JPH0736000B2 - Foreign object detection device - Google Patents
Foreign object detection deviceInfo
- Publication number
- JPH0736000B2 JPH0736000B2 JP5114732A JP11473293A JPH0736000B2 JP H0736000 B2 JPH0736000 B2 JP H0736000B2 JP 5114732 A JP5114732 A JP 5114732A JP 11473293 A JP11473293 A JP 11473293A JP H0736000 B2 JPH0736000 B2 JP H0736000B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- foreign matter
- width direction
- image forming
- pellicle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体製造装置に使用
されるガラス基板上に装着した異物付着防止膜(以下、
ペリクルと云う)上の異物検出装置に係り、特に被検査
物の形状寸法が変化しても、安定した異物検査を行うの
に好適な異物検出装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a foreign matter adhesion prevention film (hereinafter, referred to as a film attached to a glass substrate used in a semiconductor manufacturing apparatus
The present invention relates to a foreign matter detection device on a pellicle), and more particularly to a foreign matter detection device suitable for performing a stable foreign matter inspection even when the shape and size of the inspection object change.
【0002】[0002]
【従来の技術】従来のこの種の異物検出装置はたとえば
特開昭60-67845号公報に記載されているように、フォト
マスクおよびレチクルなどのガラス基板上に離間して貼
られたペリクルと称する薄膜等の被検査物表面に対し斜
方向から平行ビームを帯状に照射し、該帯状照射部に存
在する異物の散乱光を結像レンズにより集光して一次元
イメージセンサ上に結像させることによって検出するも
のが提案されている。2. Description of the Related Art A conventional foreign matter detecting device of this type is called a pellicle which is attached to a glass substrate such as a photomask and a reticle with a space therebetween, as described in Japanese Patent Laid-Open No. 60-67845. To irradiate the surface of the object to be inspected such as a thin film with a parallel beam from an oblique direction in a strip shape, and to collect the scattered light of the foreign matter existing in the strip irradiation section by an imaging lens to form an image on a one-dimensional image sensor. What to detect is proposed.
【0003】[0003]
【発明が解決しようとする課題】前記従来技術は、単数
の結像レンズで被検査物表面の照明領域全面を見込み、
その像を一次元イメージセンサ上に結像させ、照明領域
内に存在する異物を検出していたため、被検査物の形状
寸法が変化した場合、検査領域を変更する点について配
慮されておらず、被検査物の多様化に対応できない問題
があった。SUMMARY OF THE INVENTION In the prior art described above, a single imaging lens is used to anticipate the entire illumination area on the surface of the object to be inspected.
Since the image was formed on a one-dimensional image sensor and foreign matter existing in the illumination area was detected, no consideration was given to changing the inspection area when the shape and size of the inspection object changed. There was a problem that it was not possible to cope with the diversification of inspected objects.
【0004】本発明の目的は、上記従来技術の問題に鑑
み、被検査物の形状寸法が変化しても、被検査物表面の
中央部と周辺部とを同一基準レベルで異物検出ができる
ようにした異物検出装置を提供することにある。In view of the above-mentioned problems of the prior art, an object of the present invention is to allow foreign matter to be detected at the same reference level in the central portion and the peripheral portion of the surface of the inspection object even if the shape and size of the inspection object change. Another object of the present invention is to provide a foreign matter detection device.
【0005】[0005]
【課題を解決するための手段】本発明の異物検出装置に
おいては、被検査物を一方向に移動させる被検査物走査
手段と、前記被検査物の移動方向と直交する幅方向に沿
って直線状に複数配列された発光素子を有し、被検査物
表面上に対し、所望の傾斜角度をもって斜め方向から前
記直交する幅方向に沿い帯状照明する照明手段と、被検
査物表面の前記直交する幅方向に沿い直線状に複数配置
されると共に、被検査物表面上からの散乱光を集光する
結像レンズからなり、かつ隣り合う結像レンズによる互
いの結像領域の重なり度が大きくなるように構成された
レンズアレイと、互いに重ね合わせると共に、前記結像
レンズの結像位置に前記直交する幅方向に沿ってそれぞ
れ移動自在に配置された遮光板,該それぞれの遮光板の
互いに対向する位置に前記直交する幅方向に沿って開口
されると共に、前記被検査物表面の検出結像領域以外か
ら発生する散乱光を遮光する開口部を有し、遮光板の移
動により開口部における前記直交する幅方向の開口長さ
を被検査物の有効検出領域に対応して可変とする遮光手
段と、遮光手段の開口部を透過する光を受光する光電変
換素子とを備えている。 In the foreign matter detecting apparatus of the present invention, the inspection object scanning for moving the inspection object in one direction is performed.
Means and the width direction orthogonal to the moving direction of the inspection object.
