JPH0782959B2 - Method for producing magnetic member coated with carbon film - Google Patents
Method for producing magnetic member coated with carbon filmInfo
- Publication number
- JPH0782959B2 JPH0782959B2 JP5167501A JP16750193A JPH0782959B2 JP H0782959 B2 JPH0782959 B2 JP H0782959B2 JP 5167501 A JP5167501 A JP 5167501A JP 16750193 A JP16750193 A JP 16750193A JP H0782959 B2 JPH0782959 B2 JP H0782959B2
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- electrode
- tape
- nitrogen
- boron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052799 carbon Inorganic materials 0.000 title claims description 57
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims description 55
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 22
- 239000007789 gas Substances 0.000 claims description 14
- 239000011248 coating agent Substances 0.000 claims description 13
- 238000000576 coating method Methods 0.000 claims description 13
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 10
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 10
- 229910052796 boron Inorganic materials 0.000 claims description 10
- 229910052698 phosphorus Inorganic materials 0.000 claims description 10
- 239000011574 phosphorus Substances 0.000 claims description 10
- 238000001816 cooling Methods 0.000 claims description 8
- 150000002430 hydrocarbons Chemical class 0.000 claims description 5
- 239000004215 Carbon black (E152) Substances 0.000 claims description 4
- 229930195733 hydrocarbon Natural products 0.000 claims description 4
- 239000000654 additive Substances 0.000 claims description 3
- 230000000996 additive effect Effects 0.000 claims description 3
- 238000005096 rolling process Methods 0.000 claims description 3
- 239000010408 film Substances 0.000 description 23
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- 239000000696 magnetic material Substances 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 239000012535 impurity Substances 0.000 description 6
- 150000001721 carbon Chemical class 0.000 description 5
- 239000002131 composite material Substances 0.000 description 5
- 229910003460 diamond Inorganic materials 0.000 description 5
- 239000010432 diamond Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 4
- 239000005977 Ethylene Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229910000859 α-Fe Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052761 rare earth metal Inorganic materials 0.000 description 3
- 150000002910 rare earth metals Chemical class 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 101100163901 Rattus norvegicus Asic2 gene Proteins 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- -1 graphite Chemical compound 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
Landscapes
- Manufacturing Cores, Coils, And Magnets (AREA)
- Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
- Thin Magnetic Films (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は光学的バンド巾が１．０
ｅＶ以上特に１．５〜５．５ｅＶを有する炭素または炭
素を主成分とする被膜を磁気ヘッドまたは磁気ヘッド用
部材上特にそのスライダ部（磁気テープ、磁気ディスク
等こすれあう部分）にコーティングすることにより、こ
れら磁気ヘッド用部材の補強材、また機械ストレスに対
する耐摩耗保護材として得んとする複合体に関する。The present invention has an optical bandwidth of 1.0.
By coating carbon or a film containing carbon as a main component having eV or more, particularly 1.5 to 5.5 eV, on the magnetic head or a member for a magnetic head, especially on the slider portion (rubbing portion such as magnetic tape, magnetic disk). The present invention relates to a composite material to be obtained as a reinforcing material for these magnetic head members and a wear-resistant protective material against mechanical stress.
【０００２】[0002]
【従来の技術】炭素膜のコーティングに関しては、本発
明人の出願になる特許願『炭素被膜を有する複合体およ
びその作製方法』（特願昭５６−１４６９３６ 昭和５
６年９月１７日出願）が知られている。しかし、これら
は単にその作製方法を一般的に記載したものであり、そ
の形成温度を２００℃以下、好ましくは＋１５０〜−１
００℃と実質的に冷却とし、かつ、被形成面であるフェ
ライト、パーマロイ、希土類等の磁性体のスライダ部に
コーティングする例はまったく述べられていない。2. Description of the Related Art Regarding the coating of a carbon film, a patent application filed by the inventor of the present invention, "Composite having carbon coating and method for producing the same" (Japanese Patent Application No. 56-146936, Showa 5).
Application dated September 17, 2006) is known. However, these are merely general descriptions of the production method thereof, and the formation temperature thereof is 200 ° C. or lower, preferably +150 to −1.
