JPH0624990B2 - Optical element manufacturing method - Google Patents
Optical element manufacturing methodInfo
- Publication number
- JPH0624990B2 JPH0624990B2 JP62210432A JP21043287A JPH0624990B2 JP H0624990 B2 JPH0624990 B2 JP H0624990B2 JP 62210432 A JP62210432 A JP 62210432A JP 21043287 A JP21043287 A JP 21043287A JP H0624990 B2 JPH0624990 B2 JP H0624990B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- optical element
- main component
- base material
- shape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/082—Construction of plunger or mould for making solid articles, e.g. lenses having profiled, patterned or microstructured surfaces
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/10—Die base materials
- C03B2215/12—Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/22—Non-oxide ceramics
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/40—Product characteristics
- C03B2215/41—Profiled surfaces
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は高精度な形状を有する光学素子を安価に製造す
るための光学素子の製造方法に関するものである。TECHNICAL FIELD The present invention relates to an optical element manufacturing method for manufacturing an optical element having a highly accurate shape at low cost.
従来の技術 近年、光学素子または光学機器の高性能化，軽量化に伴
い、著しく高精度の素子が要求されてきている。たとえ
ばレンズでは非球面レンズをプレス成形により製造しよ
うと試みられている。このため型材料としてシリコンカ
ーバイドまたはシリコンナイトライドを用いたプレス成
形用型（特開昭５２−４５６１３号公報）や、タングス
テンカーバイドあるいはサーメットを母材として前記母
材上に被プレス材料と反応しない耐熱性膜をコーティン
グしたプレス成形用型（たとえば特願昭５９−９９０５
９号）などが提案されている。しかし前述した型材料を
高精度に加工する事はダイヤモンドバイトの摩耗が原因
となり非常にむずかしくプレス成形型のコストアップの
要因となっていた。これらの問題を解決するために、シ
リコンを母材として成形型（特願昭６０−１５５４０５
号）やＷＣ又はサーメット上にダイヤモンドバイトでの
加工性に時に優れた中間層をもうけ、この中間層を高精
度に加工した後、被プレス材料と反応しない耐熱性膜を
コーティングしたプレス成形用型（特開昭６０−１４０
８２４号）で光学素子をプレス成形する方法が提案され
ている。2. Description of the Related Art In recent years, as optical elements or optical devices have become higher in performance and lighter in weight, elements with extremely high accuracy have been required. For example, with regard to lenses, attempts have been made to manufacture aspherical lenses by press molding. For this reason, a press molding die (Japanese Patent Laid-Open No. 52-45613) using silicon carbide or silicon nitride as a die material, or a heat-resistant material that does not react with the material to be pressed on the base material using tungsten carbide or cermet as the base material Mold for press molding coated with a hydrophilic film (for example, Japanese Patent Application No. 59-9905).
No. 9) is proposed. However, it is very difficult to process the above-mentioned die material with high precision due to the wear of the diamond bite, which causes a cost increase of the press die. In order to solve these problems, a mold using silicon as a base material (Japanese Patent Application No. 60-155405).
No.), WC or cermet with an intermediate layer that is sometimes excellent in workability with a diamond bite, processed with high precision, and then coated with a heat-resistant film that does not react with the material to be pressed. (JP-A-60-140
No. 824), a method of press-molding an optical element is proposed.
発明が解決しようとする問題点 このようなシリコンを母材とした型材料では型のチッピ
ングが発生しやすいという欠点と、母材と耐熱性膜との
接着強度が得られにくいという欠点を有し、型の寿命と
しては不十分であった。また、ＷＣ又はサーメット上に
ダイヤモンドバイトでの加工性に特に優れた中間層をも
うけ、この中間層を高精度に加工した後、耐熱性膜をコ
ーティングして作製した成形型の場合も、中間層が比較
的やわらかいという欠点と中間層として成形した金属が
低融点のため成形温度で粒成長を起しプレス面の表面粗
度をくずしやすいという欠点があった。このため上記厚
生の成形型を用いて高精度な光学素子を安定かつ安価に
製造できないという問題点があった。Problems to be Solved by the Invention Such a mold material using silicon as a base material has a drawback that chipping of the mold is likely to occur and a drawback that it is difficult to obtain adhesive strength between the base material and the heat resistant film. The mold life was insufficient. Also, in the case of a molding die prepared by providing an intermediate layer having particularly excellent workability with a diamond bite on WC or cermet, processing this intermediate layer with high accuracy, and then coating it with a heat resistant film, the intermediate layer However, since the metal formed as an intermediate layer has a low melting point, grain growth occurs at the forming temperature and the surface roughness of the pressed surface is easily destroyed. Therefore, there is a problem that a highly accurate optical element cannot be stably and inexpensively manufactured using the welfare molding die.
問題点を解決するための手段 本発明は上記の問題点を解決するため耐熱性および高温
での強度に優れた材料を母材とし、この母材をある程度
所望する形状に近い形状に加工した後、被プレス材料と
の反応性に乏しく、高温強度に優れた耐熱性の膜を母材
上に被覆し、前記耐熱性膜上にレジストで所望のパター
ンを形成した後、湿式エッチング法あるいは乾式エッチ
ング法によりレジストおよび耐熱性膜の一部を所望の形
状にエッチング加工してプレス面を高精度な形状に作製
したプレス成形用型を用いることにより高精度な光学素
子を安定して製造しようとしたものである。Means for Solving the Problems In order to solve the above problems, the present invention uses a material excellent in heat resistance and strength at high temperature as a base material, and after processing the base material to a shape close to a desired shape to some extent. , A material having a low reactivity with the material to be pressed and having a high temperature strength and a heat resistant film is coated on the base material, and a desired pattern is formed on the heat resistant film with a resist, followed by a wet etching method or a dry etching method. We tried to stably manufacture high-precision optical elements by using a press-molding die in which a resist surface and a part of the heat-resistant film were etched into a desired shape by the method to make the press surface with a high-precision shape. It is a thing.
作用 本発明で、耐熱性に優れた高強度母材をある程度所望の
形状に近い形状に加工し、この上に高強度耐熱性膜をコ
ーティングした後、この耐熱性コーティング膜を高精度
にエッチング加工して高精度なプレス面をもつ成形型を
構成したものであり、比較的やわらかな金属を中間層と
して設けたり、もろくてかけやすいシリコンを母材とし
て用いたりする必要なく高精度なプレス面を得ることを
可能としたものである。以上の理由で、本発明の成形型
を用いることにより高精度な光学素子を安定かつ安価に
製造することができるようにしたものである。Action In the present invention, a high-strength base material having excellent heat resistance is processed into a shape close to a desired shape to some extent, a high-strength heat-resistant film is coated on this, and then the heat-resistant coating film is etched with high accuracy. This is a molding die with a highly accurate press surface, and it is not necessary to provide a relatively soft metal as an intermediate layer or to use a brittle and easy-to-use silicon as a base material. It was possible to obtain. For the above reasons, it is possible to stably and inexpensively manufacture a highly accurate optical element by using the molding die of the present invention.
実施例 以下本発明の光学素子の製造方法の一実施例について、
図面を用いて、詳細に説明する。Examples Hereinafter, with respect to an example of a method for manufacturing an optical element of the present invention,
This will be described in detail with reference to the drawings.
実施例１ 以下、本発明の実施例を第１図に沿って説明する。まず
たて５cm，よこ５cm，厚さ２cmの母材ＷＣ１１を鏡面研
磨してその表面粗度をＲＭＳ＝８〜１０Åに仕上げた後
第１図(b)に示すように耐熱性膜ＳｉＣｌ１２をイオン
ビームスパッタ法により成膜した。Example 1 Hereinafter, an example of the present invention will be described with reference to FIG. First, a base material WC11 having a vertical length of 5 cm, a horizontal length of 5 cm, and a thickness of 2 cm is mirror-polished to have a surface roughness of RMS = 8 to 10Å, and then the heat resistant film SiCl12 is ionized as shown in FIG. 1 (b). The film was formed by the beam sputtering method.
次に予め、レジスト及びＳｉＣのエッチングレートを求
めておき、ＳｉＣ膜上にレジスト１３を塗布した後、フ
ォトリソグラフィにより所望する最終形状が得られるよ
うパターンを形成したものが第１図(c)である。その
後、反応性ガスを用いたプラズマエッチングン法により
エッチングして最終のプレス面形状を有する型に作成し
たものが第１図(d)である。以上のようにし作成した成
形型を用いて、平板ガラスをプレス成形することにより
０．８μｍピッチで深さ０．５μｍの回折格子を安定に
製造することができた。Next, the resist and the etching rate of SiC are obtained in advance, the resist 13 is applied on the SiC film, and the pattern is formed by photolithography so that the desired final shape is obtained. is there. Then, FIG. 1 (d) shows that a mold having a final press surface shape was formed by etching by a plasma etching method using a reactive gas. By pressing the flat glass using the molding die prepared as described above, a diffraction grating having a pitch of 0.8 μm and a depth of 0.5 μm could be stably manufactured.
実施例２ 本発明の実施例２を第２図に沿って説明する。たて５c
m，よこ５cm，厚さ２cmの母材サーメット２１を鏡面研
磨してその表面粗度をＲＭＳ＝１８〜２２Åに仕上げた
後、第２図(b)に示したように耐熱性膜ＴｉＮ２２をイ
オンプレーティングタ法により成膜し、易加工性のＡｌ
をレジスト２３としてイオンプレーティングにより成膜
した。Second Embodiment A second embodiment of the present invention will be described with reference to FIG. 5c
After the base material cermet 21 of m, width 5 cm, and thickness 2 cm is mirror-polished to finish its surface roughness to RMS = 18 to 22Å, the heat resistant film TiN22 is ionized as shown in FIG. 2 (b). A film is formed by the plating method and easily processed Al
Was formed as a resist 23 by ion plating.
次に予め、Ａｌ及びＴｉＮのエッチングンレートを求め
ておき、エッチングにより所望する最終形状が得られる
ようダイヤモンドバイトによりＡｌ膜を切削加工したも
のが第２図(c)である。このようにして作った試料をプ
ラズマエッチングで処理することにより第２図(d)に示
したような形状の成形型を作製できた。この実施例によ
るとピッチ９０μｍ，深さ０．４μｍといった の比が非常に小さな回折格子の製造用成形型を簡単に作
製でき、この成形用型を使用して平板ガラスをプレスす
るとにより の非常に小さな回折格子を安定に精度良く製造できた。Next, FIG. 2 (c) shows that the etching rates of Al and TiN are obtained in advance and the Al film is cut by a diamond cutting tool so that a desired final shape can be obtained by etching. By processing the sample thus produced by plasma etching, a mold having a shape as shown in FIG. 2 (d) could be produced. According to this embodiment, the pitch is 90 μm and the depth is 0.4 μm. It is possible to easily make a mold for manufacturing a diffraction grating with a very small ratio of, and press flat glass using this mold. It was possible to stably and accurately manufacture a very small diffraction grating of.
実施例３ 本発明の実施例３を第３図に沿って説明する。直径２５
mmφ，高さ２０mmの母材サーメット３１をほぼ所望の形
状に近い半径をもつ球面に加工した後、第３図(b)に示
したようにスパッタによりＰｔ−Ｒｈ合金膜３２を形成
した。次にＰｔ−Ｒｈ合金膜３２上にＮｉ３３をスパッ
タ法により成膜し、予めＮｉ及びＰｔ−Ｒｈ合金膜のエ
ッチングレートを求めておき、エッチングにより所望す
る最終形状が得られるようダイヤモンドバイトによりＮ
ｉ膜を切削加工したものが第３図(c)である。続いてＨ
Ｃｌ，ＨＮＯ３，および過酸化水素水とから成る混酸水
溶液によりエッチングすることにより第３図(d)に示し
たような非球面形状を有する高精度な成形型を作成し
た。以上のように作成した成形型を用いてガラスをプレ
スすることにより非球面形状を有する高精度なレンズを
安定に製造することができた。Third Embodiment A third embodiment of the present invention will be described with reference to FIG. Diameter 25
A base material cermet 31 having a mmφ and a height of 20 mm was processed into a spherical surface having a radius close to a desired shape, and then a Pt-Rh alloy film 32 was formed by sputtering as shown in FIG. 3 (b). Next, Ni 33 is formed on the Pt-Rh alloy film 32 by a sputtering method, the etching rates of the Ni and Pt-Rh alloy films are obtained in advance, and N is formed by a diamond bite so that a desired final shape can be obtained by etching.
FIG. 3 (c) shows the i film cut. Then H
A highly accurate mold having an aspherical shape as shown in FIG. 3 (d) was prepared by etching with a mixed acid aqueous solution containing Cl, HNO 3 and hydrogen peroxide. By pressing the glass using the molding die prepared as described above, a highly accurate lens having an aspherical shape could be stably manufactured.
発明の効果 以上述べてきたように、本発明は多少加工性に劣るよう
な母材でも、ほぼ所望の形状に近い形状にさえ加工でき
れば、前記母材上に形成した耐熱性膜及びレジストをエ
ッチング加工することにより高精度なプレス面をもつ成
形型に簡単に作製することができるようにしたもので、
これにより従来加工性を考慮するため母材選択の自由度
があまりないという欠点を解決し、さらに高精度加工の
ために比較的やわらかな金属を中間層として設けるため
に型の寿命が十分でないというような欠点をも解決した
ものであり、本発明により高精度な光学素子を安定にプ
レス成形することを可能としたものである。EFFECTS OF THE INVENTION As described above, the present invention etches the heat resistant film and the resist formed on the base material as long as the base material is slightly inferior in processability as long as it can be processed into a shape close to a desired shape. By processing it, it is possible to easily make a mold with a highly accurate press surface,
This solves the disadvantage that there is not much freedom in selecting the base material in consideration of the conventional workability, and that the life of the mold is not sufficient because a relatively soft metal is provided as the intermediate layer for high precision processing. The present invention solves such a drawback, and the present invention enables stable press molding of a highly accurate optical element.
第１図は が１に近い回折格子を成形するための成形型の断面図、
第２図は が非常に小さい回折格子を成形するための成形型の断面
図、第３図は非球面レンズを成形するための成形型の断
面図である。 １１……母材ＷＣ、１２……耐熱性膜ＳｉＣ、１３……
レジスト、２１……母材サーメット、２２……耐熱性膜
ＴｉＮ、２３……レジスト、３１……母材サーメット、
３２……耐熱性膜Ｐｔ−Ｒｈ合金、３３……レジスト。Figure 1 Is a cross-sectional view of a molding die for molding a diffraction grating whose unit is close to 1.
Figure 2 Is a sectional view of a molding die for molding a diffraction grating having a very small value, and FIG. 3 is a sectional view of a molding die for molding an aspherical lens. 11 ... Base material WC, 12 ... Heat resistant film SiC, 13 ...
Resist, 21 ... Base material cermet, 22 ... Heat resistant film TiN, 23 ... Resist, 31 ... Base material cermet,
32 ... Heat resistant film Pt-Rh alloy, 33 ... Resist.
Claims (3)
母材とし、前記母材をある程度所望する形状に近い形状
に加工した後、被プレス材料との反応性に乏しく、高温
強度に優れた耐熱性の膜を母材上に被覆し、前記耐熱性
膜上にレジストで所望のパターンを形成した後、湿式エ
ッチング法あるいは乾式エッチング法によりレジストお
よび耐熱性膜の一部を所望の形状にエッチング加工して
プレス面を高精度な形状に作製した成形用型を使用して
光学素子をプレス成形することを特徴とする光学素子の
製造方法。1. A material having excellent heat resistance and strength at high temperature is used as a base material, and after the base material is processed into a shape close to a desired shape to some extent, it has poor reactivity with a material to be pressed and has high temperature strength. After coating a base material with an excellent heat resistant film and forming a desired pattern on the heat resistant film with a resist, a part of the resist and the heat resistant film is formed into a desired shape by a wet etching method or a dry etching method. 1. A method for manufacturing an optical element, which comprises press-molding an optical element using a molding die whose etching surface is formed into a highly precise shape by etching.
Ｎを主成分とするサーメット，ＴｉＣを主成分とするサ
ーメット，Ｃｒ３Ｃ２を主成分とするサーメット，ある
いはＡｌ２Ｏ３を主成分とするサーメットであることを
特徴とする特許請求の範囲第(1)項記載の光学素子の製
造方法。2. A base metal, a cemented carbide containing WC as a main component, and Ti.
A cermet containing N as a main component, a cermet containing TiC as a main component, a cermet containing Cr 3 C 2 as a main component, or a cermet containing Al 2 O 3 as a main component. The method for manufacturing an optical element according to the item (1).
は白金族金属を主成分とする合金膜，ちっ化物膜，炭化
物膜，あるいはホウ化物膜であることを特徴とする特許
請求の範囲第(1)項または第(2)項記載の光学素子の製造
方法。3. The heat-resistant coating film is a platinum group metal or an alloy film containing a platinum group metal as a main component, a fluoride film, a carbide film, or a boride film. ) Or the method for manufacturing the optical element according to the item (2).
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62210432A JPH0624990B2 (en) | 1987-08-25 | 1987-08-25 | Optical element manufacturing method |
| US07/235,301 US4842633A (en) | 1987-08-25 | 1988-08-23 | Method of manufacturing molds for molding optical glass elements and diffraction gratings |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62210432A JPH0624990B2 (en) | 1987-08-25 | 1987-08-25 | Optical element manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6452620A JPS6452620A (en) | 1989-02-28 |
| JPH0624990B2 true JPH0624990B2 (en) | 1994-04-06 |
Family
ID=16589223
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62210432A Expired - Fee Related JPH0624990B2 (en) | 1987-08-25 | 1987-08-25 | Optical element manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0624990B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3264729B2 (en) * | 1993-04-23 | 2002-03-11 | シチズン時計株式会社 | Stripping method of plating film |
| US7511813B2 (en) * | 2006-01-26 | 2009-03-31 | Schlumberger Technology Corporation | Downhole spectral analysis tool |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS623031A (en) * | 1985-06-27 | 1987-01-09 | Matsushita Electric Ind Co Ltd | Method for manufacturing optical glass elements |
-
1987
- 1987-08-25 JP JP62210432A patent/JPH0624990B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6452620A (en) | 1989-02-28 |
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