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JPH0649946B2 - Method for manufacturing tubular member - Google Patents
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JPH0649946B2 - Method for manufacturing tubular member - Google Patents

Method for manufacturing tubular member

Info

Publication number
JPH0649946B2
JPH0649946B2 JP60265382A JP26538285A JPH0649946B2 JP H0649946 B2 JPH0649946 B2 JP H0649946B2 JP 60265382 A JP60265382 A JP 60265382A JP 26538285 A JP26538285 A JP 26538285A JP H0649946 B2 JPH0649946 B2 JP H0649946B2
Authority
JP
Japan
Prior art keywords
cvd
graphite
tubular member
manufacturing
outer peripheral
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60265382A
Other languages
Japanese (ja)
Other versions
JPS62128974A (en
Inventor
美治 茅根
誠 江端
和久 松本
房雄 藤田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Engineering and Shipbuilding Co Ltd
Original Assignee
Mitsui Engineering and Shipbuilding Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Engineering and Shipbuilding Co Ltd filed Critical Mitsui Engineering and Shipbuilding Co Ltd
Priority to JP60265382A priority Critical patent/JPH0649946B2/en
Publication of JPS62128974A publication Critical patent/JPS62128974A/en
Publication of JPH0649946B2 publication Critical patent/JPH0649946B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Ceramic Products (AREA)
  • Manufacturing Of Tubular Articles Or Embedded Moulded Articles (AREA)
  • Chemical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は管状部材の製造方法に係り、特に半導体製造用
反応管として用いるに好適な長尺の管状部材の製造方法
に関する。
TECHNICAL FIELD The present invention relates to a method for manufacturing a tubular member, and more particularly to a method for manufacturing a long tubular member suitable for use as a reaction tube for semiconductor production.

[従来の技術] 従来、半導体製造用反応管としては、石英管又はその外
側にムライト質もしくは炭化珪素質の均熱用ライナチュ
ーブを設けたものが使われている。ところが、石英管で
は割れ易い、コンタミが入り失透するなどの欠点を有
し、特に高温での強度が不足し、特に長尺ものは撓み易
い。
[Prior Art] Conventionally, as a reaction tube for semiconductor production, a quartz tube or a tube provided with a mullite or silicon carbide soaking liner tube on the outside thereof has been used. However, a quartz tube has drawbacks such as fragility and devitrification due to contamination and the like, and lacks strength particularly at high temperatures, and particularly long ones are easily bent.

そこで、石英以外の材質からなる半導体製造用反応管の
提供が期待されている。
Therefore, it is expected to provide a reaction tube for semiconductor production made of a material other than quartz.

ところで、近年、炭化珪素や窒化珪素等の非酸化物系セ
ラミックスは、優れた耐熱特性を有しているところか
ら、各種工業材料への適用が検討されており、非酸化物
系セラミックスを用いて半導体製造用反応管を製造する
ことが考えられる。この場合、非酸化物系セラミックス
は、焼結しにくいので、焼結体とするには適宜の焼結助
剤を用いたり、反応焼結法を採用する必要がある。
By the way, in recent years, since non-oxide ceramics such as silicon carbide and silicon nitride have excellent heat resistance characteristics, application to various industrial materials has been studied, and non-oxide ceramics have been used. It is conceivable to manufacture a reaction tube for semiconductor manufacturing. In this case, since non-oxide ceramics are difficult to sinter, it is necessary to use an appropriate sintering aid or a reaction sintering method to form a sintered body.

また、管体を蒸着基材とし、これを加熱しつつその内面
もしくは外面に反応ガスを供給してCVD被膜を形成
し、しかる後基材を適当な方法で除去することによりパ
イプを得る方法が知られている。(例えば特開昭58−
177461)。
Further, there is a method of obtaining a pipe by using a tubular body as a vapor deposition base material, supplying a reaction gas to the inner surface or the outer surface while heating the vapor deposition base material to form a CVD coating, and then removing the base material by an appropriate method. Are known. (For example, JP-A-58-
177461).

