JPH0664736B2 - Method for manufacturing magnetic thin film - Google Patents
Method for manufacturing magnetic thin filmInfo
- Publication number
- JPH0664736B2 JPH0664736B2 JP8377285A JP8377285A JPH0664736B2 JP H0664736 B2 JPH0664736 B2 JP H0664736B2 JP 8377285 A JP8377285 A JP 8377285A JP 8377285 A JP8377285 A JP 8377285A JP H0664736 B2 JPH0664736 B2 JP H0664736B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- hexagonal ferrite
- magnetic thin
- film
- single phase
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000010409 thin film Substances 0.000 title claims description 9
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 238000000034 method Methods 0.000 title description 13
- 229910000859 α-Fe Inorganic materials 0.000 claims description 26
- 239000010408 film Substances 0.000 claims description 23
- 230000005415 magnetization Effects 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 12
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 10
- 239000010936 titanium Substances 0.000 claims description 10
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 6
- 239000012495 reaction gas Substances 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 229910052786 argon Inorganic materials 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims 4
- -1 alcohol compound Chemical class 0.000 claims 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 2
- 229910052788 barium Inorganic materials 0.000 claims 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims 2
- 239000010941 cobalt Substances 0.000 claims 2
- 229910017052 cobalt Inorganic materials 0.000 claims 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 7
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 6
- 239000010952 cobalt-chrome Substances 0.000 description 6
- AJCDFVKYMIUXCR-UHFFFAOYSA-N oxobarium;oxo(oxoferriooxy)iron Chemical compound [Ba]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O.O=[Fe]O[Fe]=O AJCDFVKYMIUXCR-UHFFFAOYSA-N 0.000 description 6
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 6
- 239000004642 Polyimide Substances 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 239000012159 carrier gas Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- MBMKFKOVXPKXCV-UHFFFAOYSA-N CCO[Ti]OCC Chemical compound CCO[Ti]OCC MBMKFKOVXPKXCV-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- GYIWFHXWLCXGQO-UHFFFAOYSA-N barium(2+);ethanolate Chemical compound [Ba+2].CC[O-].CC[O-] GYIWFHXWLCXGQO-UHFFFAOYSA-N 0.000 description 2
- FRCRDSKTAZVJDU-UHFFFAOYSA-N cobalt(2+);ethanolate Chemical compound [Co+2].CC[O-].CC[O-] FRCRDSKTAZVJDU-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- MHKBQFNNFYZELC-UHFFFAOYSA-N ethanolate;iron(2+) Chemical compound [Fe+2].CC[O-].CC[O-] MHKBQFNNFYZELC-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- WAIPAZQMEIHHTJ-UHFFFAOYSA-N [Cr].[Co] Chemical group [Cr].[Co] WAIPAZQMEIHHTJ-UHFFFAOYSA-N 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は高密度の垂直磁気記録を可能とする磁性体薄膜
の製造方法に関するものである。TECHNICAL FIELD The present invention relates to a method for producing a magnetic thin film that enables high density perpendicular magnetic recording.
従来の技術 近年磁気記録は、高密度化,ディジタル化の方向へ進み
つつある。磁気記録の方式として従来は、磁気記録媒体
の面内に磁化の容易軸を持っているいわゆる面内磁化に
よる磁気記録方式が主であった。しかしながら本方式で
は記録密度を上げれば上げるほど磁気記録媒体内の磁化
方向が互いに反発し合うように並ぶため高密度化を計る
のが困難になってきている。そこで最近磁気記録の新し
い方式として磁気記録媒体の面内に対して垂直方向に磁
化容易軸を持っているいわゆる垂直磁化による磁気記録
方式が開発され〔例えばエス・イワサキとワイ・ナカヤ
マ;高密度記録のため磁気モードの分析,アイ・イー・
イー・イー,トランス,マガジン,MAG−13,5番,1272ペ
ージ,1977年(Ar analysis for the magnetization mod
e for high density magnetic recording. IEEE Trans.
