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JPH0716021B2 - Photovoltaic device and manufacturing method thereof - Google Patents
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JPH0716021B2 - Photovoltaic device and manufacturing method thereof - Google Patents

Photovoltaic device and manufacturing method thereof

Info

Publication number
JPH0716021B2
JPH0716021B2 JP63233001A JP23300188A JPH0716021B2 JP H0716021 B2 JPH0716021 B2 JP H0716021B2 JP 63233001 A JP63233001 A JP 63233001A JP 23300188 A JP23300188 A JP 23300188A JP H0716021 B2 JPH0716021 B2 JP H0716021B2
Authority
JP
Japan
Prior art keywords
photovoltaic device
polymer layer
layer
photoconductive layer
phenylene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63233001A
Other languages
Japanese (ja)
Other versions
JPH0281479A (en
Inventor
栄一郎 田中
昭雄 滝本
浩二 秋山
正則 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP63233001A priority Critical patent/JPH0716021B2/en
Publication of JPH0281479A publication Critical patent/JPH0281479A/en
Publication of JPH0716021B2 publication Critical patent/JPH0716021B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells

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  • Photovoltaic Devices (AREA)
  • Electroluminescent Light Sources (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、大面積で安価な光起電力装置およびその製造
方法に関するものである。
TECHNICAL FIELD The present invention relates to a large-area and inexpensive photovoltaic device and a method for manufacturing the same.

従来の技術 光起電力装置における光導電層としては、Si結晶、非晶
質シリコン、あるいはII−VI族化合物半導体がある。前
者のシリコン系材料用いた光起電力装置では、大面積の
光起電力装置を安価に提供することは困難であり、ま
た、後者のII−VI族化合物半導体を用いた光起電力装置
では、公害等の諸問題が懸念されている。
2. Description of the Related Art As a photoconductive layer in a photovoltaic device, there are Si crystal, amorphous silicon, or II-VI group compound semiconductor. In the former photovoltaic device using a silicon-based material, it is difficult to provide a large-area photovoltaic device at low cost, and in the latter photovoltaic device using a II-VI group compound semiconductor, There are concerns about various problems such as pollution.

最近、上記の問題を解決する手段として、有機半導体材
料を用いた光起電力装置の開発が行われている。これら
は、蒸着等で製膜が可能なマグネシウムフタロシアニン
(MgPcと記す)を異種金属電極アルミニウム(Al)と銀
(Ag)ではさんだショットキー接合型、あるいはポリア
セチレンをp,n制御を行い、pn接合型の光起電力素子を
形成したもの等が報告されている。
Recently, as a means for solving the above problems, a photovoltaic device using an organic semiconductor material has been developed. These are Schottky junction type in which magnesium phthalocyanine (denoted as MgPc) capable of forming a film by vapor deposition etc. is sandwiched between dissimilar metal electrodes aluminum (Al) and silver (Ag), or p-n control is performed for polyacetylene to perform pn junction. It has been reported that a type photovoltaic element is formed.

また、材料面ではショットキー接合型の構成で、熱安定
性に優れた、長期安定性が期待される高分子、ポリ(p
−フェニレン)スルフィド(以下PPSと記す)を真空蒸
着によって、0.05〜0.15μm形成し、電極としては、Al
と銅(Cu)を用いた構成の光起電力素子が報告されてい
る。(日本化学会誌,1983,(6),p763〜768) PPSは、耐熱性に優れ、加工性にも優れたエンジニアリ
ング・プラスチックであることから、無公害で、安価で
あることから、材料面では大いに期待されるものであ
る。
In terms of materials, it has a Schottky junction type structure, and it has excellent thermal stability and is expected to have long-term stability.
-Phenylene) sulfide (hereinafter referred to as PPS) is formed by vacuum vapor deposition to a thickness of 0.05 to 0.15 μm, and the electrode is Al.
Photovoltaic devices composed of copper and copper (Cu) have been reported. (Journal of the Chemical Society of Japan, 1983, (6), p763 ~ 768) PPS is an engineering plastic with excellent heat resistance and processability, so it is non-polluting and inexpensive. Highly expected.

発明が解決しようとする課題 分子量の大きいPPS高分子を直接真空蒸着することによ
って形成されたPPS膜を用いた光起電力装置において
は、PPS膜の暗比抵抗が大きく、金属−絶縁体−金属(M
IM)構造に近いものである。このため、十分な短絡電流
が取れない問題がある。
DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention In a photovoltaic device using a PPS film formed by directly vacuum-depositing a PPS polymer having a large molecular weight, the dark specific resistance of the PPS film is large, and the metal-insulator-metal (M
IM) is similar to the structure. Therefore, there is a problem that sufficient short-circuit current cannot be obtained.

また、更なる問題としては、PPSの工学的禁止帯幅が大
きいため、光電変換効率が最も高いのは〜300nmの近紫
外にあることが上げられる。このため、実用光電変換効
率では従来の光起電力素子に比較しても不利である。
A further problem is that the engineering band gap of PPS is large, and the highest photoelectric conversion efficiency is in the near-ultraviolet region of ~ 300 nm. Therefore, the practical photoelectric conversion efficiency is disadvantageous as compared with the conventional photovoltaic device.

課題を解決するための手段 光励起によってキャリアを発生する光導電層を用いた光
起電力装置において、前記光導電層の少なくとも1部
が、p−フェニレンを有する直鎖状高分子層を主成分と
し、上記直鎖状高分子層の赤外吸収スペクトルにおけ
る、825cm-1近傍にあるパラ位二置換基を有するベンゼ
ン環のCH面外変角振動に対する吸収スペクトルの強度
の、750cm-1近傍にある一置換基を有するベンゼン環のC
H面外変角振動の吸収スペクトルの強度に対する比を、
0.9以上2.5以下とする。
Means for Solving the Problems In a photovoltaic device using a photoconductive layer that generates carriers by photoexcitation, at least a part of the photoconductive layer contains a linear polymer layer containing p-phenylene as a main component. there in the infrared absorption spectrum of the linear polymer layer, the intensity of the absorption spectra for CH out-of-plane deformation vibration of a benzene ring having para-disubstituted group in the vicinity 825Cm -1, near 750 cm -1 C of benzene ring with monosubstituent
The ratio of the out-of-plane bending vibration to the intensity of the absorption spectrum is
0.9 or more and 2.5 or less.

