JPH06668B2 - Method for producing homogeneous sintered body - Google Patents
Method for producing homogeneous sintered bodyInfo
- Publication number
- JPH06668B2 JPH06668B2 JP63325573A JP32557388A JPH06668B2 JP H06668 B2 JPH06668 B2 JP H06668B2 JP 63325573 A JP63325573 A JP 63325573A JP 32557388 A JP32557388 A JP 32557388A JP H06668 B2 JPH06668 B2 JP H06668B2
- Authority
- JP
- Japan
- Prior art keywords
- box
- silicon nitride
- fired
- sintered body
- sintering aid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 29
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 29
- 238000005245 sintering Methods 0.000 claims description 16
- 238000010304 firing Methods 0.000 claims description 14
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 7
- 239000000843 powder Substances 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 12
- 239000001301 oxygen Substances 0.000 description 12
- 229910052760 oxygen Inorganic materials 0.000 description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 9
- 229910052799 carbon Inorganic materials 0.000 description 9
- 239000000654 additive Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 6
- 229910010271 silicon carbide Inorganic materials 0.000 description 6
- 238000000354 decomposition reaction Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- UMVBXBACMIOFDO-UHFFFAOYSA-N [N].[Si] Chemical compound [N].[Si] UMVBXBACMIOFDO-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000009694 cold isostatic pressing Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- UZLYXNNZYFBAQO-UHFFFAOYSA-N oxygen(2-);ytterbium(3+) Chemical compound [O-2].[O-2].[O-2].[Yb+3].[Yb+3] UZLYXNNZYFBAQO-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229940075624 ytterbium oxide Drugs 0.000 description 1
- 229910003454 ytterbium oxide Inorganic materials 0.000 description 1
Landscapes
- Ceramic Products (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は、均質で強度等が高い窒化珪素からなる均質の
焼結体の製造方法に関する。TECHNICAL FIELD The present invention relates to a method for producing a homogeneous sintered body made of silicon nitride which is homogeneous and has high strength and the like.
[従来の技術] 窒化珪素(Si3N4)焼結体は、耐熱性、耐熱衝撃
性、耐食性、高温強度に優れているため、ガスタービン
エンジン、ディーゼルエンジン等の高温構造材料、耐摩
耗材料等に利用されている。この窒化珪素焼結体は、焼
成時に生じる窒化珪素の分解や酸素、焼結助剤の揮散に
より、焼結体の内部と表面で焼結体特性に大きな差が生
じ易く、この焼結体特性の不均質化を抑制するため、匣
(さや)中での焼成が行なわれている。[Prior Art] Since a silicon nitride (Si 3 N 4 ) sintered body is excellent in heat resistance, thermal shock resistance, corrosion resistance, and high-temperature strength, it is a high-temperature structural material for a gas turbine engine, a diesel engine, or a wear-resistant material. It is used for etc. This silicon nitride sintered body is liable to cause a large difference in sintered body characteristics between the inside and the surface of the sintered body due to decomposition of silicon nitride generated during firing and volatilization of oxygen and a sintering aid. In order to suppress the inhomogeneity of the, the firing is performed in a pod.
従来、このような窒化珪素焼成用の匣としては、炭素製
の匣、化学蒸着炭化珪素で被覆した炭素製匣(特開昭6
0−210575号公報)、窒化珪素の内匣と耐火物の
外匣からなる匣(特公昭49−40123号公報)等が
知られている。Conventionally, as a box for firing such a silicon nitride, a box made of carbon or a box made of carbon coated with chemical vapor deposition silicon carbide (Japanese Patent Laid-Open No. 6-58242).
No. 0-210575), a box comprising an inner case of silicon nitride and an outer case of a refractory (Japanese Patent Publication No. 49-40123) and the like.
