JPH0615022B2 - Ultrafiltration membrane device sterilization method - Google Patents
Ultrafiltration membrane device sterilization methodInfo
- Publication number
- JPH0615022B2 JPH0615022B2 JP4729686A JP4729686A JPH0615022B2 JP H0615022 B2 JPH0615022 B2 JP H0615022B2 JP 4729686 A JP4729686 A JP 4729686A JP 4729686 A JP4729686 A JP 4729686A JP H0615022 B2 JPH0615022 B2 JP H0615022B2
- Authority
- JP
- Japan
- Prior art keywords
- water
- ultrafiltration membrane
- hot water
- membrane device
- pure water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Separation Using Semi-Permeable Membranes (AREA)
Description
【発明の詳細な説明】 <産業上の利用分野> 本発明は超濾過膜装置を用いて被処理水中の微粒子、コ
ロイダル物質、高分子有機物、発熱性物質等を除去する
際に、処理の続行により、超濾過膜あるいは超濾過膜装
置後の透過水配管等に細菌類が繁殖して透過水中に生菌
あるいは微粒子が漏洩したりする際における超濾過膜装
置の細菌方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION <Industrial field of application> The present invention uses a superfiltration membrane device to continue treatment when removing fine particles, colloidal substances, high molecular weight organic substances, exothermic substances, etc. in water to be treated. The present invention relates to a method for bacteria in an ultrafiltration membrane device when bacteria propagate in the permeation pipe or the like after the ultrafiltration membrane or the ultrafiltration membrane device and live bacteria or fine particles leak into the permeate.
<従来の技術> 従来から平膜状、管膜状、スパイラル状、中空糸状など
の種々の超濾過膜を装着した超濾過膜装置は被処理水中
の微粒子、コロイダル物質、高分子有機物、発熱性物質
等を除去する目的で用いられているが、近年においてL
SIや超LSIを生産する電子工業における半導体ウエ
ハーまたはチップ(以下半導体ウエハーという)の洗浄
用水としての超純水の製造に用いられることが多い。<Prior art> Conventional ultrafiltration membrane devices equipped with various types of ultrafiltration membranes such as flat membrane, tubular membrane, spiral, and hollow fiber are known to be fine particles in treated water, colloidal substances, high molecular organic substances, and exothermicity. It is used to remove substances, but in recent years L
It is often used for producing ultrapure water as water for cleaning semiconductor wafers or chips (hereinafter referred to as semiconductor wafers) in the electronic industry that produces SI and VLSI.
かかる半導体ウエハーの洗浄用水は通常、以下のような
フローで製造される。すなわち原水を凝集沈澱装置、砂
濾過機、活性炭濾過機、逆浸透膜装置、2床3塔式純水
製造装置、混床式ポリシャー、精密フィルターなどの一
次側給水装置で処理して純水を得、次いで半導体ウエハ
ーを洗浄する直前で前記一次処理純水を第2図に示した
ような二次側給水装置で処理する。Water for cleaning such semiconductor wafers is usually produced by the following flow. That is, the raw water is treated with a primary side water supply device such as a coagulating sedimentation device, a sand filter, an activated carbon filter device, a reverse osmosis membrane device, a 2-bed 3-tower pure water production device, a mixed bed polisher, and a precision filter to obtain pure water. Immediately before obtaining and then cleaning the semiconductor wafer, the primary treated pure water is treated by the secondary side water supply device as shown in FIG.
