JPH06104055B2 - Incubator - Google Patents
IncubatorInfo
- Publication number
- JPH06104055B2 JPH06104055B2 JP14957590A JP14957590A JPH06104055B2 JP H06104055 B2 JPH06104055 B2 JP H06104055B2 JP 14957590 A JP14957590 A JP 14957590A JP 14957590 A JP14957590 A JP 14957590A JP H06104055 B2 JPH06104055 B2 JP H06104055B2
- Authority
- JP
- Japan
- Prior art keywords
- main
- gas
- culture chamber
- valve
- path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007789 gas Substances 0.000 description 63
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 24
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 22
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 21
- 229910001882 dioxygen Inorganic materials 0.000 description 21
- 229910002092 carbon dioxide Inorganic materials 0.000 description 12
- 239000001569 carbon dioxide Substances 0.000 description 12
- 229910001873 dinitrogen Inorganic materials 0.000 description 10
- 238000010586 diagram Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 239000000428 dust Substances 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 210000004027 cell Anatomy 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 230000005856 abnormality Effects 0.000 description 2
- 238000011218 seed culture Methods 0.000 description 2
- 206010028980 Neoplasm Diseases 0.000 description 1
- 201000011510 cancer Diseases 0.000 description 1
- 210000004748 cultured cell Anatomy 0.000 description 1
- 238000012258 culturing Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Landscapes
- Apparatus Associated With Microorganisms And Enzymes (AREA)
Description
【発明の詳細な説明】 （イ）産業上の利用分野 本発明は室内のガス環境を制御し、細胞等の培養を行う
ための培養装置に関する。TECHNICAL FIELD The present invention relates to a culture device for controlling a gas environment in a room and culturing cells and the like.
（ロ）従来の技術 従来この種培養装置は、癌細胞等の細胞組織を培養する
ため特開昭60−141279号公報に示される如く、室内の温
度、湿度環境のほかに、二酸化炭素や酸素等のガス濃度
を制御できるように構成されている。(B) Conventional Technology In order to cultivate cell tissues such as cancer cells, this seed culture device has been used in addition to indoor temperature and humidity environments, as well as carbon dioxide and oxygen, as disclosed in JP-A-60-141279. It is configured so that the gas concentration of the gas can be controlled.
このガスは通常ガスボンベに封入されたものを室内に供
給するものであるので、有限である。従って、ボンベが
空になった場合はガスの供給が停止して、環境条件が崩
れ、培養中の細胞が死滅してしまうため予備のガスボン
ベを準備して置き、ガスの供給をこれに切り換えるよう
にしている。This gas is finite because it is normally used as a gas cylinder that is supplied in a room. Therefore, when the cylinder becomes empty, the gas supply is stopped, the environmental conditions are collapsed, and the cells in the culture are killed.Therefore, a spare gas cylinder should be prepared and placed, and the gas supply should be switched to this. I have to.
第５図に従来の培養装置の構成図を示す。100は培養装
置、101はその培養室、102は培養室101内の例えば酸素
ガス濃度を検出するためのセンサーである。103は窒素
ガスを封入した主ガス供給源としての主ガスボンベであ
り、接続口Ａにて主経路104に連通されている。この主
経路104には、塵埃を除去するためのフィルター106が介
設され、三方切換弁107の一方の入口に接続されてい
る。108は同様に窒素ガスを封入した予備ガス供給源と
しての予備ガスボンベであり、接続口Ｂにて予備経路10
9に連通されている。この予備経路109には同様に塵埃を
除去するためのフィルター110が介設され三方切換弁107
の他方の入口に接続されている。FIG. 5 shows a block diagram of a conventional culture device. Reference numeral 100 is a culture device, 101 is a culture chamber thereof, and 102 is a sensor for detecting, for example, an oxygen gas concentration in the culture chamber 101. Reference numeral 103 is a main gas cylinder as a main gas supply source in which nitrogen gas is sealed, and is connected to a main path 104 at a connection port A. A filter 106 for removing dust is provided in the main path 104, and is connected to one inlet of a three-way switching valve 107. Similarly, 108 is a spare gas cylinder as a spare gas supply source in which nitrogen gas is sealed, and the spare path 10 is connected to the spare path 10 at the connection port B.
It is connected to 9. Similarly, a filter 110 for removing dust is provided on the backup path 109, and a three-way switching valve 107 is provided.
Is connected to the other entrance.
三方切換弁107は共通経路111にて培養室101内と連通さ
れるが、共通経路111には二方弁から成るバルブ112が介
設される。センサー102の出力は制御装置113に入力さ
れ、制御装置113はセンサー102の出力に基づき、バルブ
112の制御出力を発生してバルブ112を開閉し、室101内
の酸素ガス濃度を所定の値に調節する。The three-way switching valve 107 is connected to the inside of the culture chamber 101 through a common path 111, and the common path 111 is provided with a valve 112 that is a two-way valve. The output of the sensor 102 is input to the controller 113, and the controller 113 outputs the valve based on the output of the sensor 102.
A control output of 112 is generated to open / close the valve 112 to adjust the oxygen gas concentration in the chamber 101 to a predetermined value.
ここで酸素ガス濃度の制御に窒素ガスを用いるのは、大
気中の酸素濃度が約21％であり、室101内を酸素ガス濃
度５％等の低い値で使用する場合は窒素ガスによって室
101内の酸素ガス濃度を下げる必要があるからである。Nitrogen gas is used to control the oxygen gas concentration here because the oxygen concentration in the atmosphere is approximately 21%, and when the chamber 101 is used at a low value such as 5% oxygen gas concentration,
This is because it is necessary to lower the oxygen gas concentration in 101.
114、115はは圧力センサーであり、フィルター106と主
ガスボンベ103の間及び予備ガスボンベ108とフィルター
110の間の主経路104及び予備経路109の圧力をそれぞれ
検出し、これらの出力を増幅回路を含む比較器116に入
力している。比較器116は圧力センサー114の出力に基づ
き、主ガスボンベ103にガスがあって主経路104の圧力が
所定値以上であれば、三方切換弁107を主経路104側に切
り換えて主ガスボンベ103から培養室101内に窒素ガスを
供給する。Reference numerals 114 and 115 denote pressure sensors, which are provided between the filter 106 and the main gas cylinder 103 and between the auxiliary gas cylinder 108 and the filter.
The pressures of the main path 104 and the backup path 109 between 110 are respectively detected, and these outputs are input to the comparator 116 including an amplifier circuit. Based on the output of the pressure sensor 114, the comparator 116 switches the three-way switching valve 107 to the main path 104 side when the main gas cylinder 103 has gas and the pressure in the main path 104 is equal to or higher than a predetermined value. Nitrogen gas is supplied into the chamber 101.
一方、主経路104の圧力が所定の圧力より低下すると、
比較器116は三方切換弁107を予備経路109側に切り換
え、予備ガスボンベ108からガスを供給する。On the other hand, when the pressure in the main path 104 falls below a predetermined pressure,
The comparator 116 switches the three-way switching valve 107 to the side of the backup path 109 and supplies gas from the backup gas cylinder 108.
（ハ）発明が解決しようとする課題 係る従来の構成では、三方切換弁107やバルブ112の故障
により流通路が開放できなくなった場合や、フィルター
106が目詰まりしてガスが流れなくなった場合でも、圧
力センサー104には圧力が加わっているので、異常とし
て検知することができない。また、このような異常や、
主ガスボンベ103の空が発見出来たとしても、三方切換
弁107またはバルブ112が故障していると、結局予備ガス
ボンベ108からはガスは供給されない問題があった。(C) In the conventional configuration according to the problem to be solved by the invention, when the flow passage cannot be opened due to a failure of the three-way switching valve 107 or the valve 112,
Even when 106 is clogged and the gas does not flow, the pressure is applied to the pressure sensor 104, so it cannot be detected as an abnormality. In addition, such abnormalities,
Even if the main gas cylinder 103 can be found empty, if the three-way switching valve 107 or the valve 112 is broken, there is a problem that the backup gas cylinder 108 does not supply gas.
本発明は係る課題を解決するために成されたものであ
る。The present invention has been made to solve the above problems.
（ニ）課題を解決するための手段 本発明は、培養室と、主ガス供給源と、この主ガス供給
源と培養室を連通する主経路と、予備ガス供給源と、こ
の予備ガス供給源と培養室を連通する予備経路と、両経
路にそれぞれ設けた主流通制御手段と予備流通制御手段
と、培養室内のガス濃度を検出するセンサーと、このセ
ンサーの出力が入力され、両流通制御手段の制御出力を
発生する制御装置とから培養装置を構成し、制御装置は
前記センサーの出力に基づいて前記制御出力を発生し、
主流通制御手段により培養室内のガス濃度を制御すると
共に、センサーの出力変化と主流通制御手段の制御状態
に基づいて主ガス供給源の残存状態を検知し、主流通制
御手段を閉じて予備流通制御手段により培養室内のガス
濃度を制御するようにしたものである。(D) Means for Solving the Problems The present invention is directed to a culture chamber, a main gas supply source, a main path connecting the main gas supply source and the culture chamber, a spare gas supply source, and the spare gas supply source. And a flow path for communicating the culture chamber with each other, a main flow control means and a backup flow control means respectively provided on both paths, a sensor for detecting the gas concentration in the culture chamber, and the output of this sensor is input to both flow control means. A culture device comprising a control device for generating a control output of the control device, the control device generating the control output based on the output of the sensor,
While controlling the gas concentration in the culture chamber by the main flow control means, the remaining state of the main gas supply source is detected based on the output change of the sensor and the control state of the main flow control means, and the main flow control means is closed for preliminary flow. The gas concentration in the culture chamber is controlled by the control means.
（ホ）作用 本発明によれば、主ガス供給源の空の他、主経路の目詰
まりによるガス供給不良も検知できる。また、これを検
知した後も主経路とは独立した予備経路にて予備ガス供
給源のガスを培養室に導入し、更に、これも独立した予
備流通制御手段にてガスの流通を制御するので、培養室
内のガス濃度制御を安定的に継続できる。(E) Operation According to the present invention, not only the empty main gas supply source but also a defective gas supply due to clogging of the main path can be detected. Further, even after this is detected, the gas from the auxiliary gas supply source is introduced into the culture chamber through the auxiliary path independent of the main path, and the independent auxiliary flow control means also controls the gas flow. The gas concentration control in the culture chamber can be continued stably.
（ヘ）実施例 次に本発明の実施例を説明する。第１図は本発明の培養
装置１の構成図を示す。培養装置１の培養室２内は断熱
材にて断熱されており、例えば二酸化炭素を封入した二
酸化炭素ガスボンベ３が第２図に示す如き接続口Ｃにて
二酸化炭素ガス供給経路４に連通せられ、この経路４は
培養室２に連通せられている。この二酸化炭素ガス供給
経路４には、塵埃を除去するためのフィルター５及び二
方弁から成るバルブ６が介設されている。(F) Example Next, an example of the present invention will be described. FIG. 1 shows a block diagram of a culture device 1 of the present invention. The inside of the culture chamber 2 of the culture device 1 is insulated by a heat insulating material, and for example, a carbon dioxide gas cylinder 3 in which carbon dioxide is sealed is connected to a carbon dioxide gas supply path 4 through a connection port C as shown in FIG. The path 4 is connected to the culture room 2. A filter 5 for removing dust and a valve 6 composed of a two-way valve are interposed in the carbon dioxide gas supply path 4.
７は窒素を封入した主ガスボンベであり、接続口Ａにて
主経路８に連通せられ、この主経路８は培養室２に連通
せられている。この主経路８にも塵埃を除去するための
フィルター９及び二方弁から成る主バルブ10が介設され
ている。Reference numeral 7 denotes a main gas cylinder filled with nitrogen, which is connected to the main path 8 at the connection port A, and the main path 8 is connected to the culture chamber 2. A filter 9 for removing dust and a main valve 10 composed of a two-way valve are also provided in the main path 8.
