JPH0762247B2 - Determination method of film thickness value in vacuum deposition - Google Patents
Determination method of film thickness value in vacuum depositionInfo
- Publication number
- JPH0762247B2 JPH0762247B2 JP63318498A JP31849888A JPH0762247B2 JP H0762247 B2 JPH0762247 B2 JP H0762247B2 JP 63318498 A JP63318498 A JP 63318498A JP 31849888 A JP31849888 A JP 31849888A JP H0762247 B2 JPH0762247 B2 JP H0762247B2
- Authority
- JP
- Japan
- Prior art keywords
- value
- film thickness
- measured
- counter
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims description 15
- 238000001771 vacuum deposition Methods 0.000 title claims description 10
- 238000007740 vapor deposition Methods 0.000 claims description 19
- 230000007423 decrease Effects 0.000 claims description 8
- 230000003247 decreasing effect Effects 0.000 claims description 5
- 230000001186 cumulative effect Effects 0.000 claims description 3
- 238000005259 measurement Methods 0.000 description 15
- 230000008020 evaporation Effects 0.000 description 8
- 238000001704 evaporation Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005375 photometry Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Description
【発明の詳細な説明】 （産業上の利用分野） 本発明は、真空蒸着制御装置における光電測光器の光度
測定値の処理方法に関するものである。Description: TECHNICAL FIELD The present invention relates to a method of processing a photometric value of a photoelectric photometer in a vacuum vapor deposition control device.
（従来の技術） 従来、このような分野の技術としては、例えば以下に示
すようなものがあった。(Prior Art) Conventionally, as a technology in such a field, there has been the following, for example.
真空蒸着における蒸着膜の光電測光器による光度測定軌
跡は、第７図に示すようになる。The locus of photometric measurement of the deposited film in vacuum deposition by a photoelectric photometer is as shown in FIG.
従来の蒸着制御方法においては、第７図の極大点Ma1，M
a2……、極小点Mi1，Mi2……の測定方法として、光度値
をコンピュータを用い周期的に測定し、極大点、つま
り、光度測定値が前の値より小さくなった場合と、極小
点、つまり、光度測定値が前の値より大きくなった場合
を測定し、蒸着膜の形成状況を測定するようにしてい
た。ここでは、多層蒸着ZnS,MgF2膜で波長λ＝550nmで
ある。In the conventional vapor deposition control method, the maximum points Ma 1 and M in FIG.
a 2 ......, as a method of measuring the minimum points Mi 1 , Mi 2 ......, the luminosity value is periodically measured using a computer, and the maximum point, that is, the luminosity measurement value becomes smaller than the previous value. The minimum point, that is, the case where the measured light intensity becomes larger than the previous value, is measured to measure the formation state of the vapor deposition film. Here, the wavelength λ is 550 nm in a multilayer vapor-deposited ZnS, MgF 2 film.
（発明が解決しようとする課題） しかしながら、光電測光器の信号をA/Dコンバータを通
して、コンピュータで読み込む場合、信号値にノイズ成
分があると、前述の極大点、極小点の判定を誤ってしま
う。(Problems to be solved by the invention) However, when the signal of the photoelectric photometer is read by the computer through the A / D converter, if the signal value has a noise component, the above-described maximum point and minimum point are erroneously determined. .
本発明は、以上述べたノイズによる極大点、極小点の誤
判定という問題点を除去し、光電測定器の読込値軌跡の
極大点、極小点を正確に判定することができる真空蒸着
における膜厚値の判定方法を提供することを目的とす
る。The present invention eliminates the above-mentioned problem of erroneous determination of the maximum point and the minimum point due to noise, and can accurately determine the maximum point and the minimum point of the reading value locus of the photoelectric measuring device. It is intended to provide a method for determining a value.