作用 光起電力素子に必要な光導電層は、高いキャリア生成効
率と高いキャリア寿命および移動度が必要である。
Action The photoconductive layer required for a photovoltaic device is required to have high carrier generation efficiency and high carrier lifetime and mobility.

高分子におけるバルク全体でのキャリアの移動は分子鎖
内伝導と分子鎖間伝導の結果であり、移動度の向上は両
面よりなされる。第一の分子鎖内伝導の向上には、分子
軌道の広がりとそれに伴う共役系の発達が指針となって
おり、伝導機構としては荷電ソリトン,バイポーラロ
ン,ポーラロン等が考えられている。このため、共役系
の発達には、主鎖骨格中に多くのπ電子を持たせること
が必要である。また電子受容体との電荷のやりとりによ
って主鎖上に正電荷を持ち込むことも有効な手段であ
る。更に主鎖に沿っての共役が発達していなくてもホッ
ピングすることのできる電子軌道が隣接する構造であっ
てもよい。
The movement of carriers in the bulk of a polymer is a result of intramolecular chain conduction and intermolecular chain conduction, and mobility is improved from both sides. The first guideline for the improvement of intramolecular chain conduction is the expansion of molecular orbitals and the development of a conjugated system accompanying it, and charged solitons, bipolarons, polarons, etc. are considered as conduction mechanisms. Therefore, in order to develop a conjugated system, it is necessary to have many π electrons in the main chain skeleton. It is also an effective means to bring a positive charge onto the main chain by exchanging charges with the electron acceptor. Further, it may have a structure in which electron orbits capable of hopping are adjacent to each other even if conjugation along the main chain is not developed.

第二の分子鎖間伝導の向上は、結晶性と配向性の向上に
区分される。いずれにしてもキャリアが隣接する高分子
に移り易くするには、分子鎖が空間的に密に配置され、
しかもキャリアの移動する電子軌道の重なりが大きいこ
とが必要である。
The improvement of the second interchain conduction is classified into the improvement of crystallinity and the orientation. In any case, to facilitate transfer of the carrier to the adjacent polymer, the molecular chains are spatially densely arranged,
Moreover, it is necessary that the overlap of the electron trajectories in which the carriers move is large.

分子鎖の長さが結晶性、配向性に与える効果は大きく、
分子鎖が長くなることによっての結晶性の低下、ひいて
はキャリアのホッピング確率の低下と、キャリアの捕獲
確率の増大とをもたらすことになる。分子鎖長にはバル
クとして最も密に分子が並ぶに適した長さがある。この
長さに分子を揃えてやることで第二の分子鎖間伝導を向
上させることが可能となる。
The length of the molecular chain has a large effect on crystallinity and orientation,
This results in a decrease in crystallinity due to a longer molecular chain, a decrease in carrier hopping probability, and an increase in carrier capture probability. The molecular chain length has a length suitable for the most densely arranged molecules as a bulk. By aligning the molecules to this length, the second interchain conduction can be improved.

本発明は、直鎖状高分子の主鎖にならぶフェニレン基の
数が、4以上15以下の分子鎖長の小さな高分子が高い導
電性と光導電性を有することを見いだしたことによるも
のである。
The present invention is based on the finding that a polymer having a small number of phenylene groups along the main chain of a linear polymer having a molecular chain length of 4 or more and 15 or less has high conductivity and photoconductivity. is there.

即ち、この条件は上記の構成により充足することがで
き、良好な特性が実現される。
That is, this condition can be satisfied by the above configuration, and good characteristics are realized.

実施例 第1図は、本発明における基本的な光起電力装置の一実
施例の断面を模式的に示したものである。
Example FIG. 1 is a schematic cross-sectional view of an example of a basic photovoltaic device according to the present invention.

第1図に示す光起電力装置は、光起電力装置としての支
持体1上に、第1の電極2と高分子層を含む光導電層3
とを有し、前記光導電層3上には第2の電極4を有して
いる。
The photovoltaic device shown in FIG. 1 includes a photoconductive layer 3 including a first electrode 2 and a polymer layer on a support 1 as a photovoltaic device.
And a second electrode 4 on the photoconductive layer 3.

光導電層3は、その少なくとも1部が、p−フェニレン
を有する直鎖状高分子層を主成分とする。その直鎖状高
分子層は、その赤外吸収スペクトルにおいて、825cm-1
近傍にあるパラ位二置換基を有するベンゼン環のCH面外
変角振動に対する吸収スペクトルの強度の、750cm-1
傍にある一置換基を有するベンゼン環のCH面外変角振動
の吸収スペクトルの強度に対する比を、0.9以上2.5以下
とする。
At least a part of the photoconductive layer 3 is mainly composed of a linear polymer layer containing p-phenylene. The linear polymer layer has an infrared absorption spectrum of 825 cm -1.
Of the absorption spectrum for the CH out-of-plane bending vibration of a benzene ring having a para-disubstituted group in the vicinity of the absorption spectrum of the CH-out-of-plane bending vibration of a benzene ring having a single substituent in the vicinity of 750 cm -1 The ratio to the strength is 0.9 or more and 2.5 or less.

また、これらの高分子はp型の半導体特性を有するた
め、n型の他の半導体材料例えばCdS、III族元素を含む
非晶質シリコン等の無機半導体等のヘテロ接合によっ
て、更に高い光電変換効率を実現することができる。
In addition, since these polymers have p-type semiconductor characteristics, even higher photoelectric conversion efficiency can be obtained by heterojunction of other n-type semiconductor materials such as inorganic semiconductors such as amorphous silicon containing CdS and group III elements. Can be realized.

また、有機材料においても他のイオン化ポテンシャルの
大きな、フタロシアニン顔料等の有機半導体とのヘテロ
接合によっても高い光電変換効率が実現できる。
Further, even in an organic material, high photoelectric conversion efficiency can be realized by a heterojunction with another organic semiconductor such as a phthalocyanine pigment having a large ionization potential.

