JPH0798895B2 - Epoxy resin molding material - Google Patents
Epoxy resin molding materialInfo
- Publication number
- JPH0798895B2 JPH0798895B2 JP1103152A JP10315289A JPH0798895B2 JP H0798895 B2 JPH0798895 B2 JP H0798895B2 JP 1103152 A JP1103152 A JP 1103152A JP 10315289 A JP10315289 A JP 10315289A JP H0798895 B2 JPH0798895 B2 JP H0798895B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- molding material
- resin molding
- silicon nitride
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000003822 epoxy resin Substances 0.000 title claims description 23
- 229920000647 polyepoxide Polymers 0.000 title claims description 23
- 239000012778 molding material Substances 0.000 title claims description 19
- 229920005989 resin Polymers 0.000 claims description 23
- 239000011347 resin Substances 0.000 claims description 23
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 21
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 21
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 11
- 238000006243 chemical reaction Methods 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 239000011256 inorganic filler Substances 0.000 claims description 7
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 7
- 238000005538 encapsulation Methods 0.000 claims description 6
- 229920003986 novolac Polymers 0.000 claims description 6
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 5
- 125000002723 alicyclic group Chemical group 0.000 claims description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 4
- 125000005233 alkylalcohol group Chemical group 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 238000000465 moulding Methods 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000013329 compounding Methods 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 208000002173 dizziness Diseases 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- -1 glycidyl ester Chemical class 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) この発明は、樹脂封止用エポキシ樹脂成形材料に関する
ものである。さらに詳しくは、この発明は、電気部品や
電子部品を封止するための樹脂モールド品に用いられる
熱放散性および成形性に優れたエポキシ樹脂成形材料に
関するものである。TECHNICAL FIELD The present invention relates to an epoxy resin molding material for resin encapsulation. More specifically, the present invention relates to an epoxy resin molding material having excellent heat dissipation and moldability, which is used in a resin molded product for sealing electric parts and electronic parts.
(従来の技術) 近年、電気・電子機器の高性能化、高信頼性化、生産性
向上のために、プラスチックによる樹脂封止がなされる
ようになってきている。これらの電気部品や電子部品に
は、たとえばトランジスタ、ダイオード、コンデンサ
ー、フィルター、整流器、抵抗体、コイル等があり、樹
脂封止の手段はこれらに広く適用されてきてもいる。ま
た、この樹脂封止においては、パワーデバイス定格出力
の向上や素子の発熱による熱疲労寿命の短縮が課題とな
ることから、封止用樹脂には結晶シリカや高純度アルミ
ナなどの高熱伝導性の無機質フィラーを添加配合するこ
とも行われてきている。(Prior Art) In recent years, in order to improve the performance and reliability of electric and electronic devices, and to improve productivity, resin encapsulation with plastic has come to be performed. These electric parts and electronic parts include, for example, transistors, diodes, capacitors, filters, rectifiers, resistors, coils, etc., and resin sealing means have been widely applied to these. Further, in this resin encapsulation, improvement of the power device rated output and shortening of the thermal fatigue life due to heat generation of the element become problems, so the encapsulating resin has high thermal conductivity such as crystalline silica or high-purity alumina. Addition of inorganic fillers has also been performed.
(発明が解決しようとする課題) しかしながら、これまでの樹脂封止においては、熱伝導
率を高めるために無機質フィラーの充填率を高めていく
と樹脂粘度が増大し、ワイヤー変形、ボイド未充填とい
った成形上の問題が避けられなかった。(Problems to be solved by the invention) However, in the conventional resin encapsulation, as the filling rate of the inorganic filler is increased in order to increase the thermal conductivity, the resin viscosity increases, and wire deformation, void unfilling, etc. Molding problems were unavoidable.
このため、これまでの封止用樹脂成形材料によってはパ
ワーデバイスの高機能化や高出力化の要請には対応する
ことができないのが実情である。Therefore, it is the actual situation that the demands for higher performance and higher output of the power device cannot be met depending on the encapsulating resin molding material used so far.
この発明は、以上の通りの事情に鑑みてなされたもので
あり、従来の封止用樹脂成形材料の欠点を解消し、高熱
伝導性とともに低粘度化、高流動性化をも特性付与する
ことのできる、熱放散性および成形性に優れた樹脂成形
材料を提供することを目的としている。The present invention has been made in view of the circumstances as described above, and solves the drawbacks of conventional resin molding compounds for sealing, and imparts characteristics such as high thermal conductivity, low viscosity, and high fluidity. It is an object of the present invention to provide a resin molding material which is capable of heat dissipation and has excellent moldability.
(課題を解決するための手段) この発明は、上記の課題を解決するものとして、エポキ
シ樹脂に、流動層において低級アルキルアルコールまた
は脂環式アルコールと反応処理して表面SiOR(Rは置換
基を有しない低級アルキル基または脂環式アルキル基を
示す)構造を形成させた窒化硅素を配合してなることを
特徴とする樹脂封止用エポキシ樹脂成形材料を提供す
る。(Means for Solving the Problems) In order to solve the above problems, the present invention provides a method in which an epoxy resin is subjected to a reaction treatment with a lower alkyl alcohol or an alicyclic alcohol in a fluidized bed to obtain a surface SiOR (R represents a substituent). There is provided an epoxy resin molding material for resin encapsulation, which comprises a silicon nitride having a structure in which a lower alkyl group or an alicyclic alkyl group which does not have is formed is blended.
またこの発明は、エポキシ樹脂にフェノールノボラック
樹脂とともに、その一部または全部が上記の窒化硅素か
らなる無機質充填材をその樹脂組成物全体量の60〜90重
量%配合することや、シランカップリング剤をも配合す
ることを好ましい態様としてもいる。もちろんこの組成
物には、必要に応じてその他架橋剤、硬化剤、硬化促進
剤、離型剤、着色剤などの添加剤を配合してもよい。Further, the present invention, together with the phenol novolac resin in the epoxy resin, a part or all of the inorganic filler consisting of the above silicon nitride compounded 60 to 90 wt% of the total amount of the resin composition, and a silane coupling agent. Is also included as a preferred embodiment. Of course, other additives such as a cross-linking agent, a curing agent, a curing accelerator, a release agent, and a coloring agent may be added to this composition, if necessary.
この発明のベース樹脂として用いるエポキシ樹脂につい
ては、その種類に特段の限定はなく、エポキシ基含有の
硬化可能なエポキシ樹脂であるならば、ビスフェノール
A型エポキシ樹脂、ノボラック型エポキシ樹脂、ハロゲ
ン化エポキシ樹脂、グリシジルエステル型エポキシ樹脂
等の適宜なものを使用することができる。There is no particular limitation on the type of epoxy resin used as the base resin of the present invention, and if it is a curable epoxy resin containing an epoxy group, bisphenol A type epoxy resin, novolac type epoxy resin, halogenated epoxy resin. A suitable material such as a glycidyl ester type epoxy resin can be used.
これに配合する窒化硅素は、その表面に上記の通りのSi
OR基を持つことを特徴としている。The silicon nitride to be added to this is the same as above on the surface.
It is characterized by having an OR group.
この点についてさらに詳しく説明すると、無機質充填材
と樹脂とは本来的に相溶性が悪く増粘の原因となるが、
表面にシラノール(Si−OH)基を有する窒化硅素の場合
にはその配合が低粘度化に大きく寄与し、また、このシ
ラノール基のままの状態よりも、これをアルコールと反
応させて上記の通りの表面SiOR構造を有するものとした
ものが封止用樹脂の耐湿性および成形性(特にバリ特
性)の点から好ましいことが見出された。このような知
見に基づいてはじめてこの発明は完成されている。Explaining this point in more detail, although the inorganic filler and the resin are inherently poor in compatibility and cause thickening,
In the case of silicon nitride having a silanol (Si-OH) group on the surface, its composition greatly contributes to lowering the viscosity, and as compared with the state where the silanol group remains, it is reacted with alcohol as described above. It has been found that those having the surface SiOR structure are preferable from the viewpoints of moisture resistance and moldability (particularly burr characteristics) of the sealing resin. The present invention has been completed based on such knowledge.
