JPH058599B2 - - Google Patents
Info
- Publication number
- JPH058599B2 JPH058599B2 JP59219189A JP21918984A JPH058599B2 JP H058599 B2 JPH058599 B2 JP H058599B2 JP 59219189 A JP59219189 A JP 59219189A JP 21918984 A JP21918984 A JP 21918984A JP H058599 B2 JPH058599 B2 JP H058599B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- conductive
- film
- conductive circuit
- printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/067—Etchants
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Printing Methods (AREA)
Description
【発明の詳細な説明】
<産業上の利用分野>
本発明は、導電性回路を有する基板を連続的に
巻き取りながら製造する方法に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a method of manufacturing a substrate having a conductive circuit while continuously winding the substrate.
導電性回路を有する基板は、液晶表示体、エレ
クトロクロミツク表示体、電子写真記録体、電気
泳動記録体、透明スイツチ、コネクター、フレキ
シブルサーキツト、帯電防止体、面状発熱体、太
陽電池、導電体等の材料として、電気・電子工業
分野をはじめ各産業分野において広く利用されて
いる。 Substrates with conductive circuits include liquid crystal displays, electrochromic displays, electrophotographic recording bodies, electrophoretic recording bodies, transparent switches, connectors, flexible circuits, antistatic bodies, planar heating elements, solar cells, and conductive It is widely used as a material for bodies, etc. in various industrial fields, including the electrical and electronic industries.
<従来技術>
従来、かかる導電性回路を有する基板の製造法
としては、次のような方法が知られている。即
ち、金、銀、銅、錫、ニツケル、パラジウム等の
金属皮膜、或いは酸化錫、酸化インジウム、酸化
アンチモン等の金属酸化物皮膜を、真空蒸着法、
スパツタリング法もしくは印刷法によりガラス基
板、プラスチツク基板等の基板上全面に形成した
後、所定の必要な導電性回路部分に、フオトレジ
スト法やスクリーン印刷法によりマスキング層を
形成し、次いで湿式或いは乾式のエツチング法に
より不要な金属皮膜部分、或いは金属酸化物皮膜
部分を除去した後、更に前記マスキング層を除去
することによつて所望の導電性回路を有する基板
を製造する方法がある。<Prior Art> Conventionally, the following method is known as a method for manufacturing a substrate having such a conductive circuit. That is, metal films such as gold, silver, copper, tin, nickel, and palladium, or metal oxide films such as tin oxide, indium oxide, and antimony oxide are deposited by vacuum evaporation,
After forming it on the entire surface of a substrate such as a glass substrate or a plastic substrate by sputtering method or printing method, a masking layer is formed on the required conductive circuit portion by photoresist method or screen printing method, and then wet or dry method is used. There is a method of manufacturing a substrate having a desired conductive circuit by removing unnecessary metal film portions or metal oxide film portions by etching and then removing the masking layer.
しかし、前記した方法は、マスキング層の形成
工程、エツチング工程、マスキング層の除去工程
等多くの工程が必要であり、作業性が極めて悪い
ものであつた。 However, the above-described method requires many steps such as a masking layer formation step, an etching step, and a masking layer removal step, and has extremely poor workability.
前記した方法の問題点を解決する方法として、
特開昭56−13789号公報や特開昭58−113376号公
報等に開示された方法が提案されている。この方
法は何れも、基板上に設けられた導電膜上に、腐
食によつて除去すべき所定の範囲に前記導電膜の
腐食剤を含有するインキを印刷し、前記導電膜の
不要な部分を腐食した後、前記腐食剤を含有する
インキ部分を除去することによつて所望の導電性
回路を有する基板を製造する方法である。 As a method to solve the problems of the above-mentioned method,
Methods disclosed in JP-A-56-13789 and JP-A-58-113376 have been proposed. In both of these methods, ink containing a corrosive agent for the conductive film is printed on a conductive film provided on a substrate in a predetermined area to be removed by corrosion, and unnecessary parts of the conductive film are removed. This is a method of manufacturing a substrate having a desired conductive circuit by removing the ink portion containing the corrosive after corrosion.