11は同様に窒素を封入した予備ガスボンベであり、接続
口Ｂにて予備経路12に連通せられ、この予備経路12は主
バルブ10下流の主経路８に連通せられている。この予備
経路12にも、塵埃を除去するためのフィルター13及び二
方弁から成る予備バルブ14が介設されている。Reference numeral 11 is a spare gas cylinder similarly filled with nitrogen, which is connected to the spare path 12 at the connection port B, and the spare path 12 is connected to the main path 8 downstream of the main valve 10. A filter 13 for removing dust and a spare valve 14 including a two-way valve are also provided in the spare path 12.
ここで、予備経路12は直接培養室２に連通させても良
い。Here, the preliminary path 12 may be directly connected to the culture chamber 2.
15は培養室２内の二酸化炭素ガス濃度を検出するための
二酸化炭素ガス濃度センサー、16は同酸素ガス濃度を検
出するための酸素ガス濃度センサーで、二酸化炭素ガス
濃度センサー15は赤外線検知方式のガスセンサー、酸素
ガス濃度センサー16は電気伝導度を検知する方式のガス
センサーで構成され、各センサー15及び16の出力はマイ
クロコンピュータにて構成される制御装置17に入力され
る。制御装置17はバルブ６、主バルブ10及び予備バルブ
14の制御出力をそれぞれ発生し、且つ、ブザー、ランプ
及び又は文字表示パネル等から成る警告手段18の動作を
制御する。15 is a carbon dioxide gas concentration sensor for detecting the carbon dioxide gas concentration in the culture chamber 2, 16 is an oxygen gas concentration sensor for detecting the same oxygen gas concentration, and the carbon dioxide gas concentration sensor 15 is an infrared detection type The gas sensor and the oxygen gas concentration sensor 16 are gas sensors of a type that detects electric conductivity, and outputs of the sensors 15 and 16 are input to a control device 17 including a microcomputer. The control device 17 is a valve 6, a main valve 10 and a spare valve.
14 control outputs are generated and the operation of the warning means 18 including a buzzer, a lamp and / or a character display panel is controlled.
次に第３図及び第４図を参照して制御装置17の動作を説
明する。一般にこの種培養装置は二酸化炭素ガス濃度５
％、酸素ガス濃度５％における用途が多く、標準的なガ
スボンベで二酸化炭素ガスでは約１年間、窒素ガスでは
１乃至２週間で空になる。従って窒素ガスの消費料は多
く、口述する主バルブ10の動作回数も多くなるので、バ
ルブ６よりも故障確率は大きくなる。また、酸素ガス濃
度の制御に窒素ガスを用いているのは、大気中の酸素濃
度が約21％であり、５％で使用する場合は窒素ガスによ
って培養室２内の酸素ガス濃度を下げる必要があるから
である。Next, the operation of the controller 17 will be described with reference to FIGS. 3 and 4. Generally, this seed culture device has a carbon dioxide gas concentration of 5
%, The oxygen gas concentration is 5%, and the standard gas cylinder empties the carbon dioxide gas in about one year and the nitrogen gas in one to two weeks. Therefore, the consumption of nitrogen gas is large, and the number of times of operation of the main valve 10, which is dictated, also increases, so that the failure probability is higher than that of the valve 6. Also, nitrogen gas is used to control the oxygen gas concentration because the oxygen concentration in the atmosphere is about 21%, and when it is used at 5%, it is necessary to lower the oxygen gas concentration in the culture chamber 2 by nitrogen gas. Because there is.
尚、大気中の二酸化炭素濃度は約0.03％である。また、
制御装置17はセンサー15の出力に基づいてバルブ６を開
閉し、培養室２内を所定の二酸化炭素ガス濃度に制御す
るが、説明の便宜上、以下は酸素ガス濃度の制御につい
てのみ説明する。The carbon dioxide concentration in the atmosphere is about 0.03%. Also,
The controller 17 opens and closes the valve 6 based on the output of the sensor 15 to control the inside of the culture chamber 2 to have a predetermined carbon dioxide gas concentration. However, for convenience of description, only the control of the oxygen gas concentration will be described below.
主ガスボンベ７に正常量の窒素が残存している場合は、
培養装置１の設置後電源を投入すると培養室２内の酸素
ガス濃度は大気の21％であるから、制御装置17は制御出
力を発生して主バルブ10を開き、主ガスボンベ７から窒
素ガスを培養室２内に導入する。これによって培養室２
内の酸素は押し出されて希釈され、酸素ガス濃度は、第
３図のように大気の酸素ガス濃度約21％から降下して行
く。その後５％の設定値SVの下に設定した下限値ELに到
達すると制御装置17は制御出力を発生して主バルブ10を
閉じる。それによって酸素ガス濃度が上昇し、設定値SV
の上に設定した上限値EHまで上昇すると、制御装置17は
再び主バルブ10を開く。以下これを繰り返して培養室２
内の酸素ガス濃度を平均して設定値SVに制御する。この
間制御装置17は予備バルブ14を閉じている。If a normal amount of nitrogen remains in the main gas cylinder 7,
When the power is turned on after the culture device 1 is installed, the oxygen gas concentration in the culture chamber 2 is 21% of the atmosphere, and therefore the control device 17 generates a control output to open the main valve 10 to release the nitrogen gas from the main gas cylinder 7. It is introduced into the culture chamber 2. This allows the culture room 2
The oxygen inside is extruded and diluted, and the oxygen gas concentration drops from the atmospheric oxygen gas concentration of about 21% as shown in FIG. After that, when the lower limit value EL set below the set value SV of 5% is reached, the control device 17 generates a control output and closes the main valve 10. As a result, the oxygen gas concentration increases, and the set value SV
When the upper limit value EH set above is increased, the controller 17 opens the main valve 10 again. Repeat this process for culture room 2
The oxygen gas concentration in the inside is averaged and controlled to the set value SV. During this time, the controller 17 closes the auxiliary valve 14.
ここで制御装置17はバルブ10を開いている間、定期的
（例えば１分間隔S1〜Snにセンサー16から入力する酸素
ガス濃度（以下Ｅと称す）をサンプリングして、濃度Ｅ
の変化量ｅを逐次算出している。Here, the control device 17 is sampled during periodically (e.g. referred to as the oxygen gas concentration (hereinafter E input from the sensor 16 in one minute intervals S 1 to S n) are open the valve 10, the concentration E
The change amount e of is sequentially calculated.
次に主ボンベ７内の窒素の残存量が少ないと、第４図に
示す如く主バルブ10を開いても、単位時間当りに流入す
る量が少ないので、濃度Ｅの変化量e0は小さくなり、空
になるとその変化量ｅは増加に転じる。Next, if the remaining amount of nitrogen in the main cylinder 7 is small, even if the main valve 10 is opened as shown in FIG. 4, the amount of inflow per unit time is small, so the change amount e 0 of the concentration E becomes small. When it becomes empty, the amount of change e starts to increase.
制御装置17は主バルブ10を開く制御出力を発生している
状態で、この変化量ｅが所定の値より小さくなると、主
ボンベ７に残存している窒素の量が少なくなったものと
判断し、警告手段18を動作せしめて警報を発し、使用者
に主ボンベ７の交換を要求する。When the control device 17 is generating a control output for opening the main valve 10 and the amount of change e becomes smaller than a predetermined value, it is determined that the amount of nitrogen remaining in the main cylinder 7 has decreased. The warning means 18 is activated to issue an alarm, and the user is requested to replace the main cylinder 7.
同時に主バルブ10を閉じ、今度は予備バルブ14を開いて
予備ボンベ11から窒素ガスを培養室２内に導入する。以
後、制御装置17はこの予備バルブ14を開閉制御すること
により、培養室２内の酸素ガス濃度Ｅを調節する。At the same time, the main valve 10 is closed, and this time the spare valve 14 is opened to introduce the nitrogen gas from the spare cylinder 11 into the culture chamber 2. After that, the controller 17 controls the opening / closing of the preliminary valve 14 to adjust the oxygen gas concentration E in the culture chamber 2.
以上の如き構成によって従来の如き圧力センサーを用い
ることなく培養室２内の状況から主ボンベ７が空になっ
たことを検知し、予備ボンベ11に切り換えることができ
いる。このことは、また主ボンベ７が空になったことの
みならず、主ボンベ７から培養室２に至る主経路８中に
おける故障（フィルター９やバルブ10の目詰まり等）を
も検知できることを意味する。即ち、警告手段18が動作
して主ボンベ７をチェックした時に窒素が十分残存して
いれば、係る故障と判断できる。With the above structure, it is possible to detect that the main cylinder 7 has become empty from the situation inside the culture chamber 2 and switch to the spare cylinder 11 without using a conventional pressure sensor. This means that not only the main cylinder 7 is emptied, but also a failure (clogging of the filter 9 or the valve 10) in the main path 8 from the main cylinder 7 to the culture chamber 2 can be detected. To do. That is, if the warning means 18 is operated and the main cylinder 7 is checked, if sufficient nitrogen remains, it can be determined that the failure has occurred.
また、本発明では主経路８とは独立して予備経路12を設
け、更に主バルブ10とは別個の予備バルブ14にて予備ガ
スへの切り換えと供給制御を行うので、上記のような主
経路８の故障時にも予備ガスの供給を確保でき、培養細
胞の死滅を防止できる。Further, in the present invention, the auxiliary path 12 is provided independently of the main path 8, and the auxiliary valve 14 separate from the main valve 10 performs switching to the auxiliary gas and supply control. It is possible to secure the supply of the preliminary gas even at the time of failure of 8, and it is possible to prevent the death of the cultured cells.
（ト）発明の効果 本発明によれば、主ガス供給源の残存量の減少の他、主
経路の目詰まり等によるガス供給不良の検知も可能とな
る また、これを検知した後も主経路とは独立した予備経路
にて予備ガス供給源のガスを培養室に導入し、更に、こ
れも独立した予備流通制御手段にてガスの流通を制御す
るので、培養室内のガス濃度制御を安定的に継続し、培
養物の損害を確実に防止することができる。(G) Effect of the Invention According to the present invention, not only the remaining amount of the main gas supply source can be reduced, but also the gas supply failure due to the clogging of the main path can be detected. Since the gas from the auxiliary gas supply source is introduced into the culture chamber through a preliminary route independent of the above, and the gas flow is controlled by the independent preliminary flow control means, the gas concentration control inside the culture chamber is stable. And the damage to the culture can be reliably prevented.
第１図は本発明の培養装置の構成図、第２図はガスボン
ベの接続口を示す図、第３図及び第４図は酸素ガス濃度
の時間推移を示す図、第５図は従来の培養装置の構成図
である。 １…培養装置、２…培養室、７…主ガスボンベ、８…主
経路、10…主バルブ、11…予備ガスボンベ、12…予備経
路、14…予備バルブ、16…酸素ガス濃度センサー、17…
制御装置。FIG. 1 is a block diagram of a culture device of the present invention, FIG. 2 is a diagram showing a gas cylinder connection port, FIGS. 3 and 4 are diagrams showing a time transition of oxygen gas concentration, and FIG. 5 is a conventional culture. It is a block diagram of an apparatus. DESCRIPTION OF SYMBOLS 1 ... Culture apparatus, 2 ... Culture chamber, 7 ... Main gas cylinder, 8 ... Main path, 10 ... Main valve, 11 ... Spare gas cylinder, 12 ... Spare path, 14 ... Spare valve, 16 ... Oxygen gas concentration sensor, 17 ...
Control device.
Claims (1)
源と前記培養室を連通する主経路と、予備ガス供給源
と、該予備ガス供給源と前記培養室を連通する予備経路
と、両経路にそれぞれ設けた主流通制御手段と予備流通
制御手段と、前記培養室内のガス濃度を検出するセンサ
ーと、該センサーの出力が入力され、両流通制御手段の
制御出力を発生する制御装置とから成り、前記制御装置
は前記センサーの出力に基づいて前記制御出力を発生
し、前記主流通制御手段により前記培養室内のガス濃度
を制御すると共に、前記センサーの出力変化と前記主流
通制御手段の制御状態に基づいて前記主ガス供給源の残
存状態を検知し、前記主流通制御手段を閉じて前記予備
流通制御手段により前記培養室内のガス濃度を制御する
ことを特徴とする培養装置。1. A culture chamber, a main gas supply source, a main path connecting the main gas supply source to the culture chamber, a spare gas supply source, and a spare connecting the auxiliary gas supply source to the culture chamber. A path, a main flow control means and a preliminary flow control means respectively provided on both paths, a sensor for detecting the gas concentration in the culture chamber, and the output of the sensor are input to generate control outputs of both the flow control means. The control device generates the control output based on the output of the sensor, controls the gas concentration in the culture chamber by the main flow control means, and changes in the output of the sensor and the main flow. A culture characterized by detecting the remaining state of the main gas supply source based on the control state of the control means, closing the main flow control means, and controlling the gas concentration in the culture chamber by the preliminary flow control means. Location.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14957590A JPH06104055B2 (en) | 1990-06-07 | 1990-06-07 | Incubator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14957590A JPH06104055B2 (en) | 1990-06-07 | 1990-06-07 | Incubator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0440887A JPH0440887A (en) | 1992-02-12 |
| JPH06104055B2 true JPH06104055B2 (en) | 1994-12-21 |
Family
ID=15478193
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14957590A Expired - Lifetime JPH06104055B2 (en) | 1990-06-07 | 1990-06-07 | Incubator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06104055B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108384714A (en) * | 2018-04-23 | 2018-08-10 | 苏州欧飞纳米科技有限公司 | A kind of gas-dynamic control system of biological cell reactor |
-
1990
- 1990-06-07 JP JP14957590A patent/JPH06104055B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0440887A (en) | 1992-02-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101777030B1 (en) | Method and device for determining and/or monitoring the airtightness of an enclosed room | |
| NO20012171L (en) | Systems and methods for treating blood with leaflets to detect contaminants | |
| JP3549949B2 (en) | Low oxygen incubator | |
| JP3021789B2 (en) | Culture device | |
| CN209311423U (en) | Online self-calibration gas with regime flow control monitors system | |
| JPH06104055B2 (en) | Incubator | |
| ATE469445T1 (en) | RECYCLING SYSTEM OF THE ANODEST CURRENT OF A FUEL CELL | |
| JPH06102016B2 (en) | Incubator | |
| JP2001046504A (en) | Medical oxygen concentrator | |
| JP2020084282A (en) | Monitoring device for raw material tank and monitoring method for raw material tank | |
| JPH0661257B2 (en) | Incubator | |
| JP3614786B2 (en) | Pressure swing adsorption gas generator | |
| CN220276078U (en) | A mixed oxygen circuit structure that can calibrate the oxygen concentration sensor online and its ventilator | |
| CN103768736A (en) | Intelligent respirator detection device | |
| CN212483447U (en) | Explosion-proof motor sweeps explosive gas detection device that admits air | |
| KR20190036312A (en) | Apparatus for controlling weld shielding gas | |
| JP3124125B2 (en) | Flow control device | |
| JP3798089B2 (en) | Plant growth equipment for research | |
| US6652732B2 (en) | Fan flow sensor for proton exchange membrane electrolysis cell | |
| JPH09311119A (en) | Oxygen concentration detector for psa type gas concentrator | |
| US20250027871A1 (en) | Anti-oxidation conditioning system with function of automatically displaying aging status | |
| CN116465039B (en) | Control method and control system of transfer isolation cabin | |
| JPH02136646A (en) | Hot water supply apparatus | |
| JPH0479407B2 (en) | ||
| JPH0125624Y2 (en) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081221 Year of fee payment: 14 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 14 Free format text: PAYMENT UNTIL: 20081221 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20091221 Year of fee payment: 15 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 16 Free format text: PAYMENT UNTIL: 20101221 |
|
| EXPY | Cancellation because of completion of term | ||
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101221 Year of fee payment: 16 |