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JPH0814563B2 - Enzyme electrode manufacturing method and enzyme electrode manufacturing apparatus - Google Patents
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JPH0814563B2 - Enzyme electrode manufacturing method and enzyme electrode manufacturing apparatus - Google Patents

Enzyme electrode manufacturing method and enzyme electrode manufacturing apparatus

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Publication number
JPH0814563B2
JPH0814563B2 JP1118600A JP11860089A JPH0814563B2 JP H0814563 B2 JPH0814563 B2 JP H0814563B2 JP 1118600 A JP1118600 A JP 1118600A JP 11860089 A JP11860089 A JP 11860089A JP H0814563 B2 JPH0814563 B2 JP H0814563B2
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JP
Japan
Prior art keywords
enzyme
electrode
heat
heating
heat source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1118600A
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Japanese (ja)
Other versions
JPH02298856A (en
Inventor
由照 野添
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
A&D Holon Holdings Co Ltd
Original Assignee
A&D Co Ltd
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Filing date
Publication date
Application filed by A&D Co Ltd filed Critical A&D Co Ltd
Priority to JP1118600A priority Critical patent/JPH0814563B2/en
Publication of JPH02298856A publication Critical patent/JPH02298856A/en
Publication of JPH0814563B2 publication Critical patent/JPH0814563B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Immobilizing And Processing Of Enzymes And Microorganisms (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は酵素センサ等として使用される酵素電極の製
造方法及び同酵素電極の製造装置に係り、特に酵素の部
分的失活を熱により行う方法を利用した酵素電極の製造
方法及び同酵素電極の製造装置に関する。
Description: TECHNICAL FIELD The present invention relates to a method for producing an enzyme electrode used as an enzyme sensor and the like and an apparatus for producing the enzyme electrode, and in particular, partially deactivating an enzyme by heat. The present invention relates to a method for manufacturing an enzyme electrode and a manufacturing apparatus for the same using the method.

〔従来の技術〕[Conventional technology]

差動型酵素電極では一方の作用極については基質に対
する応答性を無くし、かつ検体中の基質以外の活性物質
の応答を検出するようにし、他の作用極との電流の差を
求めることにより特定の基質濃度を算出するようになっ
ている。このため、二つの作用極のうち一方の作用極に
対してのみ酵素活性を与える必要がある。この必要を満
たす方法としては、(イ)一方の作用極上に対してのみ
酵素を固定化する方法、(ロ)二つの作用極に対して予
め酵素を固定化し、後で一方の酵素固定化部の酵素を不
活性化、即ち失活させる方法がある。
In the differential enzyme electrode, one working electrode has no responsiveness to the substrate, the response of the active substance other than the substrate in the sample is detected, and it is specified by determining the current difference from the other working electrode. The substrate concentration of is calculated. Therefore, it is necessary to give the enzyme activity to only one of the two working electrodes. As a method for satisfying this need, (a) a method of immobilizing an enzyme only on one working electrode, (b) immobilizing an enzyme on two working electrodes in advance and then one of the enzyme immobilization parts There is a method of inactivating, that is, inactivating the enzyme.

ここで、差動型酵素電極では両作用極表面上での反応
物質の拡散を均一にしなければ、反応物質による両作用
極間の電流の差が不正確となり、従って正確な測定がで
きないことになる。
Here, in the differential enzyme electrode, unless the diffusion of the reactant on the surfaces of both working electrodes is made uniform, the difference in the current between the two working electrodes due to the reactant becomes inaccurate, and therefore accurate measurement cannot be performed. Become.

以上二つの方法のうち、(イ)の方法は、非酵素固定
電極側に対しては酵素が存在しない状態で、酵素固定電
極側と同質の酵素固定化物質を形成せねばならず、製造
が困難でかつ製品の均質性を出すのが難しく、特定の用
途以外の電極にはあまり使用されいない。これに対して
(ロ)の方法は部分的な失活方法により比較的容易に均
質性が得られ、工程上有利である。
Of the above two methods, the method (a) requires the formation of an enzyme immobilizing substance of the same quality as the enzyme-immobilized electrode side in the absence of enzyme on the non-enzyme-immobilized electrode side, Difficult and difficult to achieve product homogeneity, it is rarely used for electrodes other than specific applications. On the other hand, the method (b) is advantageous in terms of process because homogeneity can be obtained relatively easily by the partial deactivation method.

〔発明が解決しようとする課題〕[Problems to be Solved by the Invention]

以上の方法のうち、(ロ)の方法の有利性に鑑み、こ
の(ロ)の方法は従来から何種か提案されているが、特
に特公昭62−14276号公報記載の発明は製造された電極
の性能等の点からは優れたものということができる。こ
の発明方法は、酵素を有する酵素固定化膜を両電極上に
予め形成し、かつ失活する部分以外を覆うようにフォト
マスクを配置し、この状態で紫外線、X線等の電磁波を
照射し、これら電磁波照射部分を失活させる方法であ
る。この方法は前述の如く製造された電極の性能は良好
であるが、マスキングのための装置、電磁波照射装置等
大掛かりな装置が必要となる。また失活には比較的長時
間を要し、かつ酵素固定化部が厚ければ更に照射時間を
長くする必要がある等、生産性の点にも問題がある。
Among the above methods, in view of the advantage of the method (b), several methods have been proposed in the past, but the invention described in Japanese Patent Publication No. 62-14276 is particularly manufactured. It can be said that it is excellent in terms of electrode performance and the like. According to the method of the present invention, an enzyme-immobilized membrane having an enzyme is preliminarily formed on both electrodes, and a photomask is arranged so as to cover portions other than the inactivated portion, and in this state, electromagnetic waves such as ultraviolet rays and X-rays are irradiated. , A method of deactivating these electromagnetic wave irradiation portions. In this method, although the performance of the electrode manufactured as described above is good, a large-scale device such as a masking device and an electromagnetic wave irradiation device is required. Further, there is a problem in terms of productivity such that deactivation requires a relatively long time, and if the enzyme-immobilized portion is thick, it is necessary to further extend irradiation time.

〔課題を解決するための手段〕[Means for solving the problem]

本発明は以上の点に鑑み構成したものであり、電極の
所定部分の酵素固定化部を失活する方法として、この失
活対象部分に対して直接または間接に熱源を配置し、こ
の熱源の熱により酵素の部分的な失活を行う方法と、こ
の方法に基づく酵素電極の製造方法と、更にこの方法を
酵素電極の製造装置に応用するため、多数連設した酵素
電極の各々の失活部分に対して正確に熱源を位置させる
酵素電極の製造装置とであることを特徴とする。
The present invention is configured in view of the above points, as a method of deactivating the enzyme immobilization portion of a predetermined portion of the electrode, a heat source is directly or indirectly arranged with respect to the deactivation target portion, A method for partially deactivating an enzyme by heat, a method for producing an enzyme electrode based on this method, and further applying this method to an apparatus for producing an enzyme electrode, deactivates each of a plurality of enzyme electrodes connected in series. It is an enzyme electrode manufacturing apparatus in which a heat source is accurately positioned with respect to a portion.

〔作用〕[Action]

一対の作用極全体に形成してある酵素固定化膜のう
ち、酵素失活させる部分に対して数秒間熱源を配置する
と、この熱源配置部の酵素は失活し、差動型酵素電極を
得ることができる。
When a heat source is placed for a few seconds on the part of the enzyme-immobilized membrane formed over the pair of working electrodes that is to be deactivated, the enzyme in the heat source placement part is deactivated and a differential enzyme electrode is obtained. be able to.

〔発明構成の具体的説明〕[Specific Description of Invention Structure]

先ず本発明を構成する、熱による失活方法には次の方
法が含まれる。
First, the following method is included in the deactivation method by heat that constitutes the present invention.

(i)二つの作用極間の距離に比較して酵素固定化部の
厚みが少ない場合には、酵素固定化部の上部(表面)に
対して直接熱源を接触配置し、この熱源により酵素が失
活しかつ担体が変性しない温度に加熱する方法。
(I) When the thickness of the enzyme-immobilized part is smaller than the distance between the two working electrodes, a heat source is placed in direct contact with the upper part (surface) of the enzyme-immobilized part, and this heat source causes the enzyme to A method of heating to a temperature at which the carrier is deactivated and the carrier is not denatured.

(ii)二つの作用極間の距離に比較して基板の板厚が薄
い場合には基板の裏側に熱源を接触させ、基板及び導電
性パターン(失活させるべき部分に位置する電極)を介
して酵素固定化部を間接的に失活させる方法。
(Ii) When the thickness of the substrate is smaller than the distance between the two working electrodes, a heat source is brought into contact with the back side of the substrate and the substrate and the conductive pattern (the electrode located at the portion to be deactivated) are used. The method of indirectly deactivating the enzyme immobilization part.

