JPH0713841B2 - Texturing method of carbon substrate for magnetic disk - Google Patents
Texturing method of carbon substrate for magnetic diskInfo
- Publication number
- JPH0713841B2 JPH0713841B2 JP2083137A JP8313790A JPH0713841B2 JP H0713841 B2 JPH0713841 B2 JP H0713841B2 JP 2083137 A JP2083137 A JP 2083137A JP 8313790 A JP8313790 A JP 8313790A JP H0713841 B2 JPH0713841 B2 JP H0713841B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic disk
- carbon substrate
- substrate
- texture
- carbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 title claims description 48
- 229910052799 carbon Inorganic materials 0.000 title claims description 39
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims description 38
- 238000000034 method Methods 0.000 title claims description 7
- 230000001590 oxidative effect Effects 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 description 10
- 230000003746 surface roughness Effects 0.000 description 9
- 238000001179 sorption measurement Methods 0.000 description 8
- 238000005498 polishing Methods 0.000 description 7
- 238000003672 processing method Methods 0.000 description 5
- 238000012360 testing method Methods 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000005339 levitation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 230000010485 coping Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910021397 glassy carbon Inorganic materials 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Landscapes
- Ceramic Products (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 磁気ディスクへの書き込み、あるいはその再生を行う際
に、ディスク静止時において磁気ヘッド浮揚面と磁気デ
ィスク表面との吸着が生じることがある。この吸着現象
を防止するため、磁気ディスク用基板を表面研磨した
後、その表面を粗面化するテクスチャー(texture)処
理が行われる。この発明は、このような磁気ディスク用
基板のテクスチャー処理方法に係り、特に、カーボン基
板のテクスチャー処理方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] When writing to or reproducing from a magnetic disk, the magnetic head levitation surface and the magnetic disk surface may stick to each other when the disk is stationary. In order to prevent this adsorption phenomenon, after the surface of the magnetic disk substrate is polished, a texture treatment for roughening the surface is performed. The present invention relates to such a texture processing method for a magnetic disk substrate, and more particularly to a texture processing method for a carbon substrate.
上述したような吸着現象は、磁気ヘッド浮揚面と磁気デ
ィスク表面が極めて平滑で微小間隔で対面しているとき
に、その間がO2、N2、H2O等の分子により埋めつくされ
て界面張力による大きな吸着力が発生することに起因し
ている。このヘッド吸着が発生すると、モータ起動時に
多大の電力を消費する等の不具合が生じる。When the magnetic head levitation surface and the magnetic disk surface are extremely smooth and face each other at a minute interval, the adsorption phenomenon as described above is filled with molecules such as O 2 , N 2 , H 2 O, etc. This is because a large attraction force is generated due to the tension. When this head adsorption occurs, there arises a problem that a large amount of electric power is consumed when starting the motor.
このような吸着現象を防ぐ目的で、基板の上に磁性膜な
どを形成するに先立ち、基板表面をいったん鏡面仕上げ
した後、その表面を粗くして適当な表面粗さに調整する
ためのテクスチャー処理が行われている。このテクスチ
ャー処理方法としては、従来、次のような方法が採られ
ている。In order to prevent such adsorption phenomenon, prior to forming a magnetic film on the substrate, the surface of the substrate is once mirror-finished and then textured to roughen the surface and adjust to an appropriate surface roughness. Is being done. Conventionally, the following method has been adopted as this texture processing method.
すなわち、炭化ケイ素、アルミナ、あるいはダイヤモン
ドの砥粒を付着させた研磨テープを使用し、NiPめっき
基板を回転させた状態で、研磨テープをテープ裏面側か
らロールで押し付けながら基板径方向に接触移動させ、
基板表面に同心円状の条こんを付け、いわゆるテクスチ
ャー付き基板を得るようにしている。That is, using a polishing tape to which abrasive grains of silicon carbide, alumina, or diamond are adhered, while the NiP plated substrate is rotated, while the polishing tape is pressed from the back side of the tape with a roll, contact movement is made in the substrate radial direction. ,
Concentric stripes are attached to the surface of the substrate to obtain a so-called textured substrate.
しかしながら、上記従来の方法では、基板表面を適当な
表面粗さに調整して粗面化することが難しく必要以上に
粗くなり易いという問題が生じている。そのため、従来
のテクスチャー処理方法によって粗面化された基板を用
いた磁気ディスクにおいては、高記録密度化に対処する
ための磁気ヘッドの浮上高さ(スペーシング)をより小
さくし得なかった。However, the above-mentioned conventional method has a problem that it is difficult to adjust the surface of the substrate to an appropriate surface roughness to roughen the surface, and the surface tends to be unnecessarily rough. Therefore, in the magnetic disk using the substrate roughened by the conventional texture processing method, the flying height (spacing) of the magnetic head for coping with the increase in recording density cannot be made smaller.
