JPH0744227B2 - Semiconductor memory device - Google Patents
Semiconductor memory deviceInfo
- Publication number
- JPH0744227B2 JPH0744227B2 JP60180951A JP18095185A JPH0744227B2 JP H0744227 B2 JPH0744227 B2 JP H0744227B2 JP 60180951 A JP60180951 A JP 60180951A JP 18095185 A JP18095185 A JP 18095185A JP H0744227 B2 JPH0744227 B2 JP H0744227B2
- Authority
- JP
- Japan
- Prior art keywords
- bit line
- memory cell
- power supply
- bit
- distance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
Landscapes
- Static Random-Access Memory (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Semiconductor Memories (AREA)
Description
【発明の詳細な説明】 〔概要〕 本発明は、半導体記憶装置に於いて、正規のメモリ・セ
ルが接続されている複数のビット線対と、二対のビット
線対の間にビット線と略平行に延在する電源線とを備え
た正規のメモリ・セル群と、前記正規のメモリ・セルに
欠陥がある場合に前記欠陥がある正規のメモリ・セルを
代替する冗長用メモリ・セルからなる冗長用メモリ・セ
ル群とを有する半導体装置であって、 少なくとも前記正規のメモリ・セル群は、 l1<l2<l3 l1:ビット線対を構成する2本のビット線間の距離 l2:ビット線対間の距離 l3:ビット線と電源線間の距離 の関係を維持してなることに依り、半導体記憶装置に大
きなダメージを与える短絡が発生することを予防するよ
うにしたものである。DETAILED DESCRIPTION OF THE INVENTION [Outline] The present invention relates to a semiconductor memory device in which a plurality of bit line pairs to which normal memory cells are connected and a bit line between two bit line pairs are provided. From a normal memory cell group having a power supply line extending substantially in parallel, and a redundant memory cell replacing the defective normal memory cell when the normal memory cell is defective. And a redundant memory cell group, wherein at least the normal memory cell group is l1 <l2 <l3 l1: distance between two bit lines forming a bit line pair l2: bits Distance between line pairs l3: The relationship between the distance between the bit line and the power supply line is maintained to prevent the occurrence of a short circuit that causes great damage to the semiconductor memory device.
本発明は、同じ導電層を利用して平行に形成された複数
のビット線対と複数の電源線とを有する半導体記憶装置
の改良に関する。The present invention relates to an improvement in a semiconductor memory device having a plurality of bit line pairs and a plurality of power supply lines formed in parallel using the same conductive layer.
第2図は通常の半導体記憶装置を表す要部回路図であ
る。FIG. 2 is a circuit diagram of a main part of a normal semiconductor memory device.
図に於いて、C00,C01,C10,C11はメモリ・セル、CR0,CR1
は冗長メモリ・セル、BLR,▲▼R,BL0,▲▼0,BL
1,▲▼1はビット線、WL0,WL1はワード線、VCCは正
側電源レベル、VSSは接地側電源レベル、DB及び▲
▼はデータ・バス、BS0,BS1はビット線選択信号、BSRは
冗長ビット線選択信号、Q1及びQ2はメモリ・セルに於け
るドライバ用トランジスタ、Q3及びQ4はトランスファ・
ゲート用トランジスタ、R1及びR2は抵抗、N1,N2,N3,N4
はノード、Pは短絡電流をそれぞれ示している。In the figure, C 00 , C 01 , C 10 , C 11 are memory cells, and C R0 , C R1
Is a redundant memory cell, BL R , ▲ ▼ R , BL 0 , ▲ ▼ 0 , BL
1 , ▲ ▼ 1 is a bit line, WL 0 , WL 1 is a word line, V CC is a positive power supply level, V SS is a ground power supply level, DB and ▲
▼ data bus, BS 0, BS 1 is the bit line selection signals, BS R is redundant bit line selection signal, Q 1 and Q 2 transistor in driver memory cells, Q 3 and Q 4 Transfer
Gate transistor, R 1 and R 2 are resistors, N1, N2, N3, N4
Indicates a node, and P indicates a short-circuit current.
第3図は第2図に見られる半導体記憶装置のレイアウト
を表す要部平面説明図であり、第2図に於いて用いた記
号と同記号は同部分を表すか或いは同じ意味を持つもの
とする。FIG. 3 is an explanatory plan view of an essential part showing the layout of the semiconductor memory device shown in FIG. 2, and the same symbols as those used in FIG. 2 represent the same parts or have the same meanings. To do.
