JPH0648249B2 - Optical surface inspection device - Google Patents
Optical surface inspection deviceInfo
- Publication number
- JPH0648249B2 JPH0648249B2 JP26053587A JP26053587A JPH0648249B2 JP H0648249 B2 JPH0648249 B2 JP H0648249B2 JP 26053587 A JP26053587 A JP 26053587A JP 26053587 A JP26053587 A JP 26053587A JP H0648249 B2 JPH0648249 B2 JP H0648249B2
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- Prior art keywords
- sample
- scanning
- signal
- light beam
- light
- Prior art date
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Description
【発明の詳細な説明】 〔産業上の利用分野〕 この発明は半導体用基板のような鏡面状の表面をもつ試
料のその表面を光ビームで走査し、試料表面の凹凸や異
物などによる散乱光を受光して、これらの凹凸や異物の
有無や存在の程度を光学的に検査する装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention scans the surface of a sample having a mirror-like surface such as a semiconductor substrate with a light beam, and scatters light due to irregularities on the sample surface or foreign matter. The present invention relates to an apparatus that receives light and optically inspects the presence or absence of these irregularities or foreign matter and the degree of existence.
上述の光学的検査装置においては、検査精度を向上させ
るために、検査領域を定めるための試料の位置決めや、
試料の移動速度の再現性ができるだけ正確でなければな
らない。In the above-described optical inspection device, in order to improve the inspection accuracy, positioning of the sample for defining the inspection area,
The reproducibility of the sample movement speed should be as accurate as possible.
この種の従来の光学的検査装置の要部構成を第6図に示
す。FIG. 6 shows the configuration of the main parts of a conventional optical inspection device of this type.
第6図(a)において光投射手段1は光源2と集光レンズ
3とを備えており、光源2から投射された平行光束4は
集光レンズ3によって円板状の試料5の表面に垂直でか
つスポット状に集光する光ビーム6として投射される。
試料5の表面に凹凸や微粒子の付着のような異常箇所7
があり、これを光ビーム6が照射するとパルス状の散乱
光8を生じ、この散乱光8は試料5の表面に対して斜め
に配置された光検出器9で受光され、受光量に応じたパ
ルス状の電気信号10を出力する。異常箇所7が存在しな
い場合は光ビーム6は正反射し、正反射光の方向は試料
5の表面に対して垂直なので、この正反射光は光検出器
9には入射しない。In FIG. 6 (a), the light projecting means 1 is provided with a light source 2 and a condenser lens 3, and the parallel light flux 4 projected from the light source 2 is perpendicular to the surface of the disk-shaped sample 5 by the condenser lens 3. And is projected as a light beam 6 that is condensed in a spot shape.
Abnormal place 7 such as unevenness or adhesion of fine particles on the surface of sample 5
When the light beam 6 irradiates it, pulsed scattered light 8 is generated, and this scattered light 8 is received by a photodetector 9 obliquely arranged with respect to the surface of the sample 5, and the scattered light 8 depends on the amount of received light. It outputs a pulsed electrical signal 10. When the abnormal portion 7 does not exist, the light beam 6 is specularly reflected, and the direction of specularly reflected light is perpendicular to the surface of the sample 5, so this specularly reflected light does not enter the photodetector 9.
試料5は駆動速度制御系181 と回転速度制御系182 とを
備えた駆動装置18で駆動される回転ステージ11に搭載さ
れ、その回転ステージ11の軸12まわりに回転しながらさ
らに矢印で示すP方向に直線状に移動させられる。すな
わちこの例では回転ステージ11は走査手段と相対的移動
手段とを兼ねている。光投射手段1は固定されているの
で、この移動によって光ビーム6は試料5の表面を第6
図(b)に示すように渦巻き状に走査し、軸12の位置で定
められる検査領域について電気信号10のパルス状成分を
パルス計数回路からなる計測手段16で計数し、計数結果
17を出力して検査を行う。The sample 5 is mounted on a rotary stage 11 driven by a drive device 18 having a drive speed control system 181 and a rotation speed control system 182. The sample 5 is rotated around an axis 12 of the rotary stage 11 and further in a P direction indicated by an arrow. Can be moved in a straight line. That is, in this example, the rotary stage 11 serves both as a scanning unit and a relative moving unit. Since the light projection means 1 is fixed, this movement causes the light beam 6 to move the surface of the sample 5 to the sixth position.
As shown in FIG. (B), it scans in a spiral shape, and counts the pulse-shaped component of the electric signal 10 in the inspection area defined by the position of the axis 12 by the measuring means 16 including a pulse counting circuit, and the counting result
Output 17 for inspection.
第7図は第2の従来例の要部斜視図を示したものであ
る。この例においては光投射手段1は走査手段をも兼ね
ており、試料5に対して垂直あるいはある角度をもつ面
を走査面13とし、その走査面13内で光ビーム6の投射方
向を周期的に変じて試料5の表面を走査する。試料5の
表面と走査面13との交線が走査線14である。FIG. 7 shows a perspective view of a main part of the second conventional example. In this example, the light projecting means 1 also serves as the scanning means, and the surface perpendicular to the sample 5 or having an angle is defined as the scanning surface 13, and the projection direction of the light beam 6 is cyclical within the scanning surface 13. Then, the surface of the sample 5 is scanned. The line of intersection between the surface of the sample 5 and the scanning surface 13 is the scanning line 14.
試料5の近傍には走査線14と平行な光入射面を備えた集
光装置15が試料5表面の異常箇所7からのパルス状の散
乱光8のみを受光する角度で配置されている。この集光
装置15に光検出器9が接続されており、散乱光8による
パルス状の電気信号10を出力し、これを計測手段16で計
数し、計数結果17を得る。In the vicinity of the sample 5, a condenser 15 having a light incident surface parallel to the scanning line 14 is arranged at an angle to receive only the pulsed scattered light 8 from the abnormal portion 7 on the surface of the sample 5. The photodetector 9 is connected to the light collecting device 15, which outputs a pulsed electric signal 10 by the scattered light 8 and counts it by the measuring means 16 to obtain a counting result 17.
試料5は駆動速度制御系191 を備えた駆動装置19で駆動
される支持機構20によって走査線14と交わる矢印Q方向
に直線的に移動し、これによって試料5は全面にわたっ
て光ビーム6で走査される。The sample 5 is linearly moved in the direction of the arrow Q intersecting the scanning line 14 by the support mechanism 20 driven by the driving device 19 having the driving speed control system 191, whereby the sample 5 is scanned with the light beam 6 over the entire surface. It
〔発明が解決しようとする問題点〕 上述の光学的表面検査装置においては、通常光ビーム6
がある一個の異常箇所7を走査する回数は確率的に1回
以下あるいは複数回であることが多く、電気信号10のパ
ルス状成分の計数結果はそのままでは実際の異常箇所数
を示さない。そこで計数結果を実際の異常箇所数に対し
て校正した上で検査が行われる。走査の周期は一定であ
るため、試料5の表面の検査領域全体が走査される回数
は試料5の移動速度が異なると、それに応じて異なって
くる。このため単位長当りの走査線数すなわち走査線密
度は試料5の移動速度によって異なり、同一の異常箇所
7が走査される回数すなわち異常箇所の検知数は試料5
の移動速度の影響を受ける。したがって電気信号10のパ
ルス状成分の計数結果を実際の異常箇所数に対して校正
を行った場合の移動速度と同一の移動速度をその後の検
査においても正確に保つことが必要とされ、このために
駆動装置18や19には移動速度を不変に保つ駆動速度制御
系181,191 や回転速度制御系182 を備えなければならな
い。あるいは検査のつど異常箇所数が既知である試料を
用いて校正を行なわねばならない。[Problems to be Solved by the Invention] In the optical surface inspection apparatus described above, the normal light beam 6
In many cases, the number of times that one abnormal place 7 is scanned is stochastically less than once or a plurality of times, and the count result of the pulse-shaped component of the electric signal 10 does not indicate the actual number of abnormal places. Therefore, the counting result is calibrated for the actual number of abnormal points and then the inspection is performed. Since the scanning cycle is constant, the number of times the entire inspection area on the surface of the sample 5 is scanned varies depending on the movement speed of the sample 5 and accordingly. Therefore, the number of scanning lines per unit length, that is, the scanning line density depends on the moving speed of the sample 5, and the number of times the same abnormal portion 7 is scanned, that is, the number of detected abnormal portions is
Affected by the movement speed of. Therefore, it is necessary to maintain the same moving speed as the moving speed when calibrating the counting result of the pulsed component of the electric signal 10 for the actual number of abnormal points even in the subsequent inspection. In addition, the drive devices 18 and 19 must be provided with drive speed control systems 181, 191 and rotation speed control systems 182 that keep the moving speed unchanged. Alternatively, calibration must be performed using a sample with a known number of abnormal points in each inspection.
第6図に示した従来例では試料の移動機構である回転ス
テージ11が回転運動と直線運動の二種類の運動によって
移動するため、それぞれの運動における速度を不変に保
つ必要があり、駆動装置18には駆動速度制御系181 と回
転速度制御系182 の2系統の制御系が必要となる。In the conventional example shown in FIG. 6, the rotary stage 11 which is a sample moving mechanism moves by two kinds of motions, that is, a rotary motion and a linear motion. Therefore, it is necessary to keep the speed in each motion unchanged. Requires two control systems, a drive speed control system 181 and a rotation speed control system 182.
第7図の従来例に示す移動機構は一方向の直線運動であ
って、第6図のものにくらべて著しく簡単となってはい
るが、その直線運動速度を不変に保つ駆動速度制御系19
1 を欠かすことができない。The moving mechanism shown in the conventional example of FIG. 7 is a linear movement in one direction, which is significantly simpler than that of FIG. 6, but the drive speed control system 19 keeps the linear movement speed unchanged.
One can't miss it.
したがってこれらの従来例に示した光学的表面検査装置
は正確に制御されたその装置固有の移動速度をもつ試料
移動機構を装置の一部として備える必要があり、光学系
と光検出器ならびにその信号処理系の部分だけを独立さ
せて既存の生産ラインの試料搬送系(たとえばベルト式
ウエハ搬送装置)に適宜設置して用いることはきわめて
困難であった。Therefore, in the optical surface inspection apparatus shown in these conventional examples, it is necessary to provide a sample moving mechanism having a precisely controlled moving speed unique to the apparatus as a part of the apparatus, and the optical system, the photodetector and its signal are required. It was extremely difficult to independently install only the processing system part and appropriately install it in a sample transfer system (for example, a belt type wafer transfer device) of an existing production line.
この発明は従来の光学的表面検査装置において必要であ
った装置専用の試料移動機構を不要とし、光学的表面検
査装置の構成を簡単化するとともに異なる送り速度をも
つ既存の試料搬送装置への適用が可能な装置を提供する
ことを目的とする。INDUSTRIAL APPLICABILITY The present invention does not require a sample moving mechanism dedicated to the conventional optical surface inspection apparatus, simplifies the structure of the optical surface inspection apparatus, and is applied to an existing sample transfer apparatus having different feeding speeds. It is an object of the present invention to provide a device capable of
この発明は試料全体を走査する回数と光検出手段の出力
する電気信号のパルス状成分の計数値とは、試料の移動
速度が異なるといずれも異なってくるが、両者の間には
常に比例関係が成立することに着目し、実際の異常箇所
の数に等しいパルス状成分の計数値が得られる場合の走
査回数を基準走査回数としてあらかじめ求めておき、試
料の移動速度が異なった場合においても前記の比例関係
を利用してパルス状成分の計数値を基準走査回数に対す
る値に換算することによって異常箇所数を求めようとす
るものである。According to the present invention, the number of times the entire sample is scanned and the count value of the pulse-shaped component of the electric signal output by the photodetection means are different when the moving speed of the sample is different. Focusing on the fact that is satisfied, the number of scans when the count value of the pulse-shaped component equal to the actual number of abnormal points is obtained as the reference number of scans in advance, and even when the moving speed of the sample is different, It is intended to obtain the number of abnormal points by converting the count value of the pulse-like component into a value with respect to the reference scanning number using the proportional relation of.
すなわちパルス状の成分を計数する計測手段にさらに走
査回数計数手段と演算手段とを備えさせ、走査回数計数
手段は光ビームが前記の試料全体を走査するのに要する
走査回数Sを計数し、演算手段は前記の検査領域につい
てのパルス状成分の総和Mを算出し、その総和Mにあら
かじめ基準試料を用いて既知の異常箇所数と等しいパル
ス状成分計数値を与える走査回数として定めた基準走査
回数S0の値と前記の計数された走査回数との比S0/Sを
乗じて、異常箇所数M0をM0=M(SS0/S)として算出
するようにする。That is, the measuring means for counting the pulse-shaped component is further provided with the scanning number counting means and the calculating means, and the scanning number counting means counts the number of scanning times S required for the light beam to scan the entire sample, and performs the calculation. The means calculates the total sum M of the pulse-like components for the inspection region, and gives the sum M the pulse-like component count value equal to the number of known abnormal points using the reference sample in advance. is multiplied by the ratio S 0 / S between the value and the counted number of scans of said S 0, to the abnormal part number M 0 be calculated as M 0 = M (SS 0 / S).
走査回数計数手段で走査回数計数値Sを求め、演算手段
において基準走査回数S0と前記のSとの比S0Sをパルス
状成分計数値の総和Mに乗じて求めたM0=M(S0/S)
の値は、試料が基準走査回数S0で走査された場合のパル
ス状成分計数値すなわち実際の異常箇所数となる。試料
の移動速度が異なることによる影響はMとSとの比例関
係から両者について同様に作用し、したがって上記のM0
の算出式において明らかなようにその作用は互いに打ち
消され、したがってM0は試料の移動速度が異なっても、
その影響を受けることがない。The scanning number counting means S obtains the scanning number counting value S, and the calculating means multiplies the sum S of the pulse-like component counting values by the ratio S 0 S between the reference scanning number S 0 and the above S, M 0 = M ( S 0 / S)
The value of is the pulse-like component count value when the sample is scanned at the reference scan number S 0 , that is, the actual number of abnormal points. The influence of the different moving speeds of the sample acts similarly for both due to the proportional relationship between M and S, and therefore the above M 0
As is clear from the calculation formula of, the actions cancel each other out, so that M 0 is
Not affected by it.
