JPH0714673B2 - Method for producing support for lithographic printing plate - Google Patents
Method for producing support for lithographic printing plateInfo
- Publication number
- JPH0714673B2 JPH0714673B2 JP29245787A JP29245787A JPH0714673B2 JP H0714673 B2 JPH0714673 B2 JP H0714673B2 JP 29245787 A JP29245787 A JP 29245787A JP 29245787 A JP29245787 A JP 29245787A JP H0714673 B2 JPH0714673 B2 JP H0714673B2
- Authority
- JP
- Japan
- Prior art keywords
- lithographic printing
- treatment
- printing plate
- roughening treatment
- aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007639 printing Methods 0.000 title claims description 31
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 238000007788 roughening Methods 0.000 claims description 27
- 229910052782 aluminium Inorganic materials 0.000 claims description 22
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 22
- 150000003839 salts Chemical class 0.000 claims description 16
- 238000007743 anodising Methods 0.000 claims description 12
- 239000003792 electrolyte Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 description 26
- 239000000126 substance Substances 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 10
- 239000008151 electrolyte solution Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 239000000243 solution Substances 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 7
- 238000005299 abrasion Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- WWILHZQYNPQALT-UHFFFAOYSA-N 2-methyl-2-morpholin-4-ylpropanal Chemical compound O=CC(C)(C)N1CCOCC1 WWILHZQYNPQALT-UHFFFAOYSA-N 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 239000002002 slurry Substances 0.000 description 4
- WBHQBSYUUJJSRZ-UHFFFAOYSA-M sodium bisulfate Chemical compound [Na+].OS([O-])(=O)=O WBHQBSYUUJJSRZ-UHFFFAOYSA-M 0.000 description 4
- 229910000342 sodium bisulfate Inorganic materials 0.000 description 4
- 235000011121 sodium hydroxide Nutrition 0.000 description 4
- 239000004677 Nylon Substances 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000005238 degreasing Methods 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229920001778 nylon Polymers 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 239000010407 anodic oxide Substances 0.000 description 2
- 238000002048 anodisation reaction Methods 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000010835 comparative analysis Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- -1 for example Inorganic materials 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 235000010755 mineral Nutrition 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 1
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical class [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 241000978776 Senegalia senegal Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000004280 Sodium formate Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- VZTDIZULWFCMLS-UHFFFAOYSA-N ammonium formate Chemical compound [NH4+].[O-]C=O VZTDIZULWFCMLS-UHFFFAOYSA-N 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000004675 formic acid derivatives Chemical class 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- ZLQBNKOPBDZKDP-UHFFFAOYSA-L nickel(2+);diperchlorate Chemical compound [Ni+2].[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O ZLQBNKOPBDZKDP-UHFFFAOYSA-L 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920005596 polymer binder Polymers 0.000 description 1
- 239000002491 polymer binding agent Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000012047 saturated solution Substances 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HLBBKKJFGFRGMU-UHFFFAOYSA-M sodium formate Chemical compound [Na+].[O-]C=O HLBBKKJFGFRGMU-UHFFFAOYSA-M 0.000 description 1
- 235000019254 sodium formate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
Landscapes
- Printing Plates And Materials Therefor (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は平版印刷版用支持体の製造方法に関し、特にア
ルミニウム板の表面を粗面化処理したのち、溶融塩電解
液中で陽極酸化する平版印刷版用支持体の製造方法に関
するものである。TECHNICAL FIELD The present invention relates to a method for producing a lithographic printing plate support, and in particular, after roughening the surface of an aluminum plate, it is anodized in a molten salt electrolyte. The present invention relates to a method for producing a lithographic printing plate support.
従来、平版印刷版用支持体としてアルミニウム板が広く
使用されているが、支持体と感光層との密着性を良好に
し、かつ非画像部に保水性を与えるため、支持体の表面
を粗面化処理する、所謂、砂目立て処理がなされてい
る。Conventionally, an aluminum plate is widely used as a support for lithographic printing plates, but the surface of the support is roughened in order to improve the adhesion between the support and the photosensitive layer and to impart water retention to the non-image area. A so-called graining process, which is a chemical conversion process, is performed.