(iii)作用極が導電体であり、かつこの作用極が基板
に比較して熱伝導性が良好であることを利用して、作用
極に接続する導電性パターンの一部に熱源を接触させ、
この導電性パターン及び作用極を介して酵素固定化部を
酵素失活温度に加熱する方法。
(Iii) Taking advantage of the fact that the working electrode is a conductor and this working electrode has better thermal conductivity than the substrate, contact the heat source with a part of the conductive pattern connected to the working electrode. ,
A method of heating the enzyme-immobilized portion to the enzyme inactivation temperature via the conductive pattern and the working electrode.

(iv)導電性パターンのうち、失活させるべき部分に対
して電流を流し、この部分を発熱させて失活させる方
法。
(Iv) A method in which a current is applied to a portion of the conductive pattern to be deactivated, and this portion is heated to deactivate it.

(v)以上(i)〜(iv)に示した方法を適宜組み合わ
せ、併用する方法。
(V) A method of appropriately combining and using the methods shown in (i) to (iv) above.

先ず(i)および(ii)の方法の場合には、熱伝導性
の良好な物質により失活部形状に合わせた加熱部材を形
成し、この加熱部材をヒータ等で予め所定の温度に加熱
し、所定温度となった加熱部材を前記失活部に配置する
ことにより失活させるか、またはヒータそのものを失活
部形状に合わせて形成し、このヒータにより失活させる
方法がある。
First, in the case of the methods (i) and (ii), a heating member matched with the shape of the deactivating portion is formed of a substance having good thermal conductivity, and this heating member is heated to a predetermined temperature in advance with a heater or the like. There is a method of deactivating by arranging a heating member having a predetermined temperature in the deactivating portion, or forming a heater itself according to the shape of the deactivating portion and deactivating with the heater.

(iii)の方法では、熱源の形状には特別限定はない
が、熱源の大きさは作用極に接続するパターン内に位置
する大きさとし、このパターンから熱源がはみ出すこと
により失活部以外に熱の影響が及ばないようにすること
が望ましい。
In the method (iii), the shape of the heat source is not particularly limited, but the size of the heat source is set to a size that is located in the pattern connected to the working electrode, and the heat source protrudes from this pattern to generate heat in areas other than the inactivated portion. It is desirable to prevent the influence of.

また酵素固定化部と熱源との接触部では、熱源の接触
による剥離等の酵素固定化部の機械的な破壊を避けるた
め、シリコンゴム等の防護皮膜を配置し、この防護皮膜
を介して間接的に加熱するようにしてもよい。
At the contact area between the enzyme immobilization part and the heat source, in order to avoid mechanical destruction of the enzyme immobilization part such as peeling due to contact with the heat source, a protective film such as silicone rubber is placed, and indirect contact is made via this protective film. You may make it heat.

第1図は通常は使い捨て型電極として利用する酵素電
極の平面形状を示す。
FIG. 1 shows a plan view of an enzyme electrode which is usually used as a disposable electrode.

この酵素電極は、測定装置本体と接続する本体側接続
部A、中央部に位置し、かつ絶縁皮膜の下に導電性パタ
ーンが形成してある絶縁部B、検体の塗布、検体中への
侵漬等をを行う検出部Cから成っている。このうち検出
部Cにおける符号1および2は作用極、3は参照極、4
は対極であり、何れもガラスエポキシ樹脂から成る基板
5上に銅でパターン形成され、その端部は絶縁部Bを介
して本体側接続部Aと電気的に接続している。なお、作
用極1、作用極2及び参照極3はPtメッキが施してあ
る。
This enzyme electrode is a main body side connecting portion A connected to the measuring apparatus main body, an insulating portion B located in the central portion and having a conductive pattern formed under the insulating film, application of a sample, penetration into a sample. It is composed of a detection unit C that performs pickling and the like. Of these, reference numerals 1 and 2 in the detection unit C are working electrodes, 3 are reference electrodes, 4
Is a counter electrode, each of which is patterned with copper on the substrate 5 made of glass epoxy resin, and its end is electrically connected to the main body side connecting portion A through the insulating portion B. The working electrode 1, the working electrode 2 and the reference electrode 3 are plated with Pt.

