JPH0660432B2 - Plating method for avoiding dark deposition when depositing a matte coating from a bright nickel bath or a bright nickel / cobalt alloy bath - Google Patents
Plating method for avoiding dark deposition when depositing a matte coating from a bright nickel bath or a bright nickel / cobalt alloy bathInfo
- Publication number
- JPH0660432B2 JPH0660432B2 JP2064452A JP6445290A JPH0660432B2 JP H0660432 B2 JPH0660432 B2 JP H0660432B2 JP 2064452 A JP2064452 A JP 2064452A JP 6445290 A JP6445290 A JP 6445290A JP H0660432 B2 JPH0660432 B2 JP H0660432B2
- Authority
- JP
- Japan
- Prior art keywords
- bath
- plating method
- bright nickel
- nickel
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 62
- 238000000576 coating method Methods 0.000 title claims description 27
- 229910052759 nickel Inorganic materials 0.000 title claims description 24
- 239000011248 coating agent Substances 0.000 title claims description 23
- 238000000151 deposition Methods 0.000 title claims description 15
- 238000000034 method Methods 0.000 title claims description 15
- 238000007747 plating Methods 0.000 title claims description 11
- 229910000990 Ni alloy Inorganic materials 0.000 title claims description 8
- 229910000531 Co alloy Inorganic materials 0.000 title claims description 7
- 230000008021 deposition Effects 0.000 title description 7
- 230000000694 effects Effects 0.000 claims description 15
- 238000009713 electroplating Methods 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 239000011247 coating layer Substances 0.000 claims description 9
- 239000002736 nonionic surfactant Substances 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 7
- -1 alkali metal salts Chemical class 0.000 claims description 6
- JEHKKBHWRAXMCH-UHFFFAOYSA-N benzenesulfinic acid Chemical compound O[S@@](=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-N 0.000 claims description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- DILXLMRYFWFBGR-UHFFFAOYSA-N 2-formylbenzene-1,4-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(S(O)(=O)=O)C(C=O)=C1 DILXLMRYFWFBGR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 238000001914 filtration Methods 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 239000011651 chromium Substances 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- 239000000126 substance Substances 0.000 description 15
- 239000000839 emulsion Substances 0.000 description 8
- 238000001816 cooling Methods 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 230000002776 aggregation Effects 0.000 description 4
- 239000003792 electrolyte Substances 0.000 description 4
- SRJQTHAZUNRMPR-UYQKXTDMSA-N spinosyn A Chemical compound O([C@H]1CCC[C@@H](OC(=O)C[C@H]2[C@@H]3C=C[C@@H]4C[C@H](C[C@H]4[C@@H]3C=C2C(=O)[C@@H]1C)O[C@H]1[C@@H]([C@H](OC)[C@@H](OC)[C@H](C)O1)OC)CC)[C@H]1CC[C@H](N(C)C)[C@@H](C)O1 SRJQTHAZUNRMPR-UYQKXTDMSA-N 0.000 description 4
- 238000005054 agglomeration Methods 0.000 description 3
- 229920001400 block copolymer Polymers 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 239000002932 luster Substances 0.000 description 3
- 229940124530 sulfonamide Drugs 0.000 description 3
- 150000003456 sulfonamides Chemical class 0.000 description 3
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 2
- 229940044175 cobalt sulfate Drugs 0.000 description 2
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 2
- 230000004313 glare Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 125000001931 aliphatic group Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000005228 aryl sulfonate group Chemical group 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- DCBILZQETXFXAY-UHFFFAOYSA-N butane-1-sulfinic acid Chemical compound CCCCS(O)=O DCBILZQETXFXAY-UHFFFAOYSA-N 0.000 description 1
- JHRWWRDRBPCWTF-OLQVQODUSA-N captafol Chemical compound C1C=CC[C@H]2C(=O)N(SC(Cl)(Cl)C(Cl)Cl)C(=O)[C@H]21 JHRWWRDRBPCWTF-OLQVQODUSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- PFXWTTLYQGCPQY-UHFFFAOYSA-N dichloromethanesulfinic acid Chemical compound OS(=O)C(Cl)Cl PFXWTTLYQGCPQY-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 230000001804 emulsifying effect Effects 0.000 description 1
- 238000005189 flocculation Methods 0.000 description 1
- 230000016615 flocculation Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 229910000008 nickel(II) carbonate Inorganic materials 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- ZULUUIKRFGGGTL-UHFFFAOYSA-L nickel(ii) carbonate Chemical compound [Ni+2].[O-]C([O-])=O ZULUUIKRFGGGTL-UHFFFAOYSA-L 0.000 description 1
- 150000002891 organic anions Chemical class 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- KFZUDNZQQCWGKF-UHFFFAOYSA-M sodium;4-methylbenzenesulfinate Chemical compound [Na+].CC1=CC=C(S([O-])=O)C=C1 KFZUDNZQQCWGKF-UHFFFAOYSA-M 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 150000003455 sulfinic acids Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
【発明の詳細な説明】 (技術分野) 本発明は有機光沢剤及び非イオン表面活性剤を含有し、
非イオン表面活性剤が浴処理温度において第2相として
乳化して存在する。鉄を不含有の光沢ニッケル電気鍍金
浴又は光沢ニッケル/コバルト合金電気鍍金浴から導電
性基体表面上につや消し被膜、いわゆるビロード様被膜
を析出させる技術に関するものである。さらに具体的に
は、本発明はこの被膜の析出に際して生ずる暗色沈積及
び/又は黒色細孔を回避する手段に関するものである。
このつや消し被膜は、つやのない被膜或はビロード様被
膜もしくはシュス様被膜として特徴的である。TECHNICAL FIELD The present invention contains an organic brightener and a nonionic surfactant,
The nonionic surfactant is present as an emulsified second phase at bath treatment temperatures. The present invention relates to a technique for depositing a matte coating, a so-called velvet-like coating, on a surface of a conductive substrate from an iron-free bright nickel electroplating bath or a bright nickel / cobalt alloy electroplating bath. More specifically, the invention relates to means for avoiding dark deposits and / or black pores that occur during the deposition of this coating.
