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JPH0744337B2 - Method for manufacturing printed wiring board - Google Patents
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JPH0744337B2 - Method for manufacturing printed wiring board - Google Patents

Method for manufacturing printed wiring board

Info

Publication number
JPH0744337B2
JPH0744337B2 JP63161481A JP16148188A JPH0744337B2 JP H0744337 B2 JPH0744337 B2 JP H0744337B2 JP 63161481 A JP63161481 A JP 63161481A JP 16148188 A JP16148188 A JP 16148188A JP H0744337 B2 JPH0744337 B2 JP H0744337B2
Authority
JP
Japan
Prior art keywords
resin layer
pattern
resin
insulating substrate
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63161481A
Other languages
Japanese (ja)
Other versions
JPH0210796A (en
Inventor
博文 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP63161481A priority Critical patent/JPH0744337B2/en
Publication of JPH0210796A publication Critical patent/JPH0210796A/en
Publication of JPH0744337B2 publication Critical patent/JPH0744337B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/184Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は印刷配線板の製造方法に関し、特に無電解銅め
っきにより回路パターンを形成する印刷配線板の製造方
法に関する。
The present invention relates to a method for manufacturing a printed wiring board, and more particularly to a method for manufacturing a printed wiring board in which a circuit pattern is formed by electroless copper plating.

〔従来の技術〕[Conventional technology]

従来、この種の印刷配線板の製造方法は、第3図(a)
〜(f)に示す工程により製造されていた。すなわち第
3図(a)に示す如く、絶縁基板1にスルホール,ビア
ホール等になる孔10を穿設し、第3図(b)の如く、無
電解銅めっき用の触媒4の処理を行ない、次いで、第3
図(c)の如くドライフィルム状の光硬化型の樹脂パタ
ーン3aを形成し、次に、第3図(d)の如く無電解銅め
っきパターン5を形成した後、第3図(e)の如く、ド
ライフィルム状の光硬化型の樹脂パターン3aを剥離除去
し、次いで、第3図(f)の如くはんだ付け不用部分
に、第2絶縁樹脂パターン6を形成する印刷配線板の製
造方法となっていた。
Conventionally, the manufacturing method of this kind of printed wiring board is shown in FIG.
It was manufactured by the process shown in- (f). That is, as shown in FIG. 3 (a), holes 10 to be through holes, via holes, etc. are made in the insulating substrate 1, and the catalyst 4 for electroless copper plating is treated as shown in FIG. 3 (b). Then the third
As shown in FIG. 3C, a dry film type photo-curable resin pattern 3a is formed, and then an electroless copper plating pattern 5 is formed as shown in FIG. 3D. As described above, a method for manufacturing a printed wiring board is described, in which the photocurable resin pattern 3a in the form of a dry film is peeled and removed, and then the second insulating resin pattern 6 is formed on a portion not to be soldered as shown in FIG. 3 (f). Was becoming.

〔発明が解決しようとする課題〕[Problems to be Solved by the Invention]

上述した従来の印刷配線板の製造方法には次のような欠
点がある。
The above-mentioned conventional method of manufacturing a printed wiring board has the following drawbacks.

(1) 無電解銅めっきパターン以外の絶縁基板表面
に、触媒残渣が残りやすいため、回路パターン間の絶縁
抵抗特性が悪い。(一般に触媒には、金属のパラジウあ
るいは銅を使用するため) (2) 無電解銅めっきを行なう場合、剥離可能な光硬
化型の樹脂を使用して逆版めっきレジストパターンを形
成するため、無電解銅めっき液中に光硬化型の樹脂より
有機物が溶出し、無電解銅めっき液を汚染する。
(1) Since the catalyst residue easily remains on the surface of the insulating substrate other than the electroless copper plating pattern, the insulation resistance characteristic between the circuit patterns is poor. (Generally, a metal palladium or copper is used as a catalyst.) (2) When electroless copper plating is performed, a reversible plating resist pattern is formed by using a photocurable resin that can be peeled off. Organic substances are eluted from the photo-curable resin into the electrolytic copper plating solution and contaminate the electroless copper plating solution.

(3) 最初の工程でスルホール或いはビアホール用の
貫通孔を開けてしまうので、耐無電解めっき用樹脂パタ
ーン形成時には、その樹脂パターンを貫通孔に位置合せ
しなくてはならない。従って、位置合せ用のクリアラン
スが必らず必要でありランドレス化できないことから、
配線の高密度化が困難である。
(3) Since the through hole for the through hole or the via hole is opened in the first step, the resin pattern must be aligned with the through hole when the resin pattern for electroless plating is formed. Therefore, since a clearance for alignment is absolutely necessary and cannot be made landless,
It is difficult to increase the wiring density.

本発明の目的は、従来の欠点を除去し、回線パターン間
の絶縁抵抗特性がすぐれ、また無電解銅めっき液中に光
硬化型の樹脂より有機物が溶出することのない、高密度
配線が可能な印刷配線板の製造方法を提供することにあ
る。
The object of the present invention is to eliminate the drawbacks of the prior art, have excellent insulation resistance characteristics between line patterns, and enable high-density wiring without elution of organic substances from the photo-curing resin in the electroless copper plating solution. Another object of the present invention is to provide a method for manufacturing a printed wiring board.

〔課題を解決するための手段〕[Means for Solving the Problems]

本発明の印刷配線板の製造方法は、絶縁基板の両表面上
に光硬化性と熱硬化性とを備えた絶縁性の第1層目樹脂
層を形成する工程と、前記第1層目樹脂層上に光硬化性
を備えた第2層目樹脂層を形成する工程と、前記第2層
の樹脂層が形成された絶縁基板に貫通孔を穿設して、ス
ルホール或いはビアホールとなるべき貫通孔を、前記第
2層目樹脂層、前記第1層目樹脂層および前記絶縁基板
それぞれの貫通孔が自己整合的にオンラインで重なるよ
うに形成する工程と、前記第2層目樹脂層および第1層
目樹脂層をマスクフィルムを通して同時に露光した後、
それぞれの樹脂層の未露光部分を同一の現像液で現像し
て除去し、二層の樹脂パターンを形成する工程と、前記
樹脂パターンのうち前記第1層目樹脂層のパターンを熱
硬化させる工程と、前記絶縁基板に無電解めっき用の触
媒処理を行い、前記貫通孔内壁、絶縁基板の露出部分お
よび前記樹脂パターン上に無電解めっき用触媒を付着さ
せる工程と、前記樹脂パターンのうち前記第2層目樹脂
層のパターンを剥離して、前記第2層目樹脂層パターン
とその上の無電解めっき用触媒とを選択的に同時に除去
する工程と、前記絶縁基板の前記触媒処理された部分に
無電解銅めっきを施して、前記貫通孔内壁に導電体層を
形成すると共に前記絶縁基板上に所定の導電体パターン
を形成する工程と、前記導電体パターンのうちのはんだ
付け不用部分に絶縁性樹脂層を形成する工程とを含むこ
とを特徴とする。
A method of manufacturing a printed wiring board according to the present invention comprises a step of forming an insulating first resin layer having photo-curing property and thermosetting property on both surfaces of an insulating substrate, and the first resin layer. Forming a second resin layer having photocurability on the layer, and forming a through hole in the insulating substrate on which the second resin layer is formed to form a through hole or a via hole. Forming holes so that the through holes of the second resin layer, the first resin layer, and the insulating substrate overlap each other in a self-aligned online manner; and the second resin layer and the second resin layer. After simultaneously exposing the first resin layer through the mask film,
A step of developing and removing an unexposed portion of each resin layer with the same developer to form a two-layer resin pattern, and a step of thermally curing the pattern of the first resin layer among the resin patterns A step of performing a catalytic treatment for electroless plating on the insulating substrate, and attaching an electroless plating catalyst on the through hole inner wall, the exposed portion of the insulating substrate and the resin pattern; A step of peeling off the pattern of the second resin layer to selectively remove the second resin layer pattern and the electroless plating catalyst thereon at the same time; and the catalytically treated portion of the insulating substrate. Electroless copper plating to form a conductor layer on the inner wall of the through hole and to form a predetermined conductor pattern on the insulating substrate, and to avoid unnecessary soldering of the conductor pattern. Characterized in that it comprises a step of forming a sexual resin layer.

本発明の印刷配線板の製造方法は、第1絶縁樹脂層と光
硬化型の樹脂層を重ねて形成し、同時にパターンを形成
し、触媒処理をしているため、光硬化型の樹脂パターン
を剥離除去すると、触媒が無電解銅めっきパターンを形
成したい所望の部分だけに残るため触媒残渣が回路パタ
ーン間に残らないため回路パターン間の絶縁抵抗の低下
を来さない。
In the method for manufacturing a printed wiring board of the present invention, since the first insulating resin layer and the photo-curing resin layer are formed in an overlapping manner, a pattern is formed at the same time, and a catalyst treatment is performed, the photo-curing resin pattern is formed. When peeled and removed, the catalyst remains only in a desired portion where the electroless copper plating pattern is desired to be formed, and the catalyst residue does not remain between the circuit patterns, so that the insulation resistance between the circuit patterns does not decrease.

また、光硬化型の樹脂は、無電解銅めっき液中で有機物
を溶出させやすく無電解銅めっき液を汚染するが、本発
明では無電解銅めっきを行う前に光硬化型の樹脂を剥離
除去しているため無電解銅めっき液を汚染することがな
い。
Further, the photo-curable resin is liable to elute organic substances in the electroless copper plating solution and contaminates the electroless copper plating solution, but in the present invention, the photo-curable resin is peeled and removed before performing the electroless copper plating. Therefore, the electroless copper plating solution is not contaminated.

さらに、本発明においては、最初の工程で絶縁基板全面
に耐触媒処理用の樹脂層を形成してから、次の工程でス
ルホール或いはビアホール用の貫通孔を開ける。従っ
て、樹脂層と絶縁基板とはそれぞれの貫通孔が自己整合
的にオンラインで重なるので位置合せ用のクリアランス
が不要であり、ランドレス化による配線の高密度化が可
能である。
Further, in the present invention, a catalyst-resistant resin layer is formed on the entire surface of the insulating substrate in the first step, and then through holes for through holes or via holes are formed in the next step. Therefore, since the through holes of the resin layer and the insulating substrate overlap each other in a self-aligning manner on-line, a clearance for alignment is not required, and the wiring density can be increased by the landless method.

〔実施例〕〔Example〕

次に、本発明について図面を参照して説明する。第1図
(a)〜(g)は本発明の第1の実施例を説明するため
に工程順に示した印刷配線板の断面図である。
Next, the present invention will be described with reference to the drawings. 1A to 1G are cross-sectional views of a printed wiring board shown in the order of steps for explaining the first embodiment of the present invention.

まず、第1図(a)の如く、絶縁基板1の表面に光硬化
型でかつ熱硬化型の液状の第1絶縁樹脂層2をカーテン
コーター,ロールコーター及びスクリーン印刷法などに
より形成し、70〜100℃で5〜30分間乾燥する。次に、
第1絶縁樹脂層2の上面にドライフィルム状の光硬化型
の樹脂層3をラミネートして形成する。
First, as shown in FIG. 1 (a), a photocurable and thermosetting liquid first insulating resin layer 2 is formed on the surface of an insulating substrate 1 by a curtain coater, a roll coater, a screen printing method, or the like. Dry at -100 ° C for 5-30 minutes. next,
A dry film-shaped photo-curable resin layer 3 is laminated on the upper surface of the first insulating resin layer 2 to be formed.

次に、第1図(b)の如く、スルホール,ビアホール等
になる孔10を形成し、次いで、第1図(c)の如く、マ
スクフィルムを介して露光し、第1絶縁樹脂層2および
ドライフィルム状の光硬化型の樹脂層3の未露光部分を
1、1、1トリクロロエタンで現像除去し、所望の第1
絶縁樹脂パターン2aおよびドライフィルム状の光硬化型
の樹脂パターン3aを形成し、第1絶縁樹脂パターン2aの
熱硬化分を硬化させるために、130〜150℃で30〜60分間
の加熱処理を行なう。
Next, as shown in FIG. 1 (b), holes 10 to be through holes, via holes, etc. are formed, and then, as shown in FIG. 1 (c), exposed through a mask film to form the first insulating resin layer 2 and The unexposed portion of the dry film type photo-curable resin layer 3 is developed and removed with 1,1,1 trichloroethane to obtain a desired first layer.
The insulating resin pattern 2a and the photo-curable resin pattern 3a in the form of a dry film are formed, and heat treatment is performed at 130 to 150 ° C. for 30 to 60 minutes to cure the thermosetting component of the first insulating resin pattern 2a. .

次に、第1図(d)の如く、触媒処理を行ない触媒4を
絶縁基板1,ドライフィルム状の光硬化型の樹脂パターン
3aの表面およびスルホール,ビアホールとなる孔の壁面
に付着する。
Next, as shown in FIG. 1 (d), a catalyst treatment is performed to form the catalyst 4 on the insulating substrate 1 and a dry film type photo-curing resin pattern.
It adheres to the surface of 3a and the walls of holes that will be through holes and via holes.

次に、第1図(e)の如く塩化メチレンでドライフィル
ム状の光硬化型の樹脂パターン3aを剥離除去し、第1図
(f)の如く無電解銅めっき処理により所望の無電解銅
めっきパターン5を形成する。
Next, as shown in FIG. 1 (e), the dry film type photo-curable resin pattern 3a is peeled off with methylene chloride, and the desired electroless copper plating is performed by electroless copper plating as shown in FIG. 1 (f). The pattern 5 is formed.

最後に、第1図(g)の如くはんだ付け不用部分に第2
絶縁樹脂パターン6を形成することにより所望の印刷配
線板を得た。
Finally, as shown in FIG.
A desired printed wiring board was obtained by forming the insulating resin pattern 6.

第2図(a)〜(g)は、本発明の第2の実施例を説明
するために工程順に示した印刷配線板の断面図である。
2A to 2G are cross-sectional views of the printed wiring board shown in the order of steps for explaining the second embodiment of the present invention.

まず、第2図(a)の如く、絶縁基板1の表面に、光硬
化型でかつ熱硬化型の液状の第1絶縁樹脂層2をカーテ
ンコーター,ロールコーター及びスクリーン印刷法など
により形成し、70〜100℃で5〜30分間乾燥する。次
に、第1絶縁樹脂層2の上面に液状の光硬化型の樹脂層
7をカーテンコーター,ロールコーター及びスクリーン
印刷法などにより形成し、70〜100℃で5〜30分間乾燥
する。
First, as shown in FIG. 2 (a), a photocurable and thermosetting liquid first insulating resin layer 2 is formed on the surface of the insulating substrate 1 by a curtain coater, a roll coater, a screen printing method, or the like. Dry at 70-100 ° C for 5-30 minutes. Next, a liquid photocurable resin layer 7 is formed on the upper surface of the first insulating resin layer 2 by a curtain coater, a roll coater, a screen printing method or the like, and dried at 70 to 100 ° C. for 5 to 30 minutes.

次に、第2図(b)の如く、マスクフィルムを介して露
光し、第1絶縁樹脂層2および液状の光硬化型の樹脂層
7の未露光部分を1、1、1トリクロロエタンで現像除
去し、所望の第1絶縁樹脂パターン2aおよび液状の光硬
化型の樹脂パターン7aを形成し、第1絶縁樹脂パターン
2aの熱硬化分を硬化させるために、130〜150℃で30〜60
分間に加熱処理を行なう。
Next, as shown in FIG. 2 (b), exposure is performed through a mask film, and the unexposed portions of the first insulating resin layer 2 and the liquid photocurable resin layer 7 are developed and removed with 1,1,1 trichloroethane. Then, a desired first insulating resin pattern 2a and a liquid photocurable resin pattern 7a are formed, and the first insulating resin pattern is formed.
30 ~ 60 at 130 ~ 150 ℃ to cure the heat-cured component of 2a.
Heat treatment is performed for a minute.

次に、第2図(d)の如く触媒処理を行ない触媒4を絶
縁基板1、液状の光硬化型の樹脂パターン7aの表面およ
びスルホール,ビアホールとなる孔の壁面に付着する。
Next, as shown in FIG. 2 (d), a catalyst treatment is performed to deposit the catalyst 4 on the insulating substrate 1, the surface of the liquid photo-curable resin pattern 7a, and the walls of the holes to be through holes and via holes.

次に、第2図(e)の如く塩化メチレンで液状の光硬化
型の樹脂パターン7aを剥離除去し、第2図(f)の如
く、無電解銅めっき処理により所望の無電解銅めっきパ
ターン5を形成する。
Next, as shown in FIG. 2 (e), the liquid photocurable resin pattern 7a is peeled off with methylene chloride, and as shown in FIG. 2 (f), a desired electroless copper plating pattern is formed by electroless copper plating. 5 is formed.

最後に、第2図(g)の如く、はんだ付け不用部分に第
2絶縁樹脂パターン6を形成することにより所望の印刷
配線板を得た。
Finally, as shown in FIG. 2 (g), a desired printed wiring board was obtained by forming the second insulating resin pattern 6 on the soldering unnecessary portion.

〔発明の効果〕〔The invention's effect〕

以上説明したように本発明によれば、次の効果がある。 As described above, the present invention has the following effects.

(1) 無電解銅めっきパターン間に、触媒残渣4aが残
らないため回路パターン間の絶縁抵抗特性が良い。
(1) Since the catalyst residue 4a does not remain between the electroless copper plating patterns, the insulation resistance characteristic between the circuit patterns is good.

(2) 無電解銅めっきを行う場合に剥離タイプの光硬
化型の樹脂パターンを剥離除去してから無電解銅めっき
を行うため無電解銅めっき液を光硬化型の樹脂パターン
からの溶出物で汚染することなく無電解銅めっき液の寿
命を長くできる。
(2) In the case of performing electroless copper plating, the electroless copper plating solution is eluted from the photocurable resin pattern in order to perform the electroless copper plating after peeling and removing the peeling type photocurable resin pattern. The life of the electroless copper plating solution can be extended without contamination.

(3) 一番初めの工程で絶縁基板全面に耐触媒処理用
の樹脂パターンを形成してから、次の工程でスルホール
或いはビアホール用の貫通孔を開けるので、樹脂層と絶
縁基板とは、それぞれの貫通孔が自己整合的にオンライ
ンで重なる。従って、位置合せ用のクリアランスを設け
る必要がなく、ランドレス化による配線の高密度化が可
能である。
(3) Since the resin pattern for catalyst resistance treatment is formed on the entire surface of the insulating substrate in the first step, the through hole for the through hole or the via hole is opened in the next step. Through-holes are self-aligned and overlap online. Therefore, it is not necessary to provide a clearance for alignment, and it is possible to increase the density of wiring by making the landless.

【図面の簡単な説明】[Brief description of drawings]

第1図(a)〜(g)は、本発明の第1の実施例を説明
するために工程順に示した印刷配線板の断面図、第2図
(a)〜(g)は本発明の第2の実施例を説明するため
に工程順に示した印刷配線板の断面図、第3図(a)〜
(f)は、従来の印刷配線板の製造方法の一例を説明す
るために工程順に示した印刷配線板の断面図である。 1……絶縁基板、2……第1絶縁樹脂層、2a……第1絶
縁樹脂パターン、3……ドライフィルム状の光硬化型の
樹脂層、3a……ドライフィルム状の光硬化型の樹脂パタ
ーン、4……触媒、4a……触媒残渣、5……無電解銅め
っきパターン、6……第2絶縁樹脂パターン、7……液
状の光硬化型の樹脂層、7a……液状の光硬化型の樹脂パ
ターン、10……孔。
1 (a) to 1 (g) are sectional views of a printed wiring board shown in order of steps for explaining the first embodiment of the present invention, and FIGS. 2 (a) to 2 (g) are drawings of the present invention. Sectional drawing of the printed wiring board shown in order of process for explaining 2nd Example, FIG.
(F) is sectional drawing of the printed wiring board shown in order of process in order to demonstrate an example of the manufacturing method of the conventional printed wiring board. 1 ... Insulating substrate, 2 ... First insulating resin layer, 2a ... First insulating resin pattern, 3 ... Dry film type photo-curing resin layer, 3a ... Dry film type photo-curing resin Pattern 4 ... Catalyst, 4a ... Catalyst residue, 5 ... Electroless copper plating pattern, 6 ... Second insulating resin pattern, 7 ... Liquid photocurable resin layer, 7a ... Liquid photocuring Mold resin pattern, 10 ... holes.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】絶縁基板の両表面上に光硬化性と熱硬化性
とを備えた絶縁性の第1層目樹脂層を形成する工程と、 前記第1層目樹脂層上に光硬化性を備えた第2層目樹脂
層を形成する工程と、 前記2層の樹脂層が形成された絶縁基板に貫通孔を穿設
して、スルホール或いはビアホールとなるべき貫通孔
を、前記第2層目樹脂層、前記第1層目樹脂層および前
記絶縁基板それぞれの貫通孔が自己整合的にオンライン
で重なるように形成する工程と、 前記第2層目樹脂層および第1層目樹脂層をマスクフィ
ルムを通して同時に露光した後、それぞれの樹脂層の未
露光部分を同一の現像液で現像して除去し、二層の樹脂
パターンを形成する工程と、 前記樹脂パターンのうち前記第1層目樹脂層のパターン
を熱硬化させる工程と、 前記絶縁基板に無電解めっき用の触媒処理を行い、前記
貫通孔内壁、絶縁基板の露出部分および前記樹脂パター
ン上に無電解めっき用触媒を付着させる工程と、 前記樹脂パターンのうち前記第2層目樹脂層のパターン
を剥離して、前記第2層目樹脂層パターンとその上の無
電解めっき用触媒とを選択的に同時に除去する工程と、 前記絶縁基板の前記触媒処理された部分に無電解銅めっ
きを施して、前記貫通孔内壁に導電体層を形成すると共
に前記絶縁基板上に所定の導電体パターンを形成する工
程と、 前記導電体パターンのうちのはんだ付け不用部分に絶縁
性樹脂層を形成する工程とを含むことを特徴とする印刷
配線板の製造方法。
1. A step of forming an insulative first resin layer having photo-curing property and thermosetting property on both surfaces of an insulating substrate, and photo-curing property on the first resin layer. Forming a second resin layer including: a through hole formed in the insulating substrate on which the two resin layers are formed to form a through hole that is to be a through hole or a via hole; Forming a through hole of each of the first resin layer, the first resin layer and the insulating substrate so as to overlap each other in a self-aligning manner online, and masking the second resin layer and the first resin layer After simultaneously exposing through the film, an unexposed portion of each resin layer is developed and removed by the same developer to form a two-layer resin pattern, and the first resin layer of the resin pattern is formed. The step of heat curing the pattern of A step of performing a catalyst treatment for deplating to attach an electroless plating catalyst on the inner wall of the through hole, the exposed portion of the insulating substrate and the resin pattern; and a pattern of the second resin layer of the resin pattern And removing the second resin layer pattern and the electroless plating catalyst thereon selectively at the same time, and applying electroless copper plating to the catalyst-treated portion of the insulating substrate. A step of forming a conductor layer on the inner wall of the through hole and forming a predetermined conductor pattern on the insulating substrate, and a step of forming an insulating resin layer on a portion of the conductor pattern not to be soldered. A method of manufacturing a printed wiring board, comprising:
JP63161481A 1988-06-28 1988-06-28 Method for manufacturing printed wiring board Expired - Fee Related JPH0744337B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63161481A JPH0744337B2 (en) 1988-06-28 1988-06-28 Method for manufacturing printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63161481A JPH0744337B2 (en) 1988-06-28 1988-06-28 Method for manufacturing printed wiring board

Publications (2)

Publication Number Publication Date
JPH0210796A JPH0210796A (en) 1990-01-16
JPH0744337B2 true JPH0744337B2 (en) 1995-05-15

Family

ID=15735906

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63161481A Expired - Fee Related JPH0744337B2 (en) 1988-06-28 1988-06-28 Method for manufacturing printed wiring board

Country Status (1)

Country Link
JP (1) JPH0744337B2 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57134996A (en) * 1981-02-16 1982-08-20 Nippon Electric Co Method of producing printed circuit board
JPS5924560B2 (en) * 1981-03-17 1984-06-09 株式会社東芝 Printed wiring board manufacturing method
JPS6074692A (en) * 1983-09-30 1985-04-26 セイコーエプソン株式会社 Method of producing landless through hole circuit board
JPS63302593A (en) * 1987-06-03 1988-12-09 Nippon Mining Co Ltd Manufacture of printed circuit board

Also Published As

Publication number Publication date
JPH0210796A (en) 1990-01-16

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