この方法によると、マスキング層の形成工程、
マスキング層の除去工程が不必要になるという生
産上、作業工程が減少するという点で大きな効果
を有するものであつた。 According to this method, the step of forming a masking layer,
This has a great effect in that the process of removing the masking layer is no longer necessary, which reduces the number of work steps in production.
<本発明の解決しようとする問題点>
しかしながら、この方法は、作業工程が減少す
る点では良好な効果を有するものであるものの、
連続的な大量生産には極めて不適当なものであつ
た。何故なら、前記した方法は何れも、使用する
腐食剤が常温で液状のものであるため、腐食剤を
含有するインキを印刷した後、そのまま状態、即
ち、導電膜上に印刷したインキを他と接触させる
ことのない状態で、次工程であるエツチング工
程、不要物の除去工程に移らねばならず、従つて
基板を連続的に巻き取りながら印刷を行うという
ことができないからである。<Problems to be Solved by the Present Invention> However, although this method has a good effect in terms of reducing the number of work steps,
It was extremely unsuitable for continuous mass production. This is because in all of the above methods, the corrosive agent used is liquid at room temperature, so after printing the ink containing the corrosive agent, the ink printed on the conductive film is left as is, i.e., the ink printed on the conductive film is used as is. This is because it is necessary to proceed to the next step, an etching step and an unnecessary matter removal step, without contact, and therefore it is not possible to print while continuously winding up the substrate.
<本発明の目的>
本発明の目的とするところは、従来の種々の方
法が有する問題点を全て解決するととをに、特に
連続生産に適した導電性回路を有する基板の連続
製造法を提供することにある。<Object of the present invention> An object of the present invention is to provide a continuous manufacturing method for substrates having conductive circuits particularly suitable for continuous production, in order to solve all the problems of various conventional methods. It's about doing.
<問題を解決しようとする技術手段>
本発明者らは、前記従来技術が有する諸問題点
を解消すべく、永年にわたり各種の原料関係の条
件、処理条件及び作業手順等の研究・実験を重
ね、鋭意努力を傾注してきた結果、遂に新しい刮
目すべき方法として本発明を完成するに至つたの
である。即ち、本発明者らは、共存材料の存在下
において50℃〜300℃の加熱により酸性ガスもし
くは霧状の酸性ガスを発生する固体腐食剤を含有
するインキを用いて長尺の基板上に設けられた導
電膜上に所定の図柄を印刷した後乾燥しその後50
℃〜300℃に加熱してエツチング反応を行わすこ
とにより腐食作用を完了させ次いで印刷図柄部分
を洗浄除去して導電性回路を形成し、かつ印刷乾
燥以後の工程で基板を連続的に巻き取ることを特
徴とする導電性回路を有する基板の連続製造法を
発明したのである。<Technical Means for Solving the Problems> The present inventors have repeatedly conducted research and experiments on various raw material-related conditions, processing conditions, work procedures, etc. for many years in order to solve the problems of the above-mentioned conventional techniques. As a result of their dedicated efforts, they have finally completed the present invention as a new and remarkable method. That is, the present inventors used an ink containing a solid corrosive agent that generates acidic gas or atomized acidic gas when heated at 50°C to 300°C in the presence of coexisting materials to coat a long substrate. After printing a predetermined pattern on the conductive film, it is dried and then
The corrosive effect is completed by heating to ℃~300℃ to perform an etching reaction, and then the printed pattern part is washed and removed to form a conductive circuit, and the substrate is continuously rolled up in the process after printing and drying. He invented a continuous manufacturing method for substrates having conductive circuits, which is characterized by the following.
以下、本発明を詳細に説明する。 The present invention will be explained in detail below.
