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JPH0684529B2 - Low temperature thermoelectric material and method for producing the same - Google Patents
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JPH0684529B2 - Low temperature thermoelectric material and method for producing the same - Google Patents

Low temperature thermoelectric material and method for producing the same

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Publication number
JPH0684529B2
JPH0684529B2 JP61035337A JP3533786A JPH0684529B2 JP H0684529 B2 JPH0684529 B2 JP H0684529B2 JP 61035337 A JP61035337 A JP 61035337A JP 3533786 A JP3533786 A JP 3533786A JP H0684529 B2 JPH0684529 B2 JP H0684529B2
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JP
Japan
Prior art keywords
alloy
type
group
thermoelectric material
added
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP61035337A
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Japanese (ja)
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JPS62196346A (en
Inventor
卓司 奥村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Komatsu Ltd
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Komatsu Ltd
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Filing date
Publication date
Application filed by Komatsu Ltd filed Critical Komatsu Ltd
Priority to JP61035337A priority Critical patent/JPH0684529B2/en
Priority to US07/016,265 priority patent/US4764212A/en
Priority to EP87102425A priority patent/EP0235702B1/en
Priority to DE8787102425T priority patent/DE3767892D1/en
Publication of JPS62196346A publication Critical patent/JPS62196346A/en
Publication of JPH0684529B2 publication Critical patent/JPH0684529B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 産業上の利用分野 本発明は、低温(77〜200゜K)で高い性能を発揮するBi
-Sb系熱電材料およびその製造方法に関し、さらに詳し
くは、ベルチエ効果を利用する電子冷却用モジユールの
脚部材料、あるいはゼーベツク効果を利用する冷熱
(源)発電用モジユールの脚部材料などに有用な、従来
得られなかつたp型Bi-Sb系合金の熱電材料組成および
その製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION INDUSTRIAL FIELD OF USE The present invention is a Bi that exhibits high performance at low temperatures (77 to 200 ° K).
-For more details on Sb-based thermoelectric materials and their manufacturing methods, it is useful as a leg material for electronic cooling modules that utilize the Bertier effect, or a leg material for cold heat (source) power generation modules that utilize the Seebeck effect. The present invention relates to a thermoelectric material composition of a p-type Bi—Sb alloy which has never been obtained, and a method for producing the same.

従来の技術 Bi-Sb系合金は低温域で限られた範囲(例えば4.2゜Kに
おいてBi95Sb5〜Bi80Sb20)で0.015eV程度のバンドギ
ヤツプを有するn型半導体となり、これが低温域で優れ
たベルチエ効果を発揮することは広く知られている(例
えば、特公昭38−15421号公報参照)。
Conventional technology Bi-Sb alloys are n-type semiconductors with bandgap of about 0.015eV in a limited range in low temperature range (for example, Bi 95 Sb 5 to Bi 80 Sb 20 at 4.2 ° K), which is excellent in low temperature range. It is widely known that the Berttier effect is exhibited (see, for example, Japanese Patent Publication No. 38-15421).

このn型Bi-Sb合金は、実は真性半導体であり、キヤリ
アとして電子、正孔ともほぼ同数存在する。しかし、電
子の移動度が正孔の移動度に比べて大きいため、n型伝
導となるとされている(例えば、T.AONO及びS.AIZAWA
“Study on Thermal Gap of Bi-Sb Alloys"Tokyo Denki
Univ.参照)。
This n-type Bi-Sb alloy is actually an intrinsic semiconductor, and there are almost the same number of electrons and holes as carriers. However, since electron mobility is higher than hole mobility, n-type conduction is assumed (for example, T.AONO and S.AIZAWA).
"Study on Thermal Gap of Bi-Sb Alloys" Tokyo Denki
See Univ.).

また、IV族元素Sn,Pbなどを数100ppm固溶させた単結晶B
i-Sbでは、極低温のいわゆる不純物領域ではp型伝導を
示すが、温度上昇と共にn型へ反転するという報告があ
る(例えば、W.Yim及びA.Amith,Solid-State Electroni
cs,1972,Vol.15,p.1141〜1165参照)。
In addition, a single crystal B containing several 100 ppm of Group IV elements such as Sn and Pb
In i-Sb, p-type conduction is exhibited in a so-called impurity region at extremely low temperature, but it is reported that the i-Sb inverts to n-type as the temperature rises (for example, W. Yim and A. Amith, Solid-State Electroni
cs, 1972, Vol.15, p.1141-1165).