なお、窒化硅素を樹脂に配合するに際し、周知のシラン
カップリング剤で処理することやオルガノポリシロキサ
ンで処理すること等は、これまでにも知られている手段
である(特開昭62−84162号公報、特開昭64−38424号公
報、特開昭61−272268号公報)が、いずれも封止用樹脂
への配合においては、高熱伝導性とともに低粘度化、高
流動性等の特性を向上させるには満足できるものが得ら
れていないのが実情である。Incidentally, when the silicon nitride is compounded with the resin, treatment with a well-known silane coupling agent, treatment with an organopolysiloxane, etc. is a means known so far (Japanese Patent Laid-Open No. 62-84162). JP-A-64-38424, JP-A-61-272268), all of the characteristics such as high thermal conductivity, low viscosity, and high fluidity in the addition to the encapsulating resin. The reality is that we have not been able to obtain satisfactory results for improvement.
このことは、これらの従来の改質手段は、周知のシラン
カップリング剤等を使用しているとは言え、これらの処
理剤は、アミノ基等の特殊な置換基や、不飽和炭素基等
の置換基を有しているため、窒化硅素の表面改質として
は均質性や特性付与に偏りや、好ましくない表面活性等
を与えてしまうことに原因があるものと考えられる。This means that these conventional modifying means use well-known silane coupling agents and the like, but these treating agents have special substituents such as amino groups and unsaturated carbon groups. It is considered that the reason for the surface modification of silicon nitride is that it has unevenness in imparting homogeneity and characteristics, or imparts unfavorable surface activity, etc.
これに対して、この発明においては、SiOR構造として
は、Rが置換基を有しない低級アルキル基、たとえばメ
チル、エチル、プロピル、ブチル、ヘキシル等の低級ア
ルキル基、あるいはシクロヘキシル基等の脂環式アルキ
ル基からなるものに限定し、かつ、この構造は、対応す
るアルコールと窒化硅素との流動層における反応処理に
よって形成しているため、従来に比べて格段に優れた特
性付与が可能となっている。On the other hand, in the present invention, the SiOR structure has a lower alkyl group in which R has no substituent, for example, a lower alkyl group such as methyl, ethyl, propyl, butyl, or hexyl, or an alicyclic group such as a cyclohexyl group. The structure is limited to those consisting of an alkyl group, and since this structure is formed by the reaction treatment of the corresponding alcohol and silicon nitride in the fluidized bed, it is possible to impart significantly superior properties to the conventional ones. There is.
なお、窒化硅素の粒径は、通常1〜50μm程度のものを
用いることとする。The particle size of silicon nitride is usually about 1 to 50 μm.
この発明のSiOR構造を生成させるためのアルコールにつ
いては特にその種類に限定はなく、上記の通りの、R基
の規定に対応して低沸点で反応性の大きなアルキルアル
コールまたは脂環式アルキルアルコールとすることが好
ましい。特にメタノール、エタノール、プロパノールな
どの低級アルコールが好適なものとして例示される。The alcohol for forming the SiOR structure of the present invention is not particularly limited in its kind, and as described above, it may be an alkyl alcohol or an alicyclic alkyl alcohol having a low boiling point and high reactivity corresponding to the definition of the R group. Preferably. Particularly, lower alcohols such as methanol, ethanol and propanol are exemplified as preferable ones.
SiOR構造の形成は、後述の実施例にも例示したように、
窒化硅素粉とアルコールとの流動層における反応処理と
して実現される。流動層は、周知の反応手段としての窒
素、アルゴン等の不活性ガス、あるいは空気の導入、さ
らには、不活性溶媒の導入によって形成される。アルコ
ールは、液状で、あるいはガス状で供給することができ
る。条件的には窒化硅素粉が流動状態となり、表面Si−
OHがSiORに変換されればよい。The formation of the SiOR structure, as illustrated in the examples below,
It is realized as a reaction treatment of silicon nitride powder and alcohol in a fluidized bed. The fluidized bed is formed by introducing an inert gas such as nitrogen or argon, or air, which is a well-known reaction means, and further introducing an inert solvent. The alcohol can be supplied in liquid form or in gaseous form. Conditionally, the silicon nitride powder is in a fluidized state and the surface Si-
It is sufficient if OH is converted to SiOR.