図に於いて、CTは電極コンタクト部分を示している。In the figure, CT indicates an electrode contact portion.
第2図及び第3図から明らかなように、この半導体記憶
装置は、冗長メモリ・セルCR0,CR1等を備えているの
で、正規のメモリ・セル、例えばメモリ・セルC00に欠
陥がある場合、ビット線選択信号BS0の代わりに冗長ビ
ット線選択信号BSRを用い、ビット線BL0及びBL0に関連
するメモリ・セルをビット線BLR及び▲▼Rに関連
する冗長メモリ・セルに代替して半導体記憶装置を救済
することができる。As is apparent from FIGS. 2 and 3, since this semiconductor memory device includes redundant memory cells C R0 , C R1 etc., there is no defect in a normal memory cell, for example, memory cell C 00. in some cases, redundant memory associated with the redundancy bit line selection signal BS R instead of the bit line selection signals BS 0, a memory cell associated with the bit lines BL 0 and BL 0 to the bit line BL R and ▲ ▼ R The semiconductor memory device can be repaired by replacing the cell.
第4図は他の従来例のレイアウトを表す要部平面説明図
であり、第2図及び第3図に於いて用いた記号と同記号
は同部分を表すか或いは同じ意味を持つものとする。FIG. 4 is an explanatory plan view of an essential part showing another conventional layout, and the same symbols as those used in FIGS. 2 and 3 represent the same parts or have the same meanings. .
この従来例が第2図及び第3図に示した従来例と相違す
る点は、二対のビット線が接地側電源レベルVSSを供給
する一本の電源線を共用していることであり、例えば、
ビット線BL0及び▲▼0の対とビット線BLR及び▲
▼Rの対との間に在って接地側電源レベルVSSを供給
する電源線を共用している。This conventional example differs from the conventional example shown in FIGS. 2 and 3 in that two pairs of bit lines share one power supply line for supplying the ground-side power supply level V SS . , For example,
Bit line BL 0 and ▲ ▼ 0 pair and bit line BL R and ▲
▼ A power supply line for supplying the ground-side power supply level V SS is shared between the R pair.
前記説明した何れの実施例に於いても、ビット線BL0等
と接地側電源レベルVSS供給用電源線とは同じ導電層を
用いられているので、互いに隣接し且つ平行に形成され
ている。In any of the above-described embodiments, since the bit line BL 0 and the like and the ground-side power supply level V SS supply power supply line use the same conductive layer, they are formed adjacent to and parallel to each other. .
近年、前記のような半導体記憶装置の集積度は更に高め
られつつあり、従って、ビット線や電源線の間隔も極め
て狭くなっていて、製造プロセス上で発生する欠陥に起
因し、ビット線と電源線との短絡を生ずる機会が多くな
っている。In recent years, the degree of integration of the semiconductor memory device as described above has been further increased, and therefore, the distance between the bit lines and the power supply lines has become extremely narrow, and the bit lines and the power supply lines are caused by the defects generated in the manufacturing process. There are increasing opportunities for shorts with wires.
第2図及び第3図に関して説明したように、メモリ・セ
ルC00が欠陥メモリ・セルとなった場合、若し、その理
由が、ビット線BL0と接地側電源レベルVSS供給用電源線
との短絡であれば、第2図に矢印Pで示すような短絡電
流が流れる。As described with reference to FIGS. 2 and 3, if the memory cell C 00 becomes a defective memory cell, the reason is that the bit line BL 0 and the power supply line for supplying the ground side power supply level V SS are supplied. In the case of a short circuit with, a short circuit current as indicated by arrow P in FIG. 2 flows.
この場合、前記したように、欠陥メモリ・セル及びそれ
が接続されているビット線に関連する他の全てのメモリ
・セルも正常な動作をする冗長メモリ・セルに代替する
ことで半導体記憶装置を救済することが可能であるが、
仮令、そのようにして救済措置が採られたとしても、前
記短絡電流Pは依然として流れ続けるので、その半導体
記憶装置は無駄な消費電流が多いものとなり、場合によ
っては、実用にならないものとなる。このような問題
は、第2図及び第3図に見られる従来例に限られず、第
4図に示されている従来例に於いても同様である。In this case, as described above, the defective memory cell and all the other memory cells associated with the bit line to which the defective memory cell is connected are replaced with redundant memory cells that operate normally, so that the semiconductor memory device is replaced. It is possible to relieve,
Even if the provisional decree is taken, the short-circuit current P still continues to flow, so that the semiconductor memory device consumes a large amount of wasted current and in some cases is not practical. Such a problem is not limited to the conventional example shown in FIGS. 2 and 3, but is the same in the conventional example shown in FIG.
本発明は、各ビット線間の間隔或いはビット線と電源線
との間隔を適切に選定することで、特に、ビット線と電
源線とが短絡する機会を低減させ、半導体記憶装置の製
造歩留り及び信頼性を向上しようとするものである。The present invention reduces the chances of short-circuiting between the bit line and the power supply line by appropriately selecting the spacing between the bit lines or the spacing between the bit line and the power supply line, thereby reducing the manufacturing yield of the semiconductor memory device. It aims to improve reliability.
本発明の半導体記憶装置に於いては、メモリ・セルが接
続されている複数のビット線と、二対のビット線対の間
にビット線と略平行に延在する電源線とを備え、 l1<l2<l3 l1:ビット線対を構成する2本のビット線間の距離 l2:ビット線対間の距離 l3:ビット線と電源線間の距離 の関係を維持するようにしている。The semiconductor memory device of the present invention comprises a plurality of bit lines to which memory cells are connected, and a power supply line extending substantially parallel to the bit lines between two pairs of bit lines. <L2 <l3 l1: Distance between two bit lines that make up a bit line pair l2: Distance between bit line pairs l3: Distance between bit line and power supply line is maintained.
半導体記憶装置に於ける各配線間に生じた短絡を冗長救
済する場合、 ビット線対を構成する2本のビット線間に短絡があ
った際には当該ビット線を含む1列を冗長メモリ・セル
列の1列に依って代替することで救済可能である。When a short circuit between wirings in a semiconductor memory device is redundantly repaired, when a short circuit occurs between two bit lines forming a bit line pair, one column including the bit line is replaced by a redundant memory It can be relieved by substituting one of the cell columns.
隣接列のビット線間に短絡があった際には短絡され
た2列を冗長メモリ・セル列の2列に依って代替するこ
とで救済可能であるが、前記の場合と比較すると、半
導体記憶装置にはより多くの冗長メモリ・セル列を用意
しておく必要がある。When there is a short circuit between the bit lines of the adjacent columns, it is possible to remedy it by replacing the shorted two columns with the two columns of the redundant memory cell columns. The device needs to have more redundant memory cell columns available.
ビット線と電源線間に短絡があった際には短絡ビッ
ト線列を冗長メモリ・セル列に代替しても短絡電流は流
れ続けることになり、救済不可能になることが多い。When there is a short circuit between the bit line and the power supply line, even if the short-circuited bit line string is replaced with the redundant memory cell string, the short-circuit current continues to flow, and it is often impossible to relieve.
従って、半導体記憶装置に於いては、ビット線対を構成
するビット線間、隣接列のビット線間、ビット線と電源
線間の順に短絡確率が小さくなるように各配線を構成し
ておくことが製造歩留り及び信頼性を向上させる上で有
効である。Therefore, in the semiconductor memory device, each wiring should be configured such that the short circuit probability decreases in the order between the bit lines forming the bit line pair, between the bit lines in the adjacent column, and between the bit line and the power supply line. Is effective in improving the manufacturing yield and reliability.
本発明に於ける前記手段に依ると、短絡が発生する確率
はビット線対を構成する2本のビット線間が最も多くな
り、その次にビット線対間、そして、ビット線と電源線
間が最も少なくなることは明らかである。According to the means of the present invention, the probability of occurrence of a short circuit is greatest between two bit lines forming a bit line pair, then between the bit line pairs, and between the bit line and the power supply line. Is clearly the least.
第1図は本発明一実施例に於けるレイアウトを表す要部
平面説明図であり、第2図乃至第4図に於いて用いた記
号と同記号は同部分を表すか或いは同じ意味を持つもの
とする。FIG. 1 is an explanatory plan view of an essential part showing a layout in one embodiment of the present invention. The same symbols as those used in FIGS. 2 to 4 represent the same parts or have the same meaning. I shall.
図に於いて、l1はビット線対を構成する2本のビット線
間の距離、l2はビット線対間の距離、l3はビット線と接
地側電源レベルVSS供給用電源線間の距離を示してい
る。In the figure, l1 is the distance between the two bit lines that make up the bit line pair, l2 is the distance between the bit line pairs, and l3 is the distance between the bit line and the power supply line for supplying the ground side power level V SS. Shows.