この砂目立ての具体的手段としては、サンドブラスト、
ボールグレイン、ワイヤーグレイン、ナイロンブラシと
研磨材/水スラリーによるブラシグレイン、研磨材/水
スラリーを表面に高圧で吹きつける方法などによる機械
的砂目立て方法があり、またアルカリまたは酸あるいは
それらの混合物からなるエッチング剤で表面を粗面化処
理する化学的砂目立て方法がある。また、特開昭54−14
6234号公報及び特公昭48−28123号公報に記載されてい
る電気化学的砂目立て方法、例えば特開昭53−123204号
公報に記載されている機械的砂目立て方法と電気化学的
砂目立て方法とを組合せた方法、特開昭56−55291号公
報に記載されている機械的砂目立て方法と鉱酸のアルミ
ニウム塩の飽和水溶液による化学的砂目立て方法とを組
合せた方法も知られている。As a concrete means of this graining, sandblasting,
There are ball grain, wire grain, brush grain with nylon brush and abrasive / water slurry, mechanical graining method by spraying abrasive / water slurry on the surface with high pressure, and also from alkali or acid or their mixture. There is a chemical graining method in which the surface is roughened with another etching agent. In addition, JP-A-54-14
Electrochemical graining method described in JP 6234 and JP-B-48-28123, for example, mechanical graining method and electrochemical graining method described in JP-A-53-123204 There is also known a method in which the mechanical graining method described in JP-A-56-55291 is combined with the chemical graining method using a saturated aqueous solution of an aluminum salt of a mineral acid.
以上のような方法で粗面化処理されたアルミニウム板は
直ちに、又は更に化成処理を施して平版印刷版用支持体
として使用することができるが、高耐刷力の平版印刷版
が望まれる場合には、画像部の支持体に対する密着力を
向上させ、また非画像部表面の機械的強度を向上させる
ため、更に陽極酸化処理がなされる。The aluminum plate surface-roughened by the above method can be used immediately or after further chemical conversion treatment as a lithographic printing plate support, but when a lithographic printing plate with high printing durability is desired. In order to improve the adhesion of the image area to the support and improve the mechanical strength of the surface of the non-image area, further anodization treatment is performed.
この印刷版用支持体製造の分野では、従来、陽極酸化処
理は、硫酸、燐酸、クロム酸、蓚酸、スルファミン酸、
硼酸、ベンゼンスルホン酸等あるいはこれら二種類以上
を組み合わせた水溶液中でアルミニウム板に直流また
は、交流の電流を流すことにより行なわれている。In the field of producing a support for this printing plate, conventionally, anodizing treatment has been carried out by using sulfuric acid, phosphoric acid, chromic acid, oxalic acid, sulfamic acid,
It is carried out by applying a direct current or an alternating current to an aluminum plate in boric acid, benzenesulfonic acid or the like or an aqueous solution in which two or more kinds thereof are combined.
以上のように種々の電解液による陽極酸化処理が行なわ
れているが、なかでも硫酸、燐酸などが広く用いられて
いる。As described above, anodizing treatment with various electrolytic solutions is performed, but sulfuric acid, phosphoric acid, etc. are widely used.
ところで、感光性平版印刷版は、露光・現像・ガム引き
を基本とする製版工程を経て、印刷機にとりつけられ、
印刷が行なわれるが、版の運搬時や製版時または、印刷
中の版面のゴミの除去などの際に表面にキズを生じた
り、印刷時に、紙粉、インキ粒子、等の要因により表面
が摩耗してしまう。特にその表面が非画像部表面である
場合、キズ及び摩耗の部分にインキが付着して、汚れと
なって刷り物に現われる不都合が生じる。By the way, the photosensitive lithographic printing plate is attached to a printing machine through a plate making process based on exposure, development and gumming.
Printing is performed, but scratches occur on the surface during transportation of the plate, during plate making, or during removal of dust on the plate surface during printing, and during printing, the surface is abraded by paper dust, ink particles, etc. Resulting in. In particular, when the surface is a non-image area surface, the ink adheres to the scratched and worn portions and becomes a stain, which appears on the printed matter.
非画像部の表面が、上記のように陽極酸化処理され、ア
ルミナ皮膜が存在すると表面は硬く、キズつき難く、か
つ摩耗し難い表面となり、汚れの発生を抑制することが
できる。この陽極酸化皮膜量を多くすることにより、こ
の効果は一層強くなるが陽極酸化皮膜量を多くするに
は、多量の電力を必要とすることになり、製造コストの
上昇につながるという欠点がある。When the surface of the non-image area is anodized as described above and the alumina film is present, the surface becomes hard, is not easily scratched, and is not easily worn, so that the generation of dirt can be suppressed. By increasing the amount of the anodic oxide film, this effect is further strengthened, but in order to increase the amount of the anodic oxide film, a large amount of electric power is required, and there is a drawback that the manufacturing cost is increased.
