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JPH073454B2 - Semiconductor device testing equipment - Google Patents
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JPH073454B2 - Semiconductor device testing equipment - Google Patents

Semiconductor device testing equipment

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Publication number
JPH073454B2
JPH073454B2 JP63074297A JP7429788A JPH073454B2 JP H073454 B2 JPH073454 B2 JP H073454B2 JP 63074297 A JP63074297 A JP 63074297A JP 7429788 A JP7429788 A JP 7429788A JP H073454 B2 JPH073454 B2 JP H073454B2
Authority
JP
Japan
Prior art keywords
semiconductor device
energy
malfunction
air layer
air
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63074297A
Other languages
Japanese (ja)
Other versions
JPH01248070A (en
Inventor
清 松井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP63074297A priority Critical patent/JPH073454B2/en
Publication of JPH01248070A publication Critical patent/JPH01248070A/en
Publication of JPH073454B2 publication Critical patent/JPH073454B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Testing Of Individual Semiconductor Devices (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、半導体装置の試験装置の試験装置に係り、特
に、半導体装置に放射線を照射したときのソフトエラー
発生をする装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a testing device for a semiconductor device testing device, and more particularly to a device for generating a soft error when a semiconductor device is irradiated with radiation.

〔従来の技術〕[Conventional technology]

半導体装置の誤動作の1つにソフトエラーと呼ばれる現
象がある。この原因となる放射線はα線で、その発生源
は、半導体装置を構成しているSiチップ,Al配線,ガラ
ス保護膜材料及びこれ等をパッケージするためのプラス
チック,セラミックその他の材料中に微量に含まれてい
るU(ウラン),Th(トリウム)等の自然放射性物質で
ある。そして、U,Th等は自然崩壊によってα粒子(Heの
原子核)を放射し、これ等α粒子が半導体装置に入射す
ると、この飛程に沿って電子−正孔対が生成される。MO
Sダイナミックメモリでは、これ等の生成された電子が
メモリセルの空のポテンシャル井戸部に一定以上蓄積す
ると、ソフトエラーが発生する。又、高速バイポーラス
タチックメモリでは、生成された電子が雑音電流として
流れソフトエラーを発生させる。このようなソフトエラ
ーの問題は、半導体素子の高集積化,高速化に伴い増加
する傾向にある。
One of the malfunctions of a semiconductor device is a phenomenon called a soft error. The radiation that causes this is α rays, and its source is a minute amount in Si chips, Al wiring, glass protective film materials and the plastics, ceramics and other materials for packaging these which constitute the semiconductor device. Natural radioactive substances such as U (uranium) and Th (thorium) are included. Then, U, Th, and the like emit α particles (nuclei of He) by spontaneous decay, and when these α particles enter the semiconductor device, electron-hole pairs are generated along this range. MO
In the S dynamic memory, a soft error occurs when these generated electrons accumulate in the empty potential well portion of the memory cell for a certain amount or more. Further, in the high speed bipolar static memory, the generated electrons flow as a noise current to cause a soft error. The problem of such soft error tends to increase as the integration and speed of semiconductor devices increase.

そこで、半導体装置のα線によるソフトエラー評価を行
う必要がある。この評価を行う場合、パッケージ材から
自然に放射されるα粒子だけでは、α粒子の放射密度が
非常に小さいため試験に長時間を要する。従って、一般
にはα粒子放射密度の大きい自然放射性物質又は人工放
射性物質を用い加速評価試験を行う。
Therefore, it is necessary to evaluate the soft error of the semiconductor device by α rays. When this evaluation is performed, it takes a long time for the test because only the α particles naturally emitted from the packaging material have a very small radiation density. Therefore, generally, an accelerated evaluation test is performed using a natural radioactive material or an artificial radioactive material having a large α particle radiation density.

ソフトエラーの特性評価には、α線源から放射するα粒
子を被試験半導体装置に照射し、ソフトエラーが発生す
るまでの時間及び一定照射時間内におけるエラー発生回
数等を測定し、α線耐量を評価する。そして、試験方法
としては、1)量産品における性能チェック(全数検
査,抜取り検査等)及び市場故障率の予測等を行う場合
は、パッケージ材等から放射されるα線エネルギー分布
と相似な放射線を半導体装置に照射してα線耐量を測定
する加速寿命評価試験や、2)半導体装置の改良・開発
効果,製品間のレベル比較,特異ビット(欠陥ビット)
の検出,製造プロセス上の問題点等を評価する場合は、
α線耐量が照射α粒子エネルギー,入射角に依存するた
め、これ等パラメータについて詳細に特性評価を行う試
験がある。
The soft error characteristics are evaluated by irradiating the semiconductor device under test with α particles emitted from the α-ray source, measuring the time until a soft error occurs and the number of error occurrences within a fixed irradiation time, and measuring the α-ray tolerance. Evaluate. The test methods are as follows: 1) When performing performance checks (100% inspection, sampling inspection, etc.) and prediction of market failure rate in mass-produced products, the radiation similar to the α-ray energy distribution radiated from the packaging material is used. Accelerated life evaluation test for irradiating semiconductor device to measure α-ray tolerance, 2) Improvement and development effect of semiconductor device, level comparison between products, unique bit (defective bit)
When detecting the
Since the α-ray resistance depends on the irradiation α-particle energy and the incident angle, there is a test for detailed characterization of these parameters.

本出願人は、先に、特願昭61−121024号において、空気
中のα線源と被試験半導体装置との間の距離(α粒子が
空気中を飛ぶ距離:空気層厚)を変化させることによっ
てα線エネルギー減速量を制御し、前記半導体装置に照
射するα線エネルギーを変化させて各照射α粒子エネル
ギーごとに半導体装置のα線耐量を測定し、更に、空気
層厚を断続的又は連続的に変えながら半導体装置にα線
を照射し半導体装置に連続的で幅の広いエネルギー分布
をもつα線を照射することで加速寿命評価試験を行う試
験方法を提案している。
The applicant previously changed the distance between the α-ray source in air and the semiconductor device under test (distance in which α particles fly in air: air layer thickness) in Japanese Patent Application No. 61-121024. By controlling the α-ray energy deceleration amount by changing the α-ray energy irradiated to the semiconductor device to measure the α-ray resistance of the semiconductor device for each irradiation α-particle energy, further, intermittently the air layer thickness or It proposes a test method for performing accelerated life evaluation test by irradiating the semiconductor device with α-rays while continuously changing it and irradiating the semiconductor device with α-rays having a continuous and wide energy distribution.

〔発明が解決しようとする課題〕[Problems to be Solved by the Invention]

上記提案に係る従来技術は、以前に比べて正確な加速寿
命試験とエネルギー依存特性評価を行うことができる反
面、次の理由により試験に時間がかかるという問題点を
残している。
The conventional technique according to the above proposal can perform an accelerated life test and an energy-dependent characteristic evaluation more accurately than before, but has a problem that the test takes time due to the following reasons.

被試験半導体装置のα粒子エネルギー依存特性を評価す
る場合は、被試験半導体装置に照射するα粒子エネルギ
ーを変えるために、α粒子が飛ぶ空気層厚を制御してい
る。しかし、α粒子エネルギー依存特性は、第2図に示
すように、下方に湾曲する放物線状の特性曲線を示し、
しかも同一品種の半導体装置であっても、特性曲線9,1
0,11で示すように個々の半導体装置でそのα線耐量(MT
BF:Mean Time Between Failure)が大きく異なる。
即ち、MTBFが極小値を示すα粒子エネルギー値E0は半導
体装置毎に異なる。このエネルギー値E0が被試験半導体
装置のα線耐量を小さくしているエネルギー値である。
そこで、上記エネルギー値E0を求めるためには、半導体
装置に照射する測定エネルギー範囲を幅広くとる必要が
あり、その結果、測定エネルギー点数(試験回数)が多
くなり、α線耐量の測定に長時間を要している。
When evaluating the α-particle energy dependence characteristic of the semiconductor device under test, the air layer thickness over which the α-particles fly is controlled in order to change the α-particle energy with which the semiconductor device under test is irradiated. However, the α-particle energy-dependent characteristic shows a parabolic characteristic curve that curves downward as shown in FIG.
Moreover, even if the same type of semiconductor device is used, the characteristic curve
As shown by 0 and 11, the α-ray tolerance (MT
BF: Mean Time Between Failure) is very different.
That is, the α-particle energy value E 0 at which the MTBF exhibits a minimum value differs for each semiconductor device. This energy value E 0 is an energy value that reduces the α-ray resistance of the semiconductor device under test.
Therefore, in order to obtain the energy value E 0 , it is necessary to set a wide range of measurement energy to be applied to the semiconductor device. As a result, the number of measurement energy points (the number of tests) increases, and it takes a long time to measure the α-ray tolerance. Is needed.

本発明の目的は、上記した従来技術の問題点をなくし、
半導体装置のα線耐量を短時間で評価するための半導体
装置の試験装置を提供することにある。
The object of the present invention is to eliminate the above-mentioned problems of the prior art,
It is an object of the present invention to provide a semiconductor device testing apparatus for evaluating the α-ray resistance of a semiconductor device in a short time.

〔課題を解決するための手段〕[Means for Solving the Problems]

上記目的は、空気中に放射線源と被試験半導体装置を配
置すると共に、これら両者間の空気層厚を任意に可変設
定し、放射線エネルギーを空気中で減衰させて被試験半
導体装置に入射させ該半導体装置の誤動作を試験する半
導体装置の試験装置において、前記半導体装置の誤動作
が発生した時の放射線が通過した空気層厚を検出する手
段と、その時の入射放射線エネルギーを空気層厚にて換
算する手段とを設けることで、達成される。
The above-mentioned object is to arrange a radiation source and a semiconductor device under test in the air, to arbitrarily variably set an air layer thickness between the two, to attenuate the radiation energy in the air, and to make it enter the semiconductor device under test. In a semiconductor device testing apparatus for testing malfunction of a semiconductor device, means for detecting an air layer thickness through which radiation passes when a malfunction of the semiconductor device occurs, and incident radiation energy at that time are converted into an air layer thickness. It is achieved by providing means.

〔作用〕[Action]

α線エネルギー減衰手段として空気によるエネルギー減
衰特性を利用し、空気層厚を断続的または連続的に変化
させることで連続的且つ幅の広いエネルギー分布を有す
るα線を発生させることができる。ここで、α粒子のエ
ネルギーとその空気中の飛程距離との間には所定の関係
がある。従って、α粒子を飛ばす空気層厚を制御して連
続エネルギー分布のα線を発生させこれを被試験半導体
装置に照射し、誤動作が発生した時にα粒子が通過した
空気層厚を検出することによって、その空気層厚から被
試験半導体装置に入射した時のα粒子エネルギーを求め
ることができる。そして、得られた誤動作発生時のα粒
子エネルギー値と誤動作発生頻度の関係から、α線耐量
が極小値を示すα粒子エネルギー値E0(エネルギー依存
特性)を求めることができる。
By utilizing the energy attenuation characteristic of air as the α-ray energy attenuating means and changing the air layer thickness intermittently or continuously, α-rays having a continuous and wide energy distribution can be generated. Here, there is a predetermined relationship between the energy of α particles and their range in air. Therefore, by controlling the thickness of the air layer that blows the α particles to generate α rays with a continuous energy distribution, irradiating this to the semiconductor device under test, and detecting the thickness of the air layer through which the α particles pass when a malfunction occurs. From the thickness of the air layer, the α-particle energy when entering the semiconductor device under test can be determined. Then, the α-particle energy value E 0 (energy dependence characteristic) at which the α-ray resistance has a minimum value can be obtained from the obtained relationship between the α-particle energy value at the time of malfunction occurrence and the malfunction occurrence frequency.

以上述べたように、加速寿命評価試験時に誤動作発生時
のα粒子エネルギーを求めることによって、α粒子エネ
ルギー依存特性も同時に測定でき、測定時間の短縮を計
ることができる。
As described above, by obtaining the α-particle energy when a malfunction occurs during the accelerated life evaluation test, the α-particle energy dependence characteristic can be measured at the same time, and the measurement time can be shortened.

〔実施例〕〔Example〕

以下、本発明の一実施例を図面を参照して説明する。 An embodiment of the present invention will be described below with reference to the drawings.

第1図は本発明の一実施例に係る半導体装置の試験装置
の構成図である。第1図において、1は被試験半導体装
置、2は被試験半導体装置1から信号を取り出すための
ソケット、3はα粒子を放射するα線源、4はα線源3
の位置を検出する光電スイッチ、5はα線源3を上下に
移動させ所要時間保持するたのα線源移動制御装置、6
は被試験半導体装置1から読出した情報を正常データと
比較し誤動作したかどうかをチェックする誤動作チェッ
ク装置、7は誤動作発生時に誤動作チェック装置6から
信号を受けとり、α線源移動制御装置5からα線源3の
現在位置(l:空気層厚)を検出する手段、8は誤動作発
生時の空気層厚からα粒子エネルギー値に換算する入射
放射線エネルギー換算手段を備え誤動作発生頻度とα粒
子エネルギー値及びα線を照射してから誤動作が発生す
るまでの時間等を記録するテスタ手段、9は被試験半導
体装置1に対して外部から進入する光を遮へいするため
の暗箱である。
FIG. 1 is a block diagram of a semiconductor device testing apparatus according to an embodiment of the present invention. In FIG. 1, 1 is a semiconductor device under test, 2 is a socket for taking out a signal from the semiconductor device under test 1, 3 is an α-ray source that emits α particles, and 4 is an α-ray source 3.
Is a photoelectric switch for detecting the position of the α-ray source, and 5 is an α-ray source movement control device for moving the α-ray source 3 up and down and holding it for a required time, 6
Is a malfunction check device for comparing the information read from the semiconductor device under test 1 with normal data to check whether or not there is a malfunction, and 7 receives a signal from the malfunction check device 6 when a malfunction occurs, and outputs from the α ray source movement control device 5 α Means for detecting the current position of the radiation source 3 (l: air layer thickness), 8 is provided with incident radiation energy conversion means for converting the air layer thickness at the time of malfunction to α particle energy value, malfunction frequency and α particle energy value Also, a tester means for recording the time from the irradiation of α rays to the occurrence of a malfunction and the like, and 9 is a dark box for shielding the semiconductor device 1 under test from the light entering from the outside.

