JPH0766566B2 - Optical recording medium - Google Patents
Optical recording mediumInfo
- Publication number
- JPH0766566B2 JPH0766566B2 JP61140792A JP14079286A JPH0766566B2 JP H0766566 B2 JPH0766566 B2 JP H0766566B2 JP 61140792 A JP61140792 A JP 61140792A JP 14079286 A JP14079286 A JP 14079286A JP H0766566 B2 JPH0766566 B2 JP H0766566B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- layer
- nitride
- recording medium
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title claims description 19
- 150000004767 nitrides Chemical class 0.000 claims description 17
- 230000001681 protective effect Effects 0.000 claims description 15
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 10
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical group N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 9
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 4
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 3
- 230000035945 sensitivity Effects 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- 229910052723 transition metal Inorganic materials 0.000 description 3
- 229910001215 Te alloy Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、レーザ光等の光を用いて情報の記録再生を行
なう光記録媒体に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical recording medium that records and reproduces information by using light such as laser light.
従来の技術 近年、情報処理システムにおける処理情報量の急速な増
加に伴い、特にデータ処理システムやオフィス・オート
メーション等の分野において記録容量の大きい記録媒
体、とりわけ光記録媒体が注目されている。光記録媒体
では、媒体上に光ビームを照射し、光吸収による局部的
な温度上昇あるいは化学変化を誘起して記録を行なう。
再生は、記録によって誘起された媒体上の局部的変化を
記録時と強度あるいは波長の異なる光ビームを照射し、
その反射光あるいは透過光を検出して行なう。2. Description of the Related Art In recent years, with the rapid increase in the amount of information processed in an information processing system, a recording medium having a large recording capacity, especially an optical recording medium, has been attracting attention especially in the fields of data processing systems, office automation and the like. In an optical recording medium, recording is performed by irradiating the medium with a light beam and inducing a local temperature rise or chemical change due to light absorption.
For reproduction, a local change on the medium induced by recording is irradiated with a light beam having a different intensity or wavelength from that at the time of recording,
The reflected light or transmitted light is detected.
光記録媒体の記録膜としては、テルル系合金膜、希土類
−遷移金属系合金膜等のように酸化や腐食で劣化し易い
材料が多く、記録膜の劣化防止のための保護膜を選定す
ることが重要である。従来の光記録媒体の保護膜として
は、Si3N4,AlN等の窒化膜やSiO,SiO2等の酸化膜が検討
されており、一般に記録膜を挾んだ形で設けられる。As the recording film of the optical recording medium, there are many materials such as tellurium alloy films and rare earth-transition metal alloy films that are easily deteriorated by oxidation or corrosion, so select a protective film to prevent deterioration of the recording film. is important. As a conventional protective film for an optical recording medium, a nitride film of Si 3 N 4 , AlN or the like or an oxide film of SiO, SiO 2 or the like has been studied, and it is generally provided in a state of sandwiching the recording film.
発明が解決しようとする問題点 しかしながら、基板にプラスチックを用いた場合、その
上に形成される窒化膜はヒビ割れを生じ易く、光記録媒
体へのレーザ光照射の繰り返しや保管環境温度の急変で
媒体の破壊がもたらされるという欠点を有していた。DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention However, when plastic is used for the substrate, the nitride film formed thereon is likely to be cracked, and repeated irradiation of laser light on the optical recording medium or a sudden change in storage environment temperature may occur. It had the drawback of causing destruction of the medium.
これは基板と窒化膜の熱膨張率差、窒化膜の残留応力等
に起因していると考えられる。また、SiO2膜は膜界面に
遊離した酸素を持つため、記録膜の酸化劣化を促進し易
く、特に記録膜が希土類−遷移金属系合金膜の場合、第
３図に示すように60℃,90％RHの試験環境下で100時間前
後で特性が劣化してしまうという欠点を有していた。さ
らに、SiO膜を保護膜として用いた場合、第４図に示す
ように記録感度が時間とともに変化して行くという欠点
を有していた。It is considered that this is due to the difference in thermal expansion coefficient between the substrate and the nitride film, the residual stress of the nitride film, and the like. Further, since the SiO 2 film has free oxygen at the film interface, it is easy to accelerate the oxidative deterioration of the recording film. Especially when the recording film is a rare earth-transition metal alloy film, as shown in FIG. It had the drawback that the characteristics would deteriorate in about 100 hours under a test environment of 90% RH. Further, when the SiO film is used as the protective film, there is a drawback that the recording sensitivity changes with time as shown in FIG.
本発明は、上記問題点に鑑み、耐久性に優れた高信頼性
の光記録媒体を提供するものである。In view of the above problems, the present invention provides a highly reliable optical recording medium having excellent durability.
問題点を解決するための手段 この目的を達成するために本発明の光記録媒体は、記録
膜の保護膜が、記録膜に近い側から順に窒化物層、窒化
物と酸化物の共存層、酸化物層で構成されている。Means for Solving the Problems In order to achieve this object, the optical recording medium of the present invention has a protective film of a recording film, a nitride layer, a coexisting layer of a nitride and an oxide in order from the side closer to the recording film, It is composed of an oxide layer.
作用 本発明は上記した膜の残留応力が小さく、基板への付着
力が大きい酸化物層と、記録膜の酸化劣化の防止能力を
有する窒化物層および、酸化物層−窒化物層間の整合を
図る共存層とからなる構成によって、プラスチック基板
を用いた場合でも膜にヒビ割れが発生し難く、記録膜の
酸化や腐食を防止できるもので、記録再生特性の安定し
た高信頼性の光記録媒体を実現できる。Action The present invention provides the above-described oxide layer having a small residual stress of the film and a large adhesion to the substrate, a nitride layer having a capability of preventing oxidative deterioration of the recording film, and a matching between the oxide layer and the nitride layer. Due to the structure composed of the coexisting layer, the film is less likely to be cracked even when a plastic substrate is used, and the recording film can be prevented from being oxidized or corroded. Therefore, a highly reliable optical recording medium having stable recording / reproducing characteristics. Can be realized.
実 施 例 以下、本発明の実施例について図面を参照しながら説明
する。EXAMPLES Examples of the present invention will be described below with reference to the drawings.
第１図は、本発明の一実施例の光記録媒体の構造を示す
断面図である。第１図において、11はポリカーボネイト
基板、12a〜ｃおよび14は保護膜で、12aは酸化ケイ素
層、12bは酸化ケイ素と窒化ケイ素の共存層（以下共存
層という）、12cおよび14は窒化ケイ素層、13は記録膜
（GdTbFe膜）である。上記各保護膜（12a〜ｃおよび1
4）はスパッタリング法あるいはエレクトロン−サイク
ロトン共鳴CVD法（ECR−CVD法）を用いて形成し、酸化
ケイ素層12a,共存層12b,窒化ケイ素層12c,14の各層は、
反応ガスである酸素ガスと窒素ガスの混合比を切り換え
て形成を行なった。また、記録膜13はスパッタリング法
によって形成した。それぞれの膜厚は、酸化ケイ素層12
aが50〜1000Å，共存層12bが５〜500Å，窒化ケイ素層1
2cおよび14が300〜5000Å，記録膜13が300〜1500Åであ
る。FIG. 1 is a sectional view showing the structure of an optical recording medium according to an embodiment of the present invention. In FIG. 1, 11 is a polycarbonate substrate, 12a to c and 14 are protective films, 12a is a silicon oxide layer, 12b is a coexisting layer of silicon oxide and silicon nitride (hereinafter referred to as coexisting layer), and 12c and 14 are silicon nitride layers. , 13 are recording films (GdTbFe films). Each protective film (12a-c and 1)
4) is formed by using a sputtering method or an electron-cyclotron resonance CVD method (ECR-CVD method).
Formation was performed by switching the mixing ratio of oxygen gas and nitrogen gas which are reaction gases. The recording film 13 was formed by the sputtering method. Each film thickness is the silicon oxide layer 12
a is 50 to 1000Å, coexistence layer 12b is 5 to 500Å, silicon nitride layer 1
2c and 14 are 300 to 5000Å, and the recording film 13 is 300 to 1500Å.
第２図は、本発明による第１図の構造の光記録媒体につ
いて60℃90％RHの環境下での記録膜の保磁力とカー回転
角と記録感度の経時変化を示したものである。記録膜が
酸化や腐食等によって劣化すると保磁力、カー回転角が
低下するが、第２図に示すように、本発明による３層構
成の保護膜を用いた場合、2000時間以上ヒビ割れの発生
や保磁力、カー回転角および記録感度の劣化は認められ
なかった。FIG. 2 shows changes with time in the coercive force, Kerr rotation angle and recording sensitivity of the recording film under the environment of 60 ° C. and 90% RH for the optical recording medium having the structure of FIG. 1 according to the present invention. When the recording film deteriorates due to oxidation or corrosion, the coercive force and the Kerr rotation angle decrease, but as shown in FIG. 2, when the protective film having a three-layer structure according to the present invention is used, cracking occurs for 2000 hours or more. No deterioration of coercive force, Kerr rotation angle and recording sensitivity was observed.
以上のように、本実施例によれば、保護膜にヒビ割れの
発生がなく、記録膜の劣化がない高信頼性の光記録媒体
が実現できる。As described above, according to this embodiment, it is possible to realize a highly reliable optical recording medium in which the protective film is not cracked and the recording film is not deteriorated.
なお、本実施例では、基板としてポリカーボネイト、記
録膜として希土類−遷移金属系合金、酸化物層として酸
化ケイ素、共存層として酸化ケイ素と窒化ケイ素の共存
層、窒化物層として窒化ケイ素を用いたが、基板にガラ
スはもちろんアクリル，エポキシ，その他のプラスチッ
ク、記録膜にテルル系合金や熱可塑性樹脂等、酸化物層
に酸化アルミニウム、共存層に酸化アルミニウムと窒化
アルミニウムの共存層、窒化物層に窒化アルミニウムを
用いても同様の効果が得られる。In this example, polycarbonate was used as the substrate, rare earth-transition metal alloy was used as the recording film, silicon oxide was used as the oxide layer, silicon oxide / silicon nitride coexisting layer was used as the coexisting layer, and silicon nitride was used as the nitride layer. , Glass as well as acrylic, epoxy, and other plastics for the substrate, tellurium alloy or thermoplastic resin for the recording film, aluminum oxide for the oxide layer, coexisting layer of aluminum oxide and aluminum nitride for the coexisting layer, nitride for the nitride layer The same effect can be obtained by using aluminum.
発明の効果 本発明は、光記録媒体の保護膜として、窒化物層、窒化
物と酸化物の共存層、酸化物層からなるセラミック膜を
用いることにより、高信頼性の光記録媒体を提供するも
のである。EFFECTS OF THE INVENTION The present invention provides a highly reliable optical recording medium by using a ceramic film including a nitride layer, a coexisting layer of nitride and oxide, and an oxide layer as a protective film of the optical recording medium. It is a thing.
第１図は本発明の一実施例における光記録媒体の構造を
示す断面図、第２図は本発明による保護膜を用いた第１
図の構造の光記録媒体について、60℃90％RHの環境下で
の記録膜の保磁力、カー回転角、および記録感度の経時
変化を示した特性図、第３図はSiO2を保護膜として用い
た場合の記録膜の保磁力の経時変化を示した特性図、第
４図はSiOを保護膜として用いた場合の記録膜の記録感
度の経時変化を示した特性図である。 11……ポリカーボネイト基板、12a……酸化ケイ素層
（酸化物層）、12b……酸化ケイ素と窒化ケイ素の共存
層（酸化物と窒化物の共存層）、12c……窒化ケイ素層
（窒化物層）、13……記録膜（GdTbFe膜）、14……窒化
ケイ素層。FIG. 1 is a cross-sectional view showing the structure of an optical recording medium according to an embodiment of the present invention, and FIG. 2 is a first embodiment using a protective film according to the present invention.
Regarding the optical recording medium having the structure shown in the figure, a characteristic diagram showing changes with time of the coercive force, Kerr rotation angle, and recording sensitivity of the recording film in an environment of 60 ° C. and 90% RH, and FIG. 3 shows a SiO 2 protective film. FIG. 4 is a characteristic diagram showing a change with time of the coercive force of the recording film when used as a protective film, and FIG. 4 is a characteristic diagram showing a change with time of the recording sensitivity of the recording film when SiO is used as a protective film. 11 ... Polycarbonate substrate, 12a ... Silicon oxide layer (oxide layer), 12b ... Silicon oxide and silicon nitride coexisting layer (oxide and nitride coexisting layer), 12c ... Silicon nitride layer (nitride layer) ), 13 ... Recording film (GdTbFe film), 14 ... Silicon nitride layer.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 家城 満 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (56)参考文献 特開 昭62−281142（ＪＰ，Ａ) 特開 昭62−281143（ＪＰ，Ａ) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Mitsuru Ieshiro 1006, Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (56) References JP 62-281142 (JP, A) JP 62- 281143 (JP, A)
Claims (2)
記保護膜が、前記記録膜に近い側から順に窒化物層、窒
化物と酸化物の共存層、酸化物層で構成されていること
を特徴とする光記録媒体。1. A protective film is provided between a substrate and a recording film, and the protective film is composed of a nitride layer, a nitride-oxide coexisting layer, and an oxide layer in order from the side closer to the recording film. An optical recording medium characterized by the following.
ウム、酸化物層が酸化ケイ素または酸化アルミニウム、
共存層が窒化ケイ素と酸化ケイ素の共存層または窒化ア
ルミニウムと酸化アルミニウムの共存層であることを特
徴とする特許請求の範囲第１項記載の光記録媒体。2. The nitride layer is silicon nitride or aluminum nitride, the oxide layer is silicon oxide or aluminum oxide,
The optical recording medium according to claim 1, wherein the coexisting layer is a coexisting layer of silicon nitride and silicon oxide or a coexisting layer of aluminum nitride and aluminum oxide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61140792A JPH0766566B2 (en) | 1986-06-17 | 1986-06-17 | Optical recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61140792A JPH0766566B2 (en) | 1986-06-17 | 1986-06-17 | Optical recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62298037A JPS62298037A (en) | 1987-12-25 |
| JPH0766566B2 true JPH0766566B2 (en) | 1995-07-19 |
Family
ID=15276847
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61140792A Expired - Fee Related JPH0766566B2 (en) | 1986-06-17 | 1986-06-17 | Optical recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0766566B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2597630B2 (en) * | 1988-03-04 | 1997-04-09 | 株式会社東芝 | Optical memory medium |
| JPH01271937A (en) * | 1988-04-23 | 1989-10-31 | Hitachi Maxell Ltd | Optical information recording medium |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH079715B2 (en) * | 1986-05-30 | 1995-02-01 | ティーディーケイ株式会社 | Magneto-optical recording medium |
| JPH0770096B2 (en) * | 1986-05-30 | 1995-07-31 | ティーディーケイ株式会社 | Magneto-optical recording medium |
-
1986
- 1986-06-17 JP JP61140792A patent/JPH0766566B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62298037A (en) | 1987-12-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |