JPH0754300B2 - Rapid Evaluation of Inclusions in Metals by Emission Spectroscopy - Google Patents
Rapid Evaluation of Inclusions in Metals by Emission SpectroscopyInfo
- Publication number
- JPH0754300B2 JPH0754300B2 JP600491A JP600491A JPH0754300B2 JP H0754300 B2 JPH0754300 B2 JP H0754300B2 JP 600491 A JP600491 A JP 600491A JP 600491 A JP600491 A JP 600491A JP H0754300 B2 JPH0754300 B2 JP H0754300B2
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- inclusions
- emission
- pulses
- intensity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
- G01N21/67—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using electric arcs or discharges
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- Health & Medical Sciences (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は発光分光分析法による金
属中介在物の迅速形態評価法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rapid morphological evaluation method for inclusions in metals by optical emission spectroscopy.
【0002】[0002]
【従来の技術】図5は、従来技術による発光分光分析法
を示す図である。横軸に発光パルス強度、縦軸に出現度
数を取る。出現する発光パルスの分布状態は2種類に大
別され、一つは母材となる金属中に固溶もしくは非常に
微細かつ均一に分布している状態と、もう一つは母材中
に独立して塊状として分布している状態である。母材に
固溶もしくは微細かつ均一に分布している状態では、そ
の量、大きさ共に母材中に均一に分布している。そのた
め、当該箇所に放電した場合は、どの放電スポット場所
においても類似した成分構成をとるため、目的成分の平
均含有量に相当する発光強度を中心とした正規分布型の
強度分布を示す。またこのように母材と固溶している状
態では、母材の鋼と共に酸により化学的に溶解すること
ができる酸可溶性物質の状態を取る。2. Description of the Related Art FIG. 5 is a diagram showing a conventional optical emission spectroscopy. The horizontal axis represents emission pulse intensity, and the vertical axis represents frequency of appearance. The distribution of emitted light pulses is roughly divided into two types: one is a solid solution in the base metal or is very fine and evenly distributed, and the other is independent in the base metal. It is in the state of being distributed as a lump. In the state of being solid-dissolved in the base material or finely and uniformly distributed, both the amount and the size are uniformly distributed in the base material. Therefore, when a discharge is made to the location, the composition of the composition is similar at any discharge spot location, and therefore a normal distribution type intensity distribution centered on the emission intensity corresponding to the average content of the target component is exhibited. Further, in the state of being solid-dissolved with the base material in this way, it takes a state of an acid-soluble substance which can be chemically dissolved by an acid together with the steel of the base material.
【0003】一方、一般的に介在物と称している、母材
に固溶せず独立した酸化物等の形態で存在している物
質、例えば、鋼中の酸化アルミニウム等の介在物近辺に
放電する場合は、放電スポット中に占める目的成分の含
有量が非常に高くなるために、前述した固溶成分と比較
して高強度パルス側に出現し、その分布形態も存在して
いる介在物の個数、直径が個々に異なるために一般的に
は正規分布型を取らず図中の斜線部で示すように正規分
布の高強度側から更に高強度側にかけて広い強度範囲で
不均一に分布するようになる。なおこれらの介在物は、
一般に酸化物等の形態を取っているため、化学的な酸溶
解処理では完全には溶解することが出来ず残査として残
る酸不溶性物質である。On the other hand, a discharge, which is generally called an inclusion, does not form a solid solution in the base material and exists in the form of an independent oxide or the like, for example, an inclusion such as aluminum oxide in steel. In that case, since the content of the target component in the discharge spot becomes very high, the inclusions appearing on the high intensity pulse side as compared with the solid solution component described above, and the distribution form thereof also exists. Since the number and diameter are different from each other, it is not a normal distribution type in general, and as shown by the shaded area in the figure, it is distributed unevenly in a wide intensity range from the high intensity side to the high intensity side of the normal distribution. become. These inclusions are
Since it generally takes the form of an oxide or the like, it is an acid-insoluble substance that cannot be completely dissolved by a chemical acid dissolution treatment and remains as a residue.
