JPH0730247B2 - Aromatic polyamic acid solution composition - Google Patents
Aromatic polyamic acid solution compositionInfo
- Publication number
- JPH0730247B2 JPH0730247B2 JP61240284A JP24028486A JPH0730247B2 JP H0730247 B2 JPH0730247 B2 JP H0730247B2 JP 61240284 A JP61240284 A JP 61240284A JP 24028486 A JP24028486 A JP 24028486A JP H0730247 B2 JPH0730247 B2 JP H0730247B2
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- JP
- Japan
- Prior art keywords
- polyamic acid
- aromatic
- particles
- acid solution
- colloidal silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Compositions Of Macromolecular Compounds (AREA)
Description
【発明の詳細な説明】 [発明の技術分野] 本発明は、芳香族ポリアミック酸溶液組成物に関するも
のである。更に詳しくは本発明は、微細で高度に分散さ
れた不活性無機物質粒子を含有する芳香族ポリアミック
酸溶液組成物に関するものである。TECHNICAL FIELD OF THE INVENTION The present invention relates to an aromatic polyamic acid solution composition. More specifically, the present invention relates to aromatic polyamic acid solution compositions containing fine, highly dispersed particles of an inert inorganic material.
[従来技術及びその問題点] 芳香族ポリアミック酸溶液組成物は、金属ドラムや金属
ベルト上に流延し、熱風乾燥炉等で一部の溶媒を蒸発除
去して自己支持性のあるフィルムにした後、剥離して周
囲をクリップ、ピンシート等で把持しながら高温の炉内
に導入してイミド化する等の方法でポリイミドフィルム
を成形するためのポリイミドフィルム製膜用溶液として
も用いられる。また、グラビアコータ、リバースロール
コータ、バーコータ等の塗布手段や他の方法を利用して
フィルム状基材や他の基材等にコーティングして耐熱性
コーティング皮膜を形成するための溶液組成物としても
用いられる。[Prior Art and its Problems] The aromatic polyamic acid solution composition is cast on a metal drum or a metal belt, and a part of the solvent is removed by evaporation in a hot-air drying oven to form a self-supporting film. After that, it is also used as a polyimide film forming solution for forming a polyimide film by a method of peeling and holding the periphery with a clip, a pin sheet or the like and introducing it into a high temperature furnace to imidize. Further, as a solution composition for forming a heat-resistant coating film by coating a film-shaped substrate or another substrate using a coating means such as a gravure coater, a reverse roll coater, or a bar coater or another method. Used.
ただし、これらのポリイミドフィルム及びポリイミドコ
ーティング皮膜は表面が非常に平滑となるため、滑り性
が悪く、成形工程等に於ける走行性、巻取性の不良、後
加工工程に於ける走行性、ハンドリング性の不良等の問
題がある。この理由から、ポリアミック酸溶液中に微細
な不活性無機物質粒子を含有させ、得られるフィルム及
び皮膜の表面に凹凸を付与し、表面の滑り性を向上させ
ることが行なわれる。この様な不活性無機物質粒子とし
ては二酸化チタン、二酸化ケイ素、酸化アルミニウム、
酸化マグネシウム、窒化ケイ素、炭化ケイ素、その他が
知られているが、これらの粒子はその殆んどが二次粒
子、三次粒子といった凝集体の状態で存在するため、分
散剤等を併用しながら、物理的に重合溶媒中に分散させ
微細粒子にして添加する方法がとられている。However, since the surface of these polyimide films and polyimide coating films is extremely smooth, slipperiness is poor, runnability in molding processes, poor winding properties, runnability in post-processing processes, handling, etc. There are problems such as poor sex. For this reason, fine inactive inorganic substance particles are contained in the polyamic acid solution to impart irregularities to the surface of the obtained film and film to improve the slipperiness of the surface. Such inert inorganic material particles include titanium dioxide, silicon dioxide, aluminum oxide,
Magnesium oxide, silicon nitride, silicon carbide, etc. are known, but since most of these particles exist in the state of aggregates such as secondary particles and tertiary particles, while using a dispersant, etc., A method is used in which the particles are physically dispersed in a polymerization solvent and fine particles are added.
しかしながら、これらの凝集体で存在する微細な不活性
無機物質粒子は高度な分散を施しても一次粒子にはなり
難く、また平均粒子径は小さくとも粒子径の分布が広
く、粗大な粒子が共存するためポリイミドフィルムやポ
リイミドコーティング皮膜の表面に賦与された凹凸が不
均一になり、さらに粗大な粒子がフィッシュアイ等の表
面欠陥の原因になる欠点があった。However, fine inert inorganic particles present in these aggregates are difficult to become primary particles even when subjected to a high degree of dispersion, and the average particle size is small, but the distribution of particle sizes is wide, and coarse particles coexist. Therefore, there is a defect that unevenness imparted to the surface of the polyimide film or the polyimide coating film becomes nonuniform, and coarse particles cause surface defects such as fish eyes.
また、特開昭60−127523号公報において提案されている
ピロメリット酸成分とジアミノジフェニルエーテルとの
重合反応により生成するポリアミック酸溶液から得られ
るポリイミドフィルムは、これにCo−Crなどの金属磁性
膜を蒸着して、8mm幅のビデオテープとして用いる場合
などのように特に過酷な条件で走行させた場合には、走
行耐久性や滑り特性において充分なものということはで
きない。Further, a polyimide film obtained from a polyamic acid solution produced by a polymerization reaction of a pyromellitic acid component and diaminodiphenyl ether, which is proposed in JP-A-60-127523, has a metal magnetic film such as Co-Cr. When it is vapor-deposited and used as a video tape having a width of 8 mm, when it is run under particularly severe conditions, it cannot be said that it has sufficient running durability and sliding characteristics.
[発明の目的] 本発明の目的は、ほぼ一次粒子に単一分散した不活性無
機物質粒子を含有する芳香族ポリアミック酸溶液組成物
を提供することにある。[Object of the Invention] An object of the present invention is to provide an aromatic polyamic acid solution composition containing particles of an inert inorganic substance monodispersed in almost primary particles.
また、本発明は、耐久性が特に優れ表面に付与される凹
凸が均一で、かつ表面欠陥の少ない芳香族ポリイミドフ
ィルムや芳香族ポリイミドコーティング皮膜の製造に適
した不活性無機物質粒子含有芳香族ポリアミック酸溶液
組成物を提供することを目的とする。Further, the present invention is particularly excellent in durability, unevenness imparted to the surface is uniform, and has a small number of surface defects. Inert inorganic substance particle-containing aromatic polyamic acid suitable for producing an aromatic polyimide film or an aromatic polyimide coating film. It is intended to provide an acid solution composition.
[発明の構成] 本発明は、50モル%以上(好ましくは85モル%以下)の
3,3′,4,4′−ビフェニルテトラカルボン酸成分と50モ
ル%以下(好ましくは15モル%以上)のピロメリット酸
成分とからなる芳香族テトラカルボン酸成分とモル比で
相対的に多い量(好ましくは60〜95モル%)のp−フェ
ニレンジアミンと相対的に少ない量(好ましくは40〜5
モル%)のジアミノジフェニルエーテルとからなる芳香
族ジアミン成分との重合反応生成物である芳香族ポリア
ミック酸が有機極性アミド系溶剤中に溶解してなる芳香
族ポリアミック酸溶液であって、平均粒子径が40乃至10
00Åの範囲内にあり、かつ平均粒子径の1.5倍以上の粒
子の数が全粒子数の5%以下であるコロイダルシリカを
0.001〜10.0重量%含有することを特徴とする芳香族ポ
リアミック酸溶液組成物からなるものである。[Constitution of the invention] The present invention comprises 50 mol% or more (preferably 85 mol% or less).
Aromatic tetracarboxylic acid component consisting of 3,3 ', 4,4'-biphenyltetracarboxylic acid component and 50 mol% or less (preferably 15 mol% or more) of pyromellitic acid component, and relatively large in molar ratio In an amount (preferably 60 to 95 mol%) of p-phenylenediamine and a relatively small amount (preferably 40 to 5).
An aromatic polyamic acid solution obtained by dissolving an aromatic polyamic acid, which is a polymerization reaction product of an aromatic diamine component composed of (mol%) diaminodiphenyl ether, in an organic polar amide solvent and has an average particle size of 40 to 10
Colloidal silica in the range of 00Å and 5% or more of the average particle size of 5% or less of the total number of particles
The aromatic polyamic acid solution composition is characterized by containing 0.001 to 10.0% by weight.
上記の芳香族ポリアミック酸溶液組成物は、たとえば、
平均粒子径が40乃至1000Åの範囲内にあり、かつ平均粒
子径の1.5倍以上の粒子の数が全粒子数の5%以下であ
るコロイダルシリカを含むコロイダルシリカ水分散ゾル
もしくはコロイダルシリカアルコール分散ゾルの水もし
くはアルコールを有機極性アミド系溶剤で置換して得た
コロイダルシリカアミド溶剤分散ゾルを、上記の特定の
化合物の組合せからなる芳香族テトラカルボン酸成分と
上記の特定の化合物の組合せからなる芳香族ジアミン成
分とを含む有機極性アミド系溶剤と混合し、得られた混
合物中の芳香族テトラカルボン酸成分と芳香族ジアミン
成分を次いで反応させて芳香族ポリアミック酸とする方
法を利用して容易に得ることができる。The above aromatic polyamic acid solution composition, for example,
Colloidal silica water-dispersed sol or colloidal silica alcohol-dispersed sol containing colloidal silica having an average particle size in the range of 40 to 1000Å and 1.5 times the average particle size or more and 5% or less of the total number of particles. The colloidal silica amide solvent dispersion sol obtained by substituting water or alcohol with an organic polar amide solvent, is an aromatic tetracarboxylic acid component consisting of a combination of the above-mentioned specific compounds and an aroma consisting of a combination of the above-mentioned specific compounds. A mixture with an organic polar amide-based solvent containing a group diamine component, and then using the method of reacting the aromatic tetracarboxylic acid component and the aromatic diamine component in the resulting mixture to produce an aromatic polyamic acid easily Obtainable.
あるいは、上記のコロイダルシリカアミド溶剤分散ゾル
を、上記の特定の化合物の組合せからなる芳香族テトラ
カルボン酸成分と上記の特定の化合物の組合せからなる
芳香族ジアミン成分との重合反応生成物である芳香族ポ
リアミック酸が有機極性アミド系溶剤中に溶解してなる
芳香族ポリアミック酸溶液に混合する方法によっても容
易に得ることができる。Alternatively, the colloidal silica amide solvent dispersion sol described above, an aromatic which is a polymerization reaction product of an aromatic dicarboxylic acid component consisting of a combination of the above-mentioned specific compounds and an aromatic tetracarboxylic acid component consisting of a combination of the above-mentioned specific compounds. It can also be easily obtained by a method of mixing an aromatic polyamic acid solution obtained by dissolving a group polyamic acid in an organic polar amide solvent.
本発明で使用する有機極性アミド系溶剤の例としては、
N−メチル−2−ピロリドン、ジメチルアセトアミド、
ジメチルホルムアミドを挙げることができる。Examples of the organic polar amide solvent used in the present invention include:
N-methyl-2-pyrrolidone, dimethylacetamide,
Dimethylformamide can be mentioned.
本発明の芳香族ポリアミック酸溶液組成物は、微細で、
かつ粗大粒子の含有率が少ないコロイダルシリカを含有
することを特徴とする。The aromatic polyamic acid solution composition of the present invention is fine,
In addition, it is characterized by containing colloidal silica having a low content of coarse particles.
本発明の芳香族ポリアミック酸溶液組成物に含まれるコ
ロイダルシリカは、ほぼ一次粒子に分散されている平均
粒子径が40〜1000Åの範囲(好ましくは、100〜800Åの
範囲)の粒子である。The colloidal silica contained in the aromatic polyamic acid solution composition of the present invention is particles having an average particle size of 40 to 1000 Å (preferably 100 to 800 Å) dispersed in almost all primary particles.
一般に使用される精製四塩化ケイ素の燃焼によって製造
される超微粒子状無水シリカ、または同様にして気相法
で製造される超微粒子状の二酸化チタン、酸化アルミニ
ウムや他の無機微粒子であって、乾燥された固体で存在
する粒子は通常の添加条件で芳香族ポリアミック酸溶液
に添加する方法を利用する限り、本発明の目的を達成す
るためには適当ではない。Ultrafine particulate anhydrous silica produced by combustion of commonly used purified silicon tetrachloride, or ultrafine particulate titanium dioxide, aluminum oxide or other inorganic fine particles similarly produced by a gas phase method, and dried. The particles present as solids are not suitable for achieving the object of the present invention, as long as the method of adding to the aromatic polyamic acid solution under normal addition conditions is used.
すなわち、これらの乾燥粒子は通常、凝集状態にあり芳
香族ポリアミック酸溶液あるいは芳香族ポリアミック酸
の原料化合物溶液に加える前にホモミキサー、サンドミ
ル、超音波ホモジナイザーなどの通常の分散装置で解砕
分散しても、その凝集が容易に解けず、従って芳香族ポ
リアミック酸溶液には一次粒子が数個から十数個凝集し
た粒子径分布の広い二次粒子、三次粒子といった塊状の
凝集粒子が多数導入される結果となる。That is, these dry particles are usually in an agglomerated state and crushed and dispersed by a usual dispersing device such as a homomixer, a sand mill, an ultrasonic homogenizer before being added to the aromatic polyamic acid solution or the raw material compound solution of the aromatic polyamic acid. However, the agglomeration cannot be easily solved, and therefore a large number of aggregated agglomerated particles such as secondary particles and tertiary particles having a wide particle size distribution in which primary particles are agglomerated from several to ten or more are introduced into the aromatic polyamic acid solution. Result.
また、粒子の粒子径の分布を狭くするために遠心分離、
濾過等の方法で分級した場合でも、一定以上の大きさの
粒子をとり除くオーバーカットはできても、本発明で規
定された鋭い粒子径分布を持つ粒子は得られにくい。In addition, centrifugation to narrow the particle size distribution of the particles,
Even when the particles are classified by a method such as filtration, it is possible to obtain particles having a sharp particle size distribution defined in the present invention, even if an overcut for removing particles having a certain size or more can be performed.
従って、本発明において使用する平均粒子径が40〜1000
Åの不活性無機物質粒子はコロイダルシリカが好まし
い。Therefore, the average particle size used in the present invention is 40 to 1000.
Colloidal silica is preferable for the particles of the inert inorganic substance of Å.
すなわち、コロイダルシリカは水分散系あるいはアルコ
ール分散系(水性アルコール分散系も含む)中で狭い粒
子径分布を有し、前記の本発明の製造方法を利用すれ
ば、有機極性アミド系溶剤中及び芳香族ポリアミック酸
溶液中でも、その粒子径分布は余り変化しないため、本
発明で規定された粒子径分布の粒子を得るために、コロ
イダルシリカは特に有利に使用することができる。That is, colloidal silica has a narrow particle size distribution in an aqueous dispersion system or an alcohol dispersion system (including an aqueous alcohol dispersion system). Since the particle size distribution does not change much even in the group A polyamic acid solution, colloidal silica can be used particularly advantageously in order to obtain particles having the particle size distribution defined in the present invention.
本発明で使用するコロイダルシリカは、その平均粒子径
が40〜1000Åの範囲にあるものであり、特に平均粒子径
が100〜800Åの範囲にあるものが好ましい。The colloidal silica used in the present invention has an average particle size in the range of 40 to 1000Å, and particularly preferably an average particle size in the range of 100 to 800Å.
コロイダルシリカは通常、水分散ゾル、アルコール分散
ゾル(例、メタノールなどの低級アルコールに分散され
た状態のゾル)などとして入手できる。その具体例とし
ては、スノーテックス[日産化学(株)製]あるいはカ
タロイド[触媒化成工業(株)製]として販売されてい
る各種グレード品を挙げることができる。Colloidal silica is generally available as a water-dispersed sol, an alcohol-dispersed sol (eg, a sol dispersed in a lower alcohol such as methanol). Specific examples thereof include various grades sold as Snowtex [manufactured by Nissan Chemical Co., Ltd.] or Cataloid [manufactured by Catalysts & Chemicals Co., Ltd.].
これらの水分散コロイダルシリカもしくはアルコール分
散コロイダルシリカは、有機極性アミド系溶剤で希釈
し、必要に応じて減圧蒸留などの方法で脱水もしくは脱
アルコールするか、または水分散ゾルもしくはアルコー
ル分散ゾルの水もしくはアルコールを抜きながら有機極
性アミド系溶剤を加えて、水もしくはアルコールを有機
極性アミド系溶剤で置換して使用する。These water-dispersed colloidal silica or alcohol-dispersed colloidal silica is diluted with an organic polar amide solvent and dehydrated or dealcoholized by a method such as vacuum distillation, if necessary, or water-dispersed sol or alcohol-dispersed sol water or An organic polar amide solvent is added while removing alcohol, and water or alcohol is replaced with an organic polar amide solvent before use.
また、これらは必要に応じて機械的分散あるいは超音波
分散を施し、また濾過、遠心分離等により分級して使用
する。If necessary, they are mechanically dispersed or ultrasonically dispersed, and classified by filtration, centrifugation or the like before use.
本発明の芳香族ポリアミック酸溶液組成物は、コロイダ
ルシリカを0.001〜10.0重量%、好ましくは0.01〜6.0重
量%含有するものである。コロイダルシリカが0.001重
量%より少ないと、この組成物を用いて成形した芳香族
ポリイミドフィルムあるいは芳香族ポリイミドコーティ
ング皮膜に充分な滑り性が付与されない。コロイダルシ
リカが10.0重量%より多いと、コロイダルシリカが重な
りやすく、形成される凹凸が不均一になり、またフィル
ム及びコーティング皮膜の機械的性質を損ねるとの欠点
が発生する。The aromatic polyamic acid solution composition of the present invention contains 0.001 to 10.0% by weight, preferably 0.01 to 6.0% by weight, of colloidal silica. When the content of colloidal silica is less than 0.001% by weight, sufficient lubricity cannot be imparted to the aromatic polyimide film or aromatic polyimide coating film formed by using this composition. When the content of colloidal silica is more than 10.0% by weight, colloidal silica is likely to overlap with each other, unevenness to be formed becomes uneven, and mechanical properties of the film and the coating film are impaired.
本発明の芳香族ポリアミック酸溶液組成物の製造方法の
具体例を、水分散コロイダルシリカを用いる場合を例に
とって次に説明する。A specific example of the method for producing the aromatic polyamic acid solution composition of the present invention will be described below by taking the case of using water-dispersed colloidal silica as an example.
すなわち、まず芳香族ポリアミック酸の重合用溶剤であ
るN−メチル−2−ピロリドン、ジメチルアセトアミ
ド、ジメチルホルムアミドなどの有機極性アミド系溶剤
に水分散コロイダルシリカを添加し、分散媒を実質的に
アミド系溶剤にする。この分散液のシリカ濃度は20重量
%以下であることが好ましい。さらに、必要に応じて、
この混合液中の水を減圧蒸留などの方法を用いて脱水す
る。有機極性アミド系溶剤中の水分率は芳香族ポリアミ
ック酸溶液組成物の用途上要求される溶液粘度、ポリア
ミック酸濃度、粒子の含有量等により選択されるが、通
常は5容量%以下である。また、別の方法として水分散
コロイダルシリカの水を減圧蒸留法などで抜きながら、
これに有機極性アミド系溶剤を加える方法でもよい。That is, first, water-dispersed colloidal silica is added to an organic polar amide-based solvent such as N-methyl-2-pyrrolidone, dimethylacetamide, or dimethylformamide, which is a solvent for polymerization of aromatic polyamic acid, and the dispersion medium is substantially amide-based. Use as a solvent. The silica concentration of this dispersion is preferably 20% by weight or less. Furthermore, if necessary,
The water in this mixed solution is dehydrated using a method such as vacuum distillation. The water content in the organic polar amide-based solvent is selected depending on the solution viscosity, the polyamic acid concentration, the content of particles, etc. required for the application of the aromatic polyamic acid solution composition, but it is usually 5% by volume or less. As another method, while removing water of the water-dispersed colloidal silica by a vacuum distillation method or the like,
A method in which an organic polar amide solvent is added to this may be used.