すなわち当該純水1を一旦純水槽2に貯留し、当該純水
を混床式ポリシャー3、紫外線照射装置4、超濾過膜装
置5で処理し、一次処理純水中に残留するイオン、微粒
子、コロイダル物質、生菌等を可及的に除去して、いわ
ゆる超純水とするものである。なお超濾過膜装置5の透
過水である超純水はユースポイント配管6によって、一
点鎖線で囲んだユースポイント7まで移送し、ここで洗
浄用水として使用し、残余の透過水は純水槽2に循環す
る。なお超濾過膜装置5の非透過水も通常、非透過水循
環配管8により純水槽2に戻される。That is, the pure water 1 is temporarily stored in the pure water tank 2, and the pure water is treated by the mixed-bed polisher 3, the ultraviolet irradiation device 4, and the ultrafiltration membrane device 5, and the ions and fine particles remaining in the primary treated pure water, The so-called ultrapure water is obtained by removing colloidal substances and viable bacteria as much as possible. The ultrapure water, which is the permeated water of the ultrafiltration membrane device 5, is transferred to the use point 7 surrounded by the alternate long and short dash line through the use point pipe 6 and used as cleaning water here. The remaining permeated water is transferred to the pure water tank 2. Circulate. The non-permeated water of the ultrafiltration membrane device 5 is also usually returned to the pure water tank 2 through the non-permeated water circulation pipe 8.
このような用途に用いられる超濾過膜装置5は、この被
処理水が一次側給水装置で得られる純水であるにもかか
わらず、また直前で紫外線照射を行っているにもかかわ
らず、長時間の透過処理によって、透過水中に生菌や微
粒子の漏洩量が増加する。The ultrafiltration membrane device 5 used for such an application has a long life despite the fact that the water to be treated is pure water obtained by the primary side water supply device and is irradiated with ultraviolet rays immediately before. The permeation treatment for a period of time increases the amount of viable bacteria and fine particles leaking into the permeate.
この原因は、当該超濾過膜装置5の被処理水である純水
中に紫外線に耐性を有する一般殺菌が膜面等に繁殖する
ためと考えられる。It is considered that this is because general sterilization having resistance to ultraviolet rays propagates in pure water, which is the water to be treated of the ultrafiltration membrane device 5, on the membrane surface or the like.
したがって使用する超濾過膜が上述のような汚染を受け
た場合、何らかの殺菌処理をする必要がある。Therefore, if the ultrafiltration membrane to be used is contaminated as described above, it is necessary to perform some sterilization treatment.
従来から行われている超濾過膜の殺菌処理は、1〜5%
の過酸化水素水、または次亜塩素酸ソーダ溶液等の酸化
剤に浸漬したりあるいは通液洗浄する方法などがある
が、かかる酸化例を用いる殺菌処理は超濾過膜あるいは
装置の構成部材を劣化させたり、また殺菌処理後の洗浄
に多量の純水を使用するなどの欠点がある。さらに比較
的多量の酸化剤を用いるのでその薬品費およびその廃液
処理コストも高いという問題がある。The sterilization treatment of ultrafiltration membranes that has been performed conventionally is 1-5%
There is a method of immersing in the hydrogen peroxide solution or the oxidizing agent such as sodium hypochlorite solution, or washing by passing it through, but the sterilization using such an oxidation example deteriorates the ultrafiltration membrane or the components of the device. There is also a drawback in that a large amount of pure water is used for cleaning after the sterilization treatment. Furthermore, since a relatively large amount of oxidant is used, there is a problem that the chemical cost and the waste liquid treatment cost are high.
一方超濾過膜や装置の構成部材を劣化させず、かつ殺菌
処理後の洗浄も比較的容易に行える殺菌処理として、超
濾過膜を熱水で洗浄する方法も行われている。On the other hand, a method of washing the ultrafiltration membrane with hot water is also used as a sterilization treatment that does not deteriorate the ultrafiltration membrane and the components of the apparatus and can be washed relatively easily after the sterilization treatment.
従来の熱水による殺菌処理は以下のようにして行われて
いる。The conventional sterilization treatment with hot water is performed as follows.