With multiple light emitting elements arranged linearly
Front from a diagonal direction with a desired tilt angle with respect to the surface
An illumination means for illuminating a strip along the width direction orthogonal to each other, and
A plurality of linearly arranged along the orthogonal width direction of the surface of the object
And collects the scattered light from the surface of the object to be inspected.
It is composed of imaging lenses, and they are made by adjacent imaging lenses.
It was constructed so that the degree of overlap of the
The lens array is superimposed on each other and the image is formed.
Along the width direction orthogonal to the image forming position of the lens, respectively.
The light-shielding plates that are movably arranged,
Open at positions facing each other along the orthogonal width direction
And the area other than the detected image forming area on the surface of the inspection object.
Has an opening to block the scattered light generated from the
The length of the opening in the width direction orthogonal to the opening due to the movement
The light-shielding hand that can be changed according to the effective detection area of the inspection object.
And a photoelectric conversion device that receives light that passes through the openings of the light shielding means.
And a replacement element.
【0006】[0006]
【作用】本発明の異物検出装置では、上述の如く、被検
査物走査手段と照明手段とレンズアレイと遮光手段と光
電変換素子とを備え、照明手段の各発光素子が被検査物
の移動方向と直交する幅方向に沿い複数配列してあると
共に、レンズアレイの結像レンズも前記直交する幅方向
に沿い複数直線状に配置してあるので、それぞれ個々の
分割領域を各結像レンズと対応する光電変換素子とで検
出し、それぞれの領域内に存在する異物を検出すること
ができることにより、同一の基準レベルで異物を精度よ
く安定に検出することができる。これに加え、遮光手段
の遮光板によって形成される開口部の開口長さが被検査
物の有効検出領域の大きさに対応して可変となるので、
被検査物の形状寸法が変化しても確実に対応することが
できる。したがって、被検査物の広範囲の検査領域に亘
って安定して異物の検出を行うことができる。 [Action] In the foreign matter detection device of the present invention, as described above, the test
Object scanning means, illumination means, lens array, light blocking means, and light
Each light emitting element of the illumination means is provided with
If there are multiple arrangements along the width direction orthogonal to the moving direction of
In both cases, the imaging lenses of the lens array are also in the orthogonal width direction.
Since it is arranged in multiple straight lines along each
The divided area is detected by each imaging lens and the corresponding photoelectric conversion element.
To detect foreign substances existing in each area.
With the same reference level, foreign matter can be accurately measured.
It can be detected stably. In addition to this, light-shielding means
The opening length of the opening formed by the light shielding plate of the
Since it can be changed according to the size of the effective detection area of the object,
Reliable response to changes in the shape and size of the inspection object
it can. Therefore, it is possible to cover a wide range of inspection areas of the inspection object.
Therefore, it is possible to stably detect the foreign matter.
【0007】[0007]
【実施例】以下、本発明の実施例を図1乃至図13によ
り説明する。図1乃至図10は本発明による異物検出装
置の第1の実施例を示す。図1に示すように、異物検出
装置11は、フォトマスクおよびレチクルなどからなる
ガラス基板1の上面に枠2を介してペリクル3を貼り付
け、そのペリクル3の表面には左右対称に斜上方向に配
置されかつ該ペリクル3の表面に帯状照明する照明手段
4を設けると共に、該照明手段4によってこれらの間に
形成された帯状照明部(図示せず)上に配置され,レン
ズアレイ6と遮光手段7と光電変換素子8とを有する光
電検出手段5を設けている。また、前記ガラス基板1は
載物台9上に載置され、この載物台9上にはエンコーダ
91の指令(パルス数)によりモータ92が駆動したと
き、これに接続する送りネジ93およびナット94を介
してy方向に移動し得るように構成されている。前記照
明手段4は図2に示すように、半導体レーザ,LEDな
どを含む発光素子41を複数個x方向に沿い直線状に配
列し、各発光素子41の光源像(発光点像)を集光レン
ズ42により前記ペリクル3の表面上に照射して帯状照
明部43を形成している。なお、前記発光素子41は集
光レンズ組込形のものを使用してもよい。その場合、集
光レンズ42は不要となる。また前記発光素子41は直
線状の発光源を有する素子と前記集光レンズ42とを組
合せたものを使用してもよい。Embodiments of the present invention will be described below with reference to FIGS. 1 to 10 show a first embodiment of a foreign matter detecting device according to the present invention. As shown in FIG. 1, in a foreign matter detection device 11, a pellicle 3 is attached to an upper surface of a glass substrate 1 including a photomask, a reticle, and the like via a frame 2, and the surface of the pellicle 3 is symmetrically inclined in a diagonally upward direction. Is provided on the surface of the pellicle 3 and provided on the surface of the pellicle 3 with a band-shaped illumination unit (not shown) formed between them by the illumination unit 4, and the lens array 6 and the light shield are provided. A photoelectric detection unit 5 having a unit 7 and a photoelectric conversion element 8 is provided. Further, the glass substrate 1 is placed on a stage 9, and when the motor 92 is driven by a command (pulse number) of the encoder 91 on the stage 9, a feed screw 93 and a nut connected to the motor 92 are connected. It is configured to be movable in the y direction via 94. As shown in FIG. 2, the illuminating unit 4 arranges a plurality of light emitting elements 41 including semiconductor lasers, LEDs, etc. in a straight line along the x direction, and collects a light source image (light emitting point image) of each light emitting element 41. The lens 42 irradiates the surface of the pellicle 3 to form a band-shaped illumination section 43. The light emitting element 41 may be of a type incorporating a condenser lens. In that case, the condenser lens 42 becomes unnecessary. The light emitting element 41 may be a combination of an element having a linear light emitting source and the condenser lens 42.