[発明が解決しようとする課題] しかしながら、炭素製の匣にあっては、窒素珪素焼成面
における蒸発が大で、表面にSiCが生成し易く、さら
に酸素、焼結助剤の揮散が抑えられない。[Problems to be Solved by the Invention] However, in a carbon box, evaporation on the surface of nitrogen silicon is large, SiC is easily generated on the surface, and further, volatilization of oxygen and a sintering additive is suppressed. Absent.
また、化学蒸着炭化珪素で被覆した炭素製匣において
は、窒化珪素表面での蒸発によるSiC生成は抑えられ
るが、酸素、焼結助剤の揮散が抑えられず、さらに炭素
と炭化珪素両層間で剥離し易く、匣の耐久性が小さい。Further, in a carbon box covered with chemical vapor deposition silicon carbide, SiC generation due to evaporation on the surface of silicon nitride is suppressed, but volatilization of oxygen and a sintering aid is not suppressed, and further, between carbon and silicon carbide layers. Easy to peel off, and the durability of the box is small.
一方、窒化珪素の内匣と耐火物の外匣からなる匣にあっ
ては、窒化珪素表面での蒸発によりSiC生成及び酸素
の揮散は抑えられるが、焼結助剤の揮散が抑えられな
い。On the other hand, in the case of the box made of the inner case of silicon nitride and the outer case of the refractory, evaporation of the silicon nitride surface suppresses generation of SiC and volatilization of oxygen, but does not suppress volatilization of the sintering aid.
以上のとおり、従来の匣にあっては、焼成時に生じる窒
化珪素の分解及び酸素、焼結助剤の揮散を同時に抑えら
れないという問題があり、これらの匣を用いて得られた
窒化珪素焼結体は、表面層の変質、変色が生じ、十分な
特性のものが得られない。また、特に焼結助剤としてY
2O3あるいはYb2O3などの高融点添加剤を用いた
窒化珪素焼結体は高温焼成で製造されるため、さらに窒
化珪素の分解や酸素、焼結助剤の揮散が生じ易いという
問題がある。As described above, the conventional boxes have a problem that the decomposition of silicon nitride and the volatilization of oxygen and the sintering aid that occur during firing cannot be suppressed at the same time, and the silicon nitride firing obtained using these boxes As for the bound body, the surface layer is deteriorated and discolored, so that the one having sufficient characteristics cannot be obtained. In addition, especially as a sintering aid Y
Since a silicon nitride sintered body using a high melting point additive such as 2 O 3 or Yb 2 O 3 is manufactured by high temperature firing, there is a problem that decomposition of silicon nitride and volatilization of oxygen and a sintering aid are more likely to occur. There is.
[課題を解決するための手段] 従って、本発明は上記従来の方法における問題を解決し
た、焼結体の表面層の変質、変色が生ぜず、十分な強度
等の特性を有する窒化珪素からなる均質な焼結体の製造
方法を提供することを目的とする。[Means for Solving the Problems] Accordingly, the present invention is made of silicon nitride which has solved the problems in the above-mentioned conventional methods and has sufficient strength and the like without causing alteration or discoloration of the surface layer of the sintered body. It is an object to provide a method for producing a homogeneous sintered body.
この目的は、本発明によれば、窒化珪素粉末と焼結助剤
とからなる被焼成体を、該被焼成体と同一成分より構成
される窒化珪素と焼結助剤とからなる匣、あるいは該被
焼成体と同一成分より構成される窒化珪素と焼結助剤と
からなる被膜を内面に形成した匣の中に設置して焼成す
ることを特徴とする均質焼結体の製造方法、によって達
成される。According to the present invention, an object of the present invention is to provide a body to be fired composed of silicon nitride powder and a sintering aid, a jar containing silicon nitride composed of the same components as the body to be fired and a sintering aid, or According to a method for producing a homogeneous sintered body, which is characterized in that a film made of silicon nitride composed of the same components as that of the object to be fired and a sintering aid is placed in a box having an inner surface and fired. To be achieved.