This matte coating is characterized as a matte coating or a velvety-like coating or a shusu-like coating.
以下において光沢ニッケルなる語は、光沢ニッケル/コ
バルト合金をも含めて意味することとするが、上記技術
に関連して以下の点に留意され度い。すなわち、つや消
し光沢ニッケル層は、その特殊な装飾的効果により衛生
諸設備、家具装飾金具、家財道具などの耐久性用具に古
くから使用されている。光沢ニッケル電鍍浴はそのほか
に無機或は有機の異物質を含有し、これは光沢ニッケル
層中に蓄積されるか、或は陰極被膜における静電分布に
よりニッケル析出を阻害する。いずれの場合にも、被膜
表面に障害をもたらし、入射光の拡散反射をもたらす。
従って浴中におけるこの異物質は可能な限り均斉に微細
分散せしめられ、或は乳化され、これにより基体の全表
面にわたりつや消し効果、すなわちギラツキのない或は
少ない光沢効果がもたらされねばならない。In the following, the term bright nickel is meant to include bright nickel / cobalt alloys as well, but the following points should be noted in relation to the above technology. That is, the matte bright nickel layer has been used for a long time in durable tools such as sanitary equipment, furniture decoration fittings, and household appliances due to its special decorative effect. The bright nickel electroplating bath additionally contains foreign substances, either inorganic or organic, which either accumulate in the bright nickel layer or impede nickel deposition by electrostatic distribution in the cathodic coating. In either case, the surface of the coating is damaged and the incident light is diffusely reflected.
Therefore, this foreign substance in the bath should be as finely and uniformly dispersed as possible, or emulsified, to give a matte effect, i.e. a glint-free or low-gloss effect, over the entire surface of the substrate.
この目的を達するためには、工業的に特に耐摩耗性の分
散ニッケル被膜をもたらすために慣用されている酸化
物、炭化物、ダイヤモンド粉末などのような分散無機物
質よりも、微細分散もしくは乳化状態の有機異物質の方
が好ましい。上述した無機物質は密度が大きいという欠
点もある。これは著しく重力の影響を受け、これは沈積
被膜に異なるつや消し程度をもたらす。ここで云うつや
消しされた光沢ニッケル被膜は、例えばワットのニッケ
ル電解液から光沢剤なしに析出されるなし地ニッケル被
膜と混同してはならない。To this end, it is more finely dispersed or emulsified than dispersed inorganic materials such as oxides, carbides, diamond powders, etc. which are industrially customarily used to provide wear resistant dispersed nickel coatings. Organic foreign substances are preferred. The above-mentioned inorganic substances also have the drawback of high density. This is significantly affected by gravity, which gives the deposited coating a different degree of matting. Matte bright nickel coatings as used herein should not be confused with plain nickel coatings which are deposited without brightener from, for example, Watt's nickel electrolyte.
本発明の基礎をなす浴(西独特許1621087号)で
は、つや消し光沢ニッケル被膜を析出させる浴が、非イ
オン表面活性剤を含有しており、これは温度の上昇によ
り沈殿し、有機異物質として電解液と乳化液を形成す
る。この乳化液は回避されねばならない凝集をもたら
す。実際上使用可能の方法をもたらすために、特別の対
策が必要である。浴は付設循環において冷却されねばな
らず、それによって非イオン表面活性剤の濁り点を下回
るようにし、これを再び浴に溶解させねばならない。次
いで浴は必要な処理温度まであらためて加熱されねばな
らないが、これにより再び乳化がもたらされる。従って
特別の加熱/冷却−付設循環が必要である。公知の浴
は、つや消し光沢ニッケル層のため、芳香族スルホン酸
及びスルホンアミド及びスルホンイミドを含有する有機
光沢剤を含有する。これは低い陰極電流密度部分に黒色
ピンホールを有する乳状暗色沈積をもたらす欠点があ
る。しかるに、他方において0.5〜5A/dm2の範
囲の低い平均電流密度で処理されねばならない場合が多
く、極めて複雑な外形を有する基体、例えば計器類の場
合には低い陰極電流密度は不可避的である。しかも公知
の浴の使用に際して、平均陰極電流密度を高めることに
より上記欠点を回避することはできない。この電流密度
上昇は露出表面部分にいわゆる焦げつき、すなわち粗結
晶性乃至無定形性の沈積を局所的にもたらすからであ
る。ことに被膜表面に被覆層、特に金属炭化物及び/又
は金属窒化物被覆層が形成される場合には、黒色ピンホ
ールが特に邪魔をする。この際この黒色ピンホールがい
わば滲み出る。In the bath forming the basis of the present invention (West German Patent No. 1621087), the bath for depositing the matte bright nickel coating contains a nonionic surfactant, which precipitates with increasing temperature and is electrolyzed as an organic foreign substance. Form a liquid and an emulsion. This emulsion leads to agglomeration which must be avoided. Special measures are needed to bring the method to practical use. The bath must be cooled in the associated circulation, thereby bringing it below the cloud point of the nonionic surfactant and re-dissolving it in the bath. The bath must then be heated again to the required processing temperature, which again leads to emulsification. Therefore, special heating / cooling-attached circulation is required. The known baths contain organic brighteners containing aromatic sulfonic acids and sulfonamides and sulfonimides because of the matte bright nickel layer. This has the drawback of giving a milky dark deposit with black pinholes in the low cathode current density area. On the other hand, on the other hand, it is often necessary to treat with a low average current density in the range of 0.5 to 5 A / dm 2 , and in the case of substrates with extremely complex contours, such as instruments, a low cathode current density is unavoidable. Is. Moreover, when using known baths, the above disadvantages cannot be avoided by increasing the average cathode current density. This increase in current density locally causes so-called charring, that is, coarse crystalline or amorphous deposition on the exposed surface portion. Especially when a coating layer, in particular a metal carbide and / or metal nitride coating layer, is formed on the surface of the coating, the black pinholes are particularly disturbing. At this time, this black pinhole exudes, so to speak.
上述の欠点を回避するため、特殊の異物質を使用して処
理することが提案されている(西独特許2327881
号)。しかしながら、これまでに公知の対策において、
電解液中の有機異物質は少なくとも1種の陽イオン活性
又は酸・アルカリ両性物質と少なくとも1種の化合物の
有機陰イオンとの反応により形成される。この陰イオン
供与物質は、ことにアルキル−もしくはアリールスルフ
ァート、アルキル−もしくはアリールスルホン酸ならび
にスルフィン酸、さらにはスルホンアミドもしくはスル
ホンイミドである。つや消しされ、しかも光沢性の特性
をもたらすため、電解液はさらに公知の1次及び/或は
2次光沢剤を含有する。この有機異物質は、一定の処理
時間内に装飾的に有効なつや消しをもたらし、その処理
時間後、この異物質は凝集現象の結果濾別除去されねば
ならない。そこで、次の処理サイクルのため有機異物質
は毎回あらためて添加されねばならないが、これはコス
ト高をもたらす。In order to avoid the above-mentioned drawbacks, it is proposed to treat using a special foreign substance (West German Patent 2327881).
issue). However, in the known measures so far,
Organic foreign substances in the electrolyte are formed by the reaction of at least one cationically active or acid / alkali amphoteric substance with the organic anion of at least one compound. The anion-donating substances are, in particular, alkyl- or arylsulfates, alkyl- or arylsulphonic acids and sulfinic acids, as well as sulfonamides or sulfonimides. The electrolytic solution further contains known primary and / or secondary brighteners in order to provide a matte and glossy character. This organic foreign substance provides a decoratively effective matting within a certain treatment time, after which the foreign substance must be filtered off as a result of the agglomeration phenomenon. Therefore, organic foreign substances have to be added again each time for the next treatment cycle, which leads to high costs.
従って、本発明により解決されるべきこの分野の技術的
課題は、明細書冒頭に述べた浴、ことに西独特許162
1087号による浴から、導電性基体表面上につや消し
被膜を析出させる際の、暗色沈積及び/又は黒色ピンホ
ールの生起を抑止することである。Therefore, the technical problem in this field to be solved by the present invention is the bath mentioned at the beginning of the specification, especially West German Patent 162.
Suppressing the occurrence of dark deposits and / or black pinholes when depositing a matte coating on the surface of a conductive substrate from No. 1087 bath.