有機極性アミド系溶剤にコロイダルシリカ等が分散した
液は、必要に応じてホモミキサー、超音波ホモジナイザ
ー等で分散し、また必要に応じて濾過、遠心分離して使
用する。A liquid in which colloidal silica or the like is dispersed in an organic polar amide solvent is dispersed by a homomixer, an ultrasonic homogenizer or the like, if necessary, and filtered and centrifuged for use.
上記の様にして得られたコロイダルシリカ分散液に直
接、芳香族テトラカルボン酸成分、芳香族ジアミン成分
などの原料モノマーを添加して重合し、芳香族ポリアミ
ック酸溶液を得ても良い。あるいは芳香族ジアミン成分
と芳香族テトラカルボン酸成分のモル比を等量にせずに
重合して低粘度の溶液を得て、これに分散液を加えて、
均一に撹拌した後、不足する成分を加えてさらに重合し
て芳香族ポリアミック酸溶液を得ても良い。さらにある
いは、あらかじめ重合して製造した芳香族ポリアミック
酸にコロイダルシリカ分散液を加えて撹拌して製造して
も良い。A raw material monomer such as an aromatic tetracarboxylic acid component or an aromatic diamine component may be directly added to the colloidal silica dispersion liquid obtained as described above and polymerized to obtain an aromatic polyamic acid solution. Alternatively, a low-viscosity solution is obtained by polymerizing the aromatic diamine component and the aromatic tetracarboxylic acid component in a molar ratio of not equal to each other, and the dispersion liquid is added to the solution.
After uniformly stirring, the components lacking may be added and further polymerized to obtain an aromatic polyamic acid solution. Alternatively, it may be produced by adding a colloidal silica dispersion to an aromatic polyamic acid produced by polymerization in advance and stirring.
この様に、コロイダルシリカ分散液は芳香族ポリアミッ
ク酸溶液の製造工程の任意の段階で添加することができ
る。Thus, the colloidal silica dispersion can be added at any stage of the process for producing the aromatic polyamic acid solution.
いずれにしても、コロイダルシリカ分散液を添加したの
ち充分に撹拌混合を行ない、芳香族ポリアミック酸溶液
中にコロイダルシリカがほぼ一次粒子からなり、シャー
プな粒子径分布を持ち、高度に分散された芳香族ポリア
ミック酸溶液組成物を得る。In any case, after adding the colloidal silica dispersion and thoroughly stirring and mixing, the colloidal silica is composed of almost primary particles in the aromatic polyamic acid solution, has a sharp particle size distribution, and has a highly dispersed aroma. A group polyamic acid solution composition is obtained.
本発明におけるコロイダルシリカの粒子径は次の方法を
用いて測定することができる。すなわち、コロイダルシ
リカを含有する芳香族ポリアミック酸組成物を、粒子が
熱対流等により移動しないようにすばやく乾燥製膜し、
次にそのフィルムの表面を走査型電子顕微鏡を用いて2
万倍の観察倍率で五視野撮影して、表面に突出した粒子
の径を計測し、その個数分布を求め、この分布曲線か
ら、平均粒子径、およびその平均粒子径の1.5倍以上の
突起の割合、最大粒子径を求めることができる。The particle size of the colloidal silica in the present invention can be measured by the following method. That is, the aromatic polyamic acid composition containing colloidal silica, quickly dry film formation so that the particles do not move due to thermal convection,
Next, the surface of the film was examined using a scanning electron microscope.
Five fields of view were taken at an observation magnification of 10,000 times, the diameter of the particles protruding on the surface was measured, and the number distribution was obtained.From this distribution curve, the average particle diameter and the projections of 1.5 times or more the average particle diameter The ratio and maximum particle size can be determined.
[発明の効果] 本発明の芳香族ポリアミック酸溶液組成物は、平均粒子
径40〜1000Åの、粗大粒子を多量含まず、かつ粒子径分
布がシャープで、均一微細なほぼ一次粒子(単一粒子)
状態の粒子を多数含有した特定の組合せの芳香族テトラ
カルボン酸成分と特定の組合せの芳香族ジアミン成分と
から得られる芳香族ポリアミック酸溶液である。EFFECTS OF THE INVENTION The aromatic polyamic acid solution composition of the present invention has an average particle size of 40 to 1000Å, does not contain a large amount of coarse particles, has a sharp particle size distribution, and is a uniform fine primary particle (single particle). )
It is an aromatic polyamic acid solution obtained from a specific combination of aromatic tetracarboxylic acid components containing a large number of particles in a state and an aromatic diamine component of a specific combination.
本発明の芳香族ポリアミック溶液組成物を用いて成形し
た芳香族ポリイミドフィルム及び芳香族ポリイミドコー
ティング皮膜の表面に形成された突起は微細かつ均一
で、粗大粒子に起因する粗大な突起がない。従って、良
好な表面状態を有し、しかも滑り性が良好な芳香族ポリ
イミドフィルム及び芳香族ポリイミドコーティング皮膜
を得ることができる。The protrusions formed on the surfaces of the aromatic polyimide film and the aromatic polyimide coating film formed by using the aromatic polyamic solution composition of the present invention are fine and uniform, and there are no coarse protrusions due to coarse particles. Therefore, it is possible to obtain an aromatic polyimide film and an aromatic polyimide coating film having a good surface condition and having good slipperiness.
さらに、フィルムおよびコーティング皮膜の製造、二次
加工工程における走行性不良、巻取り性不良、ハンドリ
ング性不良が解消できる。Further, it is possible to eliminate poor running properties, poor winding properties, and poor handling properties in the production of films and coating films and secondary processing steps.
また、高度の走行耐久性、そして微細かつ均一な表面突
起と滑り性の要求される磁気記録媒体用ベースフィルム
(特に、Co−Crなどの金属磁性膜を蒸着した、8mm幅の
ビデオテープとして用いるために用いるベースフィル
ム)などのフィルム及びコーティング皮膜の製造に有効
に用いることができる。In addition, a base film for magnetic recording media that requires high running durability, fine and uniform surface protrusions, and slipperiness (especially used as an 8 mm wide video tape with a metal magnetic film such as Co-Cr vapor deposited). It can be effectively used for the production of films such as base films used for this purpose) and coating films.
次に、本発明の実施例と比較例を示す。Next, examples and comparative examples of the present invention will be shown.
[実施例1] ジメチルアセトアミド4重量部に、ホモミキサーを用い
8000rpmで撹拌しながら、平均粒子径150Å、濃度20重量
%の水分散コロイダルシリカ1重量部を徐々に加え、ジ
メチルアセトアミドに分散したコロイダルシリカを得
た。この分散液の水分率は16.1容量%であった。Example 1 A homomixer was used with 4 parts by weight of dimethylacetamide.
While stirring at 8000 rpm, 1 part by weight of water-dispersed colloidal silica having an average particle size of 150Å and a concentration of 20% by weight was gradually added to obtain colloidal silica dispersed in dimethylacetamide. The water content of this dispersion was 16.1% by volume.
次に、得られた分散液を63℃、25mmHgで減圧蒸留した
後、出力600Wの超音波ホモジナイザーで30分間分散処理
して、濃度6.8重量%、水分率1.2容量%のジメチルアセ
トアミド分散コロイダルシリカを得た。Next, the obtained dispersion liquid was distilled under reduced pressure at 63 ° C. and 25 mmHg, and then dispersed for 30 minutes with an ultrasonic homogenizer having an output of 600 W to obtain dimethylacetamide-dispersed colloidal silica having a concentration of 6.8% by weight and a water content of 1.2% by volume. Obtained.
別に、3,3′,4,4′−ビフェニルテトラカルボン酸二無
水物25モル%、ピロメリット酸二無水物20モル%、ジア
ミノジフェニルエーテル15モル%、p−フェニレンジア
ミン35モル%をジメチルアセトアミドに溶解し、50℃で
5時間撹拌して重合を行ない粘度8ポイズのポリアミッ
ク酸溶液を得た。Separately, 25 mol% of 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 20 mol% of pyromellitic dianhydride, 15 mol% of diaminodiphenyl ether, and 35 mol% of p-phenylenediamine were converted to dimethylacetamide. After dissolution, the mixture was stirred at 50 ° C. for 5 hours to carry out polymerization to obtain a polyamic acid solution having a viscosity of 8 poise.
このポリアミック酸溶液に、先に調製したジメチルアセ
トアミド分散コロイダルシリカを、重合完了時のポリア
ミック酸の重量に対して1重量%添加し、1時間撹拌混
合して均一に分散させた。さらにこの溶液に5モル%の
ピロメリット酸二無水物を加え、25℃で2時間重合し
て、コロイダルシリカが均一に分散した濃度18重量%、
粘度が960ポイズのコロイダルシリカ含有芳香族ポリア
ミック酸溶液を得た。The dimethylacetamide-dispersed colloidal silica prepared above was added to this polyamic acid solution in an amount of 1% by weight based on the weight of the polyamic acid at the time of completion of polymerization, and the mixture was stirred and mixed for 1 hour to be uniformly dispersed. Furthermore, 5 mol% of pyromellitic dianhydride was added to this solution and polymerized at 25 ° C. for 2 hours to give a colloidal silica uniformly dispersed concentration of 18% by weight,
An aromatic polyamic acid solution containing colloidal silica having a viscosity of 960 poise was obtained.
上記のコロイダルシリカ芳香族ポリアミック酸溶液をガ
ラス板上に約50μmの厚さで展開し、熱風炉を用いて15
0℃で7分間乾燥して、自己支持性のあるフィルムと
し、これを剥離した。The above colloidal silica aromatic polyamic acid solution was spread on a glass plate to a thickness of about 50 μm, and heated using a hot air oven to
It was dried at 0 ° C. for 7 minutes to obtain a self-supporting film, which was peeled off.
このフィルムを金属枠で把持して、200℃〜380℃の熱風
を供給して乾燥、イミド化し厚み10μmの芳香族ポリイ
ミドフィルムを得た。The film was held by a metal frame, and hot air at 200 ° C to 380 ° C was supplied to dry and imidize to obtain an aromatic polyimide film having a thickness of 10 µm.
このフィルム上の粒子の状態を測定した結果を第1表に
示す。The results of measuring the state of the particles on this film are shown in Table 1.
[実施例2] 平均粒子径が450Åの水分散コロイダルシリカ(濃度20
重量%)を用い、そのコロイダルシリカをポリアミック
酸の重量に対して、シリカ換算で1.8重量%添加した以
外は実施例1と同様にしてコロイダルシリカ含有芳香族
ポリアミック酸溶液を製造した。Example 2 Water-dispersed colloidal silica having an average particle size of 450Å (concentration: 20)
%), And the colloidal silica-containing aromatic polyamic acid solution was produced in the same manner as in Example 1 except that 1.8% by weight of the colloidal silica was added in terms of silica based on the weight of the polyamic acid.
次に、上記のコロイダルシリカ含有芳香族ポリアミック
酸溶液を用いて実施例1と同様にして、厚みが10μmの
芳香族ポリイミドフィルムを得た。Next, an aromatic polyimide film having a thickness of 10 μm was obtained in the same manner as in Example 1 using the above colloidal silica-containing aromatic polyamic acid solution.
得られた芳香族ポリイミドフィルム上の粒子の状態を測
定した結果を第1表に示す。The results of measuring the state of particles on the obtained aromatic polyimide film are shown in Table 1.
[比較例1] 気相法で製造された一次粒子径が300Åの極微細二酸化
チタンをジメチルアセトアミド中に4重量%加え、ホモ
ミキサーを用い8000rpmで15分間分散した後、この分散
液を1μm以上の粒子を100%カットする複層構造型フ
ィルターで濾過して分級した。[Comparative Example 1] 4% by weight of ultrafine titanium dioxide having a primary particle size of 300Å produced by a gas phase method was added to dimethylacetamide and dispersed using a homomixer at 8000 rpm for 15 minutes, and then this dispersion was 1 μm or more. The particles were classified by filtering with a multilayer filter that cuts 100% of the particles.
この二酸化チタン分散液をポリアミック酸の重量に対し
て二酸化チタン換算で1重量%添加した以外は実施例1
と同様にして、二酸化チタン含有芳香族ポリアミック酸
溶液を得た。Example 1 except that this titanium dioxide dispersion was added in an amount of 1% by weight in terms of titanium dioxide based on the weight of polyamic acid.
A titanium dioxide-containing aromatic polyamic acid solution was obtained in the same manner as in.
次に上記の二酸化チタン含有芳香族ポリアミック酸溶液
を用いて、実施例1と同様にして、厚み10μmの芳香族
ポリイミドフィルムを得た。Next, using the above titanium dioxide-containing aromatic polyamic acid solution, an aromatic polyimide film having a thickness of 10 μm was obtained in the same manner as in Example 1.
得られた芳香族ポリイミドフィルム上の粒子の状態を測
定した結果を第1表に示す。The results of measuring the state of particles on the obtained aromatic polyimide film are shown in Table 1.
[比較例2] 気相法で製造された一次粒子径が70Åの極微細二酸化ケ
イ素をジメチルアセトアミド中に2重量%加え、ホモミ
キサーを用いて8000rpmで15分間分散した後、さらに出
力600Wの超音波ホモジナイザーを用いて6時間分散し
た。この分散液を1μm以上の粒子を100%カットする
複層構造型フィルターで濾過して分級した。[Comparative Example 2] 2% by weight of ultrafine silicon dioxide having a primary particle size of 70Å produced by a gas phase method was added to dimethylacetamide and dispersed using a homomixer at 8000 rpm for 15 minutes, and then output of 600 W or more. It was dispersed for 6 hours using a sonic homogenizer. This dispersion was classified by filtering with a multi-layer structure type filter that cuts 100% of particles of 1 μm or more.
この二酸化ケイ素分散液をポリアミック酸の重量に対し
て二酸化ケイ素換算で1重量%添加した以外は実施例1
と同様にして、二酸化ケイ素含有芳香族ポリアミック酸
溶液を得た。Example 1 except that this silicon dioxide dispersion was added in an amount of 1% by weight in terms of silicon dioxide based on the weight of polyamic acid.
A silicon dioxide-containing aromatic polyamic acid solution was obtained in the same manner as in.
次に上記の二酸化ケイ素含有芳香族ポリアミック酸溶液
を用いて、実施例1と同様にして、厚み10μmの芳香族
ポリイミドフィルムを得た。Then, using the above-mentioned silicon dioxide-containing aromatic polyamic acid solution, an aromatic polyimide film having a thickness of 10 μm was obtained in the same manner as in Example 1.
このフィルムの表面の粒子の状態を測定した結果を第1
表に示す。The results of measuring the state of particles on the surface of this film are
Shown in the table.
[比較例3] 気相法で製造された一次粒子径が200Åの極微細酸化ア
ルミニウムをジメチルアセトアミド中に3重量%加え、
ホモミキサーを用いて8000rpmで15分間分散した。この
分散液を1μm以上の粒子を100%カットする複層構造
型フィルターで濾過して分級した。[Comparative Example 3] 3% by weight of ultrafine aluminum oxide having a primary particle size of 200Å produced by a vapor phase method was added to dimethylacetamide,
The mixture was dispersed at 8000 rpm for 15 minutes using a homomixer. This dispersion was classified by filtering with a multi-layer structure type filter that cuts 100% of particles of 1 μm or more.
この酸化アルミニウム分散液をポリアミック酸の重量に
対して酸化アルミニウム換算で1重量%添加した以外は
実施例1と同様にして、酸化アルミニウム含有芳香族ポ
リアミック酸溶液を得た。An aluminum oxide-containing aromatic polyamic acid solution was obtained in the same manner as in Example 1 except that this aluminum oxide dispersion was added in an amount of 1% by weight in terms of aluminum oxide with respect to the weight of polyamic acid.
次に上記の酸化アルミニウム含有芳香族ポリアミック酸
溶液を用いて、実施例1と同様にして、厚みが10μmの
芳香族ポリイミドフィルムを得た。Then, using the above-mentioned aluminum oxide-containing aromatic polyamic acid solution, an aromatic polyimide film having a thickness of 10 μm was obtained in the same manner as in Example 1.
このフィルムの表面の粒子の状態を測定した結果を第1
表に示す。The results of measuring the state of particles on the surface of this film are
Shown in the table.
[ポリアミック酸溶液中の粒子の粒子径測定] 上記の実施例および比較例で得られた不活性無機物質粒
子含有芳香族ポリアミック酸溶液中の、不活性無機物質
粒子の平均粒子径、および平均粒子径の1.5倍以上の粗
大粒子の割合を下記の方法により測定した。[Measurement of Particle Diameter of Particles in Polyamic Acid Solution] Average particle diameter of inert inorganic material particles and average particle in the inert inorganic material particle-containing aromatic polyamic acid solutions obtained in the above Examples and Comparative Examples. The ratio of coarse particles having a diameter of 1.5 times or more was measured by the following method.
上記の実施例および比較例で得られたフィルムの表面
を、走査型電子顕微鏡を用いて2万倍の観察倍率で五視
野撮影して、表面に突出した粒子の径を計測し、その個
数分布を求め、その分布曲線を得た。次に、その分布曲
線から、平均粒子径、粒子径の範囲、および平均粒子径
の1.5倍以上の突起の割合(粗大粒子率、これは平均粒
子径の1.5倍以上の粗大粒子の数の割合と実質的に一致
する)を求めた。The surface of each of the films obtained in the above Examples and Comparative Examples was photographed in 5 fields of view with a scanning electron microscope at an observation magnification of 20,000 times, the diameter of particles protruding on the surface was measured, and the number distribution thereof was measured. Was obtained and the distribution curve was obtained. Next, from the distribution curve, the average particle size, the range of the particle size, and the ratio of protrusions 1.5 times or more the average particle size (coarse particle ratio, which is the ratio of the number of coarse particles 1.5 times or more the average particle size Substantially match).
得られた結果を第1表に示す。The results obtained are shown in Table 1.
[フィルムの表面状態の評価] 上記の実施例および比較例で得られた芳香族ポリイミド
フィルムの表面を、走査型電子顕微鏡を用いて2万倍の
観察倍率で観察したところ、実施例1〜2で得られたフ
ィルムの表面には微小な凹凸が均一に分散しており、大
きな突起は殆ど見られなかったが、比較例1〜3で得ら
れたフィルムの表面には微小な凹凸と一緒に粗大粒子に
起因する巨大な突起が所々に存在しているのが観察され
た。 [Evaluation of Surface State of Film] The surfaces of the aromatic polyimide films obtained in the above Examples and Comparative Examples were observed with a scanning electron microscope at an observation magnification of 20,000, and Examples 1 and 2 were obtained. Fine irregularities are uniformly dispersed on the surface of the film obtained in 1., large protrusions were hardly seen, but with the fine irregularities on the surface of the films obtained in Comparative Examples 1 to 3. It was observed that there were some large projections caused by coarse particles.
[実施例3] ジメチルアセトアミド4重量部にホモミキサーを用い80
00rpmで攪拌しながら、平均粒子径150オングストロー
ム、濃度20重量%の水分散系コロイダルシリカ1重量部
を徐々に加え、ジメチルアセトアミドに分散したコロイ
ダルシリカを得た。この分散液は水分率を15.8容量%で
あった。次にこの分散液を15mmHg、50℃で減圧蒸留した
後、出力600Wの超音波ホモジナイザーで6時間分散処理
して、濃度6.3重量%、水分率0.78容量%のジメチルア
セトアミド分散コロイダルシリカを得た。Example 3 A homomixer was used to 4 parts by weight of dimethylacetamide.
While stirring at 00 rpm, 1 part by weight of an aqueous dispersion type colloidal silica having an average particle size of 150 Å and a concentration of 20% by weight was gradually added to obtain colloidal silica dispersed in dimethylacetamide. This dispersion had a water content of 15.8% by volume. Next, this dispersion was distilled under reduced pressure at 15 mmHg and 50 ° C. and then dispersed for 6 hours by an ultrasonic homogenizer having an output of 600 W to obtain dimethylacetamide-dispersed colloidal silica having a concentration of 6.3% by weight and a water content of 0.78% by volume.
3,3′,4,4′−ビフェニルテトラカルボン酸二無水物30
モル%、ピロメリット酸二無水物20モル%、ジアミノジ
フェニルエーテル15モル%、p−フェニレンジアミン35
モル%をジメチルアセトアミドに溶解し、25℃で5時間
攪拌して重合を行ない、濃度18重量%、粘度530ポイズ
のポリアミド溶液を得た。3,3 ', 4,4'-biphenyltetracarboxylic dianhydride 30
Mol%, pyromellitic dianhydride 20 mol%, diaminodiphenyl ether 15 mol%, p-phenylenediamine 35
Mol% was dissolved in dimethylacetamide and polymerized by stirring at 25 ° C. for 5 hours to obtain a polyamide solution having a concentration of 18% by weight and a viscosity of 530 poise.
このポリアミド酸溶液に先に調製したジメチルアセトア
ミド分散コロイダルシリカをポリアミド酸の重量に対し
てシリカ換算で1重量%添加し、充分に攪拌混合してコ
ロイダルシリカが均一に分散した製膜用ポリアミド酸溶
液を得た。To this polyamic acid solution, 1% by weight of the dimethylacetamide-dispersed colloidal silica prepared above was added in terms of silica based on the weight of the polyamic acid, and the mixture was sufficiently stirred and mixed to uniformly disperse the colloidal silica in the polyamic acid solution for film formation. Got
この溶液をTダイより回転しているエンドレス金属ベル
ト上に押し出して塗膜を形成した後、その表面に80〜13
0℃の熱風を供給して乾燥し、自己支持性のあるフィル
ムとし、これを連続的に剥離した。This solution is extruded from the T die onto the rotating endless metal belt to form a coating film, and then 80 to 13
A hot air of 0 ° C. was supplied to dry the film to form a self-supporting film, which was continuously peeled off.
このフイルムをピンテンターで把持して高温炉内を連続
的に移動させながらその表面に200〜450℃の熱風を供給
して乾燥・イミド化して、厚み12.5μmの芳香族ポリイ
ミドフィルムを得た。The film was gripped with a pin tenter and continuously moved in a high-temperature furnace to supply hot air at 200 to 450 ° C. to the surface for drying and imidization to obtain an aromatic polyimide film having a thickness of 12.5 μm.
[比較列4] 芳香族テトラカルボン酸成分として、ピロメリット酸二
無水物(PMDA)90モル%と3,3′,4,4′−ビフェニルテ
トラカルボン酸二無水物(BPDA)10モル%とを用い、芳
香族ジアミン成分として、ジアミノジフェニルエーテル
(DADE)80モル%とp−フェニレンジアミン(PPD)20
モル%とを用いた以外は実施例3と同様にして、コロイ
ダルシリカを充填して突起を形成した芳香族ポリイミド
フィルムを得た。[Comparative column 4] As aromatic tetracarboxylic acid components, pyromellitic dianhydride (PMDA) 90 mol% and 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA) 10 mol% As an aromatic diamine component, diaminodiphenyl ether (DADE) 80 mol% and p-phenylenediamine (PPD) 20
An aromatic polyimide film having protrusions formed by filling it with colloidal silica was obtained in the same manner as in Example 3 except that mol% was used.
[比較例5] 芳香族テトラカルボン酸成分としてピロメリット酸二無
水物(PMDA)100モル%を用い、芳香族ジアミン成分と
してジアミノジフェニルエーテル(DADE)100モル%を
用いた以外は実施例1と同様にして、コロイダルシリカ
を充填して突起を形成した芳香族ポリイミドフィルムを
得た。Comparative Example 5 Same as Example 1 except that 100 mol% of pyromellitic dianhydride (PMDA) was used as the aromatic tetracarboxylic acid component and 100 mol% of diaminodiphenyl ether (DADE) was used as the aromatic diamine component. Then, an aromatic polyimide film in which colloidal silica was filled and projections were formed was obtained.
[ポリイミドフィルムの特性評価] 実施例1〜3及び比較例4〜5で得られたポリイミドフ
ィルムについて機械的特性及び熱的特性の測定を行なっ
た。測定結果を第2表に示す。[Evaluation of Properties of Polyimide Film] Mechanical properties and thermal properties of the polyimide films obtained in Examples 1 to 3 and Comparative Examples 4 to 5 were measured. The measurement results are shown in Table 2.
第2表の評価項目の単位は以下の通りである。 The units of the evaluation items in Table 2 are as follows.
引張強度:kg/mm2 伸び率:% 弾性率:kg/mm2 二次転移温度:℃ 熱分解温度:℃ 熱膨張係数:cm/cm/℃ 上記の結果から、芳香族ジカルボン酸成分として多量の
ピロメリット酸二無水物と少量の3,3′,4,4′−ビフェ
ニルテトラカルボン酸二無水物の組合せを用い、芳香族
ジアミン成分として多量のジアミノジフェニルエーテル
と少量のp−フェニレンジアミンの組合せを用いた場合
には、引張強度が劣り、伸びやすくなり、弾性が劣り、
更に二次転移温度と熱分解温度が低くなり、一方では熱
膨張が大きくなることがわかる。Tensile strength: kg / mm 2 Elongation rate:% Elastic modulus: kg / mm 2 Second-order transition temperature: ℃ Thermal decomposition temperature: ℃ Thermal expansion coefficient: cm / cm / ℃ From the above results, a large amount of aromatic dicarboxylic acid component Of pyromellitic dianhydride and a small amount of 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride, and a combination of a large amount of diaminodiphenyl ether and a small amount of p-phenylenediamine as an aromatic diamine component. When using, the tensile strength is inferior, it is easy to stretch, the elasticity is inferior,
Further, it can be seen that the second-order transition temperature and the thermal decomposition temperature are lowered, while the thermal expansion is increased.
また、芳香族ジカルボン酸成分としてピロメリット酸二
無水物のみを用い、芳香族ジアミン成分としてジアミノ
ジフェニルエーテルのみを用いた場合には、引張強度が
劣り、伸びやすくなり、弾性が劣り、二次転移温度と熱
分解温度は余り変化がないが、熱膨張が大きくなること
がわかる。Further, when only pyromellitic dianhydride is used as the aromatic dicarboxylic acid component and only diaminodiphenyl ether is used as the aromatic diamine component, the tensile strength is poor, the stretch is easy, the elasticity is poor, and the second-order transition temperature is low. The thermal decomposition temperature does not change so much, but the thermal expansion increases.
[8ミリビデオテープ用支持体としてのポリイミドフィ
ルムの評価] 各例で得られた芳香族ポリイミドフィルムの表面に真空
蒸着により厚さ0.2μmのCo−Cr金属磁性薄膜を形成し
たのち、8ミリ幅に切断して8ミリビデオテープを製造
した。[Evaluation of Polyimide Film as Support for 8 mm Video Tape] After forming a 0.2 μm-thick Co-Cr metal magnetic thin film on the surface of the aromatic polyimide film obtained in each example by vacuum deposition, 8 mm width 8 mm video tape was manufactured by cutting.
このビデオテープについて、市販の8ミリビデオ再生装
置およびドロップアウトカウンターを用いて行なった滑
り、耐久性(走行耐久性)、出力(再生出力)およびDO
(ドロップアウト)についての評価試験の結果を第3表
に示す。About this video tape, sliding, durability (running durability), output (playback output) and DO performed using a commercially available 8 mm video playback device and a dropout counter
Table 3 shows the results of the evaluation test for (dropout).
試験結果は、市販の8ミリビデオテープ(ポリエチレン
テレフタレートフィルム基板を使用)を基準8ミリビデ
オテープとして、その基準8ミリビデオテープの評価値
を基準として下記のランクに基づいて表示した。The test results were displayed based on the following ranks using a commercially available 8 mm video tape (using a polyethylene terephthalate film substrate) as a reference 8 mm video tape and the evaluation value of the reference 8 mm video tape as a reference.
A:基準8ミリビデオテープより優れている B:基準8ミリビデオテープと同等 C:基準8ミリビデオテープより劣っている 上記の第3表の記載中、C*は、ポリイミドフィルムに
蒸着により金属薄膜を形成すると、その金属薄膜側を内
側とする反りが発生したことを意味する。また、比較例
4と5で製造したビデオテープはそれぞれ録画と再生を
繰り返すとテープに伸びが認められた。A: Superior to standard 8mm videotape B: Equivalent to standard 8mm videotape C: Inferior to standard 8mm videotape In the description of Table 3 above, C * means that when a metal thin film was formed on a polyimide film by vapor deposition, warpage occurred with the metal thin film side being the inside. In addition, the video tapes produced in Comparative Examples 4 and 5 were found to be elongated when recording and reproducing were repeated.
Claims (1)
テトラカルボン酸成分と50モル%以下のピロメリット酸
成分とからなる芳香族テトラカルボン酸成分とモル比で
相対的に多い量のp−フェニレンジアミンと相対的に少
ない量のジアミノジフェニルエーテルとからなる芳香族
ジアミン成分との重合反応生成物である芳香族ポリアミ
ック酸が有機極性アミド系溶剤中に溶解してなる芳香族
ポリアミック酸溶液であって、平均粒子径が40乃至1000
オングストロームの範囲内にあり、かつ平均粒子径の1.
5倍以上の粒子の数が全粒子数の5%以下であるコロイ
ダルシリカを0.001〜10.0重量%含有することを特徴と
する芳香族ポリアミック酸溶液組成物。1. A relative molar ratio of an aromatic tetracarboxylic acid component composed of 50 mol% or more of 3,3 ′, 4,4′-biphenyltetracarboxylic acid component and 50 mol% or less of pyromellitic acid component. Aromatic polyamic acid which is a polymerization reaction product of an aromatic diamine component composed of a relatively large amount of p-phenylenediamine and a relatively small amount of diaminodiphenyl ether dissolved in an organic polar amide solvent A polyamic acid solution having an average particle size of 40 to 1000
It is in the Angstrom range and has an average particle size of 1.
An aromatic polyamic acid solution composition comprising 0.001 to 10.0% by weight of colloidal silica in which the number of particles 5 times or more is 5% or less of the total number of particles.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61240284A JPH0730247B2 (en) | 1986-10-09 | 1986-10-09 | Aromatic polyamic acid solution composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61240284A JPH0730247B2 (en) | 1986-10-09 | 1986-10-09 | Aromatic polyamic acid solution composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6395264A JPS6395264A (en) | 1988-04-26 |
| JPH0730247B2 true JPH0730247B2 (en) | 1995-04-05 |
Family
ID=17057193
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61240284A Expired - Lifetime JPH0730247B2 (en) | 1986-10-09 | 1986-10-09 | Aromatic polyamic acid solution composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0730247B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101509539B1 (en) * | 2013-08-05 | 2015-04-06 | 연세대학교 산학협력단 | Polyamic acid precursor composition containing calcium compound, organic/inorganic composite using the same and preparation method thereof |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100241494B1 (en) * | 1996-12-24 | 2000-03-02 | 유현식 | Silicone-containing polyimide resin composition |
| US6441083B1 (en) * | 1999-06-11 | 2002-08-27 | Nippon Shokubai Co., Ltd. | Polyamidic acid-containing and fine particles-dispersed composition and production process therefor |
| JP2004217907A (en) * | 2002-12-25 | 2004-08-05 | Du Pont Toray Co Ltd | Polyimide film and manufacturing method thereof |
| US20090011223A1 (en) * | 2006-01-20 | 2009-01-08 | Hisayasu Kaneshiro | Polyimide Film and Method for Production Thereof |
| JP2008106140A (en) * | 2006-10-25 | 2008-05-08 | Du Pont Toray Co Ltd | Polyimide film and method for producing the same |
| JP2008106138A (en) * | 2006-10-25 | 2008-05-08 | Du Pont Toray Co Ltd | Polyimide film and method for producing the same |
| JP2008106139A (en) * | 2006-10-25 | 2008-05-08 | Du Pont Toray Co Ltd | Polyimide film and method for producing the same |
| JP4947297B2 (en) * | 2007-05-23 | 2012-06-06 | 東レ・デュポン株式会社 | Copper plate |
| JP2008297226A (en) * | 2007-05-30 | 2008-12-11 | Mitsubishi Gas Chem Co Inc | Method for producing pyromellitic dianhydride |
| KR101064816B1 (en) * | 2009-04-03 | 2011-09-14 | 주식회사 두산 | Polyamic Acid Solution, Polyimide Resin, and Flexible Metal Foil Laminate Using the Same |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60127523A (en) * | 1983-12-14 | 1985-07-08 | Toray Ind Inc | Base film for magnetic recording medium in high density |
| JP2615542B2 (en) * | 1985-04-23 | 1997-05-28 | 東レ株式会社 | Base film for high density recording media |
-
1986
- 1986-10-09 JP JP61240284A patent/JPH0730247B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101509539B1 (en) * | 2013-08-05 | 2015-04-06 | 연세대학교 산학협력단 | Polyamic acid precursor composition containing calcium compound, organic/inorganic composite using the same and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6395264A (en) | 1988-04-26 |
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