JPH07113685B2 - Color filter - Google Patents

Description

TECHNICAL FIELD The present invention relates to a color filter, and more particularly to a color filter suitable for fine color separation of a color image pickup device, a color sensor, a color display and the like.

[Prior Art] Conventionally, as a color filter, gelatin on a substrate,
A dyeing color filter is known in which a mordant layer made of a hydrophilic polymer such as casein, glue or polyvinyl alcohol is provided, and the mordant layer is colored with a dye to form a colored layer.

With such a dyeing method, it is relatively easy to deal with the spectral characteristics required as a filter because many dyes can be used, but in the dyeing process of the mordant layer, the mordant layer is dissolved in the dye bath. It employs a wet process that is difficult to control, such as dipping, and has a complicated process such as providing a dye-proof intermediate layer for each color, or has the disadvantage of poor retention. The heat resistance of dyeable dyes is 15
It is relatively low at about 0 ° C. or less, and when the filter requires thermal treatment, it is difficult to use and also has a drawback that the dyeing film itself has poor reliability such as heat resistance and light resistance. ing.

On the other hand, conventionally, a color filter using a colored resin in which a certain kind of coloring material is dispersed in a transparent resin is known.

For example, JP-A-58-46325, JP-A-60-78401, JP-A-60-184202, JP-A-60-184203, JP-A-60-184204, and JP-A-60-184204. As shown in JP-A-60-184205, etc., according to a color filter characterized by a colored resin film in which a coloring material is mixed with a polyamino resin, the polyamino resin itself has heat resistance, light resistance and the like. Although it has excellent characteristics, since it is a non-photosensitive resin, the color filter pattern is formed by a method which is disadvantageous to the fine pattern, or after the resist mask is provided on the colored resin film, the colored resin is formed. A complicated method of the manufacturing process of etching the film had to be taken.

Recently, a colorant using a photosensitive polyimide resin has been known, but this resin is a polyimide precursor type,
For imidization, heat curing at 300 ° C or higher is usually required.

On the other hand, JP-A-55-134807, JP-A-57-16407, JP-A-57-16408, JP-A-57-74707,
As disclosed in Japanese Patent Application Laid-Open No. 60-129707, a color filter characterized by a colored resin film in which a photosensitive resin and a coloring material are mixed, a color filter which is generally used for a method of manufacturing a color filter. Although it is possible to form a fine pattern only in the process and the process can be simplified, what is generally used as the photosensitive resin is a complicated one which must be prepared by mixing a resin film material and a photosensitive curing agent. In addition, the properties such as heat resistance, light resistance, and light resistance were not sufficiently satisfied.

[Problems to be Solved by the Invention] An object of the present invention is to eliminate the drawbacks of the above-mentioned conventional examples, to form a fine pattern by a simple manufacturing process, and to further improve mechanical properties and heat resistance. Another object of the present invention is to provide a color filter having excellent properties such as light resistance and solvent resistance.

[Means for Solving Problems] and [Function] That is, the present invention has a group having a photosensitivity in a molecule,
Patterned colored resin layer obtained by subjecting a layer formed of a colored resin obtained by dispersing a coloring material in an aromatic polyamide resin capable of obtaining a cured film at 0 ° C or lower to an exposure and development process It is a color filter characterized by having.

That is, since the color filter of the present invention is formed from a colored resin layer using a resin material and a coloring material having good durability such as mechanical properties, heat resistance, light resistance, and solvent resistance,
A color filter with excellent reliability and a desired spectral property can be easily designed, and a fine pattern is formed by a simple method using only a general photolithography process. is there.

The material of the colored resin layer of the color filter of the present invention is
A cured film can be obtained below 200 ℃, eg 150 ℃ × 30
Aromatic aromatic compounds that can form a cured film with about a minute of heat, and do not have specific light absorption characteristics in the visible light wavelength range (400 to 700 nm) (light transmittance of about 90% or more). Polyamide resin of is used.

