−(2′−ヒドロキシ−3′−t−ブチル−5′−
メチルフエニル)−5−クロロベンゾトリアゾー
ル及び2−(3−t−ブチル−5−メチル−2−
ヒドロキシフエニル)−5−クロロベンゾトリア
ゾールである。
また、本発明に用いられる無機酸化物は、酸化
マグネシウム、酸化アルミニウム、酸化鉄、酸化
チタン、酸化亜鉛、酸化鉛、酸化珪素などをあげ
ることができる。これらのうち本発明に使用する
のに適したものは酸化チタンである。
本発明の製造方法について説明すると、通常用
いる熱硬化性樹脂ワニス中に前記した有機紫外線
吸収物質を溶解しておき、ガラス織布等の基材に
含浸させて熱硬化性樹脂含浸基材を得、これを表
面層の1層又は複数層とし、有機紫外線吸収物質
を含有しない熱硬化性樹脂含浸基材を内層として
重ね合わせ、加熱加圧成形して積層板を得る。こ
の積層板の表面に前記の無機酸化物を含有する接
着剤を塗布・乾燥することにより、接着剤層を有
する化学めつき用積層板を得る。
このように、有機紫外線吸収物質と無機酸化物
とを併用し、かつ接着剤層には無機酸化物のみを
配合するので、本発明により得られた化学めつき
用積層板は、化学めつき後における銅皮膜の密着
性、はんだ付け耐熱性に全く悪影響を与えること
なく、すぐれた紫外線透過防止効果を発揮するこ
とができる。
有機紫外線吸収剤が5.0重量%を超えると、積
層板の耐溶剤性、耐熱性が不良になり、0.1重量
%未満では、紫外線の遮蔽効果が小さくなる。
また、酸化物を20重量%を超えて配合すると、
接着剤の粘度上昇、後工程でのめつき密着性不良
を発生する。さらに、酸化物が0.1重量%未満で
は、紫外線の遮蔽効果が小さい。酸化物の配合に
ついて、好ましくは1.0〜10重量%である。
酸化物の粒径については、高精度微細パターン
形成上、20μm以上の粒子が存在すると、化学エ
ツチング工程で酸化物粒子が接着剤表面に露出
し、めつきで形成した回路に凹凸が生じ、回路の
平滑性を損なう。酸化物の粒径は好ましくは5μ
m以下である。
[発明の効果]
本発明によると、めつきレジスト層を通過した
紫外線は接着剤層及び積層板の表面層遮蔽され、
化学めつき用積層板の層内深く透過することがな
いため、穴壁に付着しためつきレジストを感光、
硬化させることを防止することができる。
さらに、紫外線吸収剤と無機酸化物を併用して
いることにより、紫外線の遮蔽効果が大きいと共
に、有機紫外線吸収物質は接着剤層付き積層板の
表面(接着剤層)にはなく、かつその添加量は少
ないので、プリント配線板としての電気特性、化
学特性、耐熱性を劣下させることがない。
[実施例]
本発明の化学めつき用積層板の製造方法につい
て、以下に実施例及び比較例により説明する。
「部」は「重量部」を表わす。
実施例 1
エピコートEP−1046(油化シエル社製臭素化ビ
スフエノールAエポキシ樹脂)100重量部、ジシ
アンジアミド4重量部、2−エチル−4−メチル
イミダゾール0.15重量部、有機紫外線吸収物質と
して2−(2′−ヒドロキシ−3′−t−ブチル−5′−
メチルフエニル)−5−クロロベンゾトリアゾー
ル2重量部を総固形分として50重量%となるよう
メチルエチルケトン及びメチルセロソルブの溶剤
で溶解及び均一に攪拌しワニス溶液とした。この
ワニスをガラス織布に含浸させ乾燥させたのち、
樹脂分45%のプリプレグ(A)を得た。
また、有機物紫外線吸収物質を配合しないこと
を除いて前記処方と同様にして樹脂分45%のプリ
プレグ(B)を得た。
両表面層としてプリプレグ(A)各1枚と、内層と
してプリプレグ(B)6枚とを重ね合わせ、165℃、
60Kg/cm2で90分間加熱加圧成形してエポキシ樹脂
積層板を得た。
次に、下記配合で接着剤を調合し、前記のエポ
キシ樹脂積層板に塗工し、160℃で120分加熱して
両面に接着剤層を形成することにより化学めつき
用積層板を得た。接着剤層の厚みは30μmであつ
た。
NBRゴム(JSR−N−230SH) 100部
レゾール型フエノール樹脂 100部
SiO2粉末(最大粒径5μm) 10部
TiO2粉末(最大粒径1μm) 10部
メチルエチルケトン 500部
実施例 2
実施例1と同様の過程でプリプレグ(A)とプリプ
レグ(B)とを得、両表面層としてプリプレグ(A)各2
枚と、内層としてプリプレグ(B)4枚とを重ね合わ
せ、165℃、60Kg/cm2で90分間加熱加圧成形して
エポキシ樹脂積層を得た。
次に、下記配合で接着剤を調合し、前記のエポ
キシ樹脂積層板に塗工し、実施例1と同様にして
化学めつき用積層板を得た。
NBRゴム(JSR−N−530) 100部
レゾール型フエノール樹脂 100部
TiO2粉末(最大粒径10μm) 5部
メチルエチルケトン 500部
比較例 1
実施例の過程で得られたプリプレグ(B)のみを8
枚重ね合わせ、165℃、60Kg/cm2で90分間加熱加
圧成形してエポキシ樹脂積層を得た。
次に、下記配合で接着剤を調合し、前記のエポ
キシ樹脂積層板に塗工し、実施例1と同様にして
化学めつき用積層板を得た。
NBRゴム(JSR−N−230SH) 100部
レゾール型フエノール樹脂 100部
TiO2粉末(最大粒径10μm) 60部
メチルエチルケトン 500部
比較例 2
下記配合で接着剤を調合し、実施例2で得られ
たエポキシ樹脂積層板に塗工し、実施例1と同様
にして化学めつき用積層板を得た。
NBRゴム(JSR−N−230SH) 100部
レゾール型フエノール樹脂 100部
メチルエチルケトン 500部
比較例 3
比較例2と同じ配合で接着剤を調合し、比較例
1で得られたエポキシ樹脂積層板に塗工し、実施
例1と同様にして化学めつき用積層板を得た。
実施例1、2及び比較例1、2、3で得られた
化学めつき用積層板を前記工程A〜Gの順に処理
し、プリント配線板を得た。
[Industrial Field of Application] The present invention relates to a method for manufacturing a laminate for chemical plating which has an extremely excellent effect in preventing the transmission of ultraviolet rays. [Prior art] When processing a chemically plated laminate into a printed wiring board using a well-known additive process, Tokigai Akira's
As explained in detail in No. 59-151495, there are the following steps. A. Drilling holes in a laminate for chemical plating using an NC drill B. Chemical etching of the adhesive surface C. Applying a catalyst for chemical plating to the adhesive surface and all inside the holes D. Applying liquid plating resist to the adhesive surface E. Plating resist Exposure, development, patterning F Chemical plating G Printed wiring board In the above steps, the plating resist enters the hole formed in Step A, and the plating resist enters the hole formed in Step E. The plating resist inside the through-hole is exposed to light and hardened, and during chemical plating in step F, no plating is deposited on the plating resist inside the hole, which may cause poor plating deposition inside the through-hole. The cause and mechanism for this is that the light that has passed through the plating resist layer is refracted by the glass filament of the glass cloth, which is the base material of the chemical plating laminate, and the plating resist on the hole wall is exposed to light and hardened. is possible. [Purpose of the Invention] As a result of extensive research by the present inventors to prevent the hardening resist attached to the hole walls as described above from being exposed to light and hardening, the present inventors have developed a method to prevent UV transmission from being transmitted to the adhesive layer. The present invention has been completed by discovering that the above object can be achieved. [Structure of the Invention] The present invention provides a method for manufacturing a laminate for chemical plating in which an adhesive layer made of a curable resin containing synthetic rubber is formed on both surfaces of a thermosetting resin laminate. 0.1 to 5.0% by weight of an organic ultraviolet absorbing substance exhibiting an absorption peak at 10 nm to 450 nm is blended into the resin of the resin-impregnated base material constituting the surface layer of the laminate,
The method for producing a laminate for scientific plating is further characterized in that 0.1 to 20% by weight of an inorganic oxide having a maximum particle size of 20 μm or less is blended into the adhesive layer. The organic ultraviolet absorbing substances used in the present invention are hydroxybenzophenones and hydroxyphenylbenzotriazoles, such as 2-hydroxy-4octoxybenzophenone and 2-hydroxybenzophenone.
