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JPH0775252B2 - Lead frame material manufacturing method - Google Patents
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JPH0775252B2 - Lead frame material manufacturing method - Google Patents

Lead frame material manufacturing method

Info

Publication number
JPH0775252B2
JPH0775252B2 JP63014983A JP1498388A JPH0775252B2 JP H0775252 B2 JPH0775252 B2 JP H0775252B2 JP 63014983 A JP63014983 A JP 63014983A JP 1498388 A JP1498388 A JP 1498388A JP H0775252 B2 JPH0775252 B2 JP H0775252B2
Authority
JP
Japan
Prior art keywords
lead frame
inclusions
plate material
precipitates
wire
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63014983A
Other languages
Japanese (ja)
Other versions
JPH01189947A (en
Inventor
晴夫 幸野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Shindoh Co Ltd
Original Assignee
Mitsubishi Shindoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Shindoh Co Ltd filed Critical Mitsubishi Shindoh Co Ltd
Priority to JP63014983A priority Critical patent/JPH0775252B2/en
Publication of JPH01189947A publication Critical patent/JPH01189947A/en
Publication of JPH0775252B2 publication Critical patent/JPH0775252B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon

Landscapes

  • Lead Frames For Integrated Circuits (AREA)

Description

【発明の詳細な説明】 「産業上の利用分野」 本発明は、集積回路素子の製造に使用されるリードフレ
ームの材料に係わり、特に、めっき層の介在なしにワイ
ヤを直接接合できるリードフレーム材の製造方法に関す
る。
TECHNICAL FIELD The present invention relates to a material of a lead frame used for manufacturing an integrated circuit device, and more particularly, to a lead frame material capable of directly bonding a wire without interposing a plating layer. Manufacturing method.

「従来の技術」 一般のリードフレームは、銅または銅合金からなる板材
を打抜形成し、さらに、ワイヤボンディングを行なう箇
所に金または銀めっきを施して製造されている。このよ
うに金(銀)めっきを施すのは、金属板から打ち抜き成
形したままの状態では、金または銅製のワイヤを十分な
強度で接合できないためである。
"Prior Art" A general lead frame is manufactured by punching and forming a plate material made of copper or a copper alloy, and further, gold or silver plating is applied to a portion for wire bonding. The reason why the gold (silver) plating is applied is that the gold or copper wire cannot be joined with sufficient strength in the state where the metal plate is punched and formed.

しかし、前記めっきの良否はワイヤボンディングに極め
て大きな影響を与えるため、リードフレーム材にめっき
を行なうに際しては極めて高い精度が要求され、生産性
が低いとともに、微小量ではあっても貴金属を用いるた
めコストが高いという欠点があった。
However, since the quality of the plating has a great influence on the wire bonding, extremely high accuracy is required when plating the lead frame material, and the productivity is low, and the precious metal is used even if it is a minute amount. It had the drawback of being expensive.

そこで、金(銀)めっきを施さずに、リードフレーム材
に直接ワイヤーボンディングができれば著しいコスト低
減が可能であるとの観点から、例えば特公昭62−46071
号公報においては、銅または銅合金製のリードフレーム
材の表面粗さを最大高さ(Rmax)で0.5μm以下にする
とともに、表面に現れる析出物や介在物等の単一面積を
3×10-6mm2以下とすることにより、金ワイヤの直接接
合が可能であるとの提案がなされている。
Therefore, from the viewpoint that it is possible to significantly reduce the cost if wire bonding can be directly performed on the lead frame material without applying gold (silver) plating, for example, Japanese Patent Publication No. 62-46071.
In the publication, the surface roughness of the lead frame material made of copper or copper alloy is 0.5 μm or less at the maximum height (Rmax), and the single area of precipitates or inclusions appearing on the surface is 3 × 10 5. It has been proposed that direct bonding of gold wires is possible by setting the thickness to -6 mm 2 or less.