すなわち第2図中の点線で示した千は殺菌処理ラインを
示しており、あらかじめ紫外線照射装置4の処理水を貯
留槽9に貯留しておき、殺菌処理するにあたっては、当
該貯留槽9内の純水を熱交換器10を用いて間接的に加
熱し、通常90℃前後の熱水となし、当該熱水を超濾過
膜装置5に、濾過処理する方向と同じ方向で通し、非透
過熱水および透過熱水をブローあるいは純水槽2に循環
するものである。That is, a thousand indicated by a dotted line in FIG. 2 indicates a sterilization treatment line, and the treated water of the ultraviolet irradiation device 4 is stored in the storage tank 9 in advance, and the sterilization treatment is performed in the storage tank 9 in advance. Pure water is indirectly heated using the heat exchanger 10 to form hot water of about 90 ° C., and the hot water is passed through the ultrafiltration membrane device 5 in the same direction as the filtration treatment to obtain non-permeation heat. Water and permeated hot water are blown or circulated in the pure water tank 2.
しかしながら従来のこのような殺菌はその殺菌効果が小
さいという欠点がある。さらにユースポイント配置6に
は熱水が接触しないので、当該ユースポイント配管の水
が停滞し易い箇所に一般細菌が繁殖していてもこれを殺
菌できないという不具合もある。However, such conventional sterilization has a drawback that the sterilizing effect is small. Further, since hot water does not come into contact with the use point arrangement 6, there is also a problem in that even if general bacteria propagate in a portion of the use point pipe where water tends to stay, it cannot be sterilized.
<発明が解決しようとする問題点> 本発明は超濾過膜装置5あるいはその回り配管に一般殺
菌が繁殖したりしてその処理性能が低下した際の従来の
殺菌処理の欠点を解決するもので、超濾過膜あるいは装
置の構成部材を劣化させず、殺菌処理後の洗浄を容易に
行うことができ、かつユースポイント配管も併せて殺菌
でき、低コストで、処理効果の優れた殺菌方法を提供す
ることを目的とする。<Problems to be Solved by the Invention> The present invention is to solve the drawbacks of the conventional sterilization treatment when general sterilization propagates in the ultrafiltration membrane device 5 or its surrounding pipes and the treatment performance thereof deteriorates. It provides a sterilization method that does not deteriorate the ultrafiltration membrane or the components of the device, can be easily cleaned after sterilization treatment, and can also sterilize the point-of-use piping, and is low cost and has excellent treatment effects. The purpose is to do.
<問題点を解決するための手段> 前述した従来の殺菌方法における熱水による洗浄は、熱
水の持つ殺菌性を利用するものであるが、その殺菌処理
効果が優れているものであれば、殺菌処理後の洗浄の容
易さ、および超濾過膜を劣化させないなどの利点を有
し、半導体ウエハーの洗浄用水を製造する超濾過膜の殺
菌処理方法としては優れた方法である。<Means for Solving Problems> Washing with hot water in the conventional sterilization method described above utilizes the sterilizing property of hot water, but if the sterilizing effect is excellent, It is an excellent method as a sterilization method for an ultrafiltration membrane for producing water for cleaning semiconductor wafers, since it has advantages such as ease of cleaning after sterilization treatment and no deterioration of the ultrafiltration membrane.
本発明者は従来の熱水洗浄における殺菌処理の性能向上
について種々検討し、熱水をユースポイント配管部を通
過させて超濾過膜に供給し、かつ当該熱水を濾過処理す
る際とは逆方向に超濾過膜を通す洗浄を行ったところ、
その殺菌処理後の性能が大幅に向上することを知見し
た。The present inventor has variously studied the performance improvement of the sterilization treatment in the conventional hot water washing, and supplies hot water to the ultrafiltration membrane through the point of use piping and reverses the case of filtering the hot water. After washing through the ultrafiltration membrane in the direction,
It was found that the performance after the sterilization treatment is significantly improved.