従つて、極低温から室温近傍までp型となるBi-Sb系合
金から、単結晶製造を目的とするブリツジマン法やゾー
ンメルテイング法では作製不可能であり、従つて、この
ようなp型Bi-Sb合金は今だ発見及び製造されていな
い。なお、以下の記載では、極低温から室温までp型と
なるBi-Sbのみをp型Bi-Sb合金と呼ぶこととする。
Therefore, it is not possible to manufacture from a Bi-Sb alloy that becomes p-type from cryogenic temperature to near room temperature by the Britzmann method or zone melting method for the purpose of producing a single crystal. -Sb alloys have not yet been discovered and manufactured. In the following description, only Bi-Sb that becomes p-type from cryogenic temperature to room temperature will be referred to as p-type Bi-Sb alloy.

発明が解決しようとする問題点 前記したように、Bi-Sb合金は低温で高い性能を示す熱
電材料として広く知られているが、n型材料しか作製で
きなかつたため、電子冷却用モジユールの脚部材料への
実用は行なわれていないのが現状である。
Problems to be Solved by the Invention As described above, the Bi-Sb alloy is widely known as a thermoelectric material that exhibits high performance at low temperatures, but since only n-type materials can be produced, the legs of the electronic cooling module are not known. At present, it has not been put to practical use as a material.

従つて、本発明の目的は、極低温から室温までp型とな
るBi-Sb合金およびその製造方法を提供することにあ
る。
Therefore, an object of the present invention is to provide a Bi-Sb alloy that becomes p-type from cryogenic temperature to room temperature and a method for producing the same.

本発明の他の目的は、電子冷却用モジユールの脚部材、
冷熱(源)発電用モジユールの脚部材料等に有用な、低
温、例えば77〜200゜Kにおいて高い性能を発揮するBi-S
b系熱電材料およびその製造方法を提供することにあ
る。
Another object of the present invention is to provide a leg member of an electronic cooling module,
Bi-S, which is useful as a leg material for cold heat (source) power generation modules and has high performance at low temperatures, for example, 77 to 200 ° K.
It is to provide a b-type thermoelectric material and a method for manufacturing the same.

問題点を解決するための手段 本発明者の研究によれば、p型Bi-Sb合金を得るために
は、以下の組成とする必要があることが見い出された。
Means for Solving the Problems According to the research conducted by the present inventor, it was found that the following composition was required to obtain a p-type Bi—Sb alloy.

{(Bi100-xSbx)100-y▲EII y▼}100-z▲EI Z▼ ここで、EIはII族又はIV族元素を示し、EIIはIV・VI族
元素を示し、xは5〜20、yは0〜20、zは0.05〜10で
ある。(但し、上記合金組成を得るには、350〜800℃の
温度で完全に一液相となつている状態から急冷ロール法
などを用いて、強制固溶体を作製しなければならない場
合がある。) すなわち、本発明のBi-Sb系熱電材料は、Bi-Sb系母合金
として真性半導体となるBi100-xSbx(ここで、x=5〜
20)を採用すると共に、p型ドーパントとしてII族又は
IV族元素を0.05〜10at%添加し、また、実用に際して熱
電材料の性能を上げるため、必要に応じてIV・VI族元素
を0〜20at%添加するものである。なお、p型ドーパン
トとしてIV族元素を添加する場合には、上記IV・VI族元
素を添加する必要性はない。
{(Bi 100- xSbx) 100- y ▲ E II y ▼} 100- z ▲ E I Z ▼ Here, E I represents a Group II or IV group element, E II represents a IV / VI group element, x is 5 to 20, y is 0 to 20, and z is 0.05 to 10. (However, in order to obtain the above-mentioned alloy composition, it may be necessary to prepare a forced solid solution from the state of being completely in one liquid phase at a temperature of 350 to 800 ° C. by using a quenching roll method or the like.) That is, the Bi—Sb thermoelectric material of the present invention is a Bi 100- xSbx (where x = 5 to 5) that serves as an intrinsic semiconductor as a Bi—Sb master alloy.
20) is adopted, and a group II or p-type dopant is used.
The group IV element is added in an amount of 0.05 to 10 at%, and in order to improve the performance of the thermoelectric material in practical use, 0 to 20 at% of the group IV / VI element is added as necessary. When the group IV element is added as the p-type dopant, it is not necessary to add the group IV / VI element.