As the aromatic polyamide resin, one having an aromatic chain having a photosensitive hydrocarbon unsaturated group is used.

In particular, the photosensitive group in the present invention may be an aromatic chain having a photosensitive hydrocarbon unsaturated group as shown below, for example, (1) benzoic acid esters (In the formula, R ₁ is CHX = CY-COO-Z-, X is -H or -C ₆ H ₅ ,
Y is -H or -CH _3, Z is - or an ethyl group or a glycidyl group) (2) Benzyl acrylate (In the formula, Y represents -H or CH ₃ ) (3) Diphenyl ethers (In the formula, R ₂ is CHX = CY-CONH-, CH ₂ = CY-COO- (CH ₂ ) ₂
-OCO- or CH ₂ = containing one or more CY-COO-CH _2- ,
X and Y have the above meanings.) (4) Chalcones and other compound chains (In the formula, R ₃ represents H-, an alkyl group or an alkoxy group) Etc.

Examples of aromatic polyamide resins having these groups in the molecule include Lysocoat PA-1000 (manufactured by Ube Industries, Ltd.)
Etc. Lysocoat PA of the above polyamide resin
The structural formula of -1000 is shown below.

Generally, there are few photosensitive resins used in the photolithography process, which have excellent mechanical properties, heat resistance, light resistance, solvent resistance, and the like, although there are differences depending on their chemical structures. On the other hand, the photosensitive polyamide resin of the present invention is a resin system having excellent durability in terms of chemical structure, and the durability of the color filter formed using these is also very good. Become.

The coloring material forming the colored resin layer of the color filter of the present invention is not particularly limited as long as it can obtain desired spectral characteristics among organic pigments, inorganic pigments, dyes and the like. In this case, each material can be used alone or as a mixture of some of them. However, when a dye is used, the performance of the color filter is governed by the durability of the dye itself. However, when the resin system of the present invention is used, the performance is superior to that of an ordinary dyed color filter. Can be formed. Therefore, considering the color characteristics and various performances of the color filter, the organic pigment is most preferable as the coloring material.

Organic pigments include azo pigments such as soluble azo pigments, insoluble azo pigments and condensed azo pigments, phthalocyanine pigments,
And condensed polycyclic pigments containing indigo, anthraquinone, perylene, perinone, dioxazine, quinacridone, isoindolinone, phthalone, methine / azomethine, other metal complex, or some of these A mixture of these is used.

In the present invention, the colored resin used to form the colored resin layer is prepared by blending the photosensitive polyamide resin solution with the coloring material having the desired spectral characteristics in a proportion of about 10 to 50%, and then using ultrasonic waves or three After sufficiently dispersing with a main roll or the like, those having a large particle size are removed with a filter to prepare.

The colored resin layer of the color filter of the present invention is formed into a pattern by a photolithography process in which the colored resin is applied onto a substrate by a coating device such as a spinner or a roll coater, and the layer thickness has a desired spectral characteristic. However, it is usually 0.5 to 5 μm, preferably 1
Approximately 2 μm is desirable.

The colored resin layer of the color filter of the present invention itself is composed of a good material having sufficient durability, but in particular, to protect the colored resin layer from various environmental conditions, , Organic resin such as polyamide, polyimide, polyurethane, polycarbonate, silicon, or inorganic film such as Si ₃ N ₄ , SiO ₂ , SiO, Al ₂ O ₃ , Ta ₂ O ₃ is spin coated on the surface of the colored resin layer, and rolled. The protective layer can be provided by a coating method or a vapor deposition method. Further, after forming the protective layer, depending on the material, an alignment treatment may be performed to make it applicable to a device using liquid crystal.

The color filter having the colored resin layer as described above can be formed on an appropriate substrate. For example, a glass plate, a transparent resin plate, a resin film, or a cathode ray tube display surface, a light receiving surface of an image pickup tube, a wafer on which a solid-state image pickup device such as CCD, BBD, CID, or BASIS is formed, or a contact image sensor using a thin film semiconductor. , Liquid crystal display surfaces, color electrophotographic photoconductors, and the like.