Magn. MAG−13.No.5,p.1272(1977))〕記録密度が飛
躍的に増大することが可能となった。この垂直磁気記録
方式にもちいられている記録媒体としては、コバルト−
クロム(Co−Cr)合金膜が主としてスペッタ法〔例えば
エス・イワサキとケイ・オオウチ:垂直磁化異方性を持
つコバルト・クロム記録フィルム,アイ・イー・イー・
イー,トランス,マガジン,MAG−14,5,第849ページ,197
8年(K.Ouchi:Co−Cr recording film with perpendicular magnetic anisotr
opy, IEEE Trans.Magn.MAG−14,5,849(1978))〕,真
空蒸着法〔例えば杉田龍二;真空蒸着法によるCo−Cr垂
直異方性膜,信学技報,MR81−5(1981)〕等によって
開発されつつある。またCo−Cr以外にもバリウムフェラ
イト (BaO・6Fe2O3)がスパッタ法〔例えば星,松岡,直
江,山中;対向ターゲット式スパッタによるC軸配向Ba
−フェライト膜の構造と磁気特性,信学論(C),J66−
C,1,p.9−16(昭和58−01)〕により得られている 発明が解決しようとする問題点 これらの垂直磁気記録媒体において、Co−Cr合金膜は、
低温で作成することが可能であるが、垂直磁化の大きさ
の目安となる垂直磁気異方性がバリウムフェライトより
ちいさい。そのためめ完全な垂直磁化膜とはならずある
程度面内の磁化成分をものこすという問題がある。2. Description of the Related Art In recent years, magnetic recording is progressing toward higher density and digitization. Conventionally, a magnetic recording method based on so-called in-plane magnetization, which has an easy axis of magnetization in the plane of the magnetic recording medium, has been mainly used as a magnetic recording method. However, in this method, as the recording density is increased, the magnetization directions in the magnetic recording medium are arranged so as to repel each other, which makes it difficult to achieve high density. Therefore, as a new method of magnetic recording, a so-called perpendicular magnetic recording method having an easy axis of magnetization in the direction perpendicular to the in-plane of the magnetic recording medium has recently been developed [eg S Iwasaki and Wai Nakayama; high density recording. For magnetic mode analysis,
EE, Trance, Magazine, MAG-13, No. 5, 1272, 1977 (Ar analysis for the magnetization mod
e for high density magnetic recording.IEEE Trans.
Magn. MAG-13.No.5, p.1272 (1977))] It has become possible to dramatically increase the recording density. The recording medium used in this perpendicular magnetic recording system is cobalt-
Chromium (Co-Cr) alloy film is mainly used for the spatter method [eg S. Iwasaki and K. Ouchi: Cobalt-chrome recording film with perpendicular magnetization anisotropy, I.E.
E, Transformer, Magazine, MAG-14, 849, 197
8 years (K.Ouchi: Co-Cr recording film with perpendicular magnetic anisotr
opy, IEEE Trans.Magn.MAG-14,5,849 (1978)], vacuum deposition method [eg Ryuji Sugita; Co-Cr vertical anisotropic film by vacuum deposition method, IEICE Technical Report, MR81-5 (1981)] ] Etc. are being developed. The barium ferrite other than Co-Cr (BaO · 6Fe 2 O 3) is a sputtering method [for example star, Matsuoka, Naoe, Yamanaka; C axis by facing target sputtering orientation Ba
-Structure and magnetic properties of ferrite film, Theory of theory (C), J66-
C, 1, p. 9-16 (Showa 58-01)] Problems to be Solved by the Invention In these perpendicular magnetic recording media, the Co--Cr alloy film is
It can be prepared at low temperature, but its perpendicular magnetic anisotropy, which is a measure of the magnitude of perpendicular magnetization, is smaller than barium ferrite. Therefore, there is a problem that a perfect perpendicular magnetization film is not formed, and the in-plane magnetization component is hampered to some extent.
また一方バリウムフェライトは、ほぼ完全なC軸配向の
膜が得られるため、ほぼ完全な垂直磁化膜が作成でき
る。しかしながらバリウムフェライトやヘキサゴナルフ
ェライト膜を作成するのには500℃以上の基板温度が必
要であるため、ポリイミドやアルミ上にBaフェライトや
ヘキサゴナルフェライトを作成することが困難である。
又バリウムフェライト単独では、垂直磁気異方性が大き
く、磁気記録媒体としての保磁力(抗磁力)が2000〜30
00エールステッド(Oe)と高くなるため例えばフェライ
トヘッド(Mn−Zn フェライトヘッド)では、飽和磁束
密度(Bs)がちいさいため媒体を十分に磁化することは
困難である。〔例えば、スパッタ合金膜ヘッドによる高
抗磁力媒体への記録,信学技報MR77−2(1977)p.11〕 問題点を解決するための手段 本発明は、前記問題点を解決するため、従来のスパッタ
真空蒸着法ではなく、プラズマ中に反応ガスを流し、プ
ラズマの活性さを利用した、プラズマCVD法によって350
℃以下の低温でバリウムフェライト単相より保磁力(抗
磁力)のちいさいヘキサゴナルフェライト単一相から成
る垂直磁化膜を製造する方法を提供する。On the other hand, with barium ferrite, a film with almost perfect C-axis orientation can be obtained, so that an almost perfect perpendicular magnetization film can be formed. However, it is difficult to form Ba ferrite or hexagonal ferrite on polyimide or aluminum because a substrate temperature of 500 ° C. or higher is required to form barium ferrite or hexagonal ferrite film.
Also, barium ferrite alone has a large perpendicular magnetic anisotropy and a coercive force (coercive force) of 2000 to 30 as a magnetic recording medium.
Since it becomes as high as 00 Oersted (Oe), for example, in a ferrite head (Mn-Zn ferrite head), it is difficult to sufficiently magnetize the medium because the saturation magnetic flux density (Bs) is small. [For example, recording on a high coercive force medium by a sputtered alloy film head, IEICE Technical Report MR77-2 (1977) p. 11] Means for Solving Problems The present invention is directed to solving the above problems. Instead of the conventional sputter vacuum deposition method, a plasma CVD method is used, in which the reaction gas is flowed in the plasma and the plasma activity is utilized.
Provided is a method for producing a perpendicular magnetization film composed of a hexagonal ferrite single phase having a coercive force (coercive force) smaller than that of a barium ferrite single phase at a low temperature of ℃ or less.
作 用 発明者らは、プラズマCVD法を用いることによって350℃
以下の低温で保磁力のちいさいヘキサゴナルフェライト
が得られることを見いだした。すなわちFe,Ba,Co,Tiを
含有する金属アルコオキサイド例えばFe(O・C
2H5)3(ジエトキシ鉄)Ba(O・C2H5)2(ジ
エトキシバリウム)Co(O・C2H5)3(ジエトキシ
コバルト)Ti(O・C2H5)4,(ジエトキシチタ
ン)をそれぞれエチルアルコール中に溶解させ、アルゴ
ンをキャリアガスとし、酸素を反応ガスとして、高周波
プラズマ(周波数13.56MHz)中にこれらのガスを導入し
て、350℃以下の基板上で分解析出させることによりヘ
キサゴナルフェライトを生成するものである。Working inventors have found that by using the plasma CVD method
It has been found that hexagonal ferrite having a small coercive force can be obtained at the following low temperatures. That is, a metal alkoxide containing Fe, Ba, Co, Ti, such as Fe (O.C.
2 H 5) 3 (diethoxy iron) Ba (O · C 2 H 5) 2 ( diethoxy barium) Co (O · C 2 H 5) 3 ( diethoxy cobalt) Ti (O · C 2 H 5) 4, (Diethoxytitanium) is dissolved in ethyl alcohol, argon is used as a carrier gas, oxygen is used as a reaction gas, and these gases are introduced into high-frequency plasma (frequency 13.56 MHz). Hexagonal ferrite is produced by decomposition and precipitation.
このように低温でヘキサゴナルフェライトの析出が可能
となるのは、プラズマ中においては、化学反応を低温で
引きおこす活性なラジカルやイオン等の化学種が多く存
在し、通のCVD(熱による分解析出をおこなうCVD)では
エネルギー的におこりえない反応がプラズマ中では可能
であるためである。〔例えば、薄膜ハンドブック225ペ
ージ,オーム社,昭和58年12月10日〕 また一般にプラズマCVD法は通常の熱CVD法にくらべて、
低温で酸化物,炭化物,窒化物等の高融点物質が合成で
きるばかりでなく、熱分解析出反応を伴うために低温に
おいても高純度でしかも結晶性の良い膜が得られる。そ
のためヘキサゴナルフェライトのような結晶の配向性の
良いことが必要でしかもそれを低温で合成するのには最
適の方法であると考えられる。In this way, it is possible to deposit hexagonal ferrite at low temperatures because in plasma there are many chemical species such as active radicals and ions that cause chemical reactions at low temperatures, and the usual CVD (decomposition and deposition by heat) This is because a reaction that cannot occur energetically in the plasma CVD is possible in the plasma. [For example, 225 pages of thin film handbook, Ohmsha, Dec. 10, 1983] In addition, plasma CVD method is generally compared with ordinary thermal CVD method.
