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JPH06105302B2 - Radiation detector - Google Patents
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JPH06105302B2 - Radiation detector - Google Patents

Radiation detector

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Publication number
JPH06105302B2
JPH06105302B2 JP63284514A JP28451488A JPH06105302B2 JP H06105302 B2 JPH06105302 B2 JP H06105302B2 JP 63284514 A JP63284514 A JP 63284514A JP 28451488 A JP28451488 A JP 28451488A JP H06105302 B2 JPH06105302 B2 JP H06105302B2
Authority
JP
Japan
Prior art keywords
radiation
semiconductor
radiation detector
common electrode
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63284514A
Other languages
Japanese (ja)
Other versions
JPH02129583A (en
Inventor
博司 筒井
康以知 大森
哲郎 大土
末喜 馬場
裕正 船越
俊之 河原
嘉之 ▲吉▼住
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP63284514A priority Critical patent/JPH06105302B2/en
Priority to US07/435,219 priority patent/US5111052A/en
Publication of JPH02129583A publication Critical patent/JPH02129583A/en
Publication of JPH06105302B2 publication Critical patent/JPH06105302B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Measurement Of Radiation (AREA)
  • Light Receiving Elements (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、放射線エネルギースペクトル分析をするため
の微小放射線検出器及び診断用X線撮影装置、非破壊検
査装置に用いられる放射線検出器に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a minute radiation detector for performing a radiation energy spectrum analysis, a diagnostic X-ray imaging apparatus, and a radiation detector used in a nondestructive inspection apparatus. .

従来の技術 第13図に従来の全空乏層型半導体放射線検出器の構造を
示す。すなわち、従来の放射線検出器は、半導体1の平
行する2平面上に分割電極2及び共通電極3を設け、放
射線4により半導体1中で生じた電荷を電極2、3間に
電圧を印加して取り出す。電荷の移動により生じる電流
は、Ramoの定理として知られるように、第1式のように
なる。
Prior Art FIG. 13 shows the structure of a conventional full depletion type semiconductor radiation detector. That is, in the conventional radiation detector, the divided electrodes 2 and the common electrode 3 are provided on the two parallel planes of the semiconductor 1, and a charge generated in the semiconductor 1 by the radiation 4 is applied between the electrodes 2 and 3. Take it out. The current generated by the charge transfer is as shown in the first equation, which is known as Ramo's theorem.

i=q*dx/dt (1) q:発生した電荷量 dx/dt:電荷の移動速度 放射線のエネルギー分析を行うためには、従来は(1)
式の電流iを積分し、発生した電荷量を測定する。この
関係を(2)に示す。
i = q * dx / dt (1) q: Generated charge dx / dt: Charge transfer speed In order to perform energy analysis of radiation, the conventional method is (1)
The current i in the equation is integrated and the generated charge amount is measured. This relationship is shown in (2).

Q=idt (2)即ち、検出器が出力する電子及び正孔による電流
を、外部測定器の積分回路を用いて電荷量に変換して測
定する。
Q = idt (2) That is, the current due to the electrons and holes output by the detector is converted into the amount of electric charge and measured by using the integrating circuit of the external measuring device.

発明が解決しようとする課題 積分回路を用いた外部測定器を使用した場合、検出器に
入射する放射線光子数が少ないときは、出力パルス波高
は入射放射線光子のエネルギーに比例するが、入射放射
線光子の数が増加し、積分回路の時定数より短い入射レ
ートでは数え落しを生じる。
When an external measuring instrument using an integrating circuit is used, when the number of radiation photons incident on the detector is small, the output pulse height is proportional to the energy of the incident radiation photon, but the incident radiation photon The number of is increased, and counting occurs at an incident rate shorter than the time constant of the integrating circuit.

