JPH0673169B2 - Magnetic disk - Google Patents
Magnetic diskInfo
- Publication number
- JPH0673169B2 JPH0673169B2 JP12534785A JP12534785A JPH0673169B2 JP H0673169 B2 JPH0673169 B2 JP H0673169B2 JP 12534785 A JP12534785 A JP 12534785A JP 12534785 A JP12534785 A JP 12534785A JP H0673169 B2 JPH0673169 B2 JP H0673169B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- magnetic disk
- magnetic
- present
- magnetic recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005291 magnetic effect Effects 0.000 title claims description 30
- 239000010409 thin film Substances 0.000 claims description 8
- 239000010419 fine particle Substances 0.000 claims description 6
- 229920006254 polymer film Polymers 0.000 claims description 6
- 239000011247 coating layer Substances 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 230000005294 ferromagnetic effect Effects 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 3
- 239000010408 film Substances 0.000 description 21
- -1 polyethylene terephthalate Polymers 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 229910020647 Co-O Inorganic materials 0.000 description 3
- 229910020704 Co—O Inorganic materials 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 229910020630 Co Ni Inorganic materials 0.000 description 2
- 229910002440 Co–Ni Inorganic materials 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- UQLDLKMNUJERMK-UHFFFAOYSA-L di(octadecanoyloxy)lead Chemical compound [Pb+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O UQLDLKMNUJERMK-UHFFFAOYSA-L 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 125000005487 naphthalate group Chemical group 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910020646 Co-Sn Inorganic materials 0.000 description 1
- 229910002441 CoNi Inorganic materials 0.000 description 1
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 1
- 229910020676 Co—N Inorganic materials 0.000 description 1
- 229910020707 Co—Pt Inorganic materials 0.000 description 1
- 229910020705 Co—Rh Inorganic materials 0.000 description 1
- 229910020711 Co—Si Inorganic materials 0.000 description 1
- 229910020710 Co—Sm Inorganic materials 0.000 description 1
- 229910020709 Co—Sn Inorganic materials 0.000 description 1
- 229910020517 Co—Ti Inorganic materials 0.000 description 1
- 229910020515 Co—W Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018553 Ni—O Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000010952 cobalt-chrome Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は情報処理システムに於けるファイル記憶として
用いられる磁気ディスクに関するものである。TECHNICAL FIELD The present invention relates to a magnetic disk used as a file storage in an information processing system.
従来の技術 近年、磁気ディスクは高密度磁気記録の要求に応えるべ
く、強磁性金属薄膜を磁気記録層とする磁気ディスクの
開発が盛んである。2. Description of the Related Art In recent years, in order to meet the demand for high-density magnetic recording, magnetic disks have been actively developed in which magnetic metal thin films are used as magnetic recording layers.
第2図,第3図は従来の磁気ディスクの一例の断面図で
ある。2 and 3 are sectional views of an example of a conventional magnetic disk.
第2図において、1はポリエステルフィルムから成る基
板で、2はCr等の非磁性下地層3はCo−Ni(Ni:20wt
%)スパッタ膜で4は含弗素系プラズマ重合保護膜であ
る。In FIG. 2, 1 is a substrate made of a polyester film, 2 is a non-magnetic underlayer of Cr or the like, 3 is Co-Ni (Ni: 20 wt.
%) Sputtered film 4 is a fluorine-containing plasma polymerization protective film.
第3図は、両面アクセスの垂直磁気記録用のフロッピー
ディスクの断面を示すものである。FIG. 3 shows a cross section of a floppy disk for double-sided access perpendicular magnetic recording.
第3図に於て、5はポリイミドから成る基板6,7はパー
マロイ(Niは80wt%近傍の含有量がよく用いられる。)
下地層で、8,9はCoCr(Cr:20wt%)スパッタ膜で、磁化
容易軸の方向が基板面に垂直となっている、いわゆる垂
直磁化膜である。〔例えば、東北大通研シンポジウム論
文集「垂直磁気記録」PP.131〜141(1984)〕 第2図,第3図に示したいずれも、薄膜の厚みの合計の
値が0.3μmから0.7μmと大きい。In FIG. 3, 5 is a substrate 6 made of polyimide, and 6 and 7 are permalloy (Ni is often used in a content of around 80 wt%.).