Not only can high-melting substances such as oxides, carbides, and nitrides be synthesized at low temperatures, but a high-purity film with good crystallinity can be obtained even at low temperatures because of the thermal decomposition and precipitation reaction. Therefore, it is necessary to have good crystal orientation such as hexagonal ferrite, and it is considered to be the optimum method for synthesizing it at low temperature.
実施例 以下、本発明の一実施例について、図面にもとづいて説
明する。図は本発明の一実施例におけるプラズマCVD装
置の概略図を示すものである。第1図において、11は反
応チャンバー、12は高周波電極、13は高周波電源、14は
基板加熱ホルダー、15は基板、16はFe(OR)3のバブラ
ー、17はBa(OR)2のバブラー、18はCo(OR)3のバブ
ラー、19はTi(OR)4のバブラー、20はキャリアガス
(Ar)のボンベ、21は反応ガス(O2)のボンベ、22は
ロータリーポンプである。Embodiment One embodiment of the present invention will be described below with reference to the drawings. The figure shows a schematic view of a plasma CVD apparatus in an embodiment of the present invention. In FIG. 1, 11 is a reaction chamber, 12 is a high frequency electrode, 13 is a high frequency power supply, 14 is a substrate heating holder, 15 is a substrate, 16 is a bubbler of Fe (OR) 3 , 17 is a bubbler of Ba (OR) 2 , 18 is a Co (OR) 3 bubbler, 19 is a Ti (OR) 4 bubbler, 20 is a carrier gas (Ar) cylinder, 21 is a reaction gas (O 2 ) cylinder, and 22 is a rotary pump.
まずジエトキシ鉄〔Fe(O・C2H5)3〕,ジエトキ
シバリウム〔Ba(O・C2H5)2〕,ジエトキシコバ
ルト〔Co(O・C2H5)3〕,ジエトキシチタン〔Ti
(O・C2H5)4〕の30%アルコール(C2H5OH)
溶液の入ったバブラー16,17,18,19にバブル用のアルゴ
ンガス20をそれぞれ200cc/分,50cc/分,10cc/分,10cc
/分の流量で流し、これらの蒸気をロータリーポンプ22
によって減圧状態になった反応チャンバー11内の345℃
に加熱されたポリイド基板上に導入する。次に同じく、
反応ガスである酸素21を200cc/分の流量で同じくポリ
イミド基板上に流す。この時のガス圧は、10Torrであっ
た。次いで高周波電力(13.56MHz)を500W(5W/cm2)
で60分間印加し、反応させた。First diethoxy iron [Fe (O · C 2 H 5 ) 3 ], diethoxy barium [Ba (O · C 2 H 5 ) 2 ], diethoxy cobalt [Co (O · C 2 H 5 ) 3 ], diethoxy Titanium (Ti
(O · C 2 H 5 ) 4 ] 30% alcohol (C 2 H 5 OH)
Argon gas 20 for bubbles is added to the bubblers 16, 17, 18, and 19 containing the solution, respectively 200 cc / min, 50 cc / min, 10 cc / min, 10 cc
The flow rate of these vapors is increased by the rotary pump 22
345 ℃ in the reaction chamber 11 which was depressurized by
Introduced onto a heated polyidal substrate. Then again,
Oxygen 21 which is a reaction gas is flown on the polyimide substrate at a flow rate of 200 cc / min. The gas pressure at this time was 10 Torr. Next, high frequency power (13.56MHz) 500W (5W / cm 2 )
Was applied for 60 minutes to react.
次にこの時ポリイミド基板上に析出したヘキサゴナルフ
ェライトの膜厚は、約2.5μmであった。次にこの膜に
ついてX線解析およびVSM(振動試料型磁力計)による
膜の磁気的特性を測定した。結果は第1表,試料番号1
に示す。Next, the film thickness of the hexagonal ferrite deposited on the polyimide substrate at this time was about 2.5 μm. Next, the magnetic characteristics of this film were measured by X-ray analysis and VSM (vibrating sample magnetometer). The results are shown in Table 1, Sample No. 1
Shown in.