(発明の要約) しかるにこの技術的課題は、有機光沢剤及び非イオン表
面活性剤を含有し、非イオン表面活性剤が浴処理温度に
おいて第2相として乳化して存在する、鉄を不含有の光
沢ニッケル電気鍍金浴又は光沢ニッケル/コバルト合金
電気鍍金浴から導電性基体表面上につや消し被膜を析出
させる際の暗色沈積及び/又は黒色ピンホールの形成を
回避する鍍金方法であって、前記の浴に有機光沢剤及び
非イオン表面活性剤のほかに、ベンゼンスルフィン酸、
p−トルエンスルフィン酸又はこれらのアルカリ金属塩
が単独で、又は混合物として、つや消し効果を阻害しな
いように100mg/lより少ない量で添加され、0.
5〜5A/dm2の範囲の平均陰極電流密度で処理さ
れ、かつ濾過装置を備えた加熱/冷却−付設循環により
浴の二相状態が充分に維持されることを特徴とする鍍金
方法により解決され得ることが見出された。SUMMARY OF THE INVENTION This technical problem, however, is based on the fact that iron-free, containing organic brighteners and nonionic surfactants, the nonionic surfactants being present as an emulsified second phase at bath treatment temperatures. A plating method for avoiding dark color deposition and / or formation of black pinholes when depositing a matte coating on the surface of a conductive substrate from a bright nickel electroplating bath or a bright nickel / cobalt alloy electroplating bath. In addition to organic brighteners and nonionic surfactants, benzenesulfinic acid,
p-Toluenesulfinic acid or an alkali metal salt thereof is added alone or as a mixture in an amount of less than 100 mg / l so as not to impair the matting effect, and
Solution by a plating method characterized by being treated with an average cathodic current density in the range of 5 to 5 A / dm 2 and by heating / cooling-attached circulation equipped with a filtration device, the two-phase state of the bath is sufficiently maintained. It has been found that this can be done.
このような鍍金方法から形成されるつや消し被膜は、そ
の上にさらに被覆層、ことに蒸着された金属炭化物及び
/又は金属窒化物被覆層を形成することができる。つや
消し被膜の上に光沢クロム被覆層を電気鍍金することも
できる。The matte coating formed by such a plating method can have a coating layer formed thereon, especially a metal carbide and / or metal nitride coating layer deposited thereon. It is also possible to electroplate a bright chrome coating on the matte coating.
ニッケルもしくはニッケル合金含有シュス様被膜を析出
するための、乳化異物質を含有する浴に有機スルフィン
酸を添加すること、さらに加熱/冷却−付設循環を必要
としないように乳化液を安定化することは基本的には公
知である(西独公開3736171.6号)。しかしな
がら、これは大量に添加されねばならず、しかも必ずし
も常にその目的を達成することができない。Adding organic sulfinic acid to a bath containing an emulsifying foreign substance for depositing a nickel- or nickel-alloy-containing schuss-like coating, and further stabilizing heating / cooling-emulsion so as not to require additional circulation. Is basically known (West German publication No. 3736171.6). However, it must be added in large quantities and not always achieve its purpose.
(発明の構成) 本発明においては、浴に、従来慣用の第1次光沢剤(例
えばスルホンイミド、スルホンアミド、ベンゼンスルホ
ン酸、ナフタリンスルホン酸、アルカンスルホン酸、ア
リールスルホナート)及び第2次光沢剤(例えばアルケ
ンもしくはアルキンスルホン酸もしくはスルホン酸のア
ルカリ金属塩)のほかに、ベンゼンスルフィン酸及び/
或はp−トルエンスルフィン酸、ことにそのナトリウム
塩が100mg/lより少ない量で添加される。余りに
高濃度の有機スルフィン酸乃至その塩を含有させると、
同じ陰極電流密度でも、析出沈積被膜には余りに強い光
沢がもたらされ、これはつや消し効果を阻害する。この
分野の技術者は個々の場合にどの程度のスルフィン酸量
が好ましいかを事前の簡単な試験で決定し得る。この場
合、スルフィン酸量は比較的少量に選定されねばなら
ず、同時にこれに応じて浴中乳化剤濃度も少なめに選択
されることが原則的に必要である。本発明において、ま
たアルキルスルフィン酸、例えばメタン、エタン、プロ
パン、ブタンスルフィン酸、ジメタンジスルフィン酸、
ジクロルメタンスルフィン酸なども基本的には使用可能
でる。しかしながら、この脂肪族スルフィン酸は水中に
おいてしばしば不安定である。(Structure of the Invention) In the present invention, a conventional primary brightening agent (eg, sulfonimide, sulfonamide, benzenesulfonic acid, naphthalenesulfonic acid, alkanesulfonic acid, arylsulfonate) and a secondary gloss are used in the bath. In addition to agents (eg alkenes or alkyne sulfonic acids or alkali metal salts of sulfonic acids), benzenesulfinic acid and /
Alternatively, p-toluenesulfinic acid, especially its sodium salt, is added in an amount of less than 100 mg / l. When the concentration of the organic sulfinic acid or its salt is too high,
At the same cathodic current density, too much gloss is produced in the deposited film, which hinders the matte effect. The person skilled in the art can determine with a simple test in advance how much sulfinic acid is preferred in each case. In this case, the amount of sulfinic acid must be selected to be relatively small, and at the same time, it is necessary in principle that the concentration of the emulsifier in the bath be selected to be relatively small. In the present invention also alkylsulfinic acids such as methane, ethane, propane, butanesulfinic acid, dimethanedisulfinic acid,
Basically, dichloromethanesulfinic acid can also be used. However, this aliphatic sulfinic acid is often unstable in water.