【0008】図1に示したレンズアレイ6は図4に示す
ように直径が大きくても1mm程度の微小に形成された
複数個の結像レンズ61をx方向に沿い直線状に配置し
て構成されている。前記結像レンズ61は図3に示すよ
うに、中心から周辺にかけて放物線状の屈折分布62を
有するレンズにて形成されているので、入射光63が該
結像レンズ61内に入光すると、入射光63が一定の周
期でサイン状あるいはヘリカル状に進行し、これによっ
て前記ペリクル3の表面中央部とその周辺部とを同一感
度で結像することが可能である。また結像レンズ61は
図4に示すように、x方向に沿い直線状に配置している
ので、前記ペリクル3の表面に存在する異物10を広範
囲に亘って検出可能にしている。すなわち、各結像レン
ズ61の結像領域(視野)64は数mm程度であって、
これを前記光電変換素子8の受光面に投影するものであ
るから、結像レンズ61を複数個直線状に配置すること
により広範囲に亘って検出可能になる。また、各結像レ
ンズ61を複数個直線状に配列することにより前記光電
変換素子8の受光面に投影される像は各結像レンズ61
の投影像が重なり合ったものとなる。すなわち、結像レ
ンズ61は図5に示すように、光量分布65を有してお
り、レンズアレイ6(図1)の光量は個々の結像レンズ
61の有する光量の和となる。そのため、結像レンズ6
1の配列ピッチPに伴う周期的な光量ムラ66を発生
し、結像領域64内の中心と周辺では同一の異物10で
あっても、光電変換素子8の受光面での受光強度が若干
異なっている。これを解消するためには結像レンズ61
の配列ピッチPを小さくし、隣合う結像レンズ61の結
像領域64の重なり度(オーバラップ)を大きくするこ
とが必要である。これにより光量ムラ66を緩和し、異
物10の見逃しなどを防止することが可能である。たと
えば、図6に示すように、結像レンズ61をx方向に直
線状にかつ千鳥状に高密度に配列することによって前記
の問題を解決することが可能である。ただし、その場
合、光電変換素子8は結像レンズ61の2列分の結像領
域64を受光し得る大きさの受光面にする必要がある。As shown in FIG. 4, the lens array 6 shown in FIG. 1 is constructed by arranging a plurality of minutely formed image forming lenses 61 having a diameter of about 1 mm in a straight line along the x direction. Has been done. As shown in FIG. 3, the image forming lens 61 is formed of a lens having a parabolic refraction distribution 62 from the center to the periphery. Therefore, when the incident light 63 enters the image forming lens 61, it is incident. The light 63 travels in a sine shape or a helical shape at a constant cycle, whereby it is possible to image the central portion of the surface of the pellicle 3 and its peripheral portion with the same sensitivity. Further, as shown in FIG. 4, the imaging lens 61 is linearly arranged along the x direction, so that the foreign matter 10 present on the surface of the pellicle 3 can be detected over a wide range. That is, the imaging area (field of view) 64 of each imaging lens 61 is about several mm,
Since this is projected on the light receiving surface of the photoelectric conversion element 8, it is possible to detect over a wide range by arranging a plurality of imaging lenses 61 in a straight line. Further, by arranging a plurality of the image forming lenses 61 in a straight line, the image projected on the light receiving surface of the photoelectric conversion element 8 is the image forming lenses 61.