【0004】上述した酸溶解性物質すなわち母材中に均
一に固溶している物質と酸不溶性物質すなわち母材中に
独立して存在している介在物を発光分析により分別定量
する手段として、酸溶解性物質に帰属した発光パルス数
をN、酸不溶性物質に帰属した発光パルス数をN′、ま
た中央値Imを定める。すると各々の存在量を下式によ
り算出する。As a means for separately and quantitatively determining the above-mentioned acid-soluble substance, that is, the substance which is uniformly solid-dissolved in the base material and the acid-insoluble substance, that is, inclusions which independently exist in the base material, by luminescence analysis, The number of emission pulses attributed to the acid-soluble substance is N, the number of emission pulses attributed to the acid-insoluble substance is N ', and the median Im is determined. Then, the abundance of each is calculated by the following formula.
【0005】 酸可溶性物質強度=Im×(N/ (N+N′) ) ・・・・・・(5) 酸不溶性物質強度=Im×(N′/ (N+N′) ) ・・・・・・(6) これらの強度、パルス数は図1のμ−CPU12におい
てA/D変換し、データ処理システム13にて、既知の
標準試料より作成する強度と濃度の換算式により濃度換
算された分析値として供される。なお従来技術において
は、測定するパルス数としては、0から数千パルスの放
電を行いサンプリングしているが、このうち0から約数
百パルス程度の初期放電は、表面均一化を目的として単
純にサンプリング対象範囲から除去されていた。Acid-soluble substance strength = Im × (N / (N + N ′)) (5) Acid-insoluble substance strength = Im × (N ′ / (N + N ′)) ・ ・ ・ ・ ・ ・ ( 6) These intensities and the number of pulses are A / D converted in the μ-CPU 12 in FIG. Be served. In the prior art, the number of pulses to be measured is 0 to several thousand pulses of discharge and sampling is performed, but the initial discharge of 0 to about several hundreds of pulses is simply performed for the purpose of surface homogenization. It was removed from the sampling range.
【0006】[0006]
【発明が解決しようとする課題】従来技術は、酸可溶性
物質と酸不溶性物質を分別定量することは可能である。
しかしながら、溶鋼の製造過程や製品製造過程等におけ
る工程管理分析を行うのに重要な介在物の量、大きさ、
個数等の存在形態に対する情報を得るには、試料を切断
し鏡面研磨した後に顕微鏡による直接観察で対応する必
要があり、直接的に発光分光分析法より得ることはでき
なかった。In the prior art, it is possible to separately quantify an acid-soluble substance and an acid-insoluble substance.
However, the amount and size of inclusions that are important for performing process control analysis in the manufacturing process of molten steel, product manufacturing process, etc.
In order to obtain information on the existence form such as the number, it was necessary to cut the sample, mirror-polish it, and then directly observe it with a microscope, which could not be directly obtained by emission spectroscopy.
【0007】[0007]
【課題を解決するための手段】本発明は従来技術の課題
を解決するものであって、発光分光分析法を用いて、放
電により得られる発光パルスのうち、放電初期の0〜数
百パルス程度を時系列的に計測し、得られた発光パルス
中で定める強度範囲に該当する発光パルスを測定対象と
して、金属中介在物の存在個数、直径、含有量、平均直
径を下式に基づいて求めることを特徴とする発光分光分
析法による金属中介在物の迅速形態評価法である。DISCLOSURE OF THE INVENTION The present invention is intended to solve the problems of the prior art, and of the emission pulses obtained by discharge using emission spectroscopy, about 0 to several hundreds of pulses at the initial stage of discharge. Is measured in time series, and the emission pulse corresponding to the intensity range defined in the obtained emission pulse is measured, and the number of inclusions in the metal, the diameter, the content, and the average diameter are determined based on the following formula. It is a rapid morphological evaluation method for inclusions in a metal by an emission spectroscopy.
