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JPH0641920B2 - Foreign object detection method and apparatus - Google Patents
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JPH0641920B2 - Foreign object detection method and apparatus - Google Patents

Foreign object detection method and apparatus

Info

Publication number
JPH0641920B2
JPH0641920B2 JP29991686A JP29991686A JPH0641920B2 JP H0641920 B2 JPH0641920 B2 JP H0641920B2 JP 29991686 A JP29991686 A JP 29991686A JP 29991686 A JP29991686 A JP 29991686A JP H0641920 B2 JPH0641920 B2 JP H0641920B2
Authority
JP
Japan
Prior art keywords
light
inspected
foreign matter
photoelectric conversion
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP29991686A
Other languages
Japanese (ja)
Other versions
JPS63153451A (en
Inventor
幸雄 宇都
光義 小泉
良正 大島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP29991686A priority Critical patent/JPH0641920B2/en
Publication of JPS63153451A publication Critical patent/JPS63153451A/en
Publication of JPH0641920B2 publication Critical patent/JPH0641920B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、縮小投影露光装置に使用される枠上にペリク
ルを張付けた異物付着防止手段を回路パターンを形成し
たレチクル上に装着したレチクル装置等において、ペリ
クル面等の被検査物表面上の異物を検出するのに好適な
異物検出方法およびその装置に関する。
Description: TECHNICAL FIELD The present invention relates to a reticle device in which foreign matter adhesion preventing means in which a pellicle is attached to a frame used in a reduction projection exposure apparatus is mounted on a reticle having a circuit pattern formed thereon. For example, the present invention relates to a foreign matter detection method and apparatus suitable for detecting foreign matter on the surface of an object to be inspected such as a pellicle surface.

[従来の技術] 従来のこの種の異物検出装置はたとえば特開昭60-67845
号に記載されているように、フォトマスクおよびレチク
ルなどのガラス基板上に離間して貼られたペリクルと称
する薄膜等の被検査物表面に対し斜方向から平行ビーム
を帯状に照射し、帯状照射部に存在する異物の散乱光を
結像レンズにより集光して一次元イメージセンサ上に結
像させることによって検出するものが提案されている。
[Prior Art] A conventional foreign matter detection device of this type is disclosed in, for example, Japanese Patent Laid-Open No. 60-67845.
As described in No. 6, a parallel beam is applied as a strip from a diagonal direction to the surface of an object to be inspected, such as a thin film called a pellicle, which is affixed on a glass substrate such as a photomask and a reticle, with a strip-like irradiation. There is proposed a method in which scattered light of a foreign substance existing in a portion is detected by focusing it by an imaging lens and forming an image on a one-dimensional image sensor.

[発明が解決しようとする問題点] 前記従来技術は、単数の結像レンズで被検査物表面の照
明領域全面を見込みその像を一次元イメージセンサ上に
結像させ、照明領域内に存在する異物の散乱反を検出す
るもので、異物以外からの迷光の影響を避けるため、煽
り光学系を用いている。しかし、煽り光学系であるため
結像レンズの開口数(NA)が異なることから、結像倍
率が異なり、薄膜等の被検査物表面の帯状照明部の中央
部と端部とでは同一異物の散乱光強度が異なっており、
異物検出の基準レベル(閾値)をこれに合わせて設定す
る必要があるという課題を有していた。
[Problems to be Solved by the Invention] In the above-mentioned conventional technology, the entire image of the illumination area on the surface of the object to be inspected is projected by a single imaging lens to form an image on the one-dimensional image sensor, and the image exists in the illumination area. It detects the scattering reaction of foreign matter, and uses a tilting optical system to avoid the influence of stray light from other than foreign matter. However, since the numerical aperture (NA) of the imaging lens is different because it is a tilting optical system, the imaging magnification is different, and the same foreign matter is present in the central portion and the end portion of the strip illumination portion on the surface of the inspection object such as a thin film. The scattered light intensity is different,
There is a problem in that it is necessary to set the reference level (threshold value) for foreign matter detection in accordance with this.

本発明の目的は、上記従来技術の課題を解決すべく、被
検査物表面上において各結像レンズによる光量むらの影
響をなくして同一の検出感度で、しかも検出結像領域以
外からの迷光の影響を受けることなく、簡単な構成によ
り迅速に検出することができるようにした異物検出方法
およびその装置を提供することにある。
The object of the present invention is to solve the above-mentioned problems of the prior art by eliminating the influence of the unevenness of the light amount by each imaging lens on the surface of the object to be inspected, with the same detection sensitivity, and of stray light from other than the detection imaging region. An object of the present invention is to provide a foreign matter detection method and an apparatus therefor which can be quickly detected by a simple configuration without being affected.

