JPH0688025B2 - Ultrafiltration membrane device sterilization method - Google Patents
Ultrafiltration membrane device sterilization methodInfo
- Publication number
- JPH0688025B2 JPH0688025B2 JP61074265A JP7426586A JPH0688025B2 JP H0688025 B2 JPH0688025 B2 JP H0688025B2 JP 61074265 A JP61074265 A JP 61074265A JP 7426586 A JP7426586 A JP 7426586A JP H0688025 B2 JPH0688025 B2 JP H0688025B2
- Authority
- JP
- Japan
- Prior art keywords
- water
- ultrafiltration membrane
- pure water
- membrane device
- treated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000012528 membrane Substances 0.000 title claims description 52
- 238000000108 ultra-filtration Methods 0.000 title claims description 46
- 230000001954 sterilising effect Effects 0.000 title claims description 40
- 238000004659 sterilization and disinfection Methods 0.000 title claims description 37
- 238000000034 method Methods 0.000 title claims description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 119
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 10
- 239000012498 ultrapure water Substances 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 241000894006 Bacteria Species 0.000 description 13
- 238000003860 storage Methods 0.000 description 13
- 238000004140 cleaning Methods 0.000 description 11
- 239000010419 fine particle Substances 0.000 description 10
- 239000000126 substance Substances 0.000 description 7
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 239000007800 oxidant agent Substances 0.000 description 4
- 239000012466 permeate Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 239000012510 hollow fiber Substances 0.000 description 2
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 2
- 238000001223 reverse osmosis Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 239000005708 Sodium hypochlorite Substances 0.000 description 1
- 230000001112 coagulating effect Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- -1 spirals Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
Description
【発明の詳細な説明】 <産業上の利用分野> 本発明は限外濾過膜装置を用いて被処理水中の微粒子,
コロイダル物質,高分子有機物,発熱性物質等を除去す
る際に、処理の続行により、限外濾過膜あるいは限外濾
過膜装置の透過水をユースポイントに供給する循環配管
等に細菌類が繁殖してユースポイントから得られる超純
水中に生菌あるいは微粒子が漏洩したりする際における
限外濾過膜装置の殺菌方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION <Industrial field of application> The present invention uses an ultrafiltration membrane device to produce fine particles in water to be treated,
When removing colloidal substances, high molecular weight organic substances, exothermic substances, etc., by continuing the treatment, bacteria will propagate in the ultrafiltration membrane or the circulation pipe that supplies the permeated water of the ultrafiltration membrane device to the point of use. The present invention relates to a method for sterilizing an ultrafiltration membrane device when viable bacteria or fine particles leak into ultrapure water obtained from a point of use.
<従来の技術> 従来から平膜状,管膜状,スパイラル状,中空糸状など
の種々の限外濾過膜を装着した限外濾過膜装置は被処理
水中の微粒子,コロイダル物質,高分子有機物,発熱性
物質等を除去する目的で用いられているが、近年におい
てLSIや超LSIを生産する電子工業における半導体ウエハ
ーまたはチップ(以下半導体ウエハーという)の洗浄用
水としての超純水の製造に用いられることが多い。<Prior Art> Conventional ultrafiltration membrane devices equipped with various ultrafiltration membranes such as flat membranes, tubular membranes, spirals, and hollow fibers have been known to be fine particles in treated water, colloidal substances, high molecular organic matter, It is used to remove exothermic substances, etc., but in recent years it has been used to produce ultrapure water as cleaning water for semiconductor wafers or chips (hereinafter referred to as semiconductor wafers) in the electronics industry that produces LSI and VLSI. Often.
かかる半導体ウエハーの洗浄用水は通常、以下のような
フローで製造される。すなわち原水を凝集沈殿装置,砂
濾過機,活性炭濾過機,逆浸透膜装置,2床2塔式純水製
造装置,混床式ポリシャー,精密フィルターなどの一次
側純水装置で処理して純水を得、次いで半導体ウエハー
を洗浄する直前で前記一次純水を第2図に示したような
二次側純水装置で処理する。Water for cleaning such semiconductor wafers is usually produced by the following flow. That is, the raw water is treated with a primary-side pure water device such as a coagulating sedimentation device, a sand filter, an activated carbon filter device, a reverse osmosis membrane device, a two-bed two-tower pure water production device, a mixed-bed polisher, and a precision filter. Immediately before cleaning the semiconductor wafer, the primary pure water is treated with a secondary-side pure water device as shown in FIG.