(2'-hydroxy-5'-methylphenyl)-benzotriazole, 2-(2'-hydroxy-3'-t-
Butyl-5'-methylphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-5'-t
-octylphenyl)-benzotriazole, 2
Examples include -(3-t-butyl-5-methyl-2-hydroxyphenyl)-5-chlorobenzotriazole. Both of these are 10n
It shows a light absorption peak in the wavelength range of m to 450 nm. Particularly suitable for use in the present invention is 2-(2'-hydroxy-3'-t-butyl-5'-
methylphenyl)-5-chlorobenzotriazole and 2-(3-t-butyl-5-methyl-2-
hydroxyphenyl)-5-chlorobenzotriazole. Inorganic oxides used in the present invention include magnesium oxide, aluminum oxide, iron oxide, titanium oxide, zinc oxide, lead oxide, silicon oxide, and the like. Among these, titanium oxide is suitable for use in the present invention. To explain the manufacturing method of the present invention, the organic ultraviolet absorbing substance described above is dissolved in a commonly used thermosetting resin varnish, and a base material such as a glass woven cloth is impregnated to obtain a thermosetting resin-impregnated base material. This is used as one or more layers as a surface layer, and a thermosetting resin-impregnated base material containing no organic ultraviolet absorbing substance is superimposed as an inner layer, and then heated and pressure molded to obtain a laminate. A laminate for chemical plating having an adhesive layer is obtained by applying an adhesive containing the inorganic oxide to the surface of this laminate and drying it. As described above, since an organic ultraviolet absorbing substance and an inorganic oxide are used in combination, and only an inorganic oxide is mixed in the adhesive layer, the chemically plated laminate obtained according to the present invention can be used after chemically plating. It is possible to exhibit an excellent ultraviolet transmission prevention effect without any adverse effect on the adhesion and soldering heat resistance of the copper film. If the organic ultraviolet absorber exceeds 5.0% by weight, the solvent resistance and heat resistance of the laminate will be poor, and if it is less than 0.1% by weight, the ultraviolet shielding effect will be reduced. In addition, if oxides are added in excess of 20% by weight,
Increased adhesive viscosity and poor plating adhesion in subsequent processes. Furthermore, if the oxide content is less than 0.1% by weight, the UV shielding effect is small. The oxide content is preferably 1.0 to 10% by weight. Regarding the particle size of the oxide, in order to form high-precision fine patterns, if particles of 20 μm or more are present, the oxide particles will be exposed on the adhesive surface during the chemical etching process, causing unevenness in the circuit formed by plating, and causing the circuit to deteriorate. impairs the smoothness of the surface. Oxide particle size is preferably 5μ
m or less. [Effects of the Invention] According to the present invention, ultraviolet rays passing through the plating resist layer are blocked by the adhesive layer and the surface layer of the laminate;
Since it does not penetrate deeply into the layers of chemical plating laminates, it is possible to expose and remove the plating resist that adheres to the hole walls.
Hardening can be prevented. Furthermore, by using a UV absorber and an inorganic oxide in combination, the effect of blocking UV rays is large, and the organic UV absorbing substance is not present on the surface (adhesive layer) of the laminate with an adhesive layer, and its addition Since the amount is small, the electrical properties, chemical properties, and heat resistance of the printed wiring board will not deteriorate. [Example] The method for manufacturing a laminate for chemical plating according to the present invention will be described below using Examples and Comparative Examples.
"Part" represents "part by weight." Example 1 100 parts by weight of Epicote EP-1046 (brominated bisphenol A epoxy resin manufactured by Yuka Shell Co., Ltd.), 4 parts by weight of dicyandiamide, 0.15 parts by weight of 2-ethyl-4-methylimidazole, 2-( as an organic ultraviolet absorbing substance) 2'-Hydroxy-3'-t-butyl-5'-
A varnish solution was obtained by dissolving 2 parts by weight of (methylphenyl)-5-chlorobenzotriazole in a solvent of methyl ethyl ketone and methyl cellosolve to a total solid content of 50% by weight and stirring uniformly. After impregnating a woven glass cloth with this varnish and drying it,
A prepreg (A) with a resin content of 45% was obtained. Further, a prepreg (B) having a resin content of 45% was obtained in the same manner as the above recipe except that no organic ultraviolet absorbing substance was blended. One sheet each of prepreg (A) as both surface layers and six sheets of prepreg (B) as the inner layer were stacked at 165℃.
An epoxy resin laminate was obtained by heat-pressing molding at 60 kg/cm 2 for 90 minutes. Next, an adhesive was prepared with the following composition, applied to the epoxy resin laminate described above, and heated at 160°C for 120 minutes to form an adhesive layer on both sides to obtain a laminate for chemical plating. . The thickness of the adhesive layer was 30 μm. NBR rubber (JSR-N-230SH) 100 parts resol type phenolic resin 100 parts SiO 2 powder (maximum particle size 5 μm) 10 parts TiO 2 powder (maximum particle size 1 μm) 10 parts methyl ethyl ketone 500 parts Example 2 Same as Example 1 In the process, prepreg (A) and prepreg (B) were obtained, and 2 each of prepreg (A) was used as both surface layers.
