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JPH0745716B2 - Resist ink for electroless plating - Google Patents
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JPH0745716B2 - Resist ink for electroless plating - Google Patents

Resist ink for electroless plating

Info

Publication number
JPH0745716B2
JPH0745716B2 JP24696087A JP24696087A JPH0745716B2 JP H0745716 B2 JPH0745716 B2 JP H0745716B2 JP 24696087 A JP24696087 A JP 24696087A JP 24696087 A JP24696087 A JP 24696087A JP H0745716 B2 JPH0745716 B2 JP H0745716B2
Authority
JP
Japan
Prior art keywords
component
resist ink
phenol novolac
organic solvent
electroless plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP24696087A
Other languages
Japanese (ja)
Other versions
JPH0192376A (en
Inventor
修 荻谷
強 小林
隆一 藤井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
Original Assignee
Somar Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Corp filed Critical Somar Corp
Priority to JP24696087A priority Critical patent/JPH0745716B2/en
Publication of JPH0192376A publication Critical patent/JPH0192376A/en
Publication of JPH0745716B2 publication Critical patent/JPH0745716B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1605Process or apparatus coating on selected surface areas by masking
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/184Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は無電解メッキによってプリント基板を製造する
際に使用されるレジストインキに関するものである。
TECHNICAL FIELD The present invention relates to a resist ink used when a printed circuit board is manufactured by electroless plating.

(従来技術と問題点) 従来、無電解メッキ用レジストとしては、例えば、エポ
キシ樹脂、無機フィラー及び有機溶剤を配合した主剤
と、芳香族ポリアミン化合物及び有機溶剤を配合した硬
化剤とからなる2液混合型のレジストインキが知られて
いる。
(Prior Art and Problems) Conventionally, as a resist for electroless plating, for example, a two-component composition including a main agent containing an epoxy resin, an inorganic filler and an organic solvent, and a curing agent containing an aromatic polyamine compound and an organic solvent. Mixed type resist inks are known.

従来品は、耐化学薬品性、基板との密着性、耐熱性とい
った点でかなり高い性能に達しているものの、まだ性能
が十分なものとはいえない。特に、従来品に対して下記
のような欠点が指摘されている。
The conventional products have reached quite high performances in terms of chemical resistance, adhesion to substrates, and heat resistance, but their performance is not yet sufficient. In particular, the following drawbacks have been pointed out with respect to conventional products.

インキの粘性、特にチキソトロピーが変化しやす
く、安定した印刷性が得られにくい。
The viscosity of the ink, especially thixotropy, tends to change, making it difficult to obtain stable printability.

スクリーン印刷時、パターンの再現性が十分でな
く、微細パターンへの対応がむずかしい。すなわち、約
200μmの線幅のパターンになると、その再現性が不十
分である。
When screen-printing, pattern reproducibility is not sufficient and it is difficult to deal with fine patterns. Ie about
When the pattern has a line width of 200 μm, its reproducibility is insufficient.

硬化したレジスト膜の耐化学薬品性が、最近の厳し
い薬品処理条件下ではまだ十分でない。
The chemical resistance of the cured resist film is still insufficient under the recent severe chemical treatment conditions.

無電解メッキ処理中に、メッキレジスト上にも銅が
析出して付着しやすく、いわゆる「銅ふり」現象を起こ
しやすい。析出した銅が成長すると、ライン間を短絡さ
せる原因となる。
During the electroless plating process, copper is also likely to be deposited and adhered on the plating resist, so that the so-called "copper swing" phenomenon is likely to occur. The growth of the deposited copper causes a short circuit between the lines.

本発明者らは、さきに、これらの欠点を克服した無電解
メッキ用レジストインキを開発し、特許出願(特願昭61
−308926号)をした。
The present inventors previously developed a resist ink for electroless plating that overcomes these drawbacks and applied for a patent (Japanese Patent Application No.
-308926).