すなわち一旦純水槽2に貯留した当該純水1を混床式ポ
リシャー3,紫外線照射装置4,限外濾過膜装置5で処理
し、一次純水中に残留するイオン,微粒子,コロイダル
物質,生菌等を可及的に除去して、いわゆる超純水とす
るものである。なお限外濾過膜装置5の透過水である超
純水は循環配管6によって、一点鎖線で囲んだユースポ
イント7まで供給し、ここで洗浄用水として使用し、残
余の透過水は純水槽2に循環する。なお限外濾過膜装置
5の非透過水も通常、非透過水循環配管8により純水槽
2に戻される。That is, the pure water 1 once stored in the pure water tank 2 is treated by the mixed bed polisher 3, the ultraviolet irradiation device 4, and the ultrafiltration membrane device 5, and the ions, fine particles, colloidal substances, and viable bacteria remaining in the primary pure water are treated. Etc. are removed as much as possible to obtain so-called ultrapure water. The ultrapure water which is the permeated water of the ultrafiltration membrane device 5 is supplied to the use point 7 surrounded by the one-dot chain line by the circulation pipe 6 and used as cleaning water here, and the remaining permeated water is supplied to the pure water tank 2. Circulate. The non-permeated water of the ultrafiltration membrane device 5 is also normally returned to the pure water tank 2 through the non-permeated water circulation pipe 8.
このような用途に用いられる限外濾過膜装置5は、その
被処理水が一次側純水装置で得られる純水であるにもか
かわらず、また直前で紫外線照射を行っているにもかか
わらず、長時間の透過処理によって、ユースポイント7
から得られる超純水の品質が低下し、特に生菌数や微粒
子数が増加する。In the ultrafiltration membrane device 5 used for such an application, although the water to be treated is pure water obtained by the primary side pure water device, and is irradiated with ultraviolet rays immediately before. Use point 7 by long-time transparent processing
The quality of the ultrapure water obtained from the product deteriorates, and in particular the number of viable bacteria and fine particles increases.
この原因は、当該限外濾過膜装置5の被処理水である純
水中に紫外線に耐性を有する一般細菌が膜面等に繁殖す
るためと考えられる。It is considered that this is because general bacteria having resistance to ultraviolet light propagate in pure water, which is the water to be treated of the ultrafiltration membrane device 5, on the membrane surface or the like.
したがって使用する限外濾過膜が上述のような汚染を受
けた場合、何らかの殺菌処理をする必要がある。Therefore, when the ultrafiltration membrane to be used is contaminated as described above, it is necessary to perform some sterilization treatment.
従来から行われている限外濾過膜の殺菌処理は、1〜5
%の過酸化水素水、または次亜塩素酸ソーダ溶液等の酸
化剤に浸漬したりあるいは通液洗浄する方法などがある
が、かかる酸化剤を用いる殺菌処理は限外濾過膜あるい
は装置の構成部材を劣化させたり、また殺菌処理後の洗
浄に多量の純水を使用するなどの欠点がある。さらに比
較的多量の酸化剤を用いるのでその薬品費およびその廃
液処理コストも高いという問題がある。The conventional sterilization treatment of the ultrafiltration membrane is 1 to 5
% Hydrogen peroxide solution, or a method of immersing in an oxidizing agent such as sodium hypochlorite solution, or washing by passing it through, the sterilization treatment using such an oxidizing agent is an ultrafiltration membrane or a component member of the apparatus. Is deteriorated, and a large amount of pure water is used for cleaning after sterilization. Furthermore, since a relatively large amount of oxidant is used, there is a problem that the chemical cost and the waste liquid treatment cost are high.
一方限外濾過膜や装置の構成部材を劣化させず、かつ殺
菌処理後の洗浄も比較的容易に行える殺菌処理として、
限外濾過膜を熱水で洗浄する方法も行われている。On the other hand, as a sterilization treatment that does not deteriorate the ultrafiltration membrane and the components of the device and that can be washed relatively easily after the sterilization treatment,
A method of washing the ultrafiltration membrane with hot water is also used.
従来の熱水による殺菌処理は以下のようにして行われて
いる。The conventional sterilization treatment with hot water is performed as follows.
すなわち第2図中の点線は殺菌処理ラインを示してお
り、予め紫外線照射装置4の処理水を貯留槽9に貯留し
ておき、殺菌処理するにあたっては、当該貯留槽9内の
純水を熱交換器10を用いて間接的に加熱し、通常90℃前
後の熱水となし、当該熱水を限外濾過膜装置5に透過処
理する方向と同じ方向で通し、非透過熱水および透過熱
水をブローあるいは貯留槽9に循環するものである。That is, the dotted line in FIG. 2 indicates the sterilization treatment line, and the treated water of the ultraviolet irradiation device 4 is stored in the storage tank 9 in advance, and when performing the sterilization treatment, the pure water in the storage tank 9 is heated. It is indirectly heated by using the exchanger 10 to form hot water of about 90 ° C., and the hot water is passed through the ultrafiltration membrane device 5 in the same direction as the permeation treatment to obtain non-permeated hot water and permeated heat. The water is blown or circulated in the storage tank 9.
しかしながら従来の熱水による殺菌は循環配管6に熱水
が接触しないので、当該循環配管6の水が停滞し易い箇
所に一般細菌が繁殖していてもこれを殺菌できないとい
う不具合がある。したがって限外濾過膜装置5の殺菌処
理後に処理を再開しても、ユースポイント7から流出す
る超純水の特に生菌数や微粒子数がそれ程低下しないと
いう欠点を有している。However, in the conventional sterilization with hot water, the hot water does not come into contact with the circulation pipe 6, so that there is a problem that even if general bacteria are propagated in a portion of the circulation pipe 6 where water is easily stagnant, this cannot be sterilized. Therefore, even if the treatment is restarted after the sterilization treatment of the ultrafiltration membrane device 5, there is a drawback in that the number of viable bacteria and the number of fine particles of the ultrapure water flowing out from the use point 7 does not decrease so much.
<発明が解決しようとする問題点> 本発明は限外濾過膜装置5および循環配管に一般細菌が
繁殖したりしてその処理性能が低下した際の従来の殺菌
処理の欠点を解決するもので、限外濾過膜あるいは装置
の構成部材を劣化させず、殺菌処理後の洗浄を容易に行
うことができ、かつ循環配管も併せて殺菌でき、低コス
トで処理効果の優れた殺菌方法を提供することを目的と
する。<Problems to be Solved by the Invention> The present invention is to solve the drawbacks of the conventional sterilization treatment when general bacteria propagate in the ultrafiltration membrane device 5 and the circulation pipe and the treatment performance thereof deteriorates. The present invention provides a sterilization method that does not deteriorate the ultrafiltration membrane or the constituent members of the device, can be easily washed after the sterilization treatment, and can also sterilize the circulation piping, and is low in cost and has an excellent treatment effect. The purpose is to
<問題点を解決するための手段> 本発明は一次側純水製造装置で得た純水を純水槽で一旦
受け、当該純水を少なくとも紫外線照射装置で処理した
後、限外濾過膜装置で処理し、その処理水を循環配管を
用いて前記純水槽へ循環するとともに、当該循環配管の
系路中にユースポイントを設け、当該ユースポイントか
ら処理水を必要量供給する超純水の製造方法における前
記限外濾過膜装置を殺菌処理するにあたり、当該限外濾
過膜装置の供給水を加熱して70℃以上の熱水となし、当
該熱水を限外濾過膜装置に供給して透過処理し、その熱
透過水を前記循環配管に通流し、前記ユースポイントを
通過させ、ユースポイントの下流側で放流することを特
徴とする限外濾過膜装置の殺菌方法である。<Means for Solving Problems> In the present invention, the pure water obtained by the primary side pure water producing apparatus is once received in a pure water tank, and the pure water is treated with at least an ultraviolet irradiating apparatus, and then the ultrafiltration membrane apparatus is used. A method for producing ultrapure water that treats the treated water and circulates the treated water to the pure water tank by using a circulation pipe, and provides a use point in the system of the circulation pipe to supply a required amount of the treated water from the use point. In sterilizing the ultrafiltration membrane device in, heat the feed water of the ultrafiltration membrane device to hot water of 70 ℃ or more, supply the hot water to the ultrafiltration membrane device and permeate treatment Then, the heat permeable water is passed through the circulation pipe, passed through the point of use, and discharged at the downstream side of the point of use, which is a sterilization method for an ultrafiltration membrane device.
<作用> 以下に本発明を図面に基づいて詳細に説明する。<Operation> The present invention will be described in detail below with reference to the drawings.
第1図は本発明の実施態様の一例を示すフローの説明図
であり、第2図と同様に点線は殺菌処理ラインを示して
いる。FIG. 1 is an explanatory diagram of a flow showing an example of an embodiment of the present invention, and a dotted line shows a sterilization treatment line as in FIG.
まず純水槽2の純水を透過処理する場合は、従来と同じ
ように純水槽2の純水を混床式ポリシャー3、紫外線照
射装置4、限外濾過膜装置5で処理し、その透過水を循
環配管6を介して純水槽2に循環するとともに非透過水
も非透過水循環配管8を用いて純水槽2に戻す。またユ
ースポイント7において必要とされる超純水が採水さ
れ、半導体ウエハー等の洗浄用水として用いられる。First, when the pure water in the pure water tank 2 is permeated, the pure water in the pure water tank 2 is treated by the mixed-bed polisher 3, the ultraviolet irradiation device 4, and the ultrafiltration membrane device 5 as in the conventional case, and the permeated water is then treated. Is circulated to the pure water tank 2 through the circulation pipe 6, and non-permeated water is also returned to the pure water tank 2 using the non-permeated water circulation pipe 8. Ultrapure water required at the use point 7 is sampled and used as cleaning water for semiconductor wafers and the like.
次に本発明における熱水による殺菌処理は以下の通りに
行われる。Next, the sterilization treatment with hot water in the present invention is performed as follows.
すなわち前記透過処理中に貯留槽9に予め限外濾過膜装
置5の供給水を貯留しておく。That is, the water supplied to the ultrafiltration membrane device 5 is previously stored in the storage tank 9 during the permeation treatment.
殺菌処理にあたっては、貯留槽9内の供給水を熱交換器
10によって間接的に加熱して温度約90℃前後の熱水と
し、当該熱水を限外濾過膜装置5に透過処理と同じ方向
に供給する。次いでその熱透過水を循環配管6に長し、
ユースポイント7を通過させ、その後ブロー管11より系
外にブローする。なお場合によってはユースポイント7
を通過させた熱透過水を貯留槽9に回収することもで
き、あるいは純水槽2に送給し、熱透過水を純水槽を介
して系外にブローすることもできる。In the sterilization process, the feed water in the storage tank 9 is used as a heat exchanger.
It is indirectly heated by 10 to obtain hot water having a temperature of about 90 ° C., and the hot water is supplied to the ultrafiltration membrane device 5 in the same direction as the permeation treatment. Then, the heat permeable water is lengthened to the circulation pipe 6,
After passing through the use point 7, the blow pipe 11 blows it out of the system. In some cases, youth point 7
The heat permeable water that has passed through can be collected in the storage tank 9, or can be fed to the pure water tank 2 and blown out of the system through the pure water tank.
なお限外濾過膜装置5に供給した熱水の一部は非透過熱
水としてブローする。A part of the hot water supplied to the ultrafiltration membrane device 5 is blown as non-permeated hot water.
熱水の温度としては70℃以上が好ましく、通常は90℃前
後とする。なお70℃以下の温度では回生効果が小さくな
るので好ましくない。The temperature of the hot water is preferably 70 ° C or higher, and usually around 90 ° C. It should be noted that a temperature of 70 ° C. or lower is not preferable because the regenerative effect becomes small.
次に洗浄時間は少なくとも15分以上とすることが必要
で、通常は30分前後で充分である。Next, the cleaning time must be at least 15 minutes or more, and about 30 minutes is usually sufficient.
なお第1図に示した実施態様においては、限外濾過膜装
置の供給水を予め貯留槽9に貯留し、この貯留した供給
水を熱水として殺菌処理に用いたが、供給水を直接熱交
換器によって加熱して熱水を製造することにより、貯留
槽9を省略することが可能である。In the embodiment shown in FIG. 1, the feed water of the ultrafiltration membrane device was previously stored in the storage tank 9, and the stored feed water was used as hot water for sterilization treatment. The storage tank 9 can be omitted by heating with an exchanger to produce hot water.
<効果> 以上説明したごとく本発明は熱水を限外濾過膜に通すの
で、膜面に付着あるいは繁殖している汚染物あるいは一
般細菌を熱水により効果的に剥離かつ殺菌することがで
き、さらに熱透過水を循環配管6に通流し、ユースポイ
ント7を通過させてユースポイント7の下流側で放流す
るので、たとえ循環配管6に一般細菌が繁殖していても
これを効果的に殺菌することができ、殺菌処理後におい
て、微粒子数および生菌数の極めて少ない超純水をユー
スポイント7から得ることができる。また本発明による
殺菌は酸化剤を用いないので装置の構成部材を劣化させ
ることもなく、また特に洗浄廃液の処理をする必要もな
い。<Effect> As described above, since the present invention allows hot water to pass through the ultrafiltration membrane, contaminants or general bacteria adhering to or growing on the membrane surface can be effectively stripped and sterilized by hot water. Further, the heat permeable water is passed through the circulation pipe 6, passes through the use point 7 and is discharged downstream of the use point 7, so that even if general bacteria propagate in the circulation pipe 6, this is effectively sterilized. Therefore, after the sterilization treatment, it is possible to obtain ultrapure water having a very small number of fine particles and viable bacteria from the use point 7. In addition, since the sterilization according to the present invention does not use an oxidizing agent, the constituent members of the apparatus are not deteriorated, and it is not particularly necessary to treat the cleaning waste liquid.
以下に本発明の効果をより明確とするために実施例を説
明する。Examples will be described below in order to clarify the effects of the present invention.
実施例 除濁濾過装置で除濁した原水を逆浸透膜装置で処理した
後、2床3塔式純水製造装置で処理し、その処理水を真
空脱気塔で脱気後、混床式純水製造装置で処理し、これ
を精密濾過器(0.45μm)にて濾過した純水を純水槽へ
貯水した。Example Raw water turbidized by a turbidity filtration device was treated by a reverse osmosis membrane device, then treated by a two-bed, three-column type pure water production device, and the treated water was deaerated by a vacuum deaeration tower, and then a mixed-bed type Pure water filtered by a microfilter (0.45 μm) was stored in a pure water tank.
この純水を混床式ポリシャー、紫外線照射装置で処理し
た後、ポリスルホン系中空糸状限外濾過膜を装着した限
外濾過膜装置へ送水した。This pure water was treated with a mixed bed polisher and an ultraviolet irradiation device, and then fed to an ultrafiltration membrane device equipped with a polysulfone-based hollow fiber ultrafiltration membrane.
上記の通常運転の500時間経過後に従来法の2%の過酸
化水素による限外濾過膜装置のみの殺菌洗浄を行った。After 500 hours from the above-mentioned normal operation, only the ultrafiltration membrane device was sterilized and washed by the conventional method with 2% hydrogen peroxide.
すなわち紫外線照射装置後の純水を予め貯留してある貯
留槽中の純水に過酸化水素水を添加し、濃度2%の過酸
化水素水とし透過処理する方向と同じ方向で限外濾過膜
装置に60分間供給して殺菌処理した。なお当該洗浄にお
ける透過液、非透過液ともに貯留槽に循環して再使用し
た。That is, an ultrafiltration membrane is added in the same direction as the direction in which hydrogen peroxide water is added to pure water in a storage tank in which pure water after the UV irradiation device is stored in advance to make it a hydrogen peroxide solution having a concentration of 2%. The device was supplied for 60 minutes for sterilization. Both the permeated liquid and the non-permeated liquid in the cleaning were circulated in the storage tank and reused.
また従来法である熱水による限外濾過膜装置のみの殺菌
洗浄を行った。In addition, only the ultrafiltration membrane device was sterilized and washed with hot water, which is a conventional method.
すなわち第2図のフローに準じて、紫外線照射装置後の
純水を予め貯留してある貯留槽から純水を取り出し、こ
れを熱交換器によって90℃に加熱し、当該熱水を透過処
理する方向と同じ方向で限外濾過膜装置に30分間供給し
て殺菌処理した。That is, in accordance with the flow of FIG. 2, the pure water after the ultraviolet irradiation device is taken out from the storage tank in which the pure water is stored in advance, and the pure water is heated to 90 ° C. by a heat exchanger to permeate the hot water. In the same direction as the direction, it was supplied to the ultrafiltration membrane device for 30 minutes and sterilized.
一次純水およびユースポイントにおける運転当初の透過
水および500時間経過時の透過水および上述した従来法
による殺菌処理直後の透過水および当該殺菌処理から50
0時間経過時の透過水の微粒子数、生菌数、比抵抗値は
第1表に示した通りであった。50% from the primary pure water, the permeated water at the beginning of operation at the point of use, the permeated water after 500 hours have passed, and the permeated water immediately after the above-mentioned conventional sterilization treatment and the sterilization treatment.
The number of fine particles of permeated water, the number of viable bacteria, and the specific resistance value after 0 hours were as shown in Table 1.
次に前記従来法(熱水処理)による殺菌処理から500時
間経過した際に本発明の殺菌方法を実施した。Next, the sterilization method of the present invention was carried out when 500 hours had elapsed from the sterilization treatment by the conventional method (hot water treatment).
すなわち第1図のフローに準じて、紫外線照射装置後の
純水を予め貯留してある貯留槽から純水を取り出し、こ
れを熱交換器によって90℃に加熱し、当該熱水を透過処
理する方向と同じ方向で限外濾過膜装置に30分間供給し
て殺菌処理し、この際得られる非透過熱水はブローし、
またその熱透過水を循環配管に通しユースポイントを通
過させた後、系外にブローした。That is, according to the flow of FIG. 1, the pure water after the ultraviolet irradiation device is taken out from a storage tank in which the pure water is stored in advance, and the pure water is heated to 90 ° C. by a heat exchanger to permeate the hot water. It is sterilized by supplying it to the ultrafiltration membrane device for 30 minutes in the same direction, and the non-permeated hot water obtained at this time is blown,
The heat-permeable water was passed through the circulation pipe to pass the point of use and then blown out of the system.
本発明方法による殺菌処理直後および、当該殺菌処理か
ら500時間経過時の微粒子数、生菌数、比抵抗値を第1
表に示した。Immediately after the sterilization treatment by the method of the present invention and 500 hours after the sterilization treatment, the number of fine particles, the number of viable bacteria, and the specific resistance value are
Shown in the table.
また従来の方法である2%の過酸化水素水を用いて殺菌
を行い、その終了直後から限外濾過膜の透過水の比抵抗
が17MΩ−cmに達するまでに要した時間と、本発明によ
って殺菌し、その終了直後から透過水の比抵抗が17MΩ
−cmに到達するまでに要した時間とを第2表に示した。In addition, according to the present invention, the sterilization was performed using 2% hydrogen peroxide water, which is a conventional method, and the time required from the end of the sterilization until the specific resistance of the permeated water of the ultrafiltration membrane reaches 17 MΩ-cm. Sterilized and the permeated water has a resistivity of 17 MΩ immediately after the sterilization.
Table 2 shows the time required to reach -cm.
以上の実施例で示されるごとく、本発明による殺菌方法
は従来法による殺菌方法と比較して微粒子数、生菌数と
もに少ない透過水を得ることができ、また過酸化水素水
による殺菌方法と比較して、殺菌処理後の洗浄が短時間
であり、洗浄のために消費される純水量が極めて少な
い。 As shown in the above examples, the sterilization method according to the present invention can obtain permeated water in both the fine particle number and the viable cell count as compared with the sterilization method according to the conventional method, and compared with the sterilization method using hydrogen peroxide solution. Then, the cleaning after the sterilization treatment is short, and the amount of pure water consumed for the cleaning is extremely small.