Underlayers 8 and 9 are CoCr (Cr: 20 wt%) sputtered films, which are so-called perpendicularly magnetized films in which the direction of the easy axis of magnetization is perpendicular to the substrate surface. [For example, Tohoku University Research Institute Symposium Proceedings "Perpendicular Magnetic Recording" PP.131-141 (1984)] In both Figures 2 and 3, the total value of the thickness of the thin film was 0.3 μm to 0.7 μm. large.
これは高密度磁気記録に必要な、保磁力の確保の点から
出ているものであると説明されている。It is explained that this is due to the fact that the coercive force required for high density magnetic recording is secured.
第3図で10,11は、第2図の4と同じで、保護膜であ
る。Reference numerals 10 and 11 in FIG. 3 are the same as 4 in FIG. 2 and are protective films.
発明が解決しようとする問題点 しかし上記したような構成では、磁気ヘッドとの接触時
に起る媒体のダメージを回避することが充分できていな
い。この現象は、信頼度を著しく低下させることになり
改善が望まれている。Problems to be Solved by the Invention However, with the above-mentioned configuration, it is not possible to sufficiently avoid damage to the medium that occurs when the medium comes into contact with the magnetic head. This phenomenon remarkably lowers reliability and is desired to be improved.
これは恐らく、薄膜の圧縮方向に対して受ける応力に対
する強度が、従来のディスクに用いられているち密な磁
性薄膜では弱いためと思われるもので、本発明は上記事
情に鑑み、磁気ヘッドから受ける圧縮応力のパルス的変
動に対して強度を有する磁気記録層を配した磁気ディス
クを提供することを目的としている。This is probably because the strength of the thin film against the stress in the compression direction is weak in the dense magnetic thin film used in the conventional disk. In view of the above circumstances, the present invention receives it from the magnetic head. An object of the present invention is to provide a magnetic disk provided with a magnetic recording layer having strength against pulse-like fluctuation of compressive stress.
問題点を解決するための手段 上記問題点を解決するため、本発明の磁気ディスクは、
長手方向の熱収縮が横方向の30%から60%の高分子フィ
ルム上に微粒子塗布層を配し、その上に斜め蒸着法で形
成した強磁性金属薄膜を備えたものである。Means for Solving the Problems In order to solve the above problems, the magnetic disk of the present invention comprises:
A fine particle coating layer is arranged on a polymer film whose longitudinal heat shrinkage is 30% to 60%, and a ferromagnetic metal thin film formed by the oblique vapor deposition method is provided thereon.
作 用 本発明は上記した構成により、磁気ディスクに必要な磁
気記録層の面内等方性が、斜め蒸着膜の有する異方性
と、該蒸着膜が高分子フィルムの熱収縮比率の長手方向
と横方向の差違で平均化されるため大きい抗磁力で得ら
れるものと考えられるのと、斜め蒸着膜は、欠陥が多く
含まれかつボイドも多く、パルス的な圧縮応力に対して
強くなっているため、磁気ヘッドからダメージを受けな
いようにすることができ、磁気ディスクの信頼性を保て
るものである。Operation According to the present invention, the in-plane isotropy of the magnetic recording layer required for the magnetic disk has the anisotropy of the oblique vapor deposition film and the vapor deposition film in the longitudinal direction of the heat shrinkage ratio of the polymer film. It is considered that a large coercive force can be obtained because it is averaged due to the difference in the lateral direction, and the obliquely evaporated film has many defects and many voids, and is strong against pulse-like compressive stress. Therefore, the magnetic head can be prevented from being damaged, and the reliability of the magnetic disk can be maintained.
実施例 以下、本発明の実施例の磁気ディスクについて図面を参
照しながら説明する。Embodiments Hereinafter, magnetic disks according to embodiments of the present invention will be described with reference to the drawings.
第1図は本発明の一実施例に係る磁気記録媒体の拡大断
面図である。FIG. 1 is an enlarged sectional view of a magnetic recording medium according to an embodiment of the present invention.
第1図で、12は厚み26μmのポリエチレンテレフタレー
トフィルムで、150℃3分間の熱収縮率が長手方向と横
方向の比率が30%から60%の範囲にあるものである。熱
収縮率の大きさは1.5%から8%の範囲までの範囲では
比率で決ることを確かめている。In FIG. 1, 12 is a polyethylene terephthalate film having a thickness of 26 μm, and the thermal shrinkage ratio at 150 ° C. for 3 minutes is in the range of 30% to 60% in the longitudinal direction and the transverse direction. It is confirmed that the size of the heat shrinkage is determined by the ratio in the range of 1.5% to 8%.
又、150℃3分間はひとつの評価法であるが、ポリエチ
レン2−6ナフタレート、ポリカーボネート、ポリフエ
ニレンサルファイドの各フィルムについてはこの条件を
満たせば充分である。Further, 150 ° C. for 3 minutes is one evaluation method, but it is sufficient for each film of polyethylene 2-6 naphthalate, polycarbonate and polyphenylene sulfide to satisfy this condition.
13は微粒子塗布層で、直径300Åのシリカ微粒子を平均1
0ケ/(μm)2、エポキシ樹脂(平均厚み40Å)でフ
ィルム12の表面に固定したものである。13 is a fine particle coating layer, which averages 300 fine particles of silica with a diameter of 1
It is fixed on the surface of the film 12 with 0 / (μm) 2 and an epoxy resin (average thickness 40Å).
14は斜め蒸着法にて形成したCo−O膜で厚み0.15μm、
Co:Oの原子%比率は84:16である。14 is a Co-O film formed by the oblique deposition method and has a thickness of 0.15 μm.
The atomic% ratio of Co: O is 84:16.
この膜の形成は、直径1mの円筒キヤンに沿ってフィルム
を移動させながら、5×15-5Torrの酸素分圧中でCoを電
子ビーム蒸着して行った。最小入射角は22度で、円筒キ
ヤンの表面温度は66〔℃〕に保った。This film was formed by electron beam evaporation of Co under an oxygen partial pressure of 5 × 15 −5 Torr while moving the film along a cylindrical can having a diameter of 1 m. The minimum incident angle was 22 degrees, and the surface temperature of the cylindrical can was kept at 66 [℃].
得られたCo−O膜の保磁力は805±15〔e〕の範囲で
面内に於てほぼ等方的であると見なせるものであった。The coercive force of the obtained Co-O film was in the range of 805 ± 15 [e], and it could be considered to be almost isotropic in the plane.
15は溶液塗布法にて形成したステアリン酸鉛の塗膜で平
均膜厚は110Åとした。Reference numeral 15 is a coating film of lead stearate formed by the solution coating method, and the average film thickness was 110Å.
広幅(50cm幅、長さ1000m)のものから3.5インチの磁気
ディスクを打ち塗いて、アモルファス合金ヘッドを用い
て記録再生をくり返した。A 3.5-inch magnetic disk with a wide width (50 cm width, length of 1000 m) was applied, and recording and reproduction were repeated using an amorphous alloy head.
最外周トラックと最内周トラックを交互に10分ずつトレ
ースしてドロップアウトとドロップインの頻度を調べ
た。The frequency of drop-out and drop-in was investigated by tracing the outermost track and the innermost track alternately for 10 minutes each.
比較のためにスパッタ法でポリイミドフィルム(厚みは
25μm)上にCoNi(N:20wt%)を0.16μm形成し、その
上にステアリン酸鉛をスピンコート法で平均膜厚110Å
塗布した媒体を用いた。このCo−Niの保磁力は600(
e)であった。For comparison, a polyimide film (thickness is
CoNi (N: 20wt%) is formed 0.16μm on 25μm), and lead stearate is spin-coated on top of it with an average film thickness of 110Å
The coated medium was used. The coercive force of this Co-Ni is 600 (
e).
保磁力に於て実施例と差があるので、比較例に不利にな
らないように記録ビット長は0.6μmで比較し、ドロッ
プアウトは信号出力が定常値の値を0(dB)とした時、
−10(dB)以上低下した時、ドロップイン+3(dB)以
上出力が増加した時を計数した。Since there is a difference in coercive force from the example, the recording bit length is compared with 0.6 μm so as not to be disadvantageous to the comparative example, and the dropout is when the signal output has a steady value of 0 (dB),
The time when the output increased more than drop-in +3 (dB) when it decreased more than -10 (dB) was counted.
実施例と比較例についてドラップアウトパルスとドロッ
プインパルス数を各10分毎に比較した結果を表に示す。The table shows the results of comparison of the number of drip-out pulses and the number of drop-in pulses for each of the Examples and Comparative Examples every 10 minutes.
以上のように本実施例によれば、熱収縮の異方性と斜方
蒸着の組み合わせにより、磁気記録層がダメージを受け
て変化するとみられるドロップアウトやドロップインを
良好な水準で維持できることがわかる。 As described above, according to the present embodiment, it is possible to maintain a good level of dropout and dropin that are considered to change due to damage to the magnetic recording layer due to the combination of the anisotropy of heat shrinkage and the oblique deposition. Recognize.
なお実施例ではポリエチレンテレフタレートを高分子フ
ィルムとして用いたが、他にポリエチレン2−6ナフタ
レート,ポリカーボネート,ポリフエニレンサルファイ
ド,ポリアミド,ポリイミド等でもよい。Although polyethylene terephthalate is used as the polymer film in the examples, polyethylene 2-6 naphthalate, polycarbonate, polyphenylene sulfide, polyamide, polyimide or the like may be used.
又微粒子塗布層の構成材料はシリカとエポキシ樹脂とし
たが、他にCaCO3,TiO2,CaSO4,BaSO4,Fe3O4,ポリエステ
ル球等の微粒子,ポリエステル,ポリサルフオン,ポリ
ウレタン,ポリイミド等の樹脂でもよい。The constituent material of the fine particle coating layer was the silica and epoxy resin, other CaCO 3, TiO 2, CaSO 4 , BaSO 4, Fe 3 O 4, a polyester sphere like particles, polyester, polysulfone, polyurethane, polyimide, etc. Resin may be used.
強磁性金属薄膜としてCo−O膜を用いたが、他にCo−N
i,Co−Cr,Co−Ti,Co−Mo,Co−W,Co−Ta,Co−Si,Co−Sn,
Co−Sm,Co−Pt,Co−Rh,Co−Ru,Co−Ni−P,Co−Ni−O等
の斜め蒸着膜でもよい。A Co-O film was used as the ferromagnetic metal thin film, but other Co-N films were used.
i, Co-Cr, Co-Ti, Co-Mo, Co-W, Co-Ta, Co-Si, Co-Sn,
An oblique deposition film such as Co-Sm, Co-Pt, Co-Rh, Co-Ru, Co-Ni-P, and Co-Ni-O may be used.
なお、保護,潤滑の目的のオーバーコートは適宜工夫す
ればよい。The overcoat for the purpose of protection and lubrication may be properly devised.
発明の効果 以上のように本発明によれば、磁気ディスクの表面が磁
気ヘッドから受けるパルス的な圧縮応力でダメージを受
けないため、くり返し長時間使用してもドロップアウト
やドロップイン等の信号誤りの極めて少い状態を維持で
きるといったすぐれた効果を得ることができる。As described above, according to the present invention, since the surface of the magnetic disk is not damaged by the pulse-like compressive stress received from the magnetic head, even if it is repeatedly used for a long time, a signal error such as dropout or dropin occurs. It is possible to obtain an excellent effect that the state of the extremely small amount can be maintained.
第1図は本発明の一実施例に係る磁気ディスクの拡大断
面図、第2図および第3図は従来の磁気ディスクの拡大
断面図である。 12……高分子フィルム、13……微粒子塗布層、14……強
磁性金属薄膜。FIG. 1 is an enlarged sectional view of a magnetic disk according to an embodiment of the present invention, and FIGS. 2 and 3 are enlarged sectional views of a conventional magnetic disk. 12 …… Polymer film, 13 …… Fine particle coating layer, 14 …… Ferromagnetic metal thin film.
Claims (1)
の高分子フィルム上に微粒子塗布層を配し、その上に斜
め蒸着法で形成した強磁性金属薄膜を配したことを特徴
とする磁気ディスク。1. Thermal shrinkage in the longitudinal direction is 30% to 60% in the transverse direction.
A magnetic disk comprising a fine-particle coating layer on the polymer film, and a ferromagnetic metal thin film formed on the polymer film by oblique deposition.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12534785A JPH0673169B2 (en) | 1985-06-10 | 1985-06-10 | Magnetic disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12534785A JPH0673169B2 (en) | 1985-06-10 | 1985-06-10 | Magnetic disk |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61284828A JPS61284828A (en) | 1986-12-15 |
| JPH0673169B2 true JPH0673169B2 (en) | 1994-09-14 |
Family
ID=14907867
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12534785A Expired - Lifetime JPH0673169B2 (en) | 1985-06-10 | 1985-06-10 | Magnetic disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0673169B2 (en) |
-
1985
- 1985-06-10 JP JP12534785A patent/JPH0673169B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61284828A (en) | 1986-12-15 |
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