[問題点を解決するための手段] 本発明は、上記目的を達成するために、被検査物を走査
手段により所定方向に直線状に走査し、該直線状に走査
された被検査物表面上に複数の発光素子を配列して構成
した集束帯状光ビーム照射手段により垂直方向から所望
の傾斜角度を有する斜め方向でほぼ前記走査方向から該
走査方向に対してほぼ直角方向に延びた集束帯状光ビー
ムを照射し、該照射された集束帯状光ビームにより被検
査物表面上からの散乱反射光を、光軸方向を前記被検査
物表面に対してほぼ垂直状態にして前記被検査物表面の
結像領域が帯状方向に重なりあうように前記帯状方向に
千鳥状に配置された複数の結像レンズから構成された結
像レンズ群で集光して結像位置に結像させ、該結像位置
に設けられ、前記帯状方向に延びたスリット状の開口で
形成された遮光手段により前記被検査物表面の検出領域
以外から発生する散乱反射光を遮光し、前記遮光手段を
透過して結像される散乱反射光像の各々を前記複数の結
像レンズに対応させた配置された複数の光電変換手段の
各々で受光し、該複数の光電変換手段の各々から得られ
る信号に基づいて前記被検査物表面上に付着した異物を
検出することを特徴とする異物検出方法である。また本
発明は、被検査物を所定方向に直線状に走査する走査手
段と、該走査手段で直線状に走査された被検査物表面上
に垂直方向から所望の傾斜角度を有する斜め方向でほぼ
前記走査方向から該走査方向に対してほぼ直角方向に延
びた集束帯状光ビームを照射する複数の発光素子を配列
して構成した集束帯状光ビーム照射手段と、該集束帯状
光ビーム照射手段により照射された集束帯状光ビームに
より被検査物表面上からの散乱反射光を集光して結像位
置に結像させるように、光軸方向を前記被検査物表面に
対してほぼ垂直状態にして前記被検査物表面の結像領域
が帯状方向に重なりあうように前記帯状方向に千鳥状に
配置された複数の結像レンズから構成された結像レンズ
群と、該結像位置に設けられ、更に前記帯状方向に延び
たスリット状の開口で形成され、前記被検査物表面の検
出結像領域以外から発生する散乱反射光を遮光する遮光
手段と、前記複数の結像レンズに対応させて配置され、
前記遮光手段を透過して結像される散乱反射光像の各々
を受光する複数の光電変換手段とを備え、該複数の光電
変換手段の各々から得られる信号に基づいて前記被検査
物表面上に付着した異物を検出するように構成したこと
を特徴とする異物検出装置である。また本発明は、前記
異物検出装置において、前記複数の光電変換手段とし
て、リニアイメージセンサで構成したことを特徴とす
る。また本発明は、前記異物検出装置において、前記遮
光手段のスリット状の開口の長手方向の長さを可変に構
成したことを特徴とする。
[Means for Solving the Problems] In order to achieve the above object, the present invention scans an object to be inspected linearly in a predetermined direction by a scanning means, and the surface of the object to be inspected scanned linearly. Focused band-shaped light extending substantially from the scanning direction to a direction substantially perpendicular to the scanning direction in a diagonal direction having a desired inclination angle from the vertical direction by a focused-band light beam irradiation means configured by arranging a plurality of light emitting elements The beam is irradiated, and the scattered and reflected light from the surface of the object to be inspected is irradiated by the focused band-shaped light beam so that the optical axis direction is substantially perpendicular to the surface of the object to be inspected. An image forming lens group composed of a plurality of image forming lenses arranged in a zigzag pattern in the band direction so that the image areas overlap each other is condensed and imaged at the image forming position. Provided in the strip and extending in the strip direction. The scattered reflection light generated from areas other than the detection area on the surface of the object to be inspected is shielded by the light shielding means formed by the window-shaped opening, and each of the scattered reflection light images formed by passing through the light shielding means is described above. The plurality of photoelectric conversion units arranged corresponding to the plurality of imaging lenses receive light, and the foreign matter attached on the surface of the inspection object is detected based on the signal obtained from each of the plurality of photoelectric conversion units. And a foreign matter detection method. Further, according to the present invention, a scanning means for linearly scanning an object to be inspected in a predetermined direction, and an almost oblique direction having a desired inclination angle from a vertical direction on the surface of the object to be inspected linearly scanned by the scanning means. Focusing band light beam irradiating means constituted by arranging a plurality of light emitting elements for irradiating a focusing band light beam extending from the scanning direction in a direction substantially perpendicular to the scanning direction, and irradiation by the focusing band light beam irradiating means The optical axis direction is set substantially perpendicular to the surface of the object to be inspected so that the scattered and reflected light from the surface of the object to be inspected is condensed by the focused band-shaped light beam and focused at an image forming position. An imaging lens group composed of a plurality of imaging lenses arranged in a zigzag pattern in the belt-shaped direction so that the imaging regions on the surface of the object to be examined overlap in the belt-shaped direction, and the imaging lens group is provided at the imaging position. Slits extending in the strip direction Is formed in the opening, the light shielding means for shielding the scattered reflected light generated from the non-detection imaging area of the object to be inspected surface, is disposed corresponding to the plurality of imaging lenses,
A plurality of photoelectric conversion means for receiving each of the scattered reflected light images formed through the light shielding means, and on the surface of the object to be inspected based on a signal obtained from each of the plurality of photoelectric conversion means. The foreign matter detection device is characterized in that it is configured to detect foreign matter adhered to the. Further, the present invention is characterized in that, in the foreign matter detection device, a linear image sensor is used as the plurality of photoelectric conversion means. Further, the present invention is characterized in that, in the foreign matter detecting device, the length of the slit-shaped opening of the light shielding means in the longitudinal direction is variable.