従って、本発明の目的は、以上のような従来技術の問題
点に鑑み、比較的少ない陽極酸化皮膜量で、非画像部に
キズ及び印刷物への汚れが発生しにくく、しかも耐摩耗
性に優れた陽極酸化皮膜を与えるような陽極酸化処理を
含む平版印刷版用支持体の製造方法を提供することであ
る。Therefore, in view of the problems of the prior art as described above, an object of the present invention is to provide a relatively small amount of anodized film, with which scratches and stains on printed matter are less likely to occur in the non-image area, and moreover, excellent abrasion resistance Another object of the present invention is to provide a method for producing a lithographic printing plate support including an anodizing treatment for providing an anodized film.
本発明は、アルミニウム板の表面を粗面化処理した後、
溶融塩電解液中で陽極酸化処理すると、酸化皮膜の硬度
が上昇し、少ない皮膜量でも非画像部にキズ、印刷物へ
の汚れが発生しにくく、同時に優れた耐摩耗性を有する
陽極酸化皮膜が得られることを見い出し、この知見に基
づいてなされたものである。The present invention, after roughening the surface of the aluminum plate,
When anodizing in a molten salt electrolyte, the hardness of the oxide film rises, scratches on non-image areas and stains on printed materials do not easily occur even with a small amount of film, and at the same time an anodized film with excellent abrasion resistance is obtained. It was made based on this finding by finding out what can be obtained.
すなわち、本発明は、アルミニウム板の少なくとも一面
を粗面化処理した後、溶融塩電解液中で陽極酸化するこ
とを特徴とする平版印刷版用支持体の製造方法を提供す
る。That is, the present invention provides a method for producing a lithographic printing plate support, which comprises subjecting at least one surface of an aluminum plate to a surface roughening treatment and then anodizing in a molten salt electrolyte.
以下、本発明について詳述する。Hereinafter, the present invention will be described in detail.
本発明において使用されるアルミニウム板には純アルミ
ニウム及びアルミニウム合金板が含まれる。アルミニウ
ム含有合金としては種々のものが使用でき、例えば、け
い素、銅、マンガン、マグネシウム、クロム、亜鉛、
鉛、ビスマス、ニッケルなどの金属とアルミニウムとの
合金が用いられる。これらの合金は、いくらかの鉄およ
びチタンに加えてその他無視し得る程度の量の不純物を
も含んでもよい。Aluminum plates used in the present invention include pure aluminum and aluminum alloy plates. Various aluminum-containing alloys can be used, for example, silicon, copper, manganese, magnesium, chromium, zinc,
An alloy of aluminum with a metal such as lead, bismuth, or nickel is used. These alloys may contain some iron and titanium as well as other negligible amounts of impurities.
本発明の粗面化処理としては、アルミニウム板を砂目立
て処理することが好ましい。その前に、必要に応じてア
ルミニウム板の表面に付着している油脂、さび、ごみな
どを除去することを目的として清浄化処理してもよい。
この清浄化処理としては、例えばトリクレンなどによる
溶剤脱脂、或いは苛性ソーダなどによるアルカリエッチ
ング脱脂等が含まれる。苛性ソーダのようなアルカリエ
ッチング脱脂をした場合にはスマットが発生するので、
これを除去するためのデスマット処理(例えば10〜30%
の硝酸に浸漬する処理)が更に施されるのが通例であ
る。As the surface-roughening treatment of the present invention, it is preferable to grain the aluminum plate. Before that, a cleaning treatment may be carried out, if necessary, for the purpose of removing oil, fat, rust, dust, etc. adhering to the surface of the aluminum plate.
This cleaning treatment includes, for example, solvent degreasing with trichlene, alkali etching degreasing with caustic soda, and the like. When alkaline etching degreasing such as caustic soda occurs, smut occurs, so
Desmutting to remove this (eg 10-30%
It is customary to further perform a treatment of dipping in nitric acid).