【0008】 存在個数(N)=K1×Σ(F) ・・・・・・(1) 直 径(r)=K2×I ・・・・・・(2) 含有量 (V)=K3×Σ(F×I) ・・・・・・(3) 平均直径(R)=K4×Σ(F×I)/Σ(F) ・・・・・・(4) ここで F :強度Iにおける発光パルスの出現頻度。 K1〜K4:顕微鏡測定より求めた実測値と整合性を取
るための補正係数。 I :Il(Lower )からIu(Upper )の強度
範囲かつ放電サンプリング回数で放電開始をゼロとして
n=0〜数百パルス程度の初期放電を対象とする。 この時、強度Iを段階的に分割して測定すれば、各強度
範囲に対応する各直径範囲毎の存在比率も求めることが
できる。以下、図面に基づいて本発明を説明する。Number of existing (N) = K1 × Σ (F) (1) Direct diameter (r) = K2 × I (2) Content (V) = K3 × Σ (F × I) ··· (3) Average diameter (R) = K4 × Σ (F × I) / Σ (F) ··· (4) where F: at intensity I Frequency of light emission pulses. K1 to K4: correction coefficients for achieving consistency with the actual measurement values obtained by microscope measurement. I: Initial discharge of about n = 0 to several hundreds of pulses with the discharge start as zero in the intensity range of Il (Lower) to Iu (Upper) and the number of discharge samplings. At this time, if the intensity I is divided and measured stepwise, the existence ratio for each diameter range corresponding to each intensity range can also be obtained. The present invention will be described below with reference to the drawings.
【0009】図1は、発光分光分析装置の概要図であ
る。試料1は発光スタンド5に取り付け、アルゴン雰囲
気のもとで放電回路4の最適条件下で電極3との間に放
電させる。(この発光にあずかる部分を発光部6と称す
る)。この放電によって生じた光を集光レンズ7を通し
て回折格子9に導き、各成分ごとに分光する。この分光
された分光スペクトル8を各々の光電子増倍管10で光
強度を測光する。(この集光、測光にあずかる部分を分
光部11と称する)。次に測光された光強度はμ−CP
U12においてA/D変換され、データ処理システム1
3にて、成分含有率(%)に換算される。(このA/D
変換、成分含有率(%)換算にあずかる部分をデータ処
理装置14と称する)。FIG. 1 is a schematic diagram of an emission spectroscopic analyzer. The sample 1 is attached to the light emitting stand 5 and is discharged between the electrode 3 and the electrode 3 under the optimum conditions of the discharge circuit 4 under an argon atmosphere. (The part that participates in this light emission is called the light emitting part 6). The light generated by this discharge is guided to the diffraction grating 9 through the condenser lens 7, and is separated into each component. The light intensity of the spectral spectrum 8 thus split is measured by each photomultiplier tube 10. (The part that participates in this light collection and photometry is called the spectroscopic part 11). Next, the measured light intensity is μ-CP
A / D conversion in U12, data processing system 1
In 3, the component content rate (%) is converted. (This A / D
The part involved in the conversion and the conversion of the component content (%) is referred to as the data processing device 14).
【0010】図2は本発明による発光分光評価法を示す
図である。横軸に発光パルス強度、縦軸に出現度数を取
る。出現する発光パルスの分布状態は2種類に大別さ
れ、一つは母材となる金属中に固溶もしくは非常に微細
かつ均一に分布している状態と、もう一つは母材中に独
立して塊状として分布している状態である。母材に固溶
もしくは微細かつ均一に分布している状態では、その
量、大きさ共に母材中に均一に分布しているため、当該
箇所に放電した場合は、どの放電スポット場所において
も目的成分の平均含有量に相当する発光強度を中心とし
た正規分布型の強度分布を示す。FIG. 2 is a diagram showing an emission spectral evaluation method according to the present invention. The horizontal axis represents emission pulse intensity, and the vertical axis represents frequency of appearance. The distribution of emitted light pulses is roughly divided into two types: one is a solid solution in the base metal or is very fine and evenly distributed, and the other is independent in the base metal. It is in the state of being distributed as a lump. When solid-dissolved or finely and uniformly distributed in the base material, the amount and size are evenly distributed in the base material. The normal distribution type intensity distribution centering on the emission intensity corresponding to the average content of the components is shown.