（課題を解決するための手段） 本発明は、上記問題点を解決するために、真空蒸着にお
ける膜厚値の判定方法において、光電測光器の光度測定
値による真空蒸着における膜厚値を周期的に測定する工
程と、該測定値がその前に測定した値より増減したか否
かを判別する工程と、該増減回数がカウンタにより計数
され、そのカウンタ値が負にならないようにすると共
に、そのカウンタの累積値が５程度の所定の数値に達し
た場合には極点と判定する工程とを施すようにしたもの
である。(Means for Solving the Problem) In order to solve the above-mentioned problems, the present invention provides a method for determining a film thickness value in vacuum deposition, in which a film thickness value in vacuum deposition is periodically determined by a photometric value of a photoelectric photometer. And a step of determining whether or not the measured value has increased or decreased from the previously measured value, and the increase / decrease number is counted by a counter so that the counter value does not become negative, and When the cumulative value of the counter reaches a predetermined numerical value of about 5, the process of determining the extreme point is performed.
ここで、前記測定値がその前に測定した値より減少する
傾向にある場合、極大点と判定し、前記測定値がその前
に測定した値より増加する傾向にある場合、極小点と判
定する。Here, when the measured value tends to decrease from the previously measured value, it is determined as the maximum point, and when the measured value tends to increase from the previously measured value, it is determined as the minimum point. .
（作用） 本発明によれば、上記したように、真空蒸着における膜
厚値の判定方法において、光電測光器の光度測定値によ
る真空蒸着における膜厚値を周期的に測定し、この測定
値がその前に測定した値より増減したか否かを判別する
工程と、増減回数がカウンタにより計数され、そのカウ
ンタ値が負にならないようにすると共にそのカウンタの
累積値が５程度の所定の数値に達した場合には極点と判
定する。(Operation) According to the present invention, as described above, in the method for determining the film thickness value in vacuum vapor deposition, the film thickness value in vacuum vapor deposition is periodically measured by the photometric value of the photoelectric photometer, and the measured value is A step of determining whether or not the value has increased or decreased from the value measured before, and the number of times of increase or decrease is counted by a counter so that the counter value does not become negative, and the cumulative value of the counter becomes a predetermined value of about 5. If reached, it is determined to be a pole.
従って、簡単な判定方法により、真空蒸着の状態を正確
に監視することができる。Therefore, the state of vacuum deposition can be accurately monitored by a simple determination method.
（実施例） 以下、本発明の実施例について図面を参照しながら詳細
に説明する。(Example) Hereinafter, the Example of this invention is described in detail, referring drawings.
第１図は本発明の実施例を示す蒸着膜の極点の判定を行
うためのシステム構成図、第２図は本発明の極大点の判
定フローチャート、第３図は本発明の極小点の判定フロ
ーチャート、第４乃至第６図は本発明の極小点の判定例
の説明図である。FIG. 1 is a system configuration diagram for determining the extreme points of a vapor deposition film showing an embodiment of the present invention, FIG. 2 is a flowchart for determining the maximum points of the present invention, and FIG. 3 is a flowchart for determining the minimum points of the present invention. 4 to 6 are explanatory views of an example of determining a minimum point according to the present invention.
まず、第１図において、１はベルジャ、２は基板、３は
シャッタ、４は蒸発源、つまり各種の試料が回転体上に
配置された複数の蒸発源（例えばZnS,MgF2などの蒸着
源）、５はヒータ支持台、６は電離真空計、７は真空バ
ルブ、８は液体窒素トラップ、９はロータリポンプ、10
は２方向バルブ、11はあら引き用配管、12はピラニゲー
ジ、13はレーザビームの放射筒、14はそのレーザビーム
により蒸着膜を透過した光を受ける光電測光器、15はA/
D変換器、20はコンピュータ、21はCPU（中央処理装
置）、22は入力インタフェース、23はメモリ、24は比較
器、25はカウンタ、26は出力インタフェース、27は蒸発
源駆動装置である。First, in FIG. 1, 1 is a bell jar, 2 is a substrate, 3 is a shutter, 4 is an evaporation source, that is, a plurality of evaporation sources in which various samples are arranged on a rotating body (for example, evaporation sources such as ZnS and MgF 2). ) 5, heater support, 6 ionization vacuum gauge, 7 vacuum valve, 8 liquid nitrogen trap, 9 rotary pump, 10
Is a two-way valve, 11 is a piping for roughing, 12 is a Pirani gauge, 13 is a laser beam emitting cylinder, 14 is a photoelectric photometer that receives light transmitted through the vapor deposition film by the laser beam, and 15 is A /
A D converter, 20 is a computer, 21 is a CPU (central processing unit), 22 is an input interface, 23 is a memory, 24 is a comparator, 25 is a counter, 26 is an output interface, and 27 is an evaporation source driving device.