There is no mention of an example of substantially cooling to 00 ° C. and coating the slider portion of a magnetic material such as ferrite, permalloy or rare earth, which is the surface to be formed.
【０００３】従来例において、炭素膜は２００〜１００
０℃と高温でしか得られないとされており、炭素膜が条
件によっては、室温（プラズマにより１５０℃程度まで
表面が昇温する）またはそれ以下の温度での作製方法で
も十分な硬度を有せしめ得ることの記載はまったくな
い。In the conventional example, the carbon film has a thickness of 200 to 100.
It is said that the carbon film can be obtained only at a high temperature of 0 ° C., and depending on the conditions, the carbon film has sufficient hardness even at room temperature (the surface is heated to about 150 ° C. by plasma) or at a temperature lower than that. There is no mention of what can be done.
【０００４】[0004]
【発明が解決しようとする課題】本発明は、磁気ヘッド
用部材上、特に磁気テープ、磁気ディスクとこすれる部
分であるスライダ部上に炭素または炭素を主成分とする
被膜をコーティングし、その表面での耐摩耗性等の機械
的強度が補強された磁気部材を得ようとすることを目的
とするものである。SUMMARY OF THE INVENTION According to the present invention, carbon or a film containing carbon as a main component is coated on a magnetic head member, particularly on a slider portion which is a portion to be rubbed with a magnetic tape or a magnetic disk, and its surface is coated. It is an object of the present invention to obtain a magnetic member whose mechanical strength such as abrasion resistance is reinforced.
【０００５】[0005]
【課題を解決するための手段】本発明は上記目的を解決
するため、ロール・ツー・ロール方式で磁気部材にホウ
素、リンまたは窒素が添加された炭素を主成分とする被
膜を形成するに際し、テープ状キャリアの裏側に配設さ
れた第１の電極を冷却手段により冷却しつつこの電極に
対向して前記テープ状部材の表面側に離間して配設され
た第２の電極との間に直流または高周波電圧を印加し
て、プラズマを発生せしめ、炭化水素化物気体、または
これに加えてホウ素、リンまたは窒素の添加物気体とを
分解反応せしめて、前記部材上に炭素膜、若しくはホウ
素、リンまたは窒素の添加された炭素を主成分とする膜
を形成することにより磁気部材を作製することとした。In order to solve the above-mentioned problems, the present invention provides a roll-to-roll method for forming a coating film containing carbon containing boron, phosphorus or nitrogen as a main component on a magnetic member. While cooling the first electrode disposed on the back side of the tape-shaped carrier by the cooling means, the first electrode is provided between the second electrode and the second electrode disposed facing the electrode and spaced apart from the surface side of the tape-shaped member. Applying a direct current or a high frequency voltage to generate plasma, and cause a decomposition reaction with a hydrocarbon gas, or an additive gas of boron, phosphorus or nitrogen in addition to this, a carbon film on the member, or boron, The magnetic member is manufactured by forming a film containing carbon to which phosphorus or nitrogen is added as a main component.
【０００６】特に本発明はエチレン、メタンのような炭
化水素気体を直流または高周波、特に基体側に正の直流
バイヤスを加えた高周波電界によりプラズマを発生させ
た雰囲気中に導入して分解せしめることにより、Ｃ−Ｃ
結合を作り、結果としてグラファイトのような非透光性
の導電性または不良導電性の炭素を作るのではなく、作
製条件により求められた光学的エネルギバンド巾（Ｅｇ
という）が１．０ｅＶ以上、好ましくは１．５〜５．５
ｅＶを有するダイヤモンドに類似の絶縁性の炭素を形成
することを特徴としている。さらにこの本発明の炭素
は、その硬度もビッカース硬度が２０００Kg／mm2 以
上、好ましくは４５００Kg／mm2 以上、理想的には６５
００Kg／mm2 というダイヤモンド類似の硬さを有するア
モルファス（非晶質）または５〜２００Åの大きさの微
結晶性を有するセミアモルファス（半非晶質）構造を有
する炭素またはこの炭素中に水素、ハロゲン元素が２５
原子％以下または３価または５価の不純物が５原子％以
下、また窒素がＮ／Ｃ≦０．０５の濃度に添加されたい
わゆる炭素を主成分とする炭素（以下本発明においては
単に炭素という）を基板上に設けた複合体を設けんとし
たものである。In particular, the present invention introduces a hydrocarbon gas such as ethylene or methane into an atmosphere in which a plasma is generated by a direct current or a high frequency, particularly a high frequency electric field in which a positive direct current bias is added to the substrate side to decompose it. , C-C
Rather than forming a bond and consequently non-translucent conductive or poorly conductive carbon such as graphite, the optical energy bandwidth (Eg
Is 1.0 eV or more, preferably 1.5 to 5.5
It is characterized by forming insulating carbon similar to diamond with eV. Further, the carbon of the present invention has a Vickers hardness of 2000 Kg / mm 2 or more, preferably 4500 Kg / mm 2 or more, ideally 65
Amorphous (amorphous) having a diamond-like hardness of 00 kg / mm 2 or carbon having a semi-amorphous (semi-amorphous) structure having a microcrystallinity of 5 to 200Å or hydrogen in this carbon, 25 halogen elements
Carbon containing not more than 5 atomic% of atomic% or less or trivalent or pentavalent impurities and nitrogen of a concentration of N / C ≦ 0.05 (hereinafter, simply referred to as carbon in the present invention). ) Is provided on the substrate.