このレジストインキは、満足のいくものであったが、そ
の後の検討によると、基板製造中に種々のストレスが加
わった場合微細パターンにクラックが発生する傾向のあ
ることがわかり、これへの対応が新たに要望されること
になった。
This resist ink was satisfactory, but subsequent studies revealed that cracks tended to occur in the fine pattern when various stresses were applied during the manufacturing of the substrate. It was newly requested.

(発明の目的) 本発明は、上記の要望にこたえるべく、微細パターンに
クラックを生じさせることがなく、かつ良好な耐化学薬
品性、非銅ふり性を兼ね備えたレジストインキを提供し
ようとするものである。
(Object of the Invention) In order to meet the above-mentioned demands, the present invention aims to provide a resist ink which does not cause cracks in a fine pattern and has good chemical resistance and non-copper freeness. Is.

(発明の構成) 本発明は下記のとおりのものである。(Structure of the Invention) The present invention is as follows.

下記成分〔A〕〜〔F〕 〔A〕フェノールノボラック型エポキシ樹脂 〔B〕脂肪族ポリオールポリグリシジルエーテル 〔C〕フェノールノボラック樹脂 〔D〕モンモリロナイト有機複合体、 〔E〕熱硬化反応促進触媒 〔F〕有機溶剤 を含有してなる無電解メッキ用レジストインキ。The following components [A] to [F] [A] Phenol novolac type epoxy resin [B] Aliphatic polyol polyglycidyl ether [C] Phenol novolac resin [D] Montmorillonite organic complex, [E] Thermosetting reaction accelerating catalyst [F] ] A resist ink for electroless plating containing an organic solvent.

かかる構成の本発明は、本発明者らが得た下記の知見に
基づき完成されたものである。
The present invention having such a structure has been completed based on the following findings obtained by the present inventors.

微細パターンにおけるクラック発生の防止には、基
本的には、レジスト膜を構成する樹脂が柔軟性を有する
ことが重要である。
In order to prevent the occurrence of cracks in the fine pattern, it is basically important that the resin forming the resist film has flexibility.

レジスト膜の耐化学薬品性の向上やレジスト膜への
銅ふり現象の防止には、基本的にはレジスト膜を構成す
る樹脂の耐化学薬品性を向上させることが重要である。
In order to improve the chemical resistance of the resist film and to prevent the copper spattering phenomenon on the resist film, it is basically important to improve the chemical resistance of the resin forming the resist film.

レジスト膜を構成する樹脂が柔軟性を有すると、一
般に耐化学薬品性が低下する。
When the resin forming the resist film has flexibility, chemical resistance is generally lowered.

本発明における特定の組合わせ成分、特に脂肪族ポ
リオールポリグリシジルエーテルを使用することによっ
て、クラック発生及び銅ふり現象が有効に防止できる。
By using the specific combination component of the present invention, particularly the aliphatic polyol polyglycidyl ether, cracking and copper fringing can be effectively prevented.

以下、本発明の構成について詳述する。Hereinafter, the configuration of the present invention will be described in detail.

成分〔A〕 フェノールノボラック型エポキシ樹脂とは、フェノー
ル、クレゾール、ビスフェノールAなどのフェノール類
とホルムアルデヒドなどとを酸性触媒の存在下で縮合し
て得られるフェノールノボラック樹脂を、さらにアルカ
リ触媒の存在下でエピクロルヒドリンと反応して得られ
るもので、好ましくは、エポキシ当量170〜250のもので
ある。
Component [A] Phenol novolac type epoxy resin is a phenol novolac resin obtained by condensing phenols such as phenol, cresol and bisphenol A with formaldehyde in the presence of an acidic catalyst, and in the presence of an alkali catalyst. It is obtained by reacting with epichlorohydrin, and preferably has an epoxy equivalent of 170 to 250.

具体的には、エピコート154〔油化シェルエポキシ
(株)製〕等を挙げることができる。
Specific examples thereof include Epicoat 154 (produced by Yuka Shell Epoxy Co., Ltd.).