The projected images of are overlapped. That is, the imaging lens 61 has a light amount distribution 65 as shown in FIG. 5, and the light amount of the lens array 6 (FIG. 1) is the sum of the light amounts of the individual imaging lenses 61. Therefore, the imaging lens 6
Even if the foreign matter 10 is the same in the center and the periphery in the image forming area 64, the light receiving intensity of the light receiving surface of the photoelectric conversion element 8 is slightly different. ing. In order to eliminate this, the imaging lens 61
It is necessary to reduce the array pitch P of (1) and increase the degree of overlap (overlap) of the imaging regions 64 of the adjacent imaging lenses 61. As a result, it is possible to mitigate the light amount unevenness 66 and prevent the foreign matter 10 from being overlooked. For example, as shown in FIG. 6, the above-mentioned problem can be solved by arranging the imaging lenses 61 linearly in the x direction and in a zigzag pattern at high density. However, in that case, the photoelectric conversion element 8 needs to be a light receiving surface having a size capable of receiving the image forming regions 64 of two rows of the image forming lens 61.
【0009】図1に示した遮光手段7は、図8に示すよ
うに互いに重ね合わせてx方向に移動自在に配置された
二枚の平板状の遮光板71a,71bと、これら二枚の
遮光板71a,71bのそれぞれ対向側端面に開口して
x方向に所定長さで形成された開口部72a,72b
と、正逆両方向73a,73bに回転するモータ74
と、このモータ74に接続し、左ネジ部75aおよび右
ネジ部75bを有する送りネジ76と、これら左ネジ部
75aおよび右ネジ部75bにそれぞれ螺合し、前記二
枚の遮光板71a,71bのy方向端面に固定された二
個のナット77a,77bとから構成され、前記モータ
74を正方向73aもしくは逆方向73bに回転するこ
とにより、二枚の遮光板71a,71bが互いに反対の
外方向もしくは内方向に移動して二個の開口部72a,
72bの開口長さlを可変にし、これによって前記ガラ
ス基板1およびペリクル3のx方向の形状寸法がたとえ
変化しても、迷光を防止し、安定して異物10の検出が
可能である。すなわち、図7に示すように迷光として
は、ペリクル3を貼り付けている枠2からの散乱光44
と、ペリクル3を通過した光がガラス基板1の表面11
に形成された回路パターン12に当たって発生する散乱
光45とが考えられる。これらの迷光が光電変換素子8
の受光面に達しないようにするためには図9に示すよう
にペリクル3の枠2の内側から1〜2mm程度おいた一
点鎖線にて示す領域を異物10の有効検出領域31とし
た場合、ペリクル3上の異物10の検出をこの有効検出
領域31内で行う必要がある。The light-shielding means 7 shown in FIG. 1 has two flat light-shielding plates 71a and 71b which are superposed on each other and arranged to be movable in the x direction as shown in FIG. Openings 72a, 72b formed on the opposite end surfaces of the plates 71a, 71b and having a predetermined length in the x direction.
And a motor 74 that rotates in both forward and reverse directions 73a and 73b.
And the feed screw 76 connected to the motor 74 and having a left screw portion 75a and a right screw portion 75b, and screwed to the left screw portion 75a and the right screw portion 75b respectively, and the two light shielding plates 71a, 71b. Of the two nuts 77a and 77b fixed to the end face in the y direction of the motor, and by rotating the motor 74 in the forward direction 73a or in the reverse direction 73b, the two light shielding plates 71a and 71b are opposed to each other. Moving inward or inward, the two openings 72a,
The opening length 1 of 72b is made variable, whereby stray light can be prevented and the foreign matter 10 can be stably detected even if the shape and dimensions of the glass substrate 1 and the pellicle 3 in the x direction change. That is, as shown in FIG. 7, stray light is scattered light 44 from the frame 2 to which the pellicle 3 is attached.
And the light that has passed through the pellicle 3 is reflected on the surface 11 of the glass substrate 1.
Scattered light 45 generated by striking the circuit pattern 12 formed in the above is considered. These stray lights are photoelectric conversion elements 8
In order to prevent the light receiving surface of the foreign matter 10 from reaching the light receiving surface of the pellicle 3 as shown in FIG. It is necessary to detect the foreign matter 10 on the pellicle 3 within the effective detection area 31.
【0010】そこで、本発明においては図7に示すよう
に、光電変換素子8のレンズアレイ6側の直前位置に遮
光手段7を設置し、この遮光手段7の開口部72a,7
2bの開口長さlを図8および図9に示すように、前記
有効検出領域31の形状寸法に対応して可変に形成して
いるので、迷光を防止して安定した異物10の検出を行
うことが可能である。また、一般に前記ペリクル3(図
7)はガラス基板1を洗浄したのち、ガラス基板1の回
路パターン形成面11、および非形成面に1〜2μm程
度の微小異物が存在していないことを確認した上でガラ
ス基板1の両面に貼り付けるが、回路パターン12の微
細化が進むにつれてガラス基板1の形状寸法も変化して
おり、同時にペリクル3の形状寸法も多様化している
が、異物10の検出はこれら全てに対応する必要があ
る。これに対して本発明における遮光手段7はその開口
部72a,72bの開口長さlが可変に形成されている
ので(図8)、ガラス基板1およびペリクル3の形状寸
法の多様化に確実に対応することが可能である。Therefore, in the present invention, as shown in FIG. 7, the light shielding means 7 is installed immediately in front of the lens array 6 side of the photoelectric conversion element 8, and the openings 72a, 7a of the light shielding means 7 are provided.