この図に示すように、真空蒸着装置は基本的には、排気
系と、蒸発源4,基板2,シャッタ３等の真空室から構成さ
れている。As shown in this figure, the vacuum vapor deposition apparatus basically comprises an exhaust system and a vacuum chamber such as an evaporation source 4, a substrate 2 and a shutter 3.
ここで、膜厚の測定は、光度測定データ値を光電測光器
14により、A/D変換器15を介して、コンピュータ20に周
期的に読み込んで行う。Here, the film thickness is measured by measuring the photometric data value with a photoelectric photometer.
By means of 14, the data is periodically read into the computer 20 via the A / D converter 15 and is executed.
そして、該測定値がその前に測定した値より増減したか
否かを判別し、該増減回数がある一定の値に達した場合
には極点と判定し、出力インタフェース26、蒸発源駆動
装置27を介して蒸発源４を回転駆動させて、今まで行っ
ていた試料を切換えて他の蒸発源の蒸着を行うなどの制
御を行う。Then, it is determined whether or not the measured value has increased or decreased from the previously measured value, and when the number of increase or decrease reaches a certain value, it is determined as a pole point, and the output interface 26, the evaporation source driving device 27 The evaporation source 4 is rotatably driven via the, and control is performed such that the sample that has been used so far is switched and vapor deposition of another evaporation source is performed.
以下、第２図のフローチャートを参照しながら、真空蒸
着における膜厚値（光電測光器の光度測定値）の極大点
の判定について説明する。The determination of the maximum point of the film thickness value (the photometric value of the photoelectric photometer) in vacuum deposition will be described below with reference to the flowchart of FIG.
まず、カウンタ25を０にセットする（ステップ）。First, the counter 25 is set to 0 (step).
次に、光電測光器14からの光度測定データ値の読み込み
を行う。つまり、“新膜厚値”として周期的に膜厚値を
読み込み、その値A11を格納する（ステップ）。Next, the light intensity measurement data value is read from the photoelectric photometer 14. That is, the film thickness value is periodically read as the “new film thickness value” and the value A 11 is stored (step).
次に、その時の読込値A11をメモリ23へ記憶する（ステ
ップ）。Next, the read value A 11 at that time is stored in the memory 23 (step).
次いで、光電測光器14からの光度測定データ値A12の読
み込みを行う（ステップ）。Next, the light intensity measurement data value A 12 is read from the photoelectric photometer 14 (step).
その時の測定データ値A12が“新膜厚値”となり、測定
データ値A11は“旧膜厚値”となる（ステップ）。The measured data value A 12 at that time becomes the “new film thickness value”, and the measured data value A 11 becomes the “old film thickness value” (step).
次いで、その測定データ値A12と前回の測定データ値A11
とを比較器24により比較し（ステップ）、その測定デ
ータ値A12が前回の測定データ値A11以下である場合に
は、カウンタ25の値をプラス１にする（ステップ）。Then, the measured data value A 12 and the previous measured data value A 11
Are compared by the comparator 24 (step), and when the measured data value A 12 is less than or equal to the previous measured data value A 11 , the value of the counter 25 is incremented by 1 (step).
次に、そのカウンタ25の値を判別して、その値が所定値
（ここでは５）になった場合には、極大点として判定す
る（ステップ）。Next, the value of the counter 25 is discriminated, and when the value reaches a predetermined value (here, 5), it is determined as the maximum point (step).
上記ステップにおいて、測定データ値A12が前回の測
定データ値A11より大きい場合には、カウンタ25の値を
マイナス１にし（ステップ）、そのカウンタ25の値を
判別して、その値が一定値（ここでは０）になる（ステ
ップ）まで、前記ステップに戻る。In the above step, when the measured data value A 12 is larger than the previous measured data value A 11 , the value of the counter 25 is set to minus 1 (step), the value of the counter 25 is discriminated, and the value is a constant value. It returns to the said step until it becomes (here 0) (step).
また、上記ステップにおいて、カウンタ25の値が０未
満になる場合は、その値を０に保持し（ステップ）、
前記ステップに戻る。When the value of the counter 25 becomes less than 0 in the above step, the value is held at 0 (step),
Return to the step.
次に、第３図のフローチャートを参照しながら、真空蒸
着における膜厚値（光電測光器の光度測定値）の極小点
の判定について説明する。Next, the determination of the minimum point of the film thickness value (the photometric value of the photoelectric photometer) in vacuum deposition will be described with reference to the flowchart of FIG.
まず、カウンタ25を０にセットする（ステップ）。First, the counter 25 is set to 0 (step).
次いで、光電測光器14からの光度測定データ値の読み込
みを行う（ステップ）。Then, the light intensity measurement data value is read from the photoelectric photometer 14 (step).
次に、その時の読込値A21をメモリ23へ記憶する（ステ
ップ）。Next, the read value A 21 at that time is stored in the memory 23 (step).
次いで、光電測光器14からの光度測定データ値A22の読
み込みを行う（ステップ）。Next, the light intensity measurement data value A 22 is read from the photoelectric photometer 14 (step).
その時の測定データ値A22が“新膜厚値”となり、測定
データ値A21は“旧膜厚値”となる（ステップ）。The measured data value A 22 at that time becomes the “new film thickness value”, and the measured data value A 21 becomes the “old film thickness value” (step).
次いで、その測定データ値A22と前回の測定データ値A21
とを比較器24により比較し（ステップ）、その測定デ
ータ値A22が前回の測定データ値A21以上である場合に
は、カウンタ25の値をプラス１にする（ステップ）。Then, the measured data value A 22 and the previous measured data value A 21
Are compared by the comparator 24 (step), and when the measured data value A 22 is equal to or larger than the previous measured data value A 21 , the value of the counter 25 is incremented by 1 (step).
次に、そのカウンタ25の値を判別して、その値が所定値
（ここでは５）になった場合には、極小点として判定す
る（ステップ）。Next, the value of the counter 25 is discriminated, and when the value reaches a predetermined value (here, 5), it is determined as a minimum point (step).
上記ステップにおいて、測定データ値A22が前回の測
定データ値A21より小さい場合には、カウンタ25の値を
マイナス１にし（ステップ）、そのカウンタ25の値を
判別して、その値が所定値（ここでは０）になる（ステ
ップ）まで、前記ステップに戻る。In the above step, when the measured data value A 22 is smaller than the previous measured data value A 21 , the value of the counter 25 is set to minus 1 (step), the value of the counter 25 is discriminated, and the value is a predetermined value. It returns to the said step until it becomes (here 0) (step).
また、上記ステップにおいて、カウンタ25のあたいが
０未満になる場合には、その値を０に保持して（ステッ
プ）、前記ステップに戻る。Further, in the above step, when the counter 25 is less than 0, the value is held at 0 (step) and the process returns to the step.
次に、この真空蒸着における膜厚値（光電測光器の光度
測定値）の極小点の判定例について、第４図乃至第６図
を用いて説明する。Next, an example of determining the minimum point of the film thickness value (photometric value of photoelectric photometer) in this vacuum deposition will be described with reference to FIGS. 4 to 6.
第４図に光度測定値の軌跡が示されており、その極小点
判定の詳細を示すa2部が拡大図として第５図に示されて
いる。そこで、第５図において、測定ポイント数を13と
すると、第６図に示すように、測定ポイント４までは測
定データ値が減少しているので、カウンタ値は０に保持
され、測定ポイント５において測定データ値は大きくな
り、カウンタ値は１となり、測定ポイント６では測定デ
ータ値が減少してカウンタ値は０となり、測定ポイント
７では測定データ値が大きくなりカウンタ値は１とな
り、測定ポイント８では測定データ値が減少してカウン
タ値は０となり、測定ポイント９まで測定データ値が大
きくなりカウンタ値は１となり、以降は測定データ値が
増え続け、測定ポイント13になるとカウンタ値は所定の
５となり、測定データ値の上昇傾向が確認され、極小点
として判定される。The locus of the luminous intensity measurement value is shown in FIG. 4, and the a2 portion showing the details of the minimum point determination is shown in FIG. 5 as an enlarged view. Therefore, in FIG. 5, assuming that the number of measurement points is 13, as shown in FIG. 6, the measured data value has decreased up to the measurement point 4, so the counter value is held at 0 and at the measurement point 5. The measured data value becomes large, the counter value becomes 1, the measured data value decreases at measurement point 6 and becomes 0, the measured data value becomes large at measurement point 7, and the counter value becomes 1, and at measurement point 8. The measured data value decreases and the counter value becomes 0, the measured data value increases to measurement point 9 and the counter value becomes 1, and after that the measured data value continues to increase, and at measurement point 13, the counter value becomes the predetermined value 5. , The rising tendency of the measured data value is confirmed, and it is judged as the minimum point.
このように、真空蒸着における膜厚値の極大点或いは極
小点を正確に判定し、検出することができるので、正確
な真空蒸着の制御を行うことができる。In this way, the maximum point or the minimum point of the film thickness value in vacuum vapor deposition can be accurately determined and detected, so that accurate vacuum vapor deposition control can be performed.
なお、このようにして、得られる真空蒸着膜は、ブラウ
ン管、プリズムなどの蒸着膜として用いられる。The vacuum vapor deposition film thus obtained is used as a vapor deposition film for cathode ray tubes, prisms and the like.
また、本発明は上記実施例に限定されるものではなく、
本発明の趣旨に基づいて種々の変形が可能であり、これ
らを本発明の範囲から排除するものではない。The present invention is not limited to the above embodiment,
Various modifications are possible based on the spirit of the present invention, and these are not excluded from the scope of the present invention.
（発明の効果） 以上、詳細に説明したように、本発明によれば、蒸着膜
の光電測光器の測定値における極大点、極小点を誤判定
することなく、簡単な判定方法で正確に判定することが
できる。特に、ノイズ成分を含む信号値についても確実
に極点の判定を行うことができる。また、本発明によれ
ば、時間軸に対し、非線形に連続に変化するあらゆる信
号値軌跡の極点を判定することもできる。(Effects of the Invention) As described in detail above, according to the present invention, the maximum and minimum points in the measured values of the photoelectric photometer of the vapor deposition film are accurately determined by a simple determination method without erroneous determination. can do. In particular, it is possible to reliably determine the pole even for a signal value including a noise component. Further, according to the present invention, it is also possible to determine the poles of all signal value loci that change non-linearly continuously with respect to the time axis.
従って、真空蒸着における膜厚値の極大点或いは極小点
を容易に、しかも正確に判定し、検出することができる
ので、信頼性の高い真空蒸着の制御を行うことができ
る。Therefore, the maximum point or the minimum point of the film thickness value in the vacuum vapor deposition can be easily and accurately determined and detected, so that highly reliable control of the vacuum vapor deposition can be performed.
第１図は本発明の実施例を示す蒸着膜の極点の判定を行
うためのシステムの構成図、第２図は本発明の極大点の
判定フローチャート、第３図は本発明の極小点の判定フ
ローチャート、第４図は本発明の極小点の判定例におけ
る光度測定値の軌跡を示す図、第５図は第４図のａ部の
拡大図、第６図はその光度測定値の極小点判定の説明
図、第７図は従来の真空蒸着における蒸着膜の光電測光
器による光度測定軌跡を示す図である。 14……光電測光器、15……A/D変換器、20……コンピュ
ータ、21……CPU（中央処理装置）、22……入力インタ
フェース、23……メモリ、24……比較器、25……カウン
タ、26……出力インタフェース。FIG. 1 is a block diagram of a system for determining the extreme point of a deposited film showing an embodiment of the present invention, FIG. 2 is a flowchart for determining the maximum point of the present invention, and FIG. 3 is determination of the minimum point of the present invention. A flow chart, FIG. 4 is a diagram showing a locus of measured luminosity values in the determination example of the minimum point of the present invention, FIG. 5 is an enlarged view of part a of FIG. 4, and FIG. 6 is determination of the minimum point of the measured luminosity values. FIG. 7 is a diagram showing a light intensity measurement locus of a deposited film in conventional vacuum deposition by a photoelectric photometer. 14 ... Photoelectric photometer, 15 ... A / D converter, 20 ... Computer, 21 ... CPU (central processing unit), 22 ... Input interface, 23 ... Memory, 24 ... Comparator, 25 ... … Counter, 26… Output interface.
Claims (3)
蒸着における膜厚値を周期的に測定する工程と、 （ｂ）該測定値がその前に測定した値より増減したか否
かを判別する工程と、 （ｃ）該増減回数がカウンタにより計数され、そのカウ
ンタ値が負にならないようにすると共にそのカウンタの
累積値が５程度の所定の数値に達した場合には極点と判
定する工程とを有する真空蒸着における膜厚値の判定方
法。1. A step of (a) periodically measuring a film thickness value in vacuum vapor deposition by a photometric value of a photoelectric photometer, and (b) whether or not the measured value has increased or decreased from a value previously measured. (C) The increase / decrease number is counted by a counter so that the counter value does not become negative, and when the cumulative value of the counter reaches a predetermined value of about 5, it is determined as a pole point. A method for determining a film thickness value in vacuum vapor deposition, the method including:
する傾向にある場合、極大点と判定する請求項１記載の
真空蒸着における膜厚値の判定方法。2. The method for determining a film thickness value in vacuum vapor deposition according to claim 1, wherein when the measured value tends to decrease from the value measured before, it is determined as a maximum point.
する傾向にある場合、極小点と判定する請求項１記載の
真空蒸着における膜厚値の判定方法。3. The method for determining a film thickness value in vacuum deposition according to claim 1, wherein when the measured value tends to increase from a value measured before, it is determined as a minimum point.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63318498A JPH0762247B2 (en) | 1988-12-19 | 1988-12-19 | Determination method of film thickness value in vacuum deposition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63318498A JPH0762247B2 (en) | 1988-12-19 | 1988-12-19 | Determination method of film thickness value in vacuum deposition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02163374A JPH02163374A (en) | 1990-06-22 |
| JPH0762247B2 true JPH0762247B2 (en) | 1995-07-05 |
Family
ID=18099793
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63318498A Expired - Lifetime JPH0762247B2 (en) | 1988-12-19 | 1988-12-19 | Determination method of film thickness value in vacuum deposition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0762247B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100821810B1 (en) * | 2002-11-08 | 2008-04-11 | 도꾸리쯔교세이호진 상교기쥬쯔 소고겡뀨죠 | Film Formation Method on Substrate |
| JP4698166B2 (en) * | 2004-06-03 | 2011-06-08 | 株式会社シンクロン | Thin film forming method, film thickness measuring method and film thickness measuring apparatus |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5146584A (en) * | 1974-10-18 | 1976-04-21 | Pioneer Electronic Corp | JOCHAKUSOCHI |
| JPS61246795A (en) * | 1985-04-24 | 1986-11-04 | 富士通株式会社 | Maximum/minimum detection system |
| JPS62165103A (en) * | 1986-01-17 | 1987-07-21 | Canon Inc | Method for measuring film thickness |
-
1988
- 1988-12-19 JP JP63318498A patent/JPH0762247B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02163374A (en) | 1990-06-22 |
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