JPH0645845B2 - Method for manufacturing Al substratum for high strength magnetic disk - Google Patents
Method for manufacturing Al substratum for high strength magnetic diskInfo
- Publication number
- JPH0645845B2 JPH0645845B2 JP62057569A JP5756987A JPH0645845B2 JP H0645845 B2 JPH0645845 B2 JP H0645845B2 JP 62057569 A JP62057569 A JP 62057569A JP 5756987 A JP5756987 A JP 5756987A JP H0645845 B2 JPH0645845 B2 JP H0645845B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- manufacturing
- temperature
- magnetic disk
- strength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 238000000034 method Methods 0.000 title claims description 6
- 239000000758 substrate Substances 0.000 claims description 26
- 238000000137 annealing Methods 0.000 claims description 22
- 238000001953 recrystallisation Methods 0.000 claims description 12
- 238000005482 strain hardening Methods 0.000 claims description 12
- 229910000838 Al alloy Inorganic materials 0.000 claims description 9
- 238000005097 cold rolling Methods 0.000 claims description 8
- 238000005098 hot rolling Methods 0.000 claims description 7
- 229910052725 zinc Inorganic materials 0.000 claims description 5
- 239000012535 impurity Substances 0.000 claims description 4
- 229910052748 manganese Inorganic materials 0.000 claims description 3
- 238000004080 punching Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 description 10
- 239000000126 substance Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 229910000765 intermetallic Inorganic materials 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は磁気ディスク用Ａｌサブストレートの製造に係
り、高強度化のニーズに対応し得るディスクサブストレ
ートの製造方法に関する。Description: TECHNICAL FIELD The present invention relates to manufacturing of an Al substrate for a magnetic disk, and relates to a manufacturing method of a disk substrate which can meet the needs for higher strength.
(従来の技術及び解決しようとする問題点) 磁気ディスク用サブストレートには、従来よりＪＩＳ５
０８６を基本組成とするアルミニウム合金が素材として
用いられ、調質は平坦度、特に経時による平坦度変化を
防止するためにＯ材で用いられている。(Prior art and problems to be solved) Conventionally, a JIS 5
An aluminum alloy having a basic composition of 086 is used as a raw material, and the temper is used as an O material to prevent flatness, particularly flatness change with time.
磁気ディスク用サブストレートの高強度化は、ディスク
の薄肉化を可能とし、例えば、同一サイズのドライブ装
置内への収容枚数の増大、軽量化によるドライブモータ
ーの小型化等々の種々の利点をもたらすため、高強度で
平坦度の良いディスクサブストレートの市場ニーズが増
大してきているのが現状である。The increased strength of the magnetic disk substrate makes it possible to reduce the thickness of the disk, resulting in various advantages such as an increase in the number of disks that can be accommodated in a drive device of the same size and a reduction in the weight of the drive motor. At present, the market needs for a high-strength and flat disk substrate are increasing.
然るに、上記従来材によるディスクサブストレートは、
強度的には耐力１３kgf／mm2が上限となっており、薄肉
化を推進する上で強度が不充分であった。また、Ｈ２４
タイプの検討も試みられてはいるものの、必要とする平
坦度が得られず、更にメディア加工工程中で加熱による
変形が生ずる問題がある。However, the disk substrate made of the above conventional material is
In terms of strength, the yield strength was 13 kgf / mm 2 as the upper limit, and the strength was insufficient to promote thinning. Also, H24
Although attempts have been made to investigate the type, there is a problem in that the required flatness cannot be obtained, and further, deformation due to heating occurs during the media processing step.
本発明は、上記従来技術の問題点を解決して市場ニーズ
に応えるべくなされたものであって、高強度で且つ平坦
度、特に経時変化のない平坦度の優れた磁気ディスク用
Ａｌサブストレートを安定して得る方法を提供すること
を目的とするものである。The present invention has been made to solve the above-mentioned problems of the prior art and meet the market needs, and provides an Al substrate for a magnetic disk which has high strength and excellent flatness, particularly flatness that does not change with time. The object is to provide a stable method.
