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JPH0742124B2 - Method for forming quartz glass plate - Google Patents
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JPH0742124B2 - Method for forming quartz glass plate - Google Patents

Method for forming quartz glass plate

Info

Publication number
JPH0742124B2
JPH0742124B2 JP17689585A JP17689585A JPH0742124B2 JP H0742124 B2 JPH0742124 B2 JP H0742124B2 JP 17689585 A JP17689585 A JP 17689585A JP 17689585 A JP17689585 A JP 17689585A JP H0742124 B2 JPH0742124 B2 JP H0742124B2
Authority
JP
Japan
Prior art keywords
molding
glass plate
quartz glass
rod
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP17689585A
Other languages
Japanese (ja)
Other versions
JPS6241727A (en
Inventor
重義 小林
進 八馬
政昭 池村
信也 菊川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP17689585A priority Critical patent/JPH0742124B2/en
Publication of JPS6241727A publication Critical patent/JPS6241727A/en
Publication of JPH0742124B2 publication Critical patent/JPH0742124B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00Re-forming shaped glass
    • C03B23/04Re-forming tubes or rods
    • C03B23/049Re-forming tubes or rods by pressing
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B23/00Re-forming shaped glass
    • C03B23/04Re-forming tubes or rods
    • C03B23/055Re-forming tubes or rods by rolling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は石英ガラスプレートの成形方法に関するもので
ある。
TECHNICAL FIELD The present invention relates to a method for forming a quartz glass plate.

[従来の技術] 高純度で無欠点な合成石英ガラス大型プレートは、熱膨
張率が低く、光学特性、化学的耐久性に優れているた
め、ディスプレイ等の基板材料として期待されている。
[Prior Art] High-purity, defect-free large-sized synthetic quartz glass plates have low thermal expansion coefficient, excellent optical characteristics and chemical durability, and are therefore expected as substrate materials for displays and the like.

合成石英ガラスの製造方法の1つとして従来より知られ
ている気相反応法による石英ガラスの製造方法は、バー
ナーから各種原料ガスを石英ガラス製造用種棒に流出さ
せ、珪素化合物を酸水素炎中で加水分解して、鉛直に懸
下された種棒を回転させながら、該種棒にシリカ粒子を
堆積させつつ順次成長させて多孔質母材を成長させ、こ
れを加熱処理しててガラス化する方法である。
As one of the methods for producing synthetic quartz glass, which is conventionally known as a method for producing quartz glass by a gas phase reaction method, various raw material gases are made to flow from a burner to a seed rod for producing quartz glass, and a silicon compound is caused to emit an oxyhydrogen flame. While hydrolyzing in the medium, while rotating the vertically suspended seed rod, silica particles are deposited on the seed rod and sequentially grown to grow a porous base material, which is then heat treated to form glass. It is a method of converting.

また、他の合成石英ガラスの製造方法として従来より知
られているベルヌーイ法による石英ガラスの製造方法
は、バーナーから各種原料ガスを供給し、酸水素炎等の
火炎中で加分解・ガラス化し、ターゲットのボール上に
堆積させてガラスインゴットを得る方法である。
Further, as a method for producing quartz glass by the Bernoulli method, which has been conventionally known as a method for producing other synthetic quartz glass, various raw material gases are supplied from a burner, and decomposed and vitrified in a flame such as an oxyhydrogen flame, It is a method of obtaining a glass ingot by depositing it on a target ball.

前者の方法により製造される合成石英ガラスは、極めて
高純度でかつ無欠点であるが、その製造法上ほぼ円柱状
であり、通常最大5インチの直径程度である。
The synthetic quartz glass produced by the former method is extremely high in purity and has no defects, but due to its production method, it is substantially cylindrical and usually has a maximum diameter of about 5 inches.

一方、従来の方法により製造される合成石英ガラスは、
通常円柱状であり、製造方法によっては、最大200mm〜3
00mm程度の径のものも得られるが、それ以上のものを製
造する事は、技術的に困難であり、また、大型化した場
合には、気泡等を完全に除く事が困難である。
On the other hand, synthetic quartz glass manufactured by the conventional method is
It is usually cylindrical, and depending on the manufacturing method, up to 200 mm-3
Although a diameter of about 00 mm can be obtained, it is technically difficult to manufacture a larger diameter, and when the size is increased, it is difficult to completely remove bubbles and the like.