本発明は当該知見に基づくもので、一次側純水製造装置
で得た純水を、ユースポイントの直前で再度濾過処理す
る超濾過膜装置を殺菌処理するにあたり、当該超濾過膜
装置の透過水を加熱して70℃以上のの熱水となし、当
該熱水をユースポイント配管部を通過させて超濾過膜に
供給し、かつ当該熱水を濾過処理する方法とは逆方向に
超濾過膜に通すことを特徴とする超濾過膜の殺菌方法で
ある。The present invention is based on the above knowledge, and in sterilizing the ultrafiltration membrane device which again performs the filtration treatment of the pure water obtained in the primary side pure water production device, immediately before the point of use, the permeated water of the ultrafiltration membrane device. Is heated to form hot water of 70 ° C. or higher, the hot water is supplied to the ultrafiltration membrane through the point of use piping, and the hot water is filtered in the opposite direction to the method of filtering. It is a method for sterilizing an ultrafiltration membrane, which is characterized in that
<作用> 以下に本発明を図面に基づいて詳細に説明する。<Operation> The present invention will be described in detail below with reference to the drawings.
第1図は本発明の実施態様の一例を示すフローの説明図
であり、第2図と同様に点線は殺菌処理ラインを示して
おり、11〜21は代表的な弁を示している。FIG. 1 is an explanatory view of a flow showing an example of an embodiment of the present invention, the dotted line shows a sterilization treatment line, and 11 to 21 show typical valves as in FIG.
まず純水槽2の純水を濾過処理する場合は、従来と同じ
ように弁18、弁15、弁12、弁16を開口しその他
の弁を閉じ、純水槽2の純水を混床式ポリシャー3、紫
外線照射装置4、超濾過膜装置5で処理し、その透過水
をユースポイント配管6を介して純水槽2に循環すると
ともに非透過水も非透過水循環配管8を用いて純水槽2
に戻す。またユースポイント7において必要とされる超
純水が採水され、半導体ウエハー等の洗浄用水として用
いられる。First, when the pure water in the pure water tank 2 is filtered, the valves 18, 15, 15, 12 and 16 are opened and the other valves are closed as in the conventional case, and the pure water in the pure water tank 2 is mixed-bed polisher. 3, the ultraviolet irradiation device 4 and the ultrafiltration membrane device 5, the permeated water is circulated to the pure water tank 2 through the use point pipe 6, and the non-permeated water is also clarified by the non-permeated water circulation pipe 8.
Return to. Ultrapure water required at the use point 7 is sampled and used as cleaning water for semiconductor wafers and the like.
次に本発明における熱水による殺菌処理は以下の通りに
行われる。Next, the sterilization treatment with hot water in the present invention is performed as follows.
すなわち前記濾過処理中に、弁11を開口して貯留槽9
にあらかじめ透過水を貯留しておく。That is, during the filtration process, the valve 11 is opened and the storage tank 9 is opened.
Store permeate in advance.
殺菌処理にあたっては、弁13、弁15、弁17、弁1
9、弁20を開口し、その他の弁を閉じ、貯留槽9内の
透過水を熱交換器10によって間接的に加熱して温度約
90℃前後の熱水とし、当該熱水をユースポイント配管
6に流し、ユースポイント7を通過させて超濾過膜装置
5に濾過処理とは逆方向に供給する。In the sterilization process, valve 13, valve 15, valve 17, valve 1
9, the valve 20 is opened, the other valves are closed, and the permeated water in the storage tank 9 is indirectly heated by the heat exchanger 10 into hot water having a temperature of about 90 ° C., and the hot water is used as a use point pipe. 6 and then passes through the point of use 7 and is supplied to the ultrafiltration membrane device 5 in the direction opposite to the filtration process.
なお超濾過膜装置5に供給した熱水と一部は非透過熱水
として弁20からブローし、他部は超濾過膜に濾過処理
とは逆方向に通し、その透過熱水を弁17を介して、弁
19からブローする。The hot water supplied to the ultrafiltration membrane device 5 and a part thereof are blown from the valve 20 as non-permeated hot water, and the other portion is passed through the ultrafiltration membrane in the direction opposite to the filtration process, and the permeated hot water is passed through the valve 17. Through the valve 19 to blow.
なお場合によっては弁11を開口して当該透過熱水の一
部あるいは全量を貯留槽9に循環することもできる。熱
水の温度としては70℃以上が好ましく、通常は90℃
前後とする。なお70℃以下の温度では回生効果が小さ
くなるので好ましくない。In some cases, the valve 11 may be opened to circulate a part or all of the permeated hot water to the storage tank 9. The temperature of hot water is preferably 70 ° C or higher, usually 90 ° C.
Before and after. It should be noted that a temperature of 70 ° C. or lower is not preferable because the regenerative effect becomes small.
次に洗浄時間は少なくとも15分以上とすることが必要
で、通常は30前後で充分である。Next, the cleaning time needs to be at least 15 minutes or more, and about 30 is usually sufficient.
以上説明したごとく本発明は超濾過膜に対して熱水を濾
過する方向と逆方向に通すものであるが、以下のように
熱水を濾過する方向と同じ方向で通す方法を併せて行っ
ても差し支えない。As described above, the present invention is to pass the hot water through the ultrafiltration membrane in the direction opposite to the direction in which the hot water is filtered. It doesn't matter.
すなわち弁13、弁14、弁17、弁19、弁20を開
口し、その他の弁を閉じ、熱水をユースポイント配管6
に流し、ユースポイント7を通過させて超濾過膜装置5
に濾過処理と同じ方向に供給する。That is, the valve 13, the valve 14, the valve 17, the valve 19, and the valve 20 are opened, the other valves are closed, and hot water is used for the use point piping 6
Flow into the ultrafiltration membrane device 5 through the point of use 7
In the same direction as the filtration process.
超濾過膜装置5に供給した熱水の一部は、非透過熱水と
して、弁17を介して弁19からブローし、その透過熱
水を弁20を介してブローする。なお場合によっては弁
21を開口して当該透過熱水の一部あるいは全量を貯留
槽9に循環することもできる。A part of the hot water supplied to the ultrafiltration membrane device 5 is blown from the valve 19 via the valve 17 as non-permeated hot water, and the permeated hot water is blown via the valve 20. In some cases, the valve 21 may be opened to circulate a part or all of the permeated hot water to the storage tank 9.
なお第1図に示した実施態様においては、透過水をあら
かじめ貯留槽9に貯留し、この貯留した透過水を熱水と
して殺菌処理に用いたが、超濾過膜装置5が複数系列あ
る場合は、たとえば一つの超濾過膜装置5で透過水を
得、この透過水を熱水とすることにより、貯留槽9を省
略すること可能である。In the embodiment shown in FIG. 1, the permeated water was stored in the storage tank 9 in advance, and the stored permeated water was used as hot water for the sterilization treatment. For example, the permeated water is obtained by one ultrafiltration membrane device 5, and the permeated water is used as hot water, whereby the storage tank 9 can be omitted.
<効果> 以上説明したごとく本発明は超濾過膜に対して、熱水を
濾過する方向と逆方向に通すので、膜面に付着あるいは
繁殖している汚染物あるいは一般細菌を膜の裏側から逆
流する熱水により効果的に剥離、かつ殺菌することがで
き、従来の殺菌処理のごとく、濾過する方向と同じ方向
で熱水を膜面に通すものと比較して、その殺菌効果が著
しく優れている。<Effect> As described above, according to the present invention, the hot water is passed through the ultrafiltration membrane in the direction opposite to the filtration direction, so that the contaminants or general bacteria adhering to or propagating on the membrane surface flow back from the backside of the membrane. It can be effectively peeled off and sterilized by hot water, and its bactericidal effect is remarkably excellent as compared with the conventional sterilization treatment in which hot water is passed through the membrane surface in the same direction as the filtering direction. There is.
さらに熱水をユースポイント7を介して、ユースポイン
ト配管6を通して超濾過膜装置5に供給するので、たと
えユースポイント配管6に一般細菌が繁殖していてもこ
れを効果的に殺菌することができ、殺菌処理後におい
て、微粒子数および生菌数の極めて少ない透過水を得る
ことができる。Further, since hot water is supplied to the ultrafiltration membrane device 5 through the use point pipe 6 through the use point 7, it is possible to effectively sterilize general bacteria even if the use point pipe 6 is propagated. After the sterilization treatment, it is possible to obtain permeated water having a very small number of fine particles and a very small number of viable bacteria.
以下に本発明の効果をより明確とするために実施例を説
明する。Examples will be described below in order to clarify the effects of the present invention.
実施例 除濁濾過装置で除濁した原水を逆浸透膜装置で処理した
後、2床3塔式純水製造装置で処理し、その処理水を真
空脱気塔で脱気後、混床式純水製造装置で処理し、これ
を精密濾過器(0.45μm)にて濾過した純水を純水
槽へ貯水した。Example Raw water turbidized by a turbidity filtration device was treated by a reverse osmosis membrane device, then treated by a two-bed, three-column type pure water production device, and the treated water was deaerated by a vacuum deaeration tower, and then a mixed-bed type Pure water filtered by a microfilter (0.45 μm) was stored in a pure water tank.
この純水は混床式ポリシャー、紫外線照射装置で処理し
た後、ポリスルホン系中空糸状超濾過膜を装着した超濾
過膜装置へ送水した。This pure water was treated with a mixed bed polisher and an ultraviolet irradiation device, and then fed to an ultrafiltration membrane device equipped with a polysulfone-based hollow fiber ultrafiltration membrane.
上記の通常運転の500時間経過後に従来法の熱水殺菌
を行った。The conventional hot water sterilization was performed after 500 hours from the above normal operation.
すなわち第2図のフローに準じて、紫外線照射装置後の
純水をあらかじめ貯留してある貯留槽から純水を取り出
し、これを熱交換器によって90℃に加熱し、当該熱水
を濾過処理する方向と同じ方向で超濾過膜装置に30分
間供給して殺菌処理した。That is, according to the flow of FIG. 2, the pure water after the ultraviolet irradiation device is taken out from the storage tank in which the pure water is stored in advance, the pure water is heated to 90 ° C. by a heat exchanger, and the hot water is filtered. In the same direction as the direction, it was supplied to the ultrafiltration membrane device for 30 minutes and sterilized.
一次純水およびユースポイントにおける運転当初の透過
水および500時間経過後の透過水および従来法による
殺菌処理直後の透過水および当該殺菌処理から500時
間経過時の透過水の微粒子数、生菌数、比抵抗値は第1
表に示した通りであった。Permeate at the beginning of operation at the primary pure water and at the point of use, permeate after 500 hours has passed, permeate immediately after sterilization by the conventional method and permeated water at 500 hours after the sterilization, the number of viable bacteria, The first specific resistance value
It was as shown in the table.
次に前記従来法による殺菌処理から500時間経過した
際に本発明の殺菌方法を実施した。Next, the sterilization method of the present invention was carried out when 500 hours had passed since the sterilization treatment by the conventional method.
すなわち第1図のフローに準じて、超濾過膜装置の透過
水をあらかじめ貯留してある貯留槽から透過水を取り出
し、これを熱交換器によって90℃に加熱し、当該熱水
をユースポイントを介してユースポイント配管を通し、
濾過処理する方向と逆方向で超濾過膜装置に30分間供
給して殺菌処理した。That is, in accordance with the flow of FIG. 1, the permeated water of the ultrafiltration membrane device is taken out from the storage tank in which the permeated water is stored in advance, and the permeated water is heated to 90 ° C. by a heat exchanger, and the hot water is used as a use point. Through the use point piping,
It was sterilized by supplying it to the ultrafiltration membrane device for 30 minutes in the direction opposite to the filtration direction.
本発明方法による殺菌処理直後および、当該殺菌処理か
ら500時間経過時の微粒子数、生菌数、比抵抗値を第
1表に示した。Immediately after the sterilization treatment by the method of the present invention and 500 hours after the sterilization treatment, the number of fine particles, the number of viable bacteria and the specific resistance value are shown in Table 1.
