JPH0719893B2 - Optical semiconductor device - Google Patents
Optical semiconductor deviceInfo
- Publication number
- JPH0719893B2 JPH0719893B2 JP61166895A JP16689586A JPH0719893B2 JP H0719893 B2 JPH0719893 B2 JP H0719893B2 JP 61166895 A JP61166895 A JP 61166895A JP 16689586 A JP16689586 A JP 16689586A JP H0719893 B2 JPH0719893 B2 JP H0719893B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- photoelectric conversion
- conversion element
- semiconductor device
- optical semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/50—Encapsulations or containers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/40—Optical elements or arrangements
- H10F77/413—Optical elements or arrangements directly associated or integrated with the devices, e.g. back reflectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/756—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink
Landscapes
- Electroluminescent Light Sources (AREA)
- Light Receiving Elements (AREA)
Description
【発明の詳細な説明】 〔発明の属する技術分野〕 本発明は入射光を電気信号に変換する光電変換素子を光
透過性樹脂を用いて封止した光半導体装置に関する。Description: TECHNICAL FIELD The present invention relates to an optical semiconductor device in which a photoelectric conversion element for converting incident light into an electric signal is sealed with a light transmissive resin.
従来、入射光を電気信号に変換する光電変換装置は第2
図に示すように構成されている。Conventionally, the photoelectric conversion device for converting incident light into an electric signal is the second one.
It is configured as shown in the figure.
すなわち、光電変換素子1を光電変換素子支持部材2上
に固定保持し、光電変換素子1とリード端子2′の所定
の箇所に、極細金属線3を用いてワイヤボンディング
し、次に、光透過性樹脂4を用いて成形し、外形を形成
する。その後、リード端子2′の外部導出部2″を必要
長さに切断し、所望状態に曲げるなどして光半導体装置
を構成していた。That is, the photoelectric conversion element 1 is fixedly held on the photoelectric conversion element support member 2, wire-bonded to the predetermined positions of the photoelectric conversion element 1 and the lead terminal 2'using the ultrafine metal wire 3, and then the light transmission is performed. The outer shape is formed by molding using the resin 4. After that, the external lead-out portion 2 ″ of the lead terminal 2 ′ is cut to a required length and bent to a desired state to form an optical semiconductor device.
ところが、上記構成の従来の光半導体装置には、下述の
ごとき諸問題が存在する。However, the conventional optical semiconductor device having the above structure has various problems as described below.
すなわち、(i)光電変換素子1の光受容部が複数個
(n個)の光受容部から構成されている場合、光電変換
素子1のn個の光受容部に均一な光束を有する光6が入
射すると、該n個の光受容部から得られる電気信号は、
すべて同一なレベルにならなければならないところ、実
際上は同一なレベルにならないという問題がある。ま
た、n個の光受容部のうちのある1つの光受容部に光を
入射させ、その他の光受容部には光を入射させない場合
においては、光を入射させない光受容部にも暗電流より
も大なる電気信号出力が得られてしまうという問題もあ
る。That is, (i) when the light receiving part of the photoelectric conversion element 1 is composed of a plurality of (n) light receiving parts, the light 6 having a uniform light flux is supplied to the n light receiving parts of the photoelectric conversion element 1. Is incident, the electric signals obtained from the n photoreceptors are
Where they all have to be at the same level, there is the problem that they are not at the same level in practice. In addition, in the case where light is made incident on one of the n light-receiving parts and light is not made incident on the other light-receiving parts, dark current is applied to the light-receiving parts which do not make light incident. However, there is also a problem that a large electric signal output is obtained.
更にまた、(ii)光透過性樹脂4の表面9にキズ等の欠
陥がある場合、該欠陥より入射した光の光電変換素子1
上の光到達部10近傍の光受容部からの電気信号出力が低
下してしまうという問題がある。Furthermore, (ii) when the surface 9 of the light transmissive resin 4 has a defect such as a scratch, the photoelectric conversion element 1 for the light incident from the defect.
There is a problem that the electric signal output from the light receiving section near the upper light reaching section 10 is reduced.
本発明は、前述した従来の光半導体装置における上述の
諸問題を克服して、優れた特性を有する光半導体装置を
提供することを目的とする。An object of the present invention is to provide an optical semiconductor device having excellent characteristics by overcoming the above-mentioned problems of the conventional optical semiconductor device described above.
即ち、本発明の主たる目的は、光透過性樹脂を用いて封
止した光半導体装置において、光電変換素子を構成する
複数個の光受容部から得られる電気信号が均一である光
半導体装置を提供することにある。That is, a main object of the present invention is to provide an optical semiconductor device sealed with a light transmissive resin, in which electric signals obtained from a plurality of light receiving parts constituting a photoelectric conversion element are uniform. To do.
本発明の他の目的は、光透過性樹脂を用いて封止した光
半導体装置において、光透過性樹脂の表面にキズ等の欠
陥があっても光受容部からの電気信号が低下することの
ない光半導体装置を提供することにある。Another object of the present invention is to reduce the electric signal from the light receiving part in an optical semiconductor device sealed with a light transmissive resin even if there are defects such as scratches on the surface of the light transmissive resin. An object is to provide an optical semiconductor device that does not have such a structure.
本発明は、前述の従来装置における諸問題を解決して上
記本発明の目的を達成すべく鋭意研究を重ねたところ、
前述の従来装置の諸問題は以下のごとき原因によるもの
であることが判明した。The present invention is to solve the problems in the above-mentioned conventional device, and after earnest research to achieve the object of the present invention,
It was found that the above-mentioned problems of the conventional device are caused by the following causes.
前述の問題の発生原因について、第2図を用いて説明す
る。The cause of the above-mentioned problem will be described with reference to FIG.
即ち、空気層11から光透過性樹脂4および光電変換素子
4に直角に光線6が入射した時光電変換素子1の表面12
で、光が反射散乱される。反射散乱された光強度は表面
12の材料、面積度にも依るが角度依存性を持つ。反射さ
れた散乱光は樹脂4から空気層11へ抜けるものもあれば
空気層11と樹脂4の界面で反射されるものもある。That is, when the light ray 6 is incident on the light transmissive resin 4 and the photoelectric conversion element 4 at a right angle from the air layer 11, the surface 12 of the photoelectric conversion element 1 is
Then, the light is reflected and scattered. Light intensity reflected and scattered is the surface
It has an angle dependence, although it depends on the 12 materials and area. Some of the reflected scattered light escapes from the resin 4 to the air layer 11, and some of the reflected light is reflected at the interface between the air layer 11 and the resin 4.
スネルの法則によればある角度θ1で全反射する。θ1は
光透過性樹脂4と空気層11の屈折率により決定される。
例えば光透過性樹脂4、空気層11の屈折率をそれぞれ1.
5、1とした時、θ1は略40度となり略40度以上になった
場合全反射する。従って光電変換素子1の受光部5の入
射光量Aは、次式Iで表わされる。According to Snell's law, total reflection occurs at an angle θ 1 . θ 1 is determined by the refractive indexes of the light transmissive resin 4 and the air layer 11.
For example, the light transmissive resin 4 and the air layer 11 each have a refractive index of 1.
When set to 5 and 1 , θ 1 is approximately 40 degrees and total reflection occurs when it becomes approximately 40 degrees or more. Therefore, the incident light amount A of the light receiving portion 5 of the photoelectric conversion element 1 is expressed by the following equation I.
A=(光線6の光量)+(θr(θr≦θ1)をなす光
線の全反射光量の積分値)+(θr(θr<θ1)をな
す光線の反射光量の積分値)……I 式Iの第3項においてθrの値がθ1より小さい時反射
光量は非常に小さく無視できる値であるが、θrがθ1
にほぼ近い値になった時に反射光量は大になる。A = (light amount of light beam 6) + (integral value of total reflected light amount of light ray forming θr (θr ≦ θ 1 ) + (integral value of reflected light amount of light ray forming θr (θr <θ 1 )) ... I Although the third time value of [theta] r is theta 1 is less than the term reflected light of the formula I is a value that can be ignored very small, [theta] r is theta 1
The amount of reflected light becomes large when the value is close to.
つまり受光部5の入射光量は光線6の光量と光電変換素
子1面上で受光部5を中心にl1を半径にして描いた円
の円周近傍および円外から反射した光の入射光量の和と
なり、後者の不要反射光が入射するために光学特性異常
が生じ、前述のごとき問題が生じることとなる。That is, the incident light amount of the light receiving portion 5 is the light amount of the light ray 6 and the incident light amount of light reflected from the vicinity of the circumference of a circle drawn with the radius of l 1 centered on the light receiving portion 5 on the surface of the photoelectric conversion element 1 and outside the circle. In this case, since the latter unnecessary reflected light is incident, abnormal optical characteristics occur and the above-mentioned problems occur.
本発明は、上述の知見に基づいて更に研究を続けた結果
完成するに至ったものである。The present invention has been completed as a result of further research based on the above findings.
即ち、本発明の光半導体装置は、光電変換素子を光電変
換素子支持部材上に固定保持し、該素子とリード端子を
極細金属線を介して電気的に接続したのち、光透過性樹
脂を用いて封止した光半導体装置であって、ガラスまた
は光透過性樹脂等の部材が封止体外形の少なくとも光透
過面に、前記光透過性樹脂で接着されているかもしく
は、前記光透過性樹脂とは異なる種類の光透過性樹脂に
より貼り付けられていることを特徴とするものである。That is, in the optical semiconductor device of the present invention, the photoelectric conversion element is fixedly held on the photoelectric conversion element supporting member, and the element and the lead terminal are electrically connected via the ultrafine metal wire, and then the light transmissive resin is used. In the sealed optical semiconductor device, a member such as glass or a light-transmitting resin is adhered to at least the light-transmitting surface of the outer shape of the sealing body with the light-transmitting resin, or Is characterized by being adhered by different kinds of light transmitting resins.
本発明の光半導体装置は下述する態様を包含する。The optical semiconductor device of the present invention includes the aspects described below.
態様の1つは下記の構成の光半導体装置である。One of the aspects is an optical semiconductor device having the following configuration.
即ち、光電変換素子と、該光電変換素子とリード端子と
を接続する細線と、を光透過性樹脂を用いて封止してな
る光半導体装置であって、ガラスまたは光透過性樹脂か
らなる部材が封止体の表面に貼合わされており、前記部
材の光透過面と前記光電変換素子との間の距離をD、前
記光透過面における全反射角度をθ1、としたときに、
前記光電変換素子の表面において2・D・tanθ1を半径
にして描いた円内の領域に前記光電変換素子の受光部が
位置していることを特徴とする。That is, an optical semiconductor device in which a photoelectric conversion element and a thin wire connecting the photoelectric conversion element and a lead terminal are sealed with a light-transmissive resin, the member being made of glass or a light-transmissive resin. Is bonded to the surface of the sealing body, and the distance between the light transmitting surface of the member and the photoelectric conversion element is D, and the total reflection angle on the light transmitting surface is θ 1 ,
It is characterized in that the light receiving portion of the photoelectric conversion element is located in a region within a circle drawn with a radius of 2 · D · tan θ 1 on the surface of the photoelectric conversion element.
他の態様は下記の構成の焦点検出装置である。Another aspect is a focus detection device having the following configuration.
即ち、結像レンズと測距用センサーとを具備する焦点検
出装置であって、前記測距用センサーが、光電変換素
子、該光電変換素子とリード端子とを接続する細線と、
を光透過性樹脂を用いて封止してなるとともに、ガラス
または光透過性樹脂からなる部材が、封止体の表面に貼
合わされており、前記部材の光透過面と前記光電変換素
子との間の距離をD、前記光透過面における全反射角度
をθとしたときに、前記光電変換素子の表面において2
・D・tanθ1を半径にして描いた円内の領域に前記光電
変換素子の受光部が位置していることを特徴とする。That is, in a focus detection device comprising an imaging lens and a distance measuring sensor, the distance measuring sensor comprises a photoelectric conversion element, a thin wire connecting the photoelectric conversion element and a lead terminal,
While sealing with a light transmissive resin, a member made of glass or a light transmissive resin is bonded to the surface of the sealing body, the light transmissive surface of the member and the photoelectric conversion element When the distance between them is D and the angle of total reflection on the light transmitting surface is θ, 2 on the surface of the photoelectric conversion element.
The light receiving portion of the photoelectric conversion element is located in an area within a circle drawn with the radius of D · tan θ 1 .
以下、図示の実施例により本発明を詳しく説明するが、
本発明はこれにより何ら制限されるものではない。Hereinafter, the present invention will be described in detail with reference to the illustrated embodiments.
The present invention is not limited thereby.
第1図は、本発明の光半導体装置の1実施例を模式的に
示す断面略図である。なお、第1図において、前述の第
2図と同一符号を付したものは、第2図と同一のものを
示している。すなわち光電変換素子1を光電変換素子支
持部材2に固定保持し、光電変換素子1とリード端子
2′の所定箇所に極細金属線3を用いてワイヤボンディ
ングし、次に光透過性樹脂4を用いて、トランスファー
モールド法等の成形手段により成形し、外形を形成す
る。その後、成形体の少なくとも光透過面にガラス7を
光透過性樹脂8を用いて貼り付け光透過性樹脂8を硬化
させて接着させる。FIG. 1 is a schematic sectional view schematically showing one embodiment of an optical semiconductor device of the present invention. In FIG. 1, the same reference numerals as those in FIG. 2 described above indicate the same parts as in FIG. That is, the photoelectric conversion element 1 is fixedly held on the photoelectric conversion element support member 2, wire-bonded to the predetermined positions of the photoelectric conversion element 1 and the lead terminal 2'using the fine metal wire 3, and then the light-transmissive resin 4 is used. Then, the outer shape is formed by a molding method such as a transfer molding method. After that, the glass 7 is attached to at least the light transmitting surface of the molded body by using the light transmitting resin 8, and the light transmitting resin 8 is cured and adhered.
第1図の本発明の光半導体装置において、ガラス7、光
透過性樹脂8、4の屈折率が略同一であり、d1を光透過
性樹脂4の表面から光電変換素子1のセンサー面までの
距離、そしてd2をガラス7の厚味と光透過性樹脂8の厚
味の和とし、光線6がガラス7および光電変換素子1に
直角に入射した時、θ1をスネルの法則に従う全反射角
度とすると、光電変換素子1の受光部5に入射する光量
Aは、従来の光半導体装置(d2=0)の場合、次式IIで
表わされるものとなる。In the optical semiconductor device of the present invention shown in FIG. 1, the refractive indexes of the glass 7 and the light transmissive resins 8 and 4 are substantially the same, and d 1 is from the surface of the light transmissive resin 4 to the sensor surface of the photoelectric conversion element 1. , And d 2 is the sum of the thickness of the glass 7 and the thickness of the light transmissive resin 8, and when the light beam 6 is incident on the glass 7 and the photoelectric conversion element 1 at a right angle, θ 1 follows Snell's law In the case of the conventional optical semiconductor device (d 2 = 0), the amount A of light incident on the light receiving portion 5 of the photoelectric conversion element 1 is represented by the following formula II when the reflection angle is used.
A=(光線6の光量)+(光電変換素子1面上でl1を半
径にして描いた円の円周近傍と円外から反射した光の入
射光量の和) ……II これに対し、本発明の光半導体装置(d2≠0)の場合、
次式IIIで表わされるものとなる。A = (amount of light of light ray 6) + (sum of incident light amount of light reflected from the vicinity of the circumference of a circle drawn with 1 1 as a radius on the surface of the photoelectric conversion element and from the outside of the circle). In the case of the optical semiconductor device (d 2 ≠ 0) of the present invention,
It is represented by the following formula III.
A=(光線6の光量)+(光電変換素子1面上でl2を半
径にして描いた円の円周近傍と円外から反射した光の入
射光量の和) ……III 式IIIにおいて、l1=2d1tanθ1 l2=2(d1+d2)tanθ1 l2−l1=2d2tanθ1 (θ1、l1は一定) となる。従ってd2(=ガラス7の厚さと光透過性樹脂8
の厚さの和)を大きくすればする程l2−l1の値が大にな
ることにより反射光の入射する領域が狭くなり反射によ
る影響が少なくなる。また光の強度は光路長の二乗に反
比例することから、本発明の光半導体装置の場合、光路
長が長くなるゆえに、反射光の入射する強度の絶対値も
減少し影響が少なくなる。つまり反射光の影響を少なく
するためには、光電変換素子1の受光部以外からの反射
光の影響を少なくするため受光部以外は光到達できない
ようにマスキングすることと、光電変換素子1の任意の
受光部が略l2を半径にして描いた円内に入るようにガラ
ス7の厚さおよび形状を設計すればよい。またマスキン
グしても光電変換素子1面の受光部部以外にも光到達す
る場合、また任意の受光部が略l2を半径にして描いた円
外に存在せざるを得ない場合は予め影響の程度を把握し
ガラス7の厚さおよび形状を設計すれば良い。A = (amount of light of light ray 6) + (sum of incident light amount of light reflected from the vicinity of the circumference of a circle drawn with the radius of l 2 on the surface of the photoelectric conversion element 1) ... III l 1 = 2d 1 tan θ 1 l 2 = 2 (d 1 + d 2 ) tan θ 1 l 2 −l 1 = 2d 2 tan θ 1 (θ 1 and l 1 are constant). Therefore, d 2 (= glass 7 thickness and light transmissive resin 8
The larger the value of l 2 −l 1 becomes, the smaller the area where the reflected light enters becomes and the less the influence of reflection becomes. Further, since the intensity of light is inversely proportional to the square of the optical path length, in the case of the optical semiconductor device of the present invention, the optical path length becomes long, so that the absolute value of the incident intensity of reflected light also decreases and the influence is reduced. That is, in order to reduce the influence of the reflected light, in order to reduce the influence of the reflected light from the portion other than the light receiving portion of the photoelectric conversion element 1, masking is performed so that light cannot reach the portion other than the light receiving portion. The thickness and shape of the glass 7 may be designed so that the light receiving portion of the glass 7 is within a circle drawn with a radius of approximately l 2 . In addition, even if masking is performed, if light reaches other than the light receiving portion on the photoelectric conversion element 1 surface, or if any light receiving portion has to exist outside the circle drawn with the radius of approximately l 2 , the influence is affected beforehand. The thickness and shape of the glass 7 may be designed by grasping the degree of
また光透過性樹脂4の表面9にキズ等の異形が存在した
場合、光透過性樹脂4とほぼ同等の屈折率を持つ光透過
性樹脂8でキズ等が埋められ光学特性上影響が少なくな
る。Further, when there is a defect such as a flaw on the surface 9 of the light-transmitting resin 4, the flaw is filled with the light-transmitting resin 8 having a refractive index almost equal to that of the light-transmitting resin 4, and the influence on the optical characteristics is reduced. .
なお、本例においてはガラス7を用いた例をあげたが、
ガラス7のかわりに光透過性樹脂を用いることもでき
る。また、ガラス7を光透過性樹脂8で貼り付ける例を
記載したが、光透過性樹脂4をトランスファーモールド
法等により成形する際にガラス7を同時形成し、光透過
性樹脂4そのものでガラス7を接着保持することもでき
る。In this example, the glass 7 is used.
A light transmissive resin may be used instead of the glass 7. Further, although the example in which the glass 7 is pasted with the light transmissive resin 8 is described, the glass 7 is simultaneously formed when the light transmissive resin 4 is molded by the transfer molding method or the like, and the glass 7 is formed by the light transmissive resin 4 itself. Can also be held by adhesion.
次に本発明の効果について第1図を用いて説明する。本
発明の光半導体装置において、d2が大になればなる程反
射の影響が少なくなるとともに、光路長が長くなること
による反射光量の絶対値が小さくなりさらに影響が少な
くなる。また、本発明の光半導体装置においては、光透
過性樹脂4の表面9にキズ等の異形が存在しても光透過
性樹脂4、8が略同一屈折率のため光学特性上影響され
ない。本発明の光半導体装置は、光電変換素子がCCD等
受光面が多分割化されているラインセンサー、エリアセ
ンサー等反射の影響がシビアに問われるセンサーに有効
である。Next, the effect of the present invention will be described with reference to FIG. In the optical semiconductor device of the present invention, the greater d 2 is, the less the influence of reflection is, and the longer the optical path length is, the smaller the absolute value of the reflected light amount is, which is further reduced. In the optical semiconductor device of the present invention, even if the surface 9 of the light transmissive resin 4 has a defect such as a flaw, the light transmissive resins 4 and 8 have substantially the same refractive index and are not affected by the optical characteristics. INDUSTRIAL APPLICABILITY The optical semiconductor device of the present invention is effective for a line sensor in which a photoelectric conversion element has a multi-divided light receiving surface such as a CCD, an area sensor, and other sensors that are severely affected by reflection.
第3〜4図を用いて、本発明の光半導体装置をカメラの
オートフォーカスセンサーとして用いた時の光学特性向
上効果について説明する。The effect of improving the optical characteristics when the optical semiconductor device of the present invention is used as an autofocus sensor of a camera will be described with reference to FIGS.
第3図は本発明の光半導体装置をカメラのAFセンサーと
して用いた場合の光学系展開図を示す。図中、13〜18は
焦点検出装置(AFu)を構成する部品を夫々示してい
る。即ち、13はピント面近傍に置かれた視野マスク、14
はフィールドレンズ、15は開口15a、15bを持つ測距光束
分割用マスク、16は二次結像レンズで、16a、16bがレン
ズ部である。17は測距用センサー(本発明の光半導体装
置)で、多数の画素が一直線上に並んだ一対のラインセ
ンサー17a、17bを有している。FIG. 3 is a development view of an optical system when the optical semiconductor device of the present invention is used as an AF sensor of a camera. In the figure, reference numerals 13 to 18 respectively indicate parts constituting the focus detection device (AFu). That is, 13 is a visual field mask placed near the focus surface, and 14 is a visual field mask.
Is a field lens, 15 is a distance measuring light beam splitting mask having apertures 15a and 15b, 16 is a secondary imaging lens, and 16a and 16b are lens portions. Reference numeral 17 denotes a distance measuring sensor (optical semiconductor device of the present invention), which has a pair of line sensors 17a and 17b in which a large number of pixels are aligned.
18a、18bは各々二次結像レンズ16のレンズ部16a、16bに
よって投影された13aの像で、該18a、18bは境界部がぴ
ったり隣接する様に15aの大きさが決められている。14
は通過した光束を有効に測距光束分割用マスク15および
二次結像レンズ16に導くためのレンズである。Reference numerals 18a and 18b denote images of 13a projected by the lens portions 16a and 16b of the secondary imaging lens 16, respectively, and the sizes of 15a are determined so that the boundaries are exactly adjacent to each other. 14
Is a lens for effectively guiding the passed luminous flux to the distance measuring luminous flux splitting mask 15 and the secondary imaging lens 16.
従って当光学系において撮影レンズを通った光束は13の
上で結像し、更に開口15a、15bを通過して、レンズ部16
a、16bによりラインセンサー17a、17b上の18a、18b内に
再結像される。そしてラインセンサー17a、17b上の2像
の相対位置を検出して合焦状態を判別する様になってい
る。Therefore, in this optical system, the light flux that has passed through the taking lens forms an image on 13 and further passes through the openings 15a and 15b, and the lens portion 16
The images are re-imaged in the line sensors 17a and 17b into 18a and 18b by a and 16b. Then, the relative position of the two images on the line sensors 17a and 17b is detected to determine the in-focus state.
第4図にその原理を示す。ラインセンサー17a17b上に投
影された像の各々の出力をEa、Ebとすると、合焦状態で
は2像の距離Sがある値S0となるように設定されている
ものとする。そして撮影レンズが非合焦の状態ではS≠
S0となるが、これを検出するためにはEaとEbを相対的に
bitシフトさせて2像の相関をとるという手法が用いら
れる。The principle is shown in FIG. Letting Ea and Eb be the outputs of the images projected on the line sensors 17a and 17b, it is assumed that the distance S between the two images is set to a certain value S 0 in the focused state. When the taking lens is out of focus, S ≠
S 0 , but to detect this, Ea and Eb are relatively
A method of bit-shifting and taking the correlation of two images is used.
ここでもし18a上の像が前述した反射により18a上自体の
像に反射の影響を及ぼすとか、18b上の像が前述した反
射により18b上自体の像に反射の影響を及ぼすとか、ま
た18a上の像が前述した反射により18b上の像に反射の影
響を及ぼすとか、18b上の像が前述した反射により18a上
の像に反射の影響を及ぼすとEaとEbは本来の被写体輝度
分布とは異なった形状となるので真の被写体情報とは異
なった情報で相関演算をしていることになり、その結果
として検出されたピント情報に誤差を生ずることとな
る。If the image on 18a affects the image on 18a itself due to the above-mentioned reflection, or the image on 18b affects the image on 18b itself due to the above-mentioned reflection, or on 18a. Ea and Eb have the original subject brightness distribution when the image of 18 affects the image on 18b due to the reflection described above, or when the image on 18b affects the image on 18a due to the reflection described above. Since the shapes are different, the correlation calculation is performed using information different from the true subject information, and as a result, an error is generated in the detected focus information.
本発明の光半導体装置を用いると反射の影響が減少し正
確なピント情報を与えることになり、特にAFとして有利
なものである。The use of the optical semiconductor device of the present invention reduces the influence of reflection and gives accurate focus information, which is particularly advantageous for AF.
第1図は本発明の光半導体装置の一実施例を模式的に示
す断面略図であり、第2図は従来の光半導体装置を模式
的に示す断面略図である。第3図は、本発明の光半導体
装置をカメラのAFセンサーとして用いた場合の光学系展
開図であり、第4図は、その原理を説明するための図で
ある。 1……光電変換素子、2……光電変換素子支持部材、
2′……リード端子、2″……リード端子の外部導出
部、3……極細金属線、4……光透過性樹脂、5……光
電変換素子の光受容部、6……光線、7……ガラス、8
……光透過性樹脂、9……光透過性樹脂の表面、10……
光到達部、11……空気層、12……光変換素子の表面、13
……視野マスク、14……フィールドレンズ、15……測距
光束分割用マスク、15a、15b……開口、16……二次結像
レンズ、16a、16b……レンズ部、17……測距用センサ
ー、17a、17b……ラインセンサー、18a、18b……投影さ
れた13aの像FIG. 1 is a schematic sectional view schematically showing an embodiment of an optical semiconductor device of the present invention, and FIG. 2 is a schematic sectional view schematically showing a conventional optical semiconductor device. FIG. 3 is an exploded view of an optical system when the optical semiconductor device of the present invention is used as an AF sensor of a camera, and FIG. 4 is a diagram for explaining its principle. 1 ... Photoelectric conversion element, 2 ... Photoelectric conversion element support member,
2 '... Lead terminal, 2' ... Lead-out portion of lead terminal, 3 ... Extra fine metal wire, 4 ... Light transmissive resin, 5 ... Photoreceptor of photoelectric conversion element, 6 ... Ray, 7 ...... Glass, 8
…… Light-transmitting resin, 9 …… Light-transmitting resin surface, 10 ……
Light reaching part, 11 ... Air layer, 12 ... Surface of light conversion element, 13
...... Field mask, 14 ...... Field lens, 15 ...... Distance measuring luminous flux splitting mask, 15a, 15b ...... Aperture, 16 ...... Secondary imaging lens, 16a, 16b ...... Lens section, 17 ...... Distance measuring Sensor, 17a, 17b ... Line sensor, 18a, 18b ... Projected image of 13a
───────────────────────────────────────────────────── フロントページの続き (72)発明者 大貫 一朗 神奈川県川崎市高津区下野毛770番地 キ ヤノン株式会社玉川事業所内 (72)発明者 須田 康夫 神奈川県川崎市高津区下野毛770番地 キ ヤノン株式会社玉川事業所内 (72)発明者 大高 圭史 神奈川県川崎市高津区下野毛770番地 キ ヤノン株式会社玉川事業所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Ichiro Onuki, 770 Shimonoge, Takatsu-ku, Kawasaki, Kanagawa Canon Inc., Tamagawa Plant (72) Inventor, Yasuo Suda 770, Shimonoge, Takatsu-ku, Kawasaki, Kanagawa At the Tamagawa Plant (72) Inventor Keishi Otaka At 770 Shimonoge, Takatsu-ku, Kawasaki City, Kanagawa Prefecture Canon Inc., Tamagawa Plant
Claims (2)
端子とを接続する細線と、を光透過性樹脂を用いて封止
してなる光半導体装置であって、ガラスまたは光透過性
樹脂からなる部材が封止体の表面に貼合わされており、
前記部材の光透過面と前記光電変換素子との間の距離を
D、前記光透過面における全反射角度をθ1としたとき
に、前記光電変換素子の表面において2・D・tanθ1を
半径にして描いた円内の領域に前記光電変換素子の受光
部が位置していることを特徴とする光半導体装置。1. An optical semiconductor device in which a photoelectric conversion element and a thin wire connecting the photoelectric conversion element and a lead terminal are sealed with a light transmissive resin, which is made of glass or a light transmissive resin. The member consisting of is bonded to the surface of the sealing body,
When the distance between the light transmitting surface of the member and the photoelectric conversion element is D and the total reflection angle on the light transmitting surface is θ 1 , 2 · D · tan θ 1 is the radius on the surface of the photoelectric conversion element. An optical semiconductor device in which the light receiving portion of the photoelectric conversion element is located in a region within the circle drawn as above.
焦点検出装置であって、前記測距用センサーが、光電変
換素子と、該光電変換素子とリード端子とを接続する細
線と、を光透過性樹脂を用いて封止してなるとともに、
ガラスまたは光透過性樹脂からなる部材が、封止体の表
面に貼合わされており、前記部材の光透過面と前記光電
変換素子との間の距離をD、前記光透過面における全反
射角度をθとしたときに、前記光電変換素子の表面にお
いて2・D・tanθ1を半径にして描いた円内の領域に前
記光電変換素子の受光部が位置していることを特徴とす
る焦点検出装置。2. A focus detection device comprising an imaging lens and a distance measuring sensor, wherein the distance measuring sensor comprises a photoelectric conversion element, and a thin wire connecting the photoelectric conversion element and a lead terminal. Is sealed with a light-transmitting resin,
A member made of glass or a light-transmitting resin is attached to the surface of the sealing body, and the distance between the light-transmitting surface of the member and the photoelectric conversion element is D, and the total reflection angle on the light-transmitting surface is D. When θ, the focus detection device is characterized in that the light receiving portion of the photoelectric conversion element is located in a region within a circle drawn with a radius of 2D · tan θ 1 on the surface of the photoelectric conversion element. .
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61166895A JPH0719893B2 (en) | 1986-07-16 | 1986-07-16 | Optical semiconductor device |
| EP87306304A EP0253664B1 (en) | 1986-07-16 | 1987-07-16 | Semiconductor photo-sensor and method for manufacturing the same |
| DE8787306304T DE3782201T2 (en) | 1986-07-16 | 1987-07-16 | SEMICONDUCTOR PHOTOSENSOR AND METHOD FOR THE PRODUCTION THEREOF. |
| US08/472,110 US5583076A (en) | 1986-07-16 | 1995-06-07 | Method for manufacturing a semiconductor photo-sensor |
| US09/013,031 US5912504A (en) | 1986-07-16 | 1998-01-26 | Semiconductor photo-sensor and method for manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61166895A JPH0719893B2 (en) | 1986-07-16 | 1986-07-16 | Optical semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6321878A JPS6321878A (en) | 1988-01-29 |
| JPH0719893B2 true JPH0719893B2 (en) | 1995-03-06 |
Family
ID=15839615
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61166895A Expired - Fee Related JPH0719893B2 (en) | 1986-07-16 | 1986-07-16 | Optical semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0719893B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07109898B2 (en) * | 1988-10-06 | 1995-11-22 | 富士電機株式会社 | Transparent resin-sealed semiconductor device |
| JP3507251B2 (en) * | 1995-09-01 | 2004-03-15 | キヤノン株式会社 | Optical sensor IC package and method of assembling the same |
| EP2039708A4 (en) | 2006-07-07 | 2010-02-24 | Jsr Corp | Cyclic olefin addition copolymer, method for producing the same, and retardation film obtained from the copolymer |
| CN117624555A (en) | 2023-10-25 | 2024-03-01 | 杭州睿丰融创科技有限公司 | Optical material |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59123259A (en) * | 1982-12-28 | 1984-07-17 | Nec Corp | Solid-state image pickup device |
| JPS59228755A (en) * | 1983-06-09 | 1984-12-22 | Toshiba Corp | Solid state image sensor |
-
1986
- 1986-07-16 JP JP61166895A patent/JPH0719893B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6321878A (en) | 1988-01-29 |
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