第1図はこの発明の実施例の構成図である。光投射手段
21からは細く集束された光ビームが投射される。この光
ビームはビームエキスパンダ22,回転多面鏡23,f・θ
レンズ24で構成される点線で囲まれた走査手段25を介し
て試料5上に集束する光ビーム6となって、試料5の表
面を走査する。ビームエキスパンダ22は入射した細い光
ビームを数mm程度の幅をもつ平行光束26を整え、回転多
面鏡23はその平行光束26を反射してその軸まわりに回転
する光ビーム27とする。f・θレンズ24は入射した光ビ
ーム27の回転角速度と出射する光ビーム6の走査速度と
が比例関係にあるレンズで、光ビーム6を常に試料5の
表面に集束させながら一定の周期で直線状にその表面を
走査させる。試料5上に凹凸あるいは異物の付着などの
異常箇所7があるとそこでパルス状の散乱光8を生ず
る。この散乱光8は一点鎖線で囲んだ光検出手段28で検
出される。FIG. 1 is a block diagram of an embodiment of the present invention. Light projection means
A light beam that is narrowly focused is projected from 21. This light beam consists of a beam expander 22, a rotary polygon mirror 23, and f · θ.
The surface of the sample 5 is scanned by the light beam 6 which is focused on the sample 5 through the scanning means 25 surrounded by the dotted line constituted by the lens 24. The beam expander 22 forms an incident thin light beam into a parallel light beam 26 having a width of about several millimeters, and the rotating polygon mirror 23 reflects the parallel light beam 26 into a light beam 27 which rotates about its axis. The f.theta. lens 24 is a lens in which the rotational angular velocity of the incident light beam 27 and the scanning velocity of the emitted light beam 6 are in a proportional relationship, and the light beam 6 is always focused on the surface of the sample 5 and linearly moved at a constant period. To scan its surface in a circular pattern. When there is an irregular portion 7 such as unevenness or adhesion of foreign matter on the sample 5, pulsed scattered light 8 is generated there. The scattered light 8 is detected by the light detecting means 28 surrounded by the alternate long and short dash line.
光検出手段28においては光の入射面に円筒レンズを備え
た入射集光系29で散乱光8を受光し、受光された散乱光
8は光ファイババンドル30に入射し、出射集光系31を介
して光検出器32に入射し、光検出器32の出力する電気信
号10にパルス状の成分を与える。In the light detecting means 28, the scattered light 8 is received by an incident light condensing system 29 having a cylindrical lens on the light incident surface, the received scattered light 8 is incident on the optical fiber bundle 30, and the outgoing light condensing system 31 is operated. It is incident on the photodetector 32 via the light detector 32 and gives a pulsed component to the electric signal 10 output from the photodetector 32.
試料5の表面は鏡面状に仕上げられているので、試料5
の表面を照射する光ビーム6は入射集光系29には入射し
ない角度で正反射するように投射される。このため入射
集光系29したがって光検出器32には試料5の表面からの
きわめて微弱な散乱光と異常箇所7による散乱光8のみ
が入射する。Since the surface of sample 5 is mirror-finished, sample 5
The light beam 6 irradiating the surface of is incident on the incident light condensing system 29 so as to be specularly reflected at an angle not incident. For this reason, only the extremely weak scattered light from the surface of the sample 5 and the scattered light 8 due to the abnormal portion 7 are incident on the incident light condensing system 29 and thus the photodetector 32.
試料5は2点鎖線で囲まれた相対的移動手段33を構成す
る試料台34に搭載され、試料台34は試料台駆動装置35に
よって光ビーム6の走査方向と垂直な方向に駆動される
ので、これによって光ビーム6は試料5の全面を走査し
て検査を行うことができる。The sample 5 is mounted on a sample table 34 which constitutes a relative moving means 33 surrounded by a two-dot chain line, and the sample table 34 is driven by a sample table driving device 35 in a direction perpendicular to the scanning direction of the light beam 6. As a result, the light beam 6 can scan the entire surface of the sample 5 for inspection.
光検出手段28の出力する電気信号10は実線で囲まれた計
測手段36に与えられる。計測手段36は図示のように領域
設定手段37, パルス計数手段38, 走査回数計数手段39,
演算手段40とを備えている。The electric signal 10 output from the light detecting means 28 is given to the measuring means 36 surrounded by a solid line. The measuring means 36 is an area setting means 37, a pulse counting means 38, a scanning number counting means 39, as shown in the figure.
And a computing means 40.
後に詳しく述べるように領域設定手段37は光ビーム6が
試料5を走査するつど、試料5とその検査領域とを走査
する時間の幅をもつ矩形波パルスをそれぞれ信号55a と
信号59a として出力する。矩形波パルスとしての信号55
a は走査回数計数手段に与えられ、走査回数が計数され
る。また信号59a はパルス計数手段38に与えられ、上記
の矩形波パルスの幅に相当する時間だけ計数ゲートを開
き、電気信号10のパルス状成分を計数する。As will be described later in detail, the region setting means 37 outputs a rectangular wave pulse having a time width for scanning the sample 5 and the inspection region thereof as the signal 55a and the signal 59a each time the light beam 6 scans the sample 5. Signal 55 as a square wave pulse
a is given to the scanning number counting means, and the number of scanning is counted. Further, the signal 59a is given to the pulse counting means 38, and the counting gate is opened only for the time corresponding to the width of the rectangular wave pulse, and the pulsed component of the electric signal 10 is counted.
一つの検査が終了すると領域設定手段37からパルス状の
走査終了信号70a が演算手段40に与えられる。演算手段
40はこの走査終了信号70a を受けて走査回数計数手段39
からはその走査までの走査回数i,パルス計数手段38か
らはその走査において計数されたパルス状成分の計数値
Miをそれぞれデータ39a,68a として読みとって記憶した
後、リセット信号68b をパルス計数手段38に送って計数
内容をクリアする。When one inspection is completed, the pulse setting scanning end signal 70a is given from the area setting means 37 to the calculating means 40. Computing means
The scanning number counting means 39 receives the scanning end signal 70a.
From the pulse count means 38 to the scanning, and from the pulse counting means 38, the count value of the pulsed component counted in the scanning.
After Mi is read and stored as data 39a and 68a, respectively, a reset signal 68b is sent to the pulse counting means 38 to clear the counting contents.