以下同様にして、基板温度、Ba(OR)2,Fe(OR)3,Co
(OR)3,Ti(OR)4のバブラー量(Arの流量),反応
チャンバー内の圧力,高周波電力等を変化させた時の膜
厚,X線解析,VSMの結果を第1表試料番号2〜9に示す。
また試料番号10〜16は本願発明外の比較例である。ここ
でX線解析はヘキサゴナルフェライトの単相でC軸配向
が得られたかどうかを調べた。またVSMの結果からヘキ
サゴナルフェライトの飽和磁化とヒステリシス曲線(B
−Hカーブ)を求めヘキサゴナルフェライトの垂直方向
(薄膜の膜面に対して垂直の方向)の残留磁化および水
平方向の残留磁化および保磁力を求めた(垂直方向の残
留磁化が水平方向の残留磁化にくらべて大きければ大き
いほどよりすぐれた垂直磁化膜である。) なお本発明において、基板温度を350℃以下と限定した
のは、350℃以上になると基板材料として使用されるポ
リイミドやAl等において熱的変形や劣化がおこり良質の
ヘキサゴナルフェライト膜が得られないためである。Similarly, the substrate temperature, Ba (OR) 2 , Fe (OR) 3 , Co
(OR) 3 Ti (OR) 4 bubbler amount (Ar flow rate), pressure in reaction chamber, film thickness when changing high frequency power, X-ray analysis, VSM results 2-9.
Further, sample numbers 10 to 16 are comparative examples other than the present invention. Here, X-ray analysis examined whether or not C-axis orientation was obtained in a single phase of hexagonal ferrite. Also, from the results of VSM, the saturation magnetization and hysteresis curve of hexagonal ferrite (B
-H curve) was obtained to obtain remanent magnetization in the vertical direction (direction perpendicular to the film surface of the thin film) of hexagonal ferrite, and remanent magnetization in the horizontal direction and coercive force (remanent magnetization in the vertical direction was remanent in the horizontal direction). The larger the size, the better the perpendicular magnetization film.) In the present invention, the substrate temperature is limited to 350 ° C. or lower because thermal deformation or deterioration occurs in polyimide or Al used as the substrate material at 350 ° C. or higher, and a good quality hexagonal ferrite film cannot be obtained. Is.
またプラズマ電力を0.5W〜10Wと限定したのは0.5W/cm
2以下のプラズマ電力では、十分に気相中で単相のヘキ
サゴナルフェライトが合成できないためであり、10W/c
m2以上では電力が強すぎて気相中で出来たヘキサゴナ
ルフェライトが再分解されヘキサゴナルフェライト以外
の相(Fe3O4等)が析出するためである。Also, the plasma power was limited to 0.5W to 10W by 0.5W / cm
This is because single-phase hexagonal ferrite cannot be synthesized sufficiently in the gas phase with a plasma power of 2 or less.
This is because at m 2 or more, the electric power is too strong and the hexagonal ferrite formed in the gas phase is redissolved and the phases other than hexagonal ferrite (Fe 3 O 4 etc.) precipitate.
またプラズマを維持する時の圧力を0.1〜10Torrに限定
したのは0.1Torr以下では、反応生成物(ヘキサゴナル
フェライト)の製膜速度が遅く、実用上問題があるため
であり、10Torr以上では基板上に膜として成生せず、空
間でパウダー状物質となるためである。Moreover, the reason why the pressure for maintaining the plasma is limited to 0.1 to 10 Torr is that the film formation speed of the reaction product (hexagonal ferrite) is slow at 0.1 Torr or less and there is a problem in practical use. This is because it does not grow as a film and becomes a powdery substance in space.
発明の効果 以上述べてきたように、本発明によれば、プラズマの活
性さを巧みに利用して、350℃以下の比較的低温で垂直
方向の残留磁化が大きく垂直方向の保磁力の比較的ちい
さいヘキサゴナルフェライト膜が作成できる方法であっ
て、高密度の磁気記録を達成するのにきわめて有益な発
明である。EFFECTS OF THE INVENTION As described above, according to the present invention, by making good use of the activity of plasma, the remanent magnetization in the vertical direction is large and the coercive force in the vertical direction is relatively high at a relatively low temperature of 350 ° C. or less. It is a method capable of forming a small hexagonal ferrite film, and is a very useful invention for achieving high density magnetic recording.