本発明に係る共存材料の存在下において50℃〜
300℃の加熱により発生する酸性ガスとは、実質
的に水分を含まない比較的純粋なガス(ドライガ
ス)もしくはこれと有機化合物ガスとの混合物
(ミツクスドガス)であり、更に霧状の酸性ガス
とは、上記酸性ガスの他に水、鉱酸、弗化水素、
有機酸もしくは有機酸無水物の微細なる液滴が混
じつた比較的拡散性に乏しい、つまり重質的な気
液混合物(ウエツトガス)である。 50℃ ~ in the presence of coexisting materials according to the present invention
The acidic gas generated by heating to 300°C is a relatively pure gas that does not substantially contain water (dry gas) or a mixture of this and an organic compound gas (mixed gas). In addition to the above acidic gases, water, mineral acids, hydrogen fluoride,
It is a heavy gas-liquid mixture (wet gas) with relatively poor diffusivity, in which fine droplets of organic acids or organic acid anhydrides are mixed.
このようなガスを発生する固体腐食剤として
は、酸性硫酸塩、酸性弗化水素酸塩、酸性燐酸
塩、アミノ基含有化合物鉱酸塩、弗化ホウ素錯
塩、アミノ基含有化合物ホウ弗化水素酸塩、アミ
ノ基含有化合物ケイ弗化水素酸塩等の単独もしく
は二種以上の混合物がある。その含有量は限定さ
れるものではないが、通常インキの5〜30重量%
である。 Solid corrosives that generate such gases include acidic sulfates, acidic hydrofluorides, acidic phosphates, mineral acid salts of amino group-containing compounds, boron fluoride complex salts, and boroborohydrofluoric acid compounds that contain amino groups. Salts, amino group-containing compounds, hydrofluoric acid salts, etc. may be used alone or in mixtures of two or more. Although its content is not limited, it is usually 5 to 30% by weight of the ink.
It is.
本発明に係るインキは、上記固体腐食剤単独で
も使用可能なものもあるが、実際的には上記固体
腐食剤の共存材料としてバインダーを含むものが
用いられる。共存材料としては、水溶性のものと
して、デキストリン、ポリビニルアルコール、ヒ
ドロキシセルロース、ポリアクリルアミド、ポリ
アクリル酸等のごとき活性水素を含有する化合物
があり、また有機溶剤可溶性のものとして、ポリ
スチレン、ポリ酢酸ビニル、ポリ塩化ビニル、ア
クリレート樹脂、メタクリレート樹脂、可溶性フ
エノール樹脂、可溶性尿素樹脂、可溶性メラミン
樹脂等のごとき化合物がある。この共存材料の含
有量は限定されるものではないが、通常インキの
20〜50重量%である。 Although some inks according to the present invention can be used with the above-mentioned solid corrosive agent alone, in reality, an ink containing a binder as a coexisting material with the above-mentioned solid corrosive agent is used. Coexisting materials include water-soluble compounds containing active hydrogen such as dextrin, polyvinyl alcohol, hydroxycellulose, polyacrylamide, and polyacrylic acid, and organic solvent-soluble materials such as polystyrene and polyvinyl acetate. , polyvinyl chloride, acrylate resins, methacrylate resins, soluble phenolic resins, soluble urea resins, soluble melamine resins, and the like. Although the content of this coexisting material is not limited, it is usually
20-50% by weight.
また、本発明に係るインキは、前記バインダー
の他に反応促進剤を含むものであつてもよい。こ
の反応促進剤とは、固体腐食剤と共存材料の混合
系にガス発生の反応を促進するために加えられる
触媒的あるいは助触媒的性能を有する第三物質
で、例えば、無水マレイン酸、無水コハク酸、ア
ジピン酸、ゼバチン酸、アゼライン酸、安息香
酸、核置換安息香酸、ナフタリンカルボン酸、無
水トリメリツト酸、無水イタコン酸、無水フター
ル酸、イソフタール酸、テレフタール酸、無水ノ
ルボルネンジカルボン酸、フミン酸、タンニン酸
等のごとき、融点が50℃以上である有機酸もしく
は有機酸無水物をさす。その添加量は限定される
ものではないが、通常固体腐食剤の10重量%以下
にすることが好ましい。 Further, the ink according to the present invention may contain a reaction accelerator in addition to the binder. This reaction accelerator is a third substance with catalytic or cocatalytic performance that is added to the mixed system of solid corrosive and coexisting materials to promote the gas generation reaction.For example, maleic anhydride, succinic anhydride, Acid, adipic acid, zebacic acid, azelaic acid, benzoic acid, nuclear-substituted benzoic acid, naphthalenecarboxylic acid, trimellitic anhydride, itaconic anhydride, phthalic anhydride, isophthalic acid, terephthalic acid, norbornene dicarboxylic anhydride, humic acid, tannin Refers to organic acids or organic acid anhydrides with a melting point of 50°C or higher, such as acids. The amount added is not limited, but it is usually preferably 10% by weight or less of the solid corrosive.