【０００７】本発明は、さらにこの炭素が形成される基
板を２００℃以下好ましくは−１００〜１５０℃の従来
より知られたＣＶＤ法に比べて５００〜１５００℃も低
い温度で形成せしめ、下地の磁性材料の特性を劣化させ
ることなく、また下地材料との界面でおこる反応を防止
しつつコーティングが可能であることを実験的に見出し
たことを他の特徴とする。According to the present invention, the substrate on which the carbon is formed is formed at a temperature of 200 ° C. or lower, preferably −100 to 150 ° C., which is 500 to 1500 ° C. lower than that of the conventionally known CVD method. Another feature is that the coating was possible experimentally without deteriorating the characteristics of the magnetic material and preventing the reaction occurring at the interface with the base material.
【０００８】本発明は、この炭素に３価の不純物である
ホウ素を０．１〜５原子％の濃度に添加し、Ｐ型の炭素
を設け、また５価の不純物であるリン、窒素を同様に
０．１〜５原子％の濃度に添加し、Ｎ型の炭素を設ける
ことによりこの基板上面の炭素を導電性にした。本発明
は、基体特にフェライト、パーマロイ、希土類、アモル
ファス成分等の磁性材料を有する磁気ヘッド用部材のス
ライダ部の上表面にダイヤモンド結合を有する炭素膜を
形成して、これを多量に製造するため、テープ状キャリ
アを用いてロール・ツー・ロール（ｒｏｌｌ ｔｏ ｒ
ｏｌｌ以下ＲＲという）方式で作製するものである。以
下に図面に従って本発明に用いられた複合体の作製方法
を記す。In the present invention, boron, which is a trivalent impurity, is added to this carbon at a concentration of 0.1 to 5 atomic% to provide P-type carbon, and phosphorus and nitrogen, which are pentavalent impurities, are similarly added. Was added at a concentration of 0.1 to 5 atomic% and N-type carbon was provided to make the carbon on the upper surface of the substrate conductive. The present invention relates to a magnetic head member having a magnetic material such as a base material, particularly ferrite, permalloy, rare earth, or amorphous component .
In order to form a carbon film having a diamond bond on the upper surface of the lidar part and to manufacture a large amount of the film, a tape-like carrier is used to roll to roll.
(hereinafter referred to as RR) method. The method for producing the composite used in the present invention will be described below with reference to the drawings.
【０００９】[0009]
『実施例１』図１は本発明の炭素または炭素を主成分と
する被膜を形成するためのＲＴＲ方式のプラズマＣＶＤ
装置の概要を示す。図面において、ドーピング系（１
０）において、キャリアガスである水素を（１１）よ
り、反応性気体である炭化水素気体例えばメタン、エチ
レンを（１２）より、３価不純物のジボラン（水素希
釈）（１３），５価不純物のアンモニアまたはフォスヒ
ンを（１４）よりバルブ（２８）、流量計（２９）をへ
て反応系（３０）中にノズル（２５）より導入される。
このノズルに至る前に、反応性気体の励起用にマイクロ
波エネルギを（２６）で加えて予め活性化させることは
有効である。Example 1 FIG. 1 shows an RTR type plasma CVD for forming carbon or a film containing carbon as a main component of the present invention.
An outline of the device is shown. In the drawing, the doping system (1
In (0), hydrogen as a carrier gas is obtained from (11), hydrocarbon gas as a reactive gas such as methane and ethylene is obtained from (12), and trivalent impurities such as diborane (hydrogen dilution) (13) and pentavalent impurities are included. Ammonia or foshin is introduced from the nozzle (25) into the reaction system (30) through the valve (28) through the valve (14) and the flow meter (29).
Prior to reaching this nozzle, it is useful to apply microwave energy at (26) to pre-activate the reactive gas for excitation.
【００１０】反応系（３０）では、第１のロール（４）
より第２のロール（５）に補助ロール（６），（７）を
経て移動する。この補助ロール（７）はテープ状キャリ
アにたるみがこないように一定の張力（テンション）を
与えるべく、バネ（２７）を具備する。補助ロール間に
は、第１の電極（２），被形成面を具備するテープ状キ
ャリア（１），第２の電極（３）を有し、一対の電極
（２），（３）間には高周波電極（１５）、マッチング
トランス（１６）, 直流バイヤス電源（１７）より電気
エネルギが加えられ、プラズマ（４０）が発生する。排
気系（２０）は圧力調整バルブ（２５），ターボ分子ポ
ンプ（２２），ロータリーポンプ（２３）をへて不要気
体を排気する。In the reaction system (30), the first roll (4)
It moves to the second roll (5) via the auxiliary rolls (6) and (7). This auxiliary roll (7) is provided with a spring (27) so as to give a constant tension so that the tape-shaped carrier does not have slack. A first electrode (2), a tape-shaped carrier (1) having a surface to be formed, and a second electrode (3) are provided between the auxiliary rolls, and between the pair of electrodes (2) and (3). Is supplied with electric energy from the high frequency electrode (15), the matching transformer (16), and the DC bias power supply (17) to generate plasma (40). The exhaust system (20) exhausts unnecessary gas through the pressure control valve (25), the turbo molecular pump (22), and the rotary pump (23).
【００１１】これらの反応性気体は、反応空間（４０）
で０．０１〜０．３ｔｏｒｒ例えば０．１ｔｏｒｒと
し、高周波による電磁エネルギにより０．１〜５ＫＷの
エネルギを加えられる。直流バイヤスは、−２００〜６
００Ｖ（実質的には−４００〜＋４００Ｖ）を加える。
なぜなら、直流バイヤスが零のときは自己バイヤスが−
２００Ｖ（第２の電極を接地レベルとして）を有してい
るためである。反応性気体は、水素で一部を希釈した。
例えばメタンまたはエチレン：水素＝１：１とした。第
１の電極は冷却手段（９）を有し、冷却液体を（８）よ
り入れ、（８’）に排出させ、被形成面上の温度を１５
０〜−１００℃に保持させる。かくしてプラズマにより
被形成面上にビッカーズ硬度２０００Ｋｇ／ｍｍ２以上
を有するとともに、熱伝導度２．５Ｗ／ｃｍｄｅｇ以上
のＣ−Ｃ結合を多数形成したアモルファス構造または微
結晶構造を有するアモルファス構造の炭素を生成させ
た。さらにこの電磁エネルギは５０Ｗ〜１ＫＷを供給
し、単位面積あたり０．０３〜３Ｗ／ｃｍ２のプラズマ
エネルギを加えた。このプラズマ密度が大きい場合、ま
た予めマイクロ波で反応性気体が励起されている場合
は、５〜２００Åの大きさの微結晶性を有するセミアモ
ルファス構造の炭素を生成させることができた。成膜速
度は１００〜１０００Ａ／分を有し、特に表面温度を−
５０〜１５０℃とし、直流バイアスを＋１００〜３００
Ｖ加えた場合、その成膜速度は１００〜２００Ａ／分
（メタンを用いマイクロ波を用いない場合）、５００〜
１０００Ａ／分（メタンを用いマイクロ波を用いた場
合、またはエチレンを用いマイクロ波を用いた場合）を
得た。These reactive gases are mixed in the reaction space (40).
0.01 to 0.3 torr, for example, 0.1 torr, and energy of 0.1 to 5 KW can be added by electromagnetic energy due to high frequency. DC bias is -200 to 6
00V (substantially -400 to + 400V) is applied.
Because when the DC bias is zero, the self-bias is −
This is because it has 200 V (the second electrode is at the ground level). The reactive gas was partially diluted with hydrogen.
For example, methane or ethylene : hydrogen = 1: 1. The first electrode has a cooling means (9), a cooling liquid is introduced from (8) and discharged to (8 '), and the temperature on the surface to be formed is set to 15
Hold at 0--100 ° C. Thus, the amorphous structure carbon having a Vickers hardness of 2000 Kg / mm 2 or more on the surface to be formed by plasma and an amorphous structure or a microcrystalline structure having a large number of C—C bonds having a thermal conductivity of 2.5 W / cmdeg or more is formed. Was generated. Further, this electromagnetic energy was supplied from 50 W to 1 KW, and plasma energy of 0.03 to 3 W / cm 2 was applied per unit area. When the plasma density was high, or when the reactive gas was previously excited by microwaves, it was possible to generate semi-amorphous carbon having a microcrystalline size of 5 to 200 Å. The film formation rate is 100 to 1000 A / min, and the surface temperature is-
50 to 150 ° C, DC bias +100 to 300
When V is added, the film formation rate is 100 to 200 A / min (when methane is used and no microwave is used), 500 to
1000 A / min (with methane and microwaves or with ethylene and microwaves) were obtained.
【００１２】これらはすべてビッカーズ硬度が２０００
Ｋｇ／ｍｍ２以上を有する条件のみを良品とする。もち
ろんグラファイトが主成分ならばきわめて柔らかく、か
つ黒色で本発明とはまったく異質なものである。この反
応生成物は磁気ヘッド用部材（１）が冷却媒体（９）に
より冷却され、この上面に被膜として形成される。反応
後の不純物は排気系（２０）よりターボ分子ポンプ、ロ
ータリーポンプを経て排気される。反応系は０．００１
〜１０ｔｏｒｒ代表的には０．０１〜０．５ｔｏｒｒに
保持されており、マイクロ波（２６）、高周波のエネル
ギ（１５）により反応系内はプラズマ状態（４０）が生
成される。特に励起源が１ＧＨｚ以上、例えば２．４５
ＧＨｚの周波数にあっては、Ｃ−Ｈ結合より水素を分離
し、さらに周波源が０．１〜５０ＭＨｚ例えば１３．５
６ＭＨｚの周波数にあってはＣ−Ｃ結合、Ｃ＝Ｃ結合を
分解し、−Ｃ−Ｃ−結合を作り、炭素の不対結合手同志
を互いに衝突させて共有結合（ダイヤモンド結合）さ
せ、安定なダイヤモンド構造を局部的に有した構造とさ
せ得る。All of these have a Vickers hardness of 2000.
Only the condition having Kg / mm 2 or more is regarded as a good product. Of course, if graphite is the main component, it is extremely soft and black, which is completely different from the present invention. The magnetic head member (1) is cooled by the cooling medium (9), and the reaction product is formed as a film on the upper surface thereof. The impurities after the reaction are exhausted from the exhaust system (20) through a turbo molecular pump and a rotary pump. The reaction system is 0.001
10 torr is typically maintained at 0.01 to 0.5 torr, and a plasma state (40) is generated in the reaction system by microwave (26) and high frequency energy (15). Particularly, the excitation source is 1 GHz or higher, for example, 2.45.
At a frequency of GHz, hydrogen is separated from C—H bonds, and the frequency source is 0.1 to 50 MHz, for example 13.5 MHz.
At a frequency of 6MHz, CC bonds and C = C bonds are decomposed to form -CC bonds, and carbon unpaired bonds collide with each other to form covalent bonds (diamond bonds) and stabilize. The structure may have a local diamond structure.
【００１３】かくして磁気ヘッドの磁性体および金属ま
たは磁気ヘッド用部材のスライダ部の磁性体上に炭素特
に炭素中に水素を２５モル％以下含有する炭素またＰ、
ＩまたはＮ型の導電型を有する炭素を主成分とする被膜
を形成させることができた。Thus, carbon, particularly carbon containing 25 mol% or less of hydrogen in carbon or P on the magnetic material of the magnetic head and the magnetic material of the metal or the slider of the magnetic head member,
It was possible to form a film containing carbon having a conductivity type of I or N as a main component.
【００１４】『実施例２』 図２（Ａ），（Ｂ−１），（Ｂ−２）は実施例１の作製
方法によって得られた炭素を用いた磁気ヘッドまたはそ
れ用部材の例である。即ちテープまたはテープ状キャリ
ア上に磁気ヘッド用部材がテープ状に配設されている。
これを図１のＲＴＲ方式にてこの上面に炭素（５０）を
０．０３〜３μｍ好ましくは０．１〜０．５μｍの厚さ
に設けたものである。さらにこれらの炭素膜（５０）を
コートした後、これら磁気ヘッド用部材（４１）をテー
プ状キャリアよりとりはずした。この磁気ヘッド等の一
部または磁気テープ、磁気ディスク、等の他の異種材料
がその表面をこすって走行するスライダ部の部材の耐摩
耗性の向上にきわめて有効である。特にこの炭素膜は熱
伝導率が２．５Ｗ／ｃｍｄｅｇ以上、代表的には４．０
〜６．０Ｗ／ｃｍｄｅｇとダイヤモンドの６．０Ｗ／ｃ
ｍｄｅｇに近いため、高速テープ状キャリア走行により
発生する熱を全体に均一に逃がし、局部的な昇温および
それに伴う磁気ヘッドの特性劣化を防ぐことができるた
め、耐摩耗性、高熱伝導性、炭素膜特有の高平滑性等、
多くの特性を併用して有効に用いている。Example 2 FIGS. 2 (A), (B-1) and (B-2) are examples of a magnetic head using carbon obtained by the manufacturing method of Example 1 or a member therefor. . That is, the magnetic head member is arranged in a tape shape on the tape or the tape- shaped carrier.
Carbon (50) is provided on the upper surface of the RTR method of FIG. 1 to a thickness of 0.03 to 3 μm, preferably 0.1 to 0.5 μm. Further, after coating these carbon films (50), these magnetic head members (41) were removed from the tape-shaped carrier. A part of the magnetic head or other different material such as a magnetic tape or a magnetic disk is extremely effective in improving the wear resistance of the member of the slider portion which runs by rubbing its surface. In particular, this carbon film has a thermal conductivity of 2.5 W / cmdeg or more, typically 4.0.
~ 6.0W / cmdeg and 6.0W / c of diamond
Since it is close to mdeg, the heat generated by the high-speed tape-shaped carrier running can be uniformly dissipated to the whole, and it is possible to prevent local temperature rise and accompanying deterioration of the characteristics of the magnetic head, resulting in wear resistance, high thermal conductivity, and carbon. High smoothness peculiar to the film,
It is used effectively by combining many characteristics.
【００１５】『実施例３』図２（Ａ）の場合、テープ用
の書き込み、読み取りまたは該ヘッドのー例である。こ
の磁気ヘッド（４１）のＭｎ−Ｚｎフェライトを用いた
磁性体（４３）におけるスライダ部（４２）上に炭素ま
たは炭素を主成分とする被膜（５０）を０．１〜０．５
μｍの厚さにコーティングした。するとコーティングを
しない場合に比べてその寿命は５倍にも向上させること
ができた。この図面は１／２インチＶＴＲ用磁気ヘッド
の図面の例を示す。特にこの炭素膜をコートしない場合
のスライダ部のビッカース硬度は８００Kg／mm2 しかな
いため、これを２０００Kg／mm2 以上に向上させ得ると
ともに、表面でのテープ等のすべりを良好にし得るため
の効果は著しい。[Third Embodiment] FIG. 2A shows an example of writing, reading, or the head for a tape. On the slider portion (42) of the magnetic body (43) using Mn-Zn ferrite of this magnetic head (41), a coating film (50) containing carbon or carbon as a main component is formed in an amount of 0.1 to 0.5.
It was coated to a thickness of μm. Then, the life could be improved to 5 times as compared with the case without coating. This drawing shows an example of a drawing of a magnetic head for a 1/2 inch VTR. In particular, since the Vickers hardness of the slider part when this carbon film is not coated is only 800 Kg / mm 2 , it is possible to improve this to 2000 Kg / mm 2 or more, and to improve the sliding of tape etc. on the surface. Is remarkable.
【００１６】『実施例４』図２（Ｂ−１），（Ｂ−２）
は薄膜磁気ヘッドのー例を示す。図２（Ｂ−１）は正面
図、（Ｂ−２）は側面図を示す。この磁気ヘッドはトラ
ック巾２５μｍ、スライダ部のギャップ長０．６μｍ、
浮上量０．３μｍ、インダクタンス１００ｍＨ以下（１
ＭＨz ），出力電圧０．３ｍＶ以上（１ＭＨz ）を有す
る。この磁性材料（４３）のスライダ部（４２）上に炭
素または炭素を主成分とする部分（５０）を０．０５〜
０．３μｍの厚さに形成した。するとこの薄膜ヘッドの
耐摩耗性を３倍以上に伸ばすことができた。[Embodiment 4] FIGS. 2B-1 and 2B-2.
Shows an example of a thin film magnetic head. 2B-1 is a front view and FIG. 2B-2 is a side view. This magnetic head has a track width of 25 μm, a slider portion gap length of 0.6 μm,
Levitation amount 0.3 μm, inductance 100 mH or less (1
MHz) and an output voltage of 0.3 mV or more (1 MHz). On the slider portion (42) of the magnetic material (43), carbon or a portion (50) containing carbon as a main component is added in an amount of 0.05 to 0.05.
It was formed to a thickness of 0.3 μm. Then, the wear resistance of this thin film head could be extended three times or more.
【００１７】[0017]
【効果】以上の説明より明らかな如く、本発明は有機樹
脂またはそれにガラス、磁性体、金属またはセラミック
を形成し、それらの磁気ヘッド用部材または磁気ヘッド
全体の表面に炭素または炭素を主成分とした被膜をコー
ティングして設けたものである。この複合体は他の多く
の実施例にみられる如く、すべりを助長でき、加えて耐
摩耗性の向上ができるため、その工業的価値は計り知れ
ないものである。特にこの炭素が１５０℃以下の低温で
形成できるに対し、その硬度また基板に対する密着性が
きわめて優れているのが特徴である。また磁性体はサマ
リューム、コバルト等の希土類磁石、アモルファス磁性
体、酸化鉄またはこれにニッケル、クロム等がコ−トさ
れた形状異方形の磁性体またはフェライト磁性体であっ
てもよい。As is apparent from the above description, the present invention forms an organic resin or glass, a magnetic material, a metal or a ceramic on the organic resin, and uses carbon or carbon as a main component on the surface of the magnetic head member or the entire magnetic head. It is provided by coating the film. The industrial value of this composite is immeasurable because it can promote slipping and improve abrasion resistance as seen in many other examples. In particular, while this carbon can be formed at a low temperature of 150 ° C. or lower, its hardness and adhesion to the substrate are extremely excellent. Further, the magnetic substance may be a rare earth magnet such as sumalium or cobalt, an amorphous magnetic substance, iron oxide or an anisotropically shaped magnetic substance in which nickel, chromium or the like is coated, or a ferrite magnetic substance.
【図１】本発明の炭素または炭素を主成分とする被膜を
被形成面上に作製するロール・ツー・ロール方式の製造
装置の概要を示すFIG. 1 shows an outline of a roll-to-roll manufacturing apparatus for producing carbon or a coating film containing carbon as a main component on a surface to be formed according to the present invention.
【図２】本発明の複合体の実施例を示す。FIG. 2 shows an example of the composite of the present invention.
１ テープ状キャリア ２ 第１の電極 ３ 第２の電極 ４ 第１のロール ５ 第２のロール ６ 補助ロール ７ 補助ロール ９ 冷却手段 DESCRIPTION OF SYMBOLS 1 Tape-shaped carrier 2 1st electrode 3 2nd electrode 4 1st roll 5 2nd roll 6 Auxiliary roll 7 Auxiliary roll 9 Cooling means
Claims (2)
ホウ素、リンまたは窒素が添加された炭素を主成分とす
る被膜を形成するに際し、テープ状キャリアの裏側に配
設された第１の電極を冷却手段により冷却しつつこの電
極に対向して前記テープ状部材の表面側に離間して配設
された第２の電極との間に直流または高周波電圧を印加
して、プラズマを発生せしめ、炭化水素化物気体、また
はこれに加えてホウ素、リンまたは窒素の添加物気体と
を分解反応せしめて、前記部材上に炭素膜、若しくはホ
ウ素、リンまたは窒素の添加された炭素を主成分とする
膜を形成する工程とを有することを特徴とする炭素膜が
コートされた磁気部材の作製方法。1. A first electrode disposed on the back side of a tape-shaped carrier when forming a coating film containing carbon to which boron, phosphorus or nitrogen is added as a main component on a magnetic member by a roll-to-roll method. While cooling by means of a cooling means, a direct current or a high frequency voltage is applied between the second electrode and the second electrode which is arranged on the surface side of the tape-shaped member so as to be opposed to the electrode and to generate plasma. A carbon film or a film containing carbon to which boron, phosphorus or nitrogen is added as a main component, which is obtained by decomposing a hydrocarbon gas or an additive gas of boron, phosphorus or nitrogen in addition thereto. And a step of forming a magnetic member coated with a carbon film.
ホウ素、リンまたは窒素が添加された炭素を主成分とす
る被膜を形成するに際し、テープ状キャリアの裏側に配
設された第１の電極を冷却手段により２００℃以下に冷
却しつつこの電極に対向して前記テープ状部材の表面側
に離間して配設された第２の電極との間にプラズマを発
生せしめ、炭化水素化物気体、またはこれに加えてホウ
素、リンまたは窒素の添加物気体とを分解反応せしめ
て、前記部材上に炭素膜、若しくはホウ素、リンまたは
窒素の添加された炭素を主成分とする膜を形成する工程
とを有することを特徴とする炭素膜がコートされた磁気
部材の作製方法。2. A first electrode disposed on the back side of a tape-shaped carrier when forming a coating film containing carbon to which boron, phosphorus or nitrogen is added as a main component on a magnetic member by a roll-to-roll method. Is cooled to 200 ° C. or lower by a cooling means, and plasma is generated between the electrode and a second electrode which is arranged on the surface side of the tape-shaped member so as to be spaced apart from the electrode, and a hydrocarbon compound gas, Alternatively, in addition to this, a step of decomposing and reacting with an additive gas of boron, phosphorus or nitrogen to form a carbon film or a film containing carbon to which boron, phosphorus or nitrogen is added as a main component on the member. A method of manufacturing a magnetic member coated with a carbon film, comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5167501A JPH0782959B2 (en) | 1993-06-14 | 1993-06-14 | Method for producing magnetic member coated with carbon film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5167501A JPH0782959B2 (en) | 1993-06-14 | 1993-06-14 | Method for producing magnetic member coated with carbon film |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63013080A Division JPH0610853B2 (en) | 1988-01-22 | 1988-01-22 | Method for producing magnetic member coated with carbon film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06204063A JPH06204063A (en) | 1994-07-22 |
| JPH0782959B2 true JPH0782959B2 (en) | 1995-09-06 |
Family
ID=15850859
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5167501A Expired - Lifetime JPH0782959B2 (en) | 1993-06-14 | 1993-06-14 | Method for producing magnetic member coated with carbon film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0782959B2 (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0674504B2 (en) * | 1983-07-21 | 1994-09-21 | キヤノン株式会社 | Method of manufacturing deposited film |
| JPS6067671A (en) * | 1983-09-24 | 1985-04-18 | Anelva Corp | Thin film forming apparatus |
| JPH07105037B2 (en) * | 1987-05-12 | 1995-11-13 | 松下電器産業株式会社 | Method and apparatus for forming protective film of metallic magnetic medium |
-
1993
- 1993-06-14 JP JP5167501A patent/JPH0782959B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06204063A (en) | 1994-07-22 |
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