JPH0513547B2 - - Google Patents
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- Publication number
- JPH0513547B2 JPH0513547B2 JP18885586A JP18885586A JPH0513547B2 JP H0513547 B2 JPH0513547 B2 JP H0513547B2 JP 18885586 A JP18885586 A JP 18885586A JP 18885586 A JP18885586 A JP 18885586A JP H0513547 B2 JPH0513547 B2 JP H0513547B2
- Authority
- JP
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- Prior art keywords
- quantum well
- light
- resistance element
- voltage
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000010521 absorption reaction Methods 0.000 claims description 23
- 239000010409 thin film Substances 0.000 claims description 17
- 239000004065 semiconductor Substances 0.000 claims description 14
- 230000000694 effects Effects 0.000 claims description 8
- 230000031700 light absorption Effects 0.000 claims description 8
- 239000010408 film Substances 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 7
- 230000005641 tunneling Effects 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 description 22
- 230000004888 barrier function Effects 0.000 description 18
- 238000010586 diagram Methods 0.000 description 17
- 239000010410 layer Substances 0.000 description 11
- 230000007423 decrease Effects 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 6
- 238000004891 communication Methods 0.000 description 6
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 5
- 230000004044 response Effects 0.000 description 5
- 230000007704 transition Effects 0.000 description 4
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、組成の異なる薄膜からなる量子井戸
を用いた半導体素子に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor device using quantum wells made of thin films having different compositions.
光フアイバーケーブルを媒体とする光通信によ
れば、通信容量が従来の電線ケーブルを媒体とす
る電気通信に比べて飛躍的にのびるのが特長であ
る。通信技術や半導体の製造技術等の進歩に伴
い、この光通信が注目され、今後の情報通信の主
役となるべく脚光を浴びてきた。特に光通信で
は、光信号の伝送、光信号の選択演算処理、電気
信号との変換等に使用される各種デバイスの開発
が重要な課題になり、その研究、開発が盛んに行
われている。
Optical communication using fiber optic cables as a medium has the advantage of dramatically increasing communication capacity compared to conventional telecommunications using electric wire cables as a medium. With advances in communication technology and semiconductor manufacturing technology, optical communication has attracted attention and is expected to play a central role in future information communication. In particular, in optical communications, the development of various devices used for transmission of optical signals, selective arithmetic processing of optical signals, conversion with electrical signals, etc. has become an important issue, and research and development thereof are actively being carried out.
ところで、光信号の選択演算処理のための1デ
バイスとして、入射する光の強さの変化に応じて
出力がヒステリシスループを描く光双安定素子の
出現が望まれ、その実現のための研究が盛んに行
われている。この光双安定素子では、特に入射光
が僅かでも大きな出力変化が得られ、また、大き
い出力が得られること、入力を高速で変化させて
もこれに出力が追随して速く応答できること等、
感度や応答速度等の応答性の良い素子の出現が望
まれている。 By the way, as a device for selective calculation processing of optical signals, it is desired that an optical bistable element whose output forms a hysteresis loop in response to changes in the intensity of incident light will emerge, and research is being actively conducted to realize this. is being carried out. In particular, this optical bistable element can produce a large change in output even with a small amount of incident light, can also produce a large output, and even if the input changes at high speed, the output can follow it and respond quickly.
It is desired that an element with good responsiveness such as sensitivity and response speed be developed.
しかしながら、上記の如き入射する光の強さの
変化に応じて出力がヒステリシスループを描く光
双安定素子は、電気的な素子を使用しないものや
量子井戸と抵抗とを組み合わせたもの等、従来も
幾つかはあつたが、出力として得られるパワーが
少ない、応答性が悪い等、性能の面や使用し易さ
で種々の問題を有し、光信号の処理を行うのに満
足できる素子はまだ開発されていないのが現状で
ある。
However, conventional optical bistable devices whose output draws a hysteresis loop in response to changes in the intensity of incident light, such as those that do not use electrical elements or those that combine quantum wells and resistors, Although some devices have been developed, they have various problems in terms of performance and ease of use, such as low output power and poor response, and there are still no devices that are satisfactory for processing optical signals. The current situation is that it has not been developed.
本発明は、上記の考察に基づくものであつて、
感度の優れた応答性の良い光双安定素子が実現で
きる量子井戸を用いた半導体素子を提供すること
を目的とする。 The present invention is based on the above considerations, and includes:
The object of the present invention is to provide a semiconductor device using a quantum well that can realize an optical bistable device with excellent sensitivity and good response.
そのために本発明の量子井戸を用いた半導体素
子は、組成の異なる薄膜からなり特定の波長領域
で光の吸収特性が高吸収係数から低吸収係数に変
移する量子井戸の光制御層と、負性抵抗特性を有
する非直線抵抗素子とを直列にして電圧を印加
し、光制御層における上記特定の波長領域による
光の入出力特性を制御することを特徴とするもの
であり、また、組成の異なる薄膜からなり膜厚を
異にする複数の量子井戸における共鳴トンネル効
果を用いて非直線抵抗素子を実現したことを特徴
とするものである。
To this end, the semiconductor device using the quantum well of the present invention has a quantum well light control layer that is made of thin films with different compositions and whose light absorption characteristics shift from a high absorption coefficient to a low absorption coefficient in a specific wavelength region, and a It is characterized by applying a voltage to a non-linear resistance element having resistance characteristics in series, and controlling the input/output characteristics of light in the above-mentioned specific wavelength range in the light control layer. It is characterized by realizing a non-linear resistance element using the resonant tunneling effect in a plurality of quantum wells made of thin films and having different film thicknesses.
本発明の量子井戸を用いた半導体素子では、量
子井戸と非直線抵抗素子とを直列にして電圧を印
加するので、量子井戸の光吸収特性が吸収領域か
ら透過領域に変移する境界の特定波長領域の光を
入力すると、入力される光の強さによつて量子井
戸と非直線抵抗素子における電圧分担が変化し、
量子井戸が吸収から透過へ、或いは透過から吸収
へ変移する。つまり量子井戸は、両端の電圧(電
界強度)に依存して吸収領域と透過領域との変移
点がシフトし、非直線抵抗素子を直列に接続する
ことによつて両端の電圧が入射光の強さに依存し
て変化する。また、膜厚を異にする複数の量子井
戸における共鳴トンネル効果を用いることによ
り、抵抗変化が大きく良好な非直線抵抗素子を得
ることができる。
In the semiconductor device using the quantum well of the present invention, since the quantum well and the nonlinear resistance element are connected in series and a voltage is applied, the light absorption characteristic of the quantum well shifts from the absorption region to the transmission region in a specific wavelength range at the boundary. When light is input, the voltage sharing between the quantum well and the nonlinear resistance element changes depending on the intensity of the input light.
The quantum well transitions from absorption to transmission or from transmission to absorption. In other words, in a quantum well, the transition point between the absorption region and the transmission region shifts depending on the voltage (electric field strength) at both ends, and by connecting nonlinear resistance elements in series, the voltage at both ends can be adjusted to the intensity of the incident light. It changes depending on the situation. Further, by using the resonant tunneling effect in a plurality of quantum wells having different film thicknesses, it is possible to obtain an excellent nonlinear resistance element with a large resistance change.
以下、図面を参照しつつ実施例を説明する。 Examples will be described below with reference to the drawings.
第1図は本発明の量子井戸を用いた半導体素子
の1実施例を説明するための図、第2図は量子井
戸の光吸収特性を示す図、第3図は非直線抵抗素
子の電圧−電流特性を示す図、第4図は光双安定
素子の入出力特性を示す図である。 FIG. 1 is a diagram for explaining one embodiment of a semiconductor device using a quantum well according to the present invention, FIG. 2 is a diagram showing light absorption characteristics of a quantum well, and FIG. 3 is a diagram showing a voltage difference of a nonlinear resistance element. FIG. 4 is a diagram showing the current characteristics, and FIG. 4 is a diagram showing the input/output characteristics of the optical bistable element.
第1図において、1は電源、2と3は薄膜、4
は非直線抵抗素子を示す。本発明に用いられる量
子井戸の構造は、第1図に示すように例えば薄膜
2がこれと組成の異なる薄膜3により挟み込まれ
た多重量子井戸である。この量子井戸は、入射光
に対する吸収特性が第2図のようになり、或る波
長以下の光に対して高い吸収係数をもつ。この境
界の波長は、例えば量子井戸を構成する薄膜2に
GaAs、薄膜3にいAlGaAsを使用した場合には
8000Å程度、また薄膜3にInGaAs、薄膜3に
InAlAsを使用した場合には1.5μ(ミクロン)程度
になり、材料により境界の波長を選ぶことができ
る。また、この境界の波長は、電圧を加えると長
波長側(第2図図示実線から点線)にシフトする
という特性を有する。従つて、電圧を制御するこ
とによつて吸収特性を変えることができる。特定
の波長、例えば第2図に示すλiでは、高い吸収係
数をもつ状態と低い吸収係数をもつ状態との切り
換えが可能になる。 In Figure 1, 1 is a power supply, 2 and 3 are thin films, and 4
indicates a non-linear resistance element. As shown in FIG. 1, the structure of the quantum well used in the present invention is, for example, a multiple quantum well in which a thin film 2 is sandwiched between thin films 3 having a different composition. This quantum well has absorption characteristics for incident light as shown in FIG. 2, and has a high absorption coefficient for light below a certain wavelength. The wavelength of this boundary is, for example, the wavelength of the thin film 2 constituting the quantum well.
When using GaAs, thin film 3 and AlGaAs
About 8000Å, and InGaAs for thin film 3, and InGaAs for thin film 3.
When InAlAs is used, it is approximately 1.5 μ (micron), and the wavelength of the boundary can be selected depending on the material. Further, the wavelength at this boundary has a characteristic that when a voltage is applied, it shifts to the longer wavelength side (from the solid line to the dotted line in FIG. 2). Therefore, the absorption properties can be changed by controlling the voltage. At a particular wavelength, for example λ i shown in FIG. 2, it is possible to switch between a state with a high absorption coefficient and a state with a low absorption coefficient.
本発明に係る光双安定素子は、第1図の構成で
示すように原理としてこの量子井戸を利用したも
のであり、この素子構造は、量子井戸を整流性の
ある接合、例えばPN接合やシヨツトキ接合に組
み込むと共に、これに負性抵抗特性をもつ非直線
抵抗素子4を接続し両端に電源1を接続して一定
の電圧V3を印加することによつて、これらの相
互作用でヒステリシス特性をもたらすようにした
ものである。ここで、入射光の方向は、図示の如
く量子井戸に対して直角にしてもよいが、水平に
してもよい。また、単層の量子井戸であつてもよ
い。 The optical bistable device according to the present invention utilizes this quantum well as a principle, as shown in the configuration shown in FIG. In addition to incorporating it into the junction, by connecting a non-linear resistance element 4 with negative resistance characteristics to it, connecting the power supply 1 to both ends, and applying a constant voltage V3 , hysteresis characteristics can be created by the interaction of these elements. It was designed to bring about this. Here, the direction of the incident light may be perpendicular to the quantum well as shown, but it may also be horizontal. Alternatively, it may be a single-layer quantum well.