6はこれら作用極1、作用極2および参照極3を覆う
ように形成した固定化酵素皮膜(以下単に「酵素皮膜」
と称する)である。この酵素皮膜のうち、作用極1を覆
う部分は後述する方法により失活が行われた後も酵素活
性が保持されている。符号6aはこの酵素活性が保持され
ている酵素固定化部を示す。このうようにして、作用極
1はでは酵素活性が保持され、かつ作用極2では失活し
てあるので、両作用極間の差動出力を得ることにより検
体中の特定物質濃度を求めることが可能となる。
Reference numeral 6 denotes an immobilized enzyme film (hereinafter simply referred to as “enzyme film”) formed so as to cover these working electrode 1, working electrode 2 and reference electrode 3.
It is called). The portion of the enzyme film that covers the working electrode 1 retains the enzyme activity after being deactivated by the method described below. Reference numeral 6a indicates an enzyme-immobilized portion in which this enzyme activity is retained. In this way, the working electrode 1 retains the enzyme activity and the working electrode 2 is deactivated, so that the concentration of the specific substance in the sample can be obtained by obtaining the differential output between both working electrodes. Is possible.

第2図は酵素皮膜の部分的失活方法の一例を示す。 FIG. 2 shows an example of a method for partially deactivating the enzyme film.

感光性PVA(ポリビニルアルコール)に対してGOD(グ
ルコースオキシターゼ)を塗布することにより形成した
酵素皮膜6のうち、失活対象部に対応する位置における
基板5の裏面部分に対して熱源7を接触させる。この熱
源7は温度調節を容易に行うため電気的抵抗による発熱
を利用する熱源であることが望ましい。
Of the enzyme film 6 formed by applying GOD (glucose oxidase) to photosensitive PVA (polyvinyl alcohol), the heat source 7 is brought into contact with the back surface portion of the substrate 5 at the position corresponding to the deactivation target portion. . The heat source 7 is preferably a heat source that utilizes heat generated by electric resistance in order to easily adjust the temperature.

熱源7からの熱は基板5と、その一部は導電性パター
ンである作用極2を介して酵素皮膜6側に伝達され、こ
の熱により作用極2の形成部を中心として失活部6bが形
成される。一方作用極1を含む部分は、熱源7からの熱
の影響を受けずに酵素活性を保持し、以て酵素固定化部
6aとなる。
The heat from the heat source 7 is transferred to the enzyme film 6 side through the substrate 5 and a part of the working electrode 2 which is a conductive pattern, and this heat causes the deactivating portion 6b to center around the working electrode 2 forming portion. It is formed. On the other hand, the part including the working electrode 1 retains the enzyme activity without being affected by the heat from the heat source 7, and thus the enzyme immobilization part
6a.

第3図は別の構成を示す。 FIG. 3 shows another configuration.

絶縁部Bの絶縁層の下には前記作用極1、2、参照極
3及び対極4と、本体側接続部Aを形成する端子部とを
電気的に接続る導電部がパターンニングしてある。この
うち失活を行うべき作用極2に接続する導電部パターン
2′の途中に加熱部8を、この導電部パターン2′と一
体的に形成する。この加熱部8に対して例えば前記熱源
と同様の熱源を直接または間接に配置する。これにより
熱源の熱はこの加熱部8および導電部パターン2′の一
部を伝わって作用極2に伝達され、作用極2の温度が上
昇する。この作用極2の昇温によって作用極2周辺の酵
素皮膜6中の酵素は失活し、作用極2を覆うように失活
部6bが形成されることになる。
Below the insulating layer of the insulating portion B, a conductive portion for electrically connecting the working electrode 1, 2, the reference electrode 3 and the counter electrode 4 and the terminal portion forming the main body side connecting portion A is patterned. . Of these, the heating portion 8 is formed integrally with the conductive portion pattern 2 ′ in the middle of the conductive portion pattern 2 ′ connected to the working electrode 2 to be deactivated. For example, a heat source similar to the heat source is directly or indirectly arranged with respect to the heating unit 8. As a result, the heat of the heat source is transmitted to the working electrode 2 through the heating portion 8 and part of the conductive portion pattern 2 ', and the temperature of the working electrode 2 rises. Due to this temperature rise of the working electrode 2, the enzyme in the enzyme film 6 around the working electrode 2 is deactivated, and the deactivating portion 6b is formed so as to cover the working electrode 2.

〔実施例1〕 電極構成は第1図に示すものとし、基板5は幅5mm、
全長40mmの大きさで、かつ厚さは0.5mmとし、、作用極
1、作用極2、参照極3はプリント回路技術により前記
基板に対して銅によりプリント形成し、かつ0.3μmの
厚みでPtメッキが施してあり、H2O2検出電極として使用
するためのものである。
Example 1 The electrode configuration is as shown in FIG. 1, the substrate 5 has a width of 5 mm,
The total length is 40 mm and the thickness is 0.5 mm. The working electrode 1, working electrode 2 and reference electrode 3 are printed on the substrate with copper by the printed circuit technology, and the thickness of Pt is 0.3 μm. It is plated and is for use as an H 2 O 2 detection electrode.

酵素皮膜はPVA−SbQ(特開昭56−5761号)2wt%にグ
ルコースオキシターゼ〔EC(1,1,3,4)、オリエンタル
酵母工業株式会社製、370nnits/mg〕を、2.0mg/gに調整
したものを検出部Cにコーティングした。更に乾燥後、
紫外線照射500w(340nm)、10minで銅コーティング部を
硬化させ酵素皮膜6を形成した。
Enzyme coating is PVA-SbQ (JP-A-56-5576) 2wt% glucose oxidase [EC (1,1,3,4), Oriental Yeast Co., Ltd., 370nnits / mg] to 2.0mg / g The adjusted part was coated on the detection part C. After further drying,
The copper coating portion was cured by UV irradiation for 500 w (340 nm) for 10 minutes to form the enzyme coating 6.

次に、第2図に示すように基板5を介して作用極2の
下面に熱源7を配置し、この熱源温度を200℃として5
秒間加熱することにより加熱部を失活し、H2O2検出電極
とした。
Next, as shown in FIG. 2, the heat source 7 is arranged on the lower surface of the working electrode 2 through the substrate 5, and the heat source temperature is set to 200 ° C.
The heating part was deactivated by heating for 2 seconds to obtain a H 2 O 2 detection electrode.

〔試験1〕 以上の電極の性能を試験するため、リン酸緩衝液0.1
M、pH7.2、グルコース10mM(180mg/dl)、容量10μを
検体として用いた。
[Test 1] In order to test the performance of the above electrodes, a phosphate buffer solution 0.1
M, pH 7.2, glucose 10 mM (180 mg / dl) and volume 10 μ were used as samples.

性能試験としてはサイクリックボルタモグラムを用い
た検出法を利用し、スイープ範囲を−600mV〜1000mV、
スイープ速度は100mV/秒とし、加熱処理前の電極と、加
熱処理後の電極とにおける600mVの電流値を求め、両電
極の性能を比較した。
As a performance test, a detection method using a cyclic voltammogram is used, and the sweep range is -600mV to 1000mV,
The sweep speed was 100 mV / sec, and the current value of 600 mV was calculated for the electrode before heat treatment and the electrode after heat treatment, and the performance of both electrodes was compared.

第4図および第5図はサイクリックボルタモグラムを
示し、このうち第4図に示すものは、加熱処理前の電極
におけるサイクリックボルタモグラムを示す。同図にお
いて明らかなように作用極1と作用極2における電流に
は当然のことながら有為の差はなく、測定対象電圧600m
Vにおいて、作用極2は作用極1と同じ13μAを示し
た。
4 and 5 show cyclic voltammograms, of which the one shown in FIG. 4 shows the cyclic voltammograms of the electrodes before the heat treatment. As is clear from the figure, there is of course no significant difference between the working electrode 1 and working electrode 2 currents, and the measured voltage 600m
At V, working electrode 2 showed the same 13 μA as working electrode 1.

これに対して前記実施例に示す方法で作用極2に於け
る酵素皮膜を失活させた電極では、第5図に示す如く測
定対象電圧600mVにおいて作用極2は約5.6μAとなり、
作用極2における酵素は完全に失活していることが確認
できた。また反対に同じ測定電圧における作用極1の電
流は熱処理を行っていない電極とほぼ同じ14μAを示
し、作用極2に対する熱処理の影響が作用極1に対して
は全く及んでいないことも同時に確認することができ
た。
On the other hand, in the electrode in which the enzyme film on the working electrode 2 is deactivated by the method described in the above-mentioned embodiment, the working electrode 2 becomes about 5.6 μA at the measurement target voltage of 600 mV as shown in FIG.
It was confirmed that the enzyme in working electrode 2 was completely inactivated. On the contrary, the current of the working electrode 1 at the same measurement voltage shows 14 μA, which is almost the same as that of the electrode not subjected to the heat treatment, and it is confirmed at the same time that the heat treatment on the working electrode 2 does not affect the working electrode 1 at all. I was able to.