試料5についての全走査を終了すると、領域設定手段37
からパルス状の検査終了信号62a が演算手段40に与えら
れる。演算手段40はこの信号を受けて演算を実行し、リ
セット信号39b を走査回数計数手段39に送って計数内容
をクリアする。When all the scans for the sample 5 are completed, the area setting means 37
From this, a pulsed inspection end signal 62a is given to the arithmetic means 40. The calculation means 40 receives this signal and executes calculation, and sends a reset signal 39b to the scanning number counting means 39 to clear the count content.
演算手段40においてはあらかじめ校正によって得た基準
走査回数S0,試料5の縁から検査領域までの距離d,試
料5の直径Dが定数として記憶されている。これらの定
数と全走査回数S,上述の走査回数i,パルス状成分の
計数値Miとを用いて下記の演算を行って検査領域の異常
箇所数Moが算出される。In the calculation means 40, the reference number of scans S 0 obtained by calibration in advance, the distance d from the edge of the sample 5 to the inspection region, and the diameter D of the sample 5 are stored as constants. These constants and the total number of scans S, the above-mentioned number of scans i, the abnormal point number M o count value Mi and the inspection area by performing the following calculation using the pulsed component is calculated.
試料5の縁から検査領域までの走査回数S1; S1=S(d/D) …………………(1) 検査領域におけるパルス状成分の計数値の総和M: 検査領域における異常箇所数M0; M0=M(S0/S) ……………(3) (3)式によって算出された異常箇所数M0は検査結果46と
して出力される。Number of scans from the edge of the sample 5 to the inspection area S 1 ; S 1 = S (d / D) (1) Sum of count values of pulse-like components in the inspection area M: Number of abnormal points in the inspection area M 0 ; M 0 = M (S 0 / S) (3) The number of abnormal points M 0 calculated by the equation (3) is output as the inspection result 46.
上記(1),(2),(3)の成立する根拠については後に述べ
る。The grounds for establishing the above (1), (2), and (3) will be described later.
この発明においては演算手段40において(3)式による演
算を行うことで試料の移動速度が異なることによる影響
を除くとともに、同一の異常箇所7が1回以外の回数で
走査され実際の異常箇所7の数よりも異なって得られた
パルス計数値を補正し、常に実際の異常箇所数が求める
ことができるようにしている。In the present invention, the calculation means 40 performs the calculation according to the equation (3) to eliminate the influence of the different moving speeds of the sample, and the same abnormal point 7 is scanned at a number other than once and the actual abnormal point 7 is scanned. The pulse count value obtained differently from the number is corrected so that the actual number of abnormal points can always be obtained.
上記はパルス状成分の計数値Mが試料5についての全走
査回数Sと比例し、 M=kS ………………………(4) で与えられることを前提としている。kは比例定数であ
る。これは試料5の移動速度が変わると単位長当りの走
査線数すなわち走査線密度が変わり、それに明らかに比
例して全走査回数Sが変わり、さらに異常箇所7が走査
される回数すなわちパルス状成分の計数値も確率的に走
査線密度に比例して変わるといいう考え方にもとづくも
のである。The above is based on the premise that the count value M of the pulse-like component is proportional to the total number of scans S of the sample 5 and is given by M = kS ... (4). k is a proportional constant. This is because the number of scanning lines per unit length, that is, the scanning line density, changes when the moving speed of the sample 5 changes, and the total number of scans S changes obviously in proportion to the number of times the abnormal portion 7 is scanned, that is, the pulse-shaped component. It is also based on the idea that the count value of changes stochastically in proportion to the scanning line density.
(4)式においてパルス状成分の計数値Mが実際の異常箇
所数M0に等しい場合には全走査回数Sは基準走査回数S0
であるから M0=kS0 ……………………(5) であり、(4),(5)の両式からkを消去して、前記の(3)
式で与えられる関係が導かれる。すなわち(3)式は全走
査回数Sの場合に得られた計数値Mを基準走査回数S0に
対する値に換算するものである。またMとSとは比例関
係にあって、試料5の移動速度は両者に同じように作用
するため、MとSとがそれぞれ分子と分母にある(3)式
の演算においてその影響は打ち消されて、M0の値は試料
の移動速度が異なってもその影響を受けない。In the equation (4), when the count value M of the pulse-shaped component is equal to the actual number of abnormal points M 0 , the total number of scans S is the reference number of scans S 0.
Therefore, M 0 = kS 0 …………………… (5), and k is eliminated from both equations (4) and (5) to obtain (3) above.
The relationship given by the formula is derived. That is, the equation (3) is to convert the count value M obtained in the case of the total number of scans S into a value for the reference number of scans S 0 . Further, since M and S are in a proportional relationship and the moving speed of the sample 5 acts on both in the same way, their influence is canceled out in the calculation of equation (3) in which M and S are in the numerator and denominator, respectively. Thus, the value of M 0 is not affected by the moving speed of the sample.
第2図は(4)式に示した比例関係が成立することを第1
図に示した装置を用いて実験的に確認した結果である。
ここではパルス状成分計数値Mに相当する値としてこの
Mと実際の異常箇所数M0との比である検出率η=M/M0
を用いている。試料5は直径4インチのシリコンウエハ
ーであって、その表面には直径0.518 μmのポリスチレ
ンラテックス球を均一に分散させて異常箇所とし、実際
の数M0は顕微鏡で目視計数し、第1図に示した装置で得
た計数値Mを上記のM0で割って検出率ηを求めた。一方
試料の移動速度を変じてそのつど上記のシリコンウエハ
ーに対する全走査回数Sを求め、横軸にS縦軸にηをと
って両者の関係を示した。ηとSとの間には明らかに原
点を通る直線関係すなわち比例関係が成立することが示
されている。第2図について得た回帰直線は1000回以上
の走査回数については η=449×10-4S ………………(6) であり、η=100 %に対する基準走査回数S0として、S0
=2238を得ている。この値は光ビーム6が試料表面に作
るスポットの径rを実測し、このrで値をシリコンウエ
ハーを直径Dを割った値D/r,すなわち光ビームが試
料面を重なることなく、また隙間をあけることなく走査
する場合の値と一致している。Fig. 2 shows that the proportional relationship shown in equation (4) holds.
It is the result confirmed experimentally using the apparatus shown in the figure.
Here detection rate is the ratio between the pulse-like component count real anomaly number M 0 and the M as a value corresponding to the M eta = M / M 0
Is used. Sample 5 is a silicon wafer with a diameter of 4 inches, and polystyrene latex spheres with a diameter of 0.518 μm are evenly dispersed on the surface to make it an abnormal point. The actual number M 0 is visually counted with a microscope and shown in FIG. The detection rate η was obtained by dividing the count value M obtained by the apparatus shown by the above M 0 . On the other hand, by changing the moving speed of the sample, the total number of scans S for the silicon wafer was obtained each time, and the horizontal axis represents S and the vertical axis represents η to show the relationship between them. It has been shown that a linear relationship, that is, a proportional relationship, passing through the origin is clearly established between η and S. The regression line obtained for FIG. 2 is η = 449 × 10 −4 S ………… (6) for the number of scans of 1000 or more, and S is the standard scan count S 0 for η = 100%. 0
= 2238 is obtained. This value is obtained by actually measuring the diameter r of the spot formed by the light beam 6 on the sample surface, and dividing this value by the value D / r, which is the diameter D of the silicon wafer, that is, the light beams do not overlap the sample surface and there is a gap. It agrees with the value when scanning without opening.