この処理によって、窒化硅素粉の表面には、均質に上記
のSiOR構造が形成されることになる。By this treatment, the above-mentioned SiOR structure is uniformly formed on the surface of the silicon nitride powder.
そして、この発明の樹脂成形材料においては、あらかじ
めアルコールによって表面処理した窒化硅素を配合すれ
ばよく、樹脂全体量に対して60〜90重量%の割合でこれ
を配合することが好ましい。なお、この場合、その一部
の割合を他の無機質充填材との併用としてもよい。必要
に応じて、ガラス繊維、炭酸カルシウム、クレー、タル
ク、水酸化アルミニウム等を併用することができる。い
ずれの場合も、上記の窒化硅素を主体として配合する
が、この配合が60重量%未満では熱伝導性の向上が充分
でなく、また配合量が90重量%を越えると耐湿性や成形
性が低下する傾向にある。Then, in the resin molding material of the present invention, silicon nitride which has been surface-treated with alcohol beforehand may be blended, and it is preferably blended in a proportion of 60 to 90% by weight with respect to the total amount of the resin. In this case, a part of the ratio may be used in combination with another inorganic filler. If necessary, glass fiber, calcium carbonate, clay, talc, aluminum hydroxide or the like can be used in combination. In any case, the above-mentioned silicon nitride is mainly compounded, but if this compounding amount is less than 60% by weight, the thermal conductivity is not sufficiently improved, and if the compounding amount exceeds 90% by weight, moisture resistance and moldability are deteriorated. It tends to decrease.
また、この発明ではフェノールノボラック樹脂を配合す
ることが好ましいが、これに加えて、必要に応じ、フェ
ノール樹脂、メラミン樹脂、イソシアネート等の架橋剤
や、アミン、アミド等の硬化剤、アミン系もしくはリン
系の硬化促進剤を添加してもよい。Further, in the present invention, it is preferable to blend a phenol novolac resin, but in addition to this, a crosslinking agent such as a phenol resin, a melamine resin, or an isocyanate, a curing agent such as an amine or an amide, an amine-based or phosphorus-based resin, if necessary. A system curing accelerator may be added.
さらにまた、シランカップリング剤がこの発明において
好ましく配合されるが、エポキシシランがその好適なも
のとして例示される。Furthermore, a silane coupling agent is preferably blended in the present invention, and epoxy silane is exemplified as a suitable one.
以上の通りのこの発明のエポキシ樹脂成形材料は、各配
合成分を混合、混練、粉砕、あるいは造粒して実際の使
用に供することができる。成形材料は、トランファー成
形、射出成形等によるトランジスタ、ダイオード、コン
デンサー、フィルター、整流器、抵抗体、コイル等の電
気・電子部品の多数個取り成形に適することはもちろん
のこと、圧縮成形等にも適用できるものである。The epoxy resin molding material of the present invention as described above can be used for actual use by mixing, kneading, pulverizing, or granulating the respective compounding components. The molding material is not only suitable for multi-cavity molding of electric and electronic parts such as transistors, diodes, capacitors, filters, rectifiers, resistors and coils by transfer molding and injection molding, but also for compression molding. It is applicable.
以下、実施例を示し、この発明のエポキシ樹脂成形材料
についてさらに詳しく説明する。Hereinafter, the epoxy resin molding material of the present invention will be described in more detail with reference to examples.
実施例1〜5 表1に示した配合によって各成分を混合および混練して
エポキシ樹脂成形材料を製造した。なお、エポキシ樹脂
としては、エポキシ当量220、sp80℃のO−クレゾール
ノボラック樹脂を、またフェノールノボラック樹脂とし
ては、水酸基当量104、sp87℃のものを使用した。Examples 1 to 5 Epoxy resin molding materials were manufactured by mixing and kneading the respective components according to the formulations shown in Table 1. The epoxy resin used was an O-cresol novolac resin having an epoxy equivalent of 220 and sp80 ° C., and the phenol novolac resin having a hydroxyl equivalent of 104 and sp87 ° C. was used.
SiOR構造を有する窒化硅素(平均粒径10〜25μm)につ
いては、窒化硅素に対して5重量%のアルコールを用
い、流動層(50℃×60分〜100℃×30分)において反応
させ、乾燥処理したものを使用した。For silicon nitride having a SiOR structure (average particle size 10 to 25 μm), 5% by weight of alcohol relative to silicon nitride is used, and the reaction is carried out in a fluidized bed (50 ° C. × 60 minutes to 100 ° C. × 30 minutes), followed by drying. The processed one was used.
この樹脂成形材料の特性について評価を行い、その結果
を表1に示した。The characteristics of this resin molding material were evaluated, and the results are shown in Table 1.
この評価は次の基準方式により行った。This evaluation was performed according to the following standard method.
(1)溶融粘度 150℃で、フローテスター(ノズル径1×2mm、荷重30kg
/cm2)により測定。(1) Melt viscosity 150 ℃, flow tester (nozzle diameter 1 × 2mm, load 30kg)
/ cm 2 ).
(2)スパイラルフロー 170℃で、EMMIに準じて評価。(2) Spiral flow 170 ° C, evaluated according to EMMI.
(3)ワイヤー変形 16DIP標準アルミニウムTEG.モールド後軟X線にてAuワ
イヤ(25μm)の変形度を写真判定。(3) Wire deformation 16DIP standard aluminum TEG. After molding, the degree of deformation of Au wire (25 μm) is photographed by soft X-ray.
(4)成形性 16DIPモールド後の外観評価(ボイド、かすれ、バリの
出方) (5)熱伝導率 100φ、25mm厚の成形品をQTM迅速熱伝導計(昭和電工
製)にて評価。(4) Moldability Evaluation of appearance after 16DIP molding (voids, faintness, burrs) (5) Thermal conductivity 100φ, 25mm thick molded product was evaluated by QTM rapid thermal conductivity meter (Showa Denko).
この表1の結果より明らかなように、後述の比較例に比
べて、熱伝導性とともに成形性に優れた樹脂成形材料が
得られることが確認された。As is clear from the results in Table 1, it was confirmed that a resin molding material having excellent heat conductivity and moldability was obtained as compared with Comparative Examples described later.
比較例1〜2 SiOR構造を持つ窒化硅素を配合することなく、実施例1
〜5と同様にして成形材料を製造し、その特性を評価し
た。表1にその結果を示したが、実施例に比べて熱伝導
性、成形性ともに劣っていた。Comparative Examples 1 to 2 Example 1 without compounding silicon nitride having a SiOR structure
Molding materials were manufactured in the same manner as described above to evaluate the characteristics. The results are shown in Table 1, but the thermal conductivity and moldability were inferior to those of the examples.
実施例6 実施例5において、窒化硅素として表面SiORの構造がシ
クロヘキサノールからのSiOC6H11のものを用い、同様に
その特性を評価した。溶融粘度2600(poise)、スパイ
ラルフロー50(cm)、熱伝導率(×10-4)84で、ワイヤ
変形性、成形性ともに良好であった。 Example 6 In Example 5, a silicon nitride having a surface SiOR structure of SiOC 6 H 11 from cyclohexanol was used, and its characteristics were evaluated in the same manner. The melt viscosity was 2600 (poise), the spiral flow was 50 (cm), and the thermal conductivity (× 10 -4 ) was 84. Both wire deformability and formability were good.
比較例3 実施例1において、同一の窒化硅素に対して、アルコー
ルに代えて市販の以下のものを使用し、攪拌反応処理し
たものを使用した。Comparative Example 3 In Example 1, the same silicon nitride was replaced with alcohol, and the following commercially available products were used and subjected to a stirring reaction treatment.
