JPH0740575B2 - Method for producing laminated composite tape for film carrier - Google Patents
Method for producing laminated composite tape for film carrierInfo
- Publication number
- JPH0740575B2 JPH0740575B2 JP13988187A JP13988187A JPH0740575B2 JP H0740575 B2 JPH0740575 B2 JP H0740575B2 JP 13988187 A JP13988187 A JP 13988187A JP 13988187 A JP13988187 A JP 13988187A JP H0740575 B2 JPH0740575 B2 JP H0740575B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- tape
- metal foil
- composite tape
- polyetherimide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000002131 composite material Substances 0.000 title claims description 12
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000011888 foil Substances 0.000 claims description 27
- 229910052751 metal Inorganic materials 0.000 claims description 23
- 239000002184 metal Substances 0.000 claims description 23
- 239000004697 Polyetherimide Substances 0.000 claims description 21
- 229920001601 polyetherimide Polymers 0.000 claims description 21
- 239000012790 adhesive layer Substances 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 11
- 238000005530 etching Methods 0.000 claims description 9
- 239000013034 phenoxy resin Substances 0.000 claims description 8
- 229920006287 phenoxy resin Polymers 0.000 claims description 8
- 239000002966 varnish Substances 0.000 claims description 8
- 239000010410 layer Substances 0.000 claims description 6
- 238000010030 laminating Methods 0.000 claims description 5
- 239000011342 resin composition Substances 0.000 claims description 5
- 239000002904 solvent Substances 0.000 claims description 5
- 230000001681 protective effect Effects 0.000 claims description 3
- 238000004080 punching Methods 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000000853 adhesive Substances 0.000 description 10
- 230000001070 adhesive effect Effects 0.000 description 10
- 239000000203 mixture Substances 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- 125000005395 methacrylic acid group Chemical group 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229920005992 thermoplastic resin Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- 239000002313 adhesive film Substances 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- POYODSZSSBWJPD-UHFFFAOYSA-N 2-methylprop-2-enoyloxy 2-methylprop-2-eneperoxoate Chemical compound CC(=C)C(=O)OOOC(=O)C(C)=C POYODSZSSBWJPD-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 238000003855 Adhesive Lamination Methods 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- 239000004840 adhesive resin Substances 0.000 description 1
- 229920006223 adhesive resin Polymers 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- -1 phenol compound Chemical class 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
Landscapes
- Wire Bonding (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、ICチップ搭載用テープ状エンドレスフイルム
回路板作製に際して用いられる、謂ゆるフイルムキャリ
アー用テープの製造法に関するものであり、更に詳しく
はポリエーテルイミドフイルム上に、熱ラミネート可能
な光硬化組成物を含むフェノキシ樹脂接着層を形成して
おき、これを金属箔とラミネートし活性光で硬化せし
め、更にテープ裏面にレジスト層を形成する、回路加工
時の寸法安定性に優れた金属箔積層複合テープの製造方
法に係るものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial application] The present invention relates to a method for producing a so-called loose film carrier tape used in the production of a tape-shaped endless film circuit board for mounting an IC chip. On the polyetherimide film, a phenoxy resin adhesive layer containing a photo-curable composition that can be thermally laminated is formed in advance, and this is laminated with a metal foil and cured with active light, and a resist layer is formed on the back surface of the tape. The present invention relates to a method for producing a metal foil laminated composite tape having excellent dimensional stability during circuit processing.
〔従来技術〕 従来フイルムキャリアー用テープとしては耐熱性を生か
し、ポリイミドフイルム銅貼りテープが広く用いられて
きた。またこの場合、フイルムと金属箔のラミネート用
の接着剤樹脂はエポキシ樹脂又はエポキシポリアミド系
樹脂等の加熱硬化型接着剤が広く用いられてきている。[Prior Art] Conventionally, a polyimide film copper-clad tape has been widely used as a tape for a film carrier due to its heat resistance. Further, in this case, as the adhesive resin for laminating the film and the metal foil, a thermosetting adhesive such as an epoxy resin or an epoxy polyamide resin has been widely used.
しかしながら、このような従来品は大きな欠点を有して
おり問題化してきている。即ち、ポリイミドフイルムは
耐熱性に優れており、耐熱寸法変化は小さいものの耐湿
及び耐アルカリ性に劣り、回路加工工程での寸法変化が
大きくパターン間精度及び細線回路間位置精度が得難
く、回路工程での伸び縮みを見込んで回路設計が行わな
ければならないという煩わしさが有る。However, such a conventional product has a big defect and is becoming a problem. That is, the polyimide film is excellent in heat resistance, heat resistance dimensional change is small but inferior in moisture resistance and alkali resistance, dimensional change in the circuit processing process is large and it is difficult to obtain pattern accuracy and position accuracy between fine line circuits. There is the annoyance that the circuit design must be performed in anticipation of the expansion and contraction of the.
また極端な場合、耐アルカリ性に劣るためエッチングレ
ジストのアルカリ剥離工程で回路下のふくれ等が生じる
という問題があった。Further, in an extreme case, there is a problem that swelling etc. under the circuit occurs in the alkali removing step of the etching resist due to poor alkali resistance.
このような従来の金属箔貼りテープの欠点解消の要求は
ICの高密度化に伴なる回路の微細化といった傾向の中
で、強く望まれている。また、加熱接着のため接着ラミ
ネート時間が長く、更に加熱硬化炉が長くなるという点
も不都合な点として指摘されている。The demand for eliminating the drawbacks of such conventional metal foil tapes
It is strongly desired in the trend of circuit miniaturization accompanying the high density of ICs. Further, it is pointed out that the adhesive lamination time is long due to the heat adhesion, and that the heating and curing furnace is also long, which is disadvantageous.
本願発明は、これら従来の欠点を解消すべく、耐熱性を
有し、且つ湿度ならびにアルカリ処理時の寸法変化の小
さいテープを得べく、各種フイルムを検討したところ、
ポリエーテルイミドが本目的に合致することを見い出
し、加えて光硬化可能なフイルム状接着剤を用いること
によりラミネート工程の合理化が図れるとの知見を得、
鋭意研究を重ねた結果、達成された発明である。The present invention, in order to eliminate these conventional drawbacks, in order to obtain a tape having heat resistance, and a small dimensional change during humidity and alkali treatment, various films were examined,
It was found that polyether imide meets this purpose, and in addition to that, the use of a photo-curable film adhesive has led to the finding that the laminating process can be rationalized.
It is an invention achieved as a result of intensive studies.
本発明により工業的意味の大きいフィルムキャリアー用
積層複合テープの供給が可能になった。INDUSTRIAL APPLICABILITY According to the present invention, it is possible to supply a laminated composite tape for a film carrier, which has great industrial significance.
本発明は、ポリエーテルイミドフイルム上にフェノキシ
樹脂、光硬化性樹脂組成物及び溶剤から成るワニスを塗
布乾燥し、接着層付きテープを得、該接着層面に離型可
能な保護フイルムを貼り合せる工程(工程I)、該3層
構成のテープにガイド穴、チップマウント穴及び位置合
せ用穴を打抜く工程(工程II)、離型フイルムを剥離し
ながらガイド穴のみを残して、該テープよりも巾のせま
い、スリットされた金属箔を熱ラミネートして積層複合
テープを得る工程(工程III)、金属箔貼り積層板複合
テープのポリエーテルイミドフイルム側から活性光を照
射して接着剤層中の光硬化樹脂組成物成分を硬化せしめ
る工程(工程IV)、工程IVで得た金属箔貼り積層複合テ
ープのポリエーテルイミドフイルム面に最終的に剥離可
能なエッチングレジスト膜をガイド穴をのぞいて形成す
る工程(工程V)からなることを特徴とするフイルムキ
ャリアー用積層複合テープの製造方法である。The present invention is a process of applying a varnish consisting of a phenoxy resin, a photocurable resin composition and a solvent onto a polyetherimide film and drying it to obtain a tape with an adhesive layer, and laminating a releasable protective film on the adhesive layer surface. (Step I), a step of punching a guide hole, a chip mounting hole, and a positioning hole in the three-layered tape (step II), leaving only the guide hole while peeling the release film, Process of obtaining laminated composite tape by heat laminating slitted metal foil with narrow width (step III), irradiating active light from the polyetherimide film side of the metal foil laminated laminate composite tape The step of curing the photocurable resin composition component (step IV), the etching resist that can be finally peeled off on the polyetherimide film surface of the metal foil-laminated composite tape obtained in step IV The membrane is a film carrier for laminated composite tape manufacturing method characterized by comprising the step of forming except guide holes (step V).
以下本発明を工程順に説明する。The present invention will be described below in the order of steps.
まず本発明に用いられるポリエーテルイミドフイルム
は、耐熱熱可塑性樹脂フイルムであり、押出法、キャス
ト法いずれの方法で得られたフイルムであっても使用可
能である。また厚みについては、テープキャリアーとし
て引張り強度が要求されるため75μm〜150μmの厚み
のフイルムが好んで用いられる。75μm以下ではフイル
ムの走行中破断、シワ等が発生して好ましくないし150
μm以上ではフイルム走行性に難点が生じ、経済性の面
からも150μm以上の厚みは不要である。First, the polyetherimide film used in the present invention is a heat resistant thermoplastic resin film, and a film obtained by either an extrusion method or a casting method can be used. Regarding the thickness, a film having a thickness of 75 μm to 150 μm is preferably used because tensile strength is required as a tape carrier. If it is less than 75 μm, the film may be broken or wrinkled while running, which is not preferable.
When the thickness is more than μm, the film running property becomes difficult, and the thickness of 150 μm or more is not necessary from the economical point of view.
本発明に用いる金属箔とは、アルミニウム箔、モリブデ
ン箔、ニッケル箔、鉛箔、鉄箔、もしくはこれらの金属
を主体とした合金箔等をいい、必要に応じて接着する面
を粗面化処理したものを用いることができる。The metal foil used in the present invention refers to an aluminum foil, a molybdenum foil, a nickel foil, a lead foil, an iron foil, or an alloy foil mainly containing these metals, and the surface to be bonded is roughened if necessary. What was done can be used.
次いで接着剤層形成用のワニスを調整するがワニス構成
成分の一つはフェノキシ樹脂であり、以下の(1)式で
表わされる構造のビスフェノールA、ビスフェノールF
等のフェノール化合物とエピクロルヒドリンより合成さ
れる高分子量ポリヒドロキシポリエーテル構造の熱可塑
性樹脂である。Next, a varnish for forming an adhesive layer is prepared. One of the constituent components of the varnish is a phenoxy resin, and bisphenol A and bisphenol F having a structure represented by the following formula (1)
It is a thermoplastic resin having a high molecular weight polyhydroxypolyether structure, which is synthesized from a phenol compound such as epichlorohydrin.
この構造から明らかな如く、該樹脂は高分子量のため造
膜性に優れ、かつ強度を有する塗膜フイルムを形成す
る。 As is clear from this structure, since the resin has a high molecular weight, it forms a coating film having excellent film-forming properties and strength.
また構造中に多くの水酸基を有しているため各種被着体
との接着性に優れ、加えて低融点熱可塑性樹脂であるた
め、加熱溶融接着が可能であり、これ単独でもラミネー
トは可能である。然しながら耐熱性に乏しいという欠点
はまぬがれえない。本願発明の骨子の一つはこの点の改
良にもある。In addition, since it has many hydroxyl groups in its structure, it has excellent adhesiveness to various adherends, and since it is a low melting point thermoplastic resin, it can be heat melt-bonded and can be laminated by itself. is there. However, the drawback of poor heat resistance cannot be overlooked. One of the gist of the present invention is to improve this point.
また本発明で用いられる(1)式で示される樹脂の分子
量は重量平均分子量で35000以上、数平均分子量で5000
以上であり、これより小さいものは造膜性に欠け、又粘
着性を有するため使用が難しい。The resin represented by the formula (1) used in the present invention has a weight average molecular weight of 35,000 or more and a number average molecular weight of 5,000.
The above is the case, and those smaller than this are lacking in film-forming property and have adhesiveness, which makes it difficult to use.
次いで光硬化性を有する組成物とはエチレン性2種結合
を有するアクリル又はメタアクリルプレポリマー、エチ
レン性2種結合を有するアクリルモノマー又はメタアク
リルモノマー光開始剤及び光増感剤から形成される。Then, the photo-curable composition is formed from an acrylic or methacrylic prepolymer having an ethylenic two-bond, an acrylic monomer or a methacrylic monomer photoinitiator having an ethylenic two-bond, and a photosensitizer.
プレポリマーとしてはエポキシアクリレート又はエポキ
シメタアクリレート、ウレタンアクリレート又はメタア
クリレート、ポリエステルアクリレート又はメタアクリ
レート等が単独又は併用して用いられる。これら物質は
フェノキシ樹脂と相溶性に優れている。またアクリル又
はメタアクリルモノマーとしては一般にUV硬化樹脂系に
用いられるものはフェノキシ樹脂との相溶性が良好であ
ればすべて使用可能である。また開始剤としてベンゾイ
ンイソプロピルエーテル、2−エチルアントラキノン、
ベンジル等の通常の開始剤が用いられるがポリエーテル
イミドフイルム透過光で接着層を硬化せしめる必然性か
ら長波長光を吸収して、その励起エネルギーを開始剤に
移送する謂ゆる増感剤との組合せ使用が好ましい。As the prepolymer, epoxy acrylate or epoxy methacrylate, urethane acrylate or methacrylate, polyester acrylate or methacrylate is used alone or in combination. These substances have excellent compatibility with the phenoxy resin. As the acrylic or methacrylic monomer, any of those generally used for UV curable resin can be used as long as it has good compatibility with the phenoxy resin. Further, benzoin isopropyl ether, 2-ethylanthraquinone, and
Ordinary initiators such as benzyl are used, but in combination with a so-called sensitizer, which absorbs long-wavelength light and transfers its excitation energy to the initiator due to the necessity of curing the adhesive layer with transmitted light from the polyetherimide film. Use is preferred.
検討の結果、以下の構造式を有する化合物の組合せ使用
が特に好ましい。As a result of the investigation, the combined use of compounds having the following structural formulas is particularly preferable.
上記フェノキシ樹脂および光硬化組成成分を溶剤に溶か
してワニスを得る。この際ポリエーテルイミドフイルム
を溶解する溶剤は当然ながら使用できない。 The phenoxy resin and the photocurable composition components are dissolved in a solvent to obtain a varnish. At this time, of course, a solvent that dissolves the polyetherimide film cannot be used.
次いで該ワニス組成物を常法によりポリエーテルイミド
フイルムテープ上に塗布し乾燥せしめる。乾燥は開始
剤、増感剤の飛散を防ぐ意味で極力低温であることが望
ましい。また塗布厚みは接着性に支障をきたさない範囲
で可及的に薄いことが望ましい乾燥後の膜暑として10〜
30μmであるのが一般的である。Then, the varnish composition is applied onto a polyetherimide film tape by a conventional method and dried. It is desirable that the drying is performed at a temperature as low as possible in order to prevent scattering of the initiator and the sensitizer. Also, it is desirable that the coating thickness be as thin as possible within the range that does not affect the adhesiveness.
It is generally 30 μm.
かくして得られる接着性フイルムが表面に形成されたポ
リエーテルイミドフイルムを得るが、該接着フイルムは
均一透明な常温では粘着性の無い塗膜であり、巻き取り
可能である。なお巻き取り時のブロッキング防止のため
離型フイルムを添付することも好んで用いられる。A polyetherimide film having the adhesive film thus obtained formed on its surface is obtained, and the adhesive film is a film that is uniformly transparent and has no tack at room temperature and can be wound. It is also preferred to attach a release film to prevent blocking during winding.
次いで得られたフイルムを帯状にスリットしてテープ状
フイルムを得、フイルム両端部にスプロケット用ガイド
穴をあける。次いで該テープフイルムをスプロケットに
はめ込みIC搭載部となるべき箇所及び回路パターンユニ
ット毎の光センサー用位置合せ穴を打抜く。Then, the obtained film is slit into strips to obtain a tape-shaped film, and sprocket guide holes are formed at both ends of the film. Then, the tape film is fitted into a sprocket, and a position to be an IC mounting portion and a photosensor alignment hole for each circuit pattern unit are punched.
この工程により接着剤毎打抜かれた穴を有するテープが
得られる。By this step, a tape having a punched hole for each adhesive is obtained.
次に該スプロケット用ガイド穴を残すようにフイルムよ
り巾の狭いスリットされた金属箔を用意し、これを前記
フイルムに重ねて熱ラミネーターを用いて熱圧着し、こ
れを一体化する。この操作により金属箔及びフイルムは
強固に接着され一体化されるこの時点ですでに2Kg/cmと
いう高いピール接着強度を有しているため、以後の取り
扱いが安全である。Next, a slit metal foil having a width narrower than that of the film is prepared so as to leave the sprocket guide hole, and the foil is superposed on the film and thermocompression-bonded using a heat laminator to integrate the foil. By this operation, the metal foil and the film are firmly bonded and integrated, and at this point, the metal foil and the film already have a high peel adhesive strength of 2 kg / cm, so that the subsequent handling is safe.
次いでフイルム側より活性光線を照射し、フイルムを介
して接着層中に存在する光硬化樹脂組成物を反応硬化せ
しめる。この操作により接着層は耐熱性、耐薬品性とい
った機能が付与される。なお硬化を完全にするため照射
後、熱処理を行うことも有効な場合もある。Then, an actinic ray is irradiated from the film side to reactively cure the photocurable resin composition present in the adhesive layer through the film. By this operation, the adhesive layer has functions such as heat resistance and chemical resistance. In some cases, it may be effective to perform a heat treatment after the irradiation in order to complete the curing.
この際、硬化反応は低温で行われるため金属箔とポリエ
ーテルイミドフイルムの熱膨脹係数の差があるにも拘ら
ず反り、ねじれ等が生じないということも本発明の副次
的メリットである。At this time, since the curing reaction is carried out at a low temperature, there is no difference in thermal expansion coefficient between the metal foil and the polyetherimide film, so that warping, twisting or the like does not occur, which is a secondary merit of the present invention.
次に一体化されたフイルム基板のフイルム側にレジスト
層を形成するこの目的は最終的に回路とする場合、ICと
の接続端子は裏面に絶縁層の無いエッチング回路が必要
となるため、穴部分の金属箔は表面にフイルムのない状
態でエッチングされる必要があり、金属箔裏側を保護す
る必要があるためである。この層は金属箔のエッチング
終了後、金属箔表面のレジストと共に剥離される。Next, a resist layer is formed on the film side of the integrated film substrate.When this purpose is finally used as a circuit, the connection terminal with the IC requires an etching circuit without an insulating layer on the back surface, so the hole This is because the metal foil of (1) needs to be etched without a film on the surface, and the back side of the metal foil needs to be protected. This layer is peeled off together with the resist on the surface of the metal foil after the etching of the metal foil is completed.
かくしてテープ状のフイルムキャリアー用回路板が得ら
れる。Thus, a tape-shaped film carrier circuit board is obtained.
かくして得られた複合テープは金属箔とポリエーテルイ
ミドフイルムが強固に接着され、そのまま回路加工に供
せられる優れた積層フイルムである。またポリエーテル
イミドの回路加工時の収縮・伸びが従来のポリイミドフ
イルム積層テープに比して10分の1以下であり、ネガ修
正の必要は全く無い優れた積層体である。本基板を用い
て作成したテープキャリアー用回路板は充分実用に耐
え、使用可能であった。また接着層の耐熱性および耐薬
品性も充分であり、ICマウント工程にも充分耐え得るも
のであった。The composite tape thus obtained is an excellent laminated film in which the metal foil and the polyetherimide film are firmly adhered and can be directly subjected to circuit processing. Further, the shrinkage / elongation of the polyetherimide during circuit processing is 1/10 or less of that of the conventional polyimide film laminated tape, and it is an excellent laminated body that does not require any negative correction. The circuit board for a tape carrier prepared by using this substrate was practically usable and usable. Also, the heat resistance and chemical resistance of the adhesive layer were sufficient, and the adhesive layer could withstand the IC mounting process.
以下に実施例を示す。Examples will be shown below.
〔実施例−1〕 (工程I) 厚み75μのポリエーテルイミドフイルムの片面上に以下
の組成物からなる接着剤ワニスをロールコーター法によ
り塗布し、80℃.5mの乾燥ゾーン内を1m/minで通過させ
て溶剤を除去した後、離型処理した25μ厚のポリエステ
ルフイルムを貼り合せて巻き取った。接着剤層の厚みは
25μであった。[Example-1] (Step I) An adhesive varnish composed of the following composition was applied onto one surface of a polyetherimide film having a thickness of 75 µm by a roll coater method, and 1 m / min was applied in a drying zone of 80 ° C and 0.5 m. After passing through to remove the solvent, a 25 μm-thick polyester film subjected to mold release was stuck and wound up. The thickness of the adhesive layer
It was 25μ.
(接着剤ワニス組成物) フェノキシ樹脂、(数平均分子量7400、東部化成
(株).フェノトートYP−50) ……100重量部 固型エポキシアクリレート樹脂(昭和高分子(株)リポ
キシVR−60) ……17重量部 ウレタンアクリレート樹脂(日本合成化学工業(株)ゴ
ーセラックUV−3000B) ……85重量部 ペンタエリスリトールトリアクリレート……12.5重量部 チバガイギー社イルガキュアー907 ……4.7重量部 2.4−ジエチルチオキサントン ……3.3重量部 メチルセロリルブアセテート ……420重量部 酢酸ブチル ……500重量部 (工程II) この接着剤つきフイルムの両端にスプロケット用のガイ
ド穴を打抜きプレスによってあけ、次いでスプロケット
にガイド穴をセットし、チップマウント穴及び位置合せ
用穴を常法によってプレスを用い打抜いた。打抜き穴周
辺に接着剤層の浮きは認められなかった。(Adhesive varnish composition) Phenoxy resin, (number average molecular weight 7400, Tobu Kasei Co., Ltd. Phenoto YP-50) ...... 100 parts by weight Solid epoxy acrylate resin (Showa Polymer Co., Ltd. Lipoxy VR-60) ...... 17 parts by weight Urethane acrylate resin (Nippon Gosei Kagaku Co., Ltd. Gocelac UV-3000B) …… 85 parts by weight Pentaerythritol triacrylate …… 12.5 parts by weight Ciba Geigy Irgacure 907 …… 4.7 parts by weight 2.4-Diethylthioxanthone …… … 3.3 parts by weight Methylcerolylbuacetate …… 420 parts by weight Butyl acetate …… 500 parts by weight (Process II) Guide holes for sprockets are punched on both ends of the film with adhesive, and then the guide holes are set on the sprockets. Then, the chip mounting hole and the positioning hole were punched out by a conventional method using a press. No floating of the adhesive layer was observed around the punched holes.
(工程III) 打抜き後、ポリエステルの保護フイルムを剥離した後、
接着剤層上に片面粗化した厚み35μの錫箔を80℃、1Kg/
cm2で圧着ロールを用いてラミネートした。この条件で
は接着剤層のダレがないため打抜いた穴の内側に接着剤
層がしみ出す現象は認められなかった。(Step III) After punching, after peeling off the protective film of polyester,
35 μm thick tin foil with one side roughened on the adhesive layer at 80 ° C, 1 kg /
It was laminated using a pressure roll at cm 2 . Under this condition, there was no sagging of the adhesive layer, so that no phenomenon of the adhesive layer exuding inside the punched hole was observed.
この状態での貼り合せ品の接着強度を測定するため、錫
箔の90°方向での剥離し強度を測定したところ2.2Kgf/c
mであり、両者が強固に接着していることがわかった。In order to measure the adhesive strength of the bonded product in this state, peeling the tin foil in 90 ° direction and measuring the strength was 2.2 Kgf / c
It was found that both were strongly bonded to each other.
しかし、この貼り合せ品を200℃、1時間の加熱処理を
施すと、接着剤層とポリエーテルイミド面との間に全面
浮きが発生し、また貼り合せ品の錫箔を常法によりエッ
チングで除去した後、アセトンにフイルムを浸漬すると
10分間で接着剤層を溶解した。However, when this bonded product is subjected to heat treatment at 200 ° C for 1 hour, the entire surface is lifted between the adhesive layer and the polyetherimide surface, and the tin foil of the bonded product is removed by etching by a conventional method. And then immerse the film in acetone
The adhesive layer was dissolved in 10 minutes.
(工程IV) 工程IIIで得られた貼り合せ品の接着剤の硬化を施すた
め、1m/分のライン速度で流れる貼り合せ品のポリエー
テルイミド面より15cmの距離から80W/cmの高圧水銀灯1
灯を用いて光照射を行った。光照射による基板の温度上
昇は殆どないため、硬化後の基板の反りは全く認められ
なかった。(Step IV) In order to cure the adhesive of the bonded product obtained in Step III, a high pressure mercury lamp of 80 W / cm from a distance of 15 cm from the polyetherimide surface of the bonded product flowing at a line speed of 1 m / min 1
Light irradiation was performed using a lamp. Since there was almost no temperature rise of the substrate due to light irradiation, no warp of the substrate after curing was observed.
(工程V) 市販の通常のアルカリ水溶液現像・剥離型フイルム状フ
ォトレジストを常法に従い、工程IVで得られた基板の両
面にラミネートした。錫箔面には回路パターンを形成す
る部分のみに、また裏側のポリエーテルイミド面には全
面にエッチングレジスト層が残るように露光・現像を行
った後、常法によるエッチングパターン加工、エッチン
グレジスト剥離を施して目的とするフイルムキャリアー
用ポリエーテルイミドフイルム回路パターンを作成し
た。(Step V) A commercially available ordinary alkaline aqueous solution developing / peeling film-like photoresist was laminated on both surfaces of the substrate obtained in Step IV according to a conventional method. After exposing and developing so that the etching resist layer remains on the entire surface of the tin foil surface and the polyetherimide surface on the back side, the etching pattern processing and etching resist peeling by the usual method are performed. Then, a desired polyetherimide film circuit pattern for a film carrier was prepared.
この回路パターンの接着強度を評価するために、錫箔の
90°方向での引き剥し強度を測定したところ、2.6Kgf/c
mであり、また200℃と、1時間の加熱処理を施した後で
も2.3Kgf/cmの強度を示した。In order to evaluate the adhesive strength of this circuit pattern, tin foil
The peel strength in the 90 ° direction was measured and found to be 2.6 Kgf / c
m, and showed a strength of 2.3 Kgf / cm even after heat treatment at 200 ° C. for 1 hour.
また、パターンをアセトン中に1時間浸漬したが接着層
には何らの変化も認められなかった。Moreover, the pattern was immersed in acetone for 1 hour, but no change was observed in the adhesive layer.
〔実施例−2〕 実施例1において貼布する金属箔を50μm厚みの鉛−錫
合金箔に替る以外は全く同様の方法で積層構造体を得
た。[Example-2] A laminated structure was obtained in the same manner as in Example 1 except that the metal foil to be applied was replaced with a 50 µm-thick lead-tin alloy foil.
同様な方法で行った紫外線照射後のピール強度は1.8Kgf
/cmであり、200℃1時間処理後でも1.5Kgf/cmであっ
た。The peel strength after irradiation with ultraviolet rays was 1.8 Kgf.
/ cm and was 1.5 Kgf / cm even after treatment at 200 ° C for 1 hour.
この積層体は実施例1の方法と同じ方法回路板化可能で
あり、必要に応じて金属箔面上に所望の無電解メッキを
施すことも可能であった。This laminate could be formed into a circuit board by the same method as in Example 1, and desired electroless plating could be applied on the metal foil surface as required.
Claims (1)
シ樹脂、光硬化性樹脂組成物及び溶剤から成るワニスを
塗布乾燥し、接着層付きテープを得、該接着層面に離型
可能な保護フイルムを貼り合せる工程…(工程I) 該3層構成のテープにガイド穴、チップマウント穴及び
位置合せ用穴を打抜く工程…(工程II) 離型フイルムを剥離しながらガイド穴のみを残して、該
テープよりも巾のせまい、スリットされた金属箔を熱ラ
ミネートして積層複合テープを得る工程…(工程III) 金属箔貼り積層板複合テープのポリエーテルイミドフイ
ルム側から活性光を照射して接着層中の光硬化樹脂組成
物成分を硬化せしめる工程…(工程IV) 工程IVで得た金属箔貼り積層複合テープのポリエーテル
イミドフイルム面に最終的に剥離可能なエッチングレジ
スト膜をガイド穴をのぞいて形成する工程…(工程V) からなることを特徴とするフイルムキャリアー用積層複
合テープの製造方法。1. A varnish comprising a phenoxy resin, a photocurable resin composition and a solvent is applied onto a polyetherimide film and dried to obtain a tape with an adhesive layer, and a releasable protective film is attached to the adhesive layer surface. Step (Step I) Step of punching a guide hole, a chip mounting hole, and a positioning hole in the three-layer tape ... (Step II) While peeling the release film, leaving only the guide hole, Process of obtaining laminated composite tape by heat laminating slitted metal foil with narrow width ... (Step III) Irradiating active light from the polyetherimide film side of the metal foil laminated laminate composite tape Step of curing the components of the photocurable resin composition (Step IV) Etching register that can be finally peeled off on the polyetherimide film surface of the metal foil-laminated composite tape obtained in Step IV A method for producing a laminated composite tape for a film carrier, which comprises the step of forming a strike film through a guide hole (step V).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13988187A JPH0740575B2 (en) | 1987-06-05 | 1987-06-05 | Method for producing laminated composite tape for film carrier |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13988187A JPH0740575B2 (en) | 1987-06-05 | 1987-06-05 | Method for producing laminated composite tape for film carrier |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63305522A JPS63305522A (en) | 1988-12-13 |
| JPH0740575B2 true JPH0740575B2 (en) | 1995-05-01 |
Family
ID=15255748
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13988187A Expired - Fee Related JPH0740575B2 (en) | 1987-06-05 | 1987-06-05 | Method for producing laminated composite tape for film carrier |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0740575B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6056641B2 (en) * | 2013-05-07 | 2017-01-11 | 日立化成株式会社 | Adhesive sheet for image display device, method for manufacturing image display device, and image display device |
| KR20210141350A (en) * | 2020-05-14 | 2021-11-23 | 가부시끼가이샤 쓰리본드 | Photocurable composition |
| CN113097120A (en) * | 2021-04-09 | 2021-07-09 | 曹建峰 | Preparation method of thin film sensor based on metal foil substrate |
-
1987
- 1987-06-05 JP JP13988187A patent/JPH0740575B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63305522A (en) | 1988-12-13 |
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