本発明により、乳化液含有ニッケル浴、ことに西独特許
1621087号による浴から、つや消し光沢ニッケル
層もしくは光沢ニッケル/コバルト合金層を析出沈積さ
せる際の、低い陰極電流密度範囲における暗色沈積は有
効的に阻止され得る。これは、上記のような浴におい
て、その作用条件下に、溶解物質と非溶解状態、すなわ
ち乳化状態の物質との2相系であるという事実にもとづ
く。低い陰極電流密度における暗色沈積の原因は、不溶
解有機物質にあるが、これは他方においてつや消し効果
をもたらすために存在しなくてはならないものである。
スルフィン酸が電鍍浴に溶解不純物に対する高い許容を
もたらすことは公知であったが、不溶性物質を含む2相
系おける前述したような欠点を回避克服し得ることは、
本発明前において期待され得なかったところである。本
発明は、ニッケルスルファート、ニッケルクロリド及び
硼酸から成るワット浴のような純粋のニッケル電解浴に
おいて使用可能であるばかりでなく、ニッケル/コバル
ト合金電解浴においても使用可能である。後者の場合に
は、ワット浴に対して追加的に限定される量のコバルト
スルファートもしくはコバルトクロリドが添加される。
西独特許1621087号による前述の加熱/冷却循環
系は本発明によるこの改善方法においても設定されねば
ならない。According to the present invention, when a matte bright nickel layer or a bright nickel / cobalt alloy layer is deposited and deposited from an emulsion-containing nickel bath, especially a bath according to German Patent 1621087, dark color deposition in a low cathode current density range is effective. Can be blocked. This is based on the fact that, in the bath as described above, under its operating conditions, it is a two-phase system of the dissolved substance and the undissolved or emulsified substance. The cause of the dark deposits at low cathodic current densities lies in the insoluble organic matter, which on the other hand must be present in order to give a matting effect.
Although it has been known that sulfinic acid provides a high tolerance for dissolved impurities in electroplating baths, the ability to avoid and overcome the aforementioned drawbacks in two-phase systems containing insoluble materials is
This is something that could not be expected before the present invention. The invention can be used not only in pure nickel electrolytic baths such as the Watts bath consisting of nickel sulphate, nickel chloride and boric acid, but also in nickel / cobalt alloy electrolytic baths. In the latter case, an additional limited amount of cobalt sulfate or cobalt chloride is added to the Watts bath.
The previously mentioned heating / cooling circulation according to West German patent 1621087 must also be set up in this improved method according to the invention.
以下の実施例により本発明をさらに具体的に説明する。
本発明により電解ならびに非電解被膜(例えば光沢クロ
ムもしくはチタン窒化物)を優れた品質のギラツキのな
い光沢ニッケル層上に形成することができる。The present invention will be described more specifically by the following examples.
The present invention allows electrolytic as well as non-electrolytic coatings (eg bright chrome or titanium nitride) to be formed on high quality, glare-free bright nickel layers.
実験例1 以下のニッケル浴を調製し、これで電鍍被覆を行った。Experimental Example 1 The following nickel bath was prepared, and electroplating was performed using this.
ニッケルスルファートx7H2O 300g ニッケルクロリドx6H2O 50g 硼酸 40g 安息香酸スルホンイミドナトリウム塩 1g EO分20重量%、PO分80重量%、平均分子量約2
500のプロピレンオキシド/エチレンオキシドブロッ
ク共重合体 0.012ミリモル 上記のものに対し水を添加して1リッターの浴とした。Nickel sulfate x7H 2 O 300 g of nickel chloride x6H 2 O 50 g boric acid 40g benzoate sulfonimide sodium salt 1 g EO content 20 wt%, PO content 80% by weight, average molecular weight of about 2
500 propylene oxide / ethylene oxide block copolymer 0.012 mmol Water was added to the above to prepare a 1 liter bath.
