JPH0797691B2 - Optical bistable semiconductor device - Google Patents
Optical bistable semiconductor deviceInfo
- Publication number
- JPH0797691B2 JPH0797691B2 JP62229717A JP22971787A JPH0797691B2 JP H0797691 B2 JPH0797691 B2 JP H0797691B2 JP 62229717 A JP62229717 A JP 62229717A JP 22971787 A JP22971787 A JP 22971787A JP H0797691 B2 JPH0797691 B2 JP H0797691B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- fabry
- layer
- semiconductor
- state
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title claims description 15
- 239000004065 semiconductor Substances 0.000 title claims description 15
- 230000005684 electric field Effects 0.000 claims description 8
- 238000010521 absorption reaction Methods 0.000 description 6
- 230000007423 decrease Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000010365 information processing Effects 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F3/00—Optical logic elements; Optical bistable devices
- G02F3/02—Optical bistable devices
- G02F3/028—Optical bistable devices based on self electro-optic effect devices [SEED]
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F3/00—Optical logic elements; Optical bistable devices
- G02F3/02—Optical bistable devices
- G02F3/026—Optical bistable devices based on laser effects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/0206—Substrates, e.g. growth, shape, material, removal or bonding
- H01S5/0207—Substrates having a special shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18341—Intra-cavity contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18369—Structure of the reflectors, e.g. hybrid mirrors based on dielectric materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は光情報処理等に用いる光論理素子に関する。The present invention relates to an optical logic device used for optical information processing and the like.
(従来の技術) 近年、光の持つ高度な並列性を利用したデジタル情報処
理が注目を集めている。このためには光を2次元的に制
御するいわゆる面型論理素子の開発が必要である。その
うちの一つとして光双安定素子はとくに重要である。従
来、低い光入力強度で動作するものとして第3図に示す
構造がアプライドフィジックスレターズ(Applid Physi
cs Letters)45巻、13頁(1984)においてミラー(Mile
r,D.A.B.)等によって報告されている。GaAsとGaAlAsの
薄膜を交互に積層した量子井戸層31を導電型がそれぞれ
p型とn型のGaAlAsからなるクラッド層32,33ではさん
だpin構造に大きな抵抗21を介して電圧を加えている。
入力する光が弱いときには、光のエネルギーが量子井戸
の励起子のエネルギーと異なるため、吸収が小さい。光
が強くなると光の吸収によって生じる光電流が流れて、
抵抗での電圧降下のため量子井戸にかかる電界強度が低
下して励起子のエネルギーが変化して光に対する吸収が
大きくなる。このため、更に光電流は増加し抵抗での電
圧降下が大きくなる。このような正帰還により、光双安
定性が実現される。この光双安定素子は光強度が大きく
なると透過強度が低下するnot型の特性を持つ。(Prior Art) In recent years, digital information processing utilizing the high parallelism of light has attracted attention. For this purpose, it is necessary to develop a so-called surface-type logic element that controls light two-dimensionally. An optical bistable element is one of the most important ones. Conventionally, the structure shown in FIG. 3 has been applied to the Applied Physics Letters (Applid Physi
cs Letters) Volume 45, page 13 (1984) Mirror (Mile
r, DAB) etc. A quantum well layer 31 in which thin films of GaAs and GaAlAs are alternately laminated is applied to a pin structure sandwiched between cladding layers 32 and 33 of GaAlAs whose conductivity types are p-type and n-type, respectively, via a large resistance 21.
When the input light is weak, the energy of the light is different from the energy of the excitons of the quantum well, so the absorption is small. When the light becomes strong, the photocurrent generated by the absorption of the light flows,
Due to the voltage drop across the resistance, the electric field strength applied to the quantum well decreases, the energy of excitons changes, and absorption of light increases. Therefore, the photocurrent further increases and the voltage drop across the resistance increases. Optical bistability is realized by such positive feedback. This optical bistable element has a not type characteristic in which the transmission intensity decreases as the light intensity increases.
(発明が解決しようとする問題点) 以上に述べた光双安定素子では量子井戸の吸収係数の変
化を利用してため、光を吸収する長さが十分とれない面
型の素子ではオン状態とオフ状態の出力の比を大きくで
きない。また、オン状態でも吸収が起きているため、光
を吸収する素子の長さを大きくしてオフ状態の出力を小
さくすると、オン状態での損失が大きくなってしまうと
いう欠点を持つ。(Problems to be Solved by the Invention) In the above-described optical bistable element, since the change in the absorption coefficient of the quantum well is used, the planar type element that does not have a sufficient light absorption length is turned on. You cannot increase the off-state output ratio. Further, since absorption occurs even in the on state, there is a disadvantage that loss in the on state increases if the length of the element that absorbs light is increased and the output in the off state is decreased.
本発明の目的はオン状態での損失が小さく、オンオフ比
を大きくできる面型光双安定装置を提供することにあ
る。An object of the present invention is to provide a surface-type optical bistable device which has a small loss in an on state and can have a large on / off ratio.
(問題点を解決するための手段) 本発明の光双安定半導体装置とは2つの互いに平行な反
射鏡からなるファブリ・ペロ共振器の内部に第一の導電
型の第一の半導体層と、真性半導体の多重量子井戸構造
の能動層と、第二の導電型の第二の半導体層とからなる
半導体多層構造を有し、前記半導体多層構造を挟む電極
が抵抗を介して電圧源に接続され、前記半導体多層構造
に電圧が印加されていない状態でのファブリペロ共振器
の共鳴エネルギーが無電界時の前記多重量子井戸構造の
励起子エネルギーよりも低エネルギー側にあり、信号光
に前記の状態でのファブリペロ共振器の共鳴エネルギー
の光を用いることを特徴とする。(Means for Solving the Problems) The optical bistable semiconductor device of the present invention is a Fabry-Perot resonator having two mutually parallel reflecting mirrors, and a first conductivity type first semiconductor layer inside the Fabry-Perot resonator. It has a semiconductor multi-layer structure consisting of an active layer of an intrinsic semiconductor multi-quantum well structure and a second semiconductor layer of the second conductivity type, and electrodes sandwiching the semiconductor multi-layer structure are connected to a voltage source via a resistor. , The resonance energy of the Fabry-Perot resonator in the state where no voltage is applied to the semiconductor multilayer structure is lower than the exciton energy of the multiple quantum well structure when there is no electric field, and the signal light is in the above state. The light having the resonance energy of the Fabry-Perot resonator is used.
(作用) 本発明において電圧源が接続されていない状態でのファ
ブリ・ペロ共振器に共鳴する光のエネルギーは、電界が
印加されていない時の能動層の多重量子井戸構造の励起
子のエネルギーよりも低エネルギー側にある。信号光と
して用いる光のエネルギーはこの電圧源が接続されてい
ない状態でのファブリ・ペロ共振器に共鳴する光のエネ
ルギーである。(Function) In the present invention, the energy of light resonating in the Fabry-Perot resonator in the state where the voltage source is not connected is more than the energy of excitons of the multiple quantum well structure of the active layer when no electric field is applied. Is also on the low energy side. The energy of the light used as the signal light is the energy of the light that resonates with the Fabry-Perot resonator when this voltage source is not connected.
光が入射していない時には多重量子井戸構造に電圧源か
らの電圧がそのまま加わるため、励起子のエネルギーが
低エネルギー側にずれ、信号光に対する屈折率は多重量
子井戸構造に電界が加わっていない時より大きい。この
ため、ファブリ・ペロ共振器の共鳴エネルギーがずれ
て、光の透過率は小さい。この時、光は大部分反射され
るため、ファブリ・ペロ共振器の内部に入る光強度は小
さく光が多重量子井戸構造に吸収される割合は小さい。When light is not incident, the voltage from the voltage source is applied to the multiple quantum well structure as it is, so the energy of excitons shifts to the low energy side, and the refractive index for signal light is when the electric field is not applied to the multiple quantum well structure. Greater than Therefore, the resonance energy of the Fabry-Perot resonator is deviated, and the light transmittance is small. Since most of the light is reflected at this time, the light intensity entering the Fabry-Perot resonator is small and the light is absorbed in the multiple quantum well structure at a small rate.
入射する光の強度が大きくなると吸収による光電流のた
め、抵抗による電圧降下が起きて多重量子井戸構造に印
加される電界が減少する。このため、励起子のエネルギ
ーが高エネルギー側にずれて信号光に対する屈折率が減
少し、ファブリ・ペロ共振器の共鳴エネルギーが信号光
のエネルギーに近づく。信号光の透過率は大きくなる。
同時に、ファブリ・ペロ共振器の内部に入る光強度が大
きくなるため、光が多重量子井戸構造に吸収される割合
が増え更に光電流が増大する。When the intensity of incident light increases, photocurrent due to absorption causes a voltage drop due to resistance, and the electric field applied to the multiple quantum well structure decreases. For this reason, the exciton energy shifts to the high energy side, the refractive index for the signal light decreases, and the resonance energy of the Fabry-Perot resonator approaches the energy of the signal light. The transmittance of signal light is increased.
At the same time, the intensity of light entering the Fabry-Perot resonator increases, so that the proportion of light absorbed in the multiple quantum well structure increases and the photocurrent further increases.
以上のような正帰還により光双安定性が実現される。従
来の技術が多重量子井戸構造の電界による吸収係数の変
化を利用していたのに対し、本発明の光双安定性は屈折
率の変化を利用しそれをファブリ・ペロ共振器の優れた
透過特性と組合せているため、オン状態での損失が小さ
く、オンオフ比を大きくできる面型光双安定装置が実現
できる。Optical bistability is realized by the above positive feedback. Whereas the conventional technique utilizes the change of the absorption coefficient due to the electric field of the multi-quantum well structure, the optical bistability of the present invention utilizes the change of the refractive index, which is used for the excellent transmission of the Fabry-Perot resonator. Since it is combined with the characteristics, it is possible to realize a surface-type optical bistable device which has a small loss in the ON state and can have a large ON / OFF ratio.
(実施例) 第1図は本発明の1実施例を示す構成図である。n型の
GaAsの基板11上にn型−Al0.4Ga0.6Asのコンタクト層12
を厚さ2μm、アンドープAl0.4Ga0.6Asのバッファ層13
を厚さ50nm、10nm厚のアンドープGaAsのウェル層141と1
0nmの厚のアンドープAl0.4Ga0.6Asのバリア層142を交互
に5層ずつ積層した多重量子井戸層14、アンドープのAl
0.4Ga0.6Asのバッファ層15を厚さ50nm、p型−As0.4Ga
0.6Asのコンタクト層16を厚さ2μm順次積層し、光の
入射する部分の基板11をエッチングで除去する。さら
に、入射側、出射側に誘電体多層膜による反射率98%の
反射鏡17,18とn側電極19、p側電極20を形成する。100
kΩの抵抗21を介して電源22に接続する。また、電源電
圧は2.4Vである。(Embodiment) FIG. 1 is a block diagram showing an embodiment of the present invention. n-type
N-type Al 0.4 Ga 0.6 As contact layer 12 on GaAs substrate 11
A buffer layer 13 having a thickness of 2 μm and made of undoped Al 0.4 Ga 0.6 As
Undoped GaAs well layers 141 and 1 with thicknesses of 50 nm and 10 nm.
A multi-quantum well layer 14 in which five barrier layers 142 of undoped Al 0.4 Ga 0.6 As having a thickness of 0 nm are alternately laminated, undoped Al
A buffer layer 15 of 0.4 Ga 0.6 As having a thickness of 50 nm and p-type-As 0.4 Ga
A contact layer 16 of 0.6 As is sequentially laminated with a thickness of 2 μm, and the substrate 11 in the light incident portion is removed by etching. Further, reflecting mirrors 17 and 18 having a reflectance of 98% by a dielectric multilayer film, an n-side electrode 19 and a p-side electrode 20 are formed on the incident side and the emitting side. 100
Connect to power supply 22 through kΩ resistor 21. The power supply voltage is 2.4V.
本実施例の入出力特性を第2図に示す。ファブリ・ペロ
共振器は、電場が0の時に1.45eVの光に共鳴する。実線
は透過光、破線は反射光である。入力光の強度Pinが0.2
4mWのとき透過光がオフ状態からオン状態に遷移し、0.1
5mWのときオン状態からオフ状態に遷移するヒステリシ
スを持つ。反射光はその逆のヒステリシス特性を示す。
オン状態とオフ状態の強度比はPin=0.24mWにおいて透
過光で9:1、反射光で4:1程度である。従来は透過光で例
えば2.5:1であった。光の制御機構にファブリ・ペロ共
振型変調器を用いているため大きなオンオフ比が得られ
る。また消光比も3dB向上した。また、オフ状態からオ
ン状態に遷移するのに必要な光パワーは同じ大きさの負
荷抵抗を持つミラー等の実験例では0.67mWであったか
ら、約1/3である。The input / output characteristics of this embodiment are shown in FIG. The Fabry-Perot resonator resonates with 1.45 eV light when the electric field is zero. The solid line is transmitted light and the broken line is reflected light. Input light intensity Pin is 0.2
At 4 mW, the transmitted light transits from the off state to the on state,
It has hysteresis that transitions from the ON state to the OFF state at 5 mW. The reflected light exhibits the opposite hysteresis characteristic.
The intensity ratio between on-state and off-state is about 9: 1 for transmitted light and about 4: 1 for reflected light at Pin = 0.24mW. Conventionally, the transmitted light is, for example, 2.5: 1. Since a Fabry-Perot resonance modulator is used for the light control mechanism, a large on / off ratio can be obtained. Also, the extinction ratio was improved by 3 dB. In addition, the optical power required to make a transition from the off state to the on state was 0.67 mW in an experimental example such as a mirror having the same load resistance, which is about 1/3.
(発明の効果) 本発明の効果を要約するとオン状態での損失が小さく、
オンオフ比を大きくできる面型光双安定装置が得られる
ことである。(Effect of the invention) To summarize the effect of the present invention, the loss in the ON state is small,
A surface-type optical bistable device capable of increasing the on / off ratio can be obtained.
第1図は本発明の1実施例を示す構成図である。図中、
11は基板、12はコンタクト層、13はバッファ層、14は多
重量子井戸層、15はバッファ層、16はコンタクト層、1
7,18は反射鏡、19はn側電極、20はp側電極である。14
1はウェル層、142はバリア層である。また、21は抵抗、
22は電源である。 第2図は本実施例の入出力特性を示す図である。横軸は
入力光の強度、縦軸は出力光の強度である。実線は透過
光、破線は反射光である。 第3図は従来の技術の一例を示す構造図である。31は量
子井戸層、32,33はクラッド層である。FIG. 1 is a block diagram showing an embodiment of the present invention. In the figure,
11 is a substrate, 12 is a contact layer, 13 is a buffer layer, 14 is a multiple quantum well layer, 15 is a buffer layer, 16 is a contact layer, 1
Reference numerals 7 and 18 are reflecting mirrors, 19 is an n-side electrode, and 20 is a p-side electrode. 14
1 is a well layer and 142 is a barrier layer. Also, 21 is a resistance,
22 is a power supply. FIG. 2 is a diagram showing the input / output characteristics of this embodiment. The horizontal axis represents the intensity of the input light and the vertical axis represents the intensity of the output light. The solid line is transmitted light and the broken line is reflected light. FIG. 3 is a structural diagram showing an example of a conventional technique. Reference numeral 31 is a quantum well layer, and 32 and 33 are clad layers.
Claims (1)
リペロ共振器の内部に第一の導電型の第一の半導体層
と、真性半導体の多重量子井戸構造からなる能動層と、
第二の導電型の第二の半導体層とからなる半導体多層構
造を有し、前記半導体多層構造を挟む電極が抵抗を介し
て電圧源に接続され、前記半導体多層構造に電圧が印加
されていない状態でのファブリペロ共振器の共鳴エネル
ギーが無電界時の前記多重量子井戸構造の励起子エネル
ギーよりも低エネルギー側にあり、信号光に前記の状態
でのファブリペロ共振器の共鳴エネルギーの光を用いる
ことを特徴とする光双安定半導体装置。1. A first semiconductor layer of a first conductivity type inside a Fabry-Perot resonator composed of two mutually parallel reflecting mirrors, and an active layer composed of an intrinsic semiconductor multiple quantum well structure.
A semiconductor multi-layer structure including a second semiconductor layer of a second conductivity type, the electrodes sandwiching the semiconductor multi-layer structure are connected to a voltage source via a resistor, and no voltage is applied to the semiconductor multi-layer structure. The resonance energy of the Fabry-Perot resonator in the state is lower than the exciton energy of the multiple quantum well structure in the absence of electric field, and the light of the resonance energy of the Fabry-Perot resonator in the state is used as the signal light. An optical bistable semiconductor device characterized by.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62229717A JPH0797691B2 (en) | 1987-09-16 | 1987-09-16 | Optical bistable semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62229717A JPH0797691B2 (en) | 1987-09-16 | 1987-09-16 | Optical bistable semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6473786A JPS6473786A (en) | 1989-03-20 |
| JPH0797691B2 true JPH0797691B2 (en) | 1995-10-18 |
Family
ID=16896599
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62229717A Expired - Lifetime JPH0797691B2 (en) | 1987-09-16 | 1987-09-16 | Optical bistable semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0797691B2 (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH067623B2 (en) * | 1984-11-09 | 1994-01-26 | 日本電気株式会社 | Optical bistable integrated device |
| JPS6257274A (en) * | 1985-09-06 | 1987-03-12 | Nec Corp | Surface emitting semiconductor laser |
| JPH0711656B2 (en) * | 1986-02-17 | 1995-02-08 | 日本電気株式会社 | Optical bistable element |
-
1987
- 1987-09-16 JP JP62229717A patent/JPH0797691B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6473786A (en) | 1989-03-20 |
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