本発明においては、先ず前記したインキを用い
て基板上に設けられた導電膜上に所定の図柄を印
刷し乾燥する。 In the present invention, first, a predetermined pattern is printed on a conductive film provided on a substrate using the above-mentioned ink and then dried.
本発明に係る印刷方法としては、スクリーン印
刷法、グラビア印刷法、フレキソ印刷法、オフセ
ツト印刷法、凸版印刷法等がある。 Printing methods according to the present invention include screen printing, gravure printing, flexographic printing, offset printing, letterpress printing, and the like.
本発明においてまた重要なことは、上記印刷法
として、基板上に形成した導電膜を腐食するため
に使用する腐食剤が50℃未満の温度において安定
な固体であるため、50℃未満の温度特に好ましく
は5〜40℃において一旦乾燥した後、巻き取るこ
とが可能であり、このため連続巻き取り式のスク
リーン印刷法あるいは連続巻き取り式のグラビア
印刷法を適用できるという長所がある。 What is also important in the present invention is that in the above printing method, the corrosive agent used to corrode the conductive film formed on the substrate is a solid that is stable at temperatures below 50°C. Preferably, it can be dried once at 5 to 40° C. and then rolled up, and therefore has the advantage that a continuous winding screen printing method or a continuous winding type gravure printing method can be applied.
本発明に係る基板としては、従来、この種の基
板に用いられているものなら何でも使用可能であ
るが、本発明においては特に各種プラスチツクス
フイルムが好適であり、例えばポリエステルフイ
ルム、ナイロンフイルム、ポリサルフオンフイル
ム、ポリエステルサルフオンフイルム等が印刷上
好ましい。 As the substrate according to the present invention, any substrate conventionally used for this type of substrate can be used, but various plastic films are particularly suitable for the present invention, such as polyester film, nylon film, and polyester film. Sulfon film, polyester sulfon film, etc. are preferable for printing.
本発明に係る導電膜としては、金、銀、銅、
錫、ニツケル、パラジウム等の金属皮膜があり、
また酸化錫、酸化インジウム、酸化アンチモン、
酸化亜鉛、酸化カドミウム、或いは酸化インジウ
ム−酸化錫、酸化錫−酸化アンチモン等の遷移金
属酸化物系皮膜があるが、エツチング加工性、経
済性等を考慮すると、銅、ニツケル、酸化インジ
ウム、酸化錫系のものが最も好ましい。これら導
電膜の厚さは10Å〜3000Å、抵抗値は電気回路の
用途によつて1Ω□〜104Ω/□であるが、特に
好ましくは10Ω/□〜2000Ω/がよい。 The conductive film according to the present invention includes gold, silver, copper,
There are metal coatings such as tin, nickel, and palladium.
Also tin oxide, indium oxide, antimony oxide,
There are transition metal oxide films such as zinc oxide, cadmium oxide, indium oxide-tin oxide, and tin oxide-antimony oxide, but considering etching processability and economical efficiency, copper, nickel, indium oxide, and tin oxide are preferable. type is most preferred. The thickness of these conductive films is 10 Å to 3000 Å, and the resistance value is 1 Ω□ to 10 4 Ω/□ depending on the use of the electric circuit, and particularly preferably 10 Ω/□ to 2000 Ω/.
