JPH0777024B2 - Magnetic recording disk - Google Patents
Magnetic recording diskInfo
- Publication number
- JPH0777024B2 JPH0777024B2 JP61271727A JP27172786A JPH0777024B2 JP H0777024 B2 JPH0777024 B2 JP H0777024B2 JP 61271727 A JP61271727 A JP 61271727A JP 27172786 A JP27172786 A JP 27172786A JP H0777024 B2 JPH0777024 B2 JP H0777024B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- vapor deposition
- layer
- magnetic recording
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000010410 layer Substances 0.000 claims description 46
- 238000007740 vapor deposition Methods 0.000 claims description 39
- 239000000758 substrate Substances 0.000 claims description 34
- 229910044991 metal oxide Inorganic materials 0.000 claims description 11
- 150000004706 metal oxides Chemical class 0.000 claims description 11
- 239000011241 protective layer Substances 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 26
- 239000000377 silicon dioxide Substances 0.000 description 13
- 230000007797 corrosion Effects 0.000 description 9
- 238000005260 corrosion Methods 0.000 description 9
- 238000004544 sputter deposition Methods 0.000 description 8
- 239000011651 chromium Substances 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000000696 magnetic material Substances 0.000 description 5
- 230000003449 preventive effect Effects 0.000 description 5
- 229910020630 Co Ni Inorganic materials 0.000 description 4
- 229910002440 Co–Ni Inorganic materials 0.000 description 4
- 229910018104 Ni-P Inorganic materials 0.000 description 4
- 229910018536 Ni—P Inorganic materials 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910020707 Co—Pt Inorganic materials 0.000 description 2
- 229910018487 Ni—Cr Inorganic materials 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 229910002845 Pt–Ni Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】 （産業上の利用分野） 本発明は、面内記録型で硬質の磁気記録円盤に関するも
のである。The present invention relates to an in-plane recording type hard magnetic recording disk.
（従来の技術） 高密度で記録可能な媒体として、金属薄膜型磁気記録媒
体が注目され、実用化されはじめている。この金属薄膜
型磁気記録媒体には、非磁性基体上にCo、Co−Ni、Co−
Ni−Cr、Co−Ni−Fe、Co−Pt、Co−Pt−Niなどの磁性材
料からなる磁性層を形成して成る磁気記録媒体がある。
これらの磁気記録媒体は、面内方向で高い保磁力を示
し、面内記録型で硬質の磁気記録円盤に利用されつつあ
る。(Prior Art) As a medium capable of recording at a high density, a metal thin film type magnetic recording medium has attracted attention and has been put into practical use. This metal thin film type magnetic recording medium includes Co, Co-Ni and Co-on a non-magnetic substrate.
There is a magnetic recording medium formed by forming a magnetic layer made of a magnetic material such as Ni-Cr, Co-Ni-Fe, Co-Pt, and Co-Pt-Ni.
These magnetic recording media exhibit high coercive force in the in-plane direction and are being used for in-plane recording type hard magnetic recording disks.
面内記録型硬質磁気記録円盤は、磁気記録の高密度化及
び記録再生特性の向上に対する要求にともない、面内で
特に円盤の円周方向における媒体の高保磁力化、高残留
磁束密度化、角形比向上とともに、磁気異方性Ｓθ/Sr
の増大が要求される。In-plane recording type hard magnetic recording discs are required to have high density magnetic recording and improved recording / reproducing characteristics, so that in-plane, especially in the circumferential direction of the disc, high coercive force, high residual magnetic flux density, and square shape As the ratio increases, magnetic anisotropy Sθ / Sr
Is required to increase.
従来、硬質磁気記録円盤は、ヘツドと媒体が密着するこ
とによる円盤の回転阻害を防ぐため、媒体の下地非磁性
基材面にあらかじめ細かい溝を形成するテクスチヤリン
グ処理を施している。この非磁性基体上にスパツタリン
グにより磁性層を形成させた磁気記録円盤は円周方向の
角形比Ｓθが、半径方向の角形比Srに比べて大きくなる
傾向のあることが知られている（参考文献：特開昭61−
202324号公報）。Conventionally, a hard magnetic recording disk has been subjected to a texture treatment for forming fine grooves in advance on a surface of a non-magnetic base material of a medium in order to prevent the rotation of the disk from being hindered by the contact between the head and the medium. It is known that in a magnetic recording disk in which a magnetic layer is formed on this non-magnetic substrate by sputtering, the squareness ratio Sθ in the circumferential direction tends to be larger than the squareness ratio Sr in the radial direction (reference document). : JP 61-
202324).