次に、第1図に示す光双安定素子の作用を説明
する。まず量子井戸の性質を説明すると、量子井
戸は、入射光がない場合にはほとんど電流が流れ
ないが、入射光があると光の吸収に応じて電流が
流れ、従つて、入射光の強さ及び波長に応じて変
わる。すなわち、第2図に示す吸収特性におい
て、吸収領域にある波長の光に対しては、光を吸
収した分だけ電流が流れることになり、吸収領域
から外れた領域の長波長の光に対しては、入射光
が増減しても電流は僅かしか変化しない。 Next, the operation of the optical bistable device shown in FIG. 1 will be explained. First, to explain the properties of a quantum well, in a quantum well, almost no current flows when there is no incident light, but when there is incident light, a current flows according to the absorption of light, and therefore the intensity of the incident light increases. and varies depending on the wavelength. In other words, in the absorption characteristics shown in Figure 2, for light with a wavelength in the absorption region, a current flows by the amount of absorbed light, and for light with a long wavelength outside the absorption region, In this case, the current changes only slightly even if the incident light increases or decreases.
他方、非直線抵抗素子は、周知の如く第3図に
示す電圧−電流特性を有する。すなわち、或る電
圧(図示b点)までは電圧に比例して電流が増え
てゆくが、図示b点を越えると抵抗が急激に増大
し逆に電圧に反比例するように電流が減つてゆ
く。 On the other hand, the nonlinear resistance element has the voltage-current characteristics shown in FIG. 3, as is well known. That is, the current increases in proportion to the voltage up to a certain voltage (point b in the figure), but beyond point b in the figure, the resistance rapidly increases and the current decreases in inverse proportion to the voltage.
そこで、上記の性質を有する量子井戸の光制御
層及び非直線抵抗素子を、第1図に示すように直
列に接続して一定の電圧V3を印加し、第2図に
示す吸収特性をもつ量子井戸に対し波長λiを入射
光として与えると、第4図に示す入射光と出力光
の関係が得られる。まず、入射光がほとんど0の
場合には、量子井戸は高抵抗状態にあつて電流が
流れない。このとき、量子井戸の電圧V1はほぼ
電源電圧V3になり、非直線抵抗素子の電圧V2は
0になつている。また、この状態での量子井戸の
吸収特性は、電圧V1が高いため第2図の点線で
示す特性となつている。 Therefore, a quantum well light control layer and a non-linear resistance element having the above properties were connected in series as shown in Figure 1, and a constant voltage V3 was applied to obtain the absorption characteristics shown in Figure 2. When wavelength λ i is applied as incident light to a quantum well, the relationship between the incident light and output light shown in FIG. 4 is obtained. First, when the incident light is almost zero, the quantum well is in a high resistance state and no current flows. At this time, the voltage V 1 of the quantum well becomes approximately the power supply voltage V 3 , and the voltage V 2 of the nonlinear resistance element becomes 0. Further, the absorption characteristics of the quantum well in this state are as shown by the dotted line in FIG. 2 because the voltage V 1 is high.
次に、入射光を増やしてゆくと、量子井戸は吸
収係数が高い状態であるため、入射光が吸収され
電流が増え、非直線抵抗素子の電圧V2も高くな
つてゆく。この過程(第3図及び第4図に示すa
→b)では入射光が増えても量子井戸での光の吸
収により出力光は0に近い状態が続く。 Next, as the amount of incident light increases, since the quantum well has a high absorption coefficient, the incident light is absorbed, the current increases, and the voltage V 2 of the nonlinear resistance element also increases. This process (a shown in Figures 3 and 4)
→ In b), even if the incident light increases, the output light remains close to 0 due to light absorption in the quantum well.
しかし、入射光がさらに増えて非直線抵抗素子
の電圧V2が第3図に示すb点を越えると、非直
線抵抗素子の抵抗が急激に大きくなり電流は減少
するがさらに非直線抵抗素子の電圧V2が高い点
(第3図及び第4図に示すb→d)に遷移する。
このため、量子井戸の電圧V1が急激に低下して
吸収特性が第2図の点線から実線にシフトする。
従つて、ここで量子井戸での吸収がなくなり、入
力光はほとんど透過して出力光が急増することに
なる。 However, when the incident light increases further and the voltage V 2 of the nonlinear resistance element exceeds point b shown in Figure 3, the resistance of the nonlinear resistance element increases rapidly, and the current decreases, but the nonlinear resistance element The voltage V 2 transitions to a high point (b→d shown in FIGS. 3 and 4).