pH値 4.2〜4.4(硫酸もしくはニッケルカルボ
ナートで調整) 温度 52℃ 陰極電流密度 3A/dm2 陽極 DIN1702による電解質ニッケル 基体 軽度の運動 処理時間 15分間 「LPW−タッシェンブーフ、フュール、ガルヴァノテ
ヒニーク」1988年第13版、1巻、570頁の62
図による外形を有する真鍮板を電鍍技術慣用法により脱
脂浄化してから、上述電解浴でつや消し光沢ニッケル鍍
金した。隅角部の低電流密度部分において黒色ピンホー
ルを伴う暗色沈積が認められた。pH value 4.2 to 4.4 (adjusted with sulfuric acid or nickel carbonate) Temperature 52 ° C. Cathode current density 3 A / dm 2 Anode Electrolyte nickel substrate according to DIN 1702 Mild movement Treatment time 15 minutes “LPW-Taschenbuch, Fur, Galva Notechinique ", 1988 thirteenth edition, Vol. 1, 570, p. 62.
A brass plate having the outer shape shown in the figure was degreased and purified by a conventional electroplating technique, and then plated with matte bright nickel in the above electrolytic bath. Dark deposits with black pinholes were observed in the low current density areas at the corners.
実験例2 上記実験例1の電解浴に、その加熱前さらに0.12ミ
リモルのベンゼンスルフィン酸ナトリウム塩を添加し、
析出実験を行った。試験金属板隅角部にはギラツキのな
い表面効果を有する光沢面が観察され、黒色ピンホール
は認められなかった。Experimental Example 2 To the electrolytic bath of the above Experimental Example 1, 0.12 mmol of benzenesulfinic acid sodium salt was added before heating.
A precipitation experiment was conducted. A glossy surface having a glare-free surface effect was observed at the corners of the test metal plate, and no black pinhole was observed.
実験例3 実験例1及び2の同様に金属板をニッケル鍍金した後、
電鍍技術に慣用の方法で光沢クロム鍍金すか、又はTi
N蒸着(PVD法)で硬質被覆層を形成した。実験例2
と同様のニッケル浴を使用することにより、試験金属板
はその隅角部においても申し分のない被覆層をもたらし
た。Experimental Example 3 After plating a metal plate with nickel in the same manner as in Experimental Examples 1 and 2,
Bright chrome plating or Ti in a conventional manner in electroplating technology
A hard coating layer was formed by N vapor deposition (PVD method). Experimental example 2
By using a nickel bath similar to, the test metal sheet gave a satisfactory coating layer even in its corners.
実験例4 実験例2における0.12ミリモルのベンゼンスルフィ
ン酸ナトリウム塩の代わりに対応する量のp−トルエン
スルフィン酸ナトリウム塩を使用した。この場合におい
ても同様に黒色ピンホールのないつや消し光沢隅角部を
有する析出被膜が形成された。Experimental Example 4 Instead of 0.12 mmol of benzenesulfinic acid sodium salt in Experimental Example 2, a corresponding amount of p-toluenesulfinic acid sodium salt was used. Also in this case, similarly, a deposited film having a matte gloss corner portion without black pinholes was formed.
実験例5 実験例1、2乃至4と同様の電解浴で、乳化液形成剤と
してのブロック共重合体を添加しないものを調製した。
この場合の試験板体も隅角部における黒色ピンホールは
認められなかった。析出被膜はなし地光沢ではなく、光
沢性(高度のギラツキではなく)を示した。Experimental Example 5 An electrolytic bath similar to those of Experimental Examples 1, 2 to 4 was prepared without adding a block copolymer as an emulsion forming agent.
No black pinholes were observed in the corners of the test plate in this case either. The deposited film exhibited a gloss (rather than a high degree of glare) rather than a plain background gloss.
実験例6 実験例1〜5の電解浴に30g/lのコバルトスルファ
ートx7H2Oを添加したものを使用した。結果は上述
したと同じであった。It was used with the addition of cobalt sulfate x7H 2 O in 30 g / l in the electrolyte bath of Experimental Example 6 Experimental Example 1-5. The results were the same as described above.
実験例7 実験例2と同様の処理を、浴処理温度をあらためて加熱
する前に18〜20℃に冷却する、加熱/冷却循環(約
1/3浴容量/時)を行うための装置系を備えた浴につ
いて1時間ごとに行った。同様に均斉なつや消し光沢効
果が、付設循環系の連続的作動によりもたらされた。試
験金属板の隅角部も黒色ピンホールをもたらすことなく
光沢状態を維持した。Experimental Example 7 An apparatus system for performing heating / cooling circulation (about 1/3 bath volume / hour) in which the same treatment as in Experimental Example 2 was cooled to 18 to 20 ° C. before heating the bath treatment temperature again. The prepared bath was run every hour. Similarly, a uniform matte gloss effect was produced by the continuous operation of the attached circulation system. The corners of the test metal plate also maintained their glossy state without producing black pinholes.