また、非磁性基体上に、防着板を使用してスパツタリン
グまたは蒸着法により基体面に対し適宜入射角で磁性層
を形成させることにより円盤の円周方向の角形比Ｓθを
向上させた磁気記録媒体も知られている（参考文献：特
開昭61−145730号公報）。Further, magnetic recording in which the squareness ratio Sθ in the circumferential direction of the disk is improved by forming a magnetic layer on a non-magnetic substrate at an appropriate incident angle with respect to the substrate surface by a sputtering method or a vapor deposition method using a deposition preventive plate. A medium is also known (reference: Japanese Patent Laid-Open No. 61-145730).
（発明が解決しようとする問題点） しかしながら、上記の方法でデイスクの円周方向の角形
比Ｓθを向上させようとした場合、非磁性基体上にテク
スチヤリング処理を施す方法では、テクスチヤリング処
理条件、基体の温度などにより、円盤の円周方向の角形
比（Ｓθ）と半径方向の角形比（Sr）の比Ｓθ/Srが変
化して、制御することが難しく、さらに通常のテクスチ
ヤリングでは、Ｓθ/Srは２に満たない。また、円盤上
の位置すなわち、中心からの距離により、Ｓθ/Srの値
に差異を生じやすいという欠点がある。(Problems to be Solved by the Invention) However, in the case where the squareness ratio Sθ in the circumferential direction of the disk is to be improved by the above method, in the method of performing the texturing treatment on the non-magnetic substrate, the texturing treatment condition is used. , The ratio Sθ / Sr of the squareness ratio (Sθ) and the radial direction squareness ratio (Sr) of the disk changes depending on the temperature of the substrate, etc., and it is difficult to control. Furthermore, in ordinary texturing, Sθ / Sr is less than 2. In addition, there is a drawback that the value of Sθ / Sr is likely to differ depending on the position on the disk, that is, the distance from the center.
また、非磁性基体上にスパツタリングまたは蒸着法によ
り適宜入射角で磁性膜を形成させた磁気記録円盤は耐食
性が劣るという欠点があつた。Further, a magnetic recording disk having a magnetic film formed on a non-magnetic substrate by a sputtering method or a vapor deposition method at an appropriate incident angle has a drawback that the corrosion resistance is poor.
本発明は前記のような欠点がなく、円周方向の角形比お
よび円周方向の抗磁力角形比が向上し、かつ磁気異方性
Ｓθ/Srが２以上である磁気記録円盤を提供することを
目的とする。The present invention provides a magnetic recording disk which does not have the above-mentioned drawbacks, improves the squareness ratio in the circumferential direction and the coercive force squareness ratio in the circumferential direction, and has a magnetic anisotropy Sθ / Sr of 2 or more. With the goal.
（問題点を解決するための手段） 本発明者らは前記目的を達成するために種々検討を行な
つた結果、磁性層を必ずしも適宜入射角で形成させなく
ても、円盤形非磁性基体と磁性層との間に適宜入射角の
非磁性金属酸化物蒸着層を設けることにより、円周方向
の角形比および円周方向の抗磁力角形比が充分に磁気異
方性Ｓθ/Srが２以上と大きく、しかも、このようにし
た磁気記録媒体は耐食性に優れていることを見出し本発
明に至つた。(Means for Solving the Problems) As a result of various studies conducted by the present inventors to achieve the above-mentioned object, as a result, a disk-shaped non-magnetic substrate was obtained without necessarily forming a magnetic layer at an appropriate incident angle. By providing a non-magnetic metal oxide vapor-deposited layer with an appropriate incident angle between the magnetic layer and the magnetic layer, the squareness ratio in the circumferential direction and the coercive force squareness ratio in the circumferential direction are sufficiently large so that the magnetic anisotropy Sθ / Sr is 2 or more. In addition, the inventors have found that the magnetic recording medium having such a large size has excellent corrosion resistance, and has completed the present invention.
すなわち、本発明は円盤形非磁性基体上に適宜入射角の
非磁性金属酸化物蒸着層を設け、その上に磁性体蒸着層
および保護層を積層し、円周方向の角形比および円周方
向の抗磁力角形比がともに0.8以上であって、円周方向
の角形比（Ｓθ）と半径方向の角形比（Sr）の比が２以
上である磁気記録円盤である。That is, the present invention provides a non-magnetic metal oxide vapor deposition layer having an appropriate incident angle on a disc-shaped non-magnetic substrate, and laminating a magnetic substance vapor deposition layer and a protective layer on the non-magnetic metal oxide vapor deposition layer. Are both 0.8 or more in the coercive force squareness ratio, and the ratio of the squareness ratio (Sθ) in the circumferential direction to the squareness ratio (Sr) in the radial direction is 2 or more.
以下、本発明について第１図および第２図を用いて説明
する。本発明において非磁性の基体１はアルミニウム、
ガラスなどの無機質のものまたはポリカーボネート、ポ
リエーテルイミドなどの耐熱性合成樹脂である。これら
の非磁性基体の表面は常法により鏡面仕上げを行ない、
必要に応じその表面に硬貨化膜を設けたり、蒸着のため
の表面活性化処理、テクスチユアリング処理などを行な
つてもよい。The present invention will be described below with reference to FIGS. 1 and 2. In the present invention, the non-magnetic substrate 1 is aluminum,
It is an inorganic substance such as glass or a heat resistant synthetic resin such as polycarbonate or polyetherimide. The surface of these non-magnetic substrates is mirror-finished by a conventional method,
If necessary, a coining film may be provided on the surface thereof, surface activation treatment for vapor deposition, texturing treatment, or the like may be performed.
このようにして得られた円盤形非磁性基体上に適宜入射
角の非磁性金属酸化物蒸着層２を設ける。その厚さはと
くに制限はないが、普通は100〜500Å程度でよい。非磁
性金属酸化物はSiO2、TiO2、Al2O3、Y2O3、SnO2、NiO、
Nb2O5、Sb2O3、Yb2O3、Ta2O5、TeO2、Tb2O3などが用い
られる。蒸着とは真空中でのターゲツトの加熱蒸発によ
る単なる蒸着あるいはマグネトロンスパツタリング、電
子ビーム加熱蒸発による蒸着である。The nonmagnetic metal oxide vapor deposition layer 2 having an appropriate incident angle is provided on the disk-shaped nonmagnetic substrate thus obtained. The thickness is not particularly limited, but it is usually about 100 to 500Å. Non-magnetic metal oxides are SiO 2 , TiO 2 , Al 2 O 3 , Y 2 O 3 , SnO 2 , NiO,
Nb 2 O 5 , Sb 2 O 3 , Yb 2 O 3 , Ta 2 O 5 , TeO 2 , Tb 2 O 3 and the like are used. Vapor deposition is simple vapor deposition by heating evaporation of a target in a vacuum, or magnetron sputtering, vapor deposition by electron beam heating evaporation.
ここで重要な点は上記蒸着を適宜入射角で行なうことで
ある。適宜入射角の蒸着とはターゲツトから跳び出した
蒸気流の流れ方向を揃えるか、または一定方向の流れの
蒸気流のみを選び出すことによつて、基体に対し一定の
角度で蒸着物質の蒸気流を差し向けて蒸着させることで
ある。その角度は最終的に得られる磁気記録円盤の磁気
特性とくに円周方向の角形比（以下、Ｓθという）およ
び円周方向の抗磁力角形比（以下、Ｓ＊という）に影響
するので、それらの特性値がともに0.8以上で、磁気異
方性Ｓθ/Srが２以上になるように実験的に定めなけれ
ばならない。The important point here is to perform the vapor deposition at an appropriate incident angle. The vapor deposition of an appropriate incident angle means that the vapor flow of the vapor deposition material is made to flow at a constant angle with respect to the substrate by aligning the flow directions of the vapor flow jumping from the target or by selecting only the vapor flow of a constant flow. It is to vapor-deposit it. Since the angle affects the magnetic characteristics of the finally obtained magnetic recording disk, in particular, the squareness ratio in the circumferential direction (hereinafter referred to as Sθ) and the coercive force squareness ratio in the circumferential direction (hereinafter referred to as S * ). It is necessary to experimentally determine that the characteristic values are both 0.8 or more and the magnetic anisotropy Sθ / Sr is 2 or more.
ＳθおよびＳ＊がともに0.8以上でないと磁気記録の高
密度化が達成されない。また、Ｓθ/Srが２未満では十
分な記録再生特性が得られない。If both Sθ and S * are not more than 0.8, high density magnetic recording cannot be achieved. If Sθ / Sr is less than 2, sufficient recording / reproducing characteristics cannot be obtained.
適宜入射角の非磁性金属酸化物蒸着法の上に磁性体蒸着
層３および保護層４を積層させる。磁性体の種類は従来
用いられている前記磁性体材料でよい。また保護層は炭
素質、シリカなどである。なお、磁性体の保磁力向上の
ために必要があれば、第２図に示すとおり適宜入射角の
非磁性金属酸化物蒸着層２と磁性体蒸着層３との間に厚
さ1000〜2000Åていどのクロム層５を設けてもさしつか
えない。The magnetic material vapor deposition layer 3 and the protective layer 4 are laminated on the nonmagnetic metal oxide vapor deposition method with an appropriate incident angle. The type of magnetic material may be the previously used magnetic material. The protective layer is carbonaceous, silica or the like. If necessary for improving the coercive force of the magnetic substance, a thickness of 1000 to 2000 Å is provided between the non-magnetic metal oxide vapor deposition layer 2 and the magnetic substance vapor deposition layer 3 at appropriate incident angles as shown in FIG. It does not matter which chrome layer 5 is provided.
以下、実施例により本発明を具体的に説明する。Hereinafter, the present invention will be specifically described with reference to examples.
（実施例） 実施例１ 平板マグネトロンスパツタ装置で、表面が平滑なNi−Ｐ
非磁性メツキアルミ基体上に、防着板により入射角37度
で厚さ200ÅのSiO2蒸着層を設けた。(Example) Example 1 A flat plate magnetron sputtering device, Ni-P having a smooth surface
An SiO 2 vapor-deposited layer with a thickness of 200 Å was formed on the non-magnetic plated aluminum substrate with an adhesion plate at an incident angle of 37 degrees.
第３図に使用した平板マグネトロンスパツタ装置のシリ
カ蒸着源（ターゲツト）６、防着板８および基体１の位
置関係を示した。第３図でシリカ蒸着源は直径152mmの
円板、基体１は直径90mmの円板、防着板８はドーナツ状
で内周の直径30mm、シリカ蒸着源と基板の距離は60mm、
シリカ蒸着源と防着板の距離は35mm、シリカ蒸着源のエ
ロージヨン部分７は幅20mmで内径90mmのリング状、スパ
ツタ粒子の基体への入射角θは37゜であつた。スパツタ
条件としては、初期真空度１×10-5Torr、スパツタ時の
アルゴン圧力20×10-3Torr、スパツタ電力密度3.0W/cm2
そして基板温度は室温であつた。FIG. 3 shows the positional relationship among the silica vapor deposition source (target) 6, the deposition preventive plate 8 and the substrate 1 of the flat plate magnetron sputtering device used. In FIG. 3, the silica vapor deposition source is a disc with a diameter of 152 mm, the substrate 1 is a disc with a diameter of 90 mm, the deposition-inhibitory plate 8 is a doughnut-shaped inner diameter of 30 mm, and the distance between the silica vapor deposition source and the substrate is 60 mm.
The distance between the silica vapor deposition source and the deposition preventive plate was 35 mm, the erosion portion 7 of the silica vapor deposition source had a ring shape with a width of 20 mm and an inner diameter of 90 mm, and the incident angle θ of the spatter particles on the substrate was 37 °. As for the sputtering condition, the initial vacuum degree is 1 × 10 -5 Torr, the argon pressure during sputtering is 20 × 10 -3 Torr, and the sputtering power density is 3.0 W / cm 2.
The substrate temperature was room temperature.
次にこの基体のSiO2蒸着層上に、スパツタリングにより
厚さ2000Åのクロム層と厚さ600ÅのCo−Ni（Ni:80重量
％）磁性体蒸着層とその上にさらに厚さ200Åのカーボ
ン保護層を順次形成させ、磁気記録円盤を作製した。Next, on the SiO 2 vapor-deposited layer of this substrate, a chromium layer with a thickness of 2000 Å and a Co-Ni (Ni: 80 wt%) magnetic layer with a thickness of 600 Å and a carbon protective layer with a thickness of 200 Å are further deposited on it by sputtering Layers were sequentially formed to produce a magnetic recording disk.
この磁気記録円盤について、試料振動型磁力計（VSM）
により、円盤の円周方向と半径方向について、それぞれ
Ｂ−Ｈ曲線を測定し、Ｓθおよび半径方向の角形比（以
下、Srという）を求めた。さらに同じＢ−Ｈ曲線よりＳ
＊を求めた。これらの値は表に示す通りである。また、
これらの値は円盤のどの部分についても同じであり均一
性に優れていた。つぎにこの磁気記録円盤の耐食性を試
験するために円盤を温度60℃、相対湿度90％の恒温恒湿
槽内に500時間放置後、光学顕微鏡により表面を観察し
たが表に示すとおり異常は認められなかつた。About this magnetic recording disk, sample vibration type magnetometer (VSM)
The BH curve was measured in each of the circumferential direction and the radial direction of the disk, and Sθ and the squareness ratio in the radial direction (hereinafter, referred to as Sr) were obtained. Furthermore, from the same B-H curve, S
I asked for * . These values are as shown in the table. Also,
These values were the same for all parts of the disk and were excellent in uniformity. Next, in order to test the corrosion resistance of this magnetic recording disk, after the disk was left in a constant temperature and humidity chamber at a temperature of 60 ° C and a relative humidity of 90% for 500 hours, the surface was observed with an optical microscope, but abnormalities were found as shown in the table. I couldn't do it.
実施例２ シリカ蒸着源と基体の距離を100mm、シリカ蒸着源と防
着板の処理を60mmとし、入射角を50度としてシリカ蒸着
層を形成させたこと以外は実施例１と同様な磁気記録円
盤を作製した。実施例１と同様にＳθ、SrおよびＳ＊を
測定し、耐食性の試験を行なつた。これらの結果は表に
示すとおり満足すべきものであつた。Example 2 The same magnetic recording as in Example 1 except that the distance between the silica vapor deposition source and the substrate was 100 mm, the treatment between the silica vapor deposition source and the deposition preventive plate was 60 mm, and the silica vapor deposition layer was formed at an incident angle of 50 degrees. A disk was made. Sθ, Sr and S * were measured in the same manner as in Example 1 and a corrosion resistance test was performed. These results were satisfactory as shown in the table.
実施例３ 表面が平滑なNi−Ｐ非磁性メツキアルミ基体上に、電子
ビームで加熱した蒸着源よりSiO2を蒸着させて、厚さ約
200ÅのSiO2蒸着層を形成させた。使用した蒸着装置を
第４図に示した。第４図で基体１の中心とシリカ蒸着源
６の距離は100mm、基体の直径は90mmであつた。Example 3 SiO 2 was vapor-deposited from a vapor deposition source heated by an electron beam on a Ni-P non-magnetic plated aluminum substrate having a smooth surface to a thickness of about
A 200 Å SiO 2 deposited layer was formed. The vapor deposition apparatus used is shown in FIG. In FIG. 4, the distance between the center of the substrate 1 and the silica vapor deposition source 6 was 100 mm, and the diameter of the substrate was 90 mm.
この基体のシリカ蒸着層上に、ランダム入射によるスパ
ツタリングにより厚さ900ÅのCo−Pt（Pt:30重量％）磁
性体蒸着層を形成させ、さらに厚さ300Åのカーボン保
護層を形成させて磁気記録円盤を作製した。A 900 Å thick Co-Pt (Pt: 30% by weight) magnetic substance vapor-deposited layer was formed on the silica vapor-deposited layer of this substrate by spattering by random incidence, and a carbon protective layer with a thickness of 300 Å was further formed to perform magnetic recording A disk was made.
この磁気記録円盤について実施例１と同様にＳθ、Srお
よびＳ＊を測定し、耐食性の試験を行なつた。これらの
結果は表に示すとおり満足すべきものであつた。For this magnetic recording disk, Sθ, Sr and S * were measured in the same manner as in Example 1 to perform a corrosion resistance test. These results were satisfactory as shown in the table.
実施例４ 表面が平滑なNi−Ｐ非磁性メツキアルミ基体上に実施例
３と同様に電子ビーム蒸着装置を用いて入射角60゜で厚
さ約200ÅのSiO2層を形成させた。このシリカ層上に、
加熱真空蒸着装置で、ランダム入射により厚さ2000Åの
Cr層と厚さ600ÅのCo−Ni（Ni:20重量％）層と厚さ300
Åのカーボン層を順次形成させ、磁気記録媒体を作製し
た。加熱真空蒸着の条件は、Cr、Co−Ni、カーボンとも
真空度１×10-4Torrで加熱温度1000℃であつた。Example 4 An SiO 2 layer having a thickness of about 200 Å was formed at an incident angle of 60 ° on the Ni-P non-magnetic plated aluminum substrate having a smooth surface by using the electron beam vapor deposition apparatus as in Example 3. On this silica layer,
With a heating vacuum deposition device, a thickness of 2000 Å is obtained by random incidence.
Cr layer and thickness 600ÅCo-Ni (Ni: 20% by weight) layer and thickness 300
A carbon layer of Å was sequentially formed to manufacture a magnetic recording medium. The heating and vacuum deposition conditions were such that the vacuum degree was 1 × 10 −4 Torr and the heating temperature was 1000 ° C. for all of Cr, Co—Ni and carbon.
この磁気記録円盤について実施例１と同様にＳθ、Srお
よびＳ＊を測定し、耐食性の試験を行なつた。これらの
結果は表に示すとおり満足すべきものであつた。For this magnetic recording disk, Sθ, Sr and S * were measured in the same manner as in Example 1 to perform a corrosion resistance test. These results were satisfactory as shown in the table.
実施例５ 第５図に示すとおり、表面が平滑な直径90mmのガラス基
体１に、開き角30゜の防着板８を装置し、基体のみを毎
分40回転させながら、TiO2ターゲツト14からスパツタリ
ングにより、入射角θが40゜で基体表面に厚さ100ÅのT
iO2蒸着層を形成した。第５図で基体の中心とターゲツ
トの中心の距離は200mm、ターゲツトは直径152mmの円板
状であつた。Example 5 As shown in FIG. 5, a glass substrate 1 having a smooth surface and a diameter of 90 mm was provided with an adhesion preventive plate 8 having an opening angle of 30 °, and only the substrate was rotated 40 times per minute while the TiO 2 target 14 was used. By sputtering, an incident angle θ of 40 ° and a thickness of 100Å on the substrate surface
An iO 2 vapor deposition layer was formed. In FIG. 5, the distance between the center of the substrate and the center of the target was 200 mm, and the target was a disk having a diameter of 152 mm.
このTiO2蒸着層の上に厚さ1500ÅのCr層、厚さ500ÅのC
o−Ni−Cr（Ni:20重量％、Cr:10重量％）磁性体蒸着
層、および厚さ300Åのカーボン保護層をランダム入射
のスパツタリングにより順次形成させ、磁気記録円盤を
作製した。A 1500 Å Cr layer with a thickness of 500 Å C on this TiO 2 deposited layer
A magnetic recording disk was manufactured by sequentially forming an o-Ni-Cr (Ni: 20 wt%, Cr: 10 wt%) magnetic substance vapor deposition layer and a 300 Å thick carbon protective layer by random incident spattering.
この磁気記録円盤について実施例１と同様にＳθ、Srお
よびＳ＊を測定し、耐食性の試験を行なつた。これらの
結果は表に示すとおり満足すべきものであつた。For this magnetic recording disk, Sθ, Sr and S * were measured in the same manner as in Example 1 to perform a corrosion resistance test. These results were satisfactory as shown in the table.
比較例１ 直径90mmの表面が平滑なNi−Ｐ非磁性メツキアルミ円板
からなる基体上に非磁性金属酸化物蒸着層を設けること
なく、平板マグネトロンスパツタ装置によりランダム入
射角で厚さ2000Åのクロム層と厚さ600ÅのCo−Ni（Ni:
80重量％）磁性体層と、さらにその上に厚さ200Åのカ
ーボン保護層を順次形成させ、磁気記録円盤を作製し
た。 Comparative Example 1 A non-magnetic metal oxide vapor-deposition layer was not provided on a substrate made of a Ni-P non-magnetic plated aluminum disk having a smooth surface of 90 mm in diameter, and a flat plate magnetron sputtering device was used to form a chromium film having a thickness of 2000Å at a random incident angle. Layer and thickness of 600Å Co-Ni (Ni:
A magnetic recording layer was prepared by sequentially forming a magnetic layer and a carbon protective layer having a thickness of 200 Å on the magnetic layer.
この磁気記録円盤について実施例１と同じ方法でＳθ、
SrおよびＳ＊を求めた。その結果、表に示すとおり、Ｓ
θおよびＳ＊の値は小さく、さらに、Ｓθ/Srの値も小
さく磁気記録円盤として劣つていた。For this magnetic recording disk, Sθ by the same method as in Example 1,
Sr and S * were determined. As a result, as shown in the table, S
The values of θ and S * are small, and the value of Sθ / Sr is also small, which is inferior as a magnetic recording disk.
比較例２ クロム層および磁性体層の形成をいずれも入射角37゜で
形成させた外は比較例１と同一方向、同一条件で磁気記
録円盤を作成した。この磁気記録円盤について実施例１
と同じ耐食性試験を行なつた結果、表に示すとおり円盤
の表面に変色が見られた。Comparative Example 2 A magnetic recording disk was prepared in the same direction and under the same conditions as in Comparative Example 1, except that the chromium layer and the magnetic layer were both formed at an incident angle of 37 °. Example 1 of this magnetic recording disk
As a result of carrying out the same corrosion resistance test as above, discoloration was observed on the surface of the disc as shown in the table.
（発明の効果） 以上述べたとおり、本発明による磁気記録円盤は円周方
向の角形比および抗磁力角形比が高く、また磁気異方性
が高く記録再生特性に優れていることに加えて、耐食性
に優れている。(Effect of the Invention) As described above, the magnetic recording disk according to the present invention has a high squareness ratio in the circumferential direction and a high coercive force squareness ratio, high magnetic anisotropy, and excellent recording / reproducing characteristics. It has excellent corrosion resistance.
第１図および第２図は本発明の磁気記録円盤の断面図で
ある。第３図、第４図および第５図は実施例および比較
例で用いた蒸着装置の位置関係を示す説明図であり、第
３図および第４図は装置の断面図、第５図は斜視図であ
る。 符号１……基体、２……非磁性金属酸化物蒸着層、３…
…磁性体蒸着層、４……保護層、５……クロム層、６…
…シリカ蒸着源、７……エロージヨン部分、８……防着
板、９……真空槽、10……電子ビーム発生源、11……電
子ビーム、12……排気口、13……基体ホルダー、14……
TiO2ターゲツト1 and 2 are sectional views of the magnetic recording disk of the present invention. FIGS. 3, 4, and 5 are explanatory views showing the positional relationship of the vapor deposition apparatuses used in Examples and Comparative Examples. FIGS. 3 and 4 are sectional views of the apparatus, and FIG. 5 is a perspective view. It is a figure. Reference numeral 1 ... Substrate, 2 ... Nonmagnetic metal oxide vapor deposition layer, 3 ...
... Magnetic material vapor deposition layer, 4 ... Protective layer, 5 ... Chrome layer, 6 ...
... Silica vapor deposition source, 7 ... Erosion part, 8 ... Preventing plate, 9 ... Vacuum chamber, 10 ... Electron beam source, 11 ... Electron beam, 12 ... Exhaust port, 13 ... Substrate holder, 14……
TiO 2 target
Claims (1)
金属酸化物蒸着層を設け、その上に磁性体蒸着層および
保護層を積層し、円周方向の角形比および円周方向の抗
磁力角形比がともに0.8以上であって、円周方向の角形
比（Ｓθ）と半径方向の角形比（Sr）の比Ｓθ/Srが２
以上であることを特徴とする磁気記録円盤。1. A non-magnetic metal oxide vapor deposition layer having an appropriate incident angle is provided on a disc-shaped non-magnetic substrate, and a magnetic vapor deposition layer and a protective layer are laminated on the non-magnetic metal oxide vapor deposition layer, and a squareness ratio in the circumferential direction and a circumferential direction. Both have a coercive force squareness ratio of 0.8 or more, and the ratio Sθ / Sr of the squareness ratio (Sθ) in the circumferential direction to the squareness ratio (Sr) in the radial direction is 2
A magnetic recording disk characterized by the above.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61271727A JPH0777024B2 (en) | 1986-11-17 | 1986-11-17 | Magnetic recording disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61271727A JPH0777024B2 (en) | 1986-11-17 | 1986-11-17 | Magnetic recording disk |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63127426A JPS63127426A (en) | 1988-05-31 |
| JPH0777024B2 true JPH0777024B2 (en) | 1995-08-16 |
Family
ID=17503998
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61271727A Expired - Fee Related JPH0777024B2 (en) | 1986-11-17 | 1986-11-17 | Magnetic recording disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0777024B2 (en) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3114740A1 (en) * | 1981-04-11 | 1982-10-28 | Ibm Deutschland Gmbh, 7000 Stuttgart | METHOD FOR PRODUCING A METAL THIN FILM MAGNETIC DISK AND ARRANGEMENT FOR CARRYING OUT THIS METHOD |
| JPS59180829A (en) * | 1983-03-31 | 1984-10-15 | Nec Corp | Magnetic storage body |
-
1986
- 1986-11-17 JP JP61271727A patent/JPH0777024B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63127426A (en) | 1988-05-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2601491B2 (en) | Magnetic disk structure and method of manufacturing the same | |
| JP2572745B2 (en) | How to make a wear and corrosion resistant magnetic recording film | |
| US4950548A (en) | Magnetic recording medium and method of producing same | |
| EP0840293B1 (en) | Magnetic recording medium, method of fabricating magnetic recording medium, and magnetic storage | |
| JP2002208129A (en) | Magnetic recording medium, method of manufacturing the same, and magnetic recording device | |
| US5853847A (en) | Magnetic recording medium and its manufacture | |
| JPH11339240A (en) | Magnetic recording medium and magnetic disk drive | |
| GB2129832A (en) | Magnetic recording media | |
| JP4123806B2 (en) | Magnetic recording medium, method for manufacturing the same, and magnetic recording apparatus | |
| JPH09288818A (en) | Magnetic recording medium | |
| JPH0777024B2 (en) | Magnetic recording disk | |
| JPH0268716A (en) | Production of magnetic disk medium | |
| US5250338A (en) | Magnetic recording medium | |
| JP2794578B2 (en) | Manufacturing method of magnetic recording medium | |
| JP2913684B2 (en) | Magnetic recording media | |
| JP2538124B2 (en) | Fixed magnetic disk and manufacturing method thereof | |
| EP0422547B1 (en) | Magnetic recording medium | |
| JPH05101385A (en) | Method of manufacturing magnetic recording medium having easy axis of magnetization aligned in the circumferential direction | |
| JPS59157828A (en) | Magnetic recording medium | |
| JPS63121113A (en) | Magnetic recording disk | |
| JPH05234069A (en) | Thin film-magnetic disk | |
| JPS61292219A (en) | Magnetic recording medium | |
| JPH01102718A (en) | Magnetic recording medium | |
| JPH04248115A (en) | Magnetic recording medium and its production | |
| JPH01169719A (en) | Magnetic disk and its manufacture |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |