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JPH0738452B2 - Self-integrating photoconductive infrared sensor - Google Patents
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JPH0738452B2 - Self-integrating photoconductive infrared sensor - Google Patents

Self-integrating photoconductive infrared sensor

Info

Publication number
JPH0738452B2
JPH0738452B2 JP1088625A JP8862589A JPH0738452B2 JP H0738452 B2 JPH0738452 B2 JP H0738452B2 JP 1088625 A JP1088625 A JP 1088625A JP 8862589 A JP8862589 A JP 8862589A JP H0738452 B2 JPH0738452 B2 JP H0738452B2
Authority
JP
Japan
Prior art keywords
electrode
self
infrared sensor
integrating
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1088625A
Other languages
Japanese (ja)
Other versions
JPH02267972A (en
Inventor
直樹 小田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP1088625A priority Critical patent/JPH0738452B2/en
Publication of JPH02267972A publication Critical patent/JPH02267972A/en
Publication of JPH0738452B2 publication Critical patent/JPH0738452B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、赤外線によって結晶中に発生する過剰少数キ
ャリアが、結晶側壁の界面準位に捕獲されないように赤
外線センサーの出力読出し領域付近の形を改善した自己
積分型光導型赤外線センサーに関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to a shape in the vicinity of an output reading area of an infrared sensor so that excess minority carriers generated in a crystal by infrared rays are not captured by an interface state on a side wall of the crystal. A self-integrating optical infrared sensor with improved

〔従来の技術〕 従来の自己積分型光伝導型赤外線センサーは、第2図及
び第3図に示すようにバイアス電場を印加するためのプ
ラス電極1,マイナス電極2及び出力読出し電極3を結晶
表面に有し、赤外線によって結晶中に発生したキャリア
は、ドリフト領域4を電極1から電極2の方向にれるこ
とによって積分される。積分されたキャリアは、出力読
出し領域5で電位差として検出されていた(エー・ブラ
ックバーン(A.Blackburn)等インフラレッドフィジク
ス(Infrared Physics)第22巻(1982)57ページ;ティ
ー・アシュリー(T.Ashley)等インフラレッドフィジク
ス(Infrared Physics)第24巻(1984)25ページ)。
[Prior Art] In a conventional self-integrating photoconductive infrared sensor, as shown in FIGS. 2 and 3, a positive electrode 1 for applying a bias electric field, a negative electrode 2 and an output readout electrode 3 are provided on a crystal surface. Carriers generated in the crystal due to infrared rays are integrated by moving the drift region 4 from the electrode 1 to the electrode 2. The integrated carrier was detected as a potential difference in the output readout area 5 (A. Blackburn et al., Infrared Physics, Vol. 22 (1982) page 57; T. Ashley (T. Infrared Physics, Vol. 24 (1984), 25 pages.

〔発明が解決しようとする課題〕[Problems to be Solved by the Invention]

しかしながら、従来型センサーにおいては、第2図及び
第3図に示すように、ドリフト領域4と出力読出し領域
5との境界で輪郭線が折れ曲った形状の結晶形状である
ため屈曲部7において、キャリアの流れがスムーズでな
くなり、つまり、キャリアが同場所近傍の結晶型壁の界
面準位に捕獲されやすいため、積分されたキャリアの一
部が再結合して出力が低下するという問題点がある。
However, in the conventional sensor, as shown in FIG. 2 and FIG. 3, since the contour line is bent at the boundary between the drift region 4 and the output read region 5, the bent portion 7 has The carrier flow is not smooth, that is, the carriers are easily captured by the interface states of the crystal-type wall near the same place, so that there is a problem that some of the integrated carriers are recombined and the output decreases. ..

本発明の目的は、過剰少数キャリアが出力読出し領域付
近の結晶側壁にある界面準位と再結合しないように読出
し領域の形を改善した自己積分型光伝導型赤外線センサ
ーを提供することにある。
An object of the present invention is to provide a self-integrating photoconductive infrared sensor in which the shape of the read region is improved so that excess minority carriers do not recombine with the interface states on the crystal sidewall near the output read region.