[作 用] 上記構成により、レチクル装置等におけるペリクル面等
の被検査物表面上に付着した異物を、被検査物を一方向
に直線状に走査させるだけで、被検査物表面上において
各結像レンズによる光量むらの影響をなくして同一の検
出感度で、しかも検出結像領域以外からの迷光の影響を
受けることなく、簡単な構成により迅速に検出すること
ができる。また実施例は、遮光手段のスリット状の開口
の長手方向の長さを可変に構成したので、被検査物の幅
寸法に多少の変動があっても適合させて検出結像領域以
外からの迷光を受光することなく安定して被検査物表面
上に付着した異物のみを検出することができる。
[Operation] With the above configuration, foreign matter attached on the surface of the object to be inspected such as the pellicle surface in the reticle device is simply scanned in one direction on the surface of the object to be inspected. It is possible to perform quick detection with a simple configuration without affecting the unevenness of the light amount due to the image lens, with the same detection sensitivity, and without being affected by stray light from other than the detection image forming area. Further, in the embodiment, since the length in the longitudinal direction of the slit-shaped opening of the light shielding means is variable, it is adapted even if there is some variation in the width dimension of the object to be inspected, and stray light from areas other than the detected image forming area is adapted. It is possible to stably detect only the foreign matter attached on the surface of the inspection object without receiving the light.

[実施例] 以下、本発明の一実施例を示す第1図乃至第10図につい
て説明する。
[Embodiment] Hereinafter, FIGS. 1 to 10 showing an embodiment of the present invention will be described.

第1図に示すように異物検出装置11はフォトマスクおよ
びレチクルなどからなるガラス基板1の上面に枠2を介
してペリクル3を貼り付け、そのペリクル3の表面には
左右対称に斜上方向に配置され該ペリクル3の表面に帯
状照明する照明手段4を設け、かつ該照明手段4によっ
てこれらの間に形成された帯状照明部(図示せず)上に
配置され,レンズアレイ6と遮光手段7と光電変換素子
(例えば直線状に配列した一次元イメージセンサで構
成)8とからなる光電変換手段を設けている。また前
記ガラス基板1は載物台上に載置され、この載物台9に
はエンコーダ91の指令(パルス数)によりモータ92が駆
動したとき、これに接続する送りネジ93およびナット94
を介してy方向に移動しうるように構成されている。
As shown in FIG. 1, the foreign matter detection device 11 attaches a pellicle 3 to the upper surface of a glass substrate 1 including a photomask and a reticle via a frame 2, and the surface of the pellicle 3 is symmetrically inclined in an obliquely upward direction. Illuminating means 4 for arranging the strip-shaped illumination on the surface of the pellicle 3 is provided, and is arranged on a strip-shaped illuminating part (not shown) formed between them by the illuminating means 4, and the lens array 6 and the light shielding means 7 are provided. A photoelectric conversion means 5 including a photoelectric conversion element (for example, a linearly arranged one-dimensional image sensor) 8 is provided. Further, the glass substrate 1 is placed on a stage, and when the motor 92 is driven by a command (number of pulses) of the encoder 91, the stage 9 has a feed screw 93 and a nut 94 connected thereto.
It is configured so that it can be moved in the y direction via.

前記照明手段4は第2図に示すように半導体レーザ、L
EDなどを含む発光素子41を複数個x方向に直線状に配
列し、各発光素子の光源像(発光点像)を集光レンズ42
により前記ペリクル3の表面上に照射して帯状照射部43
を形成している。
As shown in FIG. 2, the illumination means 4 is a semiconductor laser, L
A plurality of light emitting elements 41 including EDs are linearly arranged in the x direction, and a light source image (light emitting point image) of each light emitting element is collected by a condenser lens 42.
To irradiate the surface of the pellicle 3 with the strip-shaped irradiation section 43.
Is formed.

なお、前記発光素子41は集光レンズ組込形のものを使用
してもよい。この場合、集光レンズ42は不要である。
The light emitting element 41 may be of a type incorporating a condenser lens. In this case, the condenser lens 42 is unnecessary.

また前記発光素子41は直線状の発光源を有する素子と前
記集光レンズ42とを組合せたものを使用してもよい。
The light emitting element 41 may be a combination of an element having a linear light emitting source and the condenser lens 42.

第1図に示したレンズアレイ6は第4図に示すように直
径が大きくても1mm程度の微小に形成された複数個の結
像レンズ61をx方向に直線状に配置して構成されてい
る。前記結像レンズ61は第3図に示すように中心から周
辺にかけて放物線状の屈折分布62を有するレンズにて形
成されているので、入射光63が該結像レンズ61内に入光
すると、入射光63が一定の周期でサイン状あるいはヘリ
カル状に進行し、これによって前記ペリクル3の表面中
央部とその周辺とを同一感度で結像することが可能であ
る。ところで、本発明の実施例ではないところの結像レ
ンズ61の構成および作用について第4図および第5図
に基づいて説明する。即ち、結像レンズ61は第4図に
示すようにx方向に直線上に配置しているので、前記ペ
リクル3の表面に存在する異物10を広範囲に亘って検出
可能にしている。
As shown in FIG. 4, the lens array 6 shown in FIG. 1 is formed by arranging a plurality of minutely formed imaging lenses 61 each having a large diameter of about 1 mm linearly in the x direction. There is. Since the imaging lens 61 is formed of a lens having a parabolic refraction distribution 62 from the center to the periphery as shown in FIG. 3, when the incident light 63 enters the imaging lens 61, it is incident. The light 63 travels in a sine shape or a helical shape at a constant cycle, whereby it is possible to image the central portion of the surface of the pellicle 3 and its periphery with the same sensitivity. By the way, the structure and operation of the imaging lens 61, which is not the embodiment of the present invention, will be explained based on FIG. 4 and FIG. That is, since the imaging lens 61 is arranged linearly in the x direction as shown in FIG. 4, the foreign matter 10 present on the surface of the pellicle 3 can be detected over a wide range.