次いで、前記基板を50℃〜300℃に加熱してエ
ツチング反応を行わすことにより腐食作用を完了
させる。 The etching reaction is then completed by heating the substrate to 50°C to 300°C.
本発明にいう加熱とは50℃〜300℃、特に好ま
しくは70℃〜150℃において所期の目的が達せら
れるように材料が工夫されており、その方法とし
ては、熱風循環炉、遠赤ヒータートンネル炉等を
使用する方法がある。加熱条件の一例を示すと、
80℃〜120℃で30秒〜1分と位う程度の腐食処理
が実際上好ましいものとして設定される。 Heating in the present invention means that the material is devised so that the desired purpose can be achieved at a temperature of 50°C to 300°C, particularly preferably 70°C to 150°C. There is a method using a tunnel furnace etc. An example of heating conditions is:
Corrosion treatment for 30 seconds to 1 minute at 80° C. to 120° C. is set as practically preferable.
本発明にいうエツチング反応とは図柄を印刷し
乾燥した後一旦巻き取るか或いは巻き取ることな
く導電膜の図柄部分が前記した固体腐食剤と接触
して適当な温度、つまり50℃〜300℃、特に好ま
しくは70℃〜150℃において酸性塩、酸性酸化物、
可溶性化合物、剥離性物質、粉末状物質等に乾式
状態において基板上で化学変化する現象を云い、
また腐食作用とはエツチング反応の結果、所要部
分が明らかに腐食されて処理前とは異なつた形態
上の変化とか外観上の変化をもたらす作用を云う
のである。 The etching reaction referred to in the present invention refers to an etching reaction in which a pattern is printed and dried, and then the pattern portion of the conductive film is brought into contact with the solid corrosive agent described above, either by winding it up once or without winding it up, at an appropriate temperature, that is, from 50°C to 300°C. Particularly preferably at 70°C to 150°C, acidic salts, acidic oxides,
A phenomenon in which soluble compounds, releasable substances, powdered substances, etc. undergo chemical changes on a substrate in a dry state.
Furthermore, the term "corrosion action" refers to an action in which, as a result of an etching reaction, a required portion is obviously corroded, resulting in a change in form or appearance that differs from that before treatment.
次いで、前記印刷図柄部分を洗浄除去する。 Next, the printed pattern portion is washed and removed.
本発明に係る洗浄除去方法としては、水或いは
極性溶剤によるシヤワー洗浄、浴槽中での洗浄、
超音波洗浄、マイクロ波洗浄等の方法が採用され
ている。 The cleaning removal method according to the present invention includes shower cleaning with water or a polar solvent, cleaning in a bathtub,
Methods such as ultrasonic cleaning and microwave cleaning are employed.
本発明者らは上記した本発明に係る導電性回路
を有する基板の製造法に関して多数の実験を行
い、本発明の優秀性を確認したものであるが、更
に本発明の技術的内容を説明するため、以下代表
的な例を実施例として示す。本発明の方法は、単
に以下に示された実施例のみに限定して解釈され
るべきではなく、任意にその実施態様を適宜に実
施し得ることは当然である。 The present inventors conducted a number of experiments regarding the method for manufacturing a substrate having a conductive circuit according to the present invention described above, and confirmed the superiority of the present invention.However, the technical content of the present invention will be further explained. Therefore, typical examples are shown below as examples. It goes without saying that the method of the present invention should not be construed as being limited only to the examples shown below, and that the embodiments thereof can be carried out as appropriate.