(問題点を解決するための手段) 上記目的を達成するためには、本発明においては、各種
実験研究の結果に基づき、アルミニウム合金の組成並び
に製造プロセス条件を併せて規制することにより可能に
したものである。(Means for Solving Problems) In order to achieve the above object, in the present invention, the composition of the aluminum alloy and the manufacturing process conditions are collectively controlled based on the results of various experimental studies. It is a thing.
すなわち、本発明に係る高強度磁気ディスク用Ａｌサブ
ストレートの製造方法は、Ｍg:３〜６％及びＭn:０．０
５〜１％を含み、更に必要に応じてＣu:０．０２〜０．
５％及びＺn:０．１〜０．７％の１種又は２種を含み、
残部がＡｌ及び不純物よりなるアルミニウム合金につ
き、熱間圧延後、最終コイルの冷間加工率が１０〜５０
％の範囲となる冷間圧延を行い、次いでディスクブラン
クを打抜き、該ディスクブランク材の歪取り焼鈍を再結
晶温度以下の温度で行うことを特徴とするものである。That is, the method of manufacturing an Al substrate for a high-strength magnetic disk according to the present invention is Mg: 3 to 6% and Mn: 0.0
5 to 1%, and if necessary, Cu: 0.02 to 0.
1% or 2% of 5% and Zn: 0.1 to 0.7%,
For the aluminum alloy with the balance being Al and impurities, the cold working ratio of the final coil is 10 to 50 after hot rolling.
% Cold rolling is performed, then the disc blank is punched, and strain relief annealing of the disc blank material is performed at a temperature not higher than the recrystallization temperature.
以下に本発明を実施例に基づいて詳細に説明する。The present invention will be described in detail below based on examples.
まず、磁気ディスク用サブストレートに素材として用い
るアルミニウム合金の化学成分限定理由を説明する。First, the reasons for limiting the chemical composition of the aluminum alloy used as a material for the magnetic disk substrate will be described.
Ｍg: Ｍgはサブストレートの強度を得る上で不可欠の元素で
あるが、３％未満では充分な強度が得られず、しかし６
％を超えると、圧延加工性が劣化し、また最終の焼鈍
(歪取り焼鈍又はサブストレート焼鈍)でＡｌ2Ｍg3相が
析出するため、Ｍg量は３〜６％とする。Mg: Mg is an essential element for obtaining the strength of the substrate, but if it is less than 3%, sufficient strength cannot be obtained, but 6
%, The rolling processability deteriorates and the final annealing
Since the Al 2 Mg 3 phase is precipitated by (strain relief annealing or substrate annealing), the amount of Mg is set to 3 to 6%.
Ｍn: Ｍnは晶出物を増加、成長させず、加工硬化を促進し且
つ焼鈍軟化温度を上げるために必要な元素である。また
ＭnはＦe系晶出物Ａｌ6Ｆeの一部を置換してＡｌ＜Ｍn・
Ｆe＞をつくるため、サブストレート加工後の表面腐食
を抑制する効果も期待できる。Ｍn量が０．０５％未満
ではそのような効果が充分に得られず、１％を超えると
晶出物が成長するため、Ｍn量は０．０５〜１％とす
る。Mn: Mn is an element necessary for increasing workability and hardening without increasing or growing crystallized substances and for raising the annealing softening temperature. Further, Mn replaces a part of the Fe-based crystallized substance Al 6 Fe and Al <Mn.
Since Fe> is created, an effect of suppressing surface corrosion after the substrate processing can be expected. If the amount of Mn is less than 0.05%, such an effect is not sufficiently obtained, and if it exceeds 1%, crystallized substances grow, so the amount of Mn is set to 0.05 to 1%.