[発明の解決しようとする問題点] 従って前項に記載の、気相反応法による製造、ベヌーイ
法による製造、いずれの方法によっても、20インチ以上
の大型石英ガラスプレートを製造する事は困難であり、
これらの方法によって得られる高純度石英ガラスインゴ
ットを、加熱加圧処理等により成形加工する必要があ
る。以下高純度石英ガラスの円柱状ロッドを石英ガラス
ロッドまたはガラスロッドと書くことができる。
[Problems to be Solved by the Invention] Therefore, it is difficult to manufacture a large quartz glass plate of 20 inches or more by any of the manufacturing method by the gas phase reaction method and the manufacturing method by the Benouy method described in the preceding paragraph. ,
The high-purity quartz glass ingot obtained by these methods needs to be molded by heating and pressing. Hereinafter, a cylindrical rod of high-purity quartz glass can be referred to as a quartz glass rod or a glass rod.

従来この成形加工の方法として、石英ガラスロッドをカ
ーボン等で作られた成形容器中で1600〜1800℃に加熱
し、上部より加圧する事により成形する方法が知られて
いる(特開昭57-67031号、特開昭57-92528他)。しかし
これらの方法によって歩留りよく成形できる大きさには
限界があり、例えば直径4インチ、長さ0.5mのガラスロ
ッドを用いた場合には8インチ角ブロックにまで成形す
るのが限界であった。これは、成形の過程でロッドが変
形して行く際に、炉内の微妙な温度分布などにより、均
一な変形が進行しない為に発生すると考えられる、ロッ
ド外表面の巻込みによる気泡の発生が原因であった。
Conventionally, as a method of this molding, there is known a method in which a quartz glass rod is heated in a molding container made of carbon or the like at 1600 to 1800 ° C. and pressed from above (Japanese Patent Laid-Open No. 57- 67031, JP-A-57-92528 and others). However, there is a limit to the size that can be formed with a good yield by these methods, and for example, when a glass rod having a diameter of 4 inches and a length of 0.5 m is used, it is a limit to form an 8-inch square block. This is considered to occur because the rod is deformed during the forming process and the uniform deformation does not proceed due to the subtle temperature distribution in the furnace. It was the cause.

[問題点を解決するための手段] 本発明は、前述の問題点を解決すべくなされたものであ
り、高純度石英ガラスの円柱状ロッドを高温下で成形し
て所望の形状のガラスプレートとするに際し、加熱炉内
でカーボンよりなる成形容器を用い、円柱状ロッドの軸
に対し垂直方向から加圧し加熱成形する事を特徴とする
石英ガラスプレートの成形方法を提供するものである。
[Means for Solving Problems] The present invention has been made to solve the above problems, and a cylindrical rod of high-purity silica glass is molded at a high temperature to form a glass plate having a desired shape. In this case, the present invention provides a method for forming a quartz glass plate, characterized by using a forming container made of carbon in a heating furnace and pressurizing from a direction perpendicular to the axis of the cylindrical rod to perform heat forming.

本発明において用いる石英ガラスロッドとしては、前述
した方法により製造された合成石英ガラスの円柱状ロッ
ドを必要な長さに切断し、有機溶媒及び10〜20%の弗酸
で処理し、ロッドに付着した有機及びSiO2以外の金属酸
化物が金属イオンを除去した後、さらに純水で洗浄,乾
燥したものを用いる事が好ましい。
As the quartz glass rod used in the present invention, a synthetic quartz glass cylindrical rod manufactured by the above-mentioned method is cut into a required length, treated with an organic solvent and 10 to 20% hydrofluoric acid, and attached to the rod. It is preferable to use the organic and metal oxides other than SiO 2 after removing the metal ions, further washed with pure water and dried.

これを第1図に示すような形状を有するカーボン、特に
グラファイトよりなる成形容器2,3内にセットし、上部
よりグラファイト製のおもり4を乗せて炉内に定置す
る。炉は、グラファイトヒーターによる抵抗加熱方式の
炉あるいは誘導加熱炉を用いる事が好ましい。
This is set in molding containers 2 and 3 made of carbon having a shape as shown in FIG. 1, particularly graphite, and a weight 4 made of graphite is placed from above and placed in a furnace. The furnace is preferably a resistance heating type furnace using a graphite heater or an induction heating furnace.

