JPH0586331B2 - - Google Patents
Info
- Publication number
- JPH0586331B2 JPH0586331B2 JP60152178A JP15217885A JPH0586331B2 JP H0586331 B2 JPH0586331 B2 JP H0586331B2 JP 60152178 A JP60152178 A JP 60152178A JP 15217885 A JP15217885 A JP 15217885A JP H0586331 B2 JPH0586331 B2 JP H0586331B2
- Authority
- JP
- Japan
- Prior art keywords
- parts
- plating
- adhesive
- laminate
- chemical plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
- H05K3/387—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive for electroless plating
Landscapes
- Laminated Bodies (AREA)
Description
〔産業上の利用分野〕
本発明は、紫外線の透過防止に極めて優れた効
果をもつ化学めつき用積層板の製造方法に関する
ものである。
〔従来技術〕
化学めつき用積層板を周知のアデイテイブプロ
セスによりプリント配線板に加工する場合、高精
度微細パターンの製造方法の1つとして、特開昭
59−151495に詳細に説明されているように、次の
ような工程がある。
A 化学めつき用積層板のNCドリルによる穴あ
け
B 接着剤表面の化学エツチング
C 接着剤表面及び穴内全てに対する化学めつき
用触媒付与
D 接着剤表面への液状めつきレジストの塗工
E めつきレジストの露光、現像、パターンニン
グ
F 化学めつき
G プリント配線板
前記工程において、工程Dの液状めつきレジス
トの塗工時、工程Aで形成した穴内にめつきレジ
ストが入り、固定Eの露光により穴内に入つため
つきレジストが感光、硬化し、工程Fの化学めつ
き時に穴内のめつきレジスト上にめつきが析出し
ないことがある。
この原因、機構については、めつきレジスト層
を通過した光が、化学めつき用積層板の基材であ
るガラスクロスのガラスフイラメントにより屈折
し、穴壁上のめつきレジストを感光、硬化させる
ことが考えられる。
〔発明の目的〕
本発明者らは、前記のような穴壁に付着しため
つきレジストが感光、硬化しないように鋭意研究
した結果、接着剤層に紫外線透過防止の機能を付
与することにより、前記目的を達成できることを
見い出し本発明を完成したものである。
〔発明の構成〕
本発明は、合成ゴムを含む硬化性樹脂よりなる
接着剤層を絶縁性基板の両表面に形成した化学め
つき用積層板の製造方法において、前記接着剤中
に10nm〜450nmに吸収ピークを示す有機の紫外
線吸収物質0.1〜5.0重量%と最大粒径20μm以下の
無機酸化物を0.1〜20重量%とを併用して配合す
ることを特徴とする化学めつき用積層板の製造方
法である。
本発明に用いられる有機の紫外線吸収物質は、
ヒドロキシベンゾフエノン類、ヒドロキシフエニ
ルベンゾトリアゾール類であり、例えば、2−ヒ
ドロキシ−4−オクトキシベンゾフエノン、2−
(2′−ヒドロキシ−5′−メチルフエニル)−ベンゾ
トリアゾール、2−(2′−ヒドロキシ−3′−t−
ブチル−5′−メチルフエニル)−5−クロロベン
ゾトリアゾール、2−(2′−ヒドロキシ−5′−t
−オクチルフエニル)−ベンゾトリアゾール、2
−(3−t−ブチル−5−メチル−2−ヒドロキ
シフエニル)−5−クロロベンゾトリアゾールな
どをあげることができる。これらはいずれも
10nm〜450nmの波長領域で光吸収ピークを示す
ものである。本発明に使用するのに特に適したも
のは、2−(2′−ヒドロキシ−3′−t−ブチル−
5′−メチルフエニル)−5−クロロベンゾトリア
ゾール及び2−(3−t−ブチル−5−メチル−
2−ヒドロキシフエニル)−5−クロロベンゾト
リアゾールである。
また、本発明に用いられる無機酸化物は、酸化
マグネシウム、酸化アルミニウム、酸化鉄、酸化
チタン、酸化亜鉛、酸化鉛、酸化珪素などをあげ
ることができる。これらのうち本発明に使用する
のに適したものは酸化チタンである。
有機紫外線吸収剤が5.0重量%を超えると、接
着剤層の耐溶剤性、耐熱性が不良になり、0.1重
量%未満では、紫外線の遮蔽効果が小さくなる。
また、酸化物を20重量%を超えて配合すると、
接着剤の粘度上昇、後工程でのめつき密着性不良
を発生する。さらに、酸化物が0.1重量%未満で
は、紫外線の遮蔽効果が小さい。酸化物の配合に
ついて、好ましくは1.0〜10重量%である。
酸化物の粒径については、高精度微細パターン
形成上、20μm以上の粒子が存在すると、化学エ
ツチング工程で酸化物粒子が接着剤表面に露出
し、めつきで形成した回路に凹凸が生じ、回路の
平滑性を損なう。酸化物の粒径は好ましくは5μm
以下である。
〔発明の効果〕
本発明によると、めつきレジスト層を通過した
紫外線は接着剤層で遮蔽され、化学めつき用積層
板の層内深く透過することがないため、穴壁に付
着しためつきレジストを感光、硬化させることを
防止することができる。
さらに、紫外線吸収剤と無機酸化物を併用して
いることにより、紫外線の遮蔽効果が大きいと共
に、有機紫外線吸収物質の添加量は少ないので、
プリント配線板としての電気特性、化学特性、耐
熱性を劣化させることがない。
〔実施例〕
本発明の化学めつき用積層板の製造方法につい
て、以下に実施例及び比較例により説明する。
実施例 1
下記配合で接着剤を調合し、ガラス・エポキシ
積層板に塗工し、160℃で120分加熱して両面に接
着剤層を形成することにより化学めつき用積層板
を得た。接着剤層の厚みは30μmであつた。
NBRゴム(JSR−N−230SH) 100部
レゾール型フエノール樹脂 100部
SiO2粉末(最大粒径5μm) 10部
TiO2粉末(最大粒径1μm) 10部
2−(2′−ヒドロキシ−3′−t−ブチル−5′−メ
チルフエニル)−5−クロロベンゾトリアゾー
ル 2部
メチルエチルケトン 500部
実施例 2
下記配合で接着剤を調合し、実施例1と同様に
して化学めつき用積層板を得た。
NBRゴム(JSR−N−530) 100部
レゾール型フエノール樹脂 100部
TiO2粉末(最大粒径10μm) 5部
2−(3−t−ブチル−5−メチル−2−ヒド
ロキシフエニル)−5−クロロベンゾトリアゾ
ール 5部
メチルエチルケトン 500部
比較例 1
下記配合で接着剤を調合し、実施例1と同様に
して化学めつき用積層板を得た。
NBRゴム(JSR−N−230SH) 100部
レゾール型フエノール樹脂 100部
TiO2粉末(最大粒径10μm) 60部
メチルエチルケトン 500部
比較例 2
下記配合で接着剤を調合し、実施例1と同様に
して化学めつき用積層板を得た。
NBRゴム(JSR−N−230SH) 100部
レゾール型フエノール樹脂 100部
2−(3−t−ブチル−5−メチル−2−ヒド
ロキシフエニル)−5−クロロベンゾトリアゾ
ール 10部
メチルエチルケトン 500部
比較例 3
下記配合で接着剤を調合し、実施例1と同様に
して化学めつき用積層板を得た。
NBRゴム(JSR−N−230SH) 100部
レゾール型フエノール樹脂 100部
メチルエチルケトン 500部
実施例1,2及び比較例1,2,3で得られた
化学めつき用積層板を前記工程A〜Gの順に処理
し、プリント配線板を得た。一方、実施例1,2
及び比較例1,2,3で調合した接着剤をアルミ
[Industrial Field of Application] The present invention relates to a method for producing a chemically plated laminate having an extremely excellent effect of preventing the transmission of ultraviolet rays. [Prior art] When processing a chemically plated laminate into a printed wiring board using a well-known additive process, as one method for producing high-precision fine patterns,
59-151495, the steps are as follows. A. Drilling holes in a laminate for chemical plating using an NC drill B. Chemical etching of the adhesive surface C. Applying a catalyst for chemical plating to the adhesive surface and all inside the holes D. Applying liquid plating resist to the adhesive surface E. Plating resist Exposure, development, patterning F Chemical plating G Printed wiring board In the above process, when applying the liquid plating resist in Step D, the plating resist enters the hole formed in Step A, and the inside of the hole is exposed by the exposure of fixing E. The plating resist in the hole is exposed to light and hardened, and plating may not be deposited on the plating resist in the hole during chemical plating in step F. The cause and mechanism for this is that the light that has passed through the plating resist layer is refracted by the glass filament of the glass cloth, which is the base material of the chemical plating laminate, and the plating resist on the hole wall is exposed to light and hardened. is possible. [Purpose of the Invention] As a result of intensive research by the present inventors to prevent the sticking resist attached to the hole wall from being exposed to light and hardening, the present inventors found that by imparting the function of preventing UV transmission to the adhesive layer, The present invention has been completed by discovering that the above object can be achieved. [Structure of the Invention] The present invention provides a method for manufacturing a laminate for chemical plating in which an adhesive layer made of a curable resin containing synthetic rubber is formed on both surfaces of an insulating substrate. A laminate for chemical plating, characterized in that it contains 0.1 to 5.0% by weight of an organic ultraviolet absorbing substance exhibiting an absorption peak in 0.1 to 20% by weight of an inorganic oxide having a maximum particle size of 20 μm or less. This is the manufacturing method. The organic ultraviolet absorbing substance used in the present invention is
Hydroxybenzophenones, hydroxyphenylbenzotriazoles, such as 2-hydroxy-4-octoxybenzophenone, 2-
(2'-hydroxy-5'-methylphenyl)-benzotriazole, 2-(2'-hydroxy-3'-t-
Butyl-5'-methylphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-5'-t
-octylphenyl)-benzotriazole, 2
Examples include -(3-t-butyl-5-methyl-2-hydroxyphenyl)-5-chlorobenzotriazole. These are all
It shows a light absorption peak in the wavelength range of 10 nm to 450 nm. Particularly suitable for use in the present invention is 2-(2'-hydroxy-3'-t-butyl-
5'-methylphenyl)-5-chlorobenzotriazole and 2-(3-t-butyl-5-methyl-
2-hydroxyphenyl)-5-chlorobenzotriazole. Inorganic oxides used in the present invention include magnesium oxide, aluminum oxide, iron oxide, titanium oxide, zinc oxide, lead oxide, silicon oxide, and the like. Among these, titanium oxide is suitable for use in the present invention. If the organic ultraviolet absorber exceeds 5.0% by weight, the solvent resistance and heat resistance of the adhesive layer will be poor, and if it is less than 0.1% by weight, the ultraviolet shielding effect will be reduced. In addition, if oxides are added in excess of 20% by weight,
Increased adhesive viscosity and poor plating adhesion in subsequent processes. Furthermore, if the oxide content is less than 0.1% by weight, the UV shielding effect is small. The oxide content is preferably 1.0 to 10% by weight. Regarding the particle size of the oxide, when forming high-precision fine patterns, if particles larger than 20 μm are present, the oxide particles will be exposed on the surface of the adhesive during the chemical etching process, causing unevenness in the circuit formed by plating, and causing the circuit to deteriorate. impairs the smoothness of the surface. The particle size of the oxide is preferably 5μm
It is as follows. [Effects of the Invention] According to the present invention, ultraviolet rays that have passed through the plating resist layer are blocked by the adhesive layer and do not penetrate deeply into the layers of the chemically plated laminate. It is possible to prevent the resist from being exposed to light and hardening. Furthermore, by using UV absorbers and inorganic oxides together, the UV shielding effect is large, and the amount of organic UV absorbing substances added is small.
The electrical properties, chemical properties, and heat resistance of the printed wiring board will not deteriorate. [Example] The method for producing a chemically plated laminate according to the present invention will be described below using Examples and Comparative Examples. Example 1 A laminate for chemical plating was obtained by preparing an adhesive according to the following formulation, coating it on a glass-epoxy laminate, and heating it at 160° C. for 120 minutes to form adhesive layers on both sides. The thickness of the adhesive layer was 30 μm. NBR rubber (JSR-N-230SH) 100 parts Resol type phenolic resin 100 parts SiO 2 powder (maximum particle size 5 μm) 10 parts TiO 2 powder (maximum particle size 1 μm) 10 parts 2-(2'-Hydroxy-3'- t-Butyl-5'-methylphenyl)-5-chlorobenzotriazole 2 parts Methyl ethyl ketone 500 parts Example 2 An adhesive was prepared with the following composition, and a laminate for chemical plating was obtained in the same manner as in Example 1. NBR rubber (JSR-N-530) 100 parts Resol type phenolic resin 100 parts TiO 2 powder (maximum particle size 10 μm) 5 parts 2-(3-t-butyl-5-methyl-2-hydroxyphenyl)-5- Chlorobenzotriazole 5 parts Methyl ethyl ketone 500 parts Comparative Example 1 An adhesive was prepared according to the following composition, and a laminate for chemical plating was obtained in the same manner as in Example 1. NBR rubber (JSR-N-230SH) 100 parts Resol type phenolic resin 100 parts TiO 2 powder (maximum particle size 10 μm) 60 parts Methyl ethyl ketone 500 parts Comparative example 2 An adhesive was prepared with the following composition and the same procedure as in Example 1 was carried out. A laminate for chemical plating was obtained. NBR rubber (JSR-N-230SH) 100 parts Resol type phenolic resin 100 parts 2-(3-t-butyl-5-methyl-2-hydroxyphenyl)-5-chlorobenzotriazole 10 parts Methyl ethyl ketone 500 parts Comparative example 3 An adhesive was prepared according to the following composition, and a laminate for chemical plating was obtained in the same manner as in Example 1. NBR rubber (JSR-N-230SH) 100 parts Resol type phenolic resin 100 parts Methyl ethyl ketone 500 parts The chemical plating laminates obtained in Examples 1 and 2 and Comparative Examples 1, 2, and 3 were A printed wiring board was obtained by processing in this order. On the other hand, Examples 1 and 2
And the adhesives prepared in Comparative Examples 1, 2, and 3 were
【表】
ニウム箔に塗工し、160℃で120分加熱して硬化さ
せた後、アルミニウム箔を除去し、厚さ30μmの
接着剤フイルムを得た。
上記プリント配線板及び接着剤フイルムの評価
結果を表−1に示す。
この結果、透過率が0.1%以下の場合に、スル
ホール内のめつき析出不良をなくすことができる
ことが判つた。
実施例1及び2はスルホール内のめつき析出に
よる不良は発生せず、めつき銅皮膜のフクレの発
生もなく、プリント配線板のはんだ付け耐熱性も
良好であつた。
一方、比較例1及び2はスルホール内のめつき
析出による不良は発生しなかつたが、めつき銅皮
膜のフクレ、あるいはプリント配線板のはんだ付
け耐熱性不良が生じた。比較例3はスルホール内
のめつき析出による不良が発生した。[Table] After coating on aluminum foil and curing by heating at 160°C for 120 minutes, the aluminum foil was removed to obtain an adhesive film with a thickness of 30 μm. Table 1 shows the evaluation results of the printed wiring board and adhesive film. As a result, it was found that when the transmittance was 0.1% or less, poor plating precipitation inside the through holes could be eliminated. In Examples 1 and 2, there were no defects due to plating precipitation in the through holes, no blistering occurred in the plated copper film, and the soldering heat resistance of the printed wiring board was good. On the other hand, in Comparative Examples 1 and 2, no defects due to plating precipitation in the through holes occurred, but blistering of the plated copper film or poor soldering heat resistance of the printed wiring board occurred. In Comparative Example 3, defects occurred due to plating precipitation within the through holes.
Claims (1)
を絶縁性基板の両表面上に形成した化学めつき用
積層板の製造方法において、前記接着剤中に
10nm〜450nmに吸収ピークを示す有機の紫外線
吸収物質0.1〜5.0重量%と最大粒径20μm以下の無
機酸化物0.1〜20重量%とを、併用して配合する
ことを特徴とする化学めつき用積層板の製造方
法。1. In a method for manufacturing a laminate for chemical plating in which an adhesive layer made of a curable resin containing synthetic rubber is formed on both surfaces of an insulating substrate, in the adhesive
For chemical plating, characterized by containing 0.1 to 5.0% by weight of an organic ultraviolet absorbing substance exhibiting an absorption peak in the range of 10nm to 450nm and 0.1 to 20% by weight of an inorganic oxide having a maximum particle size of 20μm or less. Method of manufacturing laminates.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60152178A JPS6213331A (en) | 1985-07-12 | 1985-07-12 | Manufacture of laminated board for chemical plating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60152178A JPS6213331A (en) | 1985-07-12 | 1985-07-12 | Manufacture of laminated board for chemical plating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6213331A JPS6213331A (en) | 1987-01-22 |
| JPH0586331B2 true JPH0586331B2 (en) | 1993-12-10 |
Family
ID=15534752
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60152178A Granted JPS6213331A (en) | 1985-07-12 | 1985-07-12 | Manufacture of laminated board for chemical plating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6213331A (en) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5490340A (en) * | 1977-12-28 | 1979-07-18 | Idemitsu Kosan Co Ltd | Adhesive for vulcanized rubber |
| JPS5490339A (en) * | 1977-12-28 | 1979-07-18 | Idemitsu Kosan Co Ltd | Adhesive for vulcanized rubber |
-
1985
- 1985-07-12 JP JP60152178A patent/JPS6213331A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6213331A (en) | 1987-01-22 |
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