図は本発明の一実施例におけるプラズマCVD装置の概略
を示す図である。 11……反応チャンバー、12……高周波電極、13……高周
波電源、14……基板加熱ホルダー、15……基板、16……
Fe(OR)3のバブラー、17……Ba(OR)2のバブラー、
18……Co(OR)3のバブラー、19……Ti(OR)4のバブ
ラー、20……Arキャリアガスボンベ、21……反応ガス
(O2)ボンベ、22……ロータリーポンプ。FIG. 1 is a diagram showing an outline of a plasma CVD apparatus in one embodiment of the present invention. 11 …… Reaction chamber, 12 …… High frequency electrode, 13 …… High frequency power supply, 14 …… Substrate heating holder, 15 …… Substrate, 16 ……
Fe (OR) 3 bubbler, 17 …… Ba (OR) 2 bubbler,
18 …… Co (OR) 3 bubbler, 19 …… Ti (OR) 4 bubbler, 20 …… Ar carrier gas cylinder, 21 …… Reaction gas (O 2 ) cylinder, 22 …… Rotary pump.
Claims (5)
o)およびチタン(Ti)を含有する金属アルコオキサイ
ドのアルコール溶液と、これらのアルコール溶液から、
金属アルコオキサイドの蒸気を輸送するガスとしてのア
ルゴン(Ar),および反応ガスとしての酸素(O2)を
プラズマ中で分解させ、加熱された基板上にヘキサゴナ
ルフェライト単一相から成る垂直磁化膜を析出させるこ
とを特徴とする磁性体薄膜の製造方法。1. Iron (Fe), barium (Ba), cobalt (C)
o) and titanium (Ti) -containing metal alcohol oxide alcohol solutions, and from these alcohol solutions,
Argon (Ar) as a gas for transporting the vapor of metal alcooxide and oxygen (O 2 ) as a reaction gas are decomposed in plasma to form a perpendicular magnetization film composed of a hexagonal ferrite single phase on a heated substrate. A method for producing a magnetic thin film, which comprises depositing.
て、化学式がFe(OR)3(ただしRはアルキル基)で示
されることを特徴とする特許請求の範囲第1項記載のヘ
キサゴナルフェライト単一相から成る磁性体薄膜の製造
方法。2. The hexagonal ferrite single phase according to claim 1, wherein the chemical formula of the iron-containing alcohol compound is represented by Fe (OR) 3 (where R is an alkyl group). Of manufacturing a magnetic thin film comprising.
として、化学式がBa(OR)2(ただしRはアルキル基)
で示されることを特徴とする特許請求の範囲第1項記載
のヘキサゴナルフェライト単一相から成る磁性体薄膜の
製造方法。3. A barium-containing alcohol compound having a chemical formula of Ba (OR) 2 (wherein R is an alkyl group)
The method for producing a magnetic thin film comprising a single phase of hexagonal ferrite according to claim 1, characterized in that:
物として化学式がCo(OR)3(ただしRはアルキル基)
で示されることを特徴とする特許請求の範囲第1項記載
のヘキサゴナルフェライト単一相から成る磁性体薄膜の
製造方法。4. An alcooxide compound containing cobalt has a chemical formula of Co (OR) 3 (where R is an alkyl group).
The method for producing a magnetic thin film comprising a single phase of hexagonal ferrite according to claim 1, characterized in that:
として、化学式がTi(OR)4(ただしRはアルキル基)
で示されることを特徴とする特許請求の範囲第1項記載
のヘキサゴナルフェライト単一相から成る磁性体薄膜の
製造方法。5. The titanium-containing alcohol compound has a chemical formula of Ti (OR) 4 (where R is an alkyl group).
The method for producing a magnetic thin film comprising a single phase of hexagonal ferrite according to claim 1, characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8377285A JPH0664736B2 (en) | 1985-04-19 | 1985-04-19 | Method for manufacturing magnetic thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8377285A JPH0664736B2 (en) | 1985-04-19 | 1985-04-19 | Method for manufacturing magnetic thin film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61242330A JPS61242330A (en) | 1986-10-28 |
| JPH0664736B2 true JPH0664736B2 (en) | 1994-08-22 |
Family
ID=13811892
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8377285A Expired - Fee Related JPH0664736B2 (en) | 1985-04-19 | 1985-04-19 | Method for manufacturing magnetic thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0664736B2 (en) |
-
1985
- 1985-04-19 JP JP8377285A patent/JPH0664736B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61242330A (en) | 1986-10-28 |
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