第3図は、α粒子エネルギーと空気中における飛程(α
粒子がエネルギーを失うまでに空気中を飛んだ距離)の
関係を示す特性グラフである。このグラフから分かるよ
うに、α粒子が空気中を飛ぶ距離(空気層厚)を制御す
ることで、被試験半導体装置に照射するα粒子エネルギ
ーを変化させることができる。
Figure 3 shows α particle energy and range in air (α
It is a characteristic graph which shows the relationship of the distance which the particle flew in the air before it lost energy. As can be seen from this graph, by controlling the distance (air layer thickness) that the α particles fly in the air, the α particle energy with which the semiconductor device under test is irradiated can be changed.

次に、上述した構成の試験装置の動作を説明する。Next, the operation of the test apparatus having the above-mentioned configuration will be described.

先ず、α線源移動制御装置5によりα線源3を光電スイ
ッチ4位置(基準位置)まで移動させる。そして、予め
定められたα線源3の移動量に従って移動距離(l:空気
層厚)及び保持時間をα線源移動制御装置5が制御す
る。本実施例では、α線源3の上下駆動にパルスモータ
を使用する。パルスモータを使用すると、1パルス当り
のα線源3移動距離が既値のため、移動距離はパルス数
に比例する。上記手法により、α線源3を断続,連続的
に移動させることによって連続エネルギー分布を持つα
を発生させることができ、これを被試験半導体装置1に
照射する。照射中に誤動作チェック装置6が被試験半導
体装置1の誤動作を検出すると、誤動作発生信号が空気
層厚検出手段7へ送られる。この信号を受けた空気層厚
検出手段7は、α線源移動制御装置5から、基準位置に
対してパルスを何発パルスモータに加えたか、そのパル
ス数信号を受け、この値から空気層厚lを計算してテス
タ手段8へ送る。テスタ手段8では、パルス数から空気
層厚lを求め、この空気層厚からα粒子エネルギーの減
衰量を計算し、被試験半導体装置1に入射したα粒子エ
ネルギー値に換算して、誤動作の試験を行う。
First, the α-ray source movement control device 5 moves the α-ray source 3 to the position of the photoelectric switch 4 (reference position). Then, the α-ray source movement control device 5 controls the moving distance (l: air layer thickness) and the holding time according to the predetermined moving amount of the α-ray source 3. In this embodiment, a pulse motor is used to drive the α-ray source 3 up and down. When a pulse motor is used, the moving distance is proportional to the number of pulses because the moving distance of the α-ray source 3 per pulse is already set. By the above method, the α-ray source 3 is intermittently and continuously moved to obtain α having a continuous energy distribution.
Can be generated, and the semiconductor device under test 1 is irradiated with this. If the malfunction check device 6 detects a malfunction of the semiconductor device under test 1 during irradiation, a malfunction occurrence signal is sent to the air layer thickness detecting means 7. Upon receiving this signal, the air layer thickness detecting means 7 receives from the α-ray source movement control device 5 how many pulses the pulse motor has been applied to the reference position and the pulse number signal, and from this value the air layer thickness is detected. 1 is calculated and sent to the tester means 8. The tester means 8 obtains the air layer thickness 1 from the pulse number, calculates the attenuation amount of the α particle energy from this air layer thickness, converts it into the α particle energy value incident on the semiconductor device under test 1, and tests the malfunction. I do.

以上述べたように、本実施例によれば、加速寿命評価試
験誤動作発生時に入射したα粒子エネルギー値を求める
ことによって、α粒子エネルギー依存特性も同時に測定
することができ、α線耐量の測定時間を短縮するとがで
きる。
As described above, according to the present embodiment, the α-particle energy dependence characteristic can be measured at the same time by determining the α-particle energy value that is incident when the accelerated life evaluation test malfunction occurs, and the α-ray resistance measurement time Can be shortened.

尚、本実施例では、α線源3の基準位置検出に光電スイ
ッチ4を用いたが、これ以外にメカ的(例えばリミット
スイッチ)に検出することもでき、上記手法に限るもの
でないことは言うまでもない。
In this embodiment, the photoelectric switch 4 is used to detect the reference position of the α-ray source 3, but it is also possible to detect mechanically (for example, a limit switch) other than this, and needless to say, the method is not limited to the above. Yes.

〔発明の効果〕〔The invention's effect〕

本発明によれば、従来に比べ簡単な方法で、誤動作の加
速寿命評価試験とα粒子エネルギー依存特性を同時に測
定することができ、被試験半導体装置の特性評価時間を
従来よりも大幅に短縮することができる。
According to the present invention, the accelerated life evaluation test for malfunction and the α-particle energy dependence characteristic can be simultaneously measured by a simpler method than before, and the characteristic evaluation time of the semiconductor device under test is significantly shortened as compared with the conventional method. be able to.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の一実施例に係る試験装置の構成図、第
2図は被試験半導体装置のα粒子エネルギー依存特性グ
ラフ、第3図は空気中におけるα粒子エネルギーと飛程
の関係を示す特性グラフである。 1……被試験半導体装置、3……α線源、 4……光電スイッチ、5……α線源移動制御装置、 7……空気層厚検出手段、 8……テスタ手段(入射放射線エネルギー換算手段を含
む。)
FIG. 1 is a configuration diagram of a test apparatus according to an embodiment of the present invention, FIG. 2 is a graph of α-particle energy dependence characteristics of a semiconductor device under test, and FIG. 3 is a relationship between α-particle energy in air and range. It is a characteristic graph shown. 1 ... Semiconductor device under test, 3 ... α-ray source, 4 ... Photoelectric switch, 5 ... α-ray source movement control device, 7 ... Air layer thickness detecting means, 8 ... Tester means (incident radiation energy conversion) Means are included.)

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】空気中に放射線源と被試験半導体装置を配
置すると共に、これ等両者間の空気層厚(距離)を任意
に可変設定し、放射線エネルギーを空気中で減衰させて
被試験半導体装置に入射させ該半導体装置の誤動作を試
験する半導体装置の試験装置において、前記半導体装置
の誤動作が発生した時の放射線が通過した空気層厚を検
出する手段と、その時の入射放射線エネルギーを空気層
厚にて換算する手段とを設けたことを特徴とする半導体
装置の試験装置。
1. A semiconductor device to be tested by arranging a radiation source and a semiconductor device to be tested in air, and variably setting an air layer thickness (distance) between them to attenuate radiation energy in the air. In a semiconductor device test apparatus for injecting a semiconductor device into a malfunction test of the semiconductor device, a means for detecting a thickness of an air layer through which radiation passes when the malfunction of the semiconductor device occurs, and an incident radiation energy at that time A device for testing a semiconductor device, which is provided with means for converting the thickness.
JP63074297A 1988-03-30 1988-03-30 Semiconductor device testing equipment Expired - Lifetime JPH073454B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63074297A JPH073454B2 (en) 1988-03-30 1988-03-30 Semiconductor device testing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63074297A JPH073454B2 (en) 1988-03-30 1988-03-30 Semiconductor device testing equipment

Publications (2)

Publication Number Publication Date
JPH01248070A JPH01248070A (en) 1989-10-03
JPH073454B2 true JPH073454B2 (en) 1995-01-18

Family

ID=13543064

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63074297A Expired - Lifetime JPH073454B2 (en) 1988-03-30 1988-03-30 Semiconductor device testing equipment

Country Status (1)

Country Link
JP (1) JPH073454B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5983275B2 (en) * 2012-10-09 2016-08-31 富士通株式会社 Inspection apparatus and inspection method
KR102340973B1 (en) * 2015-09-18 2021-12-17 삼성전자주식회사 Device and method for semiconductor test and data analyze device
EP3637118B1 (en) 2017-06-05 2022-08-31 Fujitsu Limited Soft error inspection method, soft error inspection device, and soft error inspection system
JP6822572B2 (en) * 2017-08-02 2021-01-27 富士通株式会社 Soft error inspection method, soft error inspection device and soft error inspection system

Also Published As

Publication number Publication date
JPH01248070A (en) 1989-10-03

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