JPH062832B2 - Vacuum continuous processing device - Google Patents

Description

Description: FIELD OF THE INVENTION The present invention relates to an apparatus for continuously plasma-processing a flexible object such as a synthetic fiber or a plastic molded article such as vinyl chloride resin in a vacuum state. is there.

[Background of the Invention]

This type of vacuum continuous processing apparatus has already been filed by the applicant of the present application in Japanese Patent Application Laid-Open No. 57-195751. In this apparatus, a flexible object to be processed such as a plastic molded product is subjected to surface treatment while plasma discharge is performed between a drum negative electrode and a rod positive electrode in a vacuum processing chamber.

By the way, since the rod-shaped positive electrode is supported on the side wall in the vacuum processing chamber in a cantilever manner, the positive electrode becomes longer and the bending is caused by its own weight especially when the width of the object to be processed is large. In addition, the deflection also occurs due to the backlash of the support member. As a result, the intensity of the plasma discharge is not uniform between the two electrodes, so that uniform plasma processing cannot be obtained on the object to be processed due to uneven processing.

Further, the positive electrode is supported by an insulating bush made of a non-conductive material, and the creep phenomenon occurs in the bush due to long-term use. The deformation of the bush impairs the sealing effect in the vacuum processing chamber.

[Object of the Invention] An object of the present invention is to provide a vacuum continuous processing apparatus which is capable of performing a uniform surface treatment on an untreated product regardless of the width of the untreated product.

[Outline of Invention]

In order to achieve the above object, the present invention is characterized in that a cathode-shaped positive electrode is supported via a spherical seat so that the negative electrode and the positive electrode can be adjusted at a constant interval.

Example of Invention

 An embodiment of the present invention will be described below with reference to the drawings.

In FIGS. 1 and 2, reference numeral 1 is a vacuum processing chamber for continuously plasma-processing a flexible non-processed material F such as a plastic film such as a vinyl chloride resin film in a vacuum state, and 2 is a vacuum processing chamber 1. preliminary vacuum chamber to a plurality arranged in front of, 3 in the preliminary vacuum chamber to a plurality arranged on the rear side of the vacuum processing chamber 1, the vacuum processing chamber 1 by the vacuum pump 4 connected thereto 10 ^- Vacuum exhaust is performed through the exhaust pipe 5 so as to maintain the vacuum pressure of about ² Torr. The insides of the preliminary vacuum chambers 2 and 3 are evacuated via an exhaust pipe 7 so that a vacuum pump 6 connected to the preliminary vacuum chambers 2 and 3 maintains a vacuum pressure slightly higher than the vacuum pressure in the vacuum processing chamber 1 and gradually reduced from atmospheric pressure. Be evacuated.

The non-processed material F to be processed is sent to the vacuum processing chamber 1 through the preliminary vacuum chamber 2 on the front side of the unwinding device 8, where it is plasma-processed, and then passes through the preliminary vacuum chamber 3 on the rear side and the winding device. Winded up at 9. Reference numeral 10 is a drive motor, and the drive motor 10 includes a line shaft 11 and a continuously variable transmission 1.
The driving force is transmitted to the vacuum processing chamber 1, the preliminary vacuum chambers 2, 3 and the winding device 9 via 2, 13, 14, 15 so that the vacuum processing chamber 1, the preliminary vacuum chambers 2, 3 and the winding device 9 The rotation speed of each drive system is appropriately adjusted by the continuously variable transmissions 12, 13, 14, and 15.

FIG. 3 shows an outline of the vacuum processing chamber 1. The vacuum processing chamber 1 includes a drum-shaped negative electrode 16 and the negative electrode 16.
It is composed of at least one rod-shaped positive electrode 17 arranged on the outer peripheral side of the negative electrode 16 and at least one guide roller 18 for guiding the non-processed object F. These electrodes and the guide roller 18 are One side plate 19 is cantilevered and the other side plate 20 serves as an opening / closing door.

FIGS. 4 and 5 show a mounting structure of the rod-shaped positive electrode 17 of the present invention, and 21 is one spherical seat for supporting the positive electrode rotatably arbitrarily through an insulating bush or the like described later. The spherical seat 21 is attached to the side plate 19. Two
2 is an insulating bush made of fluorine resin,
The bush 22 and the spherical seat 21 are in spherical contact with each other. Reference numerals 23 and 24 denote O-rings for sealing the atmosphere side and the inside of the vacuum processing chamber 1, 25 denotes a taper holder, and an insulating taper bush 26 having a taper outer surface for fitting with the taper is inserted into the inner surface of the taper holder 25. Has been done,
The taper bush 26 is provided with a slit 26a in the radial direction for fixing the positive electrode 17 by tightening a pressing bolt 27 in the axial direction. 28 is the other spherical seat, 29 is an insulating bush, and this bush 29 and the spherical seat 28 are in spherical contact with each other. Reference numeral 30 denotes a sleeve inserted on the outer peripheral side of the insulating bushes 22 and 26. The sleeve 30 fixes the positive electrode 17 with a bolt 33. 31 is a plate supported by the holder 32 by the bolts 35, 34 is a spring interposed in the spherical seat 28,
The spring 34 has a function of pressing the insulating bush 26 against the spherical seat 21 via the spherical seat 28, the insulating bush 29, and the taper holder 25. The holder 32 is supported on the side plate 19 by bolts 36.

In the above configuration, a case will be described in which the interval between the drum-shaped negative electrode 16 and the rod-shaped positive electrode 17 is made constant in order to perform uniform plasma processing on the object F to be processed.

The fixing of the positive electrode 17 and the sleeve 29 is released by loosening the bolt 33 from the state shown in FIG. In this state, if the rod-shaped positive electrode 17 bends at its tip portion due to its own weight or looseness of parts, the positive electrode 17 and the insulating bush 22, the taper holder 25, the taper bush 26 for supporting the positive electrode 17 are attached to the spherical seats 21 and 28. If the tip of the rod-shaped positive electrode 17 is slightly lifted by rotating, the gap between the negative electrode 16 and the positive electrode 17 can be made substantially uniform. By tightening the bolt 33 with the position of the next positive electrode 17 determined, the position of the positive electrode 17 is securely fixed to the holder 32 via the sleeve 30.

Even if the insulating bush 26 changes due to a creep phenomenon or the like during a long period of use, the spring 34 always presses the insulating bush 22 against the spherical seat 21 via the spherical seat 28, the insulating bush 29, and the taper holder 25. Therefore, the sealing performance inside the vacuum processing chamber 1 is not impaired.

〔The invention's effect〕

According to the device of the present invention, since the positive electrode is supported via the spherical seat, it is possible to adjust the distance between the positive electrode and the negative electrode at a constant interval. A uniform surface treatment is performed without unevenness.

[Brief description of drawings]

1 is a schematic vertical sectional view of a vacuum continuous processing apparatus of the present invention, FIG. 2 is a schematic plan view of FIG. 1, FIG. 3 is a vertical sectional view of a vacuum processing chamber in the apparatus of the present invention, and FIG. FIG. 5 is a view for explaining a mounting state of a rod-shaped positive electrode in the device of the invention, and FIG. 5 is a view taken along the line VV of FIG. 1 ... Vacuum processing chamber, 2, 3 ... Preliminary vacuum chamber, 16 ... Cathode electrode,
Reference numeral 17 ... Positive electrode, 21, 28 ... Spherical seat, 22, 29 ... Insulation bush, 25 ... Taper holder, 26 ... Taper bush.

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Kenichi Kato 4-6 Kanda Surugadai, Chiyoda-ku, Tokyo Inside Hitachi, Ltd. (72) Inventor Susumu Ueno 1 Towada, Kamisu-cho, Kashima-gun, Ibaraki Shin-Etsu Chemical Industrial Co., Ltd. Inside the PVC Technical Research Institute (72) Inventor Hajime Hajime 1 Towada, Kamisu-cho, Kashima-gun, Ibaraki Pref. Shin-Etsu Chemical Co. Wada No. 1 Shin-Etsu Chemical Co., Ltd.

Claims (1)

[Claims] 1. A vacuum processing chamber is provided with a negative electrode and a rod-shaped positive electrode facing the negative electrode, and a flexible object to be processed is fed between these electrodes to process the surface of the object to be processed. In the vacuum continuous processing apparatus, the rod-shaped positive electrode is supported via a spherical seat so that both electrodes can be adjusted to a constant interval at all times.