更には、p−フェニレンのパラ位以外に置換基を形成す
る、あるいはSe、Te等の質量の大きい原子を形成するこ
とによって、主鎖骨格への作用を大きくすることによっ
て可視光域にも光起電力を有する装置が得られる。
Furthermore, by forming a substituent at a position other than the para-position of p-phenylene, or by forming an atom with a large mass such as Se or Te, the action on the main chain skeleton can be increased to allow light to reach the visible light region. A device with electromotive force is obtained.

上記直鎖状高分子層、直鎖状高分子の主鎖にならぶフェ
ニレン基の数が、4以上15以下のオリゴマを蒸発源とす
る蒸着法によって、容易に形成することができ、優れた
特性が得られる。
The linear polymer layer can be easily formed by a vapor deposition method using an oligomer having a phenylene group number of 4 or more and 15 or less along with the main chain of the linear polymer as an evaporation source, and has excellent characteristics. Is obtained.

また、高分子の融点温度未満で加熱処理を行うことによ
り、分子鎖の配列の規則性がさらに向上し、より優れた
光起電力装置が得られる。
Further, by performing the heat treatment at a temperature lower than the melting point temperature of the polymer, the regularity of the arrangement of the molecular chains is further improved, and a more excellent photovoltaic device can be obtained.

本発明において、光導電層に高分子層とヘテロ接合を形
成する有機半導体としては、(1)フタロシアニン顔料
(Pcと称す)、例えばXPc(X=H、Si(OH)
等)、AlClPcCl、TiOClPcCl、InClPcCl、InClPc、InBrP
cBr等、(2)モノアゾ色素、ジスアゾ色素、等のアゾ
系色素、(3)ペレニン酸無水物およびペニレン酸イミ
ド等のペニレン系顔料、(4)インジゴイド染料、
(5)キナクリドン類等の多環キノン類、(7)シアニ
ン色素、(8)キサンテン染料、(9)PVCz/TNF等の電
荷移動錯体、(10)ピリリウム塩染料とポリカーボネー
ト樹脂から形成される共晶錯体、(11)アズレニウム塩
化合物等を蒸着等によって、0.02〜0.1μmの薄膜を形
成することができる。
In the present invention, the organic semiconductor forming a heterojunction with the polymer layer in the photoconductive layer includes (1) phthalocyanine pigment (referred to as Pc), for example, XPc (X = H 2 , Si (OH) 2 ,
Etc.), AlClPcCl, TiOClPcCl, InClPcCl, InClPc, InBrP
cBr and the like, (2) monoazo dyes, disazo dyes and other azo dyes, (3) perenic anhydride and penylene acid imide and other penylene pigments, (4) indigoid dyes,
(5) Polycyclic quinones such as quinacridones, (7) Cyanine dyes, (8) Xanthene dyes, (9) Charge transfer complexes such as PVCz / TNF, (10) Pyrylium salt dyes and polycarbonate resins A thin film having a thickness of 0.02 to 0.1 μm can be formed by vapor deposition of a crystalline complex, (11) azurenium salt compound, or the like.

本発明においてこれらの有機半導体、あるいは高分子層
の製膜には、真空蒸着法、イオンクラスビーム法等が用
いられる。
In the present invention, a vacuum deposition method, an ion class beam method, or the like is used for forming these organic semiconductors or polymer layers.

また、本発明において、光導電層に用いる高分子層とヘ
テロ接合を形成する無機半導体としてシリコンを含有す
る以下に示す非晶質層を用いることができる。非晶質層
としては、a−Si(:H:X)、a-Si1-yCy(:H:X)(0<
y<1)、a-Si1-yOy(:H:X)(0<y<1)、a-Si1-y
Ny(:H:X)(0<y<1)、a-Si1-zGez(:H:X)(0<
z<1)、a−(Si1-zGez1-yNy(:H:X)(0<y,z<
1)、a−(Si1-zGez1-yOy(:H:X)(0<y,z<
1)、またはa−(Si1-zGez1-yCy(:H:X)(0<y,z
<1)の単層、あるいはこれらの積層からなる層を用い
ることができる。また、yを連続的に変化させた場合も
使用できる。
Further, in the present invention, the following amorphous layer containing silicon can be used as an inorganic semiconductor forming a heterojunction with the polymer layer used for the photoconductive layer. As the amorphous layer, a-Si (: H: X), a-Si 1-y Cy (: H: X) (0 <
y <1), a-Si 1-y O y (: H: X) (0 <y <1), a-Si 1-y
N y (: H: X) (0 <y <1), a-Si 1-z Ge z (: H: X) (0 <
z <1), a- (Si 1-z Ge z ) 1-y N y (: H: X) (0 <y, z <
1), a- (Si 1-z Ge z ) 1-y O y (: H: X) (0 <y, z <
1), or a- (Si 1-z Ge z ) 1-y C y (: H: X) (0 <y, z
A single layer of <1) or a layer formed by stacking these layers can be used. It can also be used when y is continuously changed.

この時の膜厚は、光導電層の膜厚は、0.02〜1.0μm好
適には0.1〜0.5μmとすれば良い。
At this time, the film thickness of the photoconductive layer may be 0.02 to 1.0 μm, preferably 0.1 to 0.5 μm.

また、他の無機半導体としてCdS等のII−VI族化合物半
導体の蒸着膜を用いてもよい。
Further, a vapor deposition film of a II-VI group compound semiconductor such as CdS may be used as another inorganic semiconductor.

またカルコゲン原子を含有する非単結晶層を用いる場合
には、以下の組合せによる物が好適である。Ge−S、Ge
−Se、Ge−Te、Ge−P−S、Ge−P−Se、Ge−P−Te、
Ge−As−S、Ge−As−Se、Ge−As−Te、Ge−Sb−S、Ge
−Sb−Se、Ge−Sb−Te、Ge−As−Te−Se、Ge−As−S−
Te、K−Ca−Ge−S、Ge−Te−Sb−S等、あるいはGeの
代わりにSiを含有させたカルコゲナイドガラス、また、
Ge−Si−As−Se、Ge−Si−As−Teのカルコゲナイドガラ
スが上げられる。
When using a non-single-crystal layer containing a chalcogen atom, a combination of the following is preferable. Ge-S, Ge
-Se, Ge-Te, Ge-P-S, Ge-P-Se, Ge-P-Te,
Ge-As-S, Ge-As-Se, Ge-As-Te, Ge-Sb-S, Ge
-Sb-Se, Ge-Sb-Te, Ge-As-Te-Se, Ge-As-S-
Te, K-Ca-Ge-S, Ge-Te-Sb-S, etc., or chalcogenide glass containing Si instead of Ge,
Ge-Si-As-Se and Ge-Si-As-Te chalcogenide glasses are mentioned.

