JPH0769487B2 - Color filter and element using the same - Google Patents

Description

TECHNICAL FIELD The present invention relates to a color filter and an element using the same, and particularly to a color filter suitable for fine color separation of a color display, a color image pickup element, a color sensor, and the like. It relates to an element using.

[Prior Art] Conventionally, as a color filter, gelatin on a substrate,
There is known a dyed color filter in which a mordant layer made of a hydrophilic polymer such as casein, glue or polyvinyl alcohol is provided, and the mordant layer is dyed with a dye to form a colored layer.

With such a dyeing method, it is relatively easy to deal with the spectral characteristics required as a filter because many dyes can be used, but in the dyeing process of the mordant layer, the mordant layer is formed in a dye bath in which the dye is dissolved. It employs a wet process that is difficult to control, such as dipping, and has a drawback that the yield is poor because it has a complicated process of providing an intermediate layer for dye protection for each color. The heat resistance of dyeable dyes is 15
It is relatively low at about 0 ° C. or less, and when the filter requires thermal treatment, it is difficult to use and also has a drawback that the dyeing film itself has poor reliability such as heat resistance and light resistance. ing.

On the other hand, conventionally, a color filter using a colored resin in which a certain kind of coloring material is dispersed in a transparent resin is known.

For example, JP-A-58-46325, JP-A-60-78401, JP-A-60-184202, JP-A-60-184203, JP-A-60-184204, JP-A-60-184204. As shown in JP-A 60-184205, etc., these color filters are
Since it is formed of a colored resin film in which a coloring material is mixed with a polyamino resin, it is a useful color filter having excellent properties such as heat resistance and light resistance.

Further, in recent years, in order to simplify the manufacturing process of the color filter, a color filter using a coloring material having photosensitivity, for example, a polyimide resin has been developed. For example, JP-A-57-16407 and JP-A-57-747.
It is disclosed in Japanese Patent Laid-Open No. 07, Japanese Patent Laid-Open No. 60-129707 and the like.

However, all of the color filters formed by the above colored resin film have a ratio P / V of the weight (P) of the pigment dispersed in the resin of the colored resin film to the weight (V) of the resin and the surface of the color filter layer. Since the roughness has not been examined, the scattering amount of the color filter when the color filter is irradiated with light varies depending on the red, green, and blue colored resin films. It was not fully satisfactory as it adversely affected the color properties of the sensor.

[Problems to be Solved by the Invention] The object of the present invention is to eliminate the drawbacks of the above-mentioned conventional examples, and by using a conventional colored resin layer, the heat resistance, light resistance, and solvent resistance of a color filter are obtained. It is intended to provide an excellent color filter having excellent display quality and color characteristics of a sensor and having less flare, and an element using the same, while having advantages such as properties as they are.

[Means for Solving Problems] and [Function] That is, the first invention of the present invention is a blue color formed by a printing process or a photolithography process using a colored resin in which a pigment is dispersed in a resin. In a color filter having green and red patterned colored resin layers, the ratio P / V of the weight (P) of the pigment contained in each colored resin layer to the weight (V) of the resin is a blue colored resin layer. The green color resin layer and the red color resin layer are formed in this order to increase in size.

A second invention of the present invention is to use a colored resin in which a pigment is dispersed in a resin, and to have a patterned colored resin layer of blue, green and red formed by a printing process or a photolithography process, It is formed so that the ratio P / V of the weight (P) of the pigment contained in each colored resin layer to the weight (V) of the resin increases in the order of the blue colored resin layer, the green colored resin layer, and the red colored resin layer. It is a liquid crystal element including a color filter and a liquid crystal.