すなわち、各結像レンズ61の結像領域(視野)64は数mm
程度であって、これを前記光電変換素子8の受光面に投
影するものであるから、結像レンズ61を複数個直線上に
配置することにより広範囲に亘って検出可能になる。
That is, the imaging area (field of view) 64 of each imaging lens 61 is several mm.
However, since this is projected onto the light receiving surface of the photoelectric conversion element 8, it becomes possible to detect over a wide range by disposing a plurality of imaging lenses 61 on a straight line.

また各結像レンズ61を複数個直線上に配列することによ
り前記光電変換素子8の受光面に投影される像は各結像
レンズ61の投影像が重なり合ったものとなる。
Further, by arranging a plurality of the image forming lenses 61 on a straight line, the image projected on the light receiving surface of the photoelectric conversion element 8 is a superposed image of the image forming lenses 61.

すなわち、結像レンズ61は第5図に示すように光量分布
65を有しており、レンズアレイ6(第1図)の光量は個
々の結像レンズ61の有する光量の和となる。そのため、
結像レンズ61の配列ピッチPに伴なう周期的な光量ムラ
66を発生し、結像領域64内の中心と周辺では同一の異物
10であっても受光変換素子8の受光面での受光強度が若
干異っている。本発明においては、この課題を解消すべ
く、結像レンズ61の配列ピッチPを小さくし隣り合う結
像レンズ61の結像領域64の重なり度(オーバラップ)を
大きくすることが必要である。これにより光量ムラ66を
緩和し異物10の見逃しなどを防止することが可能であ
る。そこで本発明においては、第6図に示すように結像
レンズ61をx方向に直線状にかつ千鳥状に高密度に配列
することによって前記の課題を解決することが可能であ
る。ただし、この場合、光電変換素子8は結像レンズ61
の2列分の結像領域64を受光しうる大きさの受光面にす
る必要がある。
That is, as shown in FIG. 5, the imaging lens 61 has a light quantity distribution.
65, and the light amount of the lens array 6 (FIG. 1) is the sum of the light amounts of the individual imaging lenses 61. for that reason,
Cyclic light intensity unevenness associated with the arrangement pitch P of the imaging lenses 61
66, and the same foreign matter in the center and the periphery of the imaging area 64
Even if it is 10, the light receiving intensity on the light receiving surface of the light receiving conversion element 8 is slightly different. In the present invention, in order to solve this problem, it is necessary to reduce the array pitch P of the imaging lenses 61 and increase the degree of overlap (overlap) of the imaging regions 64 of the adjacent imaging lenses 61. As a result, it is possible to reduce the unevenness of the light amount 66 and prevent the foreign matter 10 from being overlooked. Therefore, in the present invention, the above-mentioned problems can be solved by arranging the imaging lenses 61 linearly and zigzag in the x direction at a high density as shown in FIG. However, in this case, the photoelectric conversion element 8 is the imaging lens 61.
It is necessary to make the light receiving surface of a size capable of receiving the image forming regions 64 for the two columns.

第1図に示した遮光手段7は、第8図に示すように互い
に重ね合わせてx方向に移動自在に配置された2枚の平
板状の遮光板71a,71bと、これら2枚の遮光板71a,71bの
それぞれ対向側端面に開口してx方向に所定長さで形成
された開口部72a,72bと、正逆両方向73a,73bに回転する
モータ74と、このモータ74に接続し、左ネジ部75aおよ
び右ネジ部75bを有する送りネジ76と、これら左ネジ部7
5aおよび右ネジ部75bにそれぞれ螺合し、前記2枚の遮
光板71a,71bのy方向端面に固定された2個のナット77
a,77bとから構成され、前記モータ74を正方向73aもしく
は逆方向73bに回転することにより、2枚の遮光板71a,7
1bが互いに反対の外方向もしくは内方向に移動して2個
の開口部72a,72bの開口長さlを可変にし、これによっ
て前記ガラス基板1およびペリクル3のx方向の形状寸
法がたとえ変化しても、迷光を防止し、安定して異物10
の検出が可能である。
The shading means 7 shown in FIG. 1 is composed of two flat shading plates 71a and 71b, which are superposed on each other and arranged to be movable in the x direction, as shown in FIG. 8, and these two shading plates. 71a, 71b are openings 72a, 72b that are formed on the opposite end surfaces of the respective 71a, 71b and have a predetermined length in the x direction, a motor 74 that rotates in both the forward and reverse directions 73a, 73b, and this motor 74. A lead screw 76 having a screw portion 75a and a right screw portion 75b, and these left screw portions 7
Two nuts 77, which are respectively screwed into the 5a and the right screw part 75b, and fixed to the end faces in the y direction of the two light shield plates 71a and 71b.
a and 77b, and by rotating the motor 74 in the forward direction 73a or the reverse direction 73b, two light shield plates 71a, 7b
1b moves in the opposite outward or inward direction to make the opening length l of the two openings 72a, 72b variable, and thereby the shape and dimensions of the glass substrate 1 and the pellicle 3 in the x direction are changed. Even if stray light is prevented and the foreign matter 10
Can be detected.