この問題を除くために、積分回路を使用せず、高速電流
増幅器を使用した場合には、次のような問題を生じる。
Si,Geのように移動度即ち一定電界中での電荷の移動速
度が同程度の場合はよいが、GaAs,CdTe,Hg12のように化
合物半導体材料で、電子とホールの移動度が異なるよう
な場合、いずれかの電荷による電流を測定しようとする
と、電荷の収集電極近傍で発生した電荷は、電荷の移動
時間が非常に短くなり、電流パルスとして増幅器を通過
すると、ゲインが非常に小さくなってしまう。すなわ
ち、増幅器を通過した電流パルスのパルス波高値は電荷
の発生位置に依存する。
In order to eliminate this problem, if the high-speed current amplifier is used without using the integrating circuit, the following problems occur.
It is preferable if the mobility, that is, the speed of movement of charges in a constant electric field, is the same as in Si and Ge.However, in compound semiconductor materials such as GaAs, CdTe, and Hg12, the mobility of electrons and holes is different. If you try to measure the current due to any charge, the charge generated in the vicinity of the charge collection electrode will have a very short charge transit time, and the gain will be very small when passing through the amplifier as a current pulse. I will end up. That is, the pulse crest value of the current pulse that has passed through the amplifier depends on the charge generation position.

さらに、両電極を放射線の入射方向に対して平行に配置
した場合は、センサの実装が容易でなくなる。
Furthermore, if both electrodes are arranged parallel to the radiation incident direction, the mounting of the sensor becomes difficult.

課題を解決するための手段 上記問題を解決するためには、検出器に入射する放射線
により発生する電荷の発生位置にかかわらず、電極に到
達するまでに適当な時間走行するように電極を配置すれ
ばよい。そこで本発明の放射線検出器は、半導体の一つ
の平面上に共通電極と平行にかつ適当な距離はなして分
割電極を配置し、共通電極と分割電極間を放射線に有感
な領域として使用する。
Means for Solving the Problems In order to solve the above problems, the electrodes should be arranged so that they travel for an appropriate time before reaching the electrodes, regardless of the position where the charges generated by the radiation incident on the detector are generated. Good. Therefore, in the radiation detector of the present invention, the divided electrodes are arranged on one plane of the semiconductor in parallel with the common electrode and at an appropriate distance, and the space between the common electrode and the divided electrodes is used as a radiation sensitive region.

作用 上記構成により、半導体の同一平面内に両電極を配置
し、電極間を有感部分として使用することにより、高計
数レートの入射放射線に対しても、放射線のエネルギー
情報を損なうことなく測定が可能となる。また、同一平
面内に両電極を有することから、多チャンネル検出器と
して、実装上非常に容易となる。
Action With the above configuration, both electrodes are arranged in the same plane of the semiconductor, and by using the space between the electrodes as a sensitive portion, it is possible to perform measurement without impairing the energy information of the radiation even for incident radiation with a high counting rate. It will be possible. In addition, since both electrodes are provided on the same plane, it is very easy to mount as a multi-channel detector.

さらには、半導体の平行するもう一方の平面上に対称に
両電極を配置することにより入射放射線の入射深さ方向
の情報を得ることが可能となる。
Furthermore, by arranging both electrodes symmetrically on the other parallel plane of the semiconductor, it becomes possible to obtain information in the incident depth direction of the incident radiation.

以下、本発明の放射線検出器の実施例について図面を参
照しながら説明する。
Embodiments of the radiation detector of the present invention will be described below with reference to the drawings.

実施例 (実施例1) 第1図は本発明の一実施例の放射線検出器の基本構成を
示す図である。半導体結晶1の1つの平面上に共通電極
2と分割電極3をつける。半導体1を全空乏層として使
用するために、両電極2、3としてオーミック性電極を
形成する。例えば半導体1としてCdTeを使用する場合
は、PtまたはAu電極を形成すればよい。この電極を形成
した平面に垂直方向から放射線4を入射する。
Embodiment (Embodiment 1) FIG. 1 is a view showing the basic arrangement of a radiation detector according to an embodiment of the present invention. The common electrode 2 and the divided electrode 3 are provided on one plane of the semiconductor crystal 1. In order to use the semiconductor 1 as a total depletion layer, ohmic electrodes are formed as both electrodes 2 and 3. For example, when CdTe is used as the semiconductor 1, a Pt or Au electrode may be formed. Radiation 4 is incident on the plane on which this electrode is formed from the vertical direction.