次に以上に示す方法を用いて電極を製造する方法およ
び装置について説明する。
Next, a method and an apparatus for manufacturing an electrode using the method shown above will be described.

先ず、上述した電極を使い捨て型のセンサとして利用
する場合には、センサの性能もさることながら、製造コ
ストを低減して安価に提供することも大きな技術的課題
となる。
First, when the above-mentioned electrode is used as a disposable sensor, it is a major technical issue to reduce the manufacturing cost and provide it at a low cost in addition to the performance of the sensor.

以下に説明するセンサの製造方法および装置も、この
点を考慮して構成してあり、大量生産と、高い製品精度
の両者を兼ね備えることを前提としている。
The sensor manufacturing method and apparatus described below are also configured in consideration of this point, and are premised on having both mass production and high product accuracy.

先ず第6図には基板集合体を示す。この基板集合体は
使い捨てセンサSとなるべき部分が25個形成してあり、
このセンサとなるべき部分の全体は幅40mm、長さ150mm
の大きさとなっている。各センサSの検出部Cに対して
は作用極1、2、参照極3及び対極4が形成され、かつ
これらの部分に対しては酵素皮膜6が予めコーティング
してある。9a、9bはこの基板集合体9の四隅に各々形成
した位置決め用の穴である。
First, FIG. 6 shows a substrate assembly. This substrate assembly is formed with 25 parts to be disposable sensors S,
The entire part that should be this sensor is 40 mm wide and 150 mm long
The size has become. A working electrode 1, 2, a reference electrode 3, and a counter electrode 4 are formed on the detection portion C of each sensor S, and an enzyme film 6 is pre-coated on these portions. 9a and 9b are positioning holes formed in the four corners of the substrate assembly 9, respectively.

第7図は加熱ユニットであり前記基板集合体9を装着
し、かつ基板集合体9の所定の部分、つまり各センサS
の酵素失活部を加熱する熱源がセンサSの数に対応した
数配置してある。10はこの加熱ユニット本体を示し、こ
の加熱ユニット本体10の四隅には前記基板集合体9の位
置決め穴9a、9bに対応した位置に位置決めピン10a、10b
が立設配置してある。第8図及び第9図の矢印11はこの
加熱ユニットに対して、基板集合体に形成したセンサの
数に対応した数配置した加熱部材からなる加熱部であ
る。
FIG. 7 shows a heating unit on which the substrate assembly 9 is mounted and a predetermined portion of the substrate assembly 9, that is, each sensor S.
The heat sources for heating the enzyme deactivating part are arranged in the number corresponding to the number of the sensors S. Reference numeral 10 denotes the heating unit main body, and positioning pins 10a, 10b are provided at four corners of the heating unit main body 10 at positions corresponding to the positioning holes 9a, 9b of the substrate assembly 9.
Is erected. An arrow 11 in FIGS. 8 and 9 is a heating unit including heating members arranged in a number corresponding to the number of sensors formed in the substrate assembly with respect to the heating unit.

第9図を用いてこの加熱部の構成を示すと、12はこの
加熱部の中心をなす加熱部材であり、加熱ユニット10を
挿通して配置してあり、その上端部12aは各センサの酵
素失活対象部に対応した大きさ及び形状となっている
〔同図(B)参照〕。加熱部材12のうち加熱ニット挿通
部にはコイルバネ13が配置してあり、その弾発力により
加熱部材12の上端部12aは、加熱ユニット10の溝部10cか
ら突出位置している。なおこの上端部12aは加熱ユニッ
ト10の平坦部10dの面よりもやや突出位置するように構
成してある。なお、この加熱部材11の上端面形状は第9
図(B)に示すように、基板側の酵素皮膜の失活部形状
に対応した形状となっており、例えば2mm×1mmの長方形
に形成してある。
The configuration of this heating unit is shown in FIG. 9. Reference numeral 12 is a heating member that forms the center of this heating unit, and the heating unit 10 is inserted therethrough, and the upper end 12a thereof is the enzyme of each sensor. It has a size and shape corresponding to the deactivation target portion [see FIG. A coil spring 13 is arranged in the heating knit insertion portion of the heating member 12, and the upper end portion 12a of the heating member 12 is positioned so as to project from the groove portion 10c of the heating unit 10 due to its elastic force. The upper end portion 12a is configured to be slightly projecting from the surface of the flat portion 10d of the heating unit 10. The shape of the upper end surface of the heating member 11 is the ninth
As shown in FIG. 3B, the shape corresponds to the shape of the deactivated portion of the enzyme film on the substrate side, and is formed in a rectangular shape of 2 mm × 1 mm, for example.

一方加熱ユニット10の裏面側に突出した部分(以下
「受熱部」と称する)12bはリング状の熱源(図示の構
成は電気ヒータ)14に挿通位置しており、熱源14の熱を
受けるようになっている。
On the other hand, a portion (hereinafter referred to as "heat receiving portion") 12b projecting to the back surface side of the heating unit 10 is positioned so as to be inserted into a ring-shaped heat source (an electric heater shown in the drawing) 14 and receives heat from the heat source 14. Has become.

次にこの装置を用いた酵素皮膜の部分的失活の作業工
程を示す。
Next, a working process for partially deactivating the enzyme film using this apparatus will be shown.

先ず基板集合体9の位置決め穴9a、9bを加熱ユニット
10の所定の位置決めピン10a、10bに挿通することにより
基板集合体9を加熱ユニット10上に配置する。次に加熱
ユニット10の位置決めピン10a、10bに対応する位置にピ
ン挿通用の穴15a、15bを有する押さえ部材15を、その穴
15a、15bに対して前記ピン10a、10bが挿通するように配
置する。これにより基板集合体9は押さえ部材15により
加熱ユニット10側に圧接される。この状態で、加熱ユニ
ット10の平坦面10dからやや突出している各加熱部材12
の上端面12aは、コイルバネ13の弾発力によって各基板
裏面において、失活部に相当する部分に密着する。続い
て各熱源14が加熱され、熱源の熱は受熱部12bを経て上
端部12aに至る。更にこの熱は基板を通して酵素皮膜の
失活部に至り、この部分の酵素を失活させる。この場
合、加熱ユニット10側の溝部10cと、押さえ部材15側の
溝部15cとにより、加熱部材11の位置する部分には放熱
用の空間が形成されること、および失活に要する加熱時
間は数秒と、非常に短いため加熱部材の熱が失活部以外
に影響を及ぼすことはない。なお、加熱開始時期の設定
方法としては上述の方法の外に、押さえ部材15の取り付
けにより各熱源14に対して自動的に電力が供給されるよ
うにしてもよい。酵素皮膜の失活が終了したならば、基
板集合体9を加熱ユニット10から取り外し、かつ各セン
サ部分Sを切り離して製品とする。
First, the positioning holes 9a and 9b of the substrate assembly 9 are set in the heating unit.
The substrate assembly 9 is placed on the heating unit 10 by inserting it into the predetermined 10 positioning pins 10a and 10b. Next, the pressing member 15 having the holes 15a and 15b for pin insertion at the positions corresponding to the positioning pins 10a and 10b of the heating unit 10 is formed.
The pins 10a and 10b are arranged so as to be inserted into the pins 15a and 15b. As a result, the substrate assembly 9 is pressed against the heating unit 10 by the pressing member 15. In this state, each heating member 12 slightly protruding from the flat surface 10d of the heating unit 10.
The upper end surface 12a of the above is closely attached to the portion corresponding to the deactivating portion on the back surface of each substrate by the elastic force of the coil spring 13. Subsequently, each heat source 14 is heated, and the heat of the heat source reaches the upper end portion 12a via the heat receiving portion 12b. Furthermore, this heat reaches the deactivated part of the enzyme film through the substrate, and deactivates the enzyme in this part. In this case, the groove 10c on the heating unit 10 side and the groove 15c on the pressing member 15 side form a space for heat dissipation in the portion where the heating member 11 is located, and the heating time required for deactivation is several seconds. Since it is very short, the heat of the heating member does not affect anything other than the deactivated part. As a method for setting the heating start timing, in addition to the above-described method, electric power may be automatically supplied to each heat source 14 by attaching the pressing member 15. When the deactivation of the enzyme film is completed, the substrate assembly 9 is removed from the heating unit 10 and each sensor portion S is separated to obtain a product.

以上の工程は失活対象を、基板を介して間接的に加熱
する方法に基づき構成してあるが、反対に失活部を加熱
部材に直接接触させて失活させるようにしてもよい。一
般に、失活部に対して直接熱源を接触させる方法は、熱
源の温度制御の点では厳しくなるが、反面基板を介して
散逸する熱の量は少なくなるため、失活部と非失活部と
の境界をより明瞭に形成することが可能となる。
Although the above steps are configured based on the method of indirectly heating the deactivation object via the substrate, the deactivation section may be directly brought into contact with the heating member to deactivate it. Generally, the method of directly contacting the heat source with the deactivating portion is strict in terms of temperature control of the heat source, but on the other hand, the amount of heat dissipated through the substrate is small, so that the deactivating portion and the non-deactivating portion are reduced. It becomes possible to form the boundary with and more clearly.