ところで、この記録密度を向上させるために磁気ディス
ク用基板に要求される特性としての高硬度、耐熱性、優
れた表面精度、軽量性を備えた基板として、カーボン基
板(アモルファスカーボン基板)が提案されている(神
戸製鋼技報、Vol.39、No4、35〜38頁、1989)。By the way, a carbon substrate (amorphous carbon substrate) has been proposed as a substrate having high hardness, heat resistance, excellent surface accuracy, and lightness, which are characteristics required for a magnetic disk substrate in order to improve the recording density. (Kobe Steel Technical Report, Vol.39, No4, pp. 35-38, 1989).
こうした状況のもとで、本発明者らは、カーボン基板の
持つ性質に着目してテクスチャー処理方法の研究を重ね
た結果、カーボン基板を酸化性雰囲気中にて所定の温度
で加熱処理することにより、前記問題点を解決し得るこ
とを見出し、この発明に到達したのである。Under these circumstances, the inventors of the present invention have conducted extensive research on texture treatment methods while paying attention to the properties of the carbon substrate, and as a result, heat-treating the carbon substrate at a predetermined temperature in an oxidizing atmosphere. The inventors have found that the above problems can be solved and arrived at the present invention.
すなわち、この発明は、表面研磨された磁気ディスク用
カーボン基板の表面を必要以上に粗くすることなく容易
に適当な表面粗さに粗面化することができる、磁気ディ
スク用カーボン基板のテクスチャー処理方法の提供を目
的とする。That is, the present invention provides a method for texture-treating a carbon substrate for a magnetic disk, which can easily roughen the surface of the carbon substrate for a magnetic disk whose surface has been polished to an appropriate surface roughness without making the surface rougher than necessary. For the purpose of providing.
上記の目的を達成するために、この発明による磁気ディ
スク用カーボン基板のテクスチャー処理方法は、表面研
磨された磁気ディスク用カーボン基板を酸化性雰囲気中
にて400〜700℃の温度で加熱処理することにより、前記
カーボン基板の表面を粗面化するようにしたことを特徴
としている。In order to achieve the above object, the method for texturing a carbon substrate for a magnetic disk according to the present invention comprises heat-treating a surface-polished carbon substrate for a magnetic disk at a temperature of 400 to 700 ° C. in an oxidizing atmosphere. Thus, the surface of the carbon substrate is roughened.
表面研磨されたカーボン基板を酸化性雰囲気中にて400
℃以上の温度に加熱すると、C+O2CO2,C+1/2O2C
O,CO+1/2O2CO2,C+CO22COの酸化反応が起こり、カ
ーボンがガス化されてその研磨面に微細な波状の凹凸が
形成される。これにより、加熱処理条件を選択すること
により表面研磨されたカーボン基板表面を必要以上に粗
くすることなく容易に適度に粗面化することができる。400 carbon surface polished in oxidizing atmosphere
When heated to a temperature above ℃, C + O 2 CO 2 , C + 1 / 2O 2 C
O, CO + 1 / 2O 2 CO 2 , C + CO 2 2CO oxidation reaction occurs, carbon is gasified, and fine wavy irregularities are formed on the polished surface. This makes it possible to easily and moderately roughen the surface-polished carbon substrate surface without making the surface of the carbon substrate roughened more than necessary by selecting the heat treatment conditions.
また、この発明においては加熱処理温度は400〜700℃の
範囲が適当である。400℃より低い温度ではカーボン基
板表面の粗面化に長時間を要し、700℃を超えると表面
粗さが粗くなり過ぎ易いためである。Further, in the present invention, the heat treatment temperature is suitably in the range of 400 to 700 ° C. This is because if the temperature is lower than 400 ° C, it takes a long time to roughen the surface of the carbon substrate, and if it exceeds 700 ° C, the surface roughness tends to be too rough.
以下、実施例に基づいてこの発明を説明する。 The present invention will be described below based on examples.
まず、磁気ディスク用カーボン基板の作製について説明
すると、炭化焼成後にガラス質炭素となる熱硬化性樹脂
であるフェノール・フォルムアルデヒド樹脂を磁気ディ
スク形状にホットプレス成形した後、これをN2ガス雰囲
気中で1500℃の温度に加熱して予備焼成した。次いで、
これを熱間静水圧加圧装置(HIP)を使用して2600℃に
加熱しつつ1800気圧の等方的圧力を加えてHIP処理す
る。この得られた成形体に所定の端面加工、表面鏡面仕
上げを施して表面粗さがRa20〜23Åの直径3.5インチの
磁気ディスク用カーボン基板とした。First of all, the production of a carbon substrate for a magnetic disk will be described. After phenol-formaldehyde resin, which is a thermosetting resin that becomes vitreous carbon after carbonization and firing, is hot-press molded into a magnetic disk shape, and then this is subjected to N 2 gas atmosphere Preheated by heating to a temperature of 1500 ° C. Then
This is subjected to HIP treatment by applying an isotropic pressure of 1800 atm while being heated to 2600 ° C using a hot isostatic press (HIP). The obtained molded body was subjected to predetermined end surface processing and surface mirror finishing to obtain a 3.5 inch diameter carbon substrate for a magnetic disk having a surface roughness Ra20 to 23Å.
次に、ステンレス製トレイに収められた25枚のカーボン
基板を電気炉内に入れ、大気雰囲気中にて後記の第1表
に示す熱処理温度、熱処理時間毎に25枚づつのカーボン
基板を加熱し、テクスチャー処理を行った。また、比較
のため、同じくRa20〜23Åの表面粗さに鏡面仕上げされ
たカーボン基板に先に説明した研磨テープを使用してテ
クスチャー処理した。なお、この研磨テープによるテク
スチャー処理条件は、研磨テープ:6000番、押し付け圧
力:2kg/cm2、基板回転数:800rpm、ロール硬度:90、処理
時間:2分とした。Next, the 25 carbon substrates contained in the stainless steel tray were placed in an electric furnace, and 25 carbon substrates were heated in the atmosphere at each heat treatment temperature and heat treatment time shown in Table 1 below. , Texture processing was performed. For comparison, a carbon substrate, which was also mirror-finished to have a surface roughness of Ra20 to 23Å, was textured using the above-mentioned polishing tape. The texture treatment conditions with this polishing tape were as follows: polishing tape: No. 6000, pressing pressure: 2 kg / cm 2 , substrate rotation speed: 800 rpm, roll hardness: 90, processing time: 2 minutes.
テクスチャー処理後、カーボン基板の表面粗さRaを測定
した。その結果を第1表に示す。After the texture treatment, the surface roughness Ra of the carbon substrate was measured. The results are shown in Table 1.
第1表から判るように、この発明によるテクスチャー処
理によれば、加熱処理温度を400〜700℃の範囲としてそ
の加熱処理時間を適当に選択することにより、太線で囲
まれた範囲で示すように、鏡面研磨されたカーボン基板
の表面粗さをRa30〜100Å程度の範囲に調整することが
できた。なお、400℃程度の比較的低温側の条件でテク
スチャー処理する場合には、酸素濃度を上げるようにし
て処理時間を短縮するようにしてもよい。 As can be seen from Table 1, according to the texture treatment according to the present invention, the heat treatment temperature is set in the range of 400 to 700 ° C., and the heat treatment time is appropriately selected so that the range shown by the thick line is shown. The surface roughness of the mirror-polished carbon substrate could be adjusted to the range of Ra30 to 100Å. When the texture treatment is performed at a relatively low temperature of about 400 ° C., the oxygen concentration may be increased to shorten the treatment time.
次に、テクスチャー処理したカーボン基板を使用して磁
気ディスクを作製し、ダイナミックフリクションテスタ
ーにて磁気ヘッド浮揚面と磁気ディスク表面との吸着試
験(スティッキング試験)を行った。すなわち、鏡面研
磨されたカーボン基板に500℃×60分、600℃×10分、70
0℃×5分の各加熱処理条件でテクスチャー処理を施
し、しかる後、このテクスチャー処理された各カーボン
基板上に、厚み1500ÅのCr下地膜と、厚み600ÅのCoNiC
r磁性膜と、厚み500ÅのC保護膜とをスパッタ法により
順次形成して磁気ディスクを作製した。なお、比較のた
め、研磨テープを使用してテクスチャー処理したカーボ
ン基板とテクスチャー処理なしのカーボン基板の上にも
上記と同様の各膜を形成して比較用の磁気ディスクを作
製し、同様に吸着試験を行った。Next, a magnetic disk was produced using the textured carbon substrate, and an adsorption test (sticking test) between the magnetic head levitating surface and the magnetic disk surface was conducted using a dynamic friction tester. That is, 500 ° C. × 60 minutes, 600 ° C. × 10 minutes, 70 ° C. on a mirror-polished carbon substrate.
Texture treatment is performed under each heat treatment condition of 0 ° C x 5 minutes, and then each of the texture-treated carbon substrates is subjected to a Cr underlayer having a thickness of 1500Å and CoNiC having a thickness of 600Å.
A magnetic disk and a C protective film having a thickness of 500Å were sequentially formed by a sputtering method to manufacture a magnetic disk. For comparison, a magnetic disk for comparison was prepared by forming the same films as above on a carbon substrate that was texture-treated using a polishing tape and a carbon substrate that was not texture-treated, and was similarly absorbed. The test was conducted.
吸着試験の結果を第2表に示す。第2表から理解される
ように、従来の研磨テープを用いる方法でテクスチャー
処理されたカーボン基板を使用した磁気ディスクにおい
ては、この実施例の条件では吸着現象は発生しなかった
が、磁気ヘッド浮上高さは0.2μmまでしか実現できな
かった。 The results of the adsorption test are shown in Table 2. As can be seen from Table 2, in the magnetic disk using the carbon substrate textured by the conventional method using the polishing tape, the adsorption phenomenon did not occur under the conditions of this example, but the magnetic head floated. The height could only be achieved up to 0.2 μm.
これに対してこの発明によるテクスチャー処理が施され
たカーボン基板を使用した磁気ディスクにおいては、磁
気ヘッド吸着を起こすことなく磁気ヘッド浮上高さを0.
1μm以下とすることができた。On the other hand, in the magnetic disk using the carbon substrate subjected to the texture treatment according to the present invention, the flying height of the magnetic head is set to 0 without causing magnetic head adsorption.
It could be 1 μm or less.
以上説明したように、この発明による磁気ディスク用カ
ーボン基板のテクスチャー処理方法では、表面研磨され
た磁気ディスク用カーボン基板を酸化性雰囲気中にて40
0〜700℃の温度で加熱処理するようにしたので、この加
熱処理によってカーボンがガス化されてその研磨面に微
細な波状の凹凸が形成され、表面研磨されたカーボン基
板の表面を必要以上に粗くすることなく容易に適当な表
面粗さに粗面化することができる。また、このテクスチ
ャー処理方法は工業的に極めて簡便であり、従来のそれ
に比べて量産性に優れているという効果も得られる。As described above, in the method for texture-treating a carbon substrate for a magnetic disk according to the present invention, the surface-polished carbon substrate for a magnetic disk is treated in an oxidizing atmosphere.
Since the heat treatment is performed at a temperature of 0 to 700 ° C., carbon is gasified by this heat treatment to form fine wavy irregularities on the polished surface, and the surface of the surface-polished carbon substrate is unnecessarily increased. It can be easily roughened to a suitable surface roughness without roughening. In addition, this texture processing method is industrially very simple and has the effect of being superior in mass productivity to the conventional method.
これにより、この発明によれば、この発明によるテクス
チャー処理を施したカーボン基板を用いて作製した磁気
ディスクは磁気ディスク装置に適用するにあたり磁気ヘ
ッド浮上高さを0.1μm以下とすることが可能となり、
高記録密度化に寄与することができる。As a result, according to the present invention, the magnetic disk manufactured by using the carbon substrate subjected to the texture treatment according to the present invention can have a magnetic head flying height of 0.1 μm or less when applied to a magnetic disk device.
This can contribute to higher recording density.
Claims (1)
板を酸化性雰囲気中にて400〜700℃の温度で加熱処理す
ることにより、前記カーボン基板の表面を粗面化するよ
うにしたことを特徴とする、磁気ディスク用カーボン基
板のテクスチャー処理方法。1. A surface-polished carbon substrate for a magnetic disk is heat-treated at a temperature of 400 to 700 ° C. in an oxidizing atmosphere to roughen the surface of the carbon substrate. And a method of texture-treating a carbon substrate for a magnetic disk.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2083137A JPH0713841B2 (en) | 1990-03-29 | 1990-03-29 | Texturing method of carbon substrate for magnetic disk |
| DE4109939A DE4109939C2 (en) | 1990-03-29 | 1991-03-26 | An amorphous carbon substrate for a magnetic disk and method of making the same |
| GB9106590A GB2242423B (en) | 1990-03-29 | 1991-03-28 | Amorphous carbon substrate for a magnetic disk and a method of manufacturing the same |
| US07/676,569 US5326607A (en) | 1990-03-29 | 1991-03-28 | Amorphous carbon substrate for a magnetic disk and a method of manufacturing the same |
| GB9401690A GB2274839B (en) | 1990-03-29 | 1994-01-28 | Amorphous carbon substrate for a magnetic disk and a method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2083137A JPH0713841B2 (en) | 1990-03-29 | 1990-03-29 | Texturing method of carbon substrate for magnetic disk |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03283018A JPH03283018A (en) | 1991-12-13 |
| JPH0713841B2 true JPH0713841B2 (en) | 1995-02-15 |
Family
ID=13793816
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2083137A Expired - Lifetime JPH0713841B2 (en) | 1990-03-29 | 1990-03-29 | Texturing method of carbon substrate for magnetic disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0713841B2 (en) |
-
1990
- 1990-03-29 JP JP2083137A patent/JPH0713841B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03283018A (en) | 1991-12-13 |
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