上記p型Bi-Sb合金は、本発明の方法に従つて、溶融状
態にあるBi-Sb系合金を非平衡相になりうる冷却速度で
凝固させることにより得られる。具体的には、第1図に
示すような装置において、溶湯溜4にBi-Sb系合金3を
装填し、高周波コイル2で加熱し、Bi-Sb系合金を溶融
状態とする。一方、金属製ロール1(φ200mm,巾20mm程
度)を500〜4000rpmで回転させ、溶湯溜4より不活性ガ
ス圧(0.5〜4kg/cm2)により溶湯をロールに噴出させて
冷却凝固させる。なお、急冷ロール法を用いなくとも、
平衡凝固より多量のp型ドーパントを添加できる急速凝
固の方法(例えば急冷粉末)でp型Bi-Sb合金を作製す
ることは可能であろう。また、上記急速ロール法におい
ては、製造条件をロール回転数500〜4000rpm,ガス噴射
圧0.5〜4kg/cm2の範囲に設定しないと、良質な急冷膜が
得られないので、好ましくは上記範囲に設定する。
The p-type Bi-Sb alloy is obtained by solidifying a Bi-Sb alloy in a molten state at a cooling rate capable of becoming a non-equilibrium phase according to the method of the present invention. Specifically, in the apparatus as shown in FIG. 1, the molten metal reservoir 4 is loaded with the Bi—Sb alloy 3 and heated by the high frequency coil 2 to bring the Bi—Sb alloy into a molten state. On the other hand, the metal roll 1 (φ200 mm, width of about 20 mm) is rotated at 500 to 4000 rpm, and the molten metal is jetted from the molten metal reservoir 4 by the inert gas pressure (0.5 to 4 kg / cm 2 ) to be cooled and solidified. In addition, without using the quenching roll method,
It would be possible to make p-type Bi-Sb alloys by rapid solidification methods (eg quench powders) that allow the addition of more p-type dopants than equilibrium solidification. Further, in the rapid roll method, unless the manufacturing conditions are set in the range of a roll speed of 500 to 4000 rpm and a gas injection pressure of 0.5 to 4 kg / cm 2 , a high quality quenching film cannot be obtained, and therefore, preferably in the above range. Set.

発明の作用 従来のブリツジマン法やゾーンメルテイング法では、p
型ドーパントが平衡凝固で固溶される量(数100ppm程
度)しか添加できないが、前記した本発明の方法による
と、平衡凝固量以上のp型ドーパントを添加することが
可能となり、その結果、従来作製不可能であつたp型Bi
-Sb合金が作製可能となる。
In the conventional Britzmann method or zone melting method, p
Although the type dopant can be added only in an amount (a few hundreds of ppm) that is solid-solved in equilibrium solidification, the above-described method of the present invention makes it possible to add more p-type dopant than the equilibrium solidification amount. P-type Bi that could not be manufactured
-Sb alloy can be manufactured.

すなわち、前記従来技術の項で説明したように、IV族元
素を平衡凝固で数100ppm添加されたBi-Sb合金は温度上
昇と共にp→n型へ反転するが(第4図参照)、本発明
に従つてBi100-xSbx(x=5〜20)の真性半導体にp型
ドーパントとしてIII族又はIV族元素を0.05〜10at%添
加することにより、77゜K〜室温にてp型伝導を示すBi-
Sb合金が得られる(第2,5〜7図参照)。
That is, as explained in the section of the prior art, the Bi—Sb alloy to which the group IV element is added by several hundred ppm by equilibrium solidification is inverted to p → n type with temperature rise (see FIG. 4). According to the above, by adding 0.05 to 10 at% of III or IV group element as a p-type dopant to the intrinsic semiconductor of Bi 100- xSbx (x = 5 to 20), p-type conduction is shown at 77 ° K to room temperature. Bi-
An Sb alloy is obtained (see Figures 2, 5-7).

