JPH0776865B2 - Method of making a display having a diffraction grating pattern - Google Patents
Method of making a display having a diffraction grating patternInfo
- Publication number
- JPH0776865B2 JPH0776865B2 JP1305716A JP30571689A JPH0776865B2 JP H0776865 B2 JPH0776865 B2 JP H0776865B2 JP 1305716 A JP1305716 A JP 1305716A JP 30571689 A JP30571689 A JP 30571689A JP H0776865 B2 JPH0776865 B2 JP H0776865B2
- Authority
- JP
- Japan
- Prior art keywords
- diffraction grating
- laser beam
- light
- display
- grating pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
- G03H1/30—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique discrete holograms only
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0476—Holographic printer
- G03H2001/0482—Interference based printer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0493—Special holograms not otherwise provided for, e.g. conoscopic, referenceless holography
- G03H2001/0497—Dot matrix holograms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2223/00—Optical components
- G03H2223/12—Amplitude mask, e.g. diaphragm, Louver filter
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
【発明の詳細な説明】 ＜産業上の利用分野＞ 本発明は微小な回折格子（グレーティング）をドット毎
に２次元平面に配置することにより形成されるディスプ
レイの作成方法に関するものである。The present invention relates to a method for producing a display formed by arranging minute diffraction gratings (gratings) on a two-dimensional plane for each dot.
＜従来の技術＞ 従来、２光束干渉による微小な干渉縞を、次々と感光材
料上に露光する方法は、知られている。露光時に干渉縞
（以下、回折格子とする）のピッチ（以下、空間周波数
とする）、方向、光強度等を変化させたものである。<Prior Art> Conventionally, a method is known in which minute interference fringes due to two-beam interference are successively exposed on a photosensitive material. The pitch (hereinafter referred to as spatial frequency) of interference fringes (hereinafter referred to as a diffraction grating), the direction, the light intensity, and the like are changed during exposure.
このような回折格子パターンを有するディスプレイ及び
その作成方法は、特開昭60−156004号公報に開示されて
いる。A display having such a diffraction grating pattern and a method for producing the display are disclosed in Japanese Patent Laid-Open No. 60-156004.
＜発明が解決しようとする課題＞ 上記２光束干渉による方法では、レーザー光をビームの
まま干渉させていた。このため、レーザービームの強度
分布が、回折格子に直接影響していた。つまり、強度分
布がガウス型の分布では、回折格子の中心が露光オーバ
ーになる傾向があった。<Problems to be Solved by the Invention> In the method based on the above-described two-beam interference, the laser light is caused to interfere as it is as a beam. Therefore, the intensity distribution of the laser beam directly affects the diffraction grating. That is, when the intensity distribution is Gaussian, the center of the diffraction grating tends to be overexposed.
また、レーザービームの感光材料上での形は円形で、そ
の径も限られていた。このため、１つのパターンを形成
するために多くの時間が必要であった。Further, the shape of the laser beam on the photosensitive material was circular and its diameter was limited. Therefore, it takes a lot of time to form one pattern.
本発明は、上記の如くの問題を解決すべくなされたもの
で、回折格子パターンを構成する各ドットの強度分布が
均一で、各ドットの大きさや形状を任意に変化させ、し
かも短時間で回折格子パターンの作成を可能にすること
を目的とする。The present invention has been made to solve the above problems, in which the intensity distribution of each dot forming the diffraction grating pattern is uniform, the size and shape of each dot are arbitrarily changed, and the diffraction is performed in a short time. The purpose is to enable the creation of a grid pattern.
なお、本明細書中においては、回折格子とドットとは同
義語であり、大きさや形状の制約を受けるものではな
く、以後両者を混在して用いることとする。In the present specification, the terms “diffraction grating” and “dot” are synonymous with each other and are not restricted by size or shape, and both will be used hereafter.
＜課題を解決するための手段＞ 上記目的を達成すべくなされた本発明は、パターンの形
成に用いるレーザービームを、リファレンス光となるレ
ーザービームと、シグナル光となるレーザービームとに
分割し、前記リファレンス光およびシグナル光を、拡げ
られた平行光として交錯させ、前記感光材料直前に配置
されたマスクにより、対応する部分のみを透過させて干
渉させることにより、任意の大きさ、任意の形状のドッ
トを形成することを特徴とする回折格子パターンを有す
るディスプレイの作成方法である。<Means for Solving the Problems> The present invention made to achieve the above object is to divide a laser beam used for forming a pattern into a laser beam serving as a reference light and a laser beam serving as a signal light. The reference light and the signal light are interlaced as expanded parallel light, and a mask arranged immediately before the photosensitive material allows only corresponding portions to pass therethrough to cause interference, thereby forming dots of arbitrary size and arbitrary shape. Is a method of producing a display having a diffraction grating pattern.
＜作用＞ レーザービームを拡げ、マスクによって一部分を選択
し、干渉させるため、均一な回折格子からなるドットの
作成が可能である。また、マスクの形状を変化させるこ
とにより、任意の形状、任意の大きさのドットが作成可
能である。<Operation> Since the laser beam is expanded and a part is selected by the mask to cause interference, it is possible to create dots composed of a uniform diffraction grating. Also, by changing the shape of the mask, it is possible to create dots of any shape and any size.
＜実施例１＞ 第１図のような光学系において、マスクとして第４図に
示すものの一部を使用する例について説明する。Example 1 An example in which a part of the mask shown in FIG. 4 is used as a mask in the optical system as shown in FIG. 1 will be described.
レーザー光源から発したレーザービームはシャッター
（16）を通り、全反射ミラー（24）により光路を変え
て、ハーフミラー（22）に入射する。そして、ハーフミ
ラー（22）により、リファレンス光とシグナル光に分割
される。A laser beam emitted from a laser light source passes through a shutter (16), changes its optical path by a total reflection mirror (24), and enters a half mirror (22). Then, it is split into reference light and signal light by the half mirror (22).
リファレンス光はミラー（26）を通り、凸レンズ（4
0）、（44）によって拡げられ、平行光となり、ミラー
（30）を通って、マスク（12）に入射する。The reference light passes through the mirror (26) and the convex lens (4
0) and (44) spread the light into parallel light, which passes through the mirror (30) and enters the mask (12).
もう一方の、シグナル光は、ミラー（28）、（32）を通
り、凸レンズ（42）、（46）により拡げられ、平行光と
なりマスク（12）に入射する。マスク（12）上で２本の
平行光は交錯するように調整されている。The other signal light passes through the mirrors (28) and (32), is expanded by the convex lenses (42) and (46), becomes parallel light, and enters the mask (12). On the mask (12), the two parallel lights are adjusted so as to intersect with each other.
２本の光がマスク（12）、つまり第４図の星形を覆って
いれば、乾板（14）には、星形の回折格子が記録され
る。この時の露光時間はシャッター（16）により調整さ
れる。If two rays cover the mask (12), that is, the star shape in FIG. 4, a star-shaped diffraction grating is recorded on the dry plate (14). The exposure time at this time is adjusted by the shutter (16).
また、この光学系において、ミラー（30）を調整するこ
とにより、任意のピッチを持つ回折格子を作成すること
が可能である。Further, in this optical system, it is possible to create a diffraction grating having an arbitrary pitch by adjusting the mirror (30).
第２図と第３図を参照して、本発明の工程を説明する。
まず、ステップＡに示すように、コンピュータに画像デ
ータを入力する。入力データから、マスクの選択と露光
位置のデータを発生させ、次に光学系のＸ−Ｙステージ
を原点に移動させる（ステップＢ、Ｃ）。露光する位置
にステージを移動し、マスク（12）の使用する部分の位
置を合わせる（ステップＤ、Ｅ）。光学系のシャッター
（10）を制御し、露光を行なう（ステップＦ）。この段
階で、１つのドットの作成工程は終了する。次に、デー
タが終了したかどうかの判断をする（ステップＧ）。終
了していないときはステップＤに戻り、ステップＤ、
Ｅ、Ｆ、Ｇを繰り返す。こうして、複数の様々な形状の
ドットから成る回折格子パターンを形成する。The process of the present invention will be described with reference to FIGS. 2 and 3.
First, as shown in step A, image data is input to the computer. Data of the mask selection and the exposure position is generated from the input data, and then the XY stage of the optical system is moved to the origin (steps B and C). The stage is moved to the exposure position and the position of the portion of the mask (12) used is adjusted (steps D and E). Exposure is performed by controlling the shutter (10) of the optical system (step F). At this stage, the process of creating one dot is completed. Next, it is judged whether or not the data is completed (step G). If not completed, return to Step D, Step D,
Repeat E, F and G. In this way, a diffraction grating pattern composed of a plurality of dots having various shapes is formed.
＜発明の効果＞ レーザービームを拡げ、マスクを通して干渉させること
により、均一な回折格子からなるドットが形成される。
また、ドットの大きさ、形状が任意であるため、パター
ンを短時間で作成可能である。<Effects of the Invention> By forming a laser beam and causing it to interfere with each other through a mask, dots having a uniform diffraction grating are formed.
Further, since the size and shape of the dots are arbitrary, the pattern can be created in a short time.
図面は本発明の実施例を示すものであって、第１図は本
発明の光学系を示す概略図、第２図は本発明の工程を示
す構成図、第３図は本発明の工程を示す流れ図、第４図
は本発明におけるマスクの一実施例を示す平面図であ
る。 10……レーザービーム 12……マスク 14……フォトレジスト乾板 16……シャッター 22……ミラー、24……ハーフミラー 26……ミラー、28……ミラー 30……ミラー、32……ミラー 40……凸レンズ、42……凸レンズ 44……凸レンズ、46……凸レンズThe drawings show the embodiments of the present invention. FIG. 1 is a schematic diagram showing an optical system of the present invention, FIG. 2 is a configuration diagram showing the steps of the present invention, and FIG. 4 is a plan view showing an embodiment of the mask according to the present invention. 10 …… Laser beam 12 …… Mask 14 …… Photoresist dry plate 16 …… Shutter 22 …… Mirror, 24 …… Half mirror 26 …… Mirror, 28 …… Mirror 30 …… Mirror, 32 …… Mirror 40 …… Convex lens, 42 ... Convex lens 44 ... Convex lens, 46 ... Convex lens
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭60−156004（ＪＰ，Ａ) 特開 昭64−63902（ＪＰ，Ａ) 特開 昭61−193104（ＪＰ，Ａ) ─────────────────────────────────────────────────── ─── Continuation of front page (56) References JP-A-60-156004 (JP, A) JP-A-64-63902 (JP, A) JP-A-61-193104 (JP, A)
Claims (1)
レーザービームと、シグナル光となるレーザービームと
に分割し、各々のレーザービームを平行光として拡げた
後、Ｘ−Ｙステージ上に載置された感光材料上の同位置
に、あらかじめ設定した角度で入射させて干渉させるこ
とによって、感光材料の表面にパターン状の回折格子を
所望に配置し、回折格子パターンからなるディスプレイ
を作成する方法であって、 シャッターの開閉によって、前記レーザービームによる
露光・非露光を制御し、前記Ｘ−Ｙステージを順次移動
させることによって、感光材料の表面にパターン状の回
折格子を配置する位置を制御すると共に、 拡げられた平行光である前記リファレンス光およびシグ
ナル光を、感光材料の直前に配置されたマスクの開口に
対応する部分のみを透過させて干渉させることを特徴と
する回折格子パターンを有するディスプレイの作成方
法。1. A laser beam is divided into a laser beam that serves as a reference light and a laser beam that serves as a signal light, each laser beam is expanded as parallel light, and then mounted on an XY stage. A method of forming a display having a diffraction grating pattern by arranging a patterned diffraction grating on a surface of the photosensitive material in a desired manner by causing the light to enter at the same position on the photosensitive material at a preset angle to cause interference. By opening and closing the shutter, the exposure / non-exposure by the laser beam is controlled, and by sequentially moving the XY stage, the position where the patterned diffraction grating is arranged is controlled and expanded. The reference light and the signal light, which are parallel light thus generated, are directed to the opening of the mask arranged immediately before the photosensitive material. How to create a display having a diffraction grating pattern, characterized in that to interfere with only by transmitting portion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1305716A JPH0776865B2 (en) | 1989-11-24 | 1989-11-24 | Method of making a display having a diffraction grating pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1305716A JPH0776865B2 (en) | 1989-11-24 | 1989-11-24 | Method of making a display having a diffraction grating pattern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03164789A JPH03164789A (en) | 1991-07-16 |
| JPH0776865B2 true JPH0776865B2 (en) | 1995-08-16 |
Family
ID=17948490
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1305716A Expired - Fee Related JPH0776865B2 (en) | 1989-11-24 | 1989-11-24 | Method of making a display having a diffraction grating pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0776865B2 (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60156004A (en) * | 1984-01-12 | 1985-08-16 | Toppan Printing Co Ltd | Exposure device of diffraction grating |
| JPS61193104A (en) * | 1985-02-22 | 1986-08-27 | Hitachi Ltd | Manufacture of diffraction grating |
| JPH0812283B2 (en) * | 1987-05-21 | 1996-02-07 | 凸版印刷株式会社 | Diffraction grating exposure device |
-
1989
- 1989-11-24 JP JP1305716A patent/JPH0776865B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03164789A (en) | 1991-07-16 |
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