成分〔B〕 脂肪族ポリオールポリグリシジルエーテルとは、(ポ
リ)エチレングリコール、1,6−ヘキサンジオール、ト
リメチロールプロパンなどのポリオール類とエピクロル
ヒドリンとをアルカリ触媒の存在下で反応して得られる
もので、好ましくはエポキシ当量100〜400のものであ
る。
Component [B] Aliphatic polyol polyglycidyl ether is obtained by reacting polyols such as (poly) ethylene glycol, 1,6-hexanediol and trimethylolpropane with epichlorohydrin in the presence of an alkali catalyst. Preferably, the epoxy equivalent is 100 to 400.

具体的には、(ポリ)エチレングリコールジグリシジル
エーテル、(ポリ)プロピレングリコールジグリシジル
エーテル、ネオペンチルグリコールジグリシジルエーテ
ル、1,4−ブタンジオールジグリシジルエーテル、1,6−
ヘキサンジオールジグリシジルエーテル、(ポリ)グリ
セロールポリグリシジルエーテル、トリメチロールプロ
パンポリグリシジルエーテル、ソルビトールポリグリシ
ジルエーテル、及びこれらのハロゲン化物等を挙げるこ
とができる。市販品としてエポライト80MF(共栄社油脂
化学工業(株)製〕等がある。
Specifically, (poly) ethylene glycol diglycidyl ether, (poly) propylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, 1,4-butanediol diglycidyl ether, 1,6-
Examples thereof include hexanediol diglycidyl ether, (poly) glycerol polyglycidyl ether, trimethylolpropane polyglycidyl ether, sorbitol polyglycidyl ether, and halides thereof. Epolite 80MF (manufactured by Kyoeisha Oil and Fat Chemical Co., Ltd.) and the like are commercially available products.

成分〔C〕 フェノールノボラック樹脂とは、フェノール、クレゾー
ル、ビスフェノールAなどのフェノール類とホルムアル
デヒドなどとを酸性触媒の存在下で縮合して得られるも
ので、好ましくは、水酸基当量100〜150、軟化点60〜13
0℃のものである。
Component [C] The phenol novolac resin is obtained by condensing phenols such as phenol, cresol, bisphenol A and formaldehyde in the presence of an acidic catalyst, and preferably has a hydroxyl equivalent of 100 to 150 and a softening point. 60 ~ 13
It is at 0 ° C.

市販品の具体例は、BRG−556〔昭和高分子(株)製〕で
ある。
A specific example of a commercially available product is BRG-556 [Showa Highpolymer Co., Ltd.].

成分〔D〕 モンモリロナイト有機複合体とは、モンモリロナイトと
有機物質との複合体であって、市販品として、オルベン
〔白石工業(株)製〕、ニューDオルベン〔同前〕、エ
スベン〔豊順洋行(株)製〕等を挙げることができる。
Component [D] Montmorillonite organic complex is a complex of montmorillonite and an organic substance, and as commercially available products, Orben [manufactured by Shiraishi Industry Co., Ltd.], New D Olben [same as above], Sben [Toyojun Hiroyuki] Co., Ltd.] and the like.

成分〔E〕 熱硬化反応促進用触媒は、〔A〕のエポキシ樹脂及び
〔B〕のフェノールノボラック樹脂の熱硬化反応促進す
る作用を有するものである。
The component [E] catalyst for accelerating thermosetting reaction has a function of accelerating the thermosetting reaction of the epoxy resin [A] and the phenol novolac resin [B].

具体例として、2−メチルイミダゾール、2−フェニル
イミダゾール、2−ヘプタデシルイミダゾール、2−ウ
ンデシルイミダゾール、2−エチル−4−メチルイミダ
ゾール、2,4−ジメチルイミダゾール、2−イソプロピ
ルイミダゾール、2−フェニル−4−メチルイミダゾー
ルなどを挙げることができる。また、トリフェニルホス
フィン、1,8−ジアザ−ビシクロ(5・4・0)ウンデ
セン−7、又はそのフェノール塩、2−エチルヘキサン
酸塩、炭酸塩なども使用できる。
Specific examples include 2-methylimidazole, 2-phenylimidazole, 2-heptadecylimidazole, 2-undecylimidazole, 2-ethyl-4-methylimidazole, 2,4-dimethylimidazole, 2-isopropylimidazole, 2-phenyl. -4-Methylimidazole and the like can be mentioned. Further, triphenylphosphine, 1,8-diaza-bicyclo (5.4.0) undecene-7, or a phenol salt thereof, 2-ethylhexanoate, carbonate or the like can be used.

成分〔F〕 有機溶剤は、成分〔A〕のエポキシ樹脂及び成分〔B〕
のフェノールノボラック樹脂を溶解するもので、好まし
くは、インキの硬化反応がかなり高い温度(通常150〜2
50℃)で行われる関係上、沸点の比較的高いものであ
る。
Component [F] The organic solvent is the epoxy resin of component [A] and component [B].
It dissolves the phenol novolac resin of (1), and preferably at a temperature (usually 150 to 2
It has a relatively high boiling point because it is performed at 50 ℃.

具体的には、エチルセロソルブ、ブチルセロソルブ、フ
ェニルセロソルブ等のセロソルブ類、これらのアセテー
トエステル類、エチルカルビトール、ブチルカルビトー
ル、フェニルカルビトール等のカルビトール類、ベンジ
ルアルコール等のアラルキルアルコール類などを挙げる
ことができる。
Specific examples include cellosolves such as ethyl cellosolve, butyl cellosolve and phenyl cellosolve, acetate esters thereof, carbitols such as ethyl carbitol, butyl carbitol and phenyl carbitol, and aralkyl alcohols such as benzyl alcohol. be able to.

これらを1種単用又は2種以上併用する。These may be used alone or in combination of two or more.

主剤に使用する有機溶剤と硬化剤系に使用するそれとは
同種でも異種でもよい。
The organic solvent used for the main agent and that used for the curing agent system may be the same or different.

本発明における各成分の含有量は、好ましくは、下記の
とおりである。
The content of each component in the present invention is preferably as follows.

成分〔B〕は、成分〔A〕に対して10〜100重量%であ
る。成分〔C〕は、成分〔A〕及び〔B〕のエポキシ基
1個当り成分〔C〕のフェノール性水酸基が0.5〜2.0個
となる割合で用いる。成分〔D〕は、成分〔A〕、
〔B〕、〔C〕及び〔E〕の合計量に対して3〜25重量
%である。成分〔E〕は、成分〔A〕、〔B〕及び
〔C〕の合計量に対して0.5〜10重量%である。成分
〔F〕は、成分〔A〕、〔B〕及び〔C〕の合計量に対
して20〜80重量%である。
The component [B] is 10 to 100% by weight with respect to the component [A]. The component [C] is used in such a ratio that the component [C] has 0.5 to 2.0 phenolic hydroxyl groups per one epoxy group of the components [A] and [B]. The component [D] is the component [A],
It is 3 to 25% by weight based on the total amount of [B], [C] and [E]. The component [E] is 0.5 to 10% by weight based on the total amount of the components [A], [B] and [C]. The component [F] is 20 to 80% by weight based on the total amount of the components [A], [B] and [C].

レジストインキが上記含有量の範囲にあるとき、とりわ
け優れた性能を発揮することができる。特に成分〔B〕
脂肪族ポリオールポリグリシジルエーテルが上記10〜10
0重量%の範囲にあるとき、耐クラッチ性及び耐化学薬
品性と、再現性のあるスクリーン印刷性とを兼ね備えた
優れたレジストインキが得られる。
When the resist ink is in the above content range, particularly excellent performance can be exhibited. Especially component [B]
The aliphatic polyol polyglycidyl ether is 10 to 10
When it is in the range of 0% by weight, an excellent resist ink having both clutch resistance and chemical resistance and reproducible screen printability can be obtained.

成分〔B〕が成分〔A〕に対して10重量%未満の場合
は、柔軟性を出すことが困難であり、また、100重量%
超の場合は、耐化学薬品性が低下する傾向がある。
When the content of the component [B] is less than 10% by weight with respect to the component [A], it is difficult to obtain flexibility, and 100% by weight.
If it exceeds, the chemical resistance tends to decrease.