Ｃu、Ｚn: 上記元素を必須成分とするが、必要に応じてＣu及び／
又はＺnを適量添加することができる。すなわち、Ｃu、
Ｚnはサブストレートのめっき性を改善するのに有効で
あるので、サブストレートの用途によって添加するが、
添加する場合にはＣu:０．０２〜０．５％、Ｚn:０．１
〜０．７％の範囲とする。Ｃu、Ｚnとも下限値未満では
めっき性の改善に効果が不充分となり、上限値を超える
と晶出物が粗大化するため、好ましくない。Cu, Zn: The above elements are essential components, but Cu and / or
Alternatively, Zn can be added in an appropriate amount. That is, Cu,
Zn is effective for improving the plating property of the substrate, so it is added depending on the use of the substrate.
When added, Cu: 0.02-0.5%, Zn: 0.1
The range is to 0.7%. If both Cu and Zn are less than the lower limit, the effect of improving the plating property becomes insufficient, and if it exceeds the upper limit, the crystallized substance becomes coarse, which is not preferable.
なお、本発明では上記成分のほか、通常不純物として含
まれる限度でＳi、Ｆe、Ｃr、Ｔi等を許容することがで
きる。しかし、Ｓi≦０．４０％、Ｆe≦０．５０％、Ｃ
r≦０．２５％、Ｔi≦０．１５％に規制するのが好まし
い。In the present invention, in addition to the above-mentioned components, Si, Fe, Cr, Ti and the like can be permitted as long as they are usually contained as impurities. However, Si ≦ 0.40%, Fe ≦ 0.50%, C
It is preferable to regulate r ≦ 0.25% and Ti ≦ 0.15%.
次に、上記化学成分のアルミニウム合金を素材としてサ
ブストレートを製造するプロセス条件について説明す
る。Next, process conditions for manufacturing a substrate using the above-mentioned aluminum alloy having the chemical composition as a raw material will be described.
まず、該アルミニウム合金は常法により溶解、鋳造し、
均熱処理、熱間圧延を施してホットコイルを得る。First, the aluminum alloy is melted and cast by a conventional method,
Soaking and hot rolling are performed to obtain a hot coil.
次いで、必要に応じて中間焼鈍又は冷間圧延と中間焼鈍
を行った後、最終コイルの冷間加工率が１０〜５０％の
範囲となる冷間圧延を行って所定の板厚とする。なお、
中間焼鈍は再結晶温度以上の温度で行う。Then, after performing intermediate annealing or cold rolling and intermediate annealing as needed, cold rolling is performed so that the cold working ratio of the final coil is in the range of 10 to 50% to obtain a predetermined plate thickness. In addition,
The intermediate annealing is performed at a temperature higher than the recrystallization temperature.
加工率を規制する冷間加工の場合、冷間加工率が小さい
と、焼鈍加熱時の再結晶温度が上昇し、軟化曲線も緩や
かになるが、反面、加工硬化による充分な強度が得られ
ない。加工硬化により充分な強度を確保し、且つ再結晶
温度が所定温度以上で軟化曲線が緩やかな範囲とするた
めに、冷間加工率を１０〜５０％、好ましくは１５〜３
０％の範囲にする必要がある。これにより、再結晶温度
が上昇するため、後工程の歪取り焼鈍の温度を上げるこ
とができ、歪矯正に有効であり、更には以後の工程中に
おける加熱に対して変形せず安定となる。また軟化曲線
が緩やかであるので、同一強度レベルの製品を安定して
製造することができると云う利点もある。In the case of cold working that regulates the working rate, if the cold working rate is small, the recrystallization temperature during annealing heating rises and the softening curve also becomes gentle, but on the other hand, sufficient strength due to work hardening cannot be obtained. . In order to secure sufficient strength by work hardening and to set the recrystallization temperature to a predetermined temperature or more and the softening curve to a gentle range, the cold working rate is 10 to 50%, preferably 15 to 3
It should be in the range of 0%. As a result, the recrystallization temperature rises, so that the temperature of the strain relief annealing in the subsequent step can be raised, which is effective for straightening the strain, and is stable without being deformed by heating in the subsequent steps. Further, since the softening curve is gentle, there is an advantage that a product having the same strength level can be stably manufactured.