これは、従来の方法によつて例えばp型ドーパントSnが
平衡凝固量以下添加されたBi-Sb合金の場合、低温では
p型ドーパントSnにより正孔濃度が電子濃度より高いた
めp型となるが、温度上昇と共に正孔と電子の濃度がほ
ぼ等しくなる真性伝導域になるため、移動度の大きな電
子が伝導を支配し、n型に反転するためで(第4図参
照)、同様の現象はSn以外のIV族元素Pbなどでも報告さ
れている(例えば、G.E.Smith及びR.Wolfe,Journal of
applied Physics ,Vol.33,841(1962))。これに対し
て、本発明のように平衡凝固量以上の0.05〜10at%のp
型ドーパントが添加された場合、添加されたIII族元素
(Al,Tl等)又はIV族元素(Sn,Pb等)により、室温近傍
でも以前正孔濃度の方が電子濃度より高い状態にあるた
め、P型伝導を示すと考えられる。
This is because, for example, in the case of a Bi-Sb alloy in which the p-type dopant Sn is added by an equilibrium solidification amount or less by a conventional method, the p-type dopant Sn has a higher hole concentration than the electron concentration at a low temperature, but the p-type dopant becomes p-type. , As the concentration of holes and electrons becomes almost equal as the temperature rises, the electrons with high mobility dominate conduction and invert to n-type (see FIG. 4). Group IV elements such as Pb other than Sn have also been reported (eg GESmith and R. Wolfe, Journal of
applied Physics, Vol.33,841 (1962)). On the other hand, as in the present invention, p of 0.05 to 10 at% above the equilibrium coagulation amount is used.
When the type dopant is added, the hole concentration is higher than the electron concentration before room temperature even near room temperature due to the added group III element (Al, Tl, etc.) or group IV element (Sn, Pb, etc.). , P-type conduction.

III族元素又はIV族元素の添加量が0.05at%未満となる
と室温近傍までp型伝導を示さなくなり、一方、上記元
素の添加量を10at%より多くすることは実用的に不適当
である。(実用的には、キヤリア濃度を1019〜1020程度
に制御する。) また、本発明のp型Bi-Sb合金には、実用に際し熱電材
料の熱伝導度を下げ、性能向上を図るために、p型伝導
を損なわない範囲でIV・VI族元素を添加してもよい。当
然のこと乍ら、IV・VI族元素は添加しなくてもよい。IV
・VI族元素の添加量は、20at%を超えるとBi-Sb系合金
としての熱電能が損なわれるため好ましくない。
If the addition amount of the group III element or the group IV element is less than 0.05 at%, p-type conductivity will not be exhibited up to around room temperature, while it is not practically appropriate to add the above element more than 10 at%. (Practically, the carrier concentration is controlled to about 10 19 to 10 20. ) In addition, in the p-type Bi-Sb alloy of the present invention, in order to reduce the thermal conductivity of the thermoelectric material in order to improve the performance. In addition, IV / VI group elements may be added to the extent that p-type conduction is not impaired. As a matter of course, the IV / VI group element may not be added. IV
The addition amount of the group VI element exceeding 20 at% is not preferable because the thermoelectric power of the Bi-Sb alloy is impaired.

実 施 例 以下、実施例及び比較例を示して本発明について具体的
に説明する。なお、本発明が下記実施例により何ら限定
されるものでないことはもとよりである。
Examples Hereinafter, the present invention will be specifically described with reference to Examples and Comparative Examples. Needless to say, the present invention is not limited to the examples below.

実施例1 Bi88Sb12の組成をもつBi-Sb合金にp型ドーパントとし
てSnを1at%添加し、約600℃に加熱し、均一な液相状態
とした(1atm前後のAr雰囲気中)。この状態より、約10
00rpmで回転するCu製ロールにガス噴射圧約1.0kg/cm2
溶湯を噴きつけ、長さ約20mm、巾約2mm、厚さ約30μの
薄膜を作製した。
Example 1 1 at% of Sn was added as a p-type dopant to a Bi-Sb alloy having a composition of Bi 88 Sb 12 , and the mixture was heated to about 600 ° C to obtain a uniform liquid phase state (in an Ar atmosphere of about 1 atm). From this state, about 10
The molten metal was sprayed at a gas injection pressure of about 1.0 kg / cm 2 onto a Cu roll rotating at 00 rpm to prepare a thin film having a length of about 20 mm, a width of about 2 mm and a thickness of about 30 μ.

得られた膜のゼーベツク定数を測定したところ、第2図
に示す結果が得られた。
When the Seebeck constant of the obtained film was measured, the results shown in FIG. 2 were obtained.

比較例1 Bi88Sb12の組成をもつ急冷薄膜を実施例1と同様の方法
で作製し、ゼーベツク定数を測定したところ、第3図に
示す結果が得られた。
Comparative Example 1 A quenched thin film having a composition of Bi 88 Sb 12 was prepared in the same manner as in Example 1, and the Seebeck constant was measured. The results shown in FIG. 3 were obtained.

比較例2 実施例1と同じ組成の合金を約600℃で均一な液相状態
とし、ブリツジマン法によつて温度勾配約40℃/cm、凝
固速度0.75mm/hrで凝固させ、直径10mm、長さ150mmのBi
-Sb素子を作製した。
Comparative Example 2 An alloy having the same composition as in Example 1 was brought into a uniform liquid phase state at about 600 ° C. and solidified by the Britzmann method at a temperature gradient of about 40 ° C./cm and a solidification rate of 0.75 mm / hr to obtain a diameter of 10 mm and a length of 10 mm. 150mm Bi
-The Sb element was produced.

素子の中央部のゼーベツク定数を測定したところ、第4
図に示す結果が得られた。
When the Seebeck constant in the central part of the device was measured,
The results shown in the figure were obtained.

第2図から明らかなように、実施例1で作製された合金
薄膜((Bi88Sb1299Sn1の組成をもつ溶湯を急例法で
凝固させた薄膜)のゼーベツク定数は、77゜K〜室温ま
で正、すなわちp型伝導となつている。これに対し、第
3図に示されるように、比較例1のBi88Sb12の組成をも
つ合金は、77゜K〜室温までゼーベツク定数が負、すな
わちn型となつている。(これは、p型ドーパントを含
まないBi100-xSbx,x=5〜20の合金でも同様である。) 一方、比較例2において、(Bi88Sb1299Sn1の組成を
もつ溶湯よりブリツジマン法で作製した素子(実際は、
ブリツジマン法で作製すると、Bi88Sb12にSnは約0.03at
%しか固溶しないため、(Bi88Sb1299Sn1の組成は作
製不可能であり、Bi88Sb12にSnを0.03at%含む単結晶と
なる)のゼーベツク定数は、第4図に示すように、温度
上昇と共に正から負へ、すなわちp型からn型へ反転し
ている。
As is apparent from FIG. 2, the Seebeck constant of the alloy thin film prepared in Example 1 (thin film obtained by solidifying the molten metal having the composition of (Bi 88 Sb 12 ) 99 Sn 1 by the sudden method) is 77 °. Positive from K to room temperature, that is, p-type conduction. On the other hand, as shown in FIG. 3, the alloy having the composition of Bi 88 Sb 12 of Comparative Example 1 has a negative Seebeck constant from 77 ° K to room temperature, that is, has an n-type. (This also applies to an alloy of Bi 100- xSbx, x = 5 to 20 containing no p-type dopant.) On the other hand, in Comparative Example 2, a molten metal having a composition of (Bi 88 Sb 12 ) 99 Sn 1 was used. Device manufactured by Britzmann method (actually,
When manufactured by the Britzmann method, Bi 88 Sb 12 has Sn of about 0.03 at.
%, The composition of (Bi 88 Sb 12 ) 99 Sn 1 cannot be prepared, and the single crystal containing Bi 88 Sb 12 containing 0.03 at% Sn is shown in Fig. 4. As shown, the temperature changes from positive to negative, that is, from p-type to n-type.

実施例2 {(Bi88Sb1295(PbSe)99Ga1の組成をもつ急冷
薄膜を実施例1の同様の方法で作製し、ゼーベツク定数
を測定したところ、第5図に示す結果が得られた。
Example 2 A quenched thin film having a composition of {(Bi 88 Sb 12 ) 95 (PbSe) 5 } 99 Ga 1 was prepared in the same manner as in Example 1, and the Seebeck constant was measured. The results shown in FIG. 5 were obtained. was gotten.

実施例3 {(Bi88Sb1295(PbTe)99Tl1の組成をもつ急例
薄膜を実施例1と同様の方法で作製し、ゼーベツク定数
を測定したところ、第6図に示す結果が得られた。
Example 3 An example thin film having a composition of {(Bi 88 Sb 12 ) 95 (PbTe) 5 } 99 Tl 1 was prepared in the same manner as in Example 1, and the Seebeck constant was measured. The result is shown in FIG. Results were obtained.

実施例4 {(Bi88Sb1294(PbSe)99Al1の組成をもつ急冷
薄膜を実施例1と同様の方法で作製し、ゼーベツク定数
を測定したところ、第7図に示す結果が得られた。
Example 4 A quenched thin film having a composition of {(Bi 88 Sb 12 ) 94 (PbSe) 6 } 99 Al 1 was prepared in the same manner as in Example 1, and the Seebeck constant was measured. The results shown in FIG. 7 were obtained. was gotten.

発明の効果 以上のように、本発明の急冷方法によつて、Bi-Sb系母
合金としての真性半導体となるBi100-xSbx(x=5〜2
0)にp型ドーパントとしてのIII族又はIV族元素を0.05
〜10at%添加したBi-Sb系合金が得られ、この合金は、
従来作製できなかつた極低温(77゜K)から室温近傍ま
でp型伝導を示すp型Bi-Sb合金である。従つて、本発
明のp型Bi-Sb合金を従来のn型Bi-Sb合金と組み合わ
せ、電子冷却モジユールの脚部材料として用いることに
より、現在のBiTe系材料を用いた電子冷却での最大冷却
可能温度約−100℃(marlow社製M16030)を一気に−200
℃近くまで下げることが可能となるなど、多大の利点、
応用効果が得られる。
Effects of the Invention As described above, according to the quenching method of the present invention, Bi 100- xSbx (x = 5 to 2) becomes an intrinsic semiconductor as a Bi-Sb based master alloy.
0) contains a group III or IV element as a p-type dopant of 0.05
Bi-Sb alloy with ~ 10at% added was obtained.
It is a p-type Bi-Sb alloy that shows p-type conductivity from extremely low temperatures (77 ° K) to near room temperature, which could not be produced conventionally. Therefore, by combining the p-type Bi-Sb alloy of the present invention with the conventional n-type Bi-Sb alloy and using it as the leg material of the electronic cooling module, the maximum cooling by electronic cooling using the current BiTe-based material is achieved. Possible temperature about -100 ℃ (marlow M16030) at a stretch -200
It is a great advantage that it can be lowered to near ℃,
Applied effects can be obtained.

【図面の簡単な説明】[Brief description of drawings]