本発明においては、以上の成分〔A〕〜〔F〕のほか
に、所望により他の成分を配合してもよい。
In the present invention, in addition to the above components [A] to [F], other components may be blended if desired.

例えば、レジスト膜の識別を容易にするために着色料と
して青色顔料、緑色顔料、カーボンブラックなどを適宜
配合することができる。着色料の配合量は、通常、成分
〔A〕〜〔E〕に対し0.5〜10重量%の範囲である。
For example, a blue pigment, a green pigment, carbon black or the like can be appropriately mixed as a colorant to facilitate the identification of the resist film. The content of the colorant is usually in the range of 0.5 to 10% by weight with respect to the components [A] to [E].

本発明のレジストインキは、下記のように主剤と硬化剤
系とを別々に調製し、しかる後、両者を混合して製造す
るのが好適である。
The resist ink of the present invention is preferably produced by separately preparing the main component and the curing agent system as described below, and then mixing both.

〔主剤〕[Main agent]

フェノールノボラック型エポキシ樹脂を約50〜120℃に
加熱し、流動化させて所定量を計り取り、ここへ所定量
の脂肪族ポリオールポリグリシジルエーテル、有機溶剤
及びモンモリロナイト有機複合体を加えて、デイゾルバ
ーなどにより均一に混合する。得られた混合物を室温ま
で冷却した後、三本ロールなどの混練機を使用してフイ
ラー類をよく混合、分散してインキ化し、最後に必要に
応じて所定量の有機溶剤を適宜加え、デイゾルバーなど
でよく混合して所定の粘性を示す主剤とする。
Phenol novolac type epoxy resin is heated to about 50 ~ 120 ℃, fluidized and weighed a predetermined amount, and then added a predetermined amount of aliphatic polyol polyglycidyl ether, organic solvent and montmorillonite organic complex, dissolver etc. Mix evenly. After cooling the obtained mixture to room temperature, the fillers are well mixed using a kneading machine such as a three-roll mill, dispersed to form an ink, and finally a predetermined amount of an organic solvent is appropriately added as necessary, and the dissolver is added. And the like to mix them well to form the base compound having a predetermined viscosity.

このように、本発明で使用するフィラーのモンモリロナ
イト有機複合体は主剤の方に添加しておく方が好ましい
が、必ずしもこれに限定されるものではなく、場合によ
り、硬化剤系の方に添加して使用することも可能であ
る。
As described above, the montmorillonite organic composite of the filler used in the present invention is preferably added to the main agent, but it is not necessarily limited to this, and in some cases, it is added to the curing agent system. It is also possible to use.

〔硬化剤系〕[Curing agent system]

上記主剤とは別に、フェノールノボラック樹脂を、通常
は、あらかじめ約50〜130℃に加熱した有機溶剤に撹拌
しながら加えて溶解させ、ついで、熱硬化反応促進用触
媒を加えて均一化して硬化剤系とする。
Separately from the main component, a phenol novolac resin is usually added to an organic solvent previously heated to about 50 to 130 ° C. while stirring to be dissolved, and then a thermosetting reaction accelerating catalyst is added to homogenize the curing agent. System.

以上のようにして調製した主剤と硬化剤系とをそれぞれ
計り取って、これを撹拌機等によって十分混合し均一化
してレジストインキを製造する。
The main component and the curing agent system prepared as described above are weighed out and thoroughly mixed with a stirrer or the like to be homogenized to produce a resist ink.

熱硬化反応促進用触媒は、通常、硬化剤系の中にあらか
じめ添加、混合されているが、そうしないで、例えば、
該触媒を有機溶剤に溶解した溶液として調製しておき、
主剤と硬化剤系とを混合してインキを製造する際に、こ
の触媒溶液を同時に加えることもできる。
The heat curing reaction accelerating catalyst is usually added and mixed in advance in the curing agent system, but otherwise, for example,
Prepared as a solution of the catalyst dissolved in an organic solvent,
This catalyst solution can be added at the same time when the ink is produced by mixing the main agent and the curing agent system.

主剤と硬化剤系とを混合してレジストインキの製造を行
う場合のそれぞれの使用量は、成分〔A〕及び〔B〕の
エポキシ基1個当り成分〔C〕のフェノール性水酸基が
0.5〜2.0個、好ましくは0.8〜1.2個となるような割合で
用いるのがよい。この範囲で用いると、硬化したレジス
ト膜の耐クラック性、耐熱性及び耐化学薬品性が良好と
なる。
In the case of producing a resist ink by mixing a main agent and a curing agent system, the amount of each is such that the phenolic hydroxyl group of component [C] is equivalent to one epoxy group of components [A] and [B].
It is preferable to use 0.5 to 2.0, preferably 0.8 to 1.2. When used in this range, the cured resist film has good crack resistance, heat resistance and chemical resistance.

(発明の効果) 本発明のレジストインキは、後記第3表の結果から明ら
かなように、耐クラック性、耐化学薬品性、非銅ふり性
において優れており、これら特性を兼ね備えた無電解メ
ッキ用レジストとして極めて有用なものである。
(Effects of the Invention) As is clear from the results of Table 3 below, the resist ink of the present invention is excellent in crack resistance, chemical resistance, and non-copper-freeness, and is an electroless plating having these characteristics. It is extremely useful as a resist for use.

(実施例と比較例) 実施例1、2及び比較例1、2 第1表に示す処方で主剤〔イ〕〜〔ニ〕をそれぞれ調製
した。これと別に、第2表に示す処方で硬化剤系を調製
した。得られた各主剤と各硬化剤系とを第3表に示す組
合わせで配合してレジストインキを製造した。
(Examples and Comparative Examples) Examples 1 and 2 and Comparative Examples 1 and 2 Main ingredients [a] to [d] were prepared according to the formulations shown in Table 1. Separately, a hardener system was prepared according to the formulation shown in Table 2. A resist ink was manufactured by blending each of the obtained main components and each curing agent system in a combination shown in Table 3.

このレジストインキの特性を調べたところ、第3表に示
す結果を得た。
When the characteristics of this resist ink were examined, the results shown in Table 3 were obtained.

特性の測定方法は次のとおりである。The method of measuring the characteristics is as follows.

〔耐クラック性〕 ACL基板(100mm×500mm×1.0mm)上に線幅150μ、厚さ2
0μでスクリーン印刷を施し、硬化(150℃、30分)した
後、基板を長尺方向に、中心部が両端よりも200mm上に
なるように反らせ、クラックが発生するかどうかを測定
する。
[Crack resistance] Line width 150μ, thickness 2 on ACL substrate (100mm × 500mm × 1.0mm)
After screen-printing at 0μ and curing (150 ° C, 30 minutes), the substrate is warped in the longitudinal direction so that the center is 200 mm above both ends, and it is measured whether cracks occur.

〔耐化学薬品性及び銅ふり量〕[Chemical resistance and copper content]

レジストパターン印刷を硬化した後、さらに化学粗化、
無電解メッキ処理を行い、化学粗化液に対する耐化学薬
品性と、20倍ルーペで観察しうる銅粒子数(1cm2当り)
を銅ふり量として測定した。
After curing the resist pattern printing, further chemical roughening,
Electroless plating treatment, chemical resistance to chemical roughening solution, and number of copper particles observable with 20 times loupe (per 1 cm 2 ).
Was measured as the amount of copper.