本発明に用いる円柱状ガラスロッドは、第2図に示す如
く、あらかじめ研削を行ない加熱成形中にガラスロッド
が底板上をころがったりずれたりしないようにしておく
事が好ましく、その際の形状はロッドの直径d0に対し、
第2図におけるdがd/d0=0.9〜0.99の範囲である事が
好ましく、これ以上では、ガラスロッドが安定せず、ま
たこれ以下では研削シロが大きすぎ歩留りが低下するの
で好ましくない。さらに、このロッドを第1図の成形容
器内にセットするに際しては、第3図に示す如く、成形
後に得られるべき角状ガラスプレートの上面の相対する
2辺の中点を結ぶ直線を含む底板に垂直な平面内に被成
形物であるガラスロッド1の軸がほぼ含まれるようにガ
ラスロッドを横にねかせて設置する事が好ましい。例え
ばこれを底板の対角線上にガラスロッド1の軸が含まれ
るように設置した場合には、加熱成形中にガラスが流動
すべき距離が、ロッド中央部と端部とで大幅に異なる為
に、均一な成形体を得る事が困難となり好ましくない。
As shown in FIG. 2, the cylindrical glass rod used in the present invention is preferably ground in advance to prevent the glass rod from rolling or slipping on the bottom plate during heat forming, and the shape at that time is the rod. For the diameter d 0 of
It is preferable that d in FIG. 2 is in the range of d / d 0 = 0.9 to 0.99. Above this, the glass rod is not stable, and below this range, the grinding white is too large and the yield decreases, which is not preferable. Furthermore, when setting this rod in the molding container of FIG. 1, as shown in FIG. 3, a bottom plate including straight lines connecting the midpoints of two opposite sides of the upper surface of the rectangular glass plate to be obtained after molding. It is preferable to install the glass rod so that it lies sideways so that the axis of the glass rod 1, which is the object to be molded, is substantially included in the plane perpendicular to. For example, when this is installed so that the axis of the glass rod 1 is included on the diagonal line of the bottom plate, the distance that the glass should flow during the heat forming is greatly different between the center part and the end part of the rod, It is not preferable because it is difficult to obtain a uniform molded body.

また、成形容器の基本構成は第1図の如きものが好まし
いが、特に、第3図に示す如く、角状の底板及びこの底
板上に角柱状の成形室が形成されるように縦割型を複数
配設した構造がより好ましい。これは、被成形物である
石英ガラスと成形容器材質のグラファイトの熱膨張率
が、約1ケタ異なる為に加熱成形後、室温まで冷却する
過程で生ずる、ガラス中のビズミ及びクラック等を防止
する効果がある為である。また、特に1700℃以上での成
形を行なう場合には、時としてガラスとグラファイトと
が反応して付着してしまい、ガラスを破損する事がある
ので、その対策として成形容器内面をSiCで被覆してお
くとより効果的である。
Further, the basic constitution of the molding container is preferably as shown in FIG. 1, but in particular, as shown in FIG. 3, a vertically divided mold is formed so that a rectangular bottom plate and a prismatic molding chamber are formed on the bottom plate. A structure in which a plurality of is arranged is more preferable. This is because the thermal expansion coefficient of quartz glass, which is the object to be molded, and graphite, which is the material of the molding container, differ by about one digit, so that it prevents the occurrence of cracks, etc. in the glass that occur during the process of cooling to room temperature after thermoforming. This is because it has an effect. In particular, when molding at 1700 ° C or higher, glass and graphite sometimes react and adhere to each other, and the glass may be damaged.As a countermeasure, coat the inner surface of the molding container with SiC. Is more effective.

本発明において、加熱成形する際の炉内雰囲気は、本発
明を限定する要素とはならないが、グラファイト抵抗加
熱炉を用い成形容器材質としてグラファイトを用いる場
合には、不活性雰囲気である必要があり、特にアルゴン
ないし、窒素雰囲気である事が好ましい。その他の不活
性ガス、例えば、ヘリウムなどでもよい。ただし、ヘリ
ウムは極めて高価な為に、経済性の面からは問題があ
る。
In the present invention, the atmosphere in the furnace at the time of heat molding does not become a limiting element of the present invention, but when graphite is used as the material for the molding container using the graphite resistance heating furnace, it must be an inert atmosphere. It is particularly preferable that the atmosphere is argon or nitrogen. Other inert gas such as helium may be used. However, since helium is extremely expensive, there is a problem in terms of economy.

また、本発明において採用される成形温度は被成形物で
ある石英ガラスロッドの粘により一概には決まらない
が、おおむね、1600〜1800℃の範囲が好ましい。これよ
り低温の場合には、石英ガラスの失透が激しく、また高
粘度のため、実際的には成形を行なう事が出来ず、ま
た、これより高温の場合には石英ガラスからのSiO2の飛
散が激しく、歩留の低下及び炉の損傷を来たすので好ま
しくない。
The molding temperature adopted in the present invention is not generally determined depending on the viscosity of the quartz glass rod which is the object to be molded, but it is preferably in the range of 1600 to 1800 ° C. In the case than the low temperature which, severe devitrification of the quartz glass, and because of the high viscosity, practical not able to perform the shaping in, also, of SiO 2 of silica glass in the case from the high temperature which It is not preferable because it causes severe scattering, which lowers the yield and damages the furnace.

また、被成形物であるガラスロッドの大きさは、ガラス
ロッドの長さl0と成形後に得られるガラスプレートの長
辺の長さl0との比l0/l1が0.5〜1.0の範囲である事が好
ましい。これよりも小さい場合には、本発明の主要な構
成要件であるロッドの軸に対し垂直な方向から成形する
という主旨が生かされず均一なガラスプレートを寸法精
度よく得る事が困難となる。
The size of the glass rod as an object to be molded, the range of the ratio l 0 / l 1 of the length l 0 of the long sides of the glass plate obtained after molding and the length l 0 of the glass rod is 0.5 to 1.0 Is preferred. If the size is smaller than this, it is difficult to obtain a uniform glass plate with high dimensional accuracy, because the main component of the present invention, that is, the purpose of forming from the direction perpendicular to the axis of the rod, is not utilized.

また、ガラスロッドの直径d0と成形後のガラスプレート
の短辺の長さl2との比が、d0/l2=0.1〜0.6である事が
好ましいが、これも上述の理由による。
Further, the ratio of the diameter d 0 of the glass rod to the length l 2 of the short side of the glass plate after molding is preferably d 0 / l 2 = 0.1 to 0.6, but this is also due to the above reason.

[実施例] 実施例1 四塩化ケイ素を原料として製造した、直径120mm、長さ5
00mm、重量12.4kgの合成石英ガラスインゴットを、底板
の内寸が510mm角の第3図に示した如き、グラファイト
製成形容器(ガラスと接触する内面に、炭化珪素粉末
(イビ川電工製、β−ランダム)を0.5mmの厚さで塗
布)に入れ、最大出力250kwのカーボンを発熱体とする9
000mm(内径)×800mm(高さ)の炉内寸法を有する電気
炉内にセットした。その際、インゴットの上面の押棒に
グラファイトの錘りを乗せ、インゴット上面にかかる荷
重が50kgとなるように調節した。
[Example] Example 1 Diameter 120 mm and length 5 produced from silicon tetrachloride as a raw material.
A synthetic quartz glass ingot of 00 mm in weight and 12.4 kg in weight was molded into a graphite molding container as shown in FIG. 3 in which the inner dimension of the bottom plate was 510 mm square. -Random) is applied in a thickness of 0.5 mm) and carbon with a maximum output of 250 kw is used as a heating element 9
It was set in an electric furnace having inner dimensions of 000 mm (inner diameter) x 800 mm (height). At that time, a graphite weight was placed on the push rod on the upper surface of the ingot, and the load applied to the upper surface of the ingot was adjusted to be 50 kg.

次いで、炉内を真空ポンプで引き、0.05トールまで減圧
に引いた後、引き続き減圧に引きながら、昇温を開始し
た。2時間で1000℃迄昇温したところで、真空ポンプを
停止し、アルゴンガスを炉内に導入して1気圧とした。
この後2時間で1750℃に昇温し、4時間保持した。
Then, the inside of the furnace was evacuated by a vacuum pump to reduce the pressure to 0.05 Torr, and then the temperature increase was started while continuously reducing the pressure. When the temperature was raised to 1000 ° C. in 2 hours, the vacuum pump was stopped and argon gas was introduced into the furnace to 1 atmospheric pressure.
After that, the temperature was raised to 1750 ° C. in 2 hours and kept for 4 hours.

この後1250℃まで1時間で降温し、次いで1000℃まで40
℃/hrで降温し、電気炉の電源を切り放冷した。そして
炉内温度が室温まで冷却した事を確認した後、グラファ
イト製成形容器を炉から取出した。成形後のインゴット
の重量は12.3kgで一辺が511mm、厚み21mmの角状プレー
トであり、内部には巻込み気泡は観察されず、極めてき
れいであった。
After this, the temperature is lowered to 1250 ° C in 1 hour, then to 1000 ° C 40
The temperature was lowered at ° C / hr, the electric furnace power was turned off, and the system was allowed to cool. After confirming that the temperature inside the furnace had cooled to room temperature, the graphite molding container was taken out of the furnace. The weight of the ingot after molding was 12.3 kg, which was a square plate having a side of 511 mm and a thickness of 21 mm, and no entrapped bubbles were observed inside, and it was extremely clean.

実施例2 四塩化ケイ素を原料として製造した、直径120mm、長さ5
00mm、重量12.4kgの合成石英ガラスインゴットを、第2
図に示した如く底面を研削し、d0=120mm,d=115mm(d/
d0=0.96)重量12.3kgとした後、パークロルエチレン及
び10%HF中で洗浄後、水洗乾燥した。これを底板の内寸
が510mm角の第3図に示した如きグラファイト製成形容
器(ガラスと接触する内面に、炭化珪素粉末(イビ川電
工製、β−ランダム)を0.5mmの厚さで塗布)に入れ、
最大出力250kwのカーボンを発熱体とする900mm(内径)
×800mm(高さ)の炉内寸法を有する電気炉内にセット
した。その際、インゴットの上面の押板にグラファイト
の錘りを乗せ、インゴット上面にかかる荷重が50kgとな
るように調節した。
Example 2 Diameter 120 mm and length 5 produced from silicon tetrachloride as a raw material
The second is a synthetic quartz glass ingot with a diameter of 00 mm and a weight of 12.4 kg.
The bottom surface was ground as shown in the figure, and d 0 = 120 mm, d = 115 mm (d /
d 0 = 0.96) After setting the weight to 12.3 kg, it was washed in perchlorethylene and 10% HF, washed with water and dried. This was coated with a graphite molding container (inside of which the glass is in contact with glass) of silicon carbide powder (β-random, made by Ibikawa Electric Co., Ltd., β-random) with a thickness of 0.5 mm as shown in FIG. )put in,
900mm (inner diameter) with carbon of maximum output 250kw as heating element
It was set in an electric furnace having a furnace size of × 800 mm (height). At that time, a graphite weight was placed on the push plate on the upper surface of the ingot, and the load applied to the upper surface of the ingot was adjusted to 50 kg.

次いで、炉内を真空ポンプで引き、0.05トールまで減圧
に引いた後、引き続き減圧に引きながら昇温を開始し
た。2時間で1000℃迄昇温したところで、真空ポンプを
停止し、アルゴンガスを炉内に導入して1気圧とした。
この後2時間で1750℃に昇温し、4時間保持した。
Next, the inside of the furnace was evacuated by a vacuum pump to reduce the pressure to 0.05 Torr, and then the temperature was started while continuously reducing the pressure. When the temperature was raised to 1000 ° C. in 2 hours, the vacuum pump was stopped and argon gas was introduced into the furnace to 1 atmospheric pressure.
After that, the temperature was raised to 1750 ° C. in 2 hours and kept for 4 hours.

この後1250℃まで1時間で降温し、次いで1000℃まで40
℃/hrで降温し、電気炉の電源を切り放冷した。そして
炉内温度が室温まで冷却した事を確認した後、グラファ
イト製成形容器を炉から取出し、成形インゴットを取り
出した。
After this, the temperature is lowered to 1250 ° C in 1 hour, then to 1000 ° C 40
The temperature was lowered at ° C / hr, the electric furnace power was turned off, and the system was allowed to cool. Then, after confirming that the temperature inside the furnace was cooled to room temperature, the graphite molding container was taken out of the furnace and the molding ingot was taken out.

インゴットの重量は12.2kgで一辺が511mmで厚み21mmの
角状プレートで、内部には巻込み気泡は観察されず、極
めてきれいであった。
The ingot weighed 12.2 kg, was a square plate with a side of 511 mm and a thickness of 21 mm, and it was extremely clean without any entrained bubbles inside.

また、加熱加圧に先立ち、合成石英ガラスインゴットの
側面面を研削したことにより極めて安定した加圧成形を
行うことができた。
Further, since the side surface of the synthetic quartz glass ingot was ground prior to heating and pressing, extremely stable pressure molding could be performed.

比較例 四塩化ケイ素を原料として製造した、直径120mm、長さ4
00mm、重量10.0kgの合成石英ガラスインゴットを、底板
の内寸が510mm角の第4図に示した如き、グラファイト
製成形容器(ガラスと接触する内面に、炭化珪素粉末
(イビ川電工製、β−ランダム)を0.5mmの厚さで塗
布)に、ガラスロッドの軸が成形容器の底板面に垂直と
なるように入れ、実施例1と同一の炉内にセットした。
その際、インゴットの上面の押板にグラファイトの錘り
を乗せ、インゴット上面にかかる荷重が50kgとなるよう
に調節した。
Comparative example manufactured using silicon tetrachloride as a raw material, diameter 120 mm, length 4
A synthetic quartz glass ingot of 00 mm in weight and 10.0 kg in weight was molded into a graphite molding container as shown in Fig. 4 with a bottom plate of 510 mm square. -Random) was applied in a thickness of 0.5 mm) so that the axis of the glass rod was perpendicular to the bottom plate surface of the molding container, and the same was set in the same furnace as in Example 1.
At that time, a graphite weight was placed on the push plate on the upper surface of the ingot, and the load applied to the upper surface of the ingot was adjusted to 50 kg.

次いで、炉内を真空ポンプで引き、0.05トールまで減圧
に引いた後、引き続き減圧に引きながら昇温を開始し
た。2時間で1000℃迄昇温したところで、真空ポンプを
停止し、アルゴンガスを炉内に導入して1気圧とした。
この後2時間で1750℃に昇温し、4時間保持した。
Next, the inside of the furnace was evacuated by a vacuum pump to reduce the pressure to 0.05 Torr, and then the temperature was started while continuously reducing the pressure. When the temperature was raised to 1000 ° C. in 2 hours, the vacuum pump was stopped and argon gas was introduced into the furnace to 1 atmospheric pressure.
After that, the temperature was raised to 1750 ° C. in 2 hours and kept for 4 hours.

この後1250℃まで1時間で降温し、次いで1000℃まで45
℃/hrで降温し、電気炉の電源を切り放冷した。そして
炉内温度が室温まで冷却した事を確認した後、グラファ
イト製成形容器を炉から取出し、成形インゴットを取り
出した。
After this, the temperature is lowered to 1250 ° C in 1 hour and then to 1000 ° C 45
The temperature was lowered at ° C / hr, the electric furnace power was turned off, and the system was allowed to cool. Then, after confirming that the temperature inside the furnace was cooled to room temperature, the graphite molding container was taken out of the furnace and the molding ingot was taken out.

インゴットの重量は9.9kgで、一辺が511mmで厚みが17mm
の角状プレートであったが、プレート内部に、ガラスロ
ッドが成形中に折れ曲って発生したと考えられる巻き込
み気泡が多数観察された。
The ingot weighs 9.9 kg, has a side of 511 mm and a thickness of 17 mm.
However, many entrapped air bubbles were observed inside the plate, which are considered to be generated by bending the glass rod during molding.

上記の実施例では成形後の石英ガラスはプレート状であ
るが、本発明はプレートに限定されるものではなく、一
般に底面寸法に対して厚みの厚いブロック状の石英ガラ
ス成形体を得る場合にも適用できる。
In the above-mentioned embodiment, the quartz glass after molding has a plate shape, but the present invention is not limited to the plate, and generally when obtaining a block-shaped quartz glass molded body having a large thickness with respect to the bottom dimension. Applicable.

[発明の効果] 以上説明したように本発明によれば、高純度石英ガラス
の円柱状ロッドから小型、中型のものは勿論、大型のガ
ラスプレートを歩留り良く得る事が出来、従来その製造
が困難であった高純度大型石英ガラスプレートを製造す
ることができる。
[Effects of the Invention] As described above, according to the present invention, it is possible to obtain not only small-sized and medium-sized cylindrical plates of high-purity silica glass but also large-sized glass plates with a high yield, and it is difficult to manufacture them conventionally. It is possible to manufacture a high-purity large-scale quartz glass plate which was

しかも、成形前のガラスロッドの大きさを適当に選定す
る事により、任意の厚さのプレートが得られるため、ブ
ロックからスライスする等の工程を経ずして歩留り良
く、任意の厚さの大型ガラスプレートを得る事が出来
る。
Moreover, by appropriately selecting the size of the glass rod before molding, a plate with an arbitrary thickness can be obtained, so that the yield is good without the step of slicing from the block, and the large size of the arbitrary thickness can be obtained. You can get a glass plate.

【図面の簡単な説明】[Brief description of drawings]

第1図は、成形容器の説明図であり、第2図(a)は被
成形物であるガラスロッドを研削した形状を示すロッド
の軸に垂直な断面図、第2図(b)は同じく側面図であ
る。第3図は、縦割型を複数配設した成形容器構造の一
実施例を示す説明図である。第4図は従来例を示す説明
図である。 1……ガラスロッド、2,3……成形容器、 4……錘り、5……割型容器の側板、 6……割型固定用ボルト、 7……割型容器の底板
FIG. 1 is an explanatory view of a molding container, FIG. 2 (a) is a cross-sectional view perpendicular to the axis of the rod showing the shape of a glass rod that is the object to be molded, and FIG. 2 (b) is the same. It is a side view. FIG. 3 is an explanatory view showing an embodiment of a molding container structure in which a plurality of vertical split molds are arranged. FIG. 4 is an explanatory view showing a conventional example. 1 ... glass rod, 2,3 ... molded container, 4 ... weight, 5 ... split container side plate, 6 ... split mold fixing bolt, 7 ... split container bottom plate

Claims (10)

【特許請求の範囲】[Claims] 【請求項1】高純度石英ガラスの円柱状ロッドを高温下
で成形して所望の形状のガラスプレートとするに際し、
加熱炉内で成形容器内におかれた前記円柱状ロッドを、
該円柱状ロッドの軸に対し垂直な方向から加圧し加熱成
形することを特徴とする石英ガラスプレートの成形方
法。
1. When molding a cylindrical rod of high-purity quartz glass at a high temperature to form a glass plate having a desired shape,
The cylindrical rod placed in the molding container in the heating furnace,
A method for forming a quartz glass plate, which comprises pressurizing and heating from a direction perpendicular to the axis of the cylindrical rod.
【請求項2】成形容器の底板上に該底板と前記ガラスロ
ッドの軸が平行あるいはほぼ平行になるようにおかれた
該ガラスロッドを所望の形状のガラスプレートとほぼ同
じ大きさの平面を有する押板を通して上部より加圧する
ことを特徴とする特許請求の範囲第1項記載の石英ガラ
スプレートの成形方法。
2. The glass rod, which is placed on the bottom plate of the molding container such that the axes of the bottom plate and the glass rod are parallel or substantially parallel to each other, has a flat surface having substantially the same size as a glass plate of a desired shape. The method for molding a quartz glass plate according to claim 1, wherein pressure is applied from above through a pressing plate.
【請求項3】成形容器の底板に接する面ならびに押板に
接する面を研削したガラスロッドを、底板に垂直な平面
であって、成形後に得られる長方形のガラスプレートの
上面の相対する2辺の中点を結ぶ直線を含む平面内、前
記ガラスロッド軸がほぼ含まれるよう前記成形容器の底
板上におくことを特徴とする特許請求の範囲第2項記載
の石英ガラスプレートの成形方法。
3. A glass rod, the surface of which is in contact with the bottom plate of the molding container and the surface of which is in contact with the pressing plate, is ground, and is a plane perpendicular to the bottom plate. The method for molding a quartz glass plate according to claim 2, wherein the glass rod axis is placed on the bottom plate of the molding container so as to substantially include the glass rod axis in a plane including a straight line connecting the midpoints.
【請求項4】成形容器が、所望のガラスプレートの形状
をもつ底板の上に縦割型を複数配設してなり、前記底板
上に、前記所望形状の底面を有する柱状の成形室を形成
することを特徴とする特許請求の範囲第1項記載の石英
ガラスプレートの成形方法。
4. A molding container comprises a bottom plate having a desired glass plate shape and a plurality of vertical split molds disposed on the bottom plate, and a columnar molding chamber having a bottom surface of the desired shape is formed on the bottom plate. The method for forming a quartz glass plate according to claim 1, wherein
【請求項5】加熱炉内の雰囲気がアルゴン、窒素、ヘリ
ウムから選ばれた1種の雰囲気であることを特徴とする
特許請求の範囲第1項記載の石英ガラスプレートの成形
方法。
5. The method for molding a quartz glass plate according to claim 1, wherein the atmosphere in the heating furnace is one atmosphere selected from argon, nitrogen and helium.
【請求項6】成形温度が1600〜1800℃である特許請求の
範囲第1項記載の石英ガラスプレートの成形方法。
6. The method for molding a quartz glass plate according to claim 1, wherein the molding temperature is 1600 to 1800 ° C.
【請求項7】所望のガラスプレートの形状が長方形であ
って、ガラスロッドの軸の長さl0と成形後に得られる長
方形ガラスプレートの長辺の長さl1との比l0/l1が0.5〜
1.0の範囲であることを特徴とする特許請求の範囲第1
項記載の石英ガラスプレートの成形方法。
7. The desired glass plate shape is rectangular and the ratio l 0 / l 1 of the axial length l 0 of the glass rod to the long side length l 1 of the rectangular glass plate obtained after molding. Is 0.5 ~
Claim 1 characterized by being in the range of 1.0
A method for forming a quartz glass plate according to the item.
【請求項8】所望のガラスプレートの形状が長方形であ
って、ガラスロッドの断面の直径d0と成形後に得られる
長方形ガラスプレートの短辺の長さl2との比d0/l2が0.1
〜0.6の範囲であることを特徴とする特許請求の範囲第
1項記載の石英ガラスプレートの成形方法。
8. A desired glass plate has a rectangular shape, and the ratio d 0 / l 2 of the diameter d 0 of the cross section of the glass rod and the length l 2 of the short side of the rectangular glass plate obtained after molding is obtained. 0.1
The method for forming a quartz glass plate according to claim 1, wherein the range is from 0.6 to 0.6.
【請求項9】成形容器がカーボンよりなることを特徴と
する特許請求の範囲第1項、第2項、第3項または第4
項記載の石英ガラスプレートの成形方法。
9. A molded container made of carbon, as claimed in claim 1, claim 2, claim 3 or claim 4.
A method for forming a quartz glass plate according to the item.
【請求項10】前記成形容器の内面をSiC被覆したこと
を特徴とする特許請求の範囲第9項記載の石英ガラスプ
レートの成形方法。
10. The method for molding a quartz glass plate according to claim 9, wherein the inner surface of the molding container is coated with SiC.
JP17689585A 1985-08-13 1985-08-13 Method for forming quartz glass plate Expired - Fee Related JPH0742124B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17689585A JPH0742124B2 (en) 1985-08-13 1985-08-13 Method for forming quartz glass plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17689585A JPH0742124B2 (en) 1985-08-13 1985-08-13 Method for forming quartz glass plate

Publications (2)

Publication Number Publication Date
JPS6241727A JPS6241727A (en) 1987-02-23
JPH0742124B2 true JPH0742124B2 (en) 1995-05-10

Family

ID=16021625

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17689585A Expired - Fee Related JPH0742124B2 (en) 1985-08-13 1985-08-13 Method for forming quartz glass plate

Country Status (1)

Country Link
JP (1) JPH0742124B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2646148B2 (en) * 1990-07-31 1997-08-25 株式会社クリーンオプチカル Glass molding machine and glass block molding method using it
JP4760137B2 (en) * 2005-05-27 2011-08-31 株式会社ニコン Method of forming quartz glass
JP2007106663A (en) * 2005-09-15 2007-04-26 Toshiba Ceramics Co Ltd Method for producing silica glass
JP4534957B2 (en) * 2005-11-09 2010-09-01 旭硝子株式会社 Method for molding silica glass containing TiO2
JP7726682B2 (en) * 2021-06-29 2025-08-20 株式会社豊田中央研究所 Molding device and molding method

Also Published As

Publication number Publication date
JPS6241727A (en) 1987-02-23

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