上記所定の加工率での冷間加工を行った後は、ディスク
ブランクを打抜き、得られたディスクブランク材に再結
晶温度以下の温度で歪取り焼鈍を行う。次いで、サブス
トレート粗加工及び仕上げ加工を行うが、粗加工の後に
必要に応じてサブストレート焼鈍を施すことができる。
歪取り焼鈍並びにサブストレート焼鈍の温度は、素材の
軟化特性により決定されるものであり、再結晶温度以下
の温度とする。再結晶温度を超える温度とすると充分な
強度が得られず、また本発明に基づく製造工程に供する
素材の場合、再結晶粒が粗大化するため、好ましくな
い。なお、上記冷間加工を所定の加工率で行うので、従
来の製造方法では再結晶温度がせいぜい２４０℃が上限
であったのに対し、本発明では２６０〜３２０℃まで可
能となり、焼鈍効果が顕著となる。After performing the cold working at the predetermined working ratio, the disc blank is punched, and the obtained disc blank material is subjected to strain relief annealing at a temperature not higher than the recrystallization temperature. Substrate roughing and finishing are then carried out, but after the roughing, substrate annealing can be performed if necessary.
The temperature of the strain relief annealing and the substrate annealing is determined by the softening characteristics of the material and is set to a temperature equal to or lower than the recrystallization temperature. If the temperature exceeds the recrystallization temperature, sufficient strength cannot be obtained, and in the case of the material used in the manufacturing process according to the present invention, the recrystallized grains become coarse, which is not preferable. Since the cold working is performed at a predetermined working rate, the recrystallization temperature of the conventional manufacturing method was 240 ° C. at the maximum, whereas the present invention allows the recrystallization temperature to be 260 to 320 ° C., and the annealing effect can be improved. It becomes remarkable.
次に、本発明の実施例を示す。Next, examples of the present invention will be described.
(実施例) 第１表に示す化学成分wt％)を有するアルミニウム合金
をディスク用素材とし、常法により溶解、鋳造し、均熱
処理して熱間圧延により５．４mm厚のホットコイルを得
た。(Example) An aluminum alloy having the chemical composition shown in Table 1 (wt%) was used as a disk material, and melted and cast by a conventional method, soaking, and hot rolling to obtain a hot coil having a thickness of 5.4 mm. .
次いで、所定の板厚まで冷間圧延を行い、中間焼鈍を施
した後、第２表に示す冷間加工率で最終の冷間加工を行
い、ディスクブランクを打抜き、得られたディスクブラ
ンク材に対して同表に示す焼鈍温度でブランク焼鈍を施
し、サブストレート粗加工及び仕上げ加工(粗グライン
ド→Ｄ/Ｔ)を行って１３０φ×４０φ×１．２７tの磁
気ディスクサブストレートを試作した。なお、最終製品
の板厚、ホットコイルの板厚、仕上げ温度等によっては
熱間圧延→冷間圧延→打抜き、或いは熱間圧延→中間焼
鈍→冷間圧延→打抜き等の工程が選択できるのは云うま
でもない。また、一部については、粗加工後に同表に示
す温度でサブストレート焼鈍を施した。Then, after cold rolling to a predetermined plate thickness and performing intermediate annealing, final cold working was performed at a cold working rate shown in Table 2, a disk blank was punched, and the obtained disk blank material was obtained. On the other hand, blank annealing was performed at the annealing temperature shown in the same table, and substrate rough processing and finish processing (coarse grinding → D / T) were performed to make a 130φ × 40φ × 1.27t magnetic disk substrate as a prototype. Depending on the plate thickness of the final product, the plate thickness of the hot coil, the finishing temperature, etc., the processes such as hot rolling → cold rolling → punching, or hot rolling → intermediate annealing → cold rolling → punching can be selected. Needless to say. Further, some of them were subjected to substrate annealing at the temperatures shown in the table after rough working.
得られたサブストレートについて強度、平坦度を調べる
と共に、金属間化合物の有無乃至程度についても調べ
た。それらの結果を第３表に示す。なお、平坦度につい
ては、サブストレート加工後、加熱を施して経時劣化を
促進させ、レーザー干渉計を用いて平坦度を測定して評
価した。The strength and flatness of the obtained substrate were examined, and the presence or absence of an intermetallic compound and its degree were also examined. The results are shown in Table 3. The flatness was evaluated by heating after substrate processing to promote deterioration over time and measuring the flatness using a laser interferometer.
第３表から明らかなとおり、従来例では強度を上げると
平坦度が劣り、逆に平坦度を向上させると強度が低下す
るのに対し、本発明例の磁気サブストレートはいずれ
も、平坦度が良好で、特に経時の平坦度変化がなく、且
つ従来よりも強度が５０〜７０％程度向上している。な
お、本発明の化学成分範囲外又は製造条件外で得られた
比較例のものは、強度が充分でないか、平坦度又は経時
の平坦度変化に問題があり、或いは金属間化合物に問題
があった。 As is apparent from Table 3, in the conventional example, when the strength is increased, the flatness is poor, and conversely, when the flatness is improved, the strength is decreased. On the contrary, in the magnetic substrates of the present invention, the flatness is It is good, there is no change in flatness over time, and the strength is improved by 50 to 70% as compared with the conventional one. In addition, those of Comparative Examples obtained outside the chemical composition range of the present invention or outside the manufacturing conditions have insufficient strength, have problems in flatness or change in flatness over time, or have problems with intermetallic compounds. It was
(発明の効果) 以上詳述したように、本発明によれば、デイスク用素材
の化学成分を規制し、併せて製造プロセス条件をも規制
するので、高強度で、且つ平坦度が優れ、経時の平坦度
変化もない磁気ディスク用サブストレートを得ることが
でき、高強度化の要請に充分応えることが可能である。(Effects of the Invention) As described in detail above, according to the present invention, the chemical components of the disk material are regulated, and the manufacturing process conditions are also regulated. Therefore, the strength is high, and the flatness is excellent. It is possible to obtain a substrate for a magnetic disk having no change in flatness, and it is possible to sufficiently meet the demand for higher strength.
Claims (2)
Ｍn:０．０５〜１％を含み、残部がＡｌ及び不純物より
なるアルミニウム合金につき、熱間圧延後、最終コイル
の冷間加工率が１０〜５０％の範囲となる冷間圧延を行
い、次いでディスクブランクを打抜き、該ディスクブラ
ンク材の歪取り焼鈍を再結晶温度以下の温度で行うこと
を特徴とする高強度磁気ディスク用Ａｌサブストレート
の製造方法。1. An aluminum alloy containing Mg: 3 to 6% and Mn: 0.05 to 1% by weight (hereinafter the same), with the balance being Al and impurities, and the final coil after hot rolling. Cold-rolling is performed in the range of 10 to 50%, then the disc blank is punched, and the strain relief annealing of the disc blank is performed at a temperature not higher than the recrystallization temperature. A method for manufacturing an Al substrate for a magnetic disk.
み、更にＣu:０．０２〜０．５％及びＺn:０．１〜０．
７％の１種又は２種を含み、残部がＡｌ及び不純物より
なるアルミニウム合金につき、熱間圧延後、最終コイル
の冷間加工率が１０〜５０％の範囲となる冷間圧延を行
い、次いでディスクブランクを打抜き、該ディスクブラ
ンク材の歪取り焼鈍を再結晶温度以下の温度で行うこと
を特徴とする高強度磁気ディスク用Ａｌサブストレート
の製造方法。2. It contains Mg: 3 to 6% and Mn: 0.05 to 1%, and further contains Cu: 0.02 to 0.5% and Zn: 0.1 to 0.