第3図はこの実施例における計測手段36の具体構成を説
明する前提として、試料5の表面とそれを走査する光ビ
ーム6にそる走査線の一つおよびその走査によって得ら
れる光検出器32からの電気信号10の波形とを示したもの
である。第3図(a)は試料台34上の試料5の平面図で、
矢印で示した試料5の移動方向Qと直交して光ビーム6
によって走査線41が形成されている。FIG. 3 shows the surface of the sample 5 and one of the scanning lines along the light beam 6 for scanning the surface of the sample 5 and the photodetector 32 obtained by the scanning as a premise for explaining the specific configuration of the measuring means 36 in this embodiment. And a waveform of the electric signal 10 of FIG. FIG. 3 (a) is a plan view of the sample 5 on the sample table 34,
The light beam 6 is orthogonal to the moving direction Q of the sample 5 indicated by the arrow.
The scanning line 41 is formed by.
試料5の縁から距離dまでの斜線を施した周辺領域42は
試料5の取扱いの際に保持具が触れる領域で、多数の異
物の付着が予想されるため検査の対象とならない領域で
ある。したがって斜線を施していない領域が検査領域43
となる。光ビーム6は試料台34上の点Oに投射されて走
査線41に沿って走査を開始し、試料5の表面を走査した
後ふたたび試料台34を参照し点0′で走査を終了する。
試料5の表面に付着した微粒子701,702,703 はいずれも
第1図における異常箇所7に相当する。点Oと点0′間
の距離はどの走査においても不変である。The peripheral region 42, which is shaded from the edge of the sample 5 to the distance d, is a region that the holder contacts when handling the sample 5, and is a region that is not an object of inspection because a large number of foreign substances are expected to adhere. Therefore, the non-hatched area is the inspection area 43.
Becomes The light beam 6 is projected to a point O on the sample table 34 to start scanning along the scanning line 41, scans the surface of the sample 5 again, and then refers to the sample table 34 again to end the scanning at a point 0 ′.
The fine particles 701, 702, 703 attached to the surface of the sample 5 all correspond to the abnormal portion 7 in FIG. The distance between point O and point 0'is invariant in any scan.
第3図(b)に示す電気信号10の波形において、走査の繰
り返し周期は時刻t00から時刻t01までの間の一定時間
T0であり、光ビームの走査は時刻t0からt6の間の一
定時間Tにおいて行われる。走査速度は一定であるた
め、横軸方向の経過時間tは走査距離に対応するので、
各時刻に対して第3図(a)に示す走査線上の位置を括弧
内に対応させて示した。In the waveform of the electric signal 10 shown in FIG. 3 (b), the scanning repetition period is a constant time T 0 from time t 00 to time t 01 , and the scanning of the light beam is from time t 0 to t 6 . It is performed at a constant time T between. Since the scanning speed is constant, the elapsed time t in the horizontal axis direction corresponds to the scanning distance.
The position on the scanning line shown in FIG. 3 (a) for each time is shown in parentheses.
時刻t00とt0との間では、まだ光ビーム6が投射され
ないため、電気信号10のレベルは光検出器32あるいはそ
の増幅器の雑音信号で定まる雑音レベル44にある。時刻
t0で光ビーム6が試料台34の表面に投射されはじめ
る。試料台34の表面は比較的強い散乱光を生じ、したが
って電気信号10のレベルはレベルV1まで上昇する。時刻
t1において光ビーム6が試料5の表面に投射されるよ
うになると、散乱光が急激に減少して電気信号10のレベ
ルはこれにともないレベルV2まで低下する。さらに時刻
t2,t3,t4において光ビーム6が微粒子701,702,703 を照
射すると、そのつどパルス状の散乱光を生じ電気信号10
にパルスb1,b2,b3を生ずるが、これらの散乱光のレベル
は試料台34表面からの散乱光のレベルにくらべて微弱で
あり、したがってパルスb1,b2,b3の波高値のレベルはV1
よりも小さい。Between times t 00 and t 0 , the light beam 6 has not yet been projected, so the level of the electrical signal 10 is at the noise level 44 determined by the noise signal of the photodetector 32 or its amplifier. At time t 0 , the light beam 6 begins to be projected on the surface of the sample table 34. The surface of the sample stage 34 produces relatively strong scattered light, so that the level of the electrical signal 10 rises to the level V 1 . When the light beam 6 comes to be projected on the surface of the sample 5 at time t 1 , the scattered light sharply decreases and the level of the electric signal 10 lowers to the level V 2 accordingly. Further time
When the light beam 6 irradiates the particles 701, 702, and 703 at t 2 , t 3 , and t 4 , pulse-like scattered light is generated each time, and the electric signal 10
Although produce pulses b 1, b 2, b 3, the levels of these scattered light is weak compared to the level of the scattered light from the sample stage 34 surface, thus wave pulses b 1, b 2, b 3 High level is V 1
Smaller than.
電気信号10は上記のように光ビーム6が試料5の表面を
走査する時間帯T1においてレベルの低下を示すので、こ
れを利用してレベルV1よりやや低いレベルに所定レベル
45としてのV31をあらかじめ定めておき、走査時間Tの
間で電気信号10がレベルV31を下まわる時刻t1において
試料の一方の縁が,またその状態からふたたびレベルV
S1を上まわる時刻t5において他方の縁が検知され、時刻
t1とt5の間の時間T1において試料5の表面が走査され
る。また第3図(a)のP1X1あるいはP2X2間の距離dが走
査される時間をτとすれば、時刻t1+τと時刻t5−τ=
t1+T1−τとの間のT1−2τが検査領域の走査時間とな
る。As described above, the electric signal 10 shows a decrease in level in the time zone T 1 in which the light beam 6 scans the surface of the sample 5, and using this, the electric signal 10 is used at a predetermined level slightly lower than the level V 1.
V 31 as 45 is determined in advance, and at time t 1 when the electric signal 10 falls below the level V 31 during the scanning time T, one edge of the sample is again level V from the state.
S1 other edge is detected at time t 5 to exceed the time
At time T 1 between t 1 and t 5 , the surface of the sample 5 is scanned. Further, when the time for scanning the distance d between P 1 X 1 or P 2 X 2 in FIG. 3 (a) is τ, time t 1 + τ and time t 5 −τ =
T 1 -2τ between t 1 + T 1 -τ is the scanning time of the inspection area.