実験例8 実験例7の浴を加熱/冷却循環系を作動させることなく
1時間ごとの析出沈積処理を行った。試験金属板の隅角
部にも黒色ピンホールをもたらすことなく光沢状態は維
持されたが、ギラツキのない光沢効果は時間を追って乳
化液の凝集のために粗悪となり見苦しい状態となった。
この加熱/冷却循環系を作動しない場合の凝集は表面状
態の観察及びこれによりもたらされるR2値により測定
され、また3隅角反射計(DIN67530)の原理に
より行い把握された。析出沈積層の光沢度はこれに応じ
て上昇する。Experimental Example 8 The bath of Experimental Example 7 was subjected to an hourly precipitation-deposition treatment without operating the heating / cooling circulation system. The gloss state was maintained without causing black pinholes in the corners of the test metal plate, but the gloss effect without glare became poor and unsightly due to aggregation of the emulsion over time.
The agglomeration without activation of the heating / cooling circulatory system was determined by observing the surface conditions and the resulting R 2 values and by the principle of the three-angle reflectometer (DIN 67530). The glossiness of the deposit is increased accordingly.
実際の装着部品について同様な実験を行ったが、これら
部品の表面処理後完全な部材となるように装着した場合
につや消し光沢効果における差異が極めて顕著となっ
た。すなわち表面の美的効果は他に比肩するものがない
優れたものであった。すなわち本発明により設けられる
べき加熱/冷却循環系により均斉なつや消し光沢効果が
保証される。Similar experiments were carried out on actually mounted parts, but when the parts were mounted so as to be perfect members after the surface treatment, the difference in the matte gloss effect was extremely remarkable. In other words, the aesthetic effect of the surface was excellent and unrivaled. That is, a uniform matte gloss effect is ensured by the heating / cooling circulation system to be provided according to the invention.
実験例9 実験例1乃至2の電解浴において、ベンゼンスルフィン
酸ナトリウム塩の量を3.6ミリモルに増量して添加
し、析出沈積実験を行った。この場合試験金属片隅角部
は黒色ピンホールのない光沢を示したが、その量を増大
させると、つや消し光沢効果は中度及び高度の陰極電流
密度においても被膜の好ましくない光沢が確認される。
この効果はプロピレンオキシド/エチレンオキシドブロ
ック共重合体の濃度を高めることにより一定の範囲で補
償され得るが、このような対策では再び乳化液の凝集を
促進することになり、これは加熱/冷却循環をさらに強
化せねばならず、これを必要な処理条件下に行うとすれ
ば、著しいコスト増加をもたらすことになる。換言すれ
ば、乳化液濃度を低く保持するのが有利であり、ベンゼ
ンスルフィン酸ナトリウム塩濃度も低く選択することが
できる。Experimental Example 9 In the electrolytic baths of Experimental Examples 1 and 2, the amount of benzenesulfinic acid sodium salt was increased to 3.6 mmol and added, and a deposition experiment was conducted. In this case, the corners of the test metal showed a black pinhole-free luster, but with increasing amount, the matte luster effect confirms the unfavorable luster of the coating even at moderate and high cathodic current densities.
This effect can be compensated to a certain extent by increasing the concentration of the propylene oxide / ethylene oxide block copolymer, but such a measure again promotes the flocculation of the emulsion, which leads to heating / cooling circulation. It must be further strengthened, and if this is done under the necessary processing conditions, it will result in a significant cost increase. In other words, it is advantageous to keep the emulsion liquid concentration low, and the benzenesulfinic acid sodium salt concentration can also be selected low.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 クラウス、シュルツェ―ベルゲ ドイツ連邦共和国、5630、レムシャイト、 アードルフ―ヴェステン―シュトラーセ、 14 (56)参考文献 特開 昭49−130835(JP,A) 特開 昭51−140842(JP,A) 特開 昭52−48526(JP,A) 米国特許3839165(US,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Klaus, Schulze-Berge, Federal Republic of Germany, 5630, Remscheid, Adolf-Westen-Strasse, 14 (56) Reference JP-A-49-130835 (JP, A) JP-A-51-140842 (JP, A) JP-A-52-48526 (JP, A) US Patent 3839165 (US, A)
Claims (3)
し、非イオン表面活性剤が浴処理温度において第2相と
して乳化して存在する、鉄を不含有の光沢ニッケル電気
鍍金浴又は光沢ニッケル/コバルト合金電気鍍金浴から
導電性基体表面上につや消し被膜を析出させる際の暗色
沈積及び/又は黒色ピンホールの形成を回避する鍍金方
法であって、前記の浴に有機光沢剤及び非イオン表面活
性剤のほかに、ベンゼンスルフィン酸、p−トルエンス
ルフィン酸又はこれらのアルカリ金属塩が単独で、又は
混合物として、つや消し効果を阻害しないように100
mg/lより少ない量で添加され、0.5〜5A/dm
2の範囲の平均陰極電流密度で処理され、かつ濾過装置
を備えた加熱/冷却−付設循環により浴の二相状態が充
分に維持されることを特徴とする鍍金方法。1. An iron-free bright nickel electroplating bath or brightener comprising an organic brightener and a nonionic surfactant, the nonionic surfactant being present as an emulsified second phase at bath treatment temperature. A plating method for avoiding the formation of a dark color deposit and / or a black pinhole when depositing a matte coating on the surface of a conductive substrate from a nickel / cobalt alloy electroplating bath. In addition to the surface-active agent, benzenesulfinic acid, p-toluenesulfinic acid or alkali metal salts thereof, alone or as a mixture, are used so as not to impair the matting effect.