This sheet was laminated with four sheets of prepreg (B) as an inner layer, and heated and pressure molded at 165° C. and 60 kg/cm 2 for 90 minutes to obtain an epoxy resin laminate. Next, an adhesive was prepared according to the following composition and applied to the epoxy resin laminate described above to obtain a laminate for chemical plating in the same manner as in Example 1. NBR rubber (JSR-N-530) 100 parts Resol type phenolic resin 100 parts TiO 2 powder (maximum particle size 10 μm) 5 parts Methyl ethyl ketone 500 parts Comparative example 1 Only the prepreg (B) obtained in the process of Example 8
The sheets were stacked together and heated and pressure molded at 165° C. and 60 kg/cm 2 for 90 minutes to obtain an epoxy resin laminate. Next, an adhesive was prepared according to the following composition and applied to the epoxy resin laminate described above to obtain a laminate for chemical plating in the same manner as in Example 1. NBR rubber (JSR-N-230SH) 100 parts Resol type phenolic resin 100 parts TiO 2 powder (maximum particle size 10 μm) 60 parts Methyl ethyl ketone 500 parts Comparative example 2 An adhesive was prepared with the following composition, and the adhesive obtained in Example 2 was prepared. The mixture was applied to an epoxy resin laminate to obtain a chemically plated laminate in the same manner as in Example 1. NBR rubber (JSR-N-230SH) 100 parts Resol type phenolic resin 100 parts Methyl ethyl ketone 500 parts Comparative example 3 Prepare an adhesive with the same composition as in Comparative example 2 and apply it to the epoxy resin laminate obtained in Comparative example 1. Then, in the same manner as in Example 1, a laminate for chemical plating was obtained. The chemically plated laminates obtained in Examples 1 and 2 and Comparative Examples 1, 2, and 3 were processed in the order of steps A to G to obtain printed wiring boards.
【表】
上記プリント配線板の評価結果を表−1に示
す。
実施例1及び2はスルホール内のめつき析出に
よる不良は発生せず、めつき銅皮膜のフクレの発
生もなく、プリント配線板のはんだ付け耐熱性も
良好であつた。
一方、比較例1はスルホール内のめつき析出に
よる不良は発生しなかつたが、めつき銅皮膜のフ
クレが生じた。比較例2はスルホール内にめつき
析出による不良の発生がみられた。比較例3はス
ルホール内のめつき析出による不良が顕著に発生
した。[Table] Table 1 shows the evaluation results of the above printed wiring board. In Examples 1 and 2, there were no defects due to plating precipitation in the through holes, no blistering occurred in the plated copper film, and the soldering heat resistance of the printed wiring board was good. On the other hand, in Comparative Example 1, no defects due to plating precipitation in the through holes occurred, but blistering of the plating copper film occurred. In Comparative Example 2, defects due to plating precipitation were observed in the through holes. In Comparative Example 3, defects due to plating precipitation within the through holes occurred significantly.
Claims (1)
を熱硬化性樹脂積層板の両表面上に形成した化学
めつき用積層板の製造方法において、前記熱硬化
性樹脂積層板の表面層を構成する樹脂含浸基材の
樹脂中に10nm〜450nmに吸収ピークを示す有機
紫外線吸収物質を0.1〜5.0重量%配合し、更に前
記接着剤層中に最大粒径20μm以下の無機酸化物
を0.1〜20重量%配合することを特徴とする化学
めつき用積層板の製造方法。1. In a method for manufacturing a laminate for chemical plating in which an adhesive layer made of a curable resin containing synthetic rubber is formed on both surfaces of a thermosetting resin laminate, the surface layer of the thermosetting resin laminate is formed. 0.1 to 5.0% by weight of an organic ultraviolet absorbing substance exhibiting an absorption peak at 10 nm to 450 nm is blended into the resin of the resin-impregnated base material, and 0.1 to 20% of an inorganic oxide with a maximum particle size of 20 μm or less is added to the adhesive layer. A method for manufacturing a laminate for chemical plating, characterized in that a laminate is mixed by weight%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60167731A JPS6228243A (en) | 1985-07-31 | 1985-07-31 | Manufacture of laminated board for chemical plating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60167731A JPS6228243A (en) | 1985-07-31 | 1985-07-31 | Manufacture of laminated board for chemical plating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6228243A JPS6228243A (en) | 1987-02-06 |
| JPH058101B2 true JPH058101B2 (en) | 1993-02-01 |
Family
ID=15855102
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60167731A Granted JPS6228243A (en) | 1985-07-31 | 1985-07-31 | Manufacture of laminated board for chemical plating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6228243A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10345350B4 (en) | 2003-09-19 | 2005-07-28 | Getrag Getriebe- Und Zahnradfabrik Hermann Hagenmeyer Gmbh & Cie Kg | Synchronous coupling for a motor vehicle stepped transmission |
-
1985
- 1985-07-31 JP JP60167731A patent/JPS6228243A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6228243A (en) | 1987-02-06 |
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