一方試料5の移動方向については、走査回数と試料の移
動距離とが比例関係にあるため、光ビーム6が最初に検
知した試料5の縁P3,P4 からそれぞれ距離dまでの斜線
を施した領域 を光ビーム6が走査する回数S1は、全走査回数をS,試
料5の直径をDとすれば、下記の再掲する(1)式 S1=S(d/D) …………………(1) によって与えられる。したがってS1+1回目からS−S1
回目までで検査領域が走査されることになり、(2)式の
総和を行う範囲が定められる。On the other hand, with respect to the moving direction of the sample 5, since the number of scans and the moving distance of the sample are in a proportional relationship, diagonal lines are drawn from the edges P 3 and P 4 of the sample 5 detected by the light beam 6 to the distance d respectively. Area Assuming the total number of scans S is S and the diameter of the sample 5 is D, the number of scans S 1 of the light beam 6 on the light beam 6 will be reproduced below. (1) Formula S 1 = S (d / D) … Given by (1). Therefore, from S 1 + 1st time, S−S 1
The inspection area is scanned by the first time, and the range for performing the summation of equation (2) is determined.
第4図は計測手段36の回路構成の一例を示したブロック
図である。また第5図は第4図の回路構成の各部分にお
ける信号の波形図である。以下第4図の各部分の動作を
第5図の波形図とともに説明する。FIG. 4 is a block diagram showing an example of the circuit configuration of the measuring means 36. FIG. 5 is a waveform diagram of signals in each part of the circuit configuration of FIG. The operation of each part of FIG. 4 will be described below with reference to the waveform chart of FIG.
第4図において光検出器32の出力する電気信号10は、ロ
ーパスフィルタ51によって白色雑音を除去された信号51
a となり、それぞれ破線の枠で囲んだ領域設定手段37と
パルス計数手段38とに与えられる。領域設定手段37にお
いては、まずコンパレータ52,単安定マルチバイブレー
タ53,インバータ54,ANDゲート55で構成される系統
によって、光ビーム6が試料5の表面を走査している時
間帯T1に等しい時間幅をもつ矩形波の信号55a を得る。
この系統では信号51a のレベルをコンパレータ52で所定
のレベルV31と比較し、V>VS1の場合には高レベル
「H」,V<VS1の場合は低レベル「L」となる出力信
号52a を得る。単安定マルチバイブレータ53は信号52a
が高レベル「H」にあればトリガされて時間幅が走査時
間Tに等しい矩形波を信号53a として出力する。一方イ
ンバータ54は信号52a の極性を反転させて信号54a と
し、これらの信号53a と信号54a とをANDゲート55に
与えて時間幅T1の矩形波を信号55a として出力する。光
ビーム6が試料5を走査しない場合はT1=0で、信号55
a は低レベル「L」のままである。In FIG. 4, the electric signal 10 output from the photodetector 32 is the signal 51 from which white noise has been removed by the low-pass filter 51.
a, which is given to the area setting means 37 and the pulse counting means 38, which are surrounded by a broken line frame. In the area setting means 37, first, by the system including the comparator 52, the monostable multivibrator 53, the inverter 54, and the AND gate 55, the time equal to the time zone T 1 during which the light beam 6 scans the surface of the sample 5 A rectangular wave signal 55a having a width is obtained.
In this system, the level of the signal 51a is compared with a predetermined level V 31 by the comparator 52, and if V> V S1, a high level “H”, and if V <V S1 , a low level “L” output signal. Get 52a. Monostable multivibrator 53 has signal 52a
Is at a high level "H", it is triggered to output a rectangular wave having a time width equal to the scanning time T as a signal 53a. On the other hand, the inverter 54 inverts the polarity of the signal 52a into a signal 54a, supplies these signals 53a and 54a to the AND gate 55, and outputs a rectangular wave having a time width T 1 as a signal 55a. If the light beam 6 does not scan the sample 5, T 1 = 0 and the signal 55
a remains at low level "L".
この信号55a は走査のつど矩形波として出力されるの
で、これを論理パルスとしてパルス計数回路である走査
回数計数手段39で計数して走査回数を求める。Since this signal 55a is output as a rectangular wave each time of scanning, the number of times of scanning is obtained by counting this as a logical pulse by the scanning number counting means 39 which is a pulse counting circuit.
信号55a はまた一点鎖線で囲んだ検査領域設定系統56と
試料検知系統57にも与えられる。The signal 55a is also given to the inspection area setting system 56 and the sample detection system 57 surrounded by the one-dot chain line.
検査領域設定系統56においては、時刻t1から2τ時間後
に立上り光ビーム6の走査方向における検査領域43の走
査時間T1−2τを時間幅とする矩形波の信号59a が走査
のつど出力される。遅延回路58は時間幅T1の矩形波であ
る信号55a に所定の時間おくれτ1=2τを与えて信号
58a とし、その信号58a と前記の信号55a とを与えられ
たANDゲート59は時間幅T1−τ1=T1−2τの矩形波
を信号59a として出力する。光ビームが試料5を走査せ
ず、信号55a が低レベル「L」にある場合は信号59a も
低レベル「L」のままである。In the inspection area setting system 56, a rectangular wave signal 59a having a time width of the scanning time T 1 -2τ of the inspection area 43 in the scanning direction of the rising light beam 6 is output each time after 2τ from the time t 1. . The delay circuit 58 gives a signal 55a, which is a rectangular wave having a time width T 1 , with a delay τ 1 = 2τ for a predetermined time.
And 58a, the AND gate 59 given a signal 55a of the and the signal 58a outputs a rectangular wave of duration T 1 -τ 1 = T 1 -2τ as signal 59a. If the light beam does not scan the sample 5 and the signal 55a is at the low level "L", the signal 59a also remains at the low level "L".
この信号59a はパルス計数手段38に与えられて、検査領
域43が走査されるT1−2τ時間計数ゲートを開くゲート
信号の役目を果す。The signal 59a is supplied to the pulse counting means 38, and serves a gate signal for opening the T 1 -2τ time counting gate inspection area 43 is scanned.
信号59a はさらにインバータ69にも与えられて極性を反
転し、光ビーム6が試料5の検査領域43の走査を終了し
た時刻t5で立上る信号69a となって単安定マルチバイブ
レータ70をトリガしてパルス状の走査終了信号70a を演
算手段40に与える。The signal 59a is also given to the inverter 69 to invert its polarity, and becomes a signal 69a which rises at time t 5 when the light beam 6 finishes scanning the inspection area 43 of the sample 5 and triggers the monostable multivibrator 70. A pulsed scanning end signal 70a to the arithmetic means 40.
試料検知系統57は光ビーム6が試料5の走査を完了する
と演算手段40の演算を開始させるパルス信号62a を出力
する。The sample detection system 57 outputs a pulse signal 62a for starting the calculation of the calculation means 40 when the scanning of the sample 5 by the light beam 6 is completed.
単安定マルチバイブレータ60は信号55a によってトリガ
され、時間幅T2が走査周期T0より長いすなわちT2>T0で
あるような矩形波を信号60a として出力する。この単安
定マルチバイブレータ60は再トリガが可能な機能を与え
られているので、光ビーム6が試料5の走査を繰り返す
と、走査開始のつど信号60a の矩形波の立下り時点以前
に再トリガされ続け、走査が行われている間は信号60a
は高レベル「H」の状態を継続する。この信号60a はイ
ンバータ61を介して極性の反転した信号61a に変換され
る。このため信号61a は光ビーム6が試料5を走査して
いる間は低レベル「L」を維持し、走査を終了すると高
レベル「H」に転ずる信号となる。したがって走査が終
了するとこの信号61a は単安定マルチバイブレータ62を
トリガし、パルス状の検査終了信号62a を演算手段40に
与える。The monostable multivibrator 60 is triggered by the signal 55a and outputs as signal 60a a square wave whose time width T 2 is longer than the scanning period T 0 , ie T 2 > T 0 . Since this monostable multivibrator 60 is provided with a function capable of retriggering, when the light beam 6 repeats scanning the sample 5, it is retriggered before the falling edge of the rectangular wave of the signal 60a at the start of scanning. Signal 60a while scanning continues
Keeps the high level "H". This signal 60a is converted into a signal 61a whose polarity is inverted via the inverter 61. Therefore, the signal 61a is a signal that maintains the low level "L" while the light beam 6 scans the sample 5 and turns to the high level "H" when the scanning is completed. Therefore, when the scanning is completed, this signal 61a triggers the monostable multivibrator 62 to give the pulse-shaped inspection completion signal 62a to the arithmetic means 40.
一方パルス計数手段38においては、まず信号51a とその
信号51a をローパスフィルタ63に与えてパルス成分を除
いた信号63a とがコンパレータ64で比較され、信号51a
と信号63a との差のパルス成分のみが信号64a として出
力される。On the other hand, in the pulse counting means 38, first the signal 51a and the signal 63a, which is obtained by applying the signal 51a to the low-pass filter 63 and removing the pulse component, are compared by the comparator 64, and the signal 51a
Only the pulse component of the difference between the signal 63a and the signal 63a is output as the signal 64a.
第5図に示す例においては信号64a はパルス成分b1,b2,
b3のみを含んでおり、この信号64a はさらにコンパレー
タ65で比較的低レベルのしきいレベルV32と比較され、
パルス成分の波高値VpがVp>V32であれば矩形波パル
スの信号65a が出力される。In the example shown in FIG. 5, the signal 64a has pulse components b 1 , b 2 ,
This signal 64a, which contains only b 3, is further compared with a relatively low threshold level V 32 by a comparator 65,
If the crest value V p of the pulse component is V p > V 32 , a rectangular wave pulse signal 65a is output.
信号65a は遅延回路66で第2の所定の時間おくれτを与
えられ、信号66a としてANDゲート67に入る。AND
ゲート67は同時に与えられた信号59a によって時刻t1+
2τからt1+T1までの間のT1−2τ時間開かれる計数ゲ
ートとして作動し、次に記すように信号65a のうちの検
査領域43内の走査で得た部分に相当する信号67a を計数
回路68に与える。これにより検査領域43中の微粒子702
によって得られたパルス信号(b2)のみが計数される。The signal 65a is given a second predetermined time delay τ by the delay circuit 66 and enters the AND gate 67 as the signal 66a. AND
The gate 67 receives the signal 59a applied at the same time to obtain the time t 1 +
It operates as a counting gate opened for T 1-2 τ times between 2τ and t 1 + T 1 and counts the signal 67a corresponding to the portion of the signal 65a obtained by scanning in the inspection area 43 as described below. Feed to circuit 68. As a result, the fine particles 702 in the inspection area 43 are
Only the pulse signals (b 2 ) obtained by are counted.
ここで信号65a と信号67a との関係について説明する。
時刻t1からの経過時間をtとし、信号65a と66a をそれ
ぞれf(t),g(t)として示すと、 g(t)=f(t−τ) ……………(7) である。信号67a はANDゲート67によって信号66a す
なわちg(t)のt=τ1=2τとt=T1との間のものと
なる。(7)式によって g(τ1)=f(τ1−τ)=f(2τ−τ)=f
(τ) g(T1)=f(T1−τ) ………………………………(8) であるので、信号67a は信号65a のt=τとt=T1−τ
との部分すなわち検査領域43から得られる部分となる。Here, the relationship between the signal 65a and the signal 67a will be described.
Letting the elapsed time from time t 1 be t, and showing signals 65a and 66a as f (t) and g (t), respectively, g (t) = f (t−τ) …………… (7) is there. The signal 67a is brought by the AND gate 67 into the signal 66a, that is, between t = τ 1 = 2τ and t = T 1 of g (t). According to the equation (7), g (τ 1 ) = f (τ 1 −τ) = f (2τ−τ) = f
(Τ) g (T 1 ) = f (T 1 −τ) ………………………… (8), so the signal 67a is t = τ and t = T 1 − of the signal 65a. τ
And a portion obtained from the inspection area 43.
走査回数計数手段39と演算手段40との間のデータ39a,リ
セット信号39b,および計数回路68と演算手段40との間の
データ68a,リセット信号68b については既に第1図にお
いて説明した通りである。The data 39a between the scanning number counting means 39 and the calculating means 40, the reset signal 39b, and the data 68a between the counting circuit 68 and the calculating means 40 and the reset signal 68b are as already described in FIG. .
この発明によれば光ビームで鏡面状の試料表面を走査
し、異常箇所で生じたパルス状の散乱光を光検出手段で
受光して、その光検出手段の出力信号のパルス状成分を
計測手段で計数して異常箇所数を検査する表面検査装置
において、計数手段が走査回数計数手段と演算手段とを
備えて、走査回数計数手段は試料についての全走査回数
を測定し、演算手段においては全走査回数と異常箇所計
数値との比例関係から、試料の検査領域についての異常
箇所計数値を基準走査回数に対する値に換算して異常箇
所数を得るようにしている。基準走査回数は上記の異常
箇所計数値が実際の異常箇所数に等しい値となる場合の
走査回数なので、上記の換算によって試料の移動速度が
異なり、全走査回数が異なっても、これとは関係なく実
際の異常箇所数を導くことが可能となる。According to the invention, the specular surface of the sample is scanned with the light beam, the pulsed scattered light generated at the abnormal portion is received by the photodetecting means, and the pulsed component of the output signal of the photodetecting means is measured by the measuring means. In the surface inspection apparatus that counts the number of abnormalities and inspects the number of abnormal points, the counting unit includes a scanning number counting unit and a computing unit, and the scanning number counting unit measures all the scanning numbers of the sample, and the computing unit From the proportional relationship between the number of scans and the abnormal spot count value, the abnormal spot count value for the inspection region of the sample is converted into a value for the reference scan count to obtain the abnormal spot count. Since the reference number of scans is the number of scans when the above-mentioned abnormal point count value is equal to the actual number of abnormal points, the movement speed of the sample differs due to the above conversion, and even if the total number of scans differs, it is related to this. It is possible to derive the actual number of abnormal points.