本発明の場合、 l1<l2<l3 の関係を維持するようにビット線及び電源線を形成する
ことは前記した通りである。尚、本実施例に於いては、
図から判るように、ビット線を電極コンタクト部分CTに
対して偏倚させることに依り、必要な間隔を得る一助と
していることが理解されよう。In the case of the present invention, the bit line and the power line are formed so as to maintain the relationship of l1 <l2 <l3, as described above. Incidentally, in this embodiment,
As can be seen, it will be appreciated that the biasing of the bit lines with respect to the electrode contact portion CT helps to obtain the required spacing.
このような構成にすると、ビット線対をなす2本のビッ
ト線間に短絡を生ずることが最も多くなるが、この場
合、一列分のメモリ・セルを冗長メモリ・セルに代替す
れば半導体記憶装置は救済され、且つ、第2図に関して
説明したような無駄な消費電流は流れない。また、ビッ
ト線対間に短絡を生ずることは前記ビット線間に短絡が
発生するよりも少なくなり、そして、短絡を生じたとし
ても、二列分のメモリ・セルを冗長メモリ・セルで代替
すれば半導体記憶装置は救済され、しかも、この場合も
前記と同様に無駄な消費電流は流れない。また、ビット
線と電源線間に短絡が生じた場合には、第2図乃至第4
図に関して説明したような短絡電源Pが流れる点に於い
ては従来例と変わりないが、ビット線と電源線間の距離
l3が最も広いのであるから、その機会は前記ビット線対
間に短絡が発生するよりも更に少なくなる。With such a configuration, a short circuit will most often occur between two bit lines forming a bit line pair. In this case, if a memory cell for one column is replaced with a redundant memory cell, a semiconductor memory device is formed. Is relieved, and no unnecessary current consumption as described with reference to FIG. 2 flows. Also, a short circuit between bit line pairs is less than a short circuit between the bit lines, and even if a short circuit occurs, two columns of memory cells can be replaced by redundant memory cells. For example, the semiconductor memory device is relieved, and in this case as well, useless consumption current does not flow as in the above case. In addition, when a short circuit occurs between the bit line and the power supply line, the short circuit shown in FIGS.
The point that the short-circuit power supply P flows as described in the figure is the same as the conventional example, but the distance between the bit line and the power supply line
Since l3 is the widest, the chances are even less than the occurrence of a short circuit between the bit line pair.
本発明は、半導体記憶装置に於いて、正規のメモリ・セ
ルが接続されている複数のビット線対と、二対のビット
線対の間にビット線と略平行に延在する電源線とを備え
た正規のメモリ・セル群と、前記正規のメモリ・セルに
欠陥がある場合に前記欠陥がある正規のメモリ・セルを
代替する冗長用メモリ・セルからなる冗長用メモリ・セ
ル群とを有する半導体装置であって、少なくとも前記正
規のメモリ・セル群は、ビット線対を構成する2本のビ
ット線間の距離をl1、ビット線対間の距離をl2、ビット
線と電源線間の距離をl3として、l1<l2<l3の関係を維
持する構成を採っている。According to the present invention, in a semiconductor memory device, a plurality of bit line pairs to which regular memory cells are connected, and a power supply line extending substantially parallel to the bit lines between the two pairs of bit lines are provided. And a redundant memory cell group including a redundant memory cell that replaces the defective normal memory cell when the regular memory cell is defective. In a semiconductor device, at least the normal memory cell group has a distance between two bit lines forming a bit line pair as l1, a distance between bit line pairs as l2, and a distance between bit lines and power supply lines as a distance. Is set as l3, and the relationship of l1 <l2 <l3 is maintained.
このような構成を採ることに依り、ビット線と電源線と
が短絡することは少なくなり、従って、欠陥メモリ・セ
ルを冗長メモリ・セルに代替しても、無駄な消費電流が
流れることから、結局、半導体記憶装置を廃棄処分にす
るなどの事態が発生することを低減でき、また、ビット
線対間の短絡は、従来のビット線対間の短絡と比較して
も少なくなるので、二列に亙るメモリ・セルを冗長メモ
リ・セルと代替しなければならない事態の発生も低減さ
れ、その結果、半導体記憶装置の製造歩留り及び信頼性
は向上する。By adopting such a configuration, it is less likely that the bit line and the power supply line are short-circuited. Therefore, even if the defective memory cell is replaced with the redundant memory cell, useless current consumption flows. After all, it is possible to reduce the occurrence of situations such as discarding the semiconductor memory device, and the number of short circuits between bit line pairs is smaller than that between conventional bit line pairs. It is also possible to reduce the occurrence of the situation in which the memory cells in the above need to be replaced with the redundant memory cells, and as a result, the manufacturing yield and reliability of the semiconductor memory device are improved.
第1図は本発明一実施例のレイアウトを示す要部平面説
明図、第2図は従来例の要部回路図、第3図は第2図に
見られる従来例のレイアウトを示す要部平面説明図、第
4図は他の従来例のレイアウトを示す要部平面説明図を
それぞれ表している。 図に於いて、C00,C01,C10,C11はメモリ・セル,CR0,CR1
は冗長メモリ・セル、BLR,▲▼R,BL0,▲▼0,BL
1,▲▼1はビット線、WL0,WL1はワード線、VSSは接
地側電源レベル、VCCは正側電源レベル、DB及び▲
▼はデータ・バス、CTは電極コンタクト部分、l1はビッ
ト線対を構成する2本のビット線間の距離、l2はビット
線対間の距離、l3はビット線と接地側電源レベルVSS供
給用電源線間の距離をそれぞれ示している。FIG. 1 is an explanatory plan view of a main part showing a layout of an embodiment of the present invention, FIG. 2 is a circuit diagram of a main part of a conventional example, and FIG. 3 is a main part plane showing a layout of the conventional example shown in FIG. FIG. 4 and FIG. 4 are main-portion plan views showing layouts of other conventional examples. In the figure, C 00 , C 01 , C 10 , C 11 are memory cells, C R0 , C R1
Is a redundant memory cell, BL R , ▲ ▼ R , BL 0 , ▲ ▼ 0 , BL
1 , ▲ ▼ 1 is a bit line, WL 0 , WL 1 is a word line, V SS is a ground side power supply level, V CC is a positive side power supply level, DB and ▲
▼ is a data bus, CT is an electrode contact portion, l1 is the distance between two bit lines that make up a bit line pair, l2 is the distance between bit line pairs, and l3 is the bit line and ground side power supply level V SS supply The distances between the power supply lines are shown.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 27/11 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Office reference number FI technical display location H01L 27/11
Claims (1)
のビット線対と、二対のビット線対の間にビット線と略
平行に延在する電源線とを備えた正規のメモリ・セル群
と、 前記正規のメモリ・セルに欠陥がある場合に前記欠陥が
ある正規のメモリ・セルを代替する冗長用メモリ・セル
からなる冗長用メモリ・セル群とを有する半導体装置で
あって、 少なくとも前記正規のメモリ・セル群は、 l1<l2<l3 l1:ビット線対を構成する2本のビット線間の距離 l2:ビット線対間の距離 l3:ビット線と電源線間の距離 の関係を維持してなることを特徴とする半導体記憶装
置。1. A regular memory cell comprising a plurality of bit line pairs to which regular memory cells are connected, and a power supply line extending substantially parallel to the bit lines between two pairs of bit line pairs. A semiconductor device comprising: a cell group; and a redundant memory cell group including a redundant memory cell that replaces the defective regular memory cell when the regular memory cell has a defect, At least the regular memory cell group has l1 <l2 <l3 l1: distance between two bit lines forming a bit line pair l2: distance between bit line pairs l3: distance between bit line and power line A semiconductor memory device characterized in that the relationship is maintained.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60180951A JPH0744227B2 (en) | 1985-08-20 | 1985-08-20 | Semiconductor memory device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60180951A JPH0744227B2 (en) | 1985-08-20 | 1985-08-20 | Semiconductor memory device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6242443A JPS6242443A (en) | 1987-02-24 |
| JPH0744227B2 true JPH0744227B2 (en) | 1995-05-15 |
Family
ID=16092126
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60180951A Expired - Lifetime JPH0744227B2 (en) | 1985-08-20 | 1985-08-20 | Semiconductor memory device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0744227B2 (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5739568A (en) * | 1981-06-22 | 1982-03-04 | Hitachi Ltd | Semiconductor integrated circuit memory |
-
1985
- 1985-08-20 JP JP60180951A patent/JPH0744227B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6242443A (en) | 1987-02-24 |
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