[発明が解決しようとする問題点] 上記の従来法のうち、焼結助剤を用いたり、反応焼結に
よる方法では、高純度化に多大の労力を要し、価格が高
いばかりでなく、粉末プロセスを採用する以上、高純度
化にも限界がある。
[Problems to be Solved by the Invention] Of the above-mentioned conventional methods, a method using a sintering aid or a reaction sintering method requires a great deal of labor for high purification, and is not only expensive, As the powder process is adopted, there is a limit to high purification.

一方、特開昭58−177461のようなCVD法によ
れば、緻密で高強度なセラミックスが得られるものの、
基材の材質が銅、アルミニウム等の金属材料であるの
で、基材の除去操作が湿式の溶解処理となり、製造工程
が煩雑となる。
On the other hand, according to the CVD method as disclosed in JP-A-58-177461, although dense and high-strength ceramics can be obtained,
Since the material of the base material is a metal material such as copper or aluminum, the operation of removing the base material is a wet dissolution process, which complicates the manufacturing process.

そこで、基材の材質を、金属材から黒鉛に置換すること
が考えられる。しかしながら、黒鉛を筒形基材となすに
は、非常に手間のかかる中ぐり加工を行わねばならず、
基材コストが高い。さらに、長尺ものを精度良く中ぐり
加工することは、容易ではなく、長尺の管状部材は製造
しにくい。
Therefore, it is considered that the material of the base material is replaced with graphite from a metal material. However, in order to form graphite into a tubular base material, it is necessary to perform a very troublesome boring process,
High base material cost. Further, it is not easy to perform boring of a long product with high accuracy, and it is difficult to manufacture a long tubular member.

[問題点を解決するための手段及び作用] 本発明は等径の黒鉛リング又は黒鉛筒を同軸的に接続配
置し、CVD処理により、この接続体の周面にセラミッ
クスの被膜を形成して管状体となす方法であって、前記
黒鉛リング又は黒鉛筒の外周角部を角取りした後接続配
置すると共に、CVD処理に際し、この外周角部を選択
的に加熱して当該外周角部に選択的にCVD析出物を被
着させる工程を有することを特徴とする管状部材の製造
方法である。
[Means and Actions for Solving Problems] In the present invention, a graphite ring or a graphite cylinder having an equal diameter is coaxially connected and arranged, and a ceramic coating is formed on the peripheral surface of this connector by a CVD process to form a tubular shape. A method of forming a body, wherein the outer peripheral corners of the graphite ring or the graphite cylinder are chamfered and then connected and arranged, and during the CVD treatment, the outer peripheral corners are selectively heated to selectively select the outer peripheral corners. The method for producing a tubular member is characterized in that it has a step of depositing a CVD deposit on the substrate.

かかる本発明によれば、高純度で緻密なセラミックス製
の、もしくはセラミックス被膜で覆われた管状部材を極
めて容易に製造できる。
According to the present invention, a tubular member made of high-purity and dense ceramics or covered with a ceramic coating can be extremely easily manufactured.

以下に本発明につき図面を参照しながら更に詳細に説明
する。
Hereinafter, the present invention will be described in more detail with reference to the drawings.

本発明においては、等径の黒鉛リング又は黒鉛筒1を同
軸的に接続配置(例えば積み重ね)して接続体2とな
し、次いでCVD処理によりこの接続体の周面にセラミ
ックスの被膜を形成する。
In the present invention, the graphite rings or graphite cylinders 1 having the same diameter are coaxially connected and arranged (for example, stacked) to form the connection body 2, and then the ceramic coating is formed on the peripheral surface of the connection body by the CVD process.

このセラミックスの被膜の形成に当り、第1,2図に示
す如く、リング又は筒1の外周角部を角取りし、リング
又は筒1同志の接合部外周に凹部3を周回形成し、該凹
部3を選択的にCVD処理温度に加熱して、第2図に示
す如く、該凹部3に選択的にCVD析出物4を析出させ
る。
In forming this ceramic coating, as shown in FIGS. 1 and 2, the outer peripheral corners of the ring or cylinder 1 are chamfered, and a recess 3 is formed around the joint of the rings or cylinders 1. 3 is selectively heated to the CVD processing temperature to selectively deposit a CVD deposit 4 in the recess 3 as shown in FIG.

かかる処理を行うことにより、リング又は筒1同志が析
出物4を介して接合されるようになり、接合体2の強度
ひいては得られる管状部材の強度の増大が図れる。な
お、この凹部3の選択的な加熱を行うには、適度な強度
のレーザビームを該凹部3に照射するのが好適である。
By carrying out such a treatment, the rings or the cylinders 1 are bonded to each other through the precipitate 4, and the strength of the bonded body 2 and thus the strength of the obtained tubular member can be increased. In order to selectively heat the concave portion 3, it is preferable to irradiate the concave portion 3 with a laser beam having an appropriate intensity.

リング又は筒1としては、内径及び外径が互いに等しい
ものが最適であるが、接続体の内周面又は外周面の一方
にのみCVD被膜を形成する場合には、内径又は外径の
みが等しいものであっても良い。
The ring or cylinder 1 is most preferably the same in inner diameter and outer diameter, but when the CVD coating is formed on only one of the inner peripheral surface and the outer peripheral surface of the connection body, only the inner diameter or outer diameter is the same. It may be one.

なお、第1図ではリング又は筒を真円形に形成してある
が、本発明においては楕円筒形や角筒(例えば六角筒)
等の形状に形成してもよい。
Although the ring or the cylinder is formed in a perfect circle in FIG. 1, in the present invention, it is an elliptic cylinder or a square cylinder (for example, a hexagonal cylinder).
It may be formed into a shape such as.

このCVD被膜は、内周面と外周面の双方に形成しても
よいのであるが、後工程において黒鉛の燃焼除去を行う
場合には、内周面もしくは外周面の一方にのみCVD被
膜を形成するのが好ましい。なお、CVD被膜を形成す
るには、常法に従って行なえばよく、例えばCVD処理
装置内に装入し、適当するCVD反応温度に加熱して、
CVD原料ガスを導入すればよい。
This CVD coating may be formed on both the inner peripheral surface and the outer peripheral surface. However, when the graphite is burned and removed in a later step, the CVD coating is formed only on one of the inner peripheral surface and the outer peripheral surface. Preferably. The CVD coating may be formed according to a conventional method, for example, by placing it in a CVD processing apparatus and heating it to an appropriate CVD reaction temperature,
A CVD source gas may be introduced.

このCVD被膜は、本発明においてはセラミックスであ
る。具体的な材質としては炭化珪素、窒化珪素などの非
酸化物系セラミックスの他マグネシア、アルミナ等の酸
化物系のものでもよいが、反応管として用いる管状部材
を製造するには、炭化珪素を析出させるのが好適であ
る。炭化珪素のCVD析出反応に用いられる原料ガス
は、各種のものが知られており、本発明ではいずれのも
のも採用できる。例えば、よく知られているように、C
3SiCl3を熱分解させることによりSiCを析出さ
せることができる。またSiCl4をCH4等のハイドロ
カーボンを用いて還元することによってもSiCを析出
させることができる。
This CVD coating is a ceramic in the present invention. Specific materials include non-oxide ceramics such as silicon carbide and silicon nitride, and oxide-based ones such as magnesia and alumina. However, in order to manufacture a tubular member used as a reaction tube, silicon carbide is deposited. Is preferred. Various source gases are known for use in the CVD deposition reaction of silicon carbide, and any of them can be adopted in the present invention. For example, as is well known, C
SiC can be deposited by thermally decomposing H 3 SiCl 3 . SiC can also be deposited by reducing SiCl 4 with a hydrocarbon such as CH 4 .

析出させるCVD被膜の厚さは、特に限定はされず、得
られる管状部材に要求される耐食性や強度などを満たす
肉厚となるようにCVD処理条件を選定する。
The thickness of the CVD coating film to be deposited is not particularly limited, and the CVD processing conditions are selected so that the resulting tubular member has a thickness that satisfies the corrosion resistance and strength required.

本発明においては、例えばCVD処理時間を長短調整す
ることにより、肉厚の極めて小さなものから、肉厚の大
きなものまで任意の肉厚の管状部材を製造することがで
きる。
In the present invention, for example, by adjusting the length of the CVD process, it is possible to manufacture a tubular member having an arbitrary wall thickness from a very thin wall to a large wall.

このようなCVD被膜の析出を行なった後、必要に応じ
黒鉛リング又は黒鉛筒1の燃焼の除去を行なう。この燃
焼除去を行なうには、酸化雰囲気中において黒鉛が燃焼
する温度領域に保持すればよい。この際、CVD処理装
置内に保持したまま、雰囲気を酸素又は空気に切り換え
ることにより、処理装置内で黒鉛リング又は筒の燃焼除
去を引き続き行なうことができる。このようにすれば、
基材とCVD被膜との熱膨張差に起因する熱応力の発生
を防止することができる。勿論、本発明においては、一
旦室温まで戻した後黒鉛を燃焼除去してもよい。また、
CVD処理温度とは異なる温度で黒鉛を燃焼させてもよ
いことは明らかである。
After depositing such a CVD coating, the combustion of the graphite ring or the graphite cylinder 1 is removed if necessary. In order to carry out this combustion removal, it is sufficient to maintain the temperature range in which the graphite burns in the oxidizing atmosphere. At this time, the atmosphere can be switched to oxygen or air while being held in the CVD processing apparatus, so that combustion removal of the graphite ring or the cylinder can be continuously performed in the processing apparatus. If you do this,
It is possible to prevent the occurrence of thermal stress due to the difference in thermal expansion between the base material and the CVD coating. Of course, in the present invention, the graphite may be burned and removed after once returning to room temperature. Also,
Obviously, the graphite may be burned at a temperature different from the CVD treatment temperature.

[実施例] 実施例1 内径90mm、外径100mm、長さ5cmの黒鉛製の筒の外
周角部を45°の角度で約8mm角取りし、これを10
個、第1図の如く積み重ねて接続体とした。
[Example] Example 1 An outer peripheral corner portion of a graphite cylinder having an inner diameter of 90 mm, an outer diameter of 100 mm and a length of 5 cm was squared at an angle of 45 ° for about 8 mm, and this was cut to 10 mm.
The individual pieces were stacked as shown in FIG. 1 to form a connected body.

この接続体をレーザCVD処理装置によりCVD処理し
てSiC被膜を形成した。CVD処理中接続体をその軸
心回りに5rpmで回転させると共に、角取りにより形
成された凹部にレーザビームを照射して加熱し、当該凹
部だけを順次CVD析出物で埋めた。なお、レーザCV
D処理装置の側壁には透明な小窓を設け、この小窓から
装置内部の接続体の前記凹部へ向けてレーザビームを照
射した。レーザは炭酸ガスレーザ、出力5kwのものを
用いた。
This connection body was subjected to a CVD process by a laser CVD processing device to form a SiC film. During the CVD process, the connector was rotated around its axis at 5 rpm, and the recess formed by chamfering was irradiated with a laser beam to be heated, and only the recess was sequentially filled with the CVD deposit. Laser CV
A transparent small window was provided on the side wall of the D processing apparatus, and a laser beam was irradiated from this small window toward the concave portion of the connection body inside the apparatus. A carbon dioxide gas laser having an output of 5 kW was used as the laser.

次いで、接続体をCVD処理装置内に装入し、1500
℃に均一に加熱した状態でCVD原料ガスとしてSiC
4を0.6/min、C38を0.1/minの
割合で流通させ、接続体の内外両周面に厚さ0.3mmの
CVD被膜を形成した。
Then, the connected body is loaded into a CVD processing apparatus, and 1500
SiC as a CVD source gas while being uniformly heated to ℃
l 4 was circulated at a rate of 0.6 / min and C 3 H 8 was circulated at a rate of 0.1 / min to form a CVD coating having a thickness of 0.3 mm on both the inner and outer peripheral surfaces of the connector.

装置内の温度が200℃になるまで徐冷した後、装置か
ら取り出した。これにより、SiC−CVD被膜で全周
面が覆われた長さ50cmの管状部材であって、筒同志の
接合強度の高い管状部材が得られた。
After slowly cooling until the temperature inside the apparatus reached 200 ° C., it was taken out from the apparatus. As a result, a tubular member having a length of 50 cm, the entire peripheral surface of which was covered with the SiC-CVD coating, and which had a high joint strength between the tubular members was obtained.

[発明の効果] 以上の説明から明らかな通り、本発明によれば低コスト
で、長尺のセラミックス製又はセラミックス被覆された
黒鉛の管状部材が得られる。本発明により得られる管状
部材を構成するセラミックスは、CVD法により形成さ
れたものであるから、緻密かつ高純度である。
[Effects of the Invention] As is clear from the above description, according to the present invention, a long tubular member made of ceramics or coated with ceramics can be obtained at low cost. The ceramic constituting the tubular member obtained by the present invention is dense and highly pure because it is formed by the CVD method.

本発明によって炭化珪素を析出させる場合には、得られ
る管状部材は、炭化珪素のみ又は炭化珪素と黒鉛とから
なり均熱できるものであるから、半導体製造用反応管と
して好適である。勿論、本発明方法により製造される管
状部材は、その他の各種の用途に供し得る。
In the case of depositing silicon carbide according to the present invention, the tubular member to be obtained is suitable as a reaction tube for semiconductor production, because it is made of only silicon carbide or silicon carbide and graphite and can be uniformly heated. Of course, the tubular member produced by the method of the present invention can be used for various other purposes.

【図面の簡単な説明】[Brief description of drawings]

第1図及び第2図の各図は本発明の筒状部材の製造法を
示す断面図である。 1…リング又は筒、2…接続体。
Each of FIGS. 1 and 2 is a cross-sectional view showing a method for manufacturing a tubular member according to the present invention. 1 ... Ring or cylinder, 2 ... Connection body.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】等径の黒鉛リング又は黒鉛筒を同軸的に接
続配置し、CVD処理により、この接続体の周面にセラ
ミックスの被膜を形成して管状体となす管状部材の製造
方法であって、 前記黒鉛リング又は黒鉛筒の外周角部を角取りした後接
続配置すると共に、CVD処理に際し、この外周角部を
選択的に加熱して当該外周角部に選択的にCVD析出物
を被着させる工程を有することを特徴とする管状部材の
製造方法。
1. A method of manufacturing a tubular member, wherein graphite rings or graphite cylinders of equal diameter are coaxially connected and arranged, and a ceramic coating is formed on the peripheral surface of the connected body by a CVD process to form a tubular body. Then, the outer peripheral corners of the graphite ring or the graphite cylinder are chamfered and then connected and arranged, and during the CVD treatment, the outer peripheral corners are selectively heated to be selectively covered with the CVD deposits. A method for manufacturing a tubular member, comprising a step of attaching the tubular member.
【請求項2】CVD処理後に黒鉛を燃焼除去する特許請
求の範囲第1項に記載の製造方法。
2. The manufacturing method according to claim 1, wherein the graphite is burned and removed after the CVD treatment.
JP60265382A 1985-11-26 1985-11-26 Method for manufacturing tubular member Expired - Lifetime JPH0649946B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60265382A JPH0649946B2 (en) 1985-11-26 1985-11-26 Method for manufacturing tubular member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60265382A JPH0649946B2 (en) 1985-11-26 1985-11-26 Method for manufacturing tubular member

Publications (2)

Publication Number Publication Date
JPS62128974A JPS62128974A (en) 1987-06-11
JPH0649946B2 true JPH0649946B2 (en) 1994-06-29

Family

ID=17416401

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60265382A Expired - Lifetime JPH0649946B2 (en) 1985-11-26 1985-11-26 Method for manufacturing tubular member

Country Status (1)

Country Link
JP (1) JPH0649946B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2629208B2 (en) * 1987-10-22 1997-07-09 いすゞ自動車株式会社 Ceramic member joining method
JP2001048667A (en) 1999-08-13 2001-02-20 Asahi Glass Co Ltd How to join ceramic parts
JP7580925B2 (en) * 2020-03-17 2024-11-12 イビデン株式会社 Joint of SiC-coated graphite members
JP7580926B2 (en) * 2020-03-17 2024-11-12 イビデン株式会社 Method for manufacturing a joint of SiC-coated graphite members
JP7534119B2 (en) * 2020-04-22 2024-08-14 イビデン株式会社 SiC-coated graphite member joint and method for manufacturing same

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49114608A (en) * 1973-03-07 1974-11-01
JPS5313197A (en) * 1976-07-22 1978-02-06 Seikoo Sangiyou Kk Method of interior piping or wiring

Also Published As

Publication number Publication date
JPS62128974A (en) 1987-06-11

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