added in an amount less than mg / l, 0.5-5 A / dm
A plating method, characterized in that the bath is maintained at an average cathode current density in the range of 2 and the two-phase state of the bath is sufficiently maintained by heating / cooling-attached circulation equipped with a filtration device.
し被膜上に被覆層、ことに蒸着された金属炭化物及び/
又は金属窒化物の被覆層が形成されることを特徴とする
鍍金方法。2. A plating method according to claim 1, wherein a coating layer, in particular a metal carbide deposited on the matte coating, and / or
Alternatively, a plating method is characterized in that a coating layer of metal nitride is formed.
し被膜上に光沢クロム被覆層が電気鍍金法により形成さ
れることを特徴とする鍍金方法。3. The plating method according to claim 1, wherein a glossy chromium coating layer is formed on the matte coating by an electroplating method.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19893909811 DE3909811A1 (en) | 1989-03-24 | 1989-03-24 | Use of at least one organic sulphinic acid and/or at least one alkali metal salt of an organic sulphinic acid as an agent ... |
| DE3909811.7 | 1989-03-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0320492A JPH0320492A (en) | 1991-01-29 |
| JPH0660432B2 true JPH0660432B2 (en) | 1994-08-10 |
Family
ID=6377170
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2064452A Expired - Fee Related JPH0660432B2 (en) | 1989-03-24 | 1990-03-16 | Plating method for avoiding dark deposition when depositing a matte coating from a bright nickel bath or a bright nickel / cobalt alloy bath |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPH0660432B2 (en) |
| DE (1) | DE3909811A1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2776753B2 (en) * | 1994-11-24 | 1998-07-16 | 埼玉日本電気株式会社 | Plastic shielded housing |
| JP4811880B2 (en) * | 2006-01-06 | 2011-11-09 | エントン インコーポレイテッド | Electrolyte and process for depositing a matte metal layer |
| EP2143828B1 (en) * | 2008-07-08 | 2016-12-28 | Enthone, Inc. | Electrolyte and method for the deposition of a matt metal layer |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3839165A (en) | 1967-08-26 | 1974-10-01 | Henkel & Cie Gmbh | Nickel electroplating method |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1621085C3 (en) * | 1967-05-16 | 1980-02-14 | Henkel Kgaa, 4000 Duesseldorf | Acid galvanic bath for the deposition of shiny nickel deposits |
| US3804726A (en) * | 1973-04-23 | 1974-04-16 | M & T Chemicals Inc | Electroplating processes and compositions |
| DE2327881B2 (en) * | 1973-06-01 | 1978-06-22 | Langbein-Pfanhauser Werke Ag, 4040 Neuss | Process for the galvanic deposition of matt-glossy nickel or nickel / cobalt deposits |
| ZA762380B (en) * | 1975-05-16 | 1977-04-27 | M & T Chemicals Inc | Bright nickel-iron plating |
| ES451714A1 (en) * | 1975-09-22 | 1977-09-01 | M & T Chemicals Inc | Electroplating process and electroplating solution |
| US4450052A (en) * | 1982-07-28 | 1984-05-22 | M&T Chemicals Inc. | Zinc and nickel tolerant trivalent chromium plating baths |
| JPS5932554A (en) * | 1982-08-13 | 1984-02-22 | Akebono Brake Ind Co Ltd | Auto-stopper valve for car |
| DE3736171A1 (en) * | 1987-10-26 | 1989-05-03 | Collardin Gmbh Gerhard | Improved method for the deposition of satiny nickel deposits |
-
1989
- 1989-03-24 DE DE19893909811 patent/DE3909811A1/en active Granted
-
1990
- 1990-03-16 JP JP2064452A patent/JPH0660432B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3839165A (en) | 1967-08-26 | 1974-10-01 | Henkel & Cie Gmbh | Nickel electroplating method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0320492A (en) | 1991-01-29 |
| DE3909811A1 (en) | 1990-09-27 |
| DE3909811C2 (en) | 1991-05-08 |
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