The third invention of the present invention, using a colored resin obtained by dispersing a pigment in a resin, having a colored resin layer having a pattern of blue, green and red formed by a printing process or a photolithography process, It is formed so that the ratio P / V of the weight (P) of the pigment contained in each colored resin layer and the weight (V) of the resin increases in the order of the blue colored resin layer, the green colored resin layer, and the red colored resin layer. A solid-state image sensor having a color filter formed by

A fourth invention of the present invention uses a colored resin obtained by dispersing a pigment in a resin, and has a patterned colored resin layer of blue, green and red formed by a printing process or a photolithography process, It is formed so that the ratio P / V of the weight (P) of the pigment contained in each colored resin layer to the weight (V) of the resin increases in the order of the blue colored resin layer, the green colored resin layer, and the red colored resin layer. An image sensor element having a color filter formed by

Hereinafter, the present invention will be described in detail.

Usually, in the method of forming a color filter with the colored resin, it is difficult to eliminate the roughness of the surface layer of the colored resin layer because the pigment is dispersed in the resin. Therefore, the present invention is characterized in that the roughness of the surface layer is controlled by the P / V ratio.

Generally, when a particle is exposed to light, the light is scattered, and if the particle is smaller than the wavelength of light, the scattering intensity is proportional to the square of the volume of the particle and the fourth power of the wavelength at that time. Inversely proportional to is known as Rayleigh scattering.

Therefore, even if the surface has irregularities, scattering corresponding to Rayleigh scattering occurs, so that in the color filter, if the surface of the colored resin film is rough, it is unavoidable that the incident light is scattered.

Now, the scattering state of incident light will be described with reference to the drawings. FIGS. 6A to 6C are explanatory views showing a state in which light is scattered by the surface roughness of the colored resin layer depending on the P / V ratio. In FIG. 6, a colored resin layer in which pigment particles 63 are dispersed in a resin 62 at a predetermined P / V ratio is formed on a substrate 61, and incident light 64 is incident on the colored resin layer. Incident light 64
Is scattered light 65 due to the surface roughness of the colored resin layer. The P / V ratio is shown in FIG. 6A, FIG. 6B, and FIG.

On the other hand, if the surface of the colored resin layer of the color filter is completely smooth, almost no scattering occurs, but in the case of a color filter formed by a colored resin in which the pigment is dispersed in the resin, the pigment is not Since the pigment having a predetermined particle size is not dissolved but dispersed in the resin, the surface is apt to be roughened.

However, in the past, since the surface roughness of the color filter by the colored resin layer has not been studied, if the surface roughness of each of the colored resin layers of blue, green and red is almost the same, blue The colored resin layer has the largest scattering, the green colored resin layer has the second largest scattering, and the red colored resin layer has the smallest scattering.

In addition, even with the same blue colored resin layer, the greater the surface roughness, the greater the scattering intensity.

Thus, conventionally, the blue, green, and red colored resin layers have different scattering intensities, so that, for example, in the case of a liquid crystal display element, the appearance of each color is different and the display quality is degraded.

Further, in the case of a sensor such as a solid-state image sensor, the balance of the spectral characteristics of each color is different, which deteriorates the sensor characteristics.

The color filter of the present invention, by increasing the P / V ratio in the colored resin layer in the order of the blue colored resin layer, the green colored resin layer, and the red colored resin layer, the blue, green, and red colored resin layers are scattered. The strength is made substantially equal, and the color balance is improved.

Further, the color filter of the present invention is excellent in reliability because it is formed from a resin system having good durability such as mechanical properties, heat resistance, light resistance and solvent resistance, and a colored resin layer using a pigment. Since it has the characteristics, an excellent color filter can be easily designed, and a fine pattern can be formed by a simple method including only a general printing process and a photolithography process.

The P / V ratios of the colored resin layers of the respective colors in the present invention are (P / V) _{B for} the blue colored resin layer, (P / V) _G for the green colored resin layer, and (P / V) _R for the red colored resin layer. Then, the object of the present invention is achieved by setting (P / V) _B <(P / V) _G <(P / V) _R.

Preferably, the ratio of (P / V) _B : (P / V) _G : (P / V) _R is
(P / V) When _R is 1.0, (0.5 to 0.8) :( 0.8 to 0.95): 1.0 is preferable.