As shown in FIGS. 8 and 9, the opening length 1 of 2b is variably formed corresponding to the shape and size of the effective detection area 31, so stray light is prevented and stable detection of the foreign matter 10 is performed. It is possible. In general, after cleaning the glass substrate 1 of the pellicle 3 (FIG. 7), it was confirmed that the circuit pattern forming surface 11 and the non-forming surface of the glass substrate 1 were free of minute foreign matters of about 1 to 2 μm. Although it is attached to both surfaces of the glass substrate 1 above, the shape and size of the glass substrate 1 are changing as the circuit pattern 12 is miniaturized, and at the same time, the shape and size of the pellicle 3 are diversified. Needs to address all of these. On the other hand, in the light-shielding means 7 of the present invention, the opening lengths 1 of the openings 72a and 72b are variable (FIG. 8), so that the glass substrate 1 and the pellicle 3 are surely diversified in shape and size. It is possible to respond.
【0011】前記光電変換素子8は図4および図5に示
すように、前記遮光手段7からの異物像10´が複数個
の画素にて形成された受光面に投影されたとき、その受
光強度に応じた電気信号81(図10参照)を出力し、
この電気信号81をあらかじめ検出すべき異物10の形
成寸法の受光強度に対応した電気信号レベル(基準レベ
ル、閾値)と比較して該電気信号81が基準レベル以上
かもしくはそれ以下になることによって異物10の存在
を検出するように形成されている。また、前記光電変換
素子8は図示していないが、前記各画素の駆動パルスを
カウントすることにより、電気信号81を出力している
画素の位置がわかるように形成されているので、前記ペ
リクル3上のx方向の異物10の存在位置を知ることが
可能である。As shown in FIGS. 4 and 5, the photoelectric conversion element 8 receives a foreign substance image 10 'from the light-shielding means 7 when it is projected onto a light receiving surface formed by a plurality of pixels. Outputs an electric signal 81 (see FIG. 10) according to
The electric signal 81 is compared with an electric signal level (reference level, threshold value) corresponding to the received light intensity of the formation dimension of the foreign matter 10 to be detected in advance, and when the electric signal 81 becomes higher or lower than the reference level, the foreign matter It is configured to detect the presence of 10. Although not shown, the photoelectric conversion element 8 is formed so that the position of the pixel outputting the electric signal 81 can be known by counting the drive pulse of each pixel, so that the pellicle 3 is formed. It is possible to know the existing position of the foreign matter 10 in the upper x direction.
【0012】本発明による異物検出装置11は、上記の
如く構成されているから、次に異物検査の仕方について
説明する。図1に示される載物台9上に設置されたガラ
ス基板1上に、枠2を介してペリクル3を搭載したの
ち、前記載物台9のモータ92を駆動してガラス基板1
をy方向に移動して図9に実線にて示す設定位置13に
位置させると、光電変換素子8の電気信号81が図10
に示すようにペリクル3の枠2の反射光の電気信号8
2,83と、ペリクル3上の異物10による散乱光の電
気信号84となる。この場合、異物10以外による電気
信号82,83は全て迷光となる。そこで本発明は、前
記光電変換素子8の電気信号81よりペリクル3の枠2
の内側の間隔Lを算出し、さらにこの間隔Lに対する有
効検出領域31を算出して該有効検出領域31のx方向
の長さに一致するように遮光手段7の開口部72a,7
2bの開口長さlが設定されたのち、ガラス基板1が載
物台9のモータ92の駆動によりy方向に移動し、検査
原点14(図9に示すようにガラス基板1の端面とす
る)が実線にて示したy方向の設定位置13まで前記ガ
ラス基板1が戻されて再び載物台9のモータ92の駆動
によって上記と逆方向に移動され、これによってペリク
ル3の表面上の異物10の検出が行われる。なお、前記
y方向の設定位置13はペリクル3の枠2の反射光の電
気信号82,83が光電変換素子8の電気信号81とし
て得られる位置であれば、任意の位置に設定してもよい
が、理想的には検査原点14に近い方がよい。Since the foreign matter detecting device 11 according to the present invention is constructed as described above, a method of inspecting a foreign matter will be described below. After mounting the pellicle 3 through the frame 2 on the glass substrate 1 installed on the stage 9 shown in FIG. 1, the motor 92 of the stage 9 is driven to drive the glass substrate 1
Is moved to the setting position 13 shown by the solid line in FIG. 9 by moving in the y direction, the electric signal 81 of the photoelectric conversion element 8 is changed to that shown in FIG.
As shown in, the electric signal 8 of the reflected light of the frame 2 of the pellicle 3
2, 83 and the electric signal 84 of the scattered light by the foreign matter 10 on the pellicle 3. In this case, the electric signals 82 and 83 other than the foreign matter 10 are all stray light. Therefore, according to the present invention, the electric signal 81 of the photoelectric conversion element 8 is used to detect the frame 2 of the pellicle 3.
The inner space L of the light shielding means 7 is calculated, and the effective detection area 31 corresponding to the space L is calculated so as to match the length of the effective detection area 31 in the x direction.
After the opening length 1 of 2b is set, the glass substrate 1 is moved in the y direction by the drive of the motor 92 of the stage 9, and the inspection origin 14 (the end face of the glass substrate 1 as shown in FIG. 9) is obtained. Is returned to the set position 13 in the y direction indicated by the solid line and is again moved in the opposite direction by the driving of the motor 92 of the stage 9, whereby the foreign matter 10 on the surface of the pellicle 3 is moved. Is detected. The setting position 13 in the y direction may be set to any position as long as the electric signals 82 and 83 of the reflected light of the frame 2 of the pellicle 3 can be obtained as the electric signal 81 of the photoelectric conversion element 8. However, ideally, it should be closer to the inspection origin 14.
【0013】実施例の異物検出装置においては、照明手
段4の各発光素子41がx方向に沿い複数個配列してあ
ると共に、レンズアレイ6の結像レンズ61もx方向に
沿い複数個直線状に配置してあるので、それぞれ個々の
分割領域を各結像レンズ61と対応する光電変換素子8
とで検出し、それぞれの領域内に存在する異物10を検
出することができることにより、同一の基準レベルで異
物10を精度よく安定に検出することができる。これに
加え、遮光板71a,71bによって形成される開口部
72a,72bの開口長さlがペリクル3の枠2の有効
検出領域31の大きさに対応して可変となるので、ガラ
ス基板1およびペリクル3の形状寸法が変化しても確実
に対応することができる。したがって、ペリクル3の広
範囲の検査領域に亘って安定して異物の検出を行うこと
ができる。In the foreign matter detecting apparatus of the embodiment, a plurality of light emitting elements 41 of the illumination means 4 are arranged along the x direction, and a plurality of imaging lenses 61 of the lens array 6 are also linear along the x direction. Since each of the divided areas is disposed in the photoelectric conversion element 8 corresponding to each imaging lens 61,
Since it is possible to detect the foreign matter 10 existing in the respective areas by detecting with the and, it is possible to accurately and stably detect the foreign matter 10 at the same reference level. to this
In addition, the opening formed by the light blocking plates 71a and 71b
The opening length l of 72a and 72b is effective for the frame 2 of the pellicle 3.
Since it is variable according to the size of the detection area 31,
Reliable even if the dimensions of the substrate 1 and pellicle 3 change
Can correspond to. Therefore, it is possible to stably detect the foreign matter over a wide inspection area of the pellicle 3.
【0014】次に、本発明の他の実施例を図11乃至図
13について説明する。図11に示す実施例は、ペリク
ル3の表面に対して右斜上方向に照明手段4を設置し、
これに相対する左斜上方向にレンズアレイ6、遮光手段
7および光電変換素子8からなる光電検出手段5を設置
した場合である。また図12に示す実施例は、ペリクル
3の真上に照明手段4を設置し、左右斜上方向の前記照
明手段4によりペリクル3上に形成される帯状照明部位
置を検出し得るように二組のレンズアレイ6、遮光手段
7および光電変換素子8を有する光電検出手段5を設置
した場合である。これら各実施例においても、前記図1
乃至図10に示す実施例と同様な効果を発揮することが
できる。さらに図13に示す実施例においては、ガラス
基板1の下側に取付けられたペリクル3の表面上に存在
する異物10を検出する場合である。この場合には、前
記図1乃至図10に示す如き構成をした異物検出装置1
1を二組設置することにより異物10を検出することが
できる。Next, another embodiment of the present invention will be described with reference to FIGS. In the embodiment shown in FIG. 11, the illuminating means 4 is installed in a right obliquely upward direction with respect to the surface of the pellicle 3,
This is a case where the photoelectric detection unit 5 including the lens array 6, the light shielding unit 7, and the photoelectric conversion element 8 is installed in the upper left diagonal direction opposite to this. Further, in the embodiment shown in FIG. 12, the illumination means 4 is installed right above the pellicle 3 so that the position of the strip-shaped illumination portion formed on the pellicle 3 can be detected by the illumination means 4 in the obliquely upward and leftward directions. This is a case where the photoelectric detection means 5 having the lens array 6, the light shielding means 7, and the photoelectric conversion element 8 in a set is installed. Also in each of these embodiments, FIG.