シリコンを含有する非晶質層を、上記光導電層として作
成し用いる場合には、SiH4、Si2H6、Si3H8、SiF4、SiCl
4、SiHF3、SiH2F2、SiH3F、SiHCl3、SiH2Cl2、SiH3Cl等
のSi原子の原料ガスを用いたプラズマCVD法、または多
結晶シリコンをターゲットとし、ArとH2(さらにF2又は
Cl2を混合しても良い)の混合ガス中での反応性スパッ
タ法が用いられる。
When an amorphous layer containing silicon is formed and used as the photoconductive layer, SiH 4 , Si 2 H 6 , Si 3 H 8 , SiF 4 , and SiCl 4 are used .
4, SiHF 3, SiH 2 F 2, SiH 3 F, SiHCl 3, SiH 2 Cl 2, SiH 3 plasma CVD method using a source gas of Si atoms, such as Cl, or a polycrystalline silicon as a target, Ar and H 2 (more F 2 or
Cl 2 may be mixed) may be used for reactive sputtering in a mixed gas.

さらに、本発明において、所望の特性を得るために、n
型伝導性を与えるn型不純物として、周期律表第Vb族に
属するN、P、As、Sb等を添加し用いてもよい。
Further, in the present invention, in order to obtain desired characteristics, n
As an n-type impurity imparting type conductivity, N, P, As, Sb or the like belonging to Group Vb of the periodic table may be added and used.

以下、実施例について述べる。Examples will be described below.

実施例1 鏡面研磨したガラス基板上に、第1電極として白金をス
パッタ法により、0.1μmの膜厚に形成した基板を、真
空蒸着装置の基板ホルダーに設置し、残留圧力10-5Pa以
下に排気した。その後に、光導電層として、フェニレン
基を有し、パラ位に硫黄を有する直鎖状高分子としてPP
Sを基板上に真空蒸着法で成膜した。
Example 1 On a mirror-polished glass substrate, a substrate in which platinum was formed as a first electrode to a film thickness of 0.1 μm by a sputtering method was placed in a substrate holder of a vacuum evaporation apparatus, and the residual pressure was set to 10 −5 Pa or less. Exhausted. After that, as a photoconductive layer, PP having a phenylene group and a linear polymer having sulfur in the para position is used.
S was deposited on the substrate by vacuum deposition.

ここで、蒸着に用いた原料粉末は、以下のように重合長
を変化させて行った。重合法は、ホーキンス(Hawkin
s)の方法(マクロモリキュールズ(Macromolecules)
9巻(1976)189頁)によって行い、結晶化融点150〜28
0℃で最大重合度はおよそ50まで数種類用意した。この
とき、それぞれの試料の赤外吸収スペクトルの825cm-1
近傍にあるパラ位二置換基を有するベンゼン環のCH面外
変角振動に対する吸収スペクトルの強度が、750cm-1
傍にある一置換基を有するベンゼン環のCH面外変角振動
の吸収スペクトル強度に対する比(以下mと称する)
は、0.7〜7.5であった。ここでm=0.9の場合、平均
重合長は4程度である。
Here, the raw material powder used for vapor deposition was prepared by changing the polymerization length as follows. The polymerization method is Hawkins.
s) method (Macromolecules)
9 (1976) p. 189), crystallization melting point 150-28
Several types were prepared up to a maximum degree of polymerization of 50 at 0 ° C. At this time, the infrared absorption spectrum of each sample was 825 cm -1.
The absorption spectrum intensity of the benzene ring having a para-disubstituted group in the vicinity for CH out-of-plane bending vibration is about 750 cm -1. Ratio to (hereinafter referred to as m * )
Was 0.7 to 7.5. Here, when m * = 0.9, the average polymerization length is about 4.

原料粉末として平均重合度を3.5、4.0、5.0、8.0、10、
15、20の6種類オリゴマを使い真空蒸着法によって、膜
厚0.1μm成膜した。この時の成膜条件は同一で、真空
度10-5Torr以下、基板温度は室温とし、蒸着源温度250
〜350℃とした。
The average degree of polymerization as raw material powder is 3.5, 4.0, 5.0, 8.0, 10,
A film thickness of 0.1 μm was formed by a vacuum deposition method using six kinds of oligomers 15 and 20. The film forming conditions at this time are the same, the degree of vacuum is 10 -5 Torr or less, the substrate temperature is room temperature, and the deposition source temperature is 250.
It was set to ~ 350 ° C.

成膜後の膜はそれぞれm=0.8、0.9、1.3、1.6、2.
5、3.0、3.5となった。従って、原料粉末の平均重合度
は、4〜10が好ましい。
After formation, the films have m * = 0.8, 0.9, 1.3, 1.6, 2.
It became 5, 3.0 and 3.5. Therefore, the average degree of polymerization of the raw material powder is preferably 4-10.

これらの膜は、それぞれ融点未満の融点近傍温度で加熱
処理を施した。この時の温度は融点−15℃以内が望まし
い。なぜなら、これ以下の温度では、熱処理による結晶
性の著しい向上に5時間以上の時間を必要とする、ま
た、融点付近では逆に結晶性が低下する場合がある。
Each of these films was subjected to heat treatment at a temperature near the melting point, which is lower than the melting point. The temperature at this time is preferably within the melting point -15 ° C. Because, at a temperature below this, it takes 5 hours or more to significantly improve the crystallinity by heat treatment, and in the vicinity of the melting point, the crystallinity may decrease.

=1.6を例にとれば、この膜上に第2電極としてAl
を透明電極として薄く蒸着し光起電力素子を形成した場
合、この素子の特性は、325nmの紫外光を用いて10μw/c
m2の光照射を行ったところ、開放端電圧は0.5V、短絡電
流は2.3×10-8A/cm2と短絡電流が大幅に改善され、フ
ィルファクター(以下FFと記す)は0.31、変換効率も電
極の透過率を補正すれば2.0%となった。
Taking m * = 1.6 as an example, Al is used as the second electrode on this film.
When a photovoltaic device is formed by thinly depositing as a transparent electrode, the characteristics of this device are 10 μw / c using ultraviolet light of 325 nm.
When light irradiation of m 2 was performed, the open-circuit voltage was 0.5 V, the short-circuit current was 2.3 × 10 -8 A / cm 2, and the short-circuit current was greatly improved. The fill factor (hereinafter referred to as FF) was 0.31 and converted. The efficiency was 2.0% if the transmittance of the electrode was corrected.

このような、素子構成の1連の光起電力装置について、
325nm、10μw/cm2の紫外光を用いて評価を行い、電極の
透過率を補正した後の変換効率をまとめたのが第1表で
ある。
Regarding a series of photovoltaic devices having such an element structure,
Table 1 summarizes the conversion efficiencies after the evaluation was performed using ultraviolet light of 325 nm and 10 μw / cm 2 and the transmittance of the electrodes was corrected.

が0.9から大きくなるにつれ変換効率が改善され、
2.5以上では急激に低下する。
The conversion efficiency improves as m * increases from 0.9,
Above 2.5, it drops sharply.

一方、市販の分子量10,000以上の高分子PPS粉末を蒸発
源として、同様に0.1μmの膜を形成し、上記と同様に
素子を得た。この素子の特性は、同様に325nmの紫外光
を用いて10μW/cm2の光照射を行ったが、開放端電圧0.5
V、短絡電流1.3×10-9A/cm2、FFは0.26、変換効率は電
極の透過率を考慮しても0.2%程度を十分な特性が得ら
れない。
On the other hand, a commercially available polymer PPS powder having a molecular weight of 10,000 or more was used as an evaporation source to form a film of 0.1 μm in the same manner, and an element was obtained in the same manner as above. Similarly, the characteristics of this device were that irradiation with 10 μW / cm 2 was performed using ultraviolet light of 325 nm, but the open end voltage was 0.5.
V, short-circuit current 1.3 × 10 -9 A / cm 2 , FF 0.26, conversion efficiency of about 0.2% is not sufficient even if the electrode transmittance is taken into consideration.

一方、この融点付近での熱処理の効果を明らかにするた
め、第2電極に+0.5Vを印加した試料の各波長(50μW/
cm2)における光電流を測定した。その結果を第2図に
示す。第2図(a)は、熱処理以前の素子の光電流を示
し、(b)は熱処理後の光電流を示す。このように、約
3倍の増加が見られた。
On the other hand, in order to clarify the effect of heat treatment near this melting point, each wavelength (50 μW / 50 μW /
The photocurrent in cm 2 ) was measured. The results are shown in FIG. FIG. 2A shows the photocurrent of the device before the heat treatment, and FIG. 2B shows the photocurrent after the heat treatment. Thus, an approximately 3-fold increase was seen.

また、市販の重合度の大きなPPSを蒸発源として用いた
場合、蒸発分子の質量分析を行った結果、分子量m/z=5
40の5量体として蒸発し基板に付着するものと分かっ
た。このような分子は、環を形成することから分子の長
鎖方向の結晶性は低下し、光電流を減少させるものと考
えられる。
Also, when commercially available PPS with a large degree of polymerization was used as the evaporation source, the result of mass spectrometric analysis of the evaporated molecules was that the molecular weight was
It was found that the pentamer of 40 evaporated and adhered to the substrate. Since such a molecule forms a ring, it is considered that the crystallinity in the long chain direction of the molecule is lowered and the photocurrent is reduced.

実施例2 実施例1と同様に、ガラス基板状にスパッタ法により形
成した白金第1電極上に、フェニレン基パラ位以外の位
置に置換基を有するフェニレン基を含有する例として、
PPSの誘導体であるポリ(2,6−ジエチル−1.4−フェニ
レンスルフィルド)(以下PDPSと称する)を蒸着法によ
って成膜した。
Example 2 Similar to Example 1, as an example of containing a phenylene group having a substituent at a position other than the para-position of a phenylene group on a platinum first electrode formed by a sputtering method on a glass substrate,
A PPS derivative, poly (2,6-diethyl-1.4-phenylene sulfide) (hereinafter referred to as PDPS), was formed into a film by a vapor deposition method.

PDPS及びPPSの原料粉末の合成は、土田等の方法(日本
化学会第56春季H会 講演予稿集1VIA03、1VIA04)によ
って行った。合成に用いる酸化剤及びその酸性度、反応
時間等によって重合度を制御できる。
The raw material powders of PDPS and PPS were synthesized by the method of Tsuchida et al. (Proceedings of the 56th Spring Meeting of the Chemical Society of Japan, 1VIA03, 1VIA04). The degree of polymerization can be controlled by the oxidizing agent used in the synthesis, the acidity thereof, the reaction time, and the like.

実施例1と同様、合成した重合度の異なる原料粉末を使
い、蒸着法によって成膜した。本実施例の原料粉末で
は、用いた酸化剤であるルイス酸がAlCl3、SbCl5の2種
類に対して、原料粉末の重合度はPDPS、PPS双方ともほ
ぼ4及び10程度であった。この原料粉末を蒸着法によっ
て光導電層として、0.1μmの膜厚に形成した。
Similar to Example 1, the raw material powders having different degrees of polymerization synthesized were used to form a film by the vapor deposition method. In the raw material powder of this example, the degree of polymerization of the raw material powder was about 4 and 10 for both the PDPS and PPS for two kinds of oxidizing agents, Lewis acid, AlCl 3 and SbCl 5 . This raw material powder was formed into a film having a thickness of 0.1 μm as a photoconductive layer by a vapor deposition method.

このようにして得られた光起電力素子を実施例1と同じ
条件で光電変換効率の測定を行った。その結果は開放端
電圧は0.5V、短絡電流は1.6×10-8A/cm2と短絡電流が
同様に大幅に改善され、FF0.31、変換効率も1.5%であ
った。
The photoelectric conversion efficiency of the thus obtained photovoltaic device was measured under the same conditions as in Example 1. As a result, the open-circuit voltage was 0.5 V, the short-circuit current was 1.6 × 10 -8 A / cm 2, and the short-circuit current was also greatly improved. The FF was 0.31 and the conversion efficiency was 1.5%.

実施例3 ガラス基板上に透明電極としてネサ膜を0.1μm形成し
た基板を、6インチの放電電極を有する平行平板型の容
量結合方式プラズマCVD装置内に設置し、反応容器内を
5×10-6Torr以下に排気後、基板を150〜200℃の温度範
囲の一定温度に加熱制御した。反応容器内にSiH4ガスを
50sccm、PH3を2〜5ppmを含むH2を250sccm混合導入し、
容器内圧力を0.2〜1.0Torに圧力を制御し、13.56MHZの
高周波を電力40〜80Wの条件で成膜し、a−Si:H層を光
導電層として0.1μm形成した。
Example 3 A substrate in which a Nesa film of 0.1 μm was formed as a transparent electrode on a glass substrate was placed in a parallel plate type capacitively coupled plasma CVD apparatus having a 6-inch discharge electrode, and the inside of a reaction vessel was 5 × 10 −. After evacuation to 6 Torr or less, the substrate was heated and controlled to a constant temperature in the temperature range of 150 to 200 ° C. Add SiH 4 gas into the reaction vessel.
50sccm, H 2 containing 2 to 5ppm of PH 3 mixed and introduced 250sccm,
The pressure inside the container was controlled to 0.2 to 1.0 Torr, a high frequency of 13.56 MHZ was formed under the condition of an electric power of 40 to 80 W, and an a-Si: H layer was formed as a photoconductive layer of 0.1 μm.

この後、PPS蒸着膜を実施例1と同様に重合度8の原料
粉末を用いてa−Si:H層上に真空蒸着法によって0.1μ
m積層させた。更に、熱処理炉に設置し、酸素雰囲気
で、加熱処理を施した。加熱温度は、融点−2℃に制御
し、それぞれ加熱処理を施した。
Then, a PPS vapor deposition film was formed on the a-Si: H layer by vacuum vapor deposition using the raw material powder having a degree of polymerization of 8 in the same manner as in Example 1 to obtain a thickness of 0.1 μm.
m were laminated. Further, it was placed in a heat treatment furnace and subjected to heat treatment in an oxygen atmosphere. The heating temperature was controlled to a melting point of −2 ° C., and each heating treatment was performed.

加熱処理後、PPS蒸着膜上に第2電極として白金を蒸着
によって形成し、光起電力素子を得た。
After the heat treatment, platinum was formed as a second electrode on the PPS vapor deposition film by vapor deposition to obtain a photovoltaic element.

この光起電力装置をa−Si:H層側のガラス基板から白色
蛍光灯を150ルックス照射したところ、開放端電圧が0.5
V、短絡電流8×10-6A/cm2で、FFは0.53、変換効率も
3.2%であった。
When this photovoltaic device was irradiated with 150 lux of a white fluorescent lamp from the glass substrate on the a-Si: H layer side, the open-ended voltage was 0.5.
V, short circuit current 8 × 10 -6 A / cm 2 , FF 0.53, conversion efficiency
It was 3.2%.

実施例4 光導電層を形成した後、加熱処理する際、真空中で加熱
処理と同時に電子受容体として、DDQ(2,3−ジクロロ−
5,6−ジシアノ−p−ベンゾキノン)を添加した。原料
であるPPSフィルムに対して6〜0.001mol%の添加量
で、膜厚0.5μmとして実施例3と同じ条件で酸素雰囲
気での熱処理を施し光起電力素子とした。
Example 4 When a heat treatment was performed after forming the photoconductive layer, DDQ (2,3-dichloro-
5,6-dicyano-p-benzoquinone) was added. The PPS film as a raw material was heat-treated in an oxygen atmosphere under the same conditions as in Example 3 with an addition amount of 6 to 0.001 mol% and a film thickness of 0.5 μm to obtain a photovoltaic element.

このようにして電子受容体を添加したPPS蒸着膜は更に
内部抵抗が減少し、短絡電流が増加した。
In this way, the PPS deposited film with the electron acceptor added further decreased the internal resistance and increased the short-circuit current.

上記の蛍光灯150ルックスを照射したところ、開放端電
圧が0.5V、短絡電流8×10-8A/cm2であった。
When the fluorescent lamp of 150 lux was irradiated, the open end voltage was 0.5 V and the short circuit current was 8 × 10 -8 A / cm 2 .

また、添加しないPPSを用いた場合では、短絡電流は2
×10-8A/cm2であった。
In addition, when PPS not added is used, the short circuit current is 2
It was × 10 -8 A / cm 2 .

TCNE(テトラシアノエチレン)を同mol%添加しても同
様の結果が得られた。
Similar results were obtained when TCNE (tetracyanoethylene) was added at the same mol%.

実施例5 ガラス基板上に第1電極として、ネサ膜を透明電極とし
て形成し、真空蒸着法によってCdS膜を0.2μm形成し
た。この試料を更に空気中にて400℃、20分の熱処理を
行い、実施例4に示したようにPPS膜を蒸着し、熱処理
を行った。その後、更に第2電極として白金を形成し、
光起電力素子を得た。
Example 5 A nesa film was formed as a transparent electrode as a first electrode on a glass substrate, and a CdS film was formed to a thickness of 0.2 μm by a vacuum deposition method. This sample was further heat-treated in air at 400 ° C. for 20 minutes to deposit a PPS film as shown in Example 4 and heat-treated. After that, platinum is further formed as a second electrode,
A photovoltaic device was obtained.

この素子を用いて、ガラス基板から蛍光灯150ルックス
の照射を行い、光電変換効率を測定した。開放電圧0.6
V、短絡電流としても、4.6×10-6A/cm2と高い。また、
FF0.37変換効率1.4%の素子が得られた。
Using this device, a glass substrate was irradiated with 150 lux of a fluorescent lamp to measure the photoelectric conversion efficiency. Open voltage 0.6
The V and short-circuit current are as high as 4.6 × 10 -6 A / cm 2 . Also,
A device with an FF of 0.37 conversion efficiency of 1.4% was obtained.

また、CdSにSeを添加しても高い効率の光起電力素子が
得られた。
Moreover, a highly efficient photovoltaic device was obtained even if Se was added to CdS.

実施例6 実施例4と同様に蒸着法によってPPS膜を0.1μm形成
し、加熱処理を行った。その後、同じく真空蒸着法によ
って0.05μmのSi(OH)Pc膜を形成し、第2電極とし
てAl膜を透明な膜厚を形成し、光起電力素子を得た。
Example 6 In the same manner as in Example 4, a PPS film was formed to a thickness of 0.1 μm by a vapor deposition method, and heat treatment was performed. Then, a Si (OH) 2 Pc film having a thickness of 0.05 μm was formed by the same vacuum evaporation method, and an Al film was formed as a second electrode to have a transparent film thickness to obtain a photovoltaic device.

Al電極上から蛍光灯150ルックスを照射し光電変換効率
を測定した。電極の透過率を補正しない状態でも、開放
電圧0.6V、短絡電流4×10-8A/cm2が得られ、FF0.36
で、透過率を補正すれば変換効率2.5%が得られた。
A fluorescent lamp of 150 lux was irradiated from above the Al electrode to measure the photoelectric conversion efficiency. Even if the electrode transmittance is not corrected, an open-circuit voltage of 0.6 V and a short-circuit current of 4 × 10 -8 A / cm 2 are obtained, and FF0.36
Then, if the transmittance was corrected, a conversion efficiency of 2.5% was obtained.

実施例7 実施例1と同様に、鏡面研磨したガラス基板上に、白金
電極をスパッタ法により0.1μmの膜厚に形成した基板
を用いた。このような基板を、真空蒸着装置の基板ホル
ダーに設置し、残留圧力を10-5Torr以下に排気した。そ
の後、50〜150℃に加熱した状態でポリ(p−フェニレ
ン)セレニド(以下PPSeと記す)粉体を加熱し、0.1μ
mのPPSe蒸着膜を得た。この膜上に第2電極としてAlを
透明電極として薄く蒸着し光起電力素子を形成した。こ
の素子の特性は、PPSと異なり、蛍光灯下でも大きな短
絡電流が得られた。150ルックスの蛍光灯光を用いて光
照射を行ったところ、開放端電圧0.5V、短絡電流は6.3
×10-8A/cm2とPPSに比較して大きな値が得られた。
Example 7 As in Example 1, a substrate was used in which a platinum electrode was formed on a mirror-polished glass substrate by sputtering to have a film thickness of 0.1 μm. Such a substrate was placed in a substrate holder of a vacuum vapor deposition apparatus, and the residual pressure was exhausted to 10 -5 Torr or less. Then, the poly (p-phenylene) selenide (hereinafter referred to as PPSe) powder is heated in a state of being heated to 50 to 150 ° C. to be 0.1 μm.
m PPSe vapor deposition film was obtained. On this film, Al was thinly deposited as a second electrode as a transparent electrode to form a photovoltaic element. The characteristics of this device were different from PPS, and a large short-circuit current was obtained even under a fluorescent lamp. When light was irradiated using fluorescent light of 150 lux, the open-circuit voltage was 0.5 V and the short-circuit current was 6.3.
A large value was obtained as compared with PPS, which was × 10 -8 A / cm 2 .

一方、本発明に従い、0.1μmのPPSe膜ムを蒸着した
後、酸素中にて〜200℃で1〜5時間の加熱処理を行っ
た。加熱処理後同様にAl電極を透明電極として薄く形成
し同様に光電変換特性を測定した。この素子の特性は、
開放端電圧は0.5V、短絡電流は9.6×10-8A/cm2と短絡
電流が改善され、FFが0.35、変換効率も電極の透過率を
考慮すれば2.4%であった。
On the other hand, according to the present invention, a 0.1 μm PPSe film was deposited and then heat-treated in oxygen at −200 ° C. for 1 to 5 hours. After the heat treatment, the Al electrode was thinly formed in the same manner as the transparent electrode, and the photoelectric conversion characteristics were measured in the same manner. The characteristics of this element are
The open-circuit voltage was 0.5 V, the short-circuit current was 9.6 × 10 -8 A / cm 2, and the short-circuit current was improved. The FF was 0.35, and the conversion efficiency was 2.4% when the electrode transmittance was taken into consideration.

この光起電力装置のPPSe中の組成を分析したところ、層
中に含まれるO原子のC原子に対する組成比率は、1.2a
tm%であった。
When the composition of PPSe of this photovoltaic device was analyzed, the composition ratio of O atoms contained in the layer to C atoms was 1.2a.
It was tm%.

実施例8 ガラス基板上に実施例5と同様に、第1電極として、ネ
サ膜を透明電極として形成し、実施例7に示したように
PPSe膜を蒸着し、その後、更に真空蒸着法によってAs2S
e2膜を0.2μm形成し、第2電極として白金を形成し、
光起電力素子を得た。
Example 8 A nesa film was formed as a transparent electrode as a first electrode on a glass substrate in the same manner as in Example 5, and as shown in Example 7,
A PPSe film is deposited and then As 2 S is deposited by vacuum deposition.
e 2 film 0.2μm is formed, platinum is formed as the second electrode,
A photovoltaic device was obtained.

この素子を用いて、ガラス基板から蛍光灯150ルックス
の照射を行い、光電変換効率を測定した。開放電圧0.6
V、短絡電流としても、5.3×10-6A/cm2と高い。また、
FF0.37変換効率2.4%の素子が得られた。
Using this device, a glass substrate was irradiated with 150 lux of a fluorescent lamp to measure the photoelectric conversion efficiency. Open voltage 0.6
The V and short-circuit current is as high as 5.3 × 10 -6 A / cm 2 . Also,
A device with an FF of 0.37 conversion efficiency of 2.4% was obtained.

同様の効果が、SeをTeに置換したポリ(p−フェニレ
ン)テルリドについても見られた。
A similar effect was observed with poly (p-phenylene) telluride in which Se was replaced with Te.

また、実施例3および8のように、他の半導体材料との
ヘテロ接合を形成しても高い変換効率が確認された。
Also, high conversion efficiency was confirmed even when a heterojunction with another semiconductor material was formed as in Examples 3 and 8.

発明の効果 本発明によれば、高いキャリア生成効率と高いキャリア
寿命および移動度を有する光導電層を備え、高い光電変
換効率を実現する光起電力装置を得ることができる。
EFFECTS OF THE INVENTION According to the present invention, it is possible to obtain a photovoltaic device that includes a photoconductive layer having high carrier generation efficiency, high carrier life and mobility, and that realizes high photoelectric conversion efficiency.

【図面の簡単な説明】[Brief description of drawings]

第1図は、本発明の一実施例における光起電力装置の断
面図、第2図は本発明の一実施例における各波長におけ
る光電流の改善効果を示すグラフである。 1……支持体、2……第1電極、3……光導電層、4…
…第2電極。
FIG. 1 is a cross-sectional view of a photovoltaic device according to one embodiment of the present invention, and FIG. 2 is a graph showing the effect of improving photocurrent at each wavelength in one embodiment of the present invention. 1 ... Support, 2 ... First electrode, 3 ... Photoconductive layer, 4 ...
… Second electrode.

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】光励起によってキャリアを発生する光導電
層を用いた光起電力装置において、前記光導電層の少な
くとも1部が、p−フェニレンを有する直鎖状高分子層
を主成分とし、上記直鎖状高分子層の赤外吸収スペクト
ルにおける、825cm-1近傍にあるパラ位二置換基を有す
るベンゼン環のCH面外変角振動に対する吸収スペクトル
の強度の、750cm-1近傍にある一置換基を有するベンゼ
ン環のCH面外変角振動の吸収スペクトルの強度に対する
比が、0.9以上2.5以下であることを特徴とする光起電力
装置。
1. A photovoltaic device using a photoconductive layer that generates carriers by photoexcitation, wherein at least a part of the photoconductive layer contains a linear polymer layer having p-phenylene as a main component. in the infrared absorption spectrum of the linear polymer layer, the intensity of the absorption spectra for CH out-of-plane deformation vibration of a benzene ring having para-disubstituted group in the vicinity 825Cm -1, monosubstituted in the vicinity 750 cm -1 A photovoltaic device, wherein the ratio of the absorption spectrum of the CH out-of-plane bending vibration of the benzene ring having a group to the intensity of the absorption spectrum is 0.9 or more and 2.5 or less.
【請求項2】光導電層の少なくとも1部がp−フェニレ
ンを有し、パラ位にVIb族元素を有する直鎖状化合物高
分子層であり、VIb族元素としてS、SeおよびTeから選
ばれた少なくとも一種を有することを特徴とする請求項
1に記載の光起電力装置。
2. A linear compound polymer layer in which at least a part of the photoconductive layer has p-phenylene and has a VI b group element in the para position, and which comprises S, Se and Te as the VI b group element. The photovoltaic device according to claim 1, comprising at least one selected.
【請求項3】光導電層中の高分子層がO原子を含有し、
高分子に含まれるO原子のC原子に対する原子数比率が
0.1〜5atm%であることを特徴とする請求項1に記載の
光起電力装置。
3. The polymer layer in the photoconductive layer contains O atom,
The ratio of the number of O atoms contained in the polymer to the number of C atoms is
The photovoltaic device according to claim 1, characterized in that it is 0.1 to 5 atm%.
【請求項4】光導電層中の高分子層に電子受容体を添加
したことを特徴とする請求項1に記載の光起電力装置。
4. The photovoltaic device according to claim 1, wherein an electron acceptor is added to the polymer layer in the photoconductive layer.
【請求項5】光導電層中の高分子層がp−フェニレンを
有する直鎖状高分子層主成分とし、上記p−フェニレン
が、パラ位以外の位置に置換基を有することを特徴とす
る請求項1に記載の光起電力装置。
5. The polymer layer in the photoconductive layer is mainly composed of a linear polymer layer having p-phenylene, and the p-phenylene has a substituent at a position other than the para position. The photovoltaic device according to claim 1.
【請求項6】請求項1に記載の光起電力装置を製造する
方法であって、光導電層中の高分子層を形成する工程に
おいて、p−フェニレンを有する直鎖状高分子であり、
かつその平均重合度が4〜10の範囲にあるオリゴマを蒸
発源とした蒸着法によって高分子層を形成することを特
徴とする光起電力装置の製造方法。
6. The method of manufacturing a photovoltaic device according to claim 1, wherein the step of forming the polymer layer in the photoconductive layer is a linear polymer having p-phenylene,
A method for producing a photovoltaic device, characterized in that the polymer layer is formed by a vapor deposition method using an oligomer having an average degree of polymerization of 4 to 10 as an evaporation source.
【請求項7】光導電層中の高分子層を形成する工程にお
いて、上記高分子層を形成後、高分子層の融点未満の温
度で加熱処理を行なうことを特徴とする請求項6に記載
の光起電力装置の製造方法。
7. The process according to claim 6, wherein in the step of forming the polymer layer in the photoconductive layer, heat treatment is performed at a temperature lower than the melting point of the polymer layer after forming the polymer layer. Method for manufacturing photovoltaic device of.
JP63233001A 1988-09-16 1988-09-16 Photovoltaic device and manufacturing method thereof Expired - Lifetime JPH0716021B2 (en)

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Application Number Priority Date Filing Date Title
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Application Number Priority Date Filing Date Title
JP63233001A JPH0716021B2 (en) 1988-09-16 1988-09-16 Photovoltaic device and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH0281479A JPH0281479A (en) 1990-03-22
JPH0716021B2 true JPH0716021B2 (en) 1995-02-22

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Country Link
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2828272B2 (en) * 1989-07-07 1998-11-25 荒川化学工業株式会社 Preparation of optically active compounds
CN1682362A (en) * 2002-09-05 2005-10-12 孔纳尔卡技术公司 Method for treating a photovoltaic active layer and organic photovoltaic element
CN101842917B (en) * 2007-10-31 2012-10-03 巴斯夫欧洲公司 Use of halogenated phthalocyanines

Also Published As

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