For an aluminum alloy containing 7% of 1 or 2 and the balance of Al and impurities, after hot rolling, cold rolling is performed so that the cold working ratio of the final coil is in the range of 10 to 50%. A method for manufacturing an Al substrate for a high-strength magnetic disk, which comprises punching a disk blank and performing strain relief annealing of the disk blank at a temperature not higher than a recrystallization temperature.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62057569A JPH0645845B2 (en) | 1987-03-12 | 1987-03-12 | Method for manufacturing Al substratum for high strength magnetic disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62057569A JPH0645845B2 (en) | 1987-03-12 | 1987-03-12 | Method for manufacturing Al substratum for high strength magnetic disk |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63223150A JPS63223150A (en) | 1988-09-16 |
| JPH0645845B2 true JPH0645845B2 (en) | 1994-06-15 |
Family
ID=13059472
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62057569A Expired - Lifetime JPH0645845B2 (en) | 1987-03-12 | 1987-03-12 | Method for manufacturing Al substratum for high strength magnetic disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0645845B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5260793B2 (en) * | 2010-05-20 | 2013-08-14 | パナソニック株式会社 | Chemical determination device and chemical determination method |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH081699B2 (en) * | 1988-10-28 | 1996-01-10 | 株式会社神戸製鋼所 | Method for manufacturing an alloy mirror-finished substrate for magnetic disk |
-
1987
- 1987-03-12 JP JP62057569A patent/JPH0645845B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5260793B2 (en) * | 2010-05-20 | 2013-08-14 | パナソニック株式会社 | Chemical determination device and chemical determination method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63223150A (en) | 1988-09-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS62177143A (en) | Aluminum alloy sheet excellent in formability and baking hardening and its production | |
| EP0646655B1 (en) | Method of manufacturing natural aging-retardated aluminum alloy sheet exhibiting excellent formability and excellent bake hardening ability | |
| JPH11343548A (en) | Production of high strength ti alloy excellent in workability | |
| EP0616044A2 (en) | Method of manufacturing natural aging retardated aluminum alloy sheet | |
| JP3748859B2 (en) | High-strength copper alloy with excellent bendability | |
| JPH0635644B2 (en) | Manufacturing method of aluminum alloy hard plate for forming | |
| JP4200086B2 (en) | Aluminum alloy plate for forming and method for producing the same | |
| EP0613959B1 (en) | An aluminium alloy sheet for use in press forming , exhibiting excellent hardening property obtained by baking at low temperature for a short period of time and a method of manufacturing the same | |
| JP7132415B1 (en) | Aluminum alloy plate for magnetic disk, aluminum alloy blank for magnetic disk and aluminum alloy substrate for magnetic disk | |
| EP0299605B1 (en) | Iron-copper-chromium alloy for high-strength lead frame or pin grid array and process for preparation thereof | |
| JPH0645845B2 (en) | Method for manufacturing Al substratum for high strength magnetic disk | |
| JPH0547615B2 (en) | ||
| JPH06272000A (en) | Production of al alloy sheet excellent in formability and baking hardenability | |
| JPH04304339A (en) | Aluminum alloy sheet for press forming excellent in balance between strength and ductility and baking hardenability and its production | |
| JPS5919987B2 (en) | Manufacturing method of Al-Mg alloy | |
| JPH0690792B2 (en) | Method for manufacturing Al substratum for magnetic disk | |
| JPS5856734B2 (en) | Manufacturing method of ferritic stainless steel sheet | |
| JPH0222446A (en) | Manufacture of high formability aluminum alloy hard plate | |
| JP3394698B2 (en) | High formability aluminum alloy sheet with high strength and good machinability | |
| JP3218099B2 (en) | Method for producing aluminum alloy sheet with low ear ratio and excellent formability | |
| JP3359428B2 (en) | Manufacturing method of aluminum alloy sheet for forming | |
| JPH02254143A (en) | Production of hard aluminum alloy sheet for forming | |
| JPH09143644A (en) | Manufacturing method of aluminum alloy sheet for forming | |
| JPS6362853A (en) | Manufacture of material for magnetic disk substrate | |
| JPH04107237A (en) | Al alloy sheet for can end excellent in corrosion resistance and its manufacture |