第1図に示した放射線検出器の断面図を第2図に示す。
第2図中破線は両電極2、3間に電圧を印加したときの
電気力線を示す。図に示すように、電気力線は放射線入
射面に平行に走る。両電極2、3間に入射した放射線4
により発生した電荷は、電気力線にしたがって両電極に
走行する。このような構造であれば、放射線の入射深さ
に依存しない信号を得ることができる。
A sectional view of the radiation detector shown in FIG. 1 is shown in FIG.
The broken line in FIG. 2 indicates the line of electric force when a voltage is applied between the electrodes 2 and 3. As shown in the figure, the lines of electric force run parallel to the radiation entrance plane. Radiation 4 incident between both electrodes 2 and 3
The electric charges generated by the electric field travel to both electrodes according to the lines of electric force. With such a structure, a signal that does not depend on the incident depth of radiation can be obtained.

第3図に本実施例の放射線検出器を電極側からみた平面
図を示す。電気力線は共通電極に直角方向に走るので、
チャンネル間の分離は図中破線で示すようになる。
FIG. 3 shows a plan view of the radiation detector of this embodiment as seen from the electrode side. Since the lines of electric force run in the direction perpendicular to the common electrode,
The separation between the channels is as shown by the broken line in the figure.

さらに、電極2、3間の電界の分布を対称にするには、
第4図に示すように共通電極に切れ込みを入れることに
より解消できる。
Furthermore, to make the distribution of the electric field between the electrodes 2 and 3 symmetrical,
This can be solved by making a notch in the common electrode as shown in FIG.

また、本発明の構造は、特に半導体を全空乏層として使
用する場合は、電極間の表面状態が重要となる。水分、
コンタミネーションから半導体表面を保護するために、
第5図に示すように、例えばSiO2等の感応素子の表面に
形成された電極間にパッシベーション膜5を形成する。
ここで重要なことは、電極に形成されていない平面上に
も電界がかかるため、電極側と対称なパッシベーション
膜の形成が重要である。
Further, in the structure of the present invention, the surface state between the electrodes is important, especially when a semiconductor is used as the total depletion layer. moisture,
To protect the semiconductor surface from contamination,
As shown in FIG. 5, a passivation film 5 is formed between the electrodes formed on the surface of the sensitive element such as SiO 2 .
What is important here is that the electric field is applied even on a plane not formed on the electrode, so that it is important to form a passivation film symmetrical to the electrode side.

(実施例2) 第6図に本発明の他の実施例を示す。半導体の同一平面
に共通電極2を中心に、両側に分割電極を形成したもの
である。さらに、第7図に示すように、両側に形成する
分割電極を互いに2分の1ピッチずらして形成すること
により検出器の性能である感度を下げることなく空間分
離能を上げることができる。
(Embodiment 2) FIG. 6 shows another embodiment of the present invention. The divided electrodes are formed on both sides of the common electrode 2 centered on the same plane of the semiconductor. Further, as shown in FIG. 7, by forming the divided electrodes formed on both sides so as to be shifted from each other by a half pitch, it is possible to enhance the spatial separation ability without lowering the sensitivity which is the performance of the detector.

また半導体材料のτ(電荷の平均寿命)が小さい材料を
使用する場合、電荷の走行中に電荷の消滅が生じるた
め、電荷の走行距離すなわち電極間距離を多く取ること
ができない。そこで第8図に示すように、半導体1の同
一平面上に分割電極2を形成し、両側に共通電極を形成
する。この構成により、各チャネルの検出感度を落とす
ことなく電極間距離を小さくすることができる。
Further, when a material having a small τ (average life of electric charge) of the semiconductor material is used, the electric charge disappears while the electric charge travels, so that the electric charge traveling distance, that is, the distance between the electrodes cannot be increased. Therefore, as shown in FIG. 8, the divided electrodes 2 are formed on the same plane of the semiconductor 1 and the common electrodes are formed on both sides. With this configuration, the inter-electrode distance can be reduced without reducing the detection sensitivity of each channel.

