JPH0680745B2 - Method of manufacturing integrated circuit container - Google Patents
Method of manufacturing integrated circuit containerInfo
- Publication number
- JPH0680745B2 JPH0680745B2 JP15083387A JP15083387A JPH0680745B2 JP H0680745 B2 JPH0680745 B2 JP H0680745B2 JP 15083387 A JP15083387 A JP 15083387A JP 15083387 A JP15083387 A JP 15083387A JP H0680745 B2 JPH0680745 B2 JP H0680745B2
- Authority
- JP
- Japan
- Prior art keywords
- metal
- container
- peripheral surface
- plate
- long
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- Lead Frames For Integrated Circuits (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、半導体チップを搭載するための集積回路容器
の製造方法に関する。さらに詳しくは、金属材料を素材
とする集積回路の製造方法に関する。TECHNICAL FIELD The present invention relates to a method for manufacturing an integrated circuit container for mounting a semiconductor chip. More specifically, the present invention relates to a method of manufacturing an integrated circuit made of a metal material.
(従来の技術) 現在使用されているセラミックス製集積回路容器は、第
1図(イ)および(ロ)に示すように、矩形状のセラミ
ックス板1の中央部に凹み部2を有し、半導体チップ
(図示せず)はこの凹み部2にガラス又は貴金属層を介
して搭載される。リードフレーム(図示せず)はこの凹
み部を取り囲む周面部3状に封着ガラスを介して搭載さ
れ、上記半導体チップのリードと接続される。第2図に
斜視図で示すように、このような容器4と同様の構造を
有し、凹み部とその凹み部を取り囲む周面部を有する容
器蓋4′を、容器4の凹み部、周面部と対向せしめて封
着し、リードフレームのリード5は容器4と容器蓋4′
との間の長辺側から取り出される。この容器蓋4′も容
器4と同様にセラミックスの焼結体である。なお、容器
と容器蓋は実質的には同一形状であることから、本明細
書では容器と容器蓋の両方を容器と総称する。(Prior Art) As shown in FIGS. 1 (a) and 1 (b), a ceramic integrated circuit container currently in use has a recessed portion 2 at the center of a rectangular ceramic plate 1, A chip (not shown) is mounted in this recess 2 through a glass or noble metal layer. A lead frame (not shown) is mounted on the peripheral surface portion 3 surrounding the recess via sealing glass and connected to the leads of the semiconductor chip. As shown in a perspective view in FIG. 2, a container lid 4 ′ having a structure similar to such a container 4 and having a recessed portion and a peripheral surface portion surrounding the recessed portion is used as the recessed portion and the peripheral surface portion of the container 4. The lead frame 5 has a container 5 and a container lid 4 '
It is taken out from the long side between and. Like the container 4, the container lid 4'is also a ceramic sintered body. Since the container and the container lid have substantially the same shape, both the container and the container lid are collectively referred to as a container in the present specification.
しかしながら、セラミックス製容器には次の欠点があ
る。However, the ceramic container has the following drawbacks.
衝撃に弱いため、搬送工程中に、お互いに衝突して欠
けを生ずる危険が大きい。焼結が不完全な場合には、熱
衝撃によってクラックが発生することもある。Since they are vulnerable to impact, there is a great risk that they may collide with each other to cause chipping during the transportation process. If sintering is incomplete, cracks may occur due to thermal shock.
熱放散性が不十分であるため、半導体チップの集積度
が高く、発熱が大きい場合には誤動作が生じ易くなる。Since the heat dissipation property is insufficient, malfunction is likely to occur when the degree of integration of the semiconductor chips is high and the heat generation is large.
焼成時の収縮が大きく、寸法精度が劣る。Large shrinkage during firing and poor dimensional accuracy.
冷却過程で反りが発生し易く、容器各部の平坦度に問
題がある。Warpage is likely to occur during the cooling process, and there is a problem in the flatness of each part of the container.
これらの欠点を解消するため、本出願人は、既に実願昭
60−146527号において、素材として金属を用いた容器を
提案した。容器を金属材料で構成する場合には、リード
フレームと接触する恐れがある部位を電気絶縁層で覆う
必要がある。その場合の電気絶縁層としては金属酸化物
が適当であり、 したがって、本出願人は、既に特願昭62−68642号にお
いて、金属酸化物層を最表面に備えた金属材料製の集積
回路容器とその製造方法を提案した。In order to overcome these drawbacks, the applicant has already made
In No. 60-146527, we proposed a container using metal as a material. When the container is made of a metal material, it is necessary to cover a portion that may come into contact with the lead frame with an electrically insulating layer. A metal oxide is suitable for the electrical insulating layer in that case. Therefore, the applicant has already proposed in Japanese Patent Application No. 62-68642 that an integrated circuit container made of a metal material having a metal oxide layer on the outermost surface. And its manufacturing method was proposed.