Further, the insulation value of the P / V ratio of each color is preferably 1/2 or less because the film formation becomes more difficult as the amount of pigment increases.

Since the P / V ratio can be freely controlled by selecting the amount of the pigment dispersed in the resin and the distribution of the amount of the resin, the P / V ratio can be controlled accurately.

The resin forming the colored resin layer of the color filter of the present invention, a cured film can be obtained at 300 ℃ or less,
For example, acrylic resin, polyamino resin (polyimide resin, polyamide resin), epoxy resin, urethane resin, polycarbonate resin, silicon resin, etc., especially for specific light absorption in the visible light wavelength range (400 to 700 nm) Those that do not have the characteristics (light transmittance of about 90% or more) are preferable.

As an acrylic resin, JMC-25 made by Japan Synthetic Rubber Co., Ltd.
And RFG manufactured by Sekisui Fine Chemical Co., Ltd.

In order to impart photosensitivity to the resin, a group having photosensitivity may be included in the molecule.

The photosensitive group in the present invention may be an aromatic chain having a photosensitive hydrocarbon unsaturated group as shown below, for example, (1) benzoic acid esters (In the formula, R ₁ is CHX = CY-COO-Z-, X is -H or -C ₆ H ₅ ,
Y is -H or -CH _3, Z is - or an ethyl group or a glycidyl group) (2) Benzyl acrylate (In the formula, Y represents -H or CH ₃ ) (3) Diphenyl ethers (In the formula, R ₂ is CHX = CY-CONH-, CH ₂ = CY-COO- (CH ₂ ) ₂
-OCO or CH ₂ = containing one or more CY-COO-CH _2- , X,
Y represents the same group as above) (4) Chalcones and other compound chains (In the formula, R ₃ represents H-, an alkyl group or an alkoxy group) Etc.

Specific examples of aromatic polyamide resins and polyimide resins having such groups in the molecule are lysocoat PA-10.
Examples include 00 (manufactured by Ube Industries, Ltd.) and Lithocoat PI-400 (manufactured by Ube Industries, Ltd.).

Generally, there are few photosensitive resins used in the photolithography process, which have excellent mechanical properties, heat resistance, light resistance, solvent resistance, and the like, although there are differences depending on their chemical structures. On the other hand, the above-mentioned photosensitive polyamino resin of the present invention is a resin system having excellent durability in terms of chemical structure as well, and the color filter formed by using them also has very good durability. Becomes

The pigment forming the colored resin layer of the color filter of the present invention is not particularly limited as long as it can obtain desired spectral characteristics among organic pigments and inorganic pigments. In this case, each material can be used alone or as a mixture of some of them. Organic pigments are preferable in consideration of the color characteristics and various properties of the color filter.

Organic pigments include azo pigments such as soluble azo pigments, insoluble azo pigments and condensed azo pigments, phthalocyanine pigments,
And condensed polycyclic pigments containing indigo, anthraquinone, perylene, perinone, dioxazine, quinacridone, isoindolinone, phthalone, methine, azomethine, other metal complex, or some of these A mixture of these is used.

The particle size of the pigment dispersed in the resin varies depending on the type of resin, but is usually preferably 0.1 μm or less.

In the present invention, the colored resin used for forming the colored resin layer may be, for example, the above-mentioned pigment having a desired spectral characteristic in the photosensitive polyamino-based resin solution.
It is mixed by a ratio to obtain a P / V ratio, sufficiently dispersed by ultrasonic waves or three rolls, and then the particles having a large particle size are removed by a filter to prepare.

The colored resin layer of the color filter of the present invention is formed into a pattern by a photolithography process in which the colored resin is applied onto a substrate by a coating device such as a spinner or a roll coater, and the layer thickness has a desired spectral characteristic. However, it is usually 0.5 to 5 μm, preferably 1
Approximately 2 μm is desirable.

The colored resin layer of the color filter of the present invention itself is composed of a good material having sufficient durability, but in particular, to protect the colored resin layer from various environmental conditions, , Organic resin such as polyamide, polyimide, polyurethane, polycarbonate, silicon, or inorganic film such as Si ₃ N ₄ , SiO ₂ , SiO, Al ₂ O ₃ , Ta ₂ O ₃ is spin coated on the surface of the colored resin layer, and rolled. The protective layer can be provided by a coating method or a vapor deposition method. Further, after forming the protective layer, depending on the material, an alignment treatment may be performed to make it applicable to a device using liquid crystal.

The color filter having the colored resin layer as described above can be formed on an appropriate substrate. For example, a glass plate, a transparent resin plate, a resin film, or a cathode ray tube display surface, a light receiving surface of an image pickup tube, a wafer on which a solid-state image pickup device such as CCD, BBD, CID, or BASIS is formed, or a contact image sensor using a thin film semiconductor. , Liquid crystal display surfaces, color electrophotographic photoreceptors, substrates for electrochromic (EC) display devices, and the like.

If it is necessary to further increase the adhesiveness between the colored resin layer and the underlying substrate, either apply a thin coating of the silane coupling agent or the like on the substrate beforehand and then form the colored resin pattern, or It is more effective to form the color filter by using a material to which a small amount of a silane coupling agent or the like is added.

Hereinafter, a typical method for forming a color filter of the present invention will be described with reference to the drawings.

FIG. 1 is a process diagram illustrating a method for forming a color filter using the photosensitive colored resin of the present invention. First, as shown in FIG. 1A, a colored resin film 2 of a first color is formed on a predetermined substrate 1 by using a polyamino resin solution (NMP solution) in which a predetermined amount of a pigment having a desired spectral characteristic is mixed. Then, a spinner is used to form a film having a predetermined thickness, and prebaking is performed under an appropriate temperature condition. Then, as shown in FIG. 1B, light having the sensitivity of the photosensitive coloring resin (for example, a high-pressure mercury lamp) is used to pass through a photomask 3 having a predetermined pattern shape corresponding to the pattern to be formed. The colored resin film is exposed to light and the pattern portion is photocured.

Then, as shown in FIG. 1 (c), the colored resin film 2 having the photo-cured portion 2a is dissolved in a solvent that dissolves only the unexposed portion (for example,
After ultrasonic development with N-methyl-2-pyrrolidone-based solvent etc. as a main component, rinse treatment (for example, 1,1,
1-trichloroethane, etc.). Then, post-baking treatment is performed to obtain the patterned colored resin layer 4 of the present invention as shown in FIG. 1 (d).

In the case of forming the color filter of the present invention having two or more colors, it is necessary to further change the color filter from FIG.
Through the process up to the figure (d), the pigment corresponding to each color is given P /
Repeatedly using each of the colored resin liquids dispersed in V, for example, a color filter consisting of three colors of patterned colored resin layers 4, 5 and 6 of different colors as shown in FIG. 1 (e) is used. Can be formed.

Further, the color filter of the present invention may have a protective layer 7 formed of the above-mentioned material on the upper part of the filter as shown in FIG. 1 (f).

[Examples] Examples of the present invention will be shown below.

Example 1 A blue colored resin material [Heliogen Blue L] capable of obtaining desired spectral characteristics on a glass substrate.
7080 (trade name, manufactured by BASF, CI No. 74160) to PA-1000 (trade name, manufactured by Ube Industries, polymer content 10%, solvent = N-methyl-2-pyrrolidone) with a P / V ratio of 0.6. The photosensitive coloring resin material thus dispersed was applied by a spinner coating method to a film thickness of 2.0 μm. Next, apply 8 to the colored resin layer.
After prebaking at 0 ° C. for 30 minutes, exposure was performed with a high pressure mercury lamp through a pattern mask corresponding to the pattern shape to be formed. After completion of the exposure, development is carried out using ultrasonic waves with a dedicated developing solution (developing solution containing N-methyl-2-pyrrolidone as a main component) which dissolves only the unexposed portion of the colored resin film, and After treatment with a rinse liquid containing 1,1,1-trichloroethane as a main component), post-baking was performed at 150 ° C. for 30 minutes to form a blue colored resin film having a pattern shape.

Then, a green colored resin material [Lionol Green 6YK (trade name, manufactured by Toyo Ink Co., Ltd., C.
P.I.No.74265) to PA-1000 (trade name, manufactured by Ube Industries, polymer content 10%, solvent = N-methyl-2-pyrrolidone)
A green colored pattern was formed at a predetermined position on the substrate in the same manner as described above, except that a photosensitive colored resin material prepared by dispersing the V ratio to 0.9 was used.

Further, as a third color, a red colored resin material [Irgazin Red BPT (trade name, manufactured by Ciba-Geigy, CINo. .71127) to PA-1000
(Product name, manufactured by Ube Industries, polymer content 10%, solvent = N-
Methyl-2-pyrrolidone) to have a P / V ratio of 1.0 so that a photosensitive colored resin material] is prepared.
In the same manner as described above, a red colored pattern was formed at a predetermined position on the substrate to obtain a colored pattern of R (red), G (green) and B (blue) 3-color stripes.

The resin coating method can also be achieved by a commonly used coating method such as a roll coater method or a printing method.

The spectral characteristics of the three-color filter thus formed are shown in FIG.

When the scattered light of the obtained color filter was measured by using an integrating sphere, the scattering intensity in each color pattern of blue, green and red was almost equal to or less than 0.1%. Therefore, since the heat ratio is small, the contrast is also improved,
A color filter with good display quality could be obtained.

Usually, when considering scattering, for example, in the case of a green filter, blue light in a shorter wavelength range than green should be scattered largely, but in an absorption type color filter using the pigment according to the present invention, blue is a pigment. , So the blue scattering is suppressed as much as possible.

Therefore, as in the present invention, it is effective to consider scattering only in the wavelength range of a desired color.

In addition, the obtained color filter has excellent heat resistance and is 250
It withstands temperatures above ℃, which makes it possible to sputter ITO on CF.

In addition, the hardness is high and the mechanical properties are excellent, and even if the CF is configured so as to be in contact with the spacer in the liquid crystal cell, the CF will not be damaged during pressure bonding. Further, it has excellent solvent resistance, is strong against each solvent after curing, does not change during each production process step, and has excellent light resistance.

Comparative Example 1 Using the same colored resin materials as those used in Example 1 having the same P / V ratios of 2.5 for blue, green, and red, R (red) was used in the same manner as in Example 1. A color filter having a colored pattern of three-color stripes of G, G, and B was prepared.

The scattering intensity of the obtained red, green and blue colored patterns is
The scattering intensity was 0.1 to 0.5%, which was not constant for each color.

Example 2 A thin film transistor was used as a substrate, and a color liquid crystal display device in which the color filter of the present invention was formed on the substrate was manufactured as follows.

First, as shown in FIG. 3 (a), a glass substrate (trade name: 7
(059, manufactured by Corning) 1) an ITO pixel electrode 11 having a layer thickness of 1000Å is formed into a desired pattern by a photolithography process, and then Al is vacuum-deposited on the surface to a layer thickness of 1000Å. The gate electrode 12 as shown in FIG. 3B was formed by patterning into a desired shape by the process.

Next, photosensitive polyimide (trade name: semicofine,
Toray Co., Ltd.) is applied on the surface of the substrate 1 on which the electrodes are provided to form an insulating layer 13, and through holes 14 which form a contact portion between the drain electrode 18 and the pixel electrode 11 are formed by pattern exposure and development treatment. It was formed as shown in FIG.

Here, the substrate 1 is set at a predetermined position in the deposition tank, SiH ₄ diluted with H ₂ is introduced into the deposition tank, and the electrodes 11 and 12 and the insulating layer 13 are formed in a vacuum by a glow discharge method. After depositing a photoconductive layer (intrinsic layer) 15 made of a-Si having a layer thickness of 2000 Å on the entire surface of the substrate 1 on which the film has been provided, 1000 Å layer thickness is continuously applied on the photoconductive layer 15 by the same operation. N ⁺
Layer 16 was laminated as shown in Figure 3 (d). The substrate 1 was taken out of the deposition tank, and each of the n ⁺ layer 16 and the photoconductive layer 15 was patterned in this order into a desired shape by a dry etching method as shown in FIG. 3 (e).

Next, after vacuum-depositing Al with a layer thickness of 1000 Å on the substrate surface on which the photoconductive layer 15 and the n ⁺ layer 16 are provided in this manner,
This Al vapor deposition layer is patterned into a desired shape by a photolithography process, and a source electrode as shown in FIG.
17 and the drain electrode 18 were formed.

Finally, according to each of the pixel electrodes 11,
After forming a colored pattern of three colors of red, blue and green as shown in FIG. 3 (g) by the same method as in FIG.
As described above, a polyimide resin as an insulating film 22 having an orientation function is applied to the entire surface of the substrate so as to have a layer thickness of 1200 Å.
The resin was cured by heat treatment at 1 ° C. for 1 hour to prepare a thin film transistor in which a color filter was integrated.

A liquid crystal display element for color was further formed using the thin film transistor with a color filter thus produced.

That is, on one side of a glass substrate (trade name: 7059, manufactured by Corning Co., Ltd.), in the same manner as the above method, 1000 liters of ITO
An electrode layer is formed, and an insulating layer having a layer thickness of 1200 Å made of a polyimide resin having an orientation function is further formed on the electrode layer,
A liquid crystal was enclosed between this substrate and the thin film transistor with a color filter formed earlier and the whole was fixed to obtain a color liquid crystal display element.

The color liquid crystal display element formed in this manner had a function of good display quality.

Example 3 Instead of providing a three-color filter on the pixel electrode,
A color liquid crystal display device having the color filter of the present invention was obtained in the same manner as in Example 2 except that it was provided on the counter electrode.

The color liquid crystal display element formed in this manner has a function of good display quality.

Example 4 A color liquid crystal display device having a color filter of the present invention was obtained in the same manner as in Example 2 except that a three-color color filter was first formed on a counter substrate and then a counter electrode was provided.

The color liquid crystal display element thus formed had a function of good display quality.

Example 5 A wafer with a CCD (charge, coupled, device) formed thereon is used as a substrate, and three-color stripes are arranged so that each colored pattern of a color filter is arranged corresponding to each light receiving cell of the CCD. A color solid-state imaging device having the color filter of the present invention was formed in the same manner as in Example 1 except that the color filter was formed.

The color solid-state image pickup device formed in this manner had no flare and had a function of good color characteristics of the sensor.

Example 6 On a wafer on which CCDs (charged, coupled, device) are formed, the color filters formed in Example 1 are provided with the colored patterns of the color filters corresponding to the light receiving cells of the CCDs. The color solid-state imaging device was formed by aligning and adhering so as to be arranged.

The color solid-state image pickup device formed in this manner had no flare and had a function of good color characteristics of the sensor.

Example 7 A color photosensor array having a color filter of the present invention as shown in the partial schematic plan view of FIG. 4 was formed as follows according to the steps shown in FIG.

First, glass substrate (Product name: 7059, Corning) 1
A photoconductive layer (intrinsic layer) 15 composed of an a-Si (amorphous silicon) layer was provided on the above by a glow discharge method as shown in FIG. 5 (a).

That is, SiH ₄ diluted with H ₂ to 10% by volume is used for gas pressure 0.50.
Torr, RF (Radio Frequency) power 10W, substrate temperature 250
The photoconductive layer 15 having a thickness of 0.7 μm was obtained by depositing the photoconductive layer 15 on the substrate at a temperature of 2 ° C. for 2 hours.

Subsequently, an n ⁺ layer 16 was provided on the photoconductive layer 15 by the glow discharge method as shown in FIG. 5 (b).

That is, SiH ₄ diluted to 10% by volume with H ₂ and 100 p with H ₂ .
A gas obtained by mixing PH ₃ diluted to pm at 1:10 was used as a raw material, and the other conditions were the same as the previous photoconductive layer deposition conditions, and the photoconductive layer 15 was continuously formed to have a layer thickness of 0.1 μm. An n ⁺ layer 16 was provided.

Next, as shown in FIG. 5 (c), Al is formed by the electron beam evaporation method.
Was deposited on the n ⁺ layer 16 with a layer thickness of 0.3 μm to deposit the conductive layer 19. Then, as shown in FIG. 5D, the conductive layer 19 is formed.
The part corresponding to the part that becomes the light conversion part of was removed.

That is, after forming a photoresist pattern in a desired shape using a positive type Microposit 1300-27 (trade name, manufactured by Shipley) photoresist, phosphoric acid (85% by volume aqueous solution), nitric acid (60% by volume aqueous solution) ), Glacial acetic acid and water are mixed in a ratio of 16: 1: 2: 1 to remove the conductive layer 19 on the exposed portion (the portion where the resist pattern is not provided) from the substrate, and the common electrode 21 And individual electrode 20
Was formed.

Next, as shown in FIG. 5 (e), the n ⁺ layer 16 in the portion to be the light conversion portion was removed.

That is, after removing the microposit 1300-27 photoresist from the substrate, a plasma etching method (also known as reactive ion etching method) using a parallel plate type plasma etching apparatus DEM-451 (manufactured by Nidec Anerva)
Then, dry etching was performed for 5 minutes with CF ₄ gas at an RF power of 120 W and a gas pressure of 0.1 Torr to remove the exposed n ⁺ layer 16 and a part of the surface layer of the photoconductive layer 15 from the substrate.

In this embodiment, in order to prevent implantation of the cathode material of the etching apparatus, a sputtering target of polysilicon (8 inches, purity
99.999%), the sample was placed on it, and the part of the cathode material where SUS was exposed was covered with a Teflon sheet cut out in a donut shape, and etching was performed while the SUS surface was hardly exposed to plasma. Then, heat treatment was performed at 20 ° C. for 60 minutes in an oven in which nitrogen was flown at a rate of 3 / min.

Next, a protective layer was formed on the surface of the photosensor array thus prepared as follows.

That is, a silicon nitride layer as the protective layer 7 was formed on the photosensor array by the glow discharge method.

That is, SiH ₄ diluted with H ₂ to 10% by volume and 100% NH ₃
A protective layer made of a silicon nitride (a-SiNH) layer having a layer thickness of 0.5 μm, using a mixed gas mixed at a flow rate ratio of 1: 4, and otherwise the same as forming the a-Si layer above. 7
Was formed as shown in FIG.

Further, using this protective layer 7 as a substrate, a color filter consisting of three colored patterns of blue 5, green 4, and red 6 was formed in the same manner as in Example 1, and as shown in FIG. A color photosensor array was formed in which colored filters were arranged on the sensors.

The color photosensor array formed in this example also had no flare and had a good color characteristic function.

Example 8 A color photosensor array was formed by sticking the color filter formed in Example 1 onto the photosensor array formed in Example 7 using an adhesive.

The color photosensor formed in this example also had a good function as in the case of forming the color photosensor in Example 7.

[Effect of the Invention] According to the present invention, a colored resin layer is formed by using a colored resin material having a photosensitive group in the molecule or a pigment not dispersed in a resin having no photosensitive group, P / V of the weight (P) of the pigment and the weight (V) of the resin contained in the colored resin layer
Since the pattern-shaped colored resin layer is formed such that the ratio is larger in the order of the blue colored resin layer, the green colored resin layer and the red colored resin layer, the following effects can be obtained.

That is, since the scattering intensity scattered from the color filter is almost the same in the colored resin layers of blue, green, and red, the contrast of each color is also the same, and the display quality of the display element is significantly improved. To do. Further, also in the sensor element, the contrast is improved and the color characteristics are improved for the same reason.

Further, according to the present invention, a color filter having a fine pattern excellent in mechanical strength and excellent in various properties such as heat resistance, light resistance, and solvent resistance is easily prepared using a colored resin material. It can be manufactured by a simple manufacturing process. Therefore, it is possible to apply to a wide range of various devices that require a color filter with good performance, and it is possible to manufacture a color device with excellent characteristics.

Furthermore, according to the present invention, it is possible to easily design desired spectral characteristics by controlling the type and concentration of the coloring material in the colored resin and the thickness of the colored resin layer.

[Brief description of drawings]

1 (a) to 1 (f) are process drawings for explaining the method for forming the color filter of the present invention, and FIG. 2 is a colored resin layer of the color filter of the present invention obtained in Example 1. 3 (a) to 3 (h) are manufacturing process diagrams of a color liquid crystal display device having the color filter of the present invention, and FIG. 4 is a color photo device having the color filter of the present invention. 5A to 5G are schematic plan partial views of the sensor array, FIG. 5A to FIG. 5G are process diagrams of forming the color photosensor array shown in FIG. 4, and FIG. It is explanatory drawing which shows the state in which light is scattered by the surface roughness by V ratio. 1,61: Substrate, 2: Colored resin film 2a: Photo-cured part, 3: Photomask 4,5,6: Patterned colored resin layer 7: Protective layer 8: Spectral characteristics of red colored resin layer 9: Green colored resin Spectral characteristics of layers 10: Spectral characteristics of blue colored resin layer 11: Pixel electrode, 12: Gate electrode 13: Insulating layer, 14: Through hole 15: Photoconductive layer, 16: n ⁺ layer 17: Source electrode, 18: Drain electrode 19: conductive layer, 20: individual electrode 21: common electrode, 22: insulating film 62: resin, 63: pigment particle 64: incident light, 65: scattered light

Front Page Continuation (72) Inventor Yu Kamio 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. (72) Inventor Tatsuo Murata 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc.

Claims (7)

[Claims] 1. A color filter having a colored resin layer in a pattern of blue, green and red formed by a printing process or a photolithography process by using a colored resin in which a pigment is dispersed in a resin, and each of the above colorings. Ratio P / V of the weight (P) of the pigment contained in the resin layer and the weight (V) of the resin
Is formed in the order of a blue colored resin layer, a green colored resin layer, and a red colored resin layer in this order. 2. The color filter according to claim 1, wherein the resin has a photosensitive group in its molecule. 3. The color filter according to claim 1, wherein the colored resin layer is a patterned colored resin layer provided on a substrate. 4. The colored resin layer is a patterned colored resin layer formed by coating and forming a colored resin film having a photosensitive group on a substrate, and then exposing and developing the film with a predetermined mask. The color filter according to the first or third range. 5. A colored resin layer formed by a printing process or a photolithography process using a colored resin in which a pigment is dispersed in a resin, the colored resin layer having a pattern of blue, green, and red, and each of the colored resin layers. Weight of pigment contained in (P)
A liquid crystal device comprising a color filter and a liquid crystal formed such that the ratio P / V of the resin weight (V) increases in the order of the blue colored resin layer, the green colored resin layer, and the red colored resin layer. 6. A colored resin having a pattern of blue, green and red formed by a printing process or a photolithography process using a colored resin obtained by dispersing a pigment in a resin, and each of the colored resin layers. Weight of pigment contained in (P)
And a resin weight (V) ratio P / V is a blue colored resin layer, a green colored resin layer, and a solid color image sensor provided with a color filter formed so as to increase in this order. 7. A colored resin layer having a pattern of blue, green and red formed by a printing process or a photolithography process by using a colored resin in which a pigment is dispersed in a resin. Weight of pigment contained in (P)
An image sensor element having a color filter formed such that the ratio P / V of the resin weight (V) increases in the order of the blue colored resin layer, the green colored resin layer, and the red colored resin layer.