第1図は、本発明の方法を実施する装置の一実施例を示
す概略構成図、第2図は本発明の実施例1で得られたp
型Bi-Sb合金薄膜のゼーベツク定数の温度変化を示すグ
ラフ、第3図は比較例1で得られた従来のn型Bi-Sb合
金薄膜のゼーベツク定数の温度変化を示すグラフ、第4
図はブリツジマン法で作製されたBi-Sb素子のゼーベツ
ク定数の温度変化を示すグラフ、第5図乃至第7図は実
施例2〜4で作製されたp型Bi-Sb合金薄膜のゼーベツ
ク定数の温度変化を示すグラフである。 1は金属製ロール、2は高周波コイル、3はBi-Bb系合
金、4は溶湯溜。
FIG. 1 is a schematic configuration diagram showing an embodiment of an apparatus for carrying out the method of the present invention, and FIG. 2 is a p obtained in Embodiment 1 of the present invention.
4 is a graph showing the temperature change of the Seebeck constant of the n-type Bi-Sb alloy thin film, and FIG. 3 is a graph showing the temperature change of the zebeck constant of the conventional n-type Bi-Sb alloy thin film obtained in Comparative Example 1.
The figure is a graph showing the temperature change of the Seebeck constant of the Bi-Sb element produced by the Britzmann method, and FIGS. 5 to 7 show the Seebeck constant of the p-type Bi-Sb alloy thin films produced in Examples 2 to 4. It is a graph which shows a temperature change. 1 is a metal roll, 2 is a high frequency coil, 3 is a Bi-Bb alloy, and 4 is a molten metal pool.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】{(Bi100-xSbx)100-y▲EII y▼}100-z
▲EI z▼ (但し、式中EIはIII族又はIV族元素を示し、EIIはIV・
VI族元素を示し、xは5〜20、yは0〜20、zは0.05〜
10である。) で示される組成を持つBi-Sb系熱電材料。
1. {(Bi 100- xSbx) 100- y ▲ E II y ▼} 100- z
▲ E I z ▼ (where E I is a group III or IV element, and E II is IV.
VI group element, x is 5 to 20, y is 0 to 20, z is 0.05 to
Is 10. ) A Bi-Sb-based thermoelectric material having the composition shown in.
【請求項2】前記式において、EIがIV族元素であり、か
つyが0である特許請求の範囲第1項に記載の熱電材
料。
2. The thermoelectric material according to claim 1, wherein E I is a Group IV element and y is 0 in the above formula.
【請求項3】溶融状態にあるBi-Sb系合金を非平衡相に
なりうる冷却速度で凝固させることを特徴とするBi-Sb
系熱電材料の製造方法。
3. A Bi-Sb alloy characterized in that a Bi-Sb alloy in a molten state is solidified at a cooling rate capable of becoming a non-equilibrium phase.
Of manufacturing thermoelectric material.
【請求項4】溶融状態にあるBi-Sb系合金を、500〜4000
prmで回転する金属製ロールに噴射圧0.5〜4kg/cm2で噴
きつけることによつて冷却凝固させる特許請求の範囲第
3項に記載の方法。
4. A Bi-Sb alloy in a molten state is added in an amount of 500 to 4000.
The method according to claim 3, wherein cooling and solidification is carried out by spraying at a spray pressure of 0.5 to 4 kg / cm 2 onto a metal roll rotating at prm.
JP61035337A 1986-02-21 1986-02-21 Low temperature thermoelectric material and method for producing the same Expired - Lifetime JPH0684529B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP61035337A JPH0684529B2 (en) 1986-02-21 1986-02-21 Low temperature thermoelectric material and method for producing the same
US07/016,265 US4764212A (en) 1986-02-21 1987-02-19 Thermoelectric material for low temperature use and method of manufacturing the same
EP87102425A EP0235702B1 (en) 1986-02-21 1987-02-20 Thermoelectric material for low temperature use and method of manufacturing the same
DE8787102425T DE3767892D1 (en) 1986-02-21 1987-02-20 THERMOELECTRIC MATERIAL, APPLICABLE TO LOW TEMPERATURES AND METHOD FOR THE PRODUCTION THEREOF.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61035337A JPH0684529B2 (en) 1986-02-21 1986-02-21 Low temperature thermoelectric material and method for producing the same

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JPH0684529B2 true JPH0684529B2 (en) 1994-10-26

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01279724A (en) * 1988-05-02 1989-11-10 Nippon Mining Co Ltd Electronic refrigerating elemental material and its manufacture
JP2729964B2 (en) * 1989-04-06 1998-03-18 株式会社小松製作所 Thermoelectric material for low temperature
JP3092463B2 (en) * 1994-10-11 2000-09-25 ヤマハ株式会社 Thermoelectric material and thermoelectric conversion element

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
ALLOYS FOR MAGENETO-THERMOELECTRIC AND THERMOMAGNETIC COOLING=1972 *

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Publication number Publication date
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