(実施例3) 第9図に本発明の他の実施例を示す。半導体1の平行す
る2平面の1方の平面に、共通電極21と分割電極31を形
成し、もう1方の平面上に対称に同じ形状の共通電極22
と分割電極32を形成する。共通電極と分割電極に図に示
すようにそれぞれ電圧を印加すると、図に破線で示すよ
うに電気力線が走り、図中半導体1の中心線(一点鎖
線)を境にして上下対称な電界の分布となる。
(Embodiment 3) FIG. 9 shows another embodiment of the present invention. The common electrode 21 and the divided electrode 31 are formed on one of the two parallel planes of the semiconductor 1, and the common electrode 22 of the same shape is symmetrically formed on the other plane.
And the divided electrode 32 is formed. When voltages are applied to the common electrode and the divided electrodes respectively as shown in the figure, the lines of electric force run as shown by the broken lines in the figure, and the electric field that is vertically symmetrical with respect to the center line (dashed line) of the semiconductor 1 in the figure is a boundary. Distribution.

一方の面から放射線が入射すると、低いエネルギーの放
射線41は入射面の近傍で多く吸収される。すると発生し
た電荷は電気力線に沿って移動する。従って低いエネル
ギーの多くは分割電極31から電流パルスとして検出され
る。また高いエネルギーの放射線42は半導体1に全体に
わったって吸収されるため、分割電極31、分割電極32の
両方から電流パルスとして検出される。
When the radiation enters from one surface, a large amount of the low energy radiation 41 is absorbed in the vicinity of the entrance surface. Then, the generated charges move along the lines of electric force. Therefore, most of the low energy is detected as a current pulse from the split electrode 31. Further, since the high-energy radiation 42 is absorbed throughout the semiconductor 1, it is detected as a current pulse from both the divided electrodes 31 and 32.

このようにして、半導体材料の吸収係数と厚さを考慮す
ることにより、特定のエネルギーで分割した、エネルギ
ー弁別機構を有する検出器を得ることが可能となる。
(実施例4) 次に、よりエネルギー分解能を向上する方法についての
べる。放射線の入射位置と発生した電荷の走行の模式図
を第10図に示す。電極間隔をW,共通電極に負電圧を、分
割電極に正電圧を印加し、電極間隔をW,共通電極から放
射線の入射位置をXとすうと、発生した電子とホールは
図のように走行する。半導体材料が化合物半導体の場合
は、電子とホールの移動度が異なる。その電流波形は
(1)式を変形すると次のようになる。
In this way, by considering the absorption coefficient and the thickness of the semiconductor material, it is possible to obtain a detector having an energy discriminating mechanism that is divided by specific energy.
Example 4 Next, a method for further improving energy resolution will be described. A schematic diagram of the incident position of radiation and the travel of generated charges is shown in FIG. When the electrode interval is W, a negative voltage is applied to the common electrode, and a positive voltage is applied to the divided electrodes, and the electrode interval is W and the radiation incident position from the common electrode is X, the generated electrons and holes travel as shown To do. When the semiconductor material is a compound semiconductor, the mobilities of electrons and holes are different. The current waveform is as follows by modifying the equation (1).

i=q*dx/dt =q*μ*E (3) μ:移動度 E=電界強度 この電流波形を電荷の発生位置との関係で示した図が第
11図である。一般的に電子の移動度はホールに対して大
きいので、電子による電流値がホールによる電流値より
大きい。X〜Wの時の波形を同図(a)、X=1/2Wの波
形を同図(b),X〜0の時の波形を同図(c)に示す。
第11図から分かるように、電流波形は電子による波形が
支配的である。電子の走行時間Teは(4)式のようにな
る。
i = q * dx / dt = q * μ * E (3) μ: Mobility E = electric field strength The figure showing this current waveform in relation to the charge generation position is
11 is a diagram. Since the mobility of electrons is generally higher than that of holes, the current value of electrons is larger than that of holes. The waveforms for X to W are shown in FIG. 7A, the waveform for X = 1/2 W is shown in FIG. 7B, and the waveforms for X to 0 are shown in FIG.
As can be seen from FIG. 11, the current waveform is dominated by the electron waveform. The transit time Te of the electron is as shown in equation (4).

TE=(W−X)/μ*E (4) Teが小さい場合、電流パルス観測は、検出器の外部に接
続する電流増幅器の周波数特性により制限される。第12
図に電流増幅器の周波数特性と出力電流波形を示す。第
12図において(a)は電流増幅器の周波数特性を示し、
fcは電流増幅器のカットオフ周波数である。Teが非常に
小さく、Te<1<fcの場合は第12図中(b)に示すよう
に、増幅器からの出力パルス波形は増幅器のゲインより
は小さくなる。しかし、Teがより大きく、Te≧1/fcの場
合は、増幅器からの出力波形は(c),(d)に示すよ
うに、パルス波高値が一定となる。この条件を(4)式
を使用して書き直すと、(5)式のようになる。
TE = (W−X) / μ * E (4) When Te is small, the current pulse observation is limited by the frequency characteristic of the current amplifier connected to the outside of the detector. 12th
The figure shows the frequency characteristics of the current amplifier and the output current waveform. First
In FIG. 12, (a) shows the frequency characteristic of the current amplifier,
fc is the cutoff frequency of the current amplifier. When Te is very small and Te <1 <fc, the output pulse waveform from the amplifier becomes smaller than the gain of the amplifier as shown in (b) of FIG. However, when Te is larger and Te ≧ 1 / fc, the output waveform from the amplifier has a constant pulse peak value as shown in (c) and (d). If this condition is rewritten using the equation (4), it becomes the equation (5).

W−X≧μ*E/fc (5) 具体的な数値を代入して計算すると、半導体材料として
CdTeを使用し、電子の移動度をμ=1000(Cm2/VSec),
電界強度をE=1000(V/cm)、1/fc=10-7Secを(5)
式に代入すると、W−X=0.1cmとなる。すなはち、放
射線により発生した電子が少なくともW−X=0.1cm以
上走行するように放射線の入射を制限すればよい。
W−X ≧ μ * E / fc (5) When calculated by substituting specific numerical values, it is regarded as a semiconductor material.
Using CdTe, electron mobility μ = 1000 (Cm 2 / VSec),
The electric field strength is E = 1000 (V / cm), 1 / fc = 10 -7 Sec (5)
Substituting into the equation, W−X = 0.1 cm. That is, the incidence of the radiation may be limited so that the electrons generated by the radiation travel at least W−X = 0.1 cm or more.

放射線の入射制限方法を第13図に示す。分割電極側に分
割電極からW−Xの距離に放射線遮蔽物6を設ければよ
い。さらに効果を高めるには、共通電極側にも電気力線
の歪みのある部分上にも放射線遮蔽物を設けることによ
り、より効果を大きくできる。
Figure 13 shows the method of limiting the incidence of radiation. The radiation shield 6 may be provided on the split electrode side at a distance W-X from the split electrode. In order to further enhance the effect, the effect can be further enhanced by providing the radiation shield on the common electrode side as well as on the portion where the lines of electric force are distorted.

発明の効果 本発明によれば、化合物半導体のように電荷の移動度が
異なる材料を用いた放射線センサを使用して、電流増幅
器をもちいて高パルスレートの放射線光子の高速測定を
行う際に、電荷の移動距離を長くすることにより電荷の
発生位置に依存しない電流パルス波高を得ることができ
る。即ち、入射放射線のエネルギー情報を失うことな
く、高速パルス計測を行うことができる。さらに、電流
増幅器の周波数帯域を考慮して検出器上に放射線窓を配
置することによりより効果を高めることができる。
EFFECTS OF THE INVENTION According to the present invention, when a radiation sensor using materials having different charge mobilities such as compound semiconductors is used, high-speed measurement of a high pulse rate radiation photon is performed using a current amplifier, By increasing the moving distance of the electric charge, it is possible to obtain a current pulse wave height that does not depend on the position where the electric charge is generated. That is, high-speed pulse measurement can be performed without losing energy information of incident radiation. Further, the effect can be enhanced by disposing the radiation window on the detector in consideration of the frequency band of the current amplifier.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の第1の実施例の放射線検出器の斜視
図、第2図は同放射線検出器の断面図、第3図は同放射
線検出器の平面図、第4図は同放射線検出器の共通電極
の形状の一例を示す平面図、第5図は電極間に設ける保
護膜を示す放射線検出器の断面図、第6図、第7図及び
第8図は第2の実施例の放射線検出器の構成を示す図、
第9図は半導体の両面に対称に電極を設けた第3の実施
例の放射線検出器の断面図、第10図及び第11図は放射線
の入射位置と出力電流の関係を説明するための断面図及
び波形図、第12図は電流増幅器の周波数特性と電流パル
ス波形を示す波形図、第13図は検出器に放射線入射窓を
設けた第4の実施例の放射線検出器の断面図、第14図は
従来の放射線検出器の断面図である。 1……半導体、2……共通電極、3……分割電極、4…
…放射線。
1 is a perspective view of the radiation detector according to the first embodiment of the present invention, FIG. 2 is a sectional view of the radiation detector, FIG. 3 is a plan view of the radiation detector, and FIG. 4 is the radiation. FIG. 5 is a plan view showing an example of the shape of a common electrode of the detector, FIG. 5 is a sectional view of a radiation detector showing a protective film provided between the electrodes, and FIGS. 6, 7, and 8 are second embodiments. Diagram showing the configuration of the radiation detector of
FIG. 9 is a sectional view of a radiation detector of the third embodiment in which electrodes are symmetrically provided on both sides of a semiconductor, and FIGS. 10 and 11 are sectional views for explaining the relationship between the incident position of radiation and the output current. 12 and FIG. 12. FIG. 12 is a waveform diagram showing the frequency characteristics and current pulse waveforms of the current amplifier. FIG. 13 is a sectional view of the radiation detector of the fourth embodiment in which the radiation entrance window is provided in the detector. FIG. 14 is a sectional view of a conventional radiation detector. 1 ... semiconductor, 2 ... common electrode, 3 ... divided electrode, 4 ...
…radiation.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 馬場 末喜 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 船越 裕正 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 河原 俊之 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 ▲吉▼住 嘉之 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Sueki Baba 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (72) Hiromasa Funakoshi 1006 Kadoma, Kadoma City, Osaka Matsushita Electric Industrial Co., Ltd. (72) Inventor Toshiyuki Kawahara 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (72) Inventor ▲ Yoshikazu Sumitomo 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd.

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】放射線光子のエネルギーに対応した電気パ
ルス信号を出力する半導体放射線検出器であって、入射
放射線光子に感応する半導体の同一平面内に共通電極と
分割電極を設けたことを特徴とする放射線検出器。
1. A semiconductor radiation detector for outputting an electric pulse signal corresponding to the energy of a radiation photon, wherein a common electrode and a split electrode are provided in the same plane of a semiconductor sensitive to an incident radiation photon. Radiation detector.
【請求項2】半導体放射線検出器が全空乏層型であっ
て、共通電極に電圧を印加し、分割電極から電気信号を
取り出すことを特徴とした請求項(1)に記載の放射線
検出器。
2. The radiation detector according to claim 1, wherein the semiconductor radiation detector is a fully depleted layer type, and a voltage is applied to the common electrode to extract an electric signal from the divided electrodes.
【請求項3】共通電極と分割電極とを、電極間距離を一
定に保ち、且つ直線的に配置したことを特徴とする請求
項(1)に記載の放射線検出器。
3. The radiation detector according to claim 1, wherein the common electrode and the divided electrodes are arranged linearly while keeping the distance between the electrodes constant.
【請求項4】半導体の一平面のほぼ中央に配設した共通
電極の両側に分割電極を配置し、両側に配置した分割電
極を平行または2分の1ピッチずらして配置したことを
特徴とする請求項(1)、(2)、もしくは(3)に記
載の放射線検出器。
4. A divided electrode is arranged on both sides of a common electrode arranged substantially in the center of a plane of a semiconductor, and the divided electrodes arranged on both sides are arranged in parallel or shifted by a half pitch. The radiation detector according to claim (1), (2), or (3).
【請求項5】共通電極の両側に分割電極を配置し、共通
電極と一方の分割電極間の放射線有感部分に入射する放
射線の一部を制限するために、放射線入射側を原子番号
の高い材料で覆ったことを特徴とする請求項(4)に記
載の放射線検出器。
5. The divided electrodes are arranged on both sides of the common electrode, and the radiation incidence side has a high atomic number in order to limit a part of the radiation incident on the radiation sensitive portion between the common electrode and one of the divided electrodes. The radiation detector according to claim 4, wherein the radiation detector is covered with a material.
【請求項6】半導体の平行する2つの平面に、対称に共
通電極と分割電極を設けたことを特徴とする請求項
(1)記載の放射線検出器。
6. The radiation detector according to claim 1, wherein a common electrode and a split electrode are symmetrically provided on two parallel planes of the semiconductor.
【請求項7】放射線に感応する半導体の一平面に形成し
た共通電極と分割電極間の半導体表面及びもう一方の面
の半導体表面をパッシベーション膜で覆ったことを特徴
とする放射線検出器。
7. A radiation detector characterized in that a semiconductor surface between a common electrode and a split electrode formed on one plane of a semiconductor sensitive to radiation and a semiconductor surface on the other side are covered with a passivation film.
【請求項8】放射線に感応する半導体の一平面に共通電
極と分割電極を有する放射線検出素子と、高速電流増幅
器からなり、放射線により発生した電荷の内電子または
ホールの走行時間が高速電流増幅器のカットオフ周波数
の逆数時間以上長くなるように、放射線入射側に窓を設
けて放射線有感部分に制限を設けたことを特徴とする放
射線検出器。
8. A radiation detection element having a common electrode and a split electrode on one surface of a semiconductor sensitive to radiation, and a high-speed current amplifier, wherein the transit time of electrons or holes in the charge generated by the radiation of the high-speed current amplifier. A radiation detector characterized in that a window is provided on the radiation incident side to limit the radiation-sensitive portion so that the reciprocal time of the cutoff frequency becomes longer than a few hours.
JP63284514A 1988-11-10 1988-11-10 Radiation detector Expired - Fee Related JPH06105302B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP63284514A JPH06105302B2 (en) 1988-11-10 1988-11-10 Radiation detector
US07/435,219 US5111052A (en) 1988-11-10 1989-11-09 Radiation sensor and a radiation detecting apparatus using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63284514A JPH06105302B2 (en) 1988-11-10 1988-11-10 Radiation detector

Publications (2)

Publication Number Publication Date
JPH02129583A JPH02129583A (en) 1990-05-17
JPH06105302B2 true JPH06105302B2 (en) 1994-12-21

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ID=17679484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63284514A Expired - Fee Related JPH06105302B2 (en) 1988-11-10 1988-11-10 Radiation detector

Country Status (1)

Country Link
JP (1) JPH06105302B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005049144A (en) * 2003-07-30 2005-02-24 Toshiba Corp Radiation measuring method
US9123837B2 (en) * 2013-05-31 2015-09-01 Oxford Instruments Analytical Oy Semiconductor detector with radiation shield

Also Published As

Publication number Publication date
JPH02129583A (en) 1990-05-17

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