【0011】一方、一般的に介在物と称している、母材
に固溶せず独立した酸化物等の形態で存在している物
質、例えば、鋼中の酸化アルミニウム等の介在物近辺に
放電する場合は、放電スポット中に占める目的成分の含
有量が非常に高くなるために、前述した固溶成分と比較
して高強度パルス側に出現し、その分布形態も存在して
いる介在物の個数、直径が個々に異なるために一般的に
は正規分布型を取らず図中の斜線部で示すように正規分
布の高強度側から更に高強度側にかけて広い強度範囲で
不均一に分布するようになる。これらの介在物からの発
光分布は、更に詳細に調査すると、以下のような知見が
得られる。On the other hand, a discharge, which is generally called an inclusion, does not form a solid solution in the base material but exists in the form of an independent oxide, for example, an inclusion such as aluminum oxide in steel. In that case, since the content of the target component in the discharge spot becomes very high, the inclusions appearing on the high intensity pulse side as compared with the solid solution component described above, and the distribution form thereof also exists. Since the number and diameter are different from each other, it is not a normal distribution type in general, and as shown by the shaded area in the figure, it is distributed unevenly in a wide intensity range from the high intensity side to the high intensity side of the normal distribution. become. The light emission distribution from these inclusions will be investigated in more detail, and the following findings will be obtained.
【0012】放電初期においては、個々の介在物の存
在状態が放電による溶融化現象、熱電子による放電現象
が完全には進行していないために、このサンプリングタ
イミングにおける発光パルス情報は介在物の存在形態を
直接的に反映している情報である。個々の介在物直径
が大きくなるほど放電スポット中に占める目的成分の含
有量が大きくなるため放電時には直径に比例して発光強
度が大きくなる。一般に酸化物等の形態を取る場合、
絶縁性が高いために放電時においては、介在物と母材金
属との境界周辺に電荷エネルギーを多く保有できるた
め、放電時に放出される発光強度は、介在物の大きさに
比例して高強度パルスが発生し、また発生するタイミン
グとしては介在物の溶融化現象が少ない放電初期におい
て特に多くの高強度発光パルスが出現する。また以上
の知見より個々のパルス強度と発生個数を積算した値は
介在物の総含有量に比例して増加してくる。At the initial stage of discharge, the existence state of each inclusion is such that the melting phenomenon due to discharge and the discharge phenomenon due to thermoelectrons do not progress completely, so that the light emission pulse information at this sampling timing shows the presence of inclusions. It is information that directly reflects the form. As the diameter of each inclusion increases, the content of the target component in the discharge spot increases, so that the emission intensity increases in proportion to the diameter during discharge. Generally when taking the form of oxides,
Due to its high insulation, a large amount of charge energy can be retained around the boundary between the inclusions and the base metal during discharge, so the emission intensity emitted during discharge is high in proportion to the size of the inclusions. As a pulse is generated, and as a timing of generation, a particularly large number of high-intensity light emission pulses appear at the beginning of discharge in which the phenomenon of melting of inclusions is small. Further, based on the above findings, the value obtained by integrating the individual pulse intensities and the number of generated pulses increases in proportion to the total content of inclusions.
【0013】図3で、本法でサンプリングする発光パル
スの時系列的な範囲を示す。横軸に積算パルス回数を取
ることにより時間推移を取り、縦軸に発生したパルス個
数を強度別(大、中、小)に区分して示す。供試料は、
表面起伏からの発生する発光と区別するために鏡面研磨
した後、顕微鏡によりあらかじめ介在物含有量の多い試
料と少ない試料とで区分して実験を行っている。FIG. 3 shows a time-series range of light emission pulses sampled by this method. The abscissa shows the time transition by taking the number of integrated pulses, and the ordinate shows the number of generated pulses by intensity (large, medium, small). The sample is
In order to distinguish it from the luminescence generated from the surface undulations, after performing mirror polishing, the experiment is conducted by dividing into a sample with a large amount of inclusions and a sample with a small amount of inclusions by a microscope.