実施例 1
市販のポリエステル連続巻き取りフイルムに、
酸化インジウム:酸化錫=90:10の組成のインジ
ウム・錫酸化物をスパツタリング法により付着さ
せた。スパツタリングは真空度10-4torrにてアル
ゴンガス導入のもとに行い、付着膜厚は約100Å
であつた。次に、ポリアクリルアミド20重量部に
対し硫酸水素ナトリウム5重量部、ケイ酸アルミ
ニウム25重量部を調合し、連続シルクスクリーン
印刷法に適するインキを作つた。このインキを用
いて上記フイルムに線幅5.0mm、線間10mm、即ち
15.0mmピツチの長さ100mmの細線を10本、連続巻
き取り式のスクリーン印刷機により印刷、巻取り
を行い、その後、印刷したフイルムを熱風循環炉
で80℃で30秒間加熱処理を行つた。インキの乾燥
と同時にエツチング反応が行われ、腐食作用は完
了した。Example 1 A commercially available continuous polyester film was
Indium/tin oxide having a composition of indium oxide: tin oxide = 90:10 was deposited by a sputtering method. Sputtering was performed at a vacuum level of 10 -4 torr with argon gas introduced, and the deposited film thickness was approximately 100 Å.
It was hot. Next, 5 parts by weight of sodium hydrogen sulfate and 25 parts by weight of aluminum silicate were mixed with 20 parts by weight of polyacrylamide to prepare an ink suitable for continuous silk screen printing. Using this ink, the line width is 5.0 mm, the line spacing is 10 mm, i.e.
Ten thin lines with a length of 100 mm and a pitch of 15.0 mm were printed and wound using a continuous winding screen printing machine, and then the printed film was heat-treated at 80°C for 30 seconds in a hot air circulation oven. The etching reaction took place simultaneously with the drying of the ink, and the corrosive action was completed.
次いで前記フイルムを水洗し、インキ部分を完
全に除去した後乾燥した。各細線においては両端
間の表面抵抗が500Ω/□であり、また各細線間
は完全に絶縁されていた。 Next, the film was washed with water to completely remove the ink portion, and then dried. The surface resistance between both ends of each thin wire was 500Ω/□, and each thin wire was completely insulated.
実施例 2
市販のポリエステルサルフオンフイルムに銅を
蒸着法によつて厚み1000Åとなるように付着さ
せ、銅薄膜付フイルムを作つた。次に、グルコー
ス20重量部、ポリビニルアルコール20重量部、燐
酸水素ナトリウム8重量部、ケイ酸アルミニウム
12重量部、アルキルベンゼンスルホン酸8重量部
およびベントナイト8重量部からなるインキを調
整した。Example 2 Copper was deposited on a commercially available polyester sulfon film to a thickness of 1000 Å by vapor deposition to produce a film with a copper thin film. Next, 20 parts by weight of glucose, 20 parts by weight of polyvinyl alcohol, 8 parts by weight of sodium hydrogen phosphate, and aluminum silicate.
An ink consisting of 12 parts by weight, 8 parts by weight of alkylbenzenesulfonic acid, and 8 parts by weight of bentonite was prepared.
このインキを用いて、上記銅薄膜付フイルムに
線幅1.27mm、線間1.27mm、即ち2.54mmピツチの長
さ50mmの細線50本を、連続巻き取り式のスクリー
ン印刷機によつて印刷、巻き取りを行い、その後
アーチ式の遠赤ヒータートンネル炉を使用して
120℃、20秒間加熱処理を行つて、銅のエツチン
グ反応を起こさせて腐食作用を完了させ、続いて
前記フイルムを水洗し、インキを完全に除去した
後乾燥したところ、所定の銅の細線パターンが得
られた。 Using this ink, 50 fine lines with a line width of 1.27 mm and a line spacing of 1.27 mm, that is, a pitch of 2.54 mm and a length of 50 mm, were printed and rolled on the copper thin film coated film using a continuous winding screen printing machine. After that, using an arch-type far-infrared heater tunnel furnace,
Heat treatment was performed at 120°C for 20 seconds to cause an etching reaction of the copper to complete the corrosion action, and then the film was washed with water to completely remove the ink and dried, resulting in a predetermined fine copper line pattern. was gotten.
実施例 3
膜厚200Åのインジウム−錫酸化物薄膜付ポリ
エステルフイルムにメタクリル樹脂100重量部、
テトラフルオロホウ酸アルミニウム30重量部、ケ
イ酸アルミニウム20重量部、エチルアルコール−
水混合溶剤200重量部、無水マレイン酸1重量部
からなるインキを連続巻き取り式のグラビア印刷
機を用いて印刷した。続いて巻き取つたポリエス
テルフイルムをアーチ式の遠赤ヒータートンネル
炉を使用して90℃で1分間加熱処理を行つた後、
インキを完全に除去したところ所望のインジウム
−錫酸化物からなる導電性回路が得られた。Example 3 100 parts by weight of methacrylic resin was added to a polyester film with a 200 Å thick indium-tin oxide thin film.
30 parts by weight of aluminum tetrafluoroborate, 20 parts by weight of aluminum silicate, ethyl alcohol
Printing was carried out using an ink consisting of 200 parts by weight of a water mixed solvent and 1 part by weight of maleic anhydride using a continuous winding type gravure printing machine. Next, the rolled polyester film was heat-treated at 90℃ for 1 minute using an arch-type far-infrared heater tunnel furnace.
When the ink was completely removed, the desired conductive circuit made of indium-tin oxide was obtained.
<発明の効果>
本発明は、以上のような構成からなるものであ
るから次のような効果を有するものである。即
ち、基板上に形成された導電膜を腐食するために
使用する腐食剤は、常温で固体形状を呈するもの
であるから、この腐食剤を含有してなるインキを
用いて所定の図柄を印刷した後、連続的に巻き取
ることができるものであり、従つて印刷法として
連続巻き取り式の印刷法を適用することが可能な
ものであるから、連続的な大量生産に極めて大き
な効果を有するものである。この結果、製造工程
の合理化ができ、エツチング工程の短縮化がで
き、更に腐食剤含有のインキの印刷時において印
刷不良等の原因により製品が不良となることが予
測される場合には、この段階で前記インキを洗浄
除去し、高価な基板を再使用することができるも
のであるから、良品率の向上、コストダウン等の
効果も有するものである。<Effects of the Invention> Since the present invention has the above configuration, it has the following effects. That is, since the corrosive agent used to corrode the conductive film formed on the substrate is solid at room temperature, a predetermined pattern is printed using ink containing this corrosive agent. After that, it can be continuously rolled up, and therefore a continuous winding printing method can be applied as a printing method, so it has an extremely large effect on continuous mass production. It is. As a result, the manufacturing process can be streamlined and the etching process can be shortened. Furthermore, if it is predicted that the product will be defective due to printing defects when printing with ink containing corrosive agents, this step Since the ink can be washed away and the expensive substrate can be reused, it also has effects such as improving the yield rate and reducing costs.
従つて本発明に係る導電性回路を有する基板の
連続製造法は、産業上極めて有用な、利用価値の
高いものである。 Therefore, the continuous manufacturing method of a substrate having a conductive circuit according to the present invention is extremely useful industrially and has high utility value.
なお、本発明に係る導電性回路を有する基板の
連続製造法は、必ずしも連続巻き取り式の印刷法
を適用する必要はなく、また連続巻き取り式の印
刷法を適用した場合も必ずしも巻き取る必要はな
く、印刷乾燥後直ちに所定の大きさに断裁して後
の工程に備えたり、あるいは印刷後乾燥すると同
時に後工程である加熱工程に移つてもよいもので
あることは云うまでもない。 Note that the continuous manufacturing method of a substrate having a conductive circuit according to the present invention does not necessarily require the application of a continuous winding printing method, and even when a continuous winding printing method is applied, winding is not necessarily necessary. It goes without saying that the sheet may be cut into a predetermined size immediately after printing and drying in preparation for a subsequent process, or it may be dried after printing and simultaneously moved to a subsequent heating step.