第1図は本発明の実施態様のフローを示す説明図であ
り、第2図は従来のフローを示す説明図である。 1……純水、2……純水槽 3……混床式ポリシャー、4……紫外線照射装置 5……限外濾過膜装置、6……循環配管 7……ユースポイント 8……非透過水循環配管、9……貯留槽 10……熱交換器、11……ブロー管FIG. 1 is an explanatory diagram showing a flow of an embodiment of the present invention, and FIG. 2 is an explanatory diagram showing a conventional flow. 1 ... Pure water, 2 ... Pure water tank 3 ... Mixed bed polisher, 4 ... Ultraviolet irradiation device 5 ... Ultrafiltration membrane device, 6 ... Circulation piping 7 ... Use point 8 ... Non-permeate water circulation Piping, 9 ... Storage tank 10 ... Heat exchanger, 11 ... Blow pipe
Claims (1)
一旦受け、当該純水を少なくとも紫外線照射装置で処理
した後、限外濾過膜装置で処理し、その処理水を循環配
管を用いて前記純水槽へ循環するとともに、当該循環配
管の系路中にユースポイントを設け、当該ユースポイン
トから処理水を必要量供給する超純水の製造方法におけ
る前記限外濾過膜装置を殺菌処理するにあたり、当該限
外濾過膜装置の供給水を加熱して70℃以上の熱水とな
し、当該熱水を限外濾過膜装置に供給して透過処理し、
その熱透過水を前記循環配管に通流し、前記ユースポイ
ントを通過させ、ユースポイントの下流側で放流するこ
とを特徴とする限外濾過膜装置の殺菌方法。1. Pure water obtained by the primary side pure water producing apparatus is once received in a pure water tank, treated with at least an ultraviolet irradiation apparatus, and then treated with an ultrafiltration membrane apparatus, and the treated water is circulated. The ultrafiltration membrane device in the method for producing ultrapure water, which circulates to the pure water tank using a pipe, provides a point of use in the system of the circulation pipe, and supplies a necessary amount of treated water from the point of use. In the sterilization treatment, the water supplied to the ultrafiltration membrane device is heated to 70 ° C. or higher, and the hot water is supplied to the ultrafiltration membrane device for permeation treatment,
A method for sterilizing an ultrafiltration membrane device, characterized in that the heat-permeable water is passed through the circulation pipe, passed through the point of use, and discharged on the downstream side of the point of use.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61074265A JPH0688025B2 (en) | 1986-04-02 | 1986-04-02 | Ultrafiltration membrane device sterilization method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61074265A JPH0688025B2 (en) | 1986-04-02 | 1986-04-02 | Ultrafiltration membrane device sterilization method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62234507A JPS62234507A (en) | 1987-10-14 |
| JPH0688025B2 true JPH0688025B2 (en) | 1994-11-09 |
Family
ID=13542120
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61074265A Expired - Fee Related JPH0688025B2 (en) | 1986-04-02 | 1986-04-02 | Ultrafiltration membrane device sterilization method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0688025B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0818022B2 (en) * | 1987-12-02 | 1996-02-28 | ダイセル化学工業株式会社 | Heat sterilization method of final filter for ultrapure water |
| JPH01307487A (en) * | 1988-06-02 | 1989-12-12 | Kurita Water Ind Ltd | Terminal sterilizing device for ultra pure water |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5434545A (en) * | 1977-08-22 | 1979-03-14 | Organo Kk | Method of producing pure water of high purity |
| JPS60110390A (en) * | 1983-11-21 | 1985-06-15 | Kuraray Co Ltd | Aseptic water preparing apparatus |
| JPS60261585A (en) * | 1984-06-07 | 1985-12-24 | Kubota Ltd | Manufacture of extremely pure water |
-
1986
- 1986-04-02 JP JP61074265A patent/JPH0688025B2/en not_active Expired - Fee Related
Non-Patent Citations (1)
| Title |
|---|
| 大矢晴彦著「逆浸透法・限外濾過法▲II▼応用膜利用技術ハンドブック」(昭53−6−30)(株)幸書房P.185〜198 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62234507A (en) | 1987-10-14 |
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