すなわち、第7図に示すように迷光としては、ペリクル
3を貼り付けている枠2からの散乱光44と、ペリクル3
を通過した光がガラス基板1の表面11に形成された回路
パターン12に当って発生する散乱光45とが考えられる。
これらの迷光が光電変換素子8の受光面に達しないよう
にするためには第9図に示すようにペリクル3の枠2の
内側から1〜2mm程度おいた1点鎖線にて示す領域を異
物10の有効検出領域31とした場合、ペリクル3上の異物
10の検出をこの有効検出領域31内で行なう必要がある。
That is, as shown in FIG. 7, as stray light, scattered light 44 from the frame 2 to which the pellicle 3 is attached and the pellicle 3 are
The scattered light 45 generated when the light passing through hits the circuit pattern 12 formed on the surface 11 of the glass substrate 1 is considered.
In order to prevent these stray light from reaching the light receiving surface of the photoelectric conversion element 8, as shown in FIG. 9, a region indicated by a dot-dash line about 1 to 2 mm from the inside of the frame 2 of the pellicle 3 is a foreign substance. Foreign matter on the pellicle 3 when the effective detection area 31 is 10
It is necessary to detect 10 in this effective detection area 31.

そこで、本発明においては光電変換素子8(第7図)の
レンズアレイ6側の直前位置に遮光手段7を設置し、こ
の遮光手段7の開口部72a,72b(第8図)の開口長さl
を前記有効検出領域31(第9図)の形状寸法に対応して
可変に形成しているので、迷光を防止して安定した異物
10の検出を行なうことが可能である。
Therefore, in the present invention, the light shielding means 7 is installed immediately before the lens array 6 side of the photoelectric conversion element 8 (FIG. 7), and the opening lengths of the openings 72a and 72b (FIG. 8) of the light shielding means 7 are set. l
Is formed variably according to the shape and size of the effective detection area 31 (FIG. 9), so stray light is prevented and stable foreign matter is prevented.
It is possible to perform 10 detections.

また一般に前記ペリクル3(第7図)はガラス基板1を
洗浄したのち、ガラス基板1の回路パターン形成面11、
および非形成面に1〜2μm程度の微小異物が存在して
いないことを確認した上でガラス基板1の両面に貼り付
けるが、回路パターン12の微細化が進むにつれてガラス
基板1の形状寸法も変化しており、同時にペリクル3の
形状寸法も多様化しているが、異物10の検出はこれら全
てに対応する必要がある。これに対して本発明における
遮光手段7はその開口部72a,72bの開口長さlが可変に
形成されているので(第8図)、ガラス基板1およびペ
リクル3の形状寸法の多様化に対応することが可能であ
る。
In general, after cleaning the glass substrate 1, the pellicle 3 (FIG. 7) is provided with a circuit pattern forming surface 11 of the glass substrate 1,
And, it is adhered to both surfaces of the glass substrate 1 after confirming that there is no minute foreign substance of about 1 to 2 μm on the non-formed surface, but the shape dimension of the glass substrate 1 also changes as the circuit pattern 12 becomes finer. At the same time, the shape and size of the pellicle 3 are diversified, but the detection of the foreign matter 10 needs to be compatible with all of them. On the other hand, in the light shielding means 7 of the present invention, since the opening length l of the openings 72a and 72b is variable (FIG. 8), it is possible to cope with the diversification of the shape dimensions of the glass substrate 1 and the pellicle 3. It is possible to

前記光電変換素子8は第4図および第5図に示すように
前記遮光手段7からの異物像10′が複数個の画素にて形
成された受光面に投影されたとき、その受光強度に応じ
た電気信号81(第10図参照)を出力し、この電気信号81
をあらかじめ検出すべき異物10の形成寸法の受光強度に
対応した電気信号レベル(基準レベル、閾値)と比較し
て該電気信号81が基準レベル以上かもしくはそれ以下に
よって異物10の存在を検出するように形成されている。
As shown in FIGS. 4 and 5, the photoelectric conversion element 8 responds to the received light intensity when the foreign object image 10 'from the light shielding means 7 is projected on the light receiving surface formed by a plurality of pixels. Electrical signal 81 (see FIG. 10) is output, and this electrical signal 81
Is compared with the electric signal level (reference level, threshold value) corresponding to the received light intensity of the formation dimension of the foreign matter 10 to be detected in advance, and the presence of the foreign matter 10 is detected when the electric signal 81 is above or below the reference level. Is formed in.

また前記光電変換素子8は図示していないが、前記各画
素の駆動パルスをカウントすることにより、電気信号81
を出力している画素の位置がわかるように形成されてい
るので、前記ペリクル3上のx方向の異物10の存在位置
を知ることが可能である。
Although not shown in the figure, the photoelectric conversion element 8 counts the drive pulse of each pixel to generate an electric signal 81
Since it is formed so that the position of the pixel outputting is detected, it is possible to know the existing position of the foreign matter 10 on the pellicle 3 in the x direction.

本発明による異物検出装置11は前記のように構成されて
いるから、つぎに異物検査方法について説明する。
Since the foreign matter detection device 11 according to the present invention is configured as described above, a foreign matter inspection method will be described next.

第1図に示される載物台9上に搭載されたガラス基板1
上に枠2を介してペリクル3を搭載したのち、前記載物
台9のモータ92を駆動してガラス基板1をy方向に移動
して第9図に実線にて示す設定位置13に位置させると、
光電変換素子8の電気信号81が第10図に示すようにペリ
クル3の枠2の反射光の電気信号82,83と、ペリクル3
上の異物10による散乱光の電気信号84となる。この場
合、異物10以外による電気信号82,83は全て迷光とな
る。
A glass substrate 1 mounted on a stage 9 shown in FIG.
After mounting the pellicle 3 through the frame 2 on the upper side, the motor 92 of the above-described object table 9 is driven to move the glass substrate 1 in the y direction to the set position 13 shown by the solid line in FIG. When,
As shown in FIG. 10, the electric signal 81 of the photoelectric conversion element 8 is the electric signals 82, 83 of the reflected light of the frame 2 of the pellicle 3 and the pellicle 3
It becomes an electric signal 84 of scattered light due to the foreign matter 10 above. In this case, the electric signals 82, 83 other than the foreign matter 10 are all stray light.

そこで本発明は前記光電変換素子8の電気信号81よりペ
リクル3の枠2の内側の間隔Lを算出し、さらにこの間
隔Lに対する有効検出領域31を算出してこの有効検出領
域31のx方向の長さに一致するように遮光装置7の開口
部72a,72bの開口長さlを設定している。
Therefore, according to the present invention, the distance L inside the frame 2 of the pellicle 3 is calculated from the electric signal 81 of the photoelectric conversion element 8, and the effective detection area 31 for the distance L is calculated to determine the effective detection area 31 in the x direction. The opening length l of the openings 72a and 72b of the light shielding device 7 is set so as to match the length.

このようにして遮光装置7の開口72a,72bの開口長さl
が設定されたのち、ガラス基板1が載物台9のモータ92
の駆動によりy方向に移動し、検査原点14(第9図に示
すようにガラス基板1の端面とする)が実線にて示した
y方向の設定位置13まで前記ガラス基板1が戻されて再
び載物台9のモータ92の駆動によって上記と逆方向に移
動されこれによってペリクル3の表面上の異物10の検出
が行なわれる。
In this way, the opening length l of the openings 72a and 72b of the light shielding device 7
After setting, the glass substrate 1 is set to the motor 92 of the stage 9.
Is driven in the y direction, the inspection origin 14 (which is the end face of the glass substrate 1 as shown in FIG. 9) is returned to the set position 13 in the y direction shown by the solid line, and the glass substrate 1 is returned again. The foreign substance 10 on the surface of the pellicle 3 is detected by being moved in the opposite direction by driving the motor 92 of the stage 9.

なお、前記y方向の設定位置13はペリクル3の枠2の反
射光の電気信号82,83が光電変換素子8の電気信号81と
して得られる位置であれば任意の位置に設定してもよい
が理想的には検査原点14に近い方がよい。
The setting position 13 in the y direction may be set to any position as long as the electric signals 82 and 83 of the reflected light of the frame 2 of the pellicle 3 are obtained as the electric signal 81 of the photoelectric conversion element 8. Ideally, it should be closer to the inspection origin 14.

したがって本発明による異物検出装置はペリクル3の広
範囲の検査領域に亘って安定して異物の検出を行なうこ
とができる。また構成が簡単で小形,軽量化にできるの
で、露出装置などにも容易に組込みが可能であるから露
光前のペリクルの表面上の異物検出にも好適である。
Therefore, the foreign matter detecting device according to the present invention can stably detect the foreign matter over a wide inspection area of the pellicle 3. Further, since the structure is simple and the size and weight can be reduced, it can be easily incorporated into an exposure device and the like, and therefore it is suitable for detecting foreign matter on the surface of the pellicle before exposure.

次に本発明の実施例ではない場合の一例を示す第11図に
ついて説明する。同図においては、ペリクル3の表面に
対して右斜上方向に照明手段4を設置し、これに相対す
る左斜上方向にレンズアレイ6、遮光手段7および光電
変換装置8からなる光電検出手段を設置した場合であ
る。
Next, FIG. 11 showing an example in the case of not being an embodiment of the present invention will be explained. In the figure, the illuminating means 4 is installed in a right obliquely upward direction with respect to the surface of the pellicle 3, and the photoelectric detecting means comprising a lens array 6, a light shielding means 7 and a photoelectric conversion device 8 is provided in a left oblique upward direction opposite to the illuminating means 4. This is the case where 5 is installed.

また本発明の実施例ではない場合の他の一例を示す第12
図においては、ペリクル3の真上に照明手段4を設置
し、左右斜上方向の前記照明手段4によりペリクル3上
に形成される帯状照明位置を検出しうるように2組のレ
ンズアレイ6、遮光装置7および光電変換装置8からな
る光電検出手段を設置した場合である。
A twelfth example showing another example which is not the embodiment of the present invention
In the figure, an illuminating means 4 is installed right above the pellicle 3, and two sets of lens arrays 6 are arranged so that the illuminating means 4 in the obliquely upward and leftward direction can detect a band-like illuminating position formed on the pellicle 3. This is the case where the photoelectric detection means 5 including the light shielding device 7 and the photoelectric conversion device 8 is installed.

さらに本発明のさらに他の一実施例を示す第13図におい
ては、ガラス基板1の下側に取付けられたペリクル3の
表面上に存在する異物10を検出する場合である。
Further, FIG. 13 showing still another embodiment of the present invention is a case where the foreign matter 10 existing on the surface of the pellicle 3 attached to the lower side of the glass substrate 1 is detected.

この場合には前記第1図乃至第10図に示す如き構成をし
た異物検出装置11を2組設置することにより異物10を検
出することができる。
In this case, the foreign substance 10 can be detected by installing two sets of the foreign substance detecting devices 11 having the structures shown in FIGS. 1 to 10.

[発明の効果] 本発明によれば、レチクル装置等におけるペリクル面等
の被検査物表面上に付着した異物を、被検査物表面を一
方向に直線状に走査させるだけで、被検査物表面上にお
いて各結像レンズによる光量むらの影響をなくして同一
の検出感度で、しかも検出結像領域以外からの迷光の影
響を受けることなく、簡単な構成により迅速に検出する
ことができ、半導体の製造において大幅な歩留まり向上
がはかれる効果を奏する。
EFFECTS OF THE INVENTION According to the present invention, the surface of the object to be inspected is simply scanned in one direction by a foreign substance adhering to the surface of the object to be inspected such as a pellicle surface in a reticle device or the like. In the above, the influence of the unevenness of the light amount due to each image forming lens is eliminated, the detection sensitivity is the same, and the influence of stray light from other than the detection image forming area is not exerted, and the detection can be performed quickly with a simple structure. This has the effect of significantly improving the yield in manufacturing.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の実施例である半導体装置に使用される
ガラス基板のペリクル膜上の異物検出装置を示す斜視
図、第2図は第1図に示す照明手段の拡大斜視図、第3
図は第1図に示すレンズアレイを形成する結像レンズの
特性説明図、第4図は本発明の実施例ではないレンズア
レイを示す拡大斜視図、第5図は第4図に示す場合にお
けるレンズアレイの光量ムラを示す斜視図、第6図は本
発明の一実施例である光量ムラ防止のためのレンズアレ
イを示す斜視図、第7図は異物以外の迷光についての説
明図、第8図は第1図に示す遮光装置の拡大斜視図、第
9図はペリクル付ガラス基板の平面図、第10図はペリク
ル枠の反射光およびペリクル膜上の異物の散乱光による
電気信号を示す図、第11図は本発明の実施例ではない
場合の一例を示す異物検出装置の補足説明図、第12図
は本発明の実施例ではない場合の他の一例を示す異物検
出装置の補足説明図、第13図は本発明のさらに他の一実
施例を示す異物検出装置の説明図である。 1……ガラス基板、2……枠、3……ペリクル、……
照明手段、……検出手段、6……レンズアレイ、7…
…遮光装置、8……光電変換素子、10……異物、11……
異物検出装置。
FIG. 1 is a perspective view showing a foreign matter detecting device on a pellicle film of a glass substrate used in a semiconductor device according to an embodiment of the present invention, and FIG. 2 is an enlarged perspective view of an illuminating means shown in FIG.
1 is a characteristic explanatory view of an imaging lens forming the lens array shown in FIG. 1, FIG. 4 is an enlarged perspective view showing a lens array which is not an embodiment of the present invention, and FIG. 5 is a case in the case shown in FIG. FIG. 6 is a perspective view showing unevenness of light amount of the lens array, FIG. 6 is a perspective view showing a lens array for preventing unevenness of light amount according to an embodiment of the present invention, FIG. 7 is an explanatory view of stray light other than foreign matter, and FIG. Fig. 1 is an enlarged perspective view of the light-shielding device shown in Fig. 1, Fig. 9 is a plan view of a glass substrate with a pellicle, and Fig. 10 is a diagram showing electric signals due to reflected light from a pellicle frame and scattered light from foreign matter on the pellicle film. FIG. 11 is a supplementary explanatory view of a foreign matter detecting device showing an example when it is not the embodiment of the present invention, and FIG. 12 is a supplementary explanatory diagram of a foreign matter detecting device showing another example when it is not the embodiment of the present invention. FIG. 13 is a foreign matter detection showing still another embodiment of the present invention. It is an explanatory view of a device. 1 ... Glass substrate, 2 ... Frame, 3 ... Pellicle, 4 ...
Illumination means, 5 ... Detection means, 6 ... Lens array, 7 ...
… Shading device, 8 …… Photoelectric conversion element, 10 …… Foreign matter, 11 ……
Foreign object detection device.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭55−149829(JP,A) 特開 昭59−99237(JP,A) 実公 昭51−22707(JP,Y2) ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-55-149829 (JP, A) JP-A-59-99237 (JP, A) Jitsuko 51-22707 (JP, Y2)