Claims (1)
により酸性ガスもしくは霧状の酸性ガスを発生す
る固体腐食剤を含有するインキを用いて長尺の基
板上に設けられた導電膜上に所定の図柄を印刷し
た後乾燥しその後50〜300℃に加熱してエツチン
グ反応を行わすことにより腐食作用を完了させ次
いで印刷図柄部分を洗浄除去して導電性回路を形
成し、かつ印刷乾燥以後の工程で基板を連続的に
巻き取ることを特徴とする導電性回路を有する基
板の連続製造法。 2 導電膜が導電性の金属皮膜であることを特徴
とする特許請求の範囲第1項記載の導電性回路を
有する基板の連続製造法。 3 導電膜が遷移金属酸化物系皮膜であることを
特徴とする特許請求の範囲第1項記載の導電性回
路を有する基板の連続製造法。 4 インキが固体腐食剤の共存材料としてバイン
ダーを含むことを特徴とする特許請求の範囲第1
項記載の導電性回路を有する基板の連続製造法。 5 インキが固体腐食剤の共存材料としてバイン
ダー及び反応促進剤を含むことを特徴とする特許
請求の範囲第4項記載の導電性回路を有する基板
の連続製造法。[Claims] 1. Provided on a long substrate using an ink containing a solid corrosive that generates acidic gas or atomized acidic gas when heated at 50 to 300°C in the presence of coexisting materials. After printing a predetermined pattern on the conductive film, it is dried, and then heated to 50 to 300°C to perform an etching reaction to complete the corrosion action, and then the printed pattern is washed away to form a conductive circuit. A continuous manufacturing method for a substrate having a conductive circuit, characterized in that the substrate is continuously wound up in a step after printing and drying. 2. The continuous manufacturing method of a substrate having a conductive circuit according to claim 1, wherein the conductive film is a conductive metal film. 3. A continuous manufacturing method for a substrate having a conductive circuit according to claim 1, wherein the conductive film is a transition metal oxide film. 4 Claim 1, characterized in that the ink contains a binder as a coexisting material with a solid corrosive agent.
A continuous manufacturing method for a substrate having a conductive circuit as described in 1. 5. The continuous manufacturing method of a substrate having a conductive circuit according to claim 4, wherein the ink contains a binder and a reaction accelerator as coexisting materials with the solid corrosive agent.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21918984A JPS6196794A (en) | 1984-10-17 | 1984-10-17 | Continuous manufacture of substrate having conductive circuit |
| PCT/JP1985/000576 WO1986002519A1 (en) | 1984-10-17 | 1985-10-16 | Method of continuously producing a substrate having an electrically conductive circuit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21918984A JPS6196794A (en) | 1984-10-17 | 1984-10-17 | Continuous manufacture of substrate having conductive circuit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6196794A JPS6196794A (en) | 1986-05-15 |
| JPH058599B2 true JPH058599B2 (en) | 1993-02-02 |
Family
ID=16731599
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21918984A Granted JPS6196794A (en) | 1984-10-17 | 1984-10-17 | Continuous manufacture of substrate having conductive circuit |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS6196794A (en) |
| WO (1) | WO1986002519A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7651830B2 (en) | 2007-06-01 | 2010-01-26 | 3M Innovative Properties Company | Patterned photoacid etching and articles therefrom |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW300314B (en) * | 1995-06-08 | 1997-03-11 | Tokyo Electron Co Ltd |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS604233B2 (en) * | 1975-12-26 | 1985-02-02 | 卓馬 桐山 | Viscous metal surface treatment agent and its manufacturing method |
| JPS591680A (en) * | 1982-06-25 | 1984-01-07 | Daicel Chem Ind Ltd | Etching solution for thin film |
-
1984
- 1984-10-17 JP JP21918984A patent/JPS6196794A/en active Granted
-
1985
- 1985-10-16 WO PCT/JP1985/000576 patent/WO1986002519A1/en not_active Ceased
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7651830B2 (en) | 2007-06-01 | 2010-01-26 | 3M Innovative Properties Company | Patterned photoacid etching and articles therefrom |
Also Published As
| Publication number | Publication date |
|---|---|
| WO1986002519A1 (en) | 1986-04-24 |
| JPS6196794A (en) | 1986-05-15 |
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