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JPH0582993B2 - - Google Patents
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JPH0582993B2 - - Google Patents

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Publication number
JPH0582993B2
JPH0582993B2 JP60225885A JP22588585A JPH0582993B2 JP H0582993 B2 JPH0582993 B2 JP H0582993B2 JP 60225885 A JP60225885 A JP 60225885A JP 22588585 A JP22588585 A JP 22588585A JP H0582993 B2 JPH0582993 B2 JP H0582993B2
Authority
JP
Japan
Prior art keywords
electrode
photovoltaic
back electrode
transparent
amorphous semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60225885A
Other languages
Japanese (ja)
Other versions
JPS6284569A (en
Inventor
Takeo Fukatsu
Kazuyuki Goto
Masaru Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP60225885A priority Critical patent/JPS6284569A/en
Publication of JPS6284569A publication Critical patent/JPS6284569A/en
Publication of JPH0582993B2 publication Critical patent/JPH0582993B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F19/00Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
    • H10F19/30Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells
    • H10F19/31Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells having multiple laterally adjacent thin-film photovoltaic cells deposited on the same substrate
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Photovoltaic Devices (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、複数の光起電力素子を集積した光起
電力装置の製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method of manufacturing a photovoltaic device in which a plurality of photovoltaic elements are integrated.

〔従来技術〕[Prior art]

一般に光起電力装置は、透光性絶縁基板に透明
電極、p−i−n接合型、或いはn−i−p接合
型等の非晶質半導体層、裏面電極をこの順序に積
層形成してなる光起電力素子を相互に直列接続し
て構成されるが、従来におけるこの種光起電力装
置の製造方法は第3図イ〜ヘに示す如き工程にて
製造されている。
Generally, a photovoltaic device has a transparent electrode, an amorphous semiconductor layer such as a p-i-n junction type or an n-i-p junction type, and a back electrode laminated in this order on a transparent insulating substrate. The conventional method for manufacturing this type of photovoltaic device is as shown in FIGS. 3A to 3F.

先ず第3図イに示す如くガラス等の透光性絶縁
基板21上に透明電極22を平面的に積層形成
し、この透明電極22を第3図ロに示す如くレー
ザビームにて各光起電力素子を構成すべき領域
(図面では3部分)毎に分断し、透光性絶縁基板
21、透明電極22上にわたつて第3図ハに示す
如くp−i−n接合型、或いはn−i−p接合型
の各半導体層23、例えばアモルフアスシリコン
層を積層形成した後、第3図ニに示す如く相隣す
る透明電極の同側の一端上面が一部露出するよう
に各透明電極22の一端縁上にて同じくレーザビ
ームにて分断し、更にこのアモルフアスシリコン
層及び露出した透明電極22に亘つて第3図ホに
示す如くAl等の裏面電極24を積層形成し、こ
の裏面電極24を第3図ヘに示す如く非晶質半導
体層23の同側の一端側上面が一部露出するよう
にレーザビームにて分断し、相隣する一方の光起
電力素子の裏面電極24と他方の光起電力素子の
透明電極22とを直列接続した光起電力装置を製
造することが行われている(特開昭57−12568
号)。
First, as shown in FIG. 3A, a transparent electrode 22 is formed in a planar manner on a transparent insulating substrate 21 such as glass, and the transparent electrode 22 is exposed to each photovoltaic force using a laser beam as shown in FIG. 3B. The device is divided into regions (three parts in the drawing), and a p-i-n junction type or n-i layer is formed over the transparent insulating substrate 21 and the transparent electrode 22 as shown in FIG. 3C. - After laminating each p-junction type semiconductor layer 23, for example, an amorphous silicon layer, each transparent electrode 23 is stacked so that the upper surface of one end of the adjacent transparent electrode on the same side is partially exposed, as shown in FIG. 3D. A laser beam is also used to separate one end of the layer, and a back electrode 24 made of Al or the like is laminated over this amorphous silicon layer and the exposed transparent electrode 22 as shown in FIG. As shown in FIG. 3, the amorphous semiconductor layer 23 is separated by a laser beam so that the upper surface of one end on the same side is partially exposed, and the back electrode 24 of one of the adjacent photovoltaic elements A photovoltaic device is manufactured in which the transparent electrode 22 of the other photovoltaic device is connected in series (Japanese Patent Laid-Open No. 57-12568).
issue).