「発明が解決しようとする課題」 しかし、本発明者らが実際に実験を行なった結果、Rmax
を0.5μm以下、かつ表面に現れる析出物や介在物等の
単一面積を3×10-6mm2以下としても、ワイヤの接合が
必ずしもうまくいかず、十分な接合強度が得られない場
合のあることが判明した。また、析出物や介在物の単一
面積を3×10-6mm2以下にまで微細化することは、前記
公報では「圧延の加工度と焼鈍条件を選択することによ
り可能」と記載されているものの、実際は予想以上に困
難で、製造コストも高くついてしまうことがわかった。
なお、リードフレーム材の表面に存在する析出物とは、
FeP等の金属間化合物が主であり、他方、介在物とはZr,
Cr,Si,Al等の酸化物が主である。
"Problems to be solved by the invention" However, as a result of actual experiments conducted by the present inventors, Rmax
Is less than 0.5 μm and the single area of precipitates or inclusions appearing on the surface is less than 3 × 10 -6 mm 2 , the wire joining does not always go well and sufficient joining strength cannot be obtained. It turned out to be. Further, it is described in the above-mentioned publication that "it is possible by selecting the workability of rolling and the annealing conditions" to reduce the single area of the precipitates and inclusions to 3 × 10 -6 mm 2 or less. However, it turned out that it was more difficult than expected and the manufacturing cost was high.
The precipitates present on the surface of the lead frame material are
Mainly intermetallic compounds such as FeP, while inclusions are Zr,
Oxides such as Cr, Si and Al are mainly used.

そこで本発明者らは、これら析出物や介在物をさらに詳
細に調べ、前記従来品の欠点を補いうる、次のような全
く新たな知見を得るに至った。
Therefore, the present inventors have investigated these precipitates and inclusions in more detail, and have obtained the following new knowledge that can supplement the drawbacks of the conventional products.

すなわち、前記公報のように析出物や介在物の単一面積
そのものを極端に微細化するのではなく、これら析出物
や介在物の単一面積が比較的大きい場合にも、これらを
酸処理等により溶解除去し、その跡に微細な凹部を多数
形成する。このようにリードフレーム材表面に多数の微
細な凹部を形成すると、ワイヤを周知の接合方法で圧接
した際に、ワイヤ接合部が凹部内にまで侵入して食い込
み、非常に高い接合強度が得られるのである。
That is, the single area itself of the precipitates or inclusions is not extremely miniaturized as in the above publication, and even when the single area of these precipitates or inclusions is relatively large, these are treated with an acid or the like. Are dissolved and removed by, and a large number of fine recesses are formed on the traces. When a large number of minute recesses are formed on the surface of the lead frame material in this way, when the wire is pressure-welded by a known bonding method, the wire bonding portion penetrates into the recess and bites into the recess, resulting in extremely high bonding strength. Of.

本発明者らは、さらに凹部の大きさについても子細な検
討を行ない、1〜3000×10-8mm2の場合に特に良好な接
合強度が得られことを突き止めた。なお、この場合の上
限面積である3000×10-8mm2という数値は、前記公報に
おける面積上限の10倍に相当している。
The present inventors further conducted a detailed study on the size of the recesses and found that particularly good bonding strength was obtained in the case of 1 to 3000 × 10 −8 mm 2 . The numerical value of 3000 × 10 −8 mm 2 which is the upper limit area in this case corresponds to 10 times the upper limit of the area in the above publication.