1)N−フェニル−γ−アミノプロピルトリメトキシシ
ラン 2)オルガノポリシロキサン 3)−アミノプロピルトリエトキシシラン いずれのものも、溶融粘度は2800(poise)以上と高
く、スパイラルフローも40(cm)以下と低レベルに止ま
った。このため、ワイヤ変形試験では部分的に断線が生
じ、微小ボイドの発生が認められた。1) N-phenyl-γ-aminopropyltrimethoxysilane 2) Organopolysiloxane 3) -Aminopropyltriethoxysilane All of them have a high melt viscosity of 2800 (poise) or more and a spiral flow of 40 (cm) or less. And stopped at a low level. Therefore, in the wire deformation test, the wire was partially broken, and the occurrence of minute voids was confirmed.
比較例4 実施例1において、流動層で反応処理せずに、攪拌処理
した窒化硅素を用いた。Comparative Example 4 In Example 1, the silicon nitride which was agitated and not subjected to the reaction treatment in the fluidized bed was used.
溶融粘度特性は2500〜2600(poise)に止まり、スパイ
ラルフローも42〜43(cm)と良好ではなかった。微小ボ
イドも認められた。Melt viscosity characteristics remained at 2500 to 2600 (poise) and spiral flow was not good at 42 to 43 (cm). Microvoids were also observed.
(発明の効果) この発明により、以上詳しく説明した通り、熱伝導性と
ともに成形性の良好なエポキシ樹脂成形材料が実現され
る。(Effect of the Invention) According to the present invention, as described in detail above, an epoxy resin molding material having good thermal conductivity and moldability is realized.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 23/29 23/31 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI technical display location H01L 23/29 23/31
Claims (4)
キルアルコールまたは脂環式アルコールと反応処理して
表面SiOR(Rは置換基を有しない低級アルキル基または
脂環式アルキル基を示す)構造を形成させた窒化硅素を
配合してなることを特徴とする樹脂封止用エポキシ樹脂
成形材料。1. An epoxy resin is subjected to a reaction treatment with a lower alkyl alcohol or an alicyclic alcohol in a fluidized bed to form a surface SiOR (R represents a lower alkyl group having no substituent or an alicyclic alkyl group) structure. An epoxy resin molding material for resin encapsulation, which is characterized by containing the above silicon nitride.
脂および一部または全部が請求項(1)記載の窒化硅素
からなる無機質充填材を配合してなるエポキシ樹脂成形
材料。2. An epoxy resin molding material obtained by blending an epoxy resin with a phenol novolac resin and an inorganic filler partially or wholly made of silicon nitride according to claim 1.
してなる請求項(2)記載のエポキシ樹脂成形材料。3. The epoxy resin molding material according to claim 2, which comprises 60 to 90% by weight of the total amount of the inorganic filler.
項(1)または(2)記載のエポキシ樹脂成形材料。4. The epoxy resin molding material according to claim 1, which comprises a silane coupling agent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1103152A JPH0798895B2 (en) | 1989-04-22 | 1989-04-22 | Epoxy resin molding material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1103152A JPH0798895B2 (en) | 1989-04-22 | 1989-04-22 | Epoxy resin molding material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02281067A JPH02281067A (en) | 1990-11-16 |
| JPH0798895B2 true JPH0798895B2 (en) | 1995-10-25 |
Family
ID=14346532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1103152A Expired - Fee Related JPH0798895B2 (en) | 1989-04-22 | 1989-04-22 | Epoxy resin molding material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0798895B2 (en) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61272268A (en) * | 1985-05-28 | 1986-12-02 | Denki Kagaku Kogyo Kk | Thermosetting resin composition |
| JPS6284162A (en) * | 1985-10-08 | 1987-04-17 | Ube Ind Ltd | Manufacturing method of modified silicon nitride powder |
| JP2590908B2 (en) * | 1987-08-03 | 1997-03-19 | 松下電工株式会社 | Epoxy resin molding material |
| JPH0750760B2 (en) * | 1988-12-21 | 1995-05-31 | 松下電工株式会社 | Resin molding material for semiconductor encapsulation |
-
1989
- 1989-04-22 JP JP1103152A patent/JPH0798895B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02281067A (en) | 1990-11-16 |
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