このため光投射手段,走査手段,光検出手段,計測手段
を試料の相対的移動手段と一体化する必要がなくなり、
全く独立させて試料の移動速度がそれぞれに異なる相対
的移動手段に装着させることが可能となる。したがって
既存の製造ラインの必要箇所に適宜設置でき、たとえば
半導体製造ラインにおけるシリコンウエハーのインライ
ン検査や半導体製造装置のローダー,アンローダー部へ
の設置による半導体製造装置内部発塵監視などの幅広い
適用が可能となる。Therefore, it is not necessary to integrate the light projecting means, the scanning means, the light detecting means, and the measuring means with the relative moving means of the sample,
It is possible to attach the samples to the relative moving means, which have different moving speeds, independently of each other. Therefore, it can be installed wherever necessary in the existing manufacturing line, and it can be applied to a wide range of applications such as in-line inspection of silicon wafers in the semiconductor manufacturing line and monitoring of dust generation inside semiconductor manufacturing equipment by installing it in the loader and unloader of semiconductor manufacturing equipment. Becomes
第1図は本発明の実施例の構成図、第2図は異常箇所の
計数値と試料の走査回数との比例関係を異常箇所の計数
値と実際の異常箇所数との比である検出率と走査回数と
の比例関係で実証した結果を示すグラフ、第3図(a),
(b)は試料と一つの走査線とを示す平面図とその走査に
おける電気信号の波形図、第4図は計測手段の回路構成
を示すブロック図、第5図は第4図の回路構成の各部に
おける信号の波形図、第6図,第7図は夫々従来技術に
おける光学的検査装置の例を示す要部構成図である。 1,21:光投射手段、5:試料、6:光ビーム、7:異
常箇所、701,702,703:微粒子、8:散乱光、10:電気
信号、25:走査手段、33:相対的移動手段、34:試料
台、35:試料台駆動装置、36:計測手段、38:パルス計
数手段、39:走査回数計数手段、40:演算手段、43:検
査領域。FIG. 1 is a configuration diagram of an embodiment of the present invention, and FIG. 2 is a detection rate which is a ratio between the count value of abnormal points and the number of scans of a sample, which is a ratio between the count value of abnormal points and the actual number of abnormal points. And graph showing the results demonstrated by the proportional relationship between the number of scans and Figure 3, (a),
(b) is a plan view showing the sample and one scanning line and a waveform diagram of electric signals in the scanning, FIG. 4 is a block diagram showing a circuit configuration of the measuring means, and FIG. 5 is a circuit configuration of FIG. Waveform diagrams of signals in respective portions, FIGS. 6 and 7 are main portion configuration diagrams showing an example of an optical inspection apparatus in the prior art. 1, 21: light projection means, 5: sample, 6: light beam, 7: abnormal part, 701, 702, 703: fine particles, 8: scattered light, 10: electric signal, 25: scanning means, 33: relative moving means, 34: Sample stage, 35: sample stage driving device, 36: measuring means, 38: pulse counting means, 39: scanning number counting means, 40: computing means, 43: inspection area.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 難波 泰明 神奈川県川崎市川崎区田辺新田1番1号 富士電機株式会社内 (72)発明者 杉本 啓介 神奈川県川崎市川崎区田辺新田1番1号 富士電機株式会社内 (56)参考文献 特開 昭61−132844(JP,A) 特開 平1−121740(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yasuaki Namba 1-1 Tanabe Nitta, Kawasaki-ku, Kawasaki-shi, Kanagawa Fuji Electric Co., Ltd. (72) Keisuke Sugimoto 1 Nitta Tanabe, Kawasaki-ku, Kawasaki-shi, Kanagawa No. 1 in Fuji Electric Co., Ltd. (56) Reference JP-A-61-132844 (JP, A) JP-A-121740 (JP, A)
Claims (2)
ビームで鏡面状の試料表面を直線的に所定の周期で繰り
返して走査する走査手段と、その走査手段と前記の試料
とを走査方向と交わる方向にそれぞれ相対的に移動させ
る相対的移動手段と、前記光ビームの試料表面ならびに
その試料表面以外の領域からの散乱光を検出する光検出
手段と、その光検出手段の出力する電気信号のうち前記
の試料表面に設定された所定の検査領域における異常箇
所で生じた散乱光にもとづくパルス状成分を計数する計
測手段とを備えて前記の試料表面の検査を行う装置にお
いて、計測手段が走査回数計数手段と演算手段とを備
え、走査回数計数手段は光ビームが前記の試料全体を走
査するのに要する走査回数Sを計数し、演算手段は前記
の検査領域についてのパルス状成分の計数値の総和Mを
算出し、その総和Mにあらかじめ基準試料を用いて既知
の異常箇所数と等しいパルス状成分計数値を与える走査
回数として定めた基準走査回数S0の値と前記の計数され
た走査回数Sとの比S0/Sを乗じて、異常箇所数M0をM0
=M(S0/S)として算出する機能を備えることを特徴
とする光学的表面検査装置。1. A light projecting means for projecting a light beam, a scanning means for linearly and repeatedly scanning a specular surface of a sample surface with the light beam, and a scanning means for scanning the sample and the sample. Relative moving means for relatively moving in a direction intersecting the direction, light detecting means for detecting scattered light from the sample surface of the light beam and a region other than the sample surface, and electricity output by the light detecting means. In the device for inspecting the sample surface, which comprises a measuring means for counting pulsed components based on scattered light generated in an abnormal portion in a predetermined inspection area set on the sample surface in the signal, the measuring means Is provided with a scanning number counting means and a computing means, the scanning number counting means counts the number of scanning times S required for the light beam to scan the entire sample, and the computing means calculates the number of the scanning regions. Calculating the sum M of the count value of the pulse-like component, and the value of the reference number of scans S 0 was determined as the number of scans to give a pulse-like component count equals the known anomaly number using pre reference sample to the sum M is multiplied by the ratio S 0 / S and counted the number of scans S above, the abnormal part number M 0 M 0
= M (S 0 / S) The optical surface inspection apparatus is provided with a function of calculating.
て、走査回数計数手段が矩形波の計数回路よりなり、光
ビームが試料表面を走査する場合に光検出手段の出力す
る電気信号が所定のレベルを下まわることにもとづいて
形成される矩形波を計数することを特徴とする光学的表
面検査装置。2. The apparatus according to claim 1, wherein the scanning number counting means comprises a rectangular wave counting circuit, and when the light beam scans the sample surface, the electric signal output from the light detecting means is predetermined. An optical surface inspection device characterized by counting rectangular waves formed on the basis of falling below the level of.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26053587A JPH0648249B2 (en) | 1987-10-15 | 1987-10-15 | Optical surface inspection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26053587A JPH0648249B2 (en) | 1987-10-15 | 1987-10-15 | Optical surface inspection device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01101448A JPH01101448A (en) | 1989-04-19 |
| JPH0648249B2 true JPH0648249B2 (en) | 1994-06-22 |
Family
ID=17349313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26053587A Expired - Lifetime JPH0648249B2 (en) | 1987-10-15 | 1987-10-15 | Optical surface inspection device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0648249B2 (en) |
-
1987
- 1987-10-15 JP JP26053587A patent/JPH0648249B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01101448A (en) | 1989-04-19 |
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