また従来の方法である2%の過酸化水素水を用いて殺菌
を行い、その終了直後から超濾過膜の透過水の比抵抗が
17MΩ−cmに達するまでに要した時間と、本発明によ
って殺菌し、その終了直後から透過水の比抵抗が17M
Ω−cmに到達するまでに要した時間とを第2表に示し
た。The conventional method was sterilization using 2% hydrogen peroxide solution, and the time required from the completion of the sterilization until the specific resistance of the permeate of the ultrafiltration membrane reached 17 MΩ-cm and the sterilization by the present invention. However, immediately after the end, the permeated water has a resistivity of 17M.
Table 2 shows the time required to reach Ω-cm.
以上の実施例で示されるごとく、本発明による殺菌方法
は従来法による殺菌方法と比較して微粒子数、生菌数と
もに少ない透過水を得ることができ、また過酸化水素水
による殺菌方法と比較して、殺菌処理後の洗浄が短時間
であり、洗浄のために消費される純水量が極めて少な
い。 As shown in the above examples, the sterilization method according to the present invention can obtain permeated water in both the fine particle number and the viable cell count as compared with the sterilization method according to the conventional method, and compared with the sterilization method using hydrogen peroxide solution. Then, the cleaning after the sterilization treatment is short, and the amount of pure water consumed for the cleaning is extremely small.
第1図は本発明の実施態様のフローを示す説明図であ
り、第2図は従来のフローを示す説明図である。 1……純水、2……純水槽 3……混床式ポリシャー、4……紫外線照射装置 5……超濾過膜装置 6……ユースポイント配管、7……ユースポイント 8……比透過水循環配管、9……貯留槽 10……熱交換器、11〜21……弁FIG. 1 is an explanatory diagram showing a flow of an embodiment of the present invention, and FIG. 2 is an explanatory diagram showing a conventional flow. 1 ... Pure water, 2 ... Pure water tank 3 ... Mixed bed polisher, 4 ... Ultraviolet irradiation device 5 ... Ultra filtration membrane device 6 ... Use point piping, 7 ... Use point 8 ... Specific permeate water circulation Piping, 9 ... Storage tank 10 ... Heat exchanger, 11-21 ... Valve
Claims (1)
ポイントの直前で再度濾過処理する超濾過膜装置を殺菌
処理するにあたり、当該超濾過膜装置の透過水を加熱し
て70℃以上の熱水となし、当該熱水をユースポイント
配管部を通過させて超濾過膜に供給し、かつ当該熱水を
濾過処理する方法とは逆方向に超濾過膜に通すことを特
徴とする超濾過膜装置の殺菌方法。1. When sterilizing the ultrafiltration membrane device in which pure water obtained by the primary side pure water production device is filtered again immediately before the point of use, the permeated water of the ultrafiltration membrane device is heated to 70 Characterized in that it is not hot water above ℃, the hot water is supplied to the ultrafiltration membrane through the point of use piping, and the hot water is passed through the ultrafiltration membrane in the opposite direction to the method of filtering. Method for sterilizing ultrafiltration membrane device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4729686A JPH0615022B2 (en) | 1986-03-06 | 1986-03-06 | Ultrafiltration membrane device sterilization method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4729686A JPH0615022B2 (en) | 1986-03-06 | 1986-03-06 | Ultrafiltration membrane device sterilization method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62204803A JPS62204803A (en) | 1987-09-09 |
| JPH0615022B2 true JPH0615022B2 (en) | 1994-03-02 |
Family
ID=12771319
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4729686A Expired - Lifetime JPH0615022B2 (en) | 1986-03-06 | 1986-03-06 | Ultrafiltration membrane device sterilization method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0615022B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL1009457C2 (en) * | 1998-06-19 | 1999-12-21 | Sepeq B V | Apparatus and method for filtering a liquid. |
| DE202004002616U1 (en) * | 2004-02-24 | 2004-04-29 | Boll & Kirch Filterbau Gmbh | Water filter system, in particular sea water filter system |
-
1986
- 1986-03-06 JP JP4729686A patent/JPH0615022B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62204803A (en) | 1987-09-09 |
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