JPH0635599B2 - Cleaning agent for mold making - Google Patents
Cleaning agent for mold makingInfo
- Publication number
- JPH0635599B2 JPH0635599B2 JP13131785A JP13131785A JPH0635599B2 JP H0635599 B2 JPH0635599 B2 JP H0635599B2 JP 13131785 A JP13131785 A JP 13131785A JP 13131785 A JP13131785 A JP 13131785A JP H0635599 B2 JPH0635599 B2 JP H0635599B2
- Authority
- JP
- Japan
- Prior art keywords
- carbon atoms
- group
- alkyl group
- cleaning agent
- ammonium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Molds, Cores, And Manufacturing Methods Thereof (AREA)
- Detergent Compositions (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は鋳型製造用洗浄剤に関する。TECHNICAL FIELD The present invention relates to a cleaning agent for mold making.
従来、鋳型を製造する際には樹脂と砂を混合し、これを
反応させ固着させたものを用いている。この時反応物が
模型、金枠、混練砂ホッパー等へ付着してその除去が従
来から問題になっている。特に、鋳型用粘結剤としてフ
ラン樹脂等の有機バインダーを用いた場合、有機バイン
ダーの付着が多いという問題があった。又、鋳型のベン
ト部(空気抜き部)に洗浄しがたい付着が起こりやすい
という問題もある。Conventionally, when a mold is manufactured, a resin and sand are mixed, and the mixture is reacted and fixed to the mold. At this time, the reaction product adheres to a model, a metal frame, a kneading sand hopper, etc., and its removal has been a problem conventionally. In particular, when an organic binder such as a furan resin is used as a binder for a mold, there is a problem that the organic binder is often attached. There is also a problem that it is easy to adhere to the vent (air vent) of the mold, which is difficult to clean.
従来、このような付着物を除去する方法として、ハンマ
やブラシ、ショットプラスト等で物理的に除去する方
法、適当な溶媒を用いて溶解除去する方法等が提案され
ている。Heretofore, as a method for removing such an adhered substance, a method of physically removing with a hammer, a brush, a shot plast, etc., a method of dissolving and removing with an appropriate solvent, etc. have been proposed.
しかしながら、物理的方法では複雑な構造の鋳型の場
合、人間が手作業で行わざるを得ず、労力と時間を要
し、その上傷が付き易く、最良の方法とは言い難い。溶
媒法では除去に通常1週間以上を要し、しかもしばしば
除去が不完全で、処理後、更にブラッシング等を行う必
要があった。However, in the case of a mold having a complicated structure, it is difficult to say that it is the best method in the case of a mold having a complicated structure, because a human has to do it manually, which requires labor and time, and is easily scratched. In the solvent method, the removal usually requires one week or more, and often the removal is incomplete, and it is necessary to further brush after the treatment.
又、特開昭59-153542 号公報には、ジメチルスルホキシ
ドと、フッ素系界面活性剤、炭化水素系アニオン界面活
性剤等の界面活性剤を含有する鋳難付着物除去剤が開示
されている。しかしながら、この除去剤も十分に付着物
を除去することができない。Further, JP-A-59-153542 discloses a difficult-to-cast deposit removing agent containing dimethyl sulfoxide and a surfactant such as a fluorine-based surfactant and a hydrocarbon-based anion surfactant. However, this removing agent also cannot sufficiently remove the deposits.
本発明者らは、かかる従来の問題点を解決すべく鋭意研
究の結果、本発明を完成するに至った。The present inventors have completed the present invention as a result of intensive research to solve the above conventional problems.
即ち、本発明は、鋳型製造時に付着する汚染物の洗浄剤
であって、次の(a)〜(e)の少なくとも一種の溶剤からな
るか、次の(a)〜(e)の少なくとも一種の溶剤と、次の
(A) 〜(D) の少なくとも一種の界面活性剤とからなる
か、或いは次の(a)〜(e)の少なくとも一種の溶剤と、次
の(A)〜(D)の少なくとも一種の界面活性剤と、次のイ)
〜ホ)の少なくとも一種の溶剤とからなることを特徴と
する鋳型製造用洗浄剤を提供するものである。That is, the present invention is a cleaning agent for contaminants attached during mold production, which consists of at least one solvent of the following (a) ~ (e), or at least one of the following (a) ~ (e) With the solvent of
(A) ~ (D) consisting of at least one surfactant, or (a) ~ (e) at least one solvent and the following (A) ~ (D) at least one interface Activator and the following a)
The present invention provides a cleaning agent for producing a mold, which comprises at least one solvent of
(a) R1CN (但しR1は炭素数1〜4のアルキル基又はアルケニル
基)。(a) R 1 CN (wherein R 1 is an alkyl group or an alkenyl group having 1 to 4 carbon atoms).
(b) R2COOH (但しR2はH 又は炭素数1〜3のアルキル基又はヒドロ
キシル基置換アルキル基)。(b) R 2 COOH (wherein R 2 is H or an alkyl group having 1 to 3 carbon atoms or a hydroxyl group-substituted alkyl group).
(c)炭素数が1〜4のハロゲン化飽和炭化水素 (但し沸点が45℃以下のものは除く)。(c) Halogenated saturated hydrocarbon having 1 to 4 carbon atoms (excluding those having a boiling point of 45 ° C or lower).
(d) R3OCH2CH2OR4 (但しR3は炭素数1〜4のアルキル基で、R4はH 、炭素
数1〜4のアルキル基又はアシル基)。(d) R 3 OCH 2 CH 2 OR 4 (wherein R 3 is an alkyl group having 1 to 4 carbon atoms, R 4 is H, an alkyl group having 1 to 4 carbon atoms or an acyl group).
(e)炭素数4〜6の環状エーテル。(e) Cyclic ether having 4 to 6 carbon atoms.
(A) (但しR6は炭素数8〜18の脂肪族炭化水素基で、M はN
a,K, アンモニウムもしくはアルカノールアンモニウム
基)。(A) (However, R 6 is an aliphatic hydrocarbon group having 8 to 18 carbon atoms, and M is N
a, K, ammonium or alkanol ammonium groups).
(B) R5OSO3M (但しR5は炭素数8〜20の脂肪族炭化水素基で、M はN
a,K, アンモニウムもしくはアルカノールアンモニウム
基)。(B) R 5 OSO 3 M (where R 5 is an aliphatic hydrocarbon group having 8 to 20 carbon atoms, and M is N
a, K, ammonium or alkanol ammonium groups).
(C) (但しR5は炭素数8〜20の脂肪族炭化水素基で、M はN
a,K, アンモニウムもしくはアルカノールアンモニウム
基、n1は1〜20の整数)。(C) (However, R 5 is an aliphatic hydrocarbon group having 8 to 20 carbon atoms, and M is N
a, K, ammonium or alkanol ammonium group, n 1 is an integer of 1 to 20).
(D) (但し、R5は炭素数8〜20の脂肪族炭化水素基で、n3は
1〜100)。(D) (However, R 5 is an aliphatic hydrocarbon group having 8 to 20 carbon atoms, and n 3 is 1 to 100).
イ)炭素数3〜8の脂肪族ケトン。A) An aliphatic ketone having 3 to 8 carbon atoms.
ロ)炭素数5〜8の脂環族ケトン。B) An alicyclic ketone having 5 to 8 carbon atoms.
ハ)炭素数6〜12の芳香族炭化水素。C) Aromatic hydrocarbons having 6 to 12 carbon atoms.
ニ)炭素数6〜8のハロゲン化芳香族炭化水素。D) A halogenated aromatic hydrocarbon having 6 to 8 carbon atoms.
ホ)炭素数2〜8の脂肪族エステル。E) An aliphatic ester having 2 to 8 carbon atoms.
本発明の洗浄剤の主有効成分である前記(a)〜(e)の少な
くとも一種の化合物の含有量は10重量%以上が好まし
い。又、(A) 〜(D) の少なくとも一種の界面活性剤の含
有量は0.1 〜20重量%の範囲が適当である。上記イ)〜
ホ)の少なくとも一種の溶剤の含有量は上記(a)〜(e)の
少なくとも一種の溶剤及び(A) 〜(D) の少なくとも一種
の界面活性剤の含有量の残部であるが、本発明の洗浄剤
は若干の水を含有していてもよい。The content of at least one compound (a) to (e), which is the main active ingredient of the detergent of the present invention, is preferably 10% by weight or more. Further, the content of at least one surfactant of (A) to (D) is appropriately in the range of 0.1 to 20% by weight. B) above
The content of at least one solvent of (e) is the balance of the content of at least one solvent of (a) to (e) and at least one surfactant of (A) to (D), but the present invention The cleaning agent may contain some water.
本発明の洗浄剤は、特に常温自硬性又はガス硬化性有機
バインダーを粘結剤とし鋳型を製造する際の模型の洗浄
に使用すると好適である。The cleaning agent of the present invention is preferably used for cleaning a model when a mold is manufactured, using a room-temperature self-hardening or gas-curing organic binder as a binder.
以下、実施例により本発明を更に詳細に説明するが、本
発明はこれらの実施例に限定されるものではない。Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to these Examples.
実施例1〜2及び比較例1〜2 硅砂にフラン樹脂と有機スルホン酸系硬化剤を添加して
鋳型を製造するフラン自硬性で、30kg/Batのミキサーに
硅砂30kg、フラン樹脂360 g、キシレンスルホン酸系硬
化剤150 gを添加して1分間混練後排出した。Examples 1-2 and Comparative Examples 1-2 Furan resin and organic sulfonic acid-based curing agent are added to silica sand to produce a mold. Furan self-hardening, 30 kg / Bat mixer, 30 kg silica sand, 360 g furan resin, xylene. 150 g of a sulfonic acid type curing agent was added, and the mixture was kneaded for 1 minute and then discharged.
これを100 回繰り返し行いミキサー及び混合羽根に付着
した硅砂含有付着物に表1に示す洗浄剤を一定量塗布
し、除去性及び発錆状況、除去後の混練砂の硬化性を評
価した。This was repeated 100 times, and a certain amount of the cleaning agent shown in Table 1 was applied to the silica-containing deposits adhering to the mixer and the mixing blades, and the removability and rusting condition, and the curability of the kneaded sand after removal were evaluated.
結果を表1に示す。The results are shown in Table 1.
実施例3〜4及び比較例3〜4 硅砂にフラン樹脂と有機スルホン酸系硬化剤を添加して
鋳型を製造するフラン自硬性で、再生硅砂1000重量部、
フラン樹脂8重量部、トルエンスルホン酸系硬化剤4重
量部を用いて鋳型を製造した。繰り返し50回成型した鋳
型製造用模型、金枠に付着した汚染物除去のため、表2
に示す洗浄剤を塗布し、除去性、発錆、清掃除去後の成
型性を評価した。 Examples 3 to 4 and Comparative Examples 3 to 4 Furan resin and an organic sulfonic acid type curing agent are added to silica sand to produce a mold. Furan is self-hardening and 1000 parts by weight of regenerated silica sand,
A mold was produced using 8 parts by weight of furan resin and 4 parts by weight of a toluene sulfonic acid type curing agent. A model for mold production, which was repeatedly molded 50 times, to remove contaminants adhering to the metal frame.
The following cleaning agents were applied, and the removability, rusting, and moldability after cleaning and removal were evaluated.
結果を表2に示す。The results are shown in Table 2.
Claims (5)
って、次の(a)〜(e)の少なくとも一種の溶剤からなるこ
とを特徴とする鋳型製造用洗浄剤。 (a) R1CN (但しR1は炭素数1〜4のアルキル基又はアルケニル
基)。 (b) R2COOH (但しR2はH 又は炭素数1〜3のアルキル基又はヒドロ
キシル基置換アルキル基)。 (c)炭素数が1〜4のハロゲン化飽和炭化水素 (但し沸点が45℃以下のものは除く)。 (d) R3OCH2CH2OR4 (但しR3は炭素数1〜4のアルキル基で、R4はH 、炭素
数1〜4のアルキル基又はアシル基)。 (e)炭素数4〜6の環状エーテル。1. A cleaning agent for a mold, which is a cleaning agent for contaminants attached during the manufacturing of a mold and is composed of at least one of the following solvents (a) to (e). (a) R 1 CN (wherein R 1 is an alkyl group or an alkenyl group having 1 to 4 carbon atoms). (b) R 2 COOH (wherein R 2 is H or an alkyl group having 1 to 3 carbon atoms or a hydroxyl group-substituted alkyl group). (c) Halogenated saturated hydrocarbon having 1 to 4 carbon atoms (excluding those having a boiling point of 45 ° C or lower). (d) R 3 OCH 2 CH 2 OR 4 (wherein R 3 is an alkyl group having 1 to 4 carbon atoms, R 4 is H, an alkyl group having 1 to 4 carbon atoms or an acyl group). (e) Cyclic ether having 4 to 6 carbon atoms.
が10重量%以上である特許請求の範囲第1項記載の洗浄
剤。2. The cleaning agent according to claim 1, wherein the content of at least one solvent of (a) to (e) is 10% by weight or more.
って、次の(a)〜(e)の少なくとも一種の溶剤と、次の
(A) 〜(D) の少なくとも一種の界面活性剤とからなるこ
とを特徴とする鋳型製造用洗浄剤。 (a) R1CN (但しR1は炭素数1〜4のアルキル基又はアルケニル
基)。 (b) R2COOH (但しR2はH 又は炭素数1〜3のアルキル基又はヒドロ
キシル基置換アルキル基)。 (c)炭素数が1〜4のハロゲン化飽和炭化水素 (但し沸点が45℃以下のものは除く)。 (d) R3OCH2CH2OR4 (但しR3は炭素数1〜4のアルキル基で、R4はH 、炭素
数1〜4のアルキル基又はアシル基)。 (e)炭素数4〜6の環状エーテル。 (A) (但しR6は炭素数8〜18の脂肪族炭化水素基で、M はN
a,K, アンモニウムもしくはアルカノールアンモニウム
基)。 (B) R5OSO3M (但しR5は炭素数8〜20の脂肪族炭化水素基で、M はN
a,K, アンモニウムもしくはアルカノールアンモニウム
基)。 (C) (但しR5は炭素数8〜20の脂肪族炭化水素基で、M はN
a,K, アンモニウムもしくはアルカノールアンモニウム
基、n1は1〜20の整数)。 (D) (但し、R5は炭素数8〜20の脂肪族炭化水素基で、n3は
1〜100 )。3. A cleaning agent for contaminants attached during mold production, comprising at least one solvent of the following (a) to (e) and the following:
A cleaning agent for producing a mold, comprising at least one surfactant of (A) to (D). (a) R 1 CN (wherein R 1 is an alkyl group or an alkenyl group having 1 to 4 carbon atoms). (b) R 2 COOH (wherein R 2 is H or an alkyl group having 1 to 3 carbon atoms or a hydroxyl group-substituted alkyl group). (c) Halogenated saturated hydrocarbon having 1 to 4 carbon atoms (excluding those having a boiling point of 45 ° C or lower). (d) R 3 OCH 2 CH 2 OR 4 (wherein R 3 is an alkyl group having 1 to 4 carbon atoms, R 4 is H, an alkyl group having 1 to 4 carbon atoms or an acyl group). (e) Cyclic ether having 4 to 6 carbon atoms. (A) (However, R 6 is an aliphatic hydrocarbon group having 8 to 18 carbon atoms, and M is N
a, K, ammonium or alkanol ammonium groups). (B) R 5 OSO 3 M (where R 5 is an aliphatic hydrocarbon group having 8 to 20 carbon atoms, and M is N
a, K, ammonium or alkanol ammonium groups). (C) (However, R 5 is an aliphatic hydrocarbon group having 8 to 20 carbon atoms, and M is N
a, K, ammonium or alkanol ammonium group, n 1 is an integer of 1 to 20). (D) (However, R 5 is an aliphatic hydrocarbon group having 8 to 20 carbon atoms, and n 3 is 1 to 100).
の含有量が0.1 〜20重量%である特許請求の範囲第3項
記載の洗浄剤。4. The cleaning agent according to claim 3, wherein the content of at least one surfactant of (A) to (D) is 0.1 to 20% by weight.
って、次の(a)〜(e)の少なくとも一種の溶剤と、次の
(A) 〜(D) の少なくとも一種の界面活性剤と、次のイ)
〜ホ)の少なくとも一種の溶剤とからなることを特徴と
する鋳型製造用洗浄剤。 (a) R1CN (但しR1は炭素数1〜4のアルキル基又はアルケニル
基)。 (b) R2COOH (但しR2はH 又は炭素数1〜3のアルキル基又はヒドロ
キシル基置換アルキル基)。 (c)炭素数が1〜4のハロゲン化飽和炭化水素 (但し沸点が45℃以下のものは除く)。 (d) R3OCH2CH2OR4 (但しR3は炭素数1〜4のアルキル基で、R4はH 、炭素
数1〜4のアルキル基又はアシル基)。 (e)炭素数4〜6の環状エーテル。 (A) (但しR6は炭素数8〜18の脂肪族炭化水素基で、M はN
a,K, アンモニウムもしくはアルカノールアンモニウム
基)。 (B) R5OSO3M (但しR5は炭素数8〜20の脂肪族炭化水素基で、M はN
a,K, アンモニウムもしくはアルカノールアンモニウム
基)。 (C) (但しR5は炭素数8〜20の脂肪族炭化水素基で、M はN
a,K, アンモニウムもしくはアルカノールアンモニウム
基、n1は1〜20の整数)。 (D) (但し、R5は炭素数8〜20の脂肪族炭化水素基で、n3は
1〜100 )。 イ)炭素数3〜8の脂肪族ケトン。 ロ)炭素数5〜8の脂環族ケトン。 ハ)炭素数6〜12の芳香族炭化水素。 ニ)炭素数6〜8のハロゲン化芳香族炭化水素。 ホ)炭素数2〜8の脂肪族エステル。5. A cleaning agent for contaminants attached during mold production, comprising at least one of the following solvents (a) to (e) and the following:
(A) to (D) at least one surfactant and the following a)
A cleaning agent for producing a mold, comprising at least one solvent of (a) R 1 CN (wherein R 1 is an alkyl group or an alkenyl group having 1 to 4 carbon atoms). (b) R 2 COOH (wherein R 2 is H or an alkyl group having 1 to 3 carbon atoms or a hydroxyl group-substituted alkyl group). (c) Halogenated saturated hydrocarbon having 1 to 4 carbon atoms (excluding those having a boiling point of 45 ° C or lower). (d) R 3 OCH 2 CH 2 OR 4 (wherein R 3 is an alkyl group having 1 to 4 carbon atoms, R 4 is H, an alkyl group having 1 to 4 carbon atoms or an acyl group). (e) Cyclic ether having 4 to 6 carbon atoms. (A) (However, R 6 is an aliphatic hydrocarbon group having 8 to 18 carbon atoms, and M is N
a, K, ammonium or alkanol ammonium groups). (B) R 5 OSO 3 M (where R 5 is an aliphatic hydrocarbon group having 8 to 20 carbon atoms, and M is N
a, K, ammonium or alkanol ammonium groups). (C) (However, R 5 is an aliphatic hydrocarbon group having 8 to 20 carbon atoms, and M is N
a, K, ammonium or alkanol ammonium group, n 1 is an integer of 1 to 20). (D) (However, R 5 is an aliphatic hydrocarbon group having 8 to 20 carbon atoms, and n 3 is 1 to 100). A) An aliphatic ketone having 3 to 8 carbon atoms. B) An alicyclic ketone having 5 to 8 carbon atoms. C) Aromatic hydrocarbons having 6 to 12 carbon atoms. D) A halogenated aromatic hydrocarbon having 6 to 8 carbon atoms. E) An aliphatic ester having 2 to 8 carbon atoms.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13131785A JPH0635599B2 (en) | 1985-06-17 | 1985-06-17 | Cleaning agent for mold making |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13131785A JPH0635599B2 (en) | 1985-06-17 | 1985-06-17 | Cleaning agent for mold making |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61291696A JPS61291696A (en) | 1986-12-22 |
| JPH0635599B2 true JPH0635599B2 (en) | 1994-05-11 |
Family
ID=15055120
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13131785A Expired - Lifetime JPH0635599B2 (en) | 1985-06-17 | 1985-06-17 | Cleaning agent for mold making |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0635599B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2549829B2 (en) * | 1995-01-05 | 1996-10-30 | 日東電工株式会社 | Cleaning mold for semiconductor mold |
-
1985
- 1985-06-17 JP JP13131785A patent/JPH0635599B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61291696A (en) | 1986-12-22 |
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