〔課題を解決するための手段〕[Means for Solving the Problems]

本発明の自己積分型光伝導型赤外線センサーは、互いに
対向配置した2つの電極を結晶表面に備え、前記電極の
うちの一方の電極近傍に読出し電極を備え、前記2つの
電極間の結晶領域が前記一方の電極から他方の電極に向
う輪郭線が滑らかな連続曲線で成る形状を有し、前記結
晶領域の側壁近傍の電気力線が前記輪郭線に並行となる
構成になっている。
The self-integrating photoconductive infrared sensor of the present invention comprises two electrodes arranged to face each other on the crystal surface, a read electrode near one of the electrodes, and a crystal region between the two electrodes. A contour line extending from the one electrode to the other electrode has a shape of a smooth continuous curve, and lines of electric force in the vicinity of the side wall of the crystal region are parallel to the contour line.

〔作用〕[Action]

第1図によって本発明の自己積分型赤外線センサーの作
用を説明する。同図において従来例と同じ構成要素には
第2図と第3図と同じ符号を付して説明する。
The operation of the self-integrating infrared sensor of the present invention will be described with reference to FIG. In the figure, the same components as those of the conventional example are designated by the same reference numerals as those in FIG. 2 and FIG.

本発明の自己積分型赤外線センサーは、バイアス電場を
印加するためのプラス電極1、マイナス電極2、出力読
出し電極3、ドリフト領域4及び読出し領域5で構成さ
れている。なお、6はキャリアの流れに対応する電気力
線を示す。
The self-integrating infrared sensor of the present invention comprises a plus electrode 1, a minus electrode 2, an output read electrode 3, a drift region 4 and a read region 5 for applying a bias electric field. In addition, 6 shows a line of electric force corresponding to the flow of carriers.

さて赤外線輻射によって、ドリフト領域4の結晶に発生
した過剰少数キャリアは電極1,2間に印加した電場によ
ってドリフトし積分される。積分されたキャリアは出力
読出し領域5に到達して電位差として出力される。キャ
リアの流れに対応する電気力線6が第2図と第3図に示
すように場所7近傍で鋭く曲る場合、キャリアが結晶側
壁の界面準位と再結晶し、出力が低下する。この出力低
下を回避するには、、ドリフト領域4から読出し領域5
への電気力線6がスムーズにつながる必要がある。つま
り、第1図に示したように、特異点のない両領域の形を
採用することによって、出力低下を防ぐことができる。
Excess minority carriers generated in the crystal of the drift region 4 due to infrared radiation drift and are integrated by the electric field applied between the electrodes 1 and 2. The integrated carriers reach the output read area 5 and are output as a potential difference. When the electric flux line 6 corresponding to the flow of carriers sharply bends in the vicinity of the location 7 as shown in FIGS. 2 and 3, the carriers recrystallize with the interface states on the crystal side walls, and the output decreases. In order to avoid this output reduction, the drift region 4 to the read region 5
It is necessary that the electric lines of force 6 are smoothly connected. That is, as shown in FIG. 1, by adopting the shapes of both regions without singular points, it is possible to prevent the output from decreasing.

〔実施例〕〔Example〕

以下に、本発明の一実施例を図によって説明する。 An embodiment of the present invention will be described below with reference to the drawings.

実施例に用いた自己積分型赤外線センサーは、バンドギ
ャップが0.1eVのHgCdTe結晶10にプラス電極1、マイナ
ス電極2及び出力読出し電極3を金蒸着で付けた光伝導
型のものである。ドリフト領域4の流さLは600μm、
読出し領域5の長さlは42.6μmである。また、本発明
のセンサーは、ドリフト領域4と出力読出し領域の輪郭
で表される形状にHgCdTe結晶10を加工してある。ここ
で、xはプラス電極の中心を原点にとってマイナス電極
方向へ測った距離である。本実施例では、Wa=63μm、
l1=21.35μmを用いた。つまり、プラス電極の幅は63
μm、マイナス電極の幅は17μmである。
The self-integrating infrared sensor used in the examples is a photoconductive type in which a positive electrode 1, a negative electrode 2 and an output reading electrode 3 are attached to a HgCdTe crystal 10 having a band gap of 0.1 eV by gold vapor deposition. The flow L of the drift region 4 is 600 μm,
The length 1 of the read area 5 is 42.6 μm. Further, in the sensor of the present invention, the contours of the drift region 4 and the output read region are The HgCdTe crystal 10 is processed into a shape represented by. Here, x is a distance measured in the negative electrode direction with the center of the positive electrode as the origin. In this example, Wa = 63 μm,
l 1 = 21.35 μm was used. That is, the width of the positive electrode is 63
The width of the negative electrode is 17 μm.

本発明のセンサーとともに同じチップ上に従来型センサ
ーつまり第2図のものに対してはドリフト領域63μm、
マイナス電極幅38.5μmを、第3図のセンサーに対して
はドリフト領域幅63μm、マイナス電極幅17μmを並べ
て出力電圧の比較を行った。3つのセンサーともドリフ
ト領域長600μm、読出し領域長は42.6μmである。ま
た、センサーの厚さつまり結晶厚は8μmである。
63 μm drift area for a conventional sensor, ie FIG. 2, on the same chip with the sensor of the present invention,
The minus electrode width was 38.5 μm, the drift region width was 63 μm, and the minus electrode width was 17 μm for the sensor shown in FIG. The drift area length of all three sensors is 600 μm, and the read area length is 42.6 μm. The thickness of the sensor, that is, the crystal thickness is 8 μm.

本発明を含む3つのセンサーに500Kの黒体輻射を照射し
て出力電圧を測定した結果、第2図の従来型センサーの
出力を1に規格化すると、第3図の従来型センサーの出
力は1.2、本発明のセンサーの出力は1.5という値を得
た。このように、本発明のセンサーは、従来型セサーに
比べて1.25倍以上の高い光応答を示すことが分かった。
As a result of measuring the output voltage by irradiating three sensors including the present invention with 500K blackbody radiation, if the output of the conventional sensor of FIG. 2 is normalized to 1, the output of the conventional sensor of FIG. The value of 1.2 and the output of the sensor of the present invention was 1.5. As described above, it was found that the sensor of the present invention exhibits a high optical response of 1.25 times or more as compared with the conventional type cesar.

〔発明の効果〕〔The invention's effect〕

以上説明したように、本発明によれば過剰少数キャリア
が、読出し電極部付近の結晶側壁の界面準位に捕獲され
ないように、同電極部付近のセンサの輪郭を設計するこ
とにより、自己積分型光伝導型赤外線センサーの光応答
を向上することができる。
As described above, according to the present invention, the self-integration type is designed by designing the contour of the sensor in the vicinity of the read electrode portion so that the excess minority carriers are not captured by the interface states of the crystal sidewalls near the read electrode portion. The optical response of the photoconductive infrared sensor can be improved.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の自己積分型光伝導型赤外線センサーの
一実施例を示す平面図、第2図及び第3図は従来側の自
己積分型光導型赤外線センサーを示す平面図である。 1……プラス電極、2……マイナス電極、3……読出し
電極、4……ドリフト領域、5……出力読出し領域、6
……電気力線、7……屈曲部。
FIG. 1 is a plan view showing an embodiment of a self-integrating photoconductive infrared sensor of the present invention, and FIGS. 2 and 3 are plan views showing a conventional self-integrating optical infrared sensor. 1 ... Plus electrode, 2 ... Minus electrode, 3 ... Read-out electrode, 4 ... Drift region, 5 ... Output read-out region, 6
…… Electric lines of force, 7 …… Bending part.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】互いに対向配置した2つの電極を結晶表面
に備え、前記電極のうちの一方の電極近傍に読出し電極
を備え、前記2つの電極間の結晶領域が前記一方の電極
から他方の電極に向う輪郭線が滑らかな連続曲線で成る
形状を有し、前記結晶領域の側壁近傍の電気力線が前記
輪郭線に並行となることを特徴とする自己積分型光導型
赤外線センサー。
1. A crystal surface is provided with two electrodes arranged to face each other, a read electrode is provided in the vicinity of one of the electrodes, and a crystal region between the two electrodes is provided from the one electrode to the other electrode. A self-integrating optical infrared sensor, characterized in that the contour line facing to is shaped like a smooth continuous curve, and the lines of electric force near the side wall of the crystal region are parallel to the contour line.
JP1088625A 1989-04-07 1989-04-07 Self-integrating photoconductive infrared sensor Expired - Lifetime JPH0738452B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1088625A JPH0738452B2 (en) 1989-04-07 1989-04-07 Self-integrating photoconductive infrared sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1088625A JPH0738452B2 (en) 1989-04-07 1989-04-07 Self-integrating photoconductive infrared sensor

Publications (2)

Publication Number Publication Date
JPH02267972A JPH02267972A (en) 1990-11-01
JPH0738452B2 true JPH0738452B2 (en) 1995-04-26

Family

ID=13947990

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1088625A Expired - Lifetime JPH0738452B2 (en) 1989-04-07 1989-04-07 Self-integrating photoconductive infrared sensor

Country Status (1)

Country Link
JP (1) JPH0738452B2 (en)

Also Published As

Publication number Publication date
JPH02267972A (en) 1990-11-01

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