「課題を解決するための手段」 本発明は上記知見に基づいてなされたもので、ジルコン
銅、鉄入銅、および錫入銅から選択される材質で形成さ
れ介在物または析出物が表面に露出した板材を用意する
工程と、前記板材に、その表面がRa:0.12μm以下の極
平滑面とされた圧延ロールを用いて、変形量が1〜5%
となるように仕上軽圧延を行うことにより、前記板材の
表面粗さをRa:0.15μm以下とする表面平滑化工程と、
前記表面平滑化工程の前または後において、前記板材の
表面から前記介在物および析出物を溶解除去することに
より、前記板材の表面に、開口面積が1〜3000×10-8mm
2の凹部を500〜10000個/mm2の分布密度で形成する多孔
化工程とを具備することを特徴としている。
"Means for Solving the Problems" The present invention has been made based on the above findings, and is formed of a material selected from zircon copper, iron-containing copper, and tin-containing copper, and inclusions or precipitates are exposed on the surface. And the amount of deformation is 1 to 5% by using a rolling roll whose surface is an extremely smooth surface with Ra: 0.12 μm or less.
A surface smoothing step of making the surface roughness of the plate material Ra: 0.15 μm or less by performing light rolling for finishing so that
Before or after the surface smoothing step, by dissolving and removing the inclusions and precipitates from the surface of the plate material, the opening area on the surface of the plate material is 1 ~ 3000 × 10 -8 mm
The method is characterized by further comprising a porosification step of forming two concave portions at a distribution density of 500 to 10,000 / mm 2 .

以下、本発明を詳細に説明する。Hereinafter, the present invention will be described in detail.

本発明に使用するリードフレーム材の材質としては、ジ
ルコン銅,鉄入銅,錫入銅など従来同様のものが使用さ
れ、特に、Zr等の含有率が高く介在物を発生しやすいC1
5000,C15100や、FeP等の析出物を発生しやすいC19400等
が好適である(以上、いずれもCDA番号)。
As the material of the lead frame material used in the present invention, zircon copper, iron-filled copper, tin-filled copper, etc. similar to the conventional ones are used. In particular, C1 having a high content ratio of Zr etc. and easily generating inclusions
5000, C15100, C19400 and the like, which easily generate precipitates such as FeP, are suitable (these are all CDA numbers).

そして、まずこの板材を通常の圧延加工により、例えば
厚さ0.3mm程度に成形し、次いで通常の仕上圧延を施し
て0.26mm程度とした後、必要に応じてバフ研磨等を施
す。次に、表面が極平滑面とされた圧延ロールにより、
前記板材に軽荷重をかけて仕上軽圧延を施す。この圧延
ロールに要求される表面粗さはRa:0.12μm以下であ
り、また仕上軽圧延の際の荷重は、板材の変形量が1〜
5%程度となるように設定されることが望ましい。
Then, first, this plate material is formed into a thickness of, for example, about 0.3 mm by a normal rolling process, then subjected to a normal finish rolling to a size of about 0.26 mm, and then buffed or the like if necessary. Next, with a rolling roll whose surface is an extremely smooth surface,
A light load is applied to the plate material for finish light rolling. The surface roughness required for this rolling roll is Ra: 0.12 μm or less, and the load during finishing light rolling is 1 to 1
It is desirable to set it to about 5%.

圧延ロールの表面が上記範囲より粗いと、圧延による変
形量をどのように設定しても板材の表面粗さがRa:0.15
μm以下にならない。また、板材の変形量が1%より小
では、圧延ロールの表面粗さが十分小さくとも板材の表
面粗さを十分高めることができず、逆に、板材の変形量
が5%より大きいと、圧延ロール表面に存在する凹部が
板材の表面に凸部として転写され、表面粗さをかえって
低下させるのみならず、板材表面に加工歪みによる表面
硬化が生じてワイヤボンディング制を低下させてしま
う。
If the surface of the rolling roll is rougher than the above range, the surface roughness of the plate material will be Ra: 0.15 no matter how the deformation amount by rolling is set.
Does not fall below μm. Further, if the deformation amount of the plate material is less than 1%, the surface roughness of the plate material cannot be sufficiently increased even if the surface roughness of the rolling roll is sufficiently small. Conversely, if the deformation amount of the plate material is greater than 5%, The concave portions existing on the surface of the rolling roll are transferred to the surface of the plate material as convex portions, which not only lowers the surface roughness, but also causes surface hardening due to processing strain on the surface of the plate material to deteriorate the wire bonding system.

以上の仕上軽圧延により、リードフレーム材の中心線平
均粗さ(Ra)を0.15μm以下に平滑化する。この値が0.
15μmより大きいと、ワイヤの接合部とリードフレーム
表面との間に微小な隙間が生じやすく、接合強度を低下
させる。
By the above light finishing rolling, the center line average roughness (Ra) of the lead frame material is smoothed to 0.15 μm or less. This value is 0.
If it is larger than 15 μm, a minute gap is apt to be formed between the wire bonding portion and the lead frame surface, and the bonding strength is lowered.

次に、仕上軽圧延を終えた板材を処理液に浸漬し、その
表面に存在するFeP等の析出物、および各種金属の酸化
物等からなる介在物を溶解除去し、その跡に多数の凹部
を形成する。前記処理液としては、塩化第二鉄等の塩素
系処理液や、フッ化水素酸等のフッ素系処理液等の溶液
が使用される。また、前記凹部の個々の開口面積は、前
述の圧延条件を選定することにより1〜3000×10-8mm2
とされる。凹部が前記範囲よりも小さいとワイヤ接合部
が噛み込むことができず、接合強度向上効果が得られな
い。また、前記範囲より大きいと凹部へのワイヤ噛み込
みが安定せず、やはり接合強度が低下する。また、リー
ドフレーム材表面における凹部の分布密度は、500〜100
00個/mm2程度であることが望ましく、それより少ないと
噛み込み不足して接合強度向上効果が得られず、他方、
多すぎると接合強度が安定しない。さらに凹部の形状
は、圧延条件等の選定により比較的深い壺状とされるこ
とが望ましい。
Next, the plate material after finishing light rolling is immersed in a treatment liquid to dissolve and remove precipitates such as FeP and the like existing on the surface and inclusions such as oxides of various metals. To form. As the processing liquid, a chlorine-based processing liquid such as ferric chloride or a fluorine-based processing liquid such as hydrofluoric acid is used. The opening area of each of the recesses is 1 to 3000 × 10 −8 mm 2 by selecting the rolling conditions described above.
It is said that If the recess is smaller than the above range, the wire bonding portion cannot be caught, and the effect of improving the bonding strength cannot be obtained. On the other hand, if it is larger than the above range, the wire biting into the recess is not stable, and the joint strength is also reduced. Also, the distribution density of the recesses on the surface of the lead frame material is 500 to 100.
It is desirable that it is about 00 pieces / mm 2 , and if it is less than that, the biting is insufficient and the effect of improving the joint strength cannot be obtained.
If it is too large, the bonding strength will not be stable. Furthermore, it is desirable that the shape of the recess be a relatively deep vase shape depending on the selection of rolling conditions and the like.

以上の構成からなるリードフレーム材の製造方法によれ
ば、表面平滑化工程において、板材の表面硬化を防ぎつ
つ板材の表面をRa:0.15μm以下にまで平滑化する一
方、多孔化工程では、板材の表面に露出した介在物およ
び析出物を溶解除去することより、板材の表面に介在物
等の粒子形状に対応した比較的深い微小凹部を形成する
ことができる。こうして得られたリードフレーム材の表
面にワイヤボンディングを行うと、リードフレーム材表
面のベースとなる平坦部にワイヤがほぼ隙間なく接合さ
れ、両者間の空隙に水分等が進入してワイヤ接合強度を
低下させるなどの問題を防ぐことができると同時に、平
坦部の所々に生じている深い微小凹部にワイヤ材質が塑
性変形して局部的に噛み込むため、そのアンカー効果に
より、単なる平坦面にワイヤボンディングを行った場合
以上の接合強度が得られる。
According to the method for manufacturing a lead frame material having the above configuration, in the surface smoothing step, the surface of the plate material is smoothed to Ra: 0.15 μm or less while preventing surface hardening of the plate material, while in the porosification step, the plate material is By dissolving and removing the inclusions and precipitates exposed on the surface of the plate, it is possible to form relatively deep minute recesses corresponding to the particle shape of the inclusions on the surface of the plate material. When wire bonding is performed on the surface of the lead frame material obtained in this way, the wire is bonded to the flat part that is the base of the lead frame material surface with almost no gap, and moisture enters into the gap between them to improve the wire bonding strength. It is possible to prevent problems such as lowering, and at the same time, the wire material is plastically deformed and locally bites into the deep minute recesses that occur in some flat parts, so the anchor effect allows wire bonding to a simple flat surface. When the above is performed, a higher bonding strength can be obtained.

なお、介在物の溶解除去によりリードフレーム材の表面
に深い微小凹部を形成したとしても、表面粗さがRa:0.1
5μmより粗ければ、塑性変形により微小凹部内にワイ
ヤ材質を十分深く進入させることが困難となり、十分な
アンカー効果が得られないだけでなく、前述のように水
分等の進入により接合強度が低下するおそれが生じる。
逆に、リードフレーム材の表面粗さがいくら良好であっ
ても、微小凹部が存在しないと良好なアンカー効果が得
られず、ワイヤ接合強度は低下する。すなわち、リード
フレーム材の表面粗さをRa:0.15μm以下とする表面平
滑化工程と、リードフレーム材の表面に微小凹部を形成
する多孔化工程とを組み合わせて始めて、ワイヤボンデ
ィング性を著しく向上することが可能となるのである。
Even if a deep minute recess is formed on the surface of the lead frame material by dissolving and removing inclusions, the surface roughness Ra: 0.1
If it is less than 5 μm, it becomes difficult to penetrate the wire material deep enough into the minute recesses due to plastic deformation, and not only a sufficient anchoring effect cannot be obtained, but also the bonding strength decreases due to the penetration of moisture as described above. May occur.
On the contrary, no matter how good the surface roughness of the lead frame material is, a good anchoring effect cannot be obtained without the fine recesses, and the wire bonding strength is reduced. That is, the wire bonding property is remarkably improved only by combining the surface smoothing step for making the surface roughness of the lead frame material Ra: 0.15 μm or less and the porosification step for forming the minute recesses on the surface of the lead frame material. It becomes possible.

さらに、本発明の方法では、従来法のように析出物や介
在物の単一面積を極端に低減する必要がないので、複雑
な処理が要らず、その分、製造コストが安く済むという
利点も得られる。
Furthermore, in the method of the present invention, since it is not necessary to extremely reduce the single area of precipitates and inclusions as in the conventional method, there is no need for complicated treatment, and there is an advantage that the manufacturing cost can be reduced accordingly. can get.

なお、上記実施例では、仕上軽圧延を行なってから析出
物や介在物の溶解処理を施していたが、その順序は逆で
あってもよいし、必要に応じてこれらの前後に他の処理
を加えてもよい。
In the above-mentioned examples, the finish light rolling was performed and then the precipitates and inclusions were dissolved. However, the order may be reversed, and other treatments may be performed before and after these treatments as necessary. May be added.

「実施例」 次に実施例を挙げて、本発明の効果を実証する。"Example" Next, the effect of the present invention will be demonstrated with reference to an example.

C15100(CDA番号)の銅合金板から通常の圧延加工によ
り0.255厚×25.4幅×200mm長のリードフレーム材を6枚
成形した。
Six lead frame materials of 0.255 thickness x 25.4 width x 200 mm length were formed from a C15100 (CDA number) copper alloy plate by ordinary rolling.

次いで、そのうち3枚に、表面粗さがRa:0.07、0.09、
0.11μmの計3種の表面平滑化圧延ロールによりそれぞ
れ変形量2%で仕上軽圧延を行なった(順に実施例1,2,
3とする)。さらにこれらを25℃の塩化第二鉄5wt%およ
び塩酸10wt%を含む溶液に1分間浸漬し、表面に露出し
ている析出物および介在物を完全に溶解した。
Next, surface roughness Ra: 0.07, 0.09,
Finishing light rolling was performed with a total deformation amount of 0.11 μm and a deformation amount of 2% using three types of surface smoothing rolling rolls (Examples 1, 2, and
3). Further, these were immersed in a solution containing 5 wt% ferric chloride and 10 wt% hydrochloric acid at 25 ° C for 1 minute to completely dissolve the precipitates and inclusions exposed on the surface.

一方、比較例として、Ra:0.12であるが析出物や介在物
を除去していないもの(比較例1)、析出物や介在物を
除去しているがRaが本発明の条件を満たさないもの(比
較例2)、Ra:0.34で析出物除去も行っていないもの
(比較例3)を用意した。
On the other hand, as a comparative example, Ra: 0.12 but no precipitates or inclusions were removed (Comparative Example 1), or a precipitate or inclusions were removed but Ra did not satisfy the conditions of the present invention. (Comparative Example 2) and Ra: 0.34 with no precipitation removed (Comparative Example 3) were prepared.

そして、以上全てのリードフレーム材の表面粗さを表面
粗さ計等により測定するとともに、表面の凹部の大きさ
や、分布密度、凹部形状を走査顕微鏡を用いて計測し
た。
Then, the surface roughness of all the lead frame materials was measured by a surface roughness meter or the like, and the size, distribution density, and shape of the recesses on the surface were measured using a scanning microscope.

次に、これらのリードフレーム材を自動ワイヤ接合装置
にセットし、実際にワイヤボンディングを行なった。そ
の条件を以下に示す。
Next, these lead frame materials were set in an automatic wire joining device, and actual wire bonding was performed. The conditions are shown below.

接合方法:サーモソニック法 ワイヤ材質:金 ワイヤ直径:25μm リードフレーム:温度:225℃ 接合荷重:40g 超音波出力:0.25W 超音波発生時間:20msec. その後、接合し終えたワイヤをフックにより引き上げ
て、ワイヤを切断するのに要する引上荷重を測定した。
併せて、接合強度の評価も行なった。この評価は、接合
部がワイヤ引上荷重に耐えてワイヤ切断に至るまで何の
変化も見られない場合が「○」、接合部が一部剥離した
後ワイヤが切断したものが「△」、完全に剥離したもの
が「×」である。その結果を次表に示す。なお表中、実
1〜3は実施例、比1〜3は比較例である。
Joining method: Thermosonic method Wire material: Gold Wire diameter: 25μm Lead frame: Temperature: 225 ℃ Joining load: 40g Ultrasonic output: 0.25W Ultrasonic wave generation time: 20msec. After that, pull up the joined wire with a hook The pulling load required to cut the wire was measured.
At the same time, the joint strength was evaluated. This evaluation is "○" when there is no change until the wire is cut at the bonded part up to the wire pulling load, "△" when the wire is cut after the bonded part is partially peeled off, What was completely peeled off is "x". The results are shown in the table below. In the table, Examples 1 to 3 are Examples and ratios 1 to 3 are Comparative Examples.

以上説明したように、本発明に係るリードフレーム材の
製造方法では、表面平滑化工程において、板材の表面硬
化を防ぎつつ板材の表面をRa:0.15μm以下にまで平滑
化する一方、多孔化工程では、板材の表面に露出してい
る介在物および析出物を溶解除去することにより、介在
物等の粒子形状に対応した比較的深い微小凹部を形成す
ることができる。こうして得られたリードフレーム材の
表面にワイヤボンディングを行うと、リードフレーム材
表面のベースとなる平坦部にワイヤがほぼ隙間なく接合
され、両者間の空隙に水分等が進入してワイヤ接合強度
を低下させるなどの問題を防ぐことができると同時に、
平坦部の所々に生じている深い微小凹部にワイヤ材質が
塑性変化して局部的に噛み込むため、そのアンカー効果
により、単なる平坦面にワイヤボンディングを行った場
合以上の接合強度が得られ、ワイヤ直接接合の信頼性を
格段に向上することが可能である。特に本発明では、板
材として介在物および析出物を多く含むジルコン銅、鉄
入銅および錫入銅から選択される材質を使用しているか
ら、板材の表面に、開口面積が1〜3000×10-8mm2の凹
部を500〜10000個/mm2の分布密度で形成することがで
き、前記アンカー効果をいっそう効果的にすることが可
能である。また、析出物や介在物の単一面積を極端に低
減する必要がないので、複雑な処理が要らず、その分、
製造コストが安く済むという利点もある。
As described above, in the method for manufacturing a lead frame material according to the present invention, in the surface smoothing step, the surface of the plate material is smoothed to Ra: 0.15 μm or less while preventing surface hardening of the plate material, while the porosification step is performed. Then, by dissolving and removing the inclusions and precipitates exposed on the surface of the plate material, it is possible to form relatively deep minute recesses corresponding to the particle shape of the inclusions. When wire bonding is performed on the surface of the lead frame material obtained in this way, the wire is bonded to the flat part that is the base of the surface of the lead frame material with almost no gap, and moisture enters into the space between them to improve the wire bonding strength. You can prevent problems such as lowering, at the same time
Since the wire material plastically changes and bites locally in the deep minute recesses that occur in flat parts, the anchoring effect provides a bonding strength higher than that when wire bonding is performed on a simple flat surface. It is possible to significantly improve the reliability of direct joining. In particular, in the present invention, since a material selected from zircon copper containing a large amount of inclusions and precipitates, iron-containing copper and tin-containing copper is used as the plate material, the surface area of the plate material has an opening area of 1 to 3000 × 10. -8 mm 2 recesses can be formed with a distribution density of 500 to 10000 / mm 2 and the anchor effect can be made even more effective. Further, since it is not necessary to extremely reduce the single area of precipitates and inclusions, complicated processing is not required,
There is also an advantage that the manufacturing cost can be reduced.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】ジルコン銅、鉄入銅、および錫入銅から選
択される材質で形成され介在物または析出物が表面に露
出した板材を用意する工程と、 前記板材に、その表面がRa:0.12μm以下の極平滑面と
された圧延ロールを用いて、変形量が1〜5%となるよ
うに仕上軽圧延を行うことにより、前記板材の表面粗さ
をRa:0.15μm以下とする表面平滑化工程と、 前記表面平滑化工程の前または後において、前記板材の
表面から前記介在物および析出物を溶解除去することに
より、前記板材の表面に、開口面積が1〜3000×10-8mm
2の凹部を500〜10000個/mm2の分布密度で形成する多孔
化工程とを具備することを特徴とするリードフレーム材
の製造方法。
1. A step of preparing a plate material formed of a material selected from zircon copper, iron-containing copper, and tin-containing copper and having inclusions or precipitates exposed on the surface, and the plate material having a surface of Ra: Surface that makes the surface roughness Ra: 0.15 μm or less by performing light finishing rolling so that the deformation amount is 1 to 5% using a rolling roll having an extremely smooth surface of 0.12 μm or less. Smoothing step, before or after the surface smoothing step, by dissolving and removing the inclusions and precipitates from the surface of the plate material, on the surface of the plate material, the opening area is 1 ~ 3000 × 10 -8 mm
2. A method of manufacturing a lead frame material, which comprises a step of forming a number of recesses of 2 at a distribution density of 500 to 10000 / mm 2 .
JP63014983A 1988-01-26 1988-01-26 Lead frame material manufacturing method Expired - Lifetime JPH0775252B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63014983A JPH0775252B2 (en) 1988-01-26 1988-01-26 Lead frame material manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63014983A JPH0775252B2 (en) 1988-01-26 1988-01-26 Lead frame material manufacturing method

Publications (2)

Publication Number Publication Date
JPH01189947A JPH01189947A (en) 1989-07-31
JPH0775252B2 true JPH0775252B2 (en) 1995-08-09

Family

ID=11876197

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63014983A Expired - Lifetime JPH0775252B2 (en) 1988-01-26 1988-01-26 Lead frame material manufacturing method

Country Status (1)

Country Link
JP (1) JPH0775252B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69110435T2 (en) * 1990-12-20 1995-11-16 Toshiba Kawasaki Kk Copper alloys and conductor grids made from them.

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61218149A (en) * 1985-03-25 1986-09-27 Hitachi Ltd Semiconductor device

Also Published As

Publication number Publication date
JPH01189947A (en) 1989-07-31

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