【0014】その結果、放電初期の0〜数百パルス程度
に特異的に介在物からの高強度パルスが出現することを
見出した。この現象は、従来技術では組織の均一化と放
電の安定化を目的として単純に除去していた初期放電の
サンプリング範囲が逆に表面組織の溶融均一化が進んで
いないため直接的に介在物の存在状態を反映しているこ
とを示している。以上の知見より介在物の平均直径、個
数、含有量等を求めるために下記に示す式を考案した。As a result, it has been found that a high-intensity pulse from the inclusion appears specifically in about 0 to several hundreds of pulses at the initial stage of discharge. This phenomenon is because the sampling range of the initial discharge, which was simply removed in the prior art for the purpose of homogenizing the structure and stabilizing the discharge, does not directly advance the melting and homogenization of the surface structure, and thus the inclusions are directly included. It indicates that the existing state is reflected. Based on the above findings, the following formula was devised to determine the average diameter, number, content, etc. of inclusions.
【0015】 存在個数(N)=K1×Σ(F) ・・・・・・(1) 直 径(r)=K2×I ・・・・・・(2) 含有量 (V)=K3×Σ(F×I) ・・・・・・(3) 平均直径(R)=K4×Σ(F×I)/Σ(F) ・・・・・・(4) ここで F :強度Iにおける発光パルスの出現頻度。 K1〜K4:顕微鏡測定より求めた実測値と整合性を取
るための補正係数。 I :Il(Lower )からIu(Upper )の強度
範囲かつ放電サンプリング回数で放電開始をゼロとして
n=0〜数百パルス程度の初期放電を対象とする。 この時、強度Iを段階的に分割して測定すれば、各強度
範囲に対応する各直径範囲毎の存在比率を求めることが
できる。Number of existing (N) = K1 × Σ (F) (1) Direct diameter (r) = K2 × I (2) Content (V) = K3 × Σ (F × I) ··· (3) Average diameter (R) = K4 × Σ (F × I) / Σ (F) ··· (4) where F: at intensity I Frequency of light emission pulses. K1 to K4: correction coefficients for achieving consistency with the actual measurement values obtained by microscope measurement. I: Initial discharge of about n = 0 to several hundreds of pulses with the discharge start as zero in the intensity range of Il (Lower) to Iu (Upper) and the number of discharge samplings. At this time, if the intensity I is divided and measured stepwise, it is possible to obtain the existence ratio for each diameter range corresponding to each intensity range.
【0016】図4は、本評価法による実施例を示す。縦
軸に発光強度、横軸に発光パルス回数を取る。サンプリ
ング対象範囲は、発光パルス回数で0〜512回かつ発
光強度が約1000以上を対象としている。この図で示
すように初期の約0〜200パルスに特異的に高強度の
発光パルスが観察されており、この範囲が試料表面に存
在している介在物からの情報を直接的に反映している部
分である。なお従来技術においては、この範囲は放電初
期における表面の不均一性からくる異常発光としてサン
プリング対象範囲から除去されていた部分である。FIG. 4 shows an example of this evaluation method. The vertical axis represents emission intensity and the horizontal axis represents the number of light emission pulses. The sampling target range is 0 to 512 times the number of light emission pulses and the light emission intensity is about 1000 or more. As shown in this figure, a high-intensity luminescence pulse was observed specifically in the initial about 0 to 200 pulses, and this range directly reflects information from inclusions existing on the sample surface. It is the part that is. In the prior art, this range is a part removed from the sampling range as abnormal light emission due to the non-uniformity of the surface at the initial stage of discharge.
【0017】図6は、本評価法により介在物の平均直径
を求めた例である。縦軸に顕微鏡の直接観察より得られ
た介在物の平均直径、横軸に本評価法の(6)式より求
めた値を取ると、図に示すように相関係数でr=0.9
3と高い相関関係を得ることができた。FIG. 6 shows an example in which the average diameter of inclusions is obtained by this evaluation method. The vertical axis represents the average diameter of inclusions obtained by direct observation with a microscope, and the horizontal axis represents the value obtained from the equation (6) of this evaluation method. As shown in the figure, the correlation coefficient is r = 0.9.
A high correlation with 3 could be obtained.
【0018】表1は、同様に他の面積、体積、個数、平
均直径についても相関関係を求めた結果である。横軸に
面積率、体積率、存在個数、平均直径を取り、縦軸に本
評価法より求めた新PDA値と単に高強度パルス数のみ
を取る。その結果、単に高強度パルス数だけで相関を取
るより、パルス個数に強度を掛け合わせて重みをつけた
方が相関係数で高い値を示すことがわかる。なお本評価
法は、実施例では鋼中に存在するアルミニウム酸化物を
例として取り上げたが、他の金属中における介在物にお
いても本法は適用できる。Similarly, Table 1 shows the results of the correlation obtained for other areas, volumes, numbers, and average diameters. The horizontal axis shows the area ratio, the volume ratio, the number of existing particles, and the average diameter, and the vertical axis shows only the new PDA value obtained by this evaluation method and simply the number of high-intensity pulses. As a result, it can be seen that the correlation coefficient is higher when the number of pulses is multiplied by the weight and weighted than when the correlation is obtained only by the number of high-intensity pulses. Note that the present evaluation method takes aluminum oxide present in steel as an example in the examples, but the present method can also be applied to inclusions in other metals.
【0019】[0019]
【表1】 [Table 1]
【0020】[0020]
【発明の効果】従来技術では溶鋼の製造過程や製品製造
過程等における工程管理分析を行うのに重要な介在物の
量、大きさ、個数等の存在形態に対する情報を得るに
は、試料を切断し鏡面研磨した後に顕微鏡による直接観
察に対応する必要があったが、本発明を用いることによ
り、直接的に発光分光分析法より迅速に得ることが可能
となった。According to the prior art, in order to obtain information on the existence form such as the amount, size, and number of inclusions, which is important for performing process control analysis in the manufacturing process of molten steel or product manufacturing process, the sample is cut. However, it was necessary to deal with direct observation with a microscope after mirror polishing, but by using the present invention, it was possible to directly obtain it more rapidly than by emission spectroscopy.
【図1】発光分光分析装置の概要図。FIG. 1 is a schematic diagram of an emission spectroscopic analyzer.
【図2】本発明による発光分光評価法を示す図。FIG. 2 is a diagram showing an emission spectrum evaluation method according to the present invention.
【図3】サンプリングした発光パルスの時系列的な範囲
を示す。FIG. 3 shows a time-series range of sampled light emission pulses.
【図4】本発明評価法による実施例で、発光強度と発光
パルス回数の関係を示す。FIG. 4 shows the relationship between the emission intensity and the number of emission pulses in an example according to the evaluation method of the present invention.
【図5】従来の発光分光分析法を示す。FIG. 5 shows a conventional optical emission spectroscopy.
【図6】本発明表か法により介在物の平均直径を求めた
例。FIG. 6 is an example in which the average diameter of inclusions is determined by the method of the present invention.
1 試料 3 電極 4 放電回路 5 発光スタンド 6 発光部 7 集光レンズ 8 分光スペクトル 9 回折格子 10 光電子増倍管 11 分光部 12 μ−CPU 13 データ処理システム 14 データ処理装置 1 Sample 3 Electrode 4 Discharge Circuit 5 Light Stand 6 Light Emitting Section 7 Condensing Lens 8 Spectral Spectrum 9 Diffraction Grating 10 Photomultiplier Tube 11 Spectroscopic Section 12 μ-CPU 13 Data Processing System 14 Data Processing Device
フロントページの続き (72)発明者 荻林 成章 千葉県君津市君津1番地 新日本製鐵株式 会社 君津製鐵所内 (56)参考文献 特開 昭62−277539(JP,A) 特開 昭61−250545(JP,A) 特開 昭53−77582(JP,A) 特開 昭57−37252(JP,A)Front page continued (72) Inventor Shigeaki Ogibayashi 1 Kimitsu, Kimitsu-shi, Chiba Nippon Steel Co., Ltd. Kimitsu Works (56) References JP 62-277539 (JP, A) JP 61- 250545 (JP, A) JP-A-53-77582 (JP, A) JP-A-57-37252 (JP, A)
Claims (1)
られる発光パルスのうち、放電初期の0〜数百パルス程
度を時系列的に計測し、得られた発光パルス中で定める
強度範囲に該当する発光パルスを測定対象として、金属
中介在物の存在個数、直径、含有量、および平均直径を
下式に基づいて求めることを特徴とする発光分光分析法
による金属中介在物の迅速評価法。 存在個数(N)=K1×Σ(F) ・・・・・・(1) 直 径(r)=K2×I ・・・・・・(2) 含有量 (V)=K3×Σ(F×I) ・・・・・・(3) 平均直径(R)=K4×Σ(F×I)/Σ(F) ・・・・・・(4) ここで F :強度Iにおける発光パルスの出現頻度。 K1〜K4:顕微鏡測定より求めた実測値と整合性を取
るための補正係数。 I :Il(Lower )からIu(Upper )の強度
範囲かつ放電サンプリング回数で放電開始をゼロとして
n=0〜数百パルス程度の初期放電を対象とする。1. An emission spectrum analysis method is used to time-sequentially measure about 0 to several hundreds of pulses at the initial stage of discharge among emission pulses obtained by discharge, and the intensity range is determined within the obtained emission pulse. Rapid evaluation method of inclusions in metal by emission spectroscopy, characterized in that the number of existing inclusions, diameter, content, and average diameter of inclusions in metal are determined based on the corresponding emission pulse based on the following formula: . Number of existing (N) = K1 × Σ (F) (1) Direct diameter (r) = K2 × I (2) Content (V) = K3 × Σ (F) × I) ··· (3) Average diameter (R) = K4 × Σ (F × I) / Σ (F) ··· (4) where F: of the emission pulse at the intensity I Frequency of appearance. K1 to K4: correction coefficients for achieving consistency with the actual measurement values obtained by microscope measurement. I: The initial discharge of about n = 0 to several hundreds of pulses is targeted with the discharge start as zero in the intensity range from Il (Lower) to Iu (Upper) and the number of discharge samplings.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP600491A JPH0754300B2 (en) | 1991-01-22 | 1991-01-22 | Rapid Evaluation of Inclusions in Metals by Emission Spectroscopy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP600491A JPH0754300B2 (en) | 1991-01-22 | 1991-01-22 | Rapid Evaluation of Inclusions in Metals by Emission Spectroscopy |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04238250A JPH04238250A (en) | 1992-08-26 |
| JPH0754300B2 true JPH0754300B2 (en) | 1995-06-07 |
Family
ID=11626598
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP600491A Expired - Lifetime JPH0754300B2 (en) | 1991-01-22 | 1991-01-22 | Rapid Evaluation of Inclusions in Metals by Emission Spectroscopy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0754300B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4247007B2 (en) * | 2003-01-31 | 2009-04-02 | 富士通株式会社 | Semiconductor wafer evaluation method and semiconductor device manufacturing method |
| CN100343656C (en) * | 2003-02-25 | 2007-10-17 | 鞍钢股份有限公司 | Spectral analysis method for online detection of number and content of inclusions in steel |
| CN100343657C (en) * | 2003-02-25 | 2007-10-17 | 鞍钢股份有限公司 | Spectral analysis method for online detection of grain size distribution of inclusions in steel |
-
1991
- 1991-01-22 JP JP600491A patent/JPH0754300B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04238250A (en) | 1992-08-26 |
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