粗面化処理は先に説明した種々の処理方法で行なうこと
ができるが、機械的砂目立て方法としてはサンドブラス
ト、ワイヤーグレイン、ナイロンブラシと研磨材/水ス
ラリーを用いるブラシグレイン、研磨材/水スラリーを
表面に高圧で吹きつける方法などが挙げられ、例えば、
印刷時報社刊「平版製版印刷の基礎」(著者杉山憲一、
1965年12月1日発行)第35〜37頁に記載されている機械
的粗面化処理などによる。化学的粗面化処理としては、
特開昭55−31187号公報に記されている鉱酸のアルミニ
ウム塩の飽和溶液で処理する方法などが用いられる。電
気化学的砂目立て方法としては例えば特開昭52−152302
号公報及び特公昭48−28123号公報などに開示されてい
る方法などが用いられ、また、機械的粗面化処理と化学
的粗面化処理を組み合わせた特開昭56−55291号公報に
記されている方法、米国特許第2,344,510号明細書、特
公昭57−16918号公報、特開昭56−28893号公報などに開
示された機械的粗面化処理と電気化学的粗面化処理とを
組み合わせた方法などが用いられる。また、特開昭60−
208294号公報などに記載されているような化学的粗面化
処理と電気化学的粗面化処理とを組み合わせた方法でも
よい。特に本発明の効果が顕著に現われる粗面化処理と
しては、化学的粗面化処理あるいは機械的粗面化処理と
化学的粗面化処理とを組み合わせた処理あるいは化学的
粗面化処理と電気化学的粗面化処理とを組み合わせた処
理が挙げられる。The surface-roughening treatment can be carried out by the various treatment methods described above, but as the mechanical graining method, sand blasting, wire grain, brush grain using nylon brush and abrasive / water slurry, abrasive / water slurry There is a method of spraying the surface with high pressure, for example,
Printing Bulletin "Basics of lithographic printing" (author Kenichi Sugiyama,
Issued December 1, 1965) Based on the mechanical roughening treatment described on pages 35-37. As the chemical roughening treatment,
The method of treating with a saturated solution of an aluminum salt of a mineral acid described in JP-A-55-31187 may be used. As an electrochemical graining method, for example, Japanese Patent Application Laid-Open No. 52-152302
The method disclosed in JP-B No. 48-28123 and Japanese Patent Publication No. 48-28123 are used, and the method disclosed in JP-A-56-55291 is a combination of mechanical surface roughening treatment and chemical surface roughening treatment. The method described in U.S. Pat.No. 2,344,510, JP-B-57-16918, and JP-A-56-28893 disclose mechanical roughening treatment and electrochemical roughening treatment. A combined method or the like is used. In addition, JP-A-60-
A method in which a chemical surface-roughening treatment and an electrochemical surface-roughening treatment as described in Japanese Patent No. 208294 are combined may be used. In particular, as the roughening treatment in which the effect of the present invention is remarkably exhibited, a chemical roughening treatment or a combination of a mechanical roughening treatment and a chemical roughening treatment, or a chemical roughening treatment and an electrical treatment. A treatment in combination with a chemical surface roughening treatment can be mentioned.
以上のように粗面化処理されたアルミニウム板は、次い
で、化学的に清浄化処理しておくことが好ましい。この
化学的処理は、機械的粗面化処理の後の場合には、表面
に食い込んだ研磨材、アルミニウム屑などを取り除く作
用を有し、また化学的または電気化学的粗面化処理の後
の場合には、表面残存物である所謂スマットを表面から
除去する作用を有するものである。かかる化学的処理の
詳細は、前者については米国特許第3,834,998号明細書
に、また後者については特公昭48−28123号および特開
昭53−12739号の各公報に記されている。It is preferable that the aluminum plate that has been roughened as described above is then chemically cleaned. This chemical treatment has a function of removing abrasives, aluminum debris, etc. that have eroded on the surface after the mechanical roughening treatment, and the chemical or electrochemical roughening treatment after the roughening treatment. In this case, it has a function of removing so-called smut, which is a surface residue, from the surface. The details of such chemical treatment are described in US Pat. No. 3,834,998 for the former and in JP-B-48-28123 and JP-A-53-12739 for the latter.
以上のように粗面化処理および清浄化処理されたアルミ
ニウム板は次に溶融塩電解液中で陽極酸化処理が施され
る。The aluminum plate that has been roughened and cleaned as described above is then anodized in a molten salt electrolyte.
本発明で使用される溶融塩電解液中での陽極酸化処理の
電解液は、常温では固体の塩を温度660℃(アルミニウ
ムの融点)未満で融解させたもの、すなわち融点660℃
未満の溶融塩であり、より好ましくは、融点350℃未満
の溶融塩である。具体的には、硫酸塩(例えば硫酸水素
アンモニウム、硫酸水素ナトリウム)、硝酸塩(例えば
硝酸アンモニウム、硝酸ナトリウム)、ギ酸塩(例えば
ギ酸アンモニウム、ギ酸ナトリウム)、塩素酸塩(例え
ば塩素酸ナトリウム)、過塩素酸塩(過塩素酸ニッケ
ル)などが単独または混合物として含まれる。これらの
内でも硫酸塩の単独または、混合物が比較的安価で温度
制御等の点において比較的容易であるなどの点で好まし
い。また、上記電解液にアルカリ金属またはアルカミ土
類金属の塩化物、ケイ酸塩、酸化物を0.1重量%〜5重
量%添加してもよい。The electrolytic solution of anodizing treatment in the molten salt electrolytic solution used in the present invention is a solid salt melted at a temperature lower than 660 ° C. (aluminum melting point), that is, a melting point of 660 ° C.
Is a molten salt having a melting point of less than 350 ° C. Specifically, sulfates (eg ammonium hydrogensulfate, sodium hydrogensulfate), nitrates (eg ammonium nitrate, sodium nitrate), formates (eg ammonium formate, sodium formate), chlorates (eg sodium chlorate), perchlorine. Acid salts (nickel perchlorate) and the like are included alone or as a mixture. Of these, the sulfates alone or as a mixture are preferable because they are relatively inexpensive and relatively easy in terms of temperature control. In addition, 0.1 wt% to 5 wt% of chloride, silicate, or oxide of alkali metal or alkamidic earth metal may be added to the electrolyte solution.
処理温度は使用する物の融点以上であれば十分である
が、アルミニウムがなまり処理を受けることになるの
で、300℃以下が好ましい。電流密度は、いかなる電流
密度でも可能であるが、皮膜生成効率を考えた場合1A/d
m2〜40A/dm2が好ましい。このようにして得られる酸化
アルミニウムの重量は0.3〜5.0g/m2であり、好ましくは
0.5〜3.0g/m2である。また、電源は直流でも交流でも可
能であるが、連続処理を行なう場合には、短時間で処理
ができる方が良く、直流で処理する方が好ましい。The treatment temperature is sufficient if it is equal to or higher than the melting point of the substance to be used, but it is preferably 300 ° C. or lower because aluminum is subjected to the rounding treatment. The current density can be any current density, but considering the film formation efficiency, it is 1A / d.
m 2 to 40 A / dm 2 is preferable. The weight of aluminum oxide thus obtained is 0.3 to 5.0 g / m 2 , and preferably
It is 0.5 to 3.0 g / m 2 . The power source may be direct current or alternating current, but in the case of continuous processing, it is better to be able to perform processing in a short time, and it is preferable to perform processing with direct current.
以上のように溶融塩電解液中で陽極酸化されたアルミニ
ウム板は、更に米国特許第3,181,461号明細書に記され
ている様にアルカリ金属シリケート、例えば珪酸ナトリ
ウムの水溶液に浸漬するなどの方法により処理したり、
米国特許第4,153,461号明細書に記されているようにポ
リビニルスルホン酸で処理したり、米国特許第3,860,42
6号明細書に記載されているように、水溶性金属塩(例
えば酢酸亜鉛など)を含む親水性セルロース(例えば、
カルボキシメチルセルロースなど)の下塗り層を設けて
もよい。The aluminum plate anodized in the molten salt electrolyte as described above is further treated by a method such as immersion in an aqueous solution of an alkali metal silicate, for example, sodium silicate, as described in U.S. Pat.No. 3,181,461. Or
Treated with polyvinyl sulfonic acid as described in U.S. Pat.No. 4,153,461 or U.S. Pat.
As described in No. 6, hydrophilic cellulose containing a water-soluble metal salt (such as zinc acetate) (for example,
An undercoat layer (such as carboxymethyl cellulose) may be provided.
このようにして得られた平版印刷版用支持体の上には、
PS版(Pre−Sensitized Plateの略称)の感光層とし
て、従来より知られている感光層を設けて、感光性平版
印刷版を得ることができ、これを製版処理して得た平版
印刷版は、優れた性能を有している。On the lithographic printing plate support thus obtained,
As a photosensitive layer of a PS plate (abbreviation of Pre-Sensitized Plate), a photosensitive layer that has been conventionally known can be provided to obtain a photosensitive lithographic printing plate. , Has excellent performance.
上記感光層の組成物としては、(a)ジアゾ樹脂とバイ
ンダーからなるもの、(b)o−ナフトキノンジアジド
化合物からなるもの、(c)アジド化合物とバインダー
からなるもの、(d)エチレン性不飽和モノマー、光重
合開始剤及び高分子バインダーからなる光重合性組成
物、(e)重合体の主鎖又は側鎖に−CH=CH−CO−基を
有する光架橋性ポリマーからなるものなどが含まれ、こ
れらの詳細は米国特許第4,238,560号明細書に詳しく説
明されている。このような感光層は本発明により製造さ
れた支持体に約0.1〜約7g/m2、より好ましくは0.5〜4g/
m2の被覆量となるように設けられる。The composition of the photosensitive layer includes (a) a diazo resin and a binder, (b) an o-naphthoquinonediazide compound, (c) an azide compound and a binder, and (d) an ethylenically unsaturated compound. A photopolymerizable composition composed of a monomer, a photopolymerization initiator and a polymer binder, and (e) a polymer composed of a photocrosslinkable polymer having a —CH═CH—CO— group in its main chain or side chain are included. These details are described in detail in US Pat. No. 4,238,560. Such a photosensitive layer is added to the support produced according to the present invention in an amount of about 0.1 to about 7 g / m 2 , more preferably 0.5 to 4 g / m 2 .
It is provided so that the coating amount is m 2 .
以下、本発明を実施例により更に詳細に説明する。な
お、「%」は、特に指示しない限り「重量%」を示す。Hereinafter, the present invention will be described in more detail with reference to Examples. In addition, "%" indicates "wt%" unless otherwise specified.
実施例1 厚さ0.24mmのアルミニウム板をまず400メッシュのパミ
ストン−水の懸濁液中で回転ナイロンブラシを用いて表
面を粗面化した。中心線表面粗さは、0.6μであった。
水洗後、10%水酸化ナトリウム水溶液に50℃で60秒間浸
漬して、アルミニウム板表面にくい込んだ研磨剤、アル
ミ屑等を除去して表面を均整化したのち、水洗し、次い
で20%硝酸で中和洗浄した。水洗後、0.7%硝酸水溶液
中で、陽極時電圧13ボルト、陰極時電圧6ボルトの矩形
波交番波形を用いて(特開昭52−77702号公報実施例に
記載されている電源波形)20秒間電気化学的に砂目立て
した。次いで、10%水酸化ナトリウム水溶液に40℃で10
秒間浸漬処理し、電気化学的砂目立てにより生成したス
マットを除去したのち、20%硝酸で中和洗浄後、水洗
し、基板〔A〕を得た。Example 1 An aluminum plate having a thickness of 0.24 mm was first roughened in a 400 mesh pumicetone-water suspension by using a rotating nylon brush. The centerline surface roughness was 0.6μ.
After washing with water, dip it in a 10% sodium hydroxide aqueous solution at 50 ° C for 60 seconds to remove abrasives and aluminum debris that are difficult to stick to the aluminum plate to balance the surface, then wash with water and then with 20% nitric acid. It was neutralized and washed. After washing with water, in a 0.7% aqueous nitric acid solution, a rectangular wave alternating waveform with a voltage of 13 volts at the anode and a voltage of 6 volts at the cathode (power waveform described in the example of JP-A-52-77702) was used for 20 seconds. Electrochemically grained. Then, add 10% sodium hydroxide solution at 40 ℃ for 10
After dipping treatment for 2 seconds to remove smut generated by electrochemical graining, the substrate was washed with 20% nitric acid for neutralization and then with water to obtain a substrate [A].
次に硫酸水素アンモニウムと硫酸水素ナトリウム(等モ
ル比)との電解液組成の溶融塩電解液中で酸化皮膜量が
1.4g/m2になるように、温度170℃、電流密度1.5A/dm2に
おいて陽極酸化し、次いで水洗、乾燥して、支持体
〔イ〕を得た。このようにして得られた支持体〔イ〕に
下記組成の感光液を塗布し、乾燥して、感光層を設け
た。感光層の乾燥塗布量は2.5g/m2であった。Next, the amount of oxide film in the molten salt electrolytic solution of the electrolytic solution composition of ammonium hydrogen sulfate and sodium hydrogen sulfate (equal molar ratio)
Anodization was carried out at a temperature of 170 ° C. and a current density of 1.5 A / dm 2 so as to obtain 1.4 g / m 2 , followed by washing with water and drying to obtain a support [a]. The support [ii] thus obtained was coated with a photosensitive solution having the following composition and dried to form a photosensitive layer. The dry coating amount of the photosensitive layer was 2.5 g / m 2 .
感光液 このようにして作成した感光性平版印刷版を、2KWのメ
タルハライドランプの光源として1mの距離を隔てた位置
に配置して60秒間ポジ透明面を通して露光した後、下記
の組成の現像液(液温25℃)を用いて現像し、さらにガ
ム引きした。Photosensitive liquid The photosensitive lithographic printing plate thus prepared was placed as a light source of a 2 KW metal halide lamp at a position separated by 1 m and exposed through a positive transparent surface for 60 seconds. 25 ° C.) and further gummed.
現像液 このようにして製版された平版印刷版の非画像部表面
に、先端の直径が0.4mmであるサファイヤ針を用いて針
に荷重(5g〜600g)をかけて一定速度で傷をつけた。そ
してこの版上にキズがつきはじめた荷重のところを目視
によって判定し、その結果を第1表に示した。Developer The surface of the non-image area of the lithographic printing plate thus prepared was scratched at a constant speed by applying a load (5 g to 600 g) to the needle using a sapphire needle having a tip diameter of 0.4 mm. Then, the portion of the load on the plate where the scratches started to be scratched was visually determined, and the results are shown in Table 1.
又、摩耗輪に1μAl2O3の研摩紙をつけ、500grの荷重で
製版された平版印刷版の非画像部表面を700回往復運動
させた時の摩耗程度を光沢度計〔日本電色工業製、Σ8
0、COLOR MEASURING SYSTEM〕のΔGs値(摩耗させる前
の光沢度値−摩耗させた後の光沢度値:光学部の入射
角、受光角60゜)にて比較評価を行なった。その結果を
第2表に示した。Also, a 1 μAl 2 O 3 abrasive paper was attached to the wear wheel, and the degree of wear when the non-image area surface of the lithographic printing plate made with a load of 500 gr was reciprocated 700 times was measured by a gloss meter [Nippon Denshoku Industries Co., Ltd. Made, Σ8
0, COLOR MEASURING SYSTEM] ΔGs value (gloss value before abrasion-gloss value after abrasion: incident angle of optical part, light receiving angle of 60 °) for comparative evaluation. The results are shown in Table 2.
さらに、版を常法により印刷した時の印刷物の汚れや非
画像部の汚染度について比較評価を行なった。その結果
を前記第2表に示した。Furthermore, a comparative evaluation was performed on the stains on the printed matter and the degree of contamination of the non-image area when the plate was printed by a conventional method. The results are shown in Table 2 above.
比較例1 実施例1の基板〔A〕を18%硫酸水溶液中で酸化皮膜量
が1.4g/m2及び3.0g/m2になるよう温度25℃、電流密度1.
5A/dm2で陽極酸化し、次いで水洗、乾燥して、支持体
〔ロ〕を得た。以下、感光層塗布から印刷評価、摩耗度
測定までは実施例1と同様に行なった。その結果を第1
表、第2表に示した。Comparative Example 1 The substrate [A] of Example 1 was placed in an 18% sulfuric acid aqueous solution at a temperature of 25 ° C. and a current density of 1. so that the oxide film amounts were 1.4 g / m 2 and 3.0 g / m 2 .
It was anodized at 5 A / dm 2 , washed with water and dried to obtain a support [B]. From the coating of the photosensitive layer to the evaluation of printing and the measurement of the degree of wear, the same procedure as in Example 1 was performed. The result is first
The results are shown in Tables and Tables 2.
実施例2 実施例1の基板〔A〕を硫酸水素ナトリウムと硫酸水素
アンモニウム(等モル比)との電解液組成の溶融塩電解
液中で酸化皮膜量が1.4g/m2になるよう温度170℃、電流
密度1.5A/dm2で陽極酸化し、次いで水洗後、2%珪酸ナ
トリウム水溶液に70℃で1分間浸漬し、水洗、乾燥して
支持体〔ハ〕を得た。Example 2 The substrate [A] of Example 1 was heated at a temperature of 170 so that the amount of oxide film was 1.4 g / m 2 in a molten salt electrolytic solution having an electrolytic solution composition of sodium hydrogensulfate and ammonium hydrogensulfate (equal molar ratio). After anodizing at a temperature of 1.5 A / dm 2 at a temperature of 1.5 ° C., washing with water, dipping in a 2% sodium silicate aqueous solution at 70 ° C. for 1 minute, washing with water and drying, a support [C] was obtained.
このようにして得られた支持体に下記組成の感光液を塗
布し、乾燥して感光層を設けた。感光層の乾燥塗布量
は、2.5g/m2であった。The support thus obtained was coated with a photosensitive solution having the following composition and dried to form a photosensitive layer. The dry coating amount of the photosensitive layer was 2.5 g / m 2 .
感光液 このようにして作られた感光性平版印刷版は、真空焼枠
中で、透明ネガティブフィルムを通して1mの距離から3K
Wのメタルハライドランプを用いて50秒間露光を行なっ
たのち、下記組成の現像液で現像し、アラビアガム水溶
液でガム引きして平版印刷版とした。Photosensitive liquid The photosensitive lithographic printing plate made in this way is 3K from a distance of 1m through a transparent negative film in a vacuum baking frame.
After exposure for 50 seconds using a W metal halide lamp, development was performed with a developing solution having the following composition, and gumming was performed with an aqueous solution of gum arabic to obtain a lithographic printing plate.
現像液 その後非画像部へのキズつけから印刷評価、摩耗度測定
までは実施例1と同様に行なった。結果を第1表、第2
表に示した。Developer After that, the process from scratching of the non-image area to printing evaluation and abrasion measurement was performed in the same manner as in Example 1. The results are shown in Table 1 and Table 2.
Shown in the table.
比較例2 実施例1の基板〔A〕を比較例1と同様に硫酸水溶液中
で陽極酸化処理し、水洗後2%珪酸ナトリウム水溶液に
70℃で1分間浸漬し、水洗、乾燥して支持体〔ニ〕を得
た。その後、感光層塗布から印刷評価、摩耗度測定まで
は実施例2と同様に行なった。結果を第1表、第2表に
示した。Comparative Example 2 The substrate [A] of Example 1 was anodized in an aqueous sulfuric acid solution in the same manner as in Comparative Example 1, washed with water and then changed to a 2% aqueous sodium silicate solution.
It was immersed at 70 ° C. for 1 minute, washed with water and dried to obtain a support [d]. After that, the processes from coating of the photosensitive layer to evaluation of printing and measurement of wear were performed in the same manner as in Example 2. The results are shown in Tables 1 and 2.
なお、上記実施例では、機械的粗面化処理と電気化学的
粗面化処理を組み合わせた粗面化処理について、また硫
酸水素アンモニウムと硫酸水素ナトリウムと〔等モル
比〕の浴での溶融塩電解液中で陽極酸化した場合につい
て示したが、他のいかなる粗面化処理についても、また
他の溶融塩電解液での陽極酸化処理についても同様の結
果が得られた。 In the above examples, the roughening treatment in which the mechanical roughening treatment and the electrochemical roughening treatment are combined, and the molten salt in the bath of ammonium hydrogensulfate and sodium hydrogensulfate [equal molar ratio] is used. Although the case of anodizing in the electrolytic solution is shown, similar results were obtained for any other roughening treatment and also for the anodizing treatment with another molten salt electrolytic solution.
また、硫酸水溶液での陽極酸化処理と溶融塩電解液中で
の陽極酸化処理の組み合わせについても同様の結果が得
られた。Similar results were obtained for a combination of anodizing treatment with an aqueous sulfuric acid solution and anodizing treatment with a molten salt electrolyte.
本発明の平版印刷版用支持体を用いた平版印刷版によっ
て印刷すると、少ない陽極酸化皮膜量においても、非画
像部にキズが発生しにくく、耐摩耗性にすぐれ、印刷物
への汚れが発生しにくく、非画像部の汚染度が減少した
印刷物が得られた。When printing with a lithographic printing plate using the lithographic printing plate support of the present invention, even in a small amount of anodized film, scratches are less likely to occur in the non-image area, the abrasion resistance is excellent, and stains are generated on the printed matter. A print was obtained that was difficult and had a reduced degree of contamination in the non-image areas.
Claims (1)
処理した後、溶融塩電解液中で陽極酸化することを特徴
とする平版印刷版用支持体の製造方法。1. A method for producing a lithographic printing plate support, which comprises subjecting at least one surface of an aluminum plate to a surface roughening treatment and then anodizing in a molten salt electrolyte.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29245787A JPH0714673B2 (en) | 1987-11-19 | 1987-11-19 | Method for producing support for lithographic printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29245787A JPH0714673B2 (en) | 1987-11-19 | 1987-11-19 | Method for producing support for lithographic printing plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01133794A JPH01133794A (en) | 1989-05-25 |
| JPH0714673B2 true JPH0714673B2 (en) | 1995-02-22 |
Family
ID=17782049
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29245787A Expired - Fee Related JPH0714673B2 (en) | 1987-11-19 | 1987-11-19 | Method for producing support for lithographic printing plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0714673B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4882108B2 (en) * | 2007-05-31 | 2012-02-22 | Necネットワーク・センサ株式会社 | PCB heat dissipation structure |
| JP7423002B2 (en) * | 2020-03-31 | 2024-01-29 | 日本製鉄株式会社 | Alloy material and its manufacturing method |
-
1987
- 1987-11-19 JP JP29245787A patent/JPH0714673B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01133794A (en) | 1989-05-25 |
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