Through this, the same effect as that of the embodiment shown in FIG. 10 can be exhibited. Further, the embodiment shown in FIG. 13 is a case where the foreign matter 10 existing on the surface of the pellicle 3 attached to the lower side of the glass substrate 1 is detected. In this case, the foreign matter detection device 1 having the structure shown in FIGS.
The foreign object 10 can be detected by installing two sets of 1.
【0015】[0015]
【発明の効果】以上述べたように、本発明によれば、被
検査物走査手段と照明手段とレンズアレイと遮光手段と
光電変換素子とを備え、照明手段の各発光素子が被検査
物の移動方向と直交する幅方向に沿い複数配列してある
と共に、レンズアレイの結像レンズも前記直交する幅方
向に沿い複数直線状に配置し、それぞれ個々の分割領域
を各結像レンズと対応する光電変換素子とで検出し、そ
れぞれの領域内に存在する異物を検出することができる
ように構成したので、同一の基準レベルで異物を精度よ
く安定に検出することができ、しかも、遮光手段の遮光
板によって形成される開口部の開口長さが被検査物の有
効検出領域の大きさに対応して可変となるように構成し
たので、被検査物の形状寸法が変化しても確実に対応す
ることができる結果、産業上の効果の大なるものであ
る。As described above, according to the present invention, according to the present invention, the
Inspection object scanning means, illumination means, lens array, light shielding means
Equipped with a photoelectric conversion element, each light emitting element of the illumination means is inspected
Plural arrays are arranged along the width direction orthogonal to the moving direction of the object.
In addition, the imaging lens of the lens array also has the width in the orthogonal direction.
Arranged in multiple straight lines along each direction, and each divided area
Is detected by each imaging lens and the corresponding photoelectric conversion element, and
It is possible to detect foreign substances existing in each area.
Since it is configured like this, it is possible to accurately measure foreign matter at the same reference level.
Stable detection, and the shading of the shading means
The opening length of the opening formed by the plate is
It is configured to be variable according to the size of the effect detection area.
Therefore, even if the shape and size of the object to be inspected changes, it is possible to respond reliably.
As a result, the industrial effect is great.
【図1】本発明による異物検出装置の第1の実施例を半
導体装置に使用されるガラス基板に適用した斜視図。FIG. 1 is a perspective view in which a first embodiment of a foreign matter detection device according to the present invention is applied to a glass substrate used in a semiconductor device.
【図2】図1に示す照明手段の拡大斜視図。FIG. 2 is an enlarged perspective view of the lighting unit shown in FIG.
【図3】図1に示すレンズアレイを形成する結像レンズ
の特性説明図。3 is a characteristic explanatory view of an imaging lens forming the lens array shown in FIG.
【図4】レンズアレイを示す拡大斜視図。FIG. 4 is an enlarged perspective view showing a lens array.
【図5】レンズアレイの光量ムラ防止のための一方法を
示す斜視図。FIG. 5 is a perspective view showing a method for preventing unevenness in light amount of the lens array.
【図6】レンズアレイの光量ムラ防止のための他の一方
法を示す斜視図。FIG. 6 is a perspective view showing another method for preventing unevenness in light amount of the lens array.
【図7】異物以外の迷光についての説明図。FIG. 7 is an explanatory diagram of stray light other than foreign matter.
【図8】図1に示す遮光手段の拡大斜視図。FIG. 8 is an enlarged perspective view of the light shielding unit shown in FIG.
【図9】ペリクル付ガラス基板の平面図。FIG. 9 is a plan view of a glass substrate with a pellicle.
【図10】ペリクル枠の反射光およびペリクル膜上の異
物の散乱光による電気信号との関係を示す説明図。FIG. 10 is an explanatory diagram showing the relationship between the reflected light of the pellicle frame and the electric signal due to the scattered light of foreign matter on the pellicle film.
【図11】本発明による異物検出装置の他の実施例を示
す説明図。FIG. 11 is an explanatory view showing another embodiment of the foreign matter detecting device according to the present invention.
【図12】本発明による異物検出装置のさらに他の実施
例を示す説明図。FIG. 12 is an explanatory view showing still another embodiment of the foreign matter detecting device according to the present invention.
【図13】本発明による異物検出装置のまたさらに他の
実施例を示す説明図。FIG. 13 is an explanatory view showing still another embodiment of the foreign matter detecting device according to the present invention.