If it is necessary to further increase the adhesiveness between the colored resin layer and the underlying substrate, either apply a thin coating of the silane coupling agent or the like on the substrate beforehand and then form the colored resin pattern, or It is more effective to form the color filter by using a material to which a small amount of a silane coupling agent or the like is added.

Hereinafter, a typical method for forming a color filter of the present invention will be described with reference to the drawings.

FIG. 1 is a process diagram illustrating a method for forming a color filter of the present invention. First, as shown in FIG. 1 (a), a polyamide resin solution (NMP solution) in which a predetermined amount of a coloring material having a desired spectral characteristic is blended is used to form a first color resin film 2 on a predetermined substrate 1. Then, a spinner is used to form a film having a predetermined thickness, and prebaking is performed under an appropriate temperature condition. Then, as shown in FIG. 1 (b), light having the sensitivity of the photosensitive coloring resin (for example, a high pressure mercury lamp)
Then, the colored resin film is exposed through the photomask 3 having a predetermined pattern shape corresponding to the pattern to be formed, and the pattern portion is photocured.

Then, as shown in FIG. 1 (c), the colored resin film 2 having the photo-cured portion 2a is dissolved in a solvent that dissolves only the unexposed portion (for example,
After ultrasonic development with N-methyl-2-pyrrolidone-based solvent etc. as a main component, rinse treatment (for example, 1,1,
1, Trichloroethane, etc. Then, post-baking treatment is performed to obtain the patterned colored resin layer 4 of the present invention as shown in FIG. 1 (d).

In the case of forming the color filter of the present invention having two or more colors, it is necessary to further change the color filter from FIG.
The processing up to the figure (d) is repeated using the colored resin liquids in which the coloring materials corresponding to the respective colors are dispersed,
For example, it is possible to form a color filter composed of three colors of the colored resin layers 4, 5 and 6 having different colors as shown in FIG. 1 (e).

Further, the color filter of the present invention may have a protective layer 7 formed of the above-mentioned material on the upper part of the filter as shown in FIG. 1 (f).

[Examples] Examples of the present invention will be shown below.

Example 1 A blue colored resin material "Heliogen Blue L" capable of obtaining desired spectral characteristics on a glass substrate.
7080 (trade name, manufactured by BASF, CI No. 74160) is lysocoat PA
-1000 (Brand name, Ube Industries Ltd., polymer content 10%, solvent = N-methyl-2-pyrrolidone, pigment: polymer = 1: 2
The photosensitive colored resin material 3 prepared by being dispersed in (compounding) was applied to a film thickness of 2.0 μm by a spinner coating method. Next, the colored resin layer was prebaked at 80 ° C. for 30 minutes, and then exposed with a high pressure mercury lamp through a pattern mask corresponding to the pattern shape to be formed. After exposure,
A dedicated developer (N) that dissolves only the unexposed portion of the colored resin film
-Development solution containing methyl-2-pyrrolidone as the main component) using ultrasonic waves, and treating with a special rinse solution (rinse solution containing 1,1,1, trichloroethane as the main component), 15
Post-baking was performed at 0 ° C. for 30 minutes to form a blue colored resin film having a pattern shape.

Then, a green colored resin material [Lionol Green 6YK (trade name, manufactured by Toyo Ink Co., Ltd., C.
I.No.74265) was dispersed in Lithocoat PA-1000 (trade name, manufactured by Ube Industries, Ltd., polymer content 10%, solvent = N-methyl-2-pyrrolidone, pigment: polymer = 1: 2 blended) to prepare a photosensitive film. A colored resin material 3] having a positive polarity is used in the same manner as described above to form a green colored pattern at a predetermined position on the substrate.

Further, as a third color, a red colored resin material [Irgazin Red BPT (trade name, manufactured by Ciba-Geigy, CINo. .71127) is a Lithocoat PA-1000 (trade name, manufactured by Ube Industries, Ltd., polymer content 10%,
Solvent = N-methyl-2-pyrrolidone, Pigment: Polymer =
Photosensitive colored resin material 3 made by dispersing 1: 2)
A red colored pattern is formed at a predetermined position on the substrate and R (red), G (green), B
A colored pattern of (blue) three-color stripes was obtained.

The spectral characteristics of the three-color filter thus formed are shown in FIG.

The obtained color filter has excellent heat resistance and can withstand a temperature of 250 ° C. or higher, which makes it possible to form ITO on a CF (color filter) by sputtering.

In addition, the hardness is high and the mechanical properties are excellent, and even if the CF is configured so as to be in contact with the spacer in the liquid crystal cell, the CF will not be damaged during pressure bonding. Further, it has excellent solvent resistance, is strong against each solvent after curing, does not change during each production process step, and has excellent light resistance.

Comparative Example 1 In Example 1, a three-color color filter was formed by using a non-photosensitive colored polyimide resin instead of using the photosensitive colored polyamide resin.

That is, a blue-colored polyimide resin material [Heliogen Biue L7080 (trade name, manufactured by BASF, CI No. 74160)] is applied on a glass substrate by Semicofine SP-780.
(Product name, Toray, solid content 17.5%, pigment: polymer =
The colored resin material prepared by dispersing 1: 2) was applied at a film thickness of 2.0 μm by a spinner coating method. Next, the colored resin layer was dried at 150 ° C. for 30 minutes and then heated at 200 ° C. for 30 minutes. After that, a positive resist [OFPR is formed on the blue layer.
-2 (trade name, manufactured by Tokyo Ohka Co., Ltd.)]
After prebaking at 80 ° C. for 20 minutes, it was exposed with a high pressure mercury lamp through a pattern mask corresponding to the pattern shape to be formed. After completion of the exposure, the resist is developed with an alkali developing solution, the blue layer is etched, the resist is then stripped with acetone, and a blue colored resin film having a pattern shape is formed by heating and baking at 250 ° C. for 30 minutes. Formed.

Next, a green colored polymide resin material [Lionol] is used as a second color on the glass substrate on which the blue colored pattern is formed.
Coloring created by dispersing Green (Lionol Green) 6YK (trade name, manufactured by Toyo Ink Co., CI No. 74265) in Semicofine (trade name, manufactured by Toray, solid content 17.5%, pigment: polymer = 1: 2 blend) A green colored pattern was formed at a predetermined position on the substrate in the same manner as above except that the resin material was used.

Further, as a third color on the substrate on which the blue and green patterns are thus formed, a red colored polyimide resin material [Irgazin Red BPT (trade name, Ciba-Geigy, CI No. 71127) is dispersed in semicofine (trade name, manufactured by Toray Industries, Inc., solid content 17.5%, pigment: polymer = 1: 2 blend) to prepare a red colored pattern in the same manner as described above. Is formed at a predetermined position on the substrate, R (red), G
A colored pattern of three-color stripes of (green) and B (blue) was obtained.

The three-color filter thus formed is a method that is very complicated and inferior in productivity because a resist step for patterning is required for each color formation in the manufacturing process of the present invention. .

Further, the polyamide resin of the present invention, which has good transparency, is colored yellow with the polyimide resin itself, resulting in color characteristics with a turbid blue colored pattern.

Example 2 A thin film transistor was used as a substrate, and a color liquid crystal display device in which the color filter of the present invention was formed on the substrate was manufactured as follows.

First, as shown in FIG. 3 (a), a glass substrate (trade name: 7
(059, manufactured by Corning) 1) ITO pixel electrode 11 having a layer thickness of 1000 Å is formed into a desired pattern by a photolithography process, and then Al is vacuum-deposited to a layer thickness of 1000 Å on this surface. A gate electrode 12 as shown in FIG. 3B was formed by patterning into a desired shape by a photolithography process.

Next, photosensitive polyimide (trade name: semicofine,
Toray Co., Ltd.) is applied on the surface of the substrate 1 on which the electrodes are provided to form an insulating layer 13, and through holes 14 which form a contact portion between the drain electrode 18 and the pixel electrode 11 are formed by pattern exposure and development treatment. It was formed as shown in FIG.

Here, the substrate 1 is set at a predetermined position in the deposition tank, SiH ₄ diluted with H ₂ is introduced into the deposition tank, and the electrodes 11 and 12 and the insulating layer 13 are formed in a vacuum by a glow discharge method. After depositing a photoconductive layer (intrinsic layer) 15 made of a-Si having a layer thickness of 2000 Å on the entire surface of the substrate 1 on which the film has been provided, 1000 Å layer thickness is continuously applied on the photoconductive layer 15 by the same operation. N ⁺
Layer 16 was laminated as shown in Figure 3 (d). The substrate 1 was taken out of the deposition tank, and each of the n ⁺ layer 16 and the photoconductive layer 15 was patterned in this order into a desired shape by a dry etching method as shown in FIG. 3 (e).

Next, after vacuum-depositing Al with a layer thickness of 1000 Å on the substrate surface on which the photoconductive layer 15 and the n ⁺ layer 16 are provided in this manner,
This Al vapor deposition layer is patterned into a desired shape by a photolithography process, and a source electrode as shown in FIG.
17 and the drain electrode 18 were formed.

Finally, according to each of the pixel electrodes 11,
After forming a colored pattern of three colors of red, blue and green as shown in FIG. 3 (g) by the same method as in FIG.
As described above, a polyimide resin as an insulating film 22 having an orientation function is applied to the entire surface of the substrate so as to have a layer thickness of 1200 Å.
The resin was cured by heat treatment at 1 ° C. for 1 hour to prepare a thin film transistor in which a color filter was integrated.

A liquid crystal display element for color was further formed using the thin film transistor with a color filter thus produced.

That is, on one side of a glass substrate (trade name: 7059, manufactured by Corning Co., Ltd.), in the same manner as the above-mentioned method, 1000 liters of ITO
An electrode layer is formed, and an insulating layer having a layer thickness of 1200 Å made of a polyimide resin having an orientation function is further formed on the electrode layer,
A liquid crystal was enclosed between this substrate and the thin film transistor with a color filter formed earlier and the whole was fixed to obtain a color liquid crystal display element.

The color liquid crystal display element thus formed had a good function.

Example 3 Instead of providing a three-color filter on the pixel electrode,
A color liquid crystal display device having the color filter of the present invention was obtained in the same manner as in Example 2 except that it was provided on the counter electrode.

The color liquid crystal display element thus formed has a good function.

Example 4 A color liquid crystal display device having a color filter of the present invention was obtained in the same manner as in Example 2 except that a three-color color filter was first formed on a counter substrate and then a counter electrode was provided.

The color liquid crystal display element thus formed had a good function.

Comparative Example 2 Instead of using the photosensitive colored polyamide resin in Example 1, a polyvinyl alcohol resin containing ammonium dichromate as a cross-linking agent was used to form a three-color filter with the configuration of Example 4.

That is, the photosensitive blue coloring material was applied by a spinner, dried at 90 ° C. for 10 minutes, exposed and developed by a usual method, and heat-treated at 150 ° C. for 30 minutes to obtain a blue colored resin having a pattern shape. A film was formed.

Then, a green coloring pattern and a red coloring pattern are formed at predetermined positions by the same method, and R (red), G (green),
A 3-color stripe pattern of B (blue) was obtained.

When an attempt was made to form a transparent conductive film on the thus formed three-color filter by sputtering, the color resin discolored due to the low heat resistance of the color resin.

Example 5 A wafer with a CCD (charge, coupled, device) formed thereon is used as a substrate, and three-color stripes are arranged so that each colored pattern of a color filter is arranged corresponding to each light receiving cell of the CCD. A color solid-state imaging device having the color filter of the present invention was formed in the same manner as in Example 1 except that the color filter was formed.

The color solid-state image sensor formed in this manner had a good function.

Example 6 On a wafer on which CCDs (charged, coupled, device) are formed, the color filters formed in Example 1 are provided with the colored patterns of the color filters corresponding to the light receiving cells of the CCDs. The color solid-state imaging device was formed by aligning and adhering so as to be arranged.

The color solid-state image sensor formed in this manner had a good function.

Example 7 A color photosensor array having a color filter of the present invention as shown in the partial schematic plan view of FIG. 4 was formed as follows according to the steps shown in FIG.

First, glass substrate (Product name: 7059, Corning) 1
A photoconductive layer (intrinsic layer) 15 composed of an a-Si (amorphous silicon) layer was provided on the above by a glow discharge method as shown in FIG. 5 (a).

That is, SiH ₄ diluted with H ₂ to 10% by volume is used for gas pressure 0.50.
Torr, RF (Radio Frequency) power 10W, substrate temperature 250
The photoconductive layer 15 having a thickness of 0.7 μm was obtained by depositing the photoconductive layer 15 on the substrate at a temperature of 2 ° C. for 2 hours.

Subsequently, an n ⁺ layer 16 was provided on the photoconductive layer 15 by the glow discharge method as shown in FIG. 5 (b).

That is, SiH ₄ diluted to 10% by volume with H ₂ and 100 p with H ₂ .
A gas obtained by mixing PH ₃ diluted to pm at 1:10 was used as a raw material, and the other conditions were the same as the previous photoconductive layer deposition conditions, and the photoconductive layer 15 was continuously formed to have a layer thickness of 0.1 μm. An n ⁺ layer 16 was provided.

Next, as shown in FIG. 5 (c), Al is formed by the electron beam evaporation method.
Was deposited on the n ⁺ layer 16 with a layer thickness of 0.3 μm to deposit the conductive layer 19. Then, as shown in FIG. 5D, the conductive layer 19 is formed.
The part corresponding to the part that becomes the light conversion part of was removed.

That is, after forming a photoresist pattern in a desired shape using a positive type Microposit 1300-27 (trade name, manufactured by Shipley) photoresist, phosphoric acid (85% by volume aqueous solution), nitric acid (60% by volume aqueous solution) ), Glacial acetic acid and water are mixed in a ratio of 16: 1: 2: 1 to remove the conductive layer 19 on the exposed portion (the portion where the resist pattern is not provided) from the substrate, and the common electrode 21 And individual electrode 20
Was formed.

Next, as shown in FIG. 5 (e), the n ⁺ layer 16 in the portion to be the light conversion portion was removed.

That is, after peeling off the microposit 1300-27 photoresist from the substrate, a plasma etching method (also known as reactive ion etching method) using a parallel plate type plasma etching apparatus DEM-451 (manufactured by Nidec Anerva)
Then, dry etching was performed for 5 minutes with CF ₄ gas at an RF power of 120 W and a gas pressure of 0.1 Torr to remove the exposed n ⁺ layer 16 and a part of the surface layer of the photoconductive layer 15 from the substrate.

In this embodiment, in order to prevent implantation of the cathode material of the etching apparatus, a sputtering target of polysilicon (8 inches, purity
99.999%), the sample was placed on it, and the part of the cathode material where SUS was exposed was covered with a Teflon sheet cut out in a donut shape, and etching was performed while the SUS surface was hardly exposed by plasma. Then, heat treatment was performed at 20 ° C. for 60 minutes in an oven in which nitrogen was flown at a rate of 3 / min.

Next, a protective layer was formed on the surface of the photosensor array thus manufactured as follows.

That is, a silicon nitride layer as the protective layer 7 was formed on the photosensor array by the glow discharge method.

That is, 10% by volume diluted with H ₂ SiH ₄ and 100% NH ₃
A protective layer made of a silicon nitride (a-SiNH) layer having a layer thickness of 0.5 μm, using a mixed gas mixed at a flow rate ratio of 1: 4, and otherwise the same as forming the a-Si layer above. 7
Was formed as shown in FIG.

Further, using this protective layer 7 as a substrate, a color filter consisting of three colored patterns of blue 5, green 4, and red 6 was formed in the same manner as in Example 1, and as shown in FIG. A color photosensor array was formed in which colored filters were arranged on the sensors.

The color photosensor array formed in this example also had a good function.

Example 8 A color photosensor array was formed by sticking the color filter formed in Example 1 onto the photosensor array formed in Example 7 using an adhesive.

The color photosensor formed in this example also had a good function as in the case of forming the color photosensor in Example 7.

EFFECTS OF THE INVENTION According to the present invention, a colored resin material in which a coloring material is dispersed in an aromatic polyamide resin having a photosensitive group in the molecule is used, and a pattern shape formed by only a normal photolithography process is used. Since it has a colored resin layer, the following effects can be obtained.

That is, a color filter having a fine pattern excellent in mechanical strength and excellent in various properties such as heat resistance, light resistance, and solvent resistance is produced by a simple manufacturing process using a colored resin material that can be easily prepared. It became possible to make. Therefore, it is possible to apply to a wide variety of devices that require a color filter with good performance, and it is possible to produce a color device with excellent characteristics.

Furthermore, according to the present invention, it is possible to easily design desired spectral characteristics by controlling the type and concentration of the coloring material in the colored resin and the thickness of the colored resin layer.

[Brief description of drawings]

1 (a) to 1 (f) are process drawings for explaining the method for forming the color filter of the present invention, and FIG. 2 is a colored resin layer of the color filter of the present invention obtained in Example 1. 3 (a) to 3 (h) are manufacturing process diagrams of a color liquid crystal display device having the color filter of the present invention, and FIG. 4 is a color photo device having the color filter of the present invention. FIGS. 5A to 5G are schematic plan partial views of the sensor array, which are process diagrams of forming the color photosensor array shown in FIG. 1: Substrate, 2: Colored resin film 2a: Photocured part, 3: Photomask 4,5,6: Patterned colored resin layer 7: Protective layer 8: Spectral characteristics of red colored resin layer 9: Green colored resin layer Spectral characteristics 10: Spectral characteristics of blue colored resin layer 11: Pixel electrode, 12: Gate electrode 13: Insulating layer, 14: Through hole 15: Photoconductive layer, 16: n ⁺ layer 17: Source electrode, 18: Drain electrode 19: Conductive layer, 20: Individual electrode 21: Common electrode, 22: Insulating film

Front page continuation (72) Inventor Nobuyuki Sekimura 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. (56) Reference JP-A-60-237441 (JP, A) JP-A-60-129707 ( JP, A) JP 60-78401 (JP, A)

Claims (7)

[Claims] 1. A polymer having a photosensitive group in its molecule, 200 ° C.
Having a patterned colored resin layer obtained by applying an exposure and development process to a layer formed of a colored resin obtained by dispersing a coloring material in an aromatic polyamide resin capable of obtaining a cured film below A color filter characterized by that. 2. The color filter according to claim 1, wherein the colored resin layer is a patterned colored resin layer provided on a substrate. 3. The colored resin layer is a patterned colored resin layer formed by coating and forming a colored resin film having a photosensitive group on a substrate, and then exposing and developing the film with a predetermined mask. The color filter according to item 1 above. 4. The color filter according to claim 2 or 3, wherein the substrate is a display portion of a display device. 5. The color filter according to claim 2 or 3, wherein the substrate is a solid-state image sensor. 6. The color filter according to claim 2 or 3, wherein the substrate is a light receiving surface of an image sensor. 7. The color filter according to claim 1, wherein the aromatic polyamide resin has an aromatic chain having a photosensitive hydrocarbon unsaturated group.