[作用] 本発明における均質焼結体の製造方法は、被焼成体と同
一成分とからなる匣あるいは被焼成体と同一成分からな
る被膜を内面に形成した匣の中に窒化珪素成形体を設置
し、所定の条件にて被焼成体を焼成するものである。な
お、匣あるいは匣の内面に形成する被膜は被焼成体と同
一成分であればよく、各成分の含有率は問わない。[Operation] In the method for producing a homogeneous sintered body according to the present invention, the silicon nitride molded body is installed in the box in which the box made of the same component as the body to be fired or the film made of the same component as the body to be fired is formed on the inner surface. Then, the body to be fired is fired under predetermined conditions. The box or the coating film formed on the inner surface of the box may be the same component as that of the body to be fired, and the content of each component is not limited.
すなわち、本発明の場合には、匣本体あるいは匣の内面
が被焼成体と同一成分であるため、Si3N4の分解が
起こりにくく、また匣材から酸素(SiO)や添加剤が
揮散するため匣内の酸素や添加剤の分圧が高くなり、被
焼成体から酸素や添加剤の揮散が抑制され、均質で高強
度の窒化珪素焼結体を得ることができる。That is, in the case of the present invention, since the main body of the box or the inner surface of the box has the same composition as that of the body to be fired, decomposition of Si 3 N 4 does not easily occur, and oxygen (SiO) and additives volatilize from the box material. Therefore, the partial pressure of oxygen and additives in the box becomes high, the volatilization of oxygen and additives from the body to be fired is suppressed, and a homogeneous and high-strength silicon nitride sintered body can be obtained.
匣の内面に被焼成体と同一成分の被膜を形成する場合の
匣の材質としては特にその種類は限定されないが、炭素
製であることが好ましい。炭素製品は安価であり、高温
変形がないという特徴がある。There is no particular limitation on the kind of the material for the case in the case of forming a coating film of the same component as that of the body to be fired on the inner surface of the case, but carbon is preferable. Carbon products are inexpensive and do not undergo high temperature deformation.
また、匣の内面への被膜の形成方法としては、被焼成体
と同一成分の粉末を内面に塗布した匣内に被焼成体と同
一成分からなる物質を入れて焼込むことにより匣材内面
に強固に密着した緻密な被膜を形成できる。なお、被膜
の厚さは通常0.1mm以上であれば匣材成分の匣内への
拡散を抑えられる。Further, as a method of forming a coating film on the inner surface of the box, by applying a substance consisting of the same component as the object to be baked into the box in which powder of the same component as the object to be baked is applied on the inner surface, the inner surface of the box material is baked. A dense coating that firmly adheres can be formed. If the thickness of the coating is usually 0.1 mm or more, the diffusion of the ingredients of the box material into the box can be suppressed.
次に、焼成に際しては、ほぼ常圧下、通常、ゲージ圧で
0〜0.5kg/cm2の範囲にて行なう。Next, the firing is carried out under almost normal pressure, usually in the range of 0 to 0.5 kg / cm 2 as a gauge pressure.
焼成温度条件としては、通常1500〜1800℃の範囲であ
る。焼成温度が1500℃より低い場合には、窒化珪素は緻
密化し難く、一方、1800℃を超えると、窒化珪素の分
解、蒸発を生じ易くなり、十分な特性のものが得られ難
くなる。The firing temperature condition is usually in the range of 1500 to 1800 ° C. If the firing temperature is lower than 1500 ° C., the silicon nitride is difficult to be densified, while if it exceeds 1800 ° C., decomposition and evaporation of the silicon nitride are likely to occur, and it becomes difficult to obtain the one having sufficient characteristics.
なお、本発明においては、ゲージ圧で10kg/cm2までの
加圧下で行なってもよく、その場合、焼成温度は1500〜
2000℃が好ましい。In the present invention, it may be carried out under a pressure of up to 10 kg / cm 2 with a gauge pressure, and in that case, the firing temperature is 1500 to
2000 ° C is preferred.
また、本発明に用いる匣は、その肉厚が5〜30mmであ
ることが好ましい。肉厚が5mmより小さい場合には、荷
重による匣の変形が生じ易く、又、30mmを超えると熱
伝導率が悪く、又、容積を大きく取れず、さらに重量が
重く作業性が悪くなる可能性がある。The box used in the present invention preferably has a wall thickness of 5 to 30 mm. If the wall thickness is less than 5 mm, the box will be easily deformed by the load, and if it exceeds 30 mm, the thermal conductivity will be poor, and the volume will not be large, and the weight will be heavy and the workability will be poor. There is.
なお、本発明において用いる被焼成体は、窒化珪素粉末
と焼結助剤からなる成形体である。The body to be fired used in the present invention is a molded body composed of silicon nitride powder and a sintering aid.
[実施例] 以下、本発明を実施例に基き、さらに詳細に説明する
が、本発明はこれらの実施例に限られるものではない。[Examples] Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited to these examples.
(実施例1) 平均粒子径0.7μmのα型窒化珪素粉末92重量%
(以下、%は全て重量%を示す。)に、酸化イットリウ
ム(Y2O3)3%、酸化イッテルビウム(Yb
2O3)5%を添加した混合粉末100重量部に対し、
水150重量部を添加し、粉砕機により7時間混合粉砕
を行なった。Example 1 92% by weight of α-type silicon nitride powder having an average particle diameter of 0.7 μm
(Hereinafter, all% represent% by weight.), Yttrium oxide (Y 2 O 3 ) 3%, ytterbium oxide (Yb)
2 O 3 ) 5% was added to 100 parts by weight of the mixed powder,
150 parts by weight of water was added, and mixed and pulverized by a pulverizer for 7 hours.
この粉砕物に、ポリビニルアルコール1重量部を添加
し、噴霧乾燥を行なった。得られた乾燥物を金型を用
い、35mm(φ)×20mmの円板に成形後、2500kg
/cm2の圧力で冷間静水圧プレスを行ない、成形体(被焼
成体)を作製した。To this pulverized product, 1 part by weight of polyvinyl alcohol was added and spray-dried. 2500 kg after molding the obtained dried product into a 35 mm (φ) × 20 mm disc using a mold
Cold isostatic pressing was performed at a pressure of / cm 2 to prepare a molded body (body to be fired).
この成形体を、焼成用の匣として外径100mm、内径8
mm、高さ80mmの円筒及び外径100mm、厚さ10mmの
底板と蓋からなり、表1に示すNo.1〜5の各匣の中に
設置し、常圧の窒素雰囲気中において1750℃で1.
5時間焼成を行なった。This molded body is used as a box for firing and has an outer diameter of 100 mm and an inner diameter of 8
mm, height 80 mm cylinder, outer diameter 100 mm, thickness 10 mm bottom plate and lid, installed in each box No. 1-5 shown in Table 1, at 1750 ° C in a nitrogen atmosphere at atmospheric pressure. 1.
Firing was performed for 5 hours.
尚、表1に示すNo.2の匣は、被焼成体と同一成分の粉
末を内面に塗布したカーボン匣内に被焼成体と同一成分
からなる物質を入れて数回焼込み、被焼成体と同一成分
の被膜をカーボン匣内面に形成することにより作製し
た。In addition, the No. 2 box shown in Table 1 is an object to be fired by putting a substance having the same component as the object to be fired into a carbon box whose inner surface is coated with powder having the same components as the object to be fired It was prepared by forming a coating film of the same component as that on the inner surface of the carbon box.
得られた焼結体について、その表面部分および内部部分
について、酸素量(Sio2)、Y2O3及びYb2O
3(焼結助剤)の含有量、および嵩密度を測定し、その
比を求めた。結果を表1に示す。Regarding the obtained sintered body, the amount of oxygen (Sio 2 ), Y 2 O 3 and Yb 2 O was measured for the surface portion and the inner portion.
The content of 3 (sintering aid) and the bulk density were measured, and the ratio was determined. The results are shown in Table 1.
表1から分かるように、本発明の方法に従って焼成した
場合には、焼結体の表面部分と内部部分との酸素量、添
加剤量、嵩密度はほぼ同等であるが、比較例による焼成
の場合には、添加剤量、嵩密度が著しく小さくなってい
る。すなわち、本発明の方法に従って焼成した場合に
は、窒化珪素表面からの酸素、添加剤等の揮散が少な
く、均質な焼結体が得られる。As can be seen from Table 1, when fired according to the method of the present invention, the amount of oxygen, the amount of additives, and the bulk density of the surface portion and the inner portion of the sintered body are almost the same, In this case, the amount of additive and the bulk density are extremely small. That is, when fired according to the method of the present invention, a homogeneous sintered body can be obtained with less volatilization of oxygen, additives and the like from the surface of silicon nitride.
[発明の効果] 以上説明したように、本発明の均質焼結体の製造方法に
よれば、窒化珪素成形体を匣本体あるいは内面を被焼成
体と同一成分で形成した匣内に設置して焼成することに
より、均質で、特性に優れた窒化珪素からなる焼結体を
容易に得ることができる。さらに、本発明方法は、ベー
ン、ターボチャージャーロータ等の複雑形状品、特に、
加工されず焼成面のまま使用される形状品の焼結法とし
てきわめて有用である。 [Effects of the Invention] As described above, according to the method for producing a homogeneous sintered body of the present invention, the silicon nitride compact is installed in the box body or in the box whose inner surface is made of the same component as the material to be fired. By firing, it is possible to easily obtain a homogeneous sintered body made of silicon nitride having excellent characteristics. Further, the method of the present invention is a complex shape product such as a vane or a turbocharger rotor,
It is extremely useful as a sintering method for shaped articles that are used as they are without being processed.
Claims (1)
を、該被焼成体と同一成分より構成される窒化珪素と焼
結助剤とからなる匣、あるいは該被焼成体と同一成分よ
り構成される窒化珪素と焼結助剤とからなる被膜を内面
に形成した匣の中に設置して焼成することを特徴とする
均質焼結体の製造方法。1. A body to be fired composed of silicon nitride powder and a sintering aid is a box made of silicon nitride and a sintering aid composed of the same components as the body to be fired, or the same as the body to be fired. A method for producing a homogenous sintered body, which comprises placing a coating film comprising silicon nitride composed of the components and a sintering aid in a box formed on the inner surface and firing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63325573A JPH06668B2 (en) | 1988-12-23 | 1988-12-23 | Method for producing homogeneous sintered body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63325573A JPH06668B2 (en) | 1988-12-23 | 1988-12-23 | Method for producing homogeneous sintered body |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02172870A JPH02172870A (en) | 1990-07-04 |
| JPH06668B2 true JPH06668B2 (en) | 1994-01-05 |
Family
ID=18178396
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63325573A Expired - Fee Related JPH06668B2 (en) | 1988-12-23 | 1988-12-23 | Method for producing homogeneous sintered body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06668B2 (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55104974A (en) * | 1979-01-30 | 1980-08-11 | Asahi Glass Co Ltd | Manufacture of silicon nitride sintered body |
| JPS5838387B2 (en) * | 1979-02-13 | 1983-08-23 | 旭硝子株式会社 | Method for producing a sintered body of silicon nitride or silicon carbide |
| JPS56155069A (en) * | 1980-04-24 | 1981-12-01 | Matsushita Electric Industrial Co Ltd | Sheath for baking ceramic and its baking method |
-
1988
- 1988-12-23 JP JP63325573A patent/JPH06668B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02172870A (en) | 1990-07-04 |
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