1…ガラス基板、2…枠、3…ペリクル、4…照明手
段、41…発光素子、43…帯状照明部、5…光電検出
手段、6…レンズアレイ、61…結像レンズ、7…遮光
手段、71a,71b…遮光板、72a,72b…開口
部、8…光電変換素子、10…異物、11…異物検出装
置。DESCRIPTION OF SYMBOLS 1 ... Glass substrate, 2 ... Frame, 3 ... Pellicle, 4 ... Illumination means, 41 ... Light emitting element, 43 ... Band illumination part, 5 ... Photoelectric detection means, 6 ... Lens array, 61 ... Imaging lens, 7 ... Shading means , 71a, 71b ... Shading plate, 72a, 72b ... Opening
Part, 8 ... Photoelectric conversion element, 10 ... Foreign matter, 11 ... Foreign matter detection device.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭61−123270(JP,A) 特開 昭55−149829(JP,A) 特開 昭59−99237(JP,A) 特公 昭54−13751(JP,B2) 実公 昭51−22707(JP,Y2) ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP 61-123270 (JP, A) JP 55-149829 (JP, A) JP 59-99237 (JP, A) JP 54- 13751 (JP, B2) Actual public Sho 51-22707 (JP, Y2)
Claims (1)
よって被検査物表面上に存在する異物からの散乱光を検
出する異物検出装置において、前記被検査物を一方向に
移動させる被検査物走査手段と、前記被検査物の移動方
向と直交する幅方向に沿って直線状に複数配列された発
光素子を有し、被検査物表面上に対し、所望の傾斜角度
をもって斜め方向から前記直交する幅方向に沿い帯状照
明する照明手段と、被検査物表面の前記直交する幅方向
に沿い直線状に複数配置されると共に、被検査物表面上
からの散乱光を集光する結像レンズからなり、かつ隣り
合う結像レンズによる互いの結像領域の重なり度が大き
くなるように構成されたレンズアレイと、互いに重ね合
わせると共に、前記結像レンズの結像位置に前記直交す
る幅方向に沿ってそれぞれ移動自在に配置された遮光
板,該それぞれの遮光板の互いに対向する位置に前記直
交する幅方向に沿って開口されると共に、前記被検査物
表面の検出結像領域以外から発生する散乱光を遮光する
開口部を有し、遮光板の移動により開口部における前記
直交する幅方向の開口長さを被検査物の有効検出領域に
対応して可変とする遮光手段と、遮光手段の開口部を透
過する光を受光する光電変換素子とを備えたことを特徴
とする異物検出装置。 1. When illuminating the surface of an object to be inspected,
Therefore, the scattered light from foreign matter existing on the surface of the inspection object can be detected.
In the foreign matter detection device that comes out, the object to be inspected in one direction
Inspecting object scanning means for moving and moving method of the inspecting object
The lines are arranged in a straight line along the width direction orthogonal to the
Has an optical element and has a desired tilt angle with respect to the surface of the object to be inspected.
From the diagonal direction along the width direction orthogonal to the above.
Illuminating means that illuminates and the width direction of the surface of the inspection object which is orthogonal to
Are arranged in a straight line along the
Consists of an imaging lens that collects scattered light from
The degree of overlap between the image forming areas due to the matching image forming lenses is large.
Lens array configured to
And at the same time to the image forming position of the image forming lens.
A light shield that is movably arranged along the width direction
The plate and the direct shields at the positions facing each other of the respective shading plates.
The object to be inspected is opened along the intersecting width direction.
Blocks scattered light generated from areas other than the detection and imaging area on the surface
The opening has an opening, and the movement of the light shielding plate causes the aforementioned
The orthogonal opening width in the width direction is set as the effective detection area of the inspection object.
Correspondingly variable light blocking means and the opening of the light blocking means
A foreign matter detection device, comprising: a photoelectric conversion element that receives excess light .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5114732A JPH0736000B2 (en) | 1993-05-17 | 1993-05-17 | Foreign object detection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5114732A JPH0736000B2 (en) | 1993-05-17 | 1993-05-17 | Foreign object detection device |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29991686A Division JPH0641920B2 (en) | 1986-12-18 | 1986-12-18 | Foreign object detection method and apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0611453A JPH0611453A (en) | 1994-01-21 |
| JPH0736000B2 true JPH0736000B2 (en) | 1995-04-19 |
Family
ID=14645249
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5114732A Expired - Lifetime JPH0736000B2 (en) | 1993-05-17 | 1993-05-17 | Foreign object detection device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0736000B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008191066A (en) * | 2007-02-07 | 2008-08-21 | Topcon Corp | Surface inspection method and surface inspection apparatus |
| CN115629076B (en) * | 2022-09-27 | 2025-02-18 | 威海华菱光电股份有限公司 | Array type image detection device |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5413751A (en) * | 1977-07-01 | 1979-02-01 | Toyo Communication Equip | Elastic surface wave filter |
| JPS61123270A (en) * | 1984-11-20 | 1986-06-11 | Canon Inc | Color picture processing system |
-
1993
- 1993-05-17 JP JP5114732A patent/JPH0736000B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0611453A (en) | 1994-01-21 |
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