Therefore, the voltage V 1 of the quantum well decreases rapidly, and the absorption characteristic shifts from the dotted line to the solid line in FIG. 2.
Therefore, absorption in the quantum well disappears at this point, most of the input light is transmitted, and the output light increases rapidly.
一旦上記の状態(第3図及び第4図に示すd)
に遷移すると、非直線抵抗素子は高抵抗のまま
で、高電圧分担状態を維持し、量子井戸は非吸収
状態(透明状態)を維持する。このため、入射光
が減つても出力光は高出力状態(第3図及び第4
図に示すd)が続く。 Once in the above state (d shown in Figures 3 and 4)
When the transition occurs, the nonlinear resistance element maintains a high resistance and a high voltage sharing state, and the quantum well maintains a non-absorbing state (transparent state). Therefore, even if the incident light decreases, the output light remains in a high output state (see Figures 3 and 4).
d) shown in the figure follows.
しかし、入射光がさらに減つて量子井戸におけ
る負荷抵抗が増え非直線抵抗素子における分担電
圧が低下(第3図及び第4図に示すcまで低下)
すると、非直線抵抗素子の抵抗が急激に小さくな
つて電流が増え量子井戸の分担電圧が高くなる。
このため、量子井戸の吸収特性が第2図の実線か
ら点線にシフトする。従つて、ここで量子井戸が
入射光を吸収するようになり、出力光は低出力状
態(第3図及び第4図に示すa)になる。 However, as the incident light further decreases, the load resistance in the quantum well increases and the shared voltage in the nonlinear resistance element decreases (down to c shown in Figures 3 and 4).
Then, the resistance of the nonlinear resistance element decreases rapidly, the current increases, and the voltage shared by the quantum well increases.
Therefore, the absorption characteristics of the quantum well shift from the solid line in FIG. 2 to the dotted line. Therefore, the quantum well now absorbs the incident light, and the output light is in a low power state (a shown in FIGS. 3 and 4).
第5図は本発明に係る量子井戸を用いた半導体
素子の他の実施例で、光双安定素子に使用される
非直線抵抗素子に好適な例を示す図、第6図は2
重障壁共鳴トンネルダイオードの動作を説明する
ための図、第7図は負性抵抗特性を説明するため
の図、第8図は間隔を変えた3重障壁共鳴トンネ
ルダイオードの例を示す図であり、11は障壁を
示す。 FIG. 5 shows another embodiment of a semiconductor device using quantum wells according to the present invention, and is a diagram showing an example suitable for a nonlinear resistance element used in an optical bistable device.
FIG. 7 is a diagram for explaining the operation of a double barrier resonant tunnel diode, FIG. 7 is a diagram for explaining negative resistance characteristics, and FIG. 8 is a diagram showing an example of a triple barrier resonant tunnel diode with different spacing. , 11 indicates a barrier.
第5図に示す量子井戸を用いた半導体素子の例
は、複数の量子井戸における共鳴トンネル効果を
用いて非直線抵抗素子を実現したものであり、
GaAsの薄膜とAlGaAsの薄膜とを積層した構造
の多重量子井戸により非直線抵抗素子の共鳴トン
ネルダイオードを構成した例である。この共鳴ト
ンネルダイオードの作用を2重障壁で説明する
と、初めは大部分が第1の障壁で反射して1部が
透過するが、それも第2の障壁で反射する。ここ
で第6図a,bに示すように電圧を徐々に上げて
電流を流すと、2カ所で発生する反射が相互に打
ち消すようになり電流が増え、位相が完全に弱め
合う条件の時、反射が0になつてしまい大きな電
流I1が流れる。それ以上の電圧になると、相互に
打ち消す条件が崩れ、電流が急激に減る。 The example of a semiconductor device using quantum wells shown in FIG. 5 is one in which a non-linear resistance element is realized using the resonant tunneling effect in a plurality of quantum wells.
This is an example in which a resonant tunnel diode, which is a nonlinear resistance element, is constructed using a multi-quantum well structure in which a GaAs thin film and an AlGaAs thin film are stacked. Explaining the effect of this resonant tunnel diode using a double barrier, most of the light is initially reflected by the first barrier and a portion is transmitted, but it is also reflected by the second barrier. Now, as shown in Figure 6a and b, when the voltage is gradually increased and the current is caused to flow, the reflections occurring at the two locations cancel each other out and the current increases, and when the phases are completely weakened, The reflection becomes 0 and a large current I1 flows. If the voltage is higher than that, the conditions for mutual cancellation break down and the current decreases rapidly.
ところで、一般に非直線抵抗素子は、第7図に
示す電流I1と電流I2との差が大きいものが要求さ
れる。しかし、上記の如き作用の障壁をもう1つ
加えて3重にした場合には、各障壁における共鳴
条件が合わないため、第7図に示す電流I1はあま
り大きくならない。従つて、単純に3重障壁にし
た共鳴トンネルダイオードでは、望ましい特性の
非直線抵抗素子は得られない。 Incidentally, in general, a nonlinear resistance element is required to have a large difference between the current I 1 and the current I 2 shown in FIG. However, if one more barrier with the above-mentioned effect is added to make the structure triple, the current I 1 shown in FIG. 7 does not become very large because the resonance conditions in each barrier do not match. Therefore, a resonant tunneling diode simply made of triple barriers cannot provide a nonlinear resistance element with desirable characteristics.
そこで、第5図に示す如き3重障壁共鳴トンネ
ルダイオードで第7図に示す電流I1と電流I2との
差が大きくなるようにするためには、第8図に示
す障壁の間隔W1、W2を、例えば障壁11の厚さ
を23Åにした場合、間隔W1を71Å、間隔W2を48
Åのように変えるとよい。つまり、障壁を透過し
た電子は加速されて波長が短くなるから、この性
質に着目し、これに対応させて間隔W2を間隔W1
より短くする。通常、エネルギーE=定数×
(1/W)2で共鳴が起こるので、第1の障壁を透
過するとエネルギーEが2倍になるとすると、上
記の管下W1を71Å、間隔W2を48Åがその条件に
対応することになる。 Therefore, in order to increase the difference between the current I 1 and the current I 2 shown in FIG. 7 in a triple barrier resonant tunnel diode as shown in FIG. 5, the barrier spacing W 1 shown in FIG. 8 must be increased. , W 2 , for example, when the thickness of the barrier 11 is 23 Å, the interval W 1 is 71 Å, and the interval W 2 is 48 Å.
It is best to change it to something like Å. In other words, since electrons that have passed through the barrier are accelerated and their wavelength becomes shorter, we focused on this property and changed the interval W 2 to the interval W 1 accordingly.
Make it shorter. Usually, energy E = constant ×
Resonance occurs at (1/W) 2 , so if the energy E is doubled when it passes through the first barrier, then the above-mentioned tube width W 1 of 71 Å and interval W 2 of 48 Å correspond to those conditions. Become.
上記の如き3重障壁共鳴トンネルダイオードを
本発明に係る光双安定素子に使うと、GaAs系の
多層薄膜素子としてMBE(Molecular Beam
Epitaxy;分子線エタピキシー)法により一貫製
造できる。この場合、光の吸収/透過を制御する
量子井戸に対して、3重障壁共鳴トンネルダイオ
ードが光を透過するものであつて、光に依存しな
いように、材料の調整を必要とすることは勿論の
ことである。そのためには、吸収開始波長を光制
御層のそれよりも短くすればよい。その1例とし
ては、第5図に示す薄膜のそれぞれにAlを加え
てGaAsの層をAlxGa1-xAsの層とし、AlGaAsの
層をAlyGa1-yAsの層とすると共にx<yの条件
を満足するように組成を選択すればよい。 When the triple barrier resonant tunneling diode as described above is used in the optical bistable device according to the present invention, MBE (Molecular Beam) is used as a GaAs-based multilayer thin film device.
It can be manufactured in an integrated manner using the epitaxy (molecular beam epitaxy) method. In this case, the triple-barrier resonant tunneling diode transmits light in contrast to the quantum well that controls light absorption/transmission, and of course requires adjustment of the material so that it does not depend on light. It is about. For this purpose, the absorption start wavelength may be made shorter than that of the light control layer. As an example, Al is added to each of the thin films shown in Figure 5, so that the GaAs layer becomes an Al x Ga 1-x As layer, the AlGaAs layer becomes an Al y Ga 1-y As layer, and The composition may be selected so as to satisfy the condition x<y.
なお、本発明は、種々の変形が可能であり、上
記実施例に限定されるものではない。例えば上記
実施例では、多層膜の量子井戸を使用したが、多
層でなくてもよく、光の入射方向は膜に直角方向
でなく水平方向であつてもよい。また、本発明に
係る量子井戸を用いた光双安定素子を構成する非
直線抵抗素子は、第5図ないし第8図により説明
した3重障壁共鳴トンネルダイオードでなく、他
の素子を用いてもよい。さらに、非直線抵抗素子
は、上述の如く光制御層と一体化構造としてもよ
いが、一体化構造とせず、光制御層と電気的な接
続回路を節けるようにしてもよい。量子井戸を構
成する多層膜の組成も上記実施例で示したGaAs
系以外のものであつてもよいことはいうまでもな
い。 Note that the present invention can be modified in various ways and is not limited to the above embodiments. For example, in the above embodiment, a quantum well with a multilayer film is used, but the quantum well does not need to be multilayer, and the incident direction of light may not be perpendicular to the film but may be horizontal. Further, the non-linear resistance element constituting the optical bistable element using quantum wells according to the present invention is not the triple barrier resonant tunnel diode explained with reference to FIGS. 5 to 8, but other elements may be used. good. Further, the non-linear resistance element may have an integrated structure with the light control layer as described above, but it may also be configured so that the light control layer and the electrical connection circuit can be connected without having an integrated structure. The composition of the multilayer film constituting the quantum well is GaAs as shown in the above example.
Needless to say, it may be something other than the system.
以上の説明から明らかなように、本発明によれ
ば、量子井戸と非線形抵抗素子と直列にして一定
の電圧を印加するだけでよいので、簡単な構造で
光の入出力関係がヒステリシスループを描く光双
安定素子を提供することができる。また、上記の
如き量子井戸構造を用いるので、半導体基板上に
共鳴トンネルダイオード、光制御層を順次積層す
ることによつて光双安定素子を製造することがで
きる。従つて、集積化も容易にでき、光信号の記
憶や論理演算用の半導体素子として広く利用でき
る。
As is clear from the above explanation, according to the present invention, it is only necessary to connect the quantum well and the nonlinear resistance element in series and apply a constant voltage, so the optical input/output relationship forms a hysteresis loop with a simple structure. An optical bistable device can be provided. Further, since the quantum well structure as described above is used, an optical bistable device can be manufactured by sequentially laminating a resonant tunnel diode and a light control layer on a semiconductor substrate. Therefore, it can be easily integrated and can be widely used as a semiconductor element for optical signal storage and logical operations.
第1図は本発明の量子井戸を用いた光双安定素
子の1実施例を説明するための図、第2図は量子
井戸の光吸収特性を示す図、第3図は非直線抵抗
素子の電圧−層流特性を示す図、第4図は光双安
定素子の入出力特性を示す図、第5図は本発明に
係る量子井戸を用いた半導体素子の他の実施例
で、光双安定素子に使用される非直線抵抗素子に
好適な例を示す図、第6図は2重障壁共鳴トンネ
ルダイオードの動作を説明するための図、第7図
は負性抵抗特性を説明するための図、第8図は間
隔を変えた3重障壁共鳴トンネルダイオードの例
を示す図である。
1は電源、2,3と11は薄膜、4は非直線抵
抗素子。
Fig. 1 is a diagram for explaining one embodiment of an optical bistable device using a quantum well of the present invention, Fig. 2 is a diagram showing the light absorption characteristics of a quantum well, and Fig. 3 is a diagram of a nonlinear resistance element. FIG. 4 is a diagram showing the input/output characteristics of an optically bistable device, and FIG. 5 is another example of a semiconductor device using a quantum well according to the present invention. A diagram showing a suitable example of a nonlinear resistance element used in the device, Figure 6 is a diagram to explain the operation of a double barrier resonant tunnel diode, and Figure 7 is a diagram to explain negative resistance characteristics. , FIG. 8 is a diagram showing an example of a triple barrier resonant tunnel diode with varying spacing. 1 is a power supply, 2, 3 and 11 are thin films, and 4 is a non-linear resistance element.
Claims (1)
光の吸収特性が高吸収係数から低吸収係数に変移
する量子井戸の光制御層と、負性抵抗特性を有す
る非直線抵抗素子とを直列にして電圧を印加し、
光制御層における上記特定の波長領域による光の
入出力特性を制御することを特徴とする量子井戸
を用いた半導体素子。 2 多層膜による量子井戸を光制御層にしたこと
を特徴とする特許請求の範囲第1項記載の量子井
戸を用いた半導体素子。 3 組成の異なる薄膜からなり膜厚を異にする複
数の量子井戸における共鳴トンネル効果を用いて
非直線抵抗素子を実現したことを特徴とする量子
井戸を用いた半導体素子。[Claims] 1. A quantum well light control layer that is made of thin films with different compositions and whose light absorption characteristics shift from a high absorption coefficient to a low absorption coefficient in a specific wavelength range, and a nonlinear resistor that has negative resistance characteristics. Apply voltage with the element in series,
A semiconductor device using a quantum well, characterized in that the input/output characteristics of light in the above-mentioned specific wavelength range are controlled in a light control layer. 2. A semiconductor device using a quantum well according to claim 1, characterized in that a quantum well made of a multilayer film is used as a light control layer. 3. A semiconductor device using quantum wells, characterized in that a non-linear resistance element is realized by using a resonant tunneling effect in a plurality of quantum wells made of thin films of different compositions and having different film thicknesses.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61188855A JPS6344776A (en) | 1986-08-12 | 1986-08-12 | Semiconductor device using quantum well |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61188855A JPS6344776A (en) | 1986-08-12 | 1986-08-12 | Semiconductor device using quantum well |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6344776A JPS6344776A (en) | 1988-02-25 |
| JPH0513547B2 true JPH0513547B2 (en) | 1993-02-22 |
Family
ID=16231029
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61188855A Granted JPS6344776A (en) | 1986-08-12 | 1986-08-12 | Semiconductor device using quantum well |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6344776A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2678774B1 (en) * | 1991-07-05 | 1998-07-10 | Thomson Csf | ELECTROMAGNETIC WAVE DETECTOR. |
| EP3082169A1 (en) * | 2015-04-17 | 2016-10-19 | AZUR SPACE Solar Power GmbH | Stacked optocoupler module |
-
1986
- 1986-08-12 JP JP61188855A patent/JPS6344776A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6344776A (en) | 1988-02-25 |
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