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】被検査物を走査手段により所定方向に直線
状に走査し、該直線状に走査された被検査物表面上に複
数の発光素子を配列して構成した集束帯状光ビーム照射
手段により垂直方向から所望の傾斜角度を有する斜め方
向でほぼ前記走査方向から該走査方向に対してほぼ直角
方向に延びた集束帯状光ビームを照射し、該照射された
集束帯状光ビームにより被検査物表面上からの散乱反射
光を、光軸方向を前記被検査物表面に対してほぼ垂直状
態にして前記被検査物表面の結像領域が帯状方向に重な
りあうように前記帯状方向に千鳥状に配置された複数の
結像レンズから構成された結像レンズ群で集光して結像
位置に結像させ、該結像位置に設けられ、前記帯状方向
に延びたスリット状の開口で形成された遮光手段により
前記被検査物表面の検出領域以外から発生する散乱反射
光を遮光し、前記遮光手段を透過して結像される散乱反
射光像の各々を前記複数の結像レンズに対応させた配置
された複数の光電変換手段の各々で受光し、該複数の光
電変換手段の各々から得られる信号に基づいて前記被検
査物表面上に付着した異物を検出することを特徴とする
異物検出方法。
1. A convergent band light beam irradiating means constituted by scanning an inspection object linearly in a predetermined direction by a scanning means and arranging a plurality of light emitting elements on the surface of the inspection object linearly scanned. Is irradiated with a focused band-shaped light beam that extends from the scanning direction in a direction substantially perpendicular to the scanning direction in an oblique direction having a desired inclination angle from the vertical direction, and the irradiated focused band-shaped light beam inspects the object to be inspected. Scattered reflected light from the surface is staggered in the strip-shaped direction so that the image forming regions of the surface of the inspected object are overlapped in the strip-shaped direction with the optical axis direction being substantially perpendicular to the surface of the inspection object. An imaging lens group composed of a plurality of arranged imaging lenses collects the light to form an image at an imaging position, and is provided at the imaging position, and is formed by a slit-shaped opening extending in the band direction. The surface of the object to be inspected by the light shielding means Of the plurality of photoelectric conversion means arranged so as to shield the scattered reflected light generated from other than the detection region and to associate each of the scattered reflected light images formed by transmitting through the light shielding means with the plurality of imaging lenses. A foreign matter detecting method, comprising: detecting a foreign matter that is received by each of the plurality of photoelectric conversion means and detecting a foreign matter that has adhered to the surface of the inspection object based on a signal obtained from each of the plurality of photoelectric conversion means.
【請求項2】被検査物を所定方向に直線状に走査する走
査手段と、該走査手段で直線状に走査された被検査物表
面上に垂直方向から所望の傾斜角度を有する斜め方向で
ほぼ前記走査方向から該走査方向に対してほぼ直角方向
に延びた集束帯状光ビームを照射する複数の発光素子を
配列して構成した集束帯状光ビーム照射手段と、該集束
帯状光ビーム照射手段により照射された集束帯状光ビー
ムにより被検査物表面上からの散乱反射光を集光して結
像位置に結像させるように、光軸方向を前記被検査物表
面に対してほぼ垂直状態にして前記被検査物表面の結像
領域が帯状方向に重なりあうように前記帯状方向に千鳥
状に配置された複数の結像レンズから構成された結像レ
ンズ群と、該結像位置に設けられ、更に前記帯状方向に
延びたスリット状の開口で形成され、前記被検査物表面
の検出結像領域以外から発生する散乱反射光を遮光する
遮光手段と、前記複数の結像レンズに対応させて配置さ
れ、前記遮光手段を透過して結像される散乱反射光像の
各々を受光する複数の光電変換手段とを備え、該複数の
光電変換手段の各々から得られる信号に基づいて前記被
検査物表面上に付着した異物を検出するように構成した
ことを特徴とする異物検出装置。
2. A scanning means for linearly scanning an object to be inspected in a predetermined direction, and an oblique direction having a desired inclination angle from a vertical direction on a surface of the object to be inspected linearly scanned by the scanning means. Focusing band light beam irradiating means constituted by arranging a plurality of light emitting elements for irradiating a focusing band light beam extending from the scanning direction in a direction substantially perpendicular to the scanning direction, and irradiation by the focusing band light beam irradiating means The optical axis direction is set substantially perpendicular to the surface of the object to be inspected so that the scattered and reflected light from the surface of the object to be inspected is condensed by the focused band-shaped light beam and focused at an image forming position. An imaging lens group composed of a plurality of imaging lenses arranged in a zigzag pattern in the belt-like direction so that the imaging regions on the surface of the object to be inspected overlap in the belt-like direction; Slit shape extending in the strip direction A light blocking unit formed of an opening for blocking scattered reflected light generated from a region other than the detection image forming region of the surface of the object to be inspected, and the light blocking unit disposed corresponding to the plurality of image forming lenses and transmitting through the light blocking unit. A plurality of photoelectric conversion means for receiving each of the scattered reflected light images to be imaged, and detecting foreign matter adhering to the surface of the object to be inspected based on a signal obtained from each of the plurality of photoelectric conversion means. A foreign matter detection device having the above-mentioned configuration.
【請求項3】前記複数の光電変換手段として、リニアイ
メージセンサで構成したことを特徴とする特許請求の範
囲第2項記載の異物検出装置。
3. The foreign matter detection device according to claim 2, wherein the plurality of photoelectric conversion means are linear image sensors.
【請求項4】前記遮光手段のスリット状の開口の長手方
向の長さを可変に構成したことを特徴とする特許請求の
範囲第2項記載の異物検出装置。
4. The foreign matter detecting apparatus according to claim 2, wherein the slit-shaped opening of the light shielding means has a variable length in the longitudinal direction.
JP29991686A 1986-12-18 1986-12-18 Foreign object detection method and apparatus Expired - Lifetime JPH0641920B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29991686A JPH0641920B2 (en) 1986-12-18 1986-12-18 Foreign object detection method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29991686A JPH0641920B2 (en) 1986-12-18 1986-12-18 Foreign object detection method and apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP5114732A Division JPH0736000B2 (en) 1993-05-17 1993-05-17 Foreign object detection device

Publications (2)

Publication Number Publication Date
JPS63153451A JPS63153451A (en) 1988-06-25
JPH0641920B2 true JPH0641920B2 (en) 1994-06-01

Family

ID=17878475

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29991686A Expired - Lifetime JPH0641920B2 (en) 1986-12-18 1986-12-18 Foreign object detection method and apparatus

Country Status (1)

Country Link
JP (1) JPH0641920B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7258878B2 (en) * 2017-12-12 2023-04-17 エーエスエムエル ネザーランズ ビー.ブイ. Apparatus and method for determining conditions associated with a pellicle
CN109596640B (en) * 2018-12-05 2021-09-03 京东方科技集团股份有限公司 Foreign matter detection method and device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5122707U (en) * 1974-08-10 1976-02-19
JPS55149829A (en) * 1979-05-11 1980-11-21 Hitachi Ltd Detector for foreign matter in wafer
JPS5999237A (en) * 1982-11-29 1984-06-07 Kita Denshi:Kk Print surface monitoring sensor

Also Published As

Publication number Publication date
JPS63153451A (en) 1988-06-25

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