〔注(第1表及び第2表)〕 (1) 油化シェルエポキシ(株)製 フェノールノボ
ラック型樹脂、エポキシ当量176〜181 (2) 共栄社油脂化学工業(株)製 グリセリンジグ
リシンエーテル、エポキシ当量140〜170 (3) 共栄社油脂化学工業(株)製 トリメチロール
プロパントリグリシジルエーテル、エポキシ当量135〜1
65 (4) 白石工業(株)製 モンモリロナイト有機複合
体 (5) 三菱化成(株)製 カーボンブラック(黒色顔
料) (6) 昭和高分子(株)製 フェノールノボラック樹
脂、軟化点80℃
[Notes (Tables 1 and 2)] (1) Yuka Shell Epoxy Co., Ltd. phenol novolac type resin, epoxy equivalent 176 to 181 (2) Kyoeisha Oil and Fat Chemical Co., Ltd. glycerin diglycine ether, epoxy Equivalent 140-170 (3) Kyoeisha Yushi Kagaku Kogyo Co., Ltd. trimethylolpropane triglycidyl ether, epoxy equivalent 135-1
65 (4) Shiroishi Industry Co., Ltd. montmorillonite organic composite (5) Mitsubishi Kasei Co., Ltd. carbon black (black pigment) (6) Showa Highpolymer Co., Ltd. phenol novolac resin, softening point 80 ° C

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】下記成分〔A〕〜〔F〕 〔A〕フェノールノボラック型エポキシ樹脂 〔B〕脂肪族ポリオールポリグリシジルエーテル 〔C〕フェノールノボラック樹脂 〔D〕モンモリロナイト有機複合体 〔E〕熱硬化反応促進触媒 〔F〕有機溶剤 を含有してなる無電解メッキ用レジストインキ。1. The following components [A] to [F] [A] phenol novolac type epoxy resin [B] aliphatic polyol polyglycidyl ether [C] phenol novolac resin [D] montmorillonite organic complex [E] thermosetting reaction Accelerating catalyst [F] A resist ink for electroless plating containing an organic solvent. 【請求項2】成分〔A〕フェノールノボラック型エポキ
シ樹脂、〔B〕脂肪族ポリオールポリグリシジルエーテ
ル、〔D〕モンモリロナイト有機複合体、〔F〕有機溶
剤を含有する主剤と、〔C〕フェノールノボラック樹
脂、〔E〕熱硬化反応促進触媒、〔F〕有機溶剤、所望
により〔D〕モンモリロナイト有機複合体を含有する硬
化剤系とを配合してなる特許請求の範囲(1)のレジス
トインキ。
2. A component [A] phenol novolac type epoxy resin, [B] aliphatic polyol polyglycidyl ether, [D] montmorillonite organic composite, [F] main component containing an organic solvent, and [C] phenol novolac resin. The resist ink according to claim (1), which comprises: [E] a thermosetting reaction accelerating catalyst, [F] an organic solvent, and optionally [D] a montmorillonite organic complex-containing curing agent system.
【請求項3】成分〔B〕脂肪族ポリオールポリグリシジ
ルエーテルを、〔A〕に対して10〜100重量%含有して
なる特許請求の範囲(1)のレジストインキ。
3. The resist ink according to claim 1, which contains the component [B] aliphatic polyol polyglycidyl ether in an amount of 10 to 100% by weight based on [A].
JP24696087A 1987-09-30 1987-09-30 Resist ink for electroless plating Expired - Fee Related JPH0745716B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24696087A JPH0745716B2 (en) 1987-09-30 1987-09-30 Resist ink for electroless plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24696087A JPH0745716B2 (en) 1987-09-30 1987-09-30 Resist ink for electroless plating

Publications (2)

Publication Number Publication Date
JPH0192376A JPH0192376A (en) 1989-04-11
JPH0745716B2 true JPH0745716B2 (en) 1995-05-17

Family

ID=17156284

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24696087A Expired - Fee Related JPH0745716B2 (en) 1987-09-30 1987-09-30 Resist ink for electroless plating

Country Status (1)

Country Link
JP (1) JPH0745716B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1338252C (en) * 1989-07-05 1996-04-16 Osamu Ogitani Resist ink composition
JP2012256636A (en) * 2011-06-07 2012-12-27 Taiyo Holdings Co Ltd Resin composition for plating resist and multilayer printed wiring board

Also Published As

Publication number Publication date
JPH0192376A (en) 1989-04-11

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