第3図はその容器6の途中工程品の一例で、同図(イ)
は略式斜視図、同図(ロ)は断面図を示す。これからも
分かるように、板状の金属芯材9aが、酸化物となる他の
金属層9bで全面被覆されており、中央部に半導体チップ
搭載用の凹み部7が成形されている。FIG. 3 is an example of the intermediate process product of the container 6, and FIG.
Shows a schematic perspective view, and FIG. As can be seen from this, the plate-shaped metal core material 9a is entirely covered with another metal layer 9b which becomes an oxide, and the recessed portion 7 for mounting a semiconductor chip is formed in the central portion.
凹み部7は、打抜き途中止めあるいはポンチ張出しによ
って形成される。ところで、第3図に示す容器6には次
の問題がある。The recessed portion 7 is formed by stopping halfway through punching or punching out. By the way, the container 6 shown in FIG. 3 has the following problems.
凹み部7の裏面側に凸部10が形成されるため、搬送時
に容器同士がまた他のものにひっかかることがある。Since the convex portion 10 is formed on the back surface side of the concave portion 7, the containers may be caught on another object during the transportation.
凹み部7の成形に伴うスプリングバックにより、第4
図の如く周面部11に反りが生ずることがある。この周面
部11は封着ガラス層を介してリードフレームが搭載され
る部位であり、平面度が要求される。第4図(イ)の場
合は上反り、同(ロ)は下反りを示す。反りの方向およ
びその程度は、凹み部7の深さd、板厚tによって変化
する。本発明者の実験によれば、d一定の場合、tの増
加に伴って下反りから上反りに変化し、適当なtで反り
が0となる。すなわち、dに応じてtを決定せぬばなら
ず、不必要に厚い材料を使わざるを得ない場合がある。
また、tの適正値は材料の強度の影響も受け、強度管理
が非常にわずらわしいものとなる。Due to the springback due to the formation of the recessed portion 7, the fourth
As illustrated, the peripheral surface portion 11 may be warped. The peripheral surface portion 11 is a portion where the lead frame is mounted via the sealing glass layer, and flatness is required. In the case of FIG. 4 (a), the warp is shown, and the same (b) shows the warp. The direction and degree of the warp vary depending on the depth d of the recess 7 and the plate thickness t. According to an experiment by the present inventor, when d is constant, the warp changes from downward warp to upward warp as t increases, and the warp becomes 0 at an appropriate t. That is, t must be determined according to d, and there is a case where an unnecessarily thick material has to be used.
Further, the proper value of t is also affected by the strength of the material, which makes the strength management very troublesome.
ガラスまたは貴金属層を介して半導体チップを搭載す
る凹み部7の底面は平坦であることが要求されるが、打
抜き途中止め或いはポンチ張出しで成形すると、第5図
(イ)に示す如く、当該凹み部底面7aがダイス13の穴1
3′内で湾曲状に変形してしまう。これを防止するため
に、同図(ロ)に示す如くダイス穴13′内に加圧パッド
12を設け、下方より加圧することによって、凹み部底面
7aを平坦に保ちつつ成形する必要がある。しかも、所定
深さに凹み部7を成形した後、板押え15で周面部11を押
えた状態でポンチ14を上昇させると、パッド12によって
凹み部7が押し戻されるので、板押え15をポンチ14より
も先に上昇させるか、あるいはパッド12を下降させてか
らポンチ14を上昇させる必要があり、そのタイミングが
難しく、金型の構造と作動が複雑となる。The bottom surface of the recessed portion 7 on which the semiconductor chip is mounted via the glass or noble metal layer is required to be flat. The bottom surface 7a is the hole 1 of the die 13.
It will be curved in 3 '. In order to prevent this, a pressure pad is placed in the die hole 13 'as shown in FIG.
By providing 12 and pressing from below, the bottom of the recess
It is necessary to mold 7a while keeping it flat. In addition, when the punch 14 is lifted while the peripheral surface 11 is being pressed by the plate retainer 15 after the recess 7 is formed to a predetermined depth, the recess 12 is pushed back by the pad 12, so the plate retainer 15 is punched 14 It is necessary to raise the punch 14 before raising it, or lowering the pad 12 and then raising the punch 14, which makes the timing difficult and complicates the structure and operation of the mold.
(発明が解決しようとする問題点) したがって、本発明の目的は、底面に搬送上の障害とな
る凸部がなく、半導体チップを搭載する凹み部底面なら
びにリードフレームを搭載する周面部の平坦度を極めて
容易に得ることができる集積回路容器の製造方法を提供
することである。(Problems to be Solved by the Invention) Therefore, an object of the present invention is to provide a flatness of a bottom surface of a recessed portion on which a semiconductor chip is mounted and a peripheral surface portion on which a lead frame is mounted without having a convex portion on the bottom surface which obstructs transportation. It is an object of the present invention to provide a method for manufacturing an integrated circuit container, which is capable of extremely easily obtaining
(問題点を解決するための手段) かくして、本発明の要旨とするところは、半導体チップ
を搭載するための凹み部と、該凹み部を取り囲む周面部
を有する集積回路容器の製造方法において、板状の金属
芯材の周面を酸化物を形成する金属で被覆した、幅が容
器の幅にほゞ等しい長尺狭幅板状の材料を用意し、該材
料に、前記凹み部のもととなる透孔を長手方向に所定間
隔であける打抜き工程と、このようにして得た穴あき長
尺板材を、同じく板状の金属芯材の周面を酸化物を形成
する他の金属で被覆した、同一幅の長尺狭幅板状の材料
を重ね合わせ、加熱圧延して合わせ面の被覆金属を一体
化する工程と、このようにして得られた合わせ材に形成
された凹み部と凹み部との中間位置で該合わせ材を切断
する工程と、前記金属芯材の周面の被覆金属を酸化する
工程とを備えることを特徴とする集積回路容器の製造方
法である。(Means for Solving the Problems) Thus, the gist of the present invention is to provide a method for manufacturing an integrated circuit container having a recess for mounting a semiconductor chip and a peripheral surface surrounding the recess in a plate. Prepare a long narrow plate-shaped material in which the peripheral surface of a metal core material is coated with a metal that forms an oxide, and the width is approximately equal to the width of the container. Punching step in which through holes are formed at predetermined intervals in the longitudinal direction, and the perforated long plate material thus obtained is coated with another metal forming an oxide on the peripheral surface of a plate-shaped metal core material. The process of stacking long narrow plate-shaped materials of the same width and heating and rolling to integrate the coating metal on the mating surfaces, and the recesses and dents formed in the thus obtained mating material. A step of cutting the laminated material at an intermediate position between the metal core material and the peripheral surface of the metal core material And a step of oxidizing a metal.
なお、酸化工程は最終仕上げ工程として行われるが、酸
化処理が連続ラインで可能であれば、合わせ材の切断に
先立って行ってもよい。The oxidation step is performed as a final finishing step, but if the oxidation treatment can be performed in a continuous line, the oxidation step may be performed before the cutting of the laminated material.
金属芯材を被覆する金属は容易に酸化物を形成するもの
であればよい。通常はアルミニウムが好ましい。被覆の
態様は電気メッキ、蒸着など適宜手段で行うことができ
る。特に制限されない。The metal that coats the metal core may be any metal that easily forms an oxide. Aluminum is usually preferred. The coating can be performed by an appropriate means such as electroplating or vapor deposition. There is no particular limitation.
(作用) 次に、添付図面を参照しながら、本発明にかかる集積回
路容器の製造方法についてさらに詳しく説明する。(Operation) Next, the method for manufacturing the integrated circuit container according to the present invention will be described in more detail with reference to the accompanying drawings.
第6図(イ)および(ロ)は本発明による方法で製造さ
れる集積回路容器の構造の一例を示すそれぞれ斜視図お
よび断面図である。本発明でいう容器とは、前記した如
く、容器、蓋の両方を意味するもので、容器もその蓋も
同様の構造である。6 (a) and 6 (b) are a perspective view and a sectional view, respectively, showing an example of the structure of an integrated circuit container manufactured by the method according to the present invention. As described above, the container in the present invention means both the container and the lid, and the container and the lid have the same structure.
第6図(イ)、(ロ)に示す如く、容器16は上層板16
a、下層板16bを接合させた二重構造であり、合わせた面
40が接合面である。搭載されるリードフレーム(図示せ
ず)と容器16が接触する恐れがある部位は金属酸化物層
により電気的に絶縁されている。第6図で云えば、リー
ドフレームが搭載される周面部32、前述の第2図の如く
曲げられたリードフレームが近接する上層板、下層板16
a、16bの長辺部および裏面33である。なお、図中、上層
板、下層板16a、16bの厚さはそれぞれta、tb、およびそ
の長辺部、短辺部(16a′、16b′)の長さはそれぞれ
l、bで表わされている。As shown in FIGS. 6A and 6B, the container 16 is an upper layer plate 16
a, a double structure in which the lower plate 16b is joined, and the combined surface
40 is the joint surface. A portion where the mounted lead frame (not shown) and the container 16 may come into contact with each other is electrically insulated by the metal oxide layer. Referring to FIG. 6, the peripheral surface portion 32 on which the lead frame is mounted, the upper layer plate and the lower layer plate 16 to which the lead frame bent as shown in FIG.
The long sides of a and 16b and the back surface 33. In the figure, the thicknesses of the upper and lower layers 16a and 16b are represented by ta and tb, and the lengths of their long sides and short sides (16a ', 16b') are represented by 1 and b, respectively. ing.
第7図は金属酸化物を形成する手前の段階での、長尺合
わせ材17を示し、幅寸法は容器と同じbであり、凹み部
7が所定のピッチ(例えば容器長さlに相当する長さ)
で設けられている。これを凹み部と凹み部の間の破線イ
−イで切断し、陽極酸化などの適宜手段で酸化処理して
第6図に示すような容器16が製造される。FIG. 7 shows the long-sized laminated material 17 before the formation of the metal oxide, the width dimension is the same as that of the container b, and the recessed portions 7 correspond to a predetermined pitch (for example, the container length 1). length)
It is provided in. This is cut along the broken line YI between the recesses and oxidized by an appropriate means such as anodic oxidation to manufacture the container 16 as shown in FIG.
第7図において長尺合わせ材17は長尺上層板18と長尺下
層板19を接合したものである。下層板19、上層板18はい
ずれも板材の金属芯材を酸化皮膜となる他の金属で被覆
したものである。第8図(イ)、(ロ)は長尺上層板18
の構造の一例を示すそれぞれ斜視図および断面図であ
る。第8図(ロ)は第8図(イ)のロ−ロ線に沿った断
面図である。板状の金属芯材18aと被覆金属層18bからな
り、所定寸法の透孔21が所定のピッチであけられてい
る。矩形状の透孔21の辺長m′,n′およびピッチl′に
ついては後述する。In FIG. 7, a long laminated material 17 is obtained by joining a long upper layer plate 18 and a long lower layer plate 19. Each of the lower layer plate 19 and the upper layer plate 18 is formed by coating the metal core material of the plate material with another metal that will be an oxide film. 8 (a) and 8 (b) are long upper layer plates 18
3 is a perspective view and a cross-sectional view showing an example of the structure of FIG. FIG. 8B is a cross-sectional view taken along the line of FIG. 8A. A plate-shaped metal core 18a and a coating metal layer 18b are formed, and through holes 21 having a predetermined size are formed at a predetermined pitch. The side lengths m ', n'and the pitch l'of the rectangular through holes 21 will be described later.
透孔21をあける前の材料は金属芯材18aの周面が被覆金
属層18bで覆われた同一幅b′の板状フープ材であり、
円形断面の棒状クラッド材の矩形断面に圧延する方法に
よって、または金属芯材18aにメッキあるいは蒸着で被
覆金属層18bを形成する方法によって製造される。透孔2
1の加工は打抜きで行われ、前述の従来例にみられる第
3図の如き凹み部7が形成されないので、透孔21の周面
部22を拘束して打抜く限り、周面部22の平坦度不良は発
生しない。The material before forming the through holes 21 is a plate-shaped hoop material having the same width b ′ in which the peripheral surface of the metal core material 18a is covered with the coating metal layer 18b.
It is manufactured by a method of rolling a rod-shaped clad material having a circular cross section into a rectangular cross section or by a method of forming a coating metal layer 18b on a metal core material 18a by plating or vapor deposition. Through hole 2
Since the processing of 1 is performed by punching and the recessed portion 7 as shown in FIG. 3 seen in the above-mentioned conventional example is not formed, the flatness of the peripheral surface portion 22 is limited as long as the peripheral surface portion 22 of the through hole 21 is constrained and punched. No defects occur.
第9図(イ)、(ロ)はそれぞれ長尺下層板19を示す斜
視図および断面図であり、板状の金属芯材19aの周面が
他の金属層19bで覆われている。これの製造法は透孔を
加工する前の長尺上層板18と同様である。9 (a) and 9 (b) are a perspective view and a cross-sectional view, respectively, showing the elongated lower layer plate 19, in which the peripheral surface of a plate-shaped metal core material 19a is covered with another metal layer 19b. The manufacturing method thereof is the same as that of the long upper layer plate 18 before processing the through holes.
ところで、第6図に示す容器16は全体の線膨張係数がリ
ードフレームの線膨張係数と実質的に等しくなるように
する必要がある。これは容器16とリードフレームの間で
熱応力を発生させないためである。熱応力が発生すると
付着ガラスに亀裂が生ずる危険がある。そのために、第
8図に示す長尺上層板18の金属芯材18a、第9図に示す
長尺下層板19の金属芯材19aには、例えばリードフレー
ムと同一の金属が使用される。被覆金属層18b、19bは後
述する接合の容易さおよびコスト面からアルミニウムが
適当である。By the way, the container 16 shown in FIG. 6 needs to have an overall linear expansion coefficient substantially equal to the linear expansion coefficient of the lead frame. This is because no thermal stress is generated between the container 16 and the lead frame. When thermal stress occurs, there is a risk that the adhered glass may crack. Therefore, for the metal core material 18a of the long upper layer plate 18 shown in FIG. 8 and the metal core material 19a of the long lower layer plate 19 shown in FIG. 9, for example, the same metal as the lead frame is used. Aluminum is suitable for the coating metal layers 18b and 19b from the viewpoint of ease of bonding and cost, which will be described later.
次に、長尺上層板18と長尺下層板19を重ね合わせ、300
〜500℃に加熱し、第10図に示すように上下一対のロー
ル24で圧延し、合わせ面の被覆金属(例:アルミニウ
ム)層同志を接合する。第11図は接合後の幅方向断面を
示し、長尺上層板18の被覆金属(例:アルミニウム)層
と長尺下層板19の被覆金属層が一体化している。Next, the long upper layer plate 18 and the long lower layer plate 19 are overlapped, and 300
It is heated to ˜500 ° C. and rolled by a pair of upper and lower rolls 24 as shown in FIG. 10 to join the coating metal (eg, aluminum) layers on the mating surfaces. FIG. 11 shows a cross section in the width direction after joining, in which the covering metal (eg, aluminum) layer of the long upper layer plate 18 and the covering metal layer of the long lower layer plate 19 are integrated.
かかる熱間圧延による接合に必要な圧下率は加熱温度が
低いほど大となる。本発明者の経験では300℃に加熱す
るときはほぼ30%、500℃ではほぼ20%でよい。第10図
に示すように、この圧下率に応じて、長尺上層板18の厚
さta′(第8図参照)、長尺下層板19の厚さtb′(第9
図参照)を決める。また、圧延によって長尺上層板18の
透孔21の寸法m′、n′(第8図参照)が変化するの
で、圧延後に第7図に示す凹み部7の平面寸法m、nと
なるように、透孔21の平面寸法m′、n′を決定する。
なお、圧延による幅方向の寸法変化は小さいので、n′
はnとほゞ同一となる。また、長尺上層板18、長尺下層
板19の幅b′は同じく長尺合わせ板17の幅bとほゞ同一
でよい。The reduction rate required for joining by such hot rolling increases as the heating temperature decreases. According to the experience of the present inventor, heating to 300 ° C. may be about 30%, and 500 ° C. may be about 20%. As shown in FIG. 10, the thickness ta ′ of the long upper layer plate 18 (see FIG. 8) and the thickness tb ′ (the ninth lower layer plate 19
(See the figure). Further, since the dimensions m'and n '(see FIG. 8) of the through holes 21 of the long upper layer plate 18 are changed by rolling, the flat dimensions m, n of the recessed portion 7 shown in FIG. 7 are obtained after rolling. Then, the plane dimensions m ′ and n ′ of the through hole 21 are determined.
Since the dimensional change in the width direction due to rolling is small, n '
Is almost the same as n. The width b ′ of the long upper layer plate 18 and the long lower layer plate 19 may be substantially the same as the width b of the long laminated plate 17.
長尺上層板18の被覆金属層の厚さts1(第8図参照)、
長尺下層板19の被覆金属層の厚さts2(第9図参照)は
所要圧延接合強度と接合後の厚さから決定される。薄す
ぎると接合が不完全となり、また後述する酸化処理後の
電気絶縁性が不十分となる。接合が不十分な場合には剥
離が生ずる恐れがあり、また剥離に至らずとも、後述す
るように凹み部に半導体チップを搭載し、容器蓋を封着
した後の半導体チップを外気から完全に遮断することが
できなくなる。逆に厚すぎると、被覆金属層の線膨張係
数がリードフレームと同一材質の金属芯材のそれよりも
大きい場合には、容器とリードフレームの線膨張係数を
実質的に一致させることが困難となる。本発明者の経験
によれば、ts1、ts2はいずれも10〜50μmが適当であ
る。The thickness ts 1 of the coating metal layer of the long upper layer plate 18 (see FIG. 8),
The thickness ts 2 (see FIG. 9) of the coating metal layer of the long lower layer plate 19 is determined from the required rolling joint strength and the thickness after joining. If it is too thin, the bonding will be incomplete and the electrical insulation after the oxidation treatment described below will be insufficient. If the bonding is insufficient, peeling may occur, and even if peeling does not occur, the semiconductor chip is mounted in the recess as described below, and the semiconductor chip after sealing the container lid is completely removed from the outside air. You will not be able to shut off. Conversely, if it is too thick, it is difficult to substantially match the linear expansion coefficient of the container and the lead frame when the linear expansion coefficient of the coated metal layer is larger than that of the metal core material made of the same material as the lead frame. Become. According to the experience of the present inventor, it is suitable that both ts 1 and ts 2 are 10 to 50 μm.
長尺上層板18の厚みta′(第8図参照)は、圧延接合後
の凹み部7の深さが容器凹み部の深さd(第11図参照)
となるように決定する。長尺下層板19の厚みtb′(第9
図参照)は圧延接合後の凹み部7の底部の厚さが所定寸
法T(第11図参照)になるように決定する。圧延接合の
際に凹み部底部は直接ロールによる圧下は受けないが、
圧延を受ける部分の圧延方向の伸びの影響があるため、
T<tb′となる。凹み部底部厚みTは、半導体チップに
発生する熱の放散性の添からは薄い方がよいが、チップ
搭載部としての剛性を考慮すれば0.1〜0.3mmが適当であ
る。The thickness ta '(see FIG. 8) of the long upper layer plate 18 is such that the depth of the recessed portion 7 after rolling and joining is the depth d of the recessed portion of the container (see FIG. 11).
To be The thickness tb 'of the long lower layer plate 19 (9th
(See the drawing) is determined so that the thickness of the bottom of the recessed portion 7 after the rolling and joining becomes a predetermined dimension T (see FIG. 11). At the time of roll-bonding, the bottom of the recess is not directly pressed by the roll,
Since there is an influence of the elongation in the rolling direction of the part to be rolled,
T <tb '. The bottom thickness T of the recess is preferably thin from the viewpoint of heat dissipation of the semiconductor chip, but 0.1 to 0.3 mm is appropriate in consideration of the rigidity of the chip mounting part.
次に、圧延接合によって製造された長尺合わせ材17を、
第7図に示すように破線イ−イの位置で切断し、被覆金
属層20を酸化処理して電気絶縁性を付与する。酸化処理
の一例をあげれば、電気化学的に行われる陽極酸化処理
がある。Next, the long laminated material 17 manufactured by rolling joining,
As shown in FIG. 7, the coating metal layer 20 is cut at the position indicated by the broken line ii, and the coating metal layer 20 is oxidized to provide electrical insulation. An example of the oxidation treatment is anodization treatment that is performed electrochemically.
第11図の例で伝えば、酸化皮膜が形成されるのは凹み部
7を取り囲む周面部の被覆層20a、凹み部底面の被覆層2
0d、周縁部の被覆層20c、凹み部と反対側の裏面被覆層2
0bである。第6図に示す容器16の短辺16a′、16b′は切
断切口であるために第11図に示す金属芯材18a′、19a′
が露出する。これらの金属芯材18a′、19a′の耐食性が
不十分な場合には、耐熱性の樹脂塗料を塗布する。この
樹脂塗料に耐熱性が要求されるのは、後述する半導体チ
ップ、リードフレームの搭載工程および封着工程で熱に
耐える必要があるからである。According to the example of FIG. 11, the oxide film is formed by the coating layer 20a on the peripheral surface surrounding the recess 7 and the coating layer 2 on the bottom of the recess 2.
0d, the coating layer 20c on the peripheral portion, the back surface coating layer 2 on the side opposite to the recessed portion
It is 0b. Since the short sides 16a ', 16b' of the container 16 shown in FIG. 6 are cut edges, the metal cores 18a ', 19a' shown in FIG.
Is exposed. When the corrosion resistance of these metal core materials 18a ', 19a' is insufficient, a heat resistant resin coating is applied. The reason why this resin coating material is required to have heat resistance is that it is necessary to withstand heat in a mounting process and a sealing process of a semiconductor chip and a lead frame described later.
以上が本発明の集積回路容器の製造方法であるが、半導
体チップ、リードフレームの搭載および容器と容器蓋の
封着について補足的に説明する。The above is the method for manufacturing the integrated circuit container of the present invention, but the mounting of the semiconductor chip, the lead frame, and the sealing of the container and the container lid will be supplementarily described.
これらは従来法に同じである。These are the same as the conventional method.
すなわち、第12図に示すように、まず、容器16の凹み部
の底面にガラスまたは貴金属からなる半導体チップ接着
層24を形成する。次に気密封着のためのガラス粉末を周
面部32の金属酸化物層20a上にスクリーン印刷で塗布
し、仮焼成を行って封着用ガラス層26を形成する。な
お、好適態様にあってアルミニウムを被覆金属として用
いるのはその酸化物層のガラスとの密着性が良いことも
その理由の1つである。That is, as shown in FIG. 12, first, the semiconductor chip adhesive layer 24 made of glass or noble metal is formed on the bottom surface of the recess of the container 16. Next, glass powder for hermetic sealing is applied on the metal oxide layer 20a of the peripheral surface portion 32 by screen printing, and calcination is performed to form the sealing glass layer 26. One of the reasons why aluminum is used as the coating metal in the preferred embodiment is that the oxide layer has good adhesion to glass.
半導体チップ27は接着層24を加熱溶融させることによ
り、またリードフレーム33は封着ガラス層26を加熱溶融
させることにより、埋め込まれる。半導体チップ27のリ
ードとリードフレームは配線29で接続される。次に第13
図に示すように、容器16に容器蓋16′をかぶせ、両者の
封着ガラス層26、26′を加熱溶融して一体化し、封着す
る。なお、図中符号は第12図に同じである。The semiconductor chip 27 is embedded by heating and melting the adhesive layer 24, and the lead frame 33 is embedded by heating and melting the sealing glass layer 26. The leads of the semiconductor chip 27 and the lead frame are connected by wires 29. Next thirteenth
As shown in the figure, the container 16 is covered with a container lid 16 ', and both sealing glass layers 26, 26' are heated and melted to be integrated and sealed. The reference numerals in the figure are the same as in FIG.
(発明の効果) 以上詳述したように本発明の製造法により製造される集
積回路容器は、搬送上の障害となる凸部が全くなく、か
つリードフレームを搭載する周面部を、半導体チップを
搭載する凹み部の深さ、使用する金属板材の厚さと無関
係に平坦にすることができ、また金属製容器の特徴とし
て、衝撃に強く、かつ半導体チップに発生した熱を速や
かに逃しうるというすぐれた特徴を有するのである。(Effects of the Invention) As described in detail above, the integrated circuit container manufactured by the manufacturing method of the present invention has no protrusions that hinder transportation and has a semiconductor chip formed on the peripheral surface part on which the lead frame is mounted. It can be made flat irrespective of the depth of the recessed part to be mounted and the thickness of the metal plate material to be used, and the characteristics of the metal container are that it is strong against impacts and can quickly dissipate the heat generated in the semiconductor chip. It has different characteristics.
第1図(イ)は、従来のセラミック製集積回路容器の略
式平面図; 第1図(ロ)は、第1図のロ−ロ線に沿った断面図; 第2図は、第1図に示す容器に半導体チップを組込んで
組立てて得たパッケージの略式斜視図; 第3図(イ)は、従来品の略式斜視図; 第3図(ロ)は、第3図(イ)のロ−ロ線に沿った断面
図; 第4図(イ)、(ロ)は、凹み部成形時にそれぞれ上反
り、下反りの形成される様子を示す略式説明図; 第5図(イ)、(ロ)は、凹み部成形の様子を示す模式
的説明図; 第6図(イ)、(ロ)は、本発明方法で製造される集積
回路容器のそれぞれ斜視図およびロ−ロ線に沿った断面
図; 第7図は、長尺合わせ材の略式斜視図; 第8図(イ)、(ロ)は、長尺合わせ材の上層板の構造
を示すそれぞれ略式斜視図および断面図; 第9図(イ)、(ロ)は、長尺下層板のそれぞれ斜視図
および断面図; 第10図は、長尺上層板と長尺下層板とを合わせて圧延に
より長尺合わせ材とする様子の略式説明図; 第11図は、圧延によって得た合わせ材の断面図;および 第12図および第13図は、本発明により製造される容器を
使って半導体チップをパッケージに組立てる様子を説明
するそれぞれ略式断面図である。 7:凹み部、16:容器 16a:上層板、16b:下層板 17:長尺合わせ材、18a:金属芯材 18b:被覆金属層、21:透孔 32,22:周面部1 (a) is a schematic plan view of a conventional ceramic integrated circuit container; FIG. 1 (b) is a cross-sectional view taken along the line Loro of FIG. 1; FIG. 2 is FIG. A schematic perspective view of a package obtained by assembling a semiconductor chip into the container shown in FIG. 3; FIG. 3 (a) is a schematic perspective view of a conventional product; FIG. 3 (b) is a schematic perspective view of FIG. FIG. 4 (a) and FIG. 4 (b) are schematic explanatory views showing how upward warp and downward warp are formed during molding of the recessed portion; FIG. 5 (a), (B) is a schematic explanatory view showing a state of forming a recessed part; FIGS. 6 (a) and 6 (b) are respectively a perspective view and a roro line of an integrated circuit container manufactured by the method of the present invention. FIG. 7 is a schematic perspective view of the long laminated material; FIGS. 8A and 8B are schematic perspective views and sectional views showing the structure of the upper layer plate of the long laminated material, respectively. Fig. 9 (a) and (b) are perspective views and cross-sectional views of the long lower layer plate, respectively. Fig. 10 is a long laminated material obtained by rolling the long upper layer plate and the long lower layer plate together. FIG. 11 is a cross-sectional view of a laminated material obtained by rolling; and FIGS. 12 and 13 are assembling semiconductor chips into a package using the container manufactured according to the present invention. 3A and 3B are schematic sectional views respectively illustrating 7: Recessed part, 16: Container 16a: Upper layer plate, 16b: Lower layer plate 17: Long laminated material, 18a: Metal core material 18b: Coated metal layer, 21: Through holes 32, 22: Peripheral surface part
Claims (3)
該凹み部を取り囲む周面部を有する集積回路容器の製造
方法において、板状の金属芯材の周面を酸化物を形成す
る金属で被覆した、幅が容器の幅にほゞ等しい長尺狭幅
板状の材料を用意し、該材料に、前記凹み部のもととな
る透孔を長手方向に所定間隔であける打抜き工程と、こ
のようにして得た穴あき長尺板材を、同じく板状の金属
芯材の周面を酸化物を形成する他の金属で被覆した、同
一幅の長尺狭幅板状の材料を重ね合わせ、加熱圧延して
合わせ面の被覆金属を一体化する工程と、このようにし
て得られた合わせ材に形成された凹み部と凹み部との中
間位置で該合わせ材を切断する工程と、前記金属芯材の
周面の被覆金属を酸化する工程とを備えることを特徴と
する集積回路容器の製造方法。1. A recess for mounting a semiconductor chip,
In a method for manufacturing an integrated circuit container having a peripheral surface portion surrounding the recess, a long narrow width in which the peripheral surface of a plate-shaped metal core material is coated with a metal forming an oxide, and the width is approximately equal to the width of the container. A plate-shaped material is prepared, and a punching step in which through holes that are the bases of the recesses are formed at predetermined intervals in the longitudinal direction in the material, and a perforated long plate material obtained in this manner A step of superimposing a long narrow plate-shaped material having the same width, in which the peripheral surface of the metal core material is coated with another metal forming an oxide, and heating and rolling to integrate the coated metal on the mating surface. And a step of cutting the mating material at an intermediate position between the recesses formed in the mating material thus obtained and a step of oxidizing the coating metal on the peripheral surface of the metal core material. A method of manufacturing an integrated circuit container, comprising:
記被覆金属の酸化工程を行う、特許請求の範囲第1項記
載の方法。2. The method according to claim 1, wherein the step of oxidizing the coating metal is performed prior to the step of cutting the laminated material.
ミニウムである、特許請求の範囲第1項または第2項の
いずれかに記載の方法。3. The method according to claim 1, wherein the metal coating the peripheral surface of the metal core material is aluminum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15083387A JPH0680745B2 (en) | 1987-06-17 | 1987-06-17 | Method of manufacturing integrated circuit container |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15083387A JPH0680745B2 (en) | 1987-06-17 | 1987-06-17 | Method of manufacturing integrated circuit container |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63314854A JPS63314854A (en) | 1988-12-22 |
| JPH0680745B2 true JPH0680745B2 (en) | 1994-10-12 |
Family
ID=15505378
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15083387A Expired - Lifetime JPH0680745B2 (en) | 1987-06-17 | 1987-06-17 | Method of manufacturing integrated circuit container |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0680745B2 (en) |
-
1987
- 1987-06-17 JP JP15083387A patent/JPH0680745B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63314854A (en) | 1988-12-22 |
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