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

ところで光起電力装置を上述した如き方法で製
造する場合、各透明電極22、非晶質半導体層2
3、裏面電極24を夫々形成する都度個々に切断
する結果、例えば非晶質半導体層23はその表面
をむき出した状態のままで切断加工されるために
切断に際して飛散するシリコンの溶融粒が非結晶
半導体層表面に付着する外、酸化、水分吸収等に
よつて劣化し易く膜品質低下の大きな要因となる
という問題があつた。
By the way, when manufacturing a photovoltaic device by the method described above, each transparent electrode 22, amorphous semiconductor layer 2
3. As a result of cutting the back electrodes 24 individually each time they are formed, for example, the amorphous semiconductor layer 23 is cut with its surface exposed, so the molten silicon particles scattered during cutting become amorphous. In addition to adhering to the surface of the semiconductor layer, it also easily deteriorates due to oxidation, moisture absorption, etc., and is a major factor in the deterioration of film quality.

〔問題点を解決するための手段〕[Means for solving problems]

本発明はかかる事情に鑑みてなされたものであ
つて、その特徴とするところは、透光性絶縁基板
上に、透明電極、非晶質半導体膜及び裏面電極を
この順序に積層形成して成る複数の光起電力素子
を、一の素子の透明電極と隣接する素子の裏面電
極とを接続電極を介して直列接続させた光起電力
装置の製造方法であつて、基板上に形成された、
上記透明電極、上記非晶質半導体膜及び上記裏面
電極から成る積層体を同時的にレーザビームによ
つて切断し、且つその切断部分に絶縁物を形成す
ることにより、各光起電力素子毎に分割すると共
に、上記切断部分近傍の、上記非晶質半導体膜と
上記裏面電極との積層体を、レーザビームによつ
て切断した後、該切断部を含むように上記裏面電
極上に上記接続電極を形成し、該接続電極を上記
裏面電極と共にレーザビームによつて同時的に切
断することにより、各光起電力素子を直列接続す
る構成としたことにある。
The present invention has been made in view of the above circumstances, and is characterized in that a transparent electrode, an amorphous semiconductor film, and a back electrode are laminated in this order on a transparent insulating substrate. A method for manufacturing a photovoltaic device in which a plurality of photovoltaic devices are connected in series between a transparent electrode of one device and a back electrode of an adjacent device via a connecting electrode, the method comprising:
By simultaneously cutting the laminate consisting of the transparent electrode, the amorphous semiconductor film, and the back electrode with a laser beam, and forming an insulator on the cut portion, each photovoltaic element is At the same time, after cutting the laminate of the amorphous semiconductor film and the back electrode near the cut portion with a laser beam, the connecting electrode is placed on the back electrode so as to include the cut portion. The photovoltaic elements are connected in series by forming the connection electrode and cutting the connection electrode together with the back electrode simultaneously with a laser beam.

〔実施例〕〔Example〕

以下本発明をその実施例を示す図面に基づき具
体的に説明する。第1図は本発明方法にて製造し
た光起電力装置の断面構造図であり、図中1はガ
ラス等にて形成された透光性絶縁基板、2は
SnO2,ITO/SnO2等にて構成された透明電極、
3はアモルフアスシリコン等にて構成されたp−
i−n接合型又はn−i−n接合型の非晶質半導
体層、4はAl、Ti又はAg等にて構成された裏面
電極、5はレジスト等にて構成された絶縁物、6
はAl,Ti又はAg等にて構成された接続電極を示
している。各光起電力素子は透光性絶縁基板1上
に絶縁物5にて区画された状態で前記した各透明
電極2、非晶質半導体層3、裏面電極4をこの順
序に積層して構成されており、これら各光起電力
素子A,B,C…夫々の裏面電極4上に接続電極
6を積層形成すると共に、この接続電極6を各相
隣する片側の光起電力素子A,B,C…における
透明電極2と接続せしめて、各光起電力素子A,
B,C…を直列接続した集積型の光起電力装置と
して構成してある。このような光起電力装置にあ
つては光を透光性絶縁基板1を通して非晶質半導
体層3内に導入し、ここで生成せしめられた光起
電力を各光起電力素子A,B,Cの透明電極2、
裏面電極及び接続電極6にて集電され、透明電極
2、接続電極6に接続した図示しない引出線を通
じて外部に取り出されるようになつている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be specifically described below based on drawings showing embodiments thereof. FIG. 1 is a cross-sectional structural diagram of a photovoltaic device manufactured by the method of the present invention, in which 1 is a transparent insulating substrate made of glass or the like, and 2 is a transparent insulating substrate made of glass or the like;
Transparent electrodes made of SnO 2 , ITO/SnO 2 , etc.
3 is a p- made of amorphous silicon or the like.
an amorphous semiconductor layer of i-n junction type or n-i-n junction type; 4 is a back electrode made of Al, Ti, Ag, etc.; 5 is an insulator made of resist, etc.; 6
indicates a connection electrode made of Al, Ti, Ag, etc. Each photovoltaic element is constructed by stacking the transparent electrodes 2, amorphous semiconductor layer 3, and back electrode 4 in this order on a transparent insulating substrate 1, separated by an insulator 5. A connecting electrode 6 is laminated on the back electrode 4 of each of these photovoltaic elements A, B, C..., and this connecting electrode 6 is connected to each adjacent photovoltaic element A, B, C, etc. on one side. Each photovoltaic element A, is connected to the transparent electrode 2 in C...
It is configured as an integrated photovoltaic device in which B, C, . . . are connected in series. In such a photovoltaic device, light is introduced into the amorphous semiconductor layer 3 through the transparent insulating substrate 1, and the photovoltaic force generated here is transferred to each of the photovoltaic elements A, B, C transparent electrode 2,
The current is collected by the back electrode and the connection electrode 6, and taken out to the outside through a leader wire (not shown) connected to the transparent electrode 2 and the connection electrode 6.

次に上記した如き本発明装置の製造過程につい
て第2図イ〜ニに基づき説明する。第2図イ〜ニ
は上述した如き、本発明装置の製造過程を示す説
明図であり、先ず第2図イに示す如く、透光性絶
縁基板1上に透明電極2、p−i−n接合型又は
n−i−p接合型の非晶質半導体層3、裏面電極
4からなる積層体をこの順序で夫々所要厚さに積
層形成した後、各光起電力素子A,B,C…を構
成する領域毎に透明電極2、非晶質半導体層3、
裏面電極4に対し、同時的にレーザスクライブを
施す。使用レーザはQスイツチ付のYAGレーザ
であつてレーザパワー密度5×108w/cm2、その
出力波長は1.06μm、繰り返しパルス数3KHz程度
とするのが適切である。レーザービームの投射は
通常は裏面電極4側から行うが、透光性絶縁基板
5側から行つてもよい。
Next, the manufacturing process of the apparatus of the present invention as described above will be explained based on FIGS. 2A to 2D. FIGS. 2A to 2D are explanatory diagrams showing the manufacturing process of the device of the present invention as described above. First, as shown in FIG. After laminating a laminate consisting of a junction type or n-i-p junction type amorphous semiconductor layer 3 and a back electrode 4 in this order to a desired thickness, each photovoltaic element A, B, C... A transparent electrode 2, an amorphous semiconductor layer 3,
The back electrode 4 is simultaneously laser scribed. The laser used is a YAG laser equipped with a Q switch, with a laser power density of 5×10 8 W/cm 2 , an output wavelength of 1.06 μm, and a pulse repetition rate of approximately 3 KHz. Although the laser beam is normally projected from the back electrode 4 side, it may also be projected from the transparent insulating substrate 5 side.

次に第2図ロに示す如く切断によつて形成され
た溝内に絶縁物5を形成する。先ずレジストを裏
面電極4の全面に薄く塗布し透光性絶縁基板1側
から露光させたあと、レジストを溶剤にて溶解除
去する。
Next, as shown in FIG. 2B, an insulator 5 is formed in the groove formed by cutting. First, a resist is applied thinly to the entire surface of the back electrode 4, exposed to light from the transparent insulating substrate 1 side, and then the resist is dissolved and removed using a solvent.

使用レジストについては特に限定するものでは
なく、従来知られたものを適宜採択すればよい。
There are no particular limitations on the resist used, and any conventionally known resist may be adopted as appropriate.

次いで第2図ハに示す如く、各絶縁物5と僅か
に間隔を隔ててその片側にて裏面電極4側から裏
面電極4及び非晶質半導体層3に対して同時的に
レーザスクライブする。この際透明電極2を損傷
しないようレーザパワー密度は2×108w/cm2
5×108w/cm2程度とする。
Next, as shown in FIG. 2C, the back electrode 4 and the amorphous semiconductor layer 3 are simultaneously laser scribed from the back electrode 4 side on one side of each insulator 5 with a slight distance therebetween. At this time, the laser power density was set at 2×10 8 W/cm 2 to 2×10 8 W/cm 2 to avoid damaging the transparent electrode 2.
It should be about 5×10 8 w/cm 2 .

次いで第2図ニに示す如く裏面電極4及びレー
ザスクライブされ、露出せしめられた透明電極2
にわたるよう接続電極6を形成すると共に、前記
レーザスクライブ位置と若干の間隔を隔てて、破
線で示す如くレーザビームを投射し、接続電極
6、裏面電極4にレーザスクライブを施す。この
場合のレーザパワー密度は透明電極2を損傷しな
いよう2×108w/cm2以下が望ましい。而して第
1図に示す如く相互に複数の光起電力素子A,
B,C…を直列接続した光起電力装置が得られる
こととなる。
Next, as shown in FIG. 2D, the back electrode 4 and the exposed transparent electrode 2 are laser scribed.
The connection electrode 6 is formed so as to span the area, and the connection electrode 6 and the back electrode 4 are laser scribed by projecting a laser beam as shown by the broken line at a slight distance from the laser scribe position. In this case, the laser power density is preferably 2×10 8 W/cm 2 or less so as not to damage the transparent electrode 2. As shown in FIG. 1, a plurality of photovoltaic elements A,
A photovoltaic device in which B, C, . . . are connected in series is obtained.

〔効果〕〔effect〕

以上の如く本発明方法にあつては、透光性絶縁
基板上に透明電極、非晶質半導体層、裏面電極を
この順序で積層形成した後、これらを同時的に切
断することとしているから、切断加工作業が容易
であることは勿論、非晶質半導体層表面に裏面電
極を積層した状態で切断を行うため、例えばレー
ザスクライブ等に際しての非晶質半導体層構成材
料の飛散粒子付着による膜質の低下、或いは酸
化、水分の吸収を防止出来て膜品質の大幅な向上
を図れるなど本発明は優れた効果を奏するもので
ある。
As described above, in the method of the present invention, after forming a transparent electrode, an amorphous semiconductor layer, and a back electrode in this order on a transparent insulating substrate, they are simultaneously cut. Not only is the cutting process easy, but since the cutting is performed with the back electrode laminated on the surface of the amorphous semiconductor layer, there is a possibility that the film quality may deteriorate due to the adhesion of scattered particles of the material constituting the amorphous semiconductor layer during laser scribing, etc. The present invention has excellent effects such as being able to significantly improve film quality by preventing deterioration, oxidation, and moisture absorption.

加えて、本発明は光起電力素子間を直列接続す
るための接続電極を各光起電力素子毎に分割する
に際して、その接続電極と、その下地となる裏面
電極とを同時的にレーザビームにて切断すること
から、斯る工程における作業も容易に行い得ると
共に、その切断を確実に行うことが可能となる。
In addition, in the present invention, when dividing a connecting electrode for serially connecting photovoltaic elements to each photovoltaic element, the connecting electrode and the underlying back electrode are simultaneously exposed to a laser beam. Since the cutting is carried out by the operator, the work in this process can be easily carried out, and the cutting can be carried out reliably.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明方法によつて得た光起電力装置
の断面構造図、第2図はイ〜ニは本発明方法の工
程を示す模式図、第3図イ〜ヘは従来方法の工程
を示す模式図である。 1……透光性絶縁基板、2……透明電極、3…
…非晶質半導体層、4……裏面電極、5……絶縁
物、6……接続電極。
FIG. 1 is a cross-sectional structural diagram of a photovoltaic device obtained by the method of the present invention, FIG. 2 is a schematic diagram showing steps A to D of the method of the present invention, and FIG. FIG. 1... Translucent insulating substrate, 2... Transparent electrode, 3...
...Amorphous semiconductor layer, 4... Back electrode, 5... Insulator, 6... Connection electrode.

Claims (1)

【特許請求の範囲】 1 透光性絶縁基板上に、透明電極、非晶質半導
体膜及び裏面電極をこの順序に積層形成して成る
複数の光起電力素子を、一の素子の透明電極と隣
接する素子の裏面電極とを接続電極を介して直列
接続させた光起電力装置の製造方法であつて、 基板上に形成された、上記透明電極、上記非晶
質半導体膜及び上記裏面電極から成る積層体を同
時的にレーザビームによつて切断し、且つその切
断部分に絶縁物を形成することにより、各光起電
力素子毎に分割すると共に、上記切断部分近傍
の、上記非晶質半導体膜と上記裏面電極との積層
体を、レーザビームによつて切断した後、該切断
部を含むように上記裏面電極上に上記接続電極を
形成し、該接続電極を上記裏面電極と共にレーザ
ビームによつて同時的に切断することにより、各
光起電力素子を直列接続することを特徴とする光
起電力装置の製造方法。
[Claims] 1. A plurality of photovoltaic elements formed by laminating a transparent electrode, an amorphous semiconductor film, and a back electrode in this order on a transparent insulating substrate are combined with the transparent electrode of one element. A method for manufacturing a photovoltaic device in which back electrodes of adjacent elements are connected in series via a connecting electrode, the method comprising: the transparent electrode, the amorphous semiconductor film, and the back electrode formed on a substrate; By simultaneously cutting the laminated body consisting of a laser beam and forming an insulator on the cut portion, it is divided into each photovoltaic element, and the amorphous semiconductor near the cut portion is After cutting the laminate of the film and the back electrode with a laser beam, the connection electrode is formed on the back electrode so as to include the cut portion, and the connection electrode and the back electrode are exposed to the laser beam. A method for manufacturing a photovoltaic device, characterized in that each photovoltaic element is connected in series by cutting the photovoltaic elements simultaneously.
JP60225885A 1985-10-08 1985-10-08 Method of manufacturing photovoltaic device Granted JPS6284569A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60225885A JPS6284569A (en) 1985-10-08 1985-10-08 Method of manufacturing photovoltaic device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60225885A JPS6284569A (en) 1985-10-08 1985-10-08 Method of manufacturing photovoltaic device

Publications (2)

Publication Number Publication Date
JPS6284569A JPS6284569A (en) 1987-04-18
JPH0582993B2 true JPH0582993B2 (en) 1993-11-24

Family

ID=16836388

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60225885A Granted JPS6284569A (en) 1985-10-08 1985-10-08 Method of manufacturing photovoltaic device

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Families Citing this family (9)

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Publication number Priority date Publication date Assignee Title
CA2024662A1 (en) * 1989-09-08 1991-03-09 Robert Oswald Monolithic series and parallel connected photovoltaic module
JP3035565B2 (en) * 1991-12-27 2000-04-24 株式会社半導体エネルギー研究所 Fabrication method of thin film solar cell
WO2000007249A1 (en) * 1998-07-27 2000-02-10 Citizen Watch Co., Ltd. Solar cell and method of producing the same, and mask for photolithography for producing solar cell
US20070079866A1 (en) * 2005-10-07 2007-04-12 Applied Materials, Inc. System and method for making an improved thin film solar cell interconnect
JP2008034744A (en) * 2006-07-31 2008-02-14 Sanyo Electric Co Ltd Solar cell module
US8716591B2 (en) 2007-06-20 2014-05-06 Ascent Solar Technologies, Inc. Array of monolithically integrated thin film photovoltaic cells and associated methods
CN102272938B (en) * 2009-01-29 2013-10-09 京瓷株式会社 Photoelectric conversion cell, photoelectric conversion module, and method for manufacturing photoelectric conversion cell
US20110303272A1 (en) * 2010-06-09 2011-12-15 Semiconductor Energy Laboratory Co., Ltd. Photoelectric Conversion Device and Manufacturing Method Thereof
TWI453932B (en) * 2010-07-06 2014-09-21 Solarbase Group Inc Photovoltaic module and method of manufacturing photovoltaic module having electrode diffusion layer

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