第10図は加熱ユニットの別の構成例を示す。 FIG. 10 shows another configuration example of the heating unit.

16は前述の構成とは別の構成の加熱部材を示す。この
加熱部材16の上端部16aの配置位置は、常時は加熱ユニ
ット10の平坦部10dよりも低い位置となるよう形成して
ある。16bは加熱部材16の一部を成す受熱部であり、前
記上端部16a側が加熱ユニット10の溝部10cに係止するこ
とにより、中軸部16cを介して常時は吊り下げられた状
態となっている。17はこの受熱部16bの下面に形成した
緩衝部であり、受熱部16bの軸心方向に摺動可能な筒状
部17aと、この筒状部17a内に収納されたコイルバネ18と
から成っている。次に矢印19は加熱部材16を昇降させる
昇降装置であり、図示の構成では、緩衝部17の底面に接
触するカム20と、このカム20を回転させるカム軸21と、
カム軸21を回転させるモータ22とからなっている。
Reference numeral 16 denotes a heating member having a configuration different from that described above. The upper end portion 16a of the heating member 16 is always arranged at a position lower than the flat portion 10d of the heating unit 10. Reference numeral 16b is a heat receiving portion forming a part of the heating member 16, and the upper end portion 16a side is locked in the groove portion 10c of the heating unit 10 so that it is always suspended via the center shaft portion 16c. . Reference numeral 17 denotes a buffer portion formed on the lower surface of the heat receiving portion 16b, which includes a tubular portion 17a slidable in the axial direction of the heat receiving portion 16b and a coil spring 18 housed in the tubular portion 17a. There is. Next, an arrow 19 is an elevating device that elevates and lowers the heating member 16, and in the illustrated configuration, a cam 20 that contacts the bottom surface of the buffer portion 17, and a cam shaft 21 that rotates the cam 20,
It is composed of a motor 22 for rotating the cam shaft 21.

次に23は加熱ユニット10における基板集合体9の有無
を検知する位置センサ、24は押さえ部材15の有無を検知
する位置センサ、25は加熱部材16の上端部16a近傍の温
度を検知する温度センサである。また26は図示の装置を
自動制御するための制御装置である。
Next, 23 is a position sensor that detects the presence or absence of the substrate assembly 9 in the heating unit 10, 24 is a position sensor that detects the presence or absence of the pressing member 15, and 25 is a temperature sensor that detects the temperature near the upper end 16a of the heating member 16. Is. Reference numeral 26 is a control device for automatically controlling the illustrated device.

以上の装置の作動状態を次に説明する。 The operating state of the above device will be described below.

先ず、装置の非作動時においては、カム20は緩衝部材
17の底面と接触しておらず、従って加熱部材16全体は図
示の如く上端部16a側が加熱ユニット10の溝部10c平面に
係止された状態で、自重により受熱部16bが吊り下げら
れた状態となっている。このため加熱部材16の上端部16
aは加熱ユニット10の平坦部10dよりも低い位置となって
いる。
First, when the device is not in operation, the cam 20 serves as a buffer member.
The heating member 16 is not in contact with the bottom surface of the heating unit 16, and therefore the upper end 16a side is locked to the groove 10c plane of the heating unit 10 as shown in the drawing, and the heat receiving unit 16b is hung by its own weight. Has become. Therefore, the upper end 16 of the heating member 16 is
The position a is lower than the flat portion 10d of the heating unit 10.

次に、制御装置26は熱源14をONとして加熱部材16を加
熱する。この間制御装置26は、失活部に直接または間接
に接触する加熱部材16の上端部16aの温度を温度センサ2
5で監視している。この上端部16aが所定の温度となった
ならば、基板集合体9を加熱ユニット10上に配置し、か
つ押さえ部材15を更にその上に配置する。制御装置26は
位置センサ23および24により基板集合体9及び押さえ部
材15が設置されたことを検知したならばモータ22を回転
させる信号を発すると共に、内蔵しているタイマー26a
が作動する。カム20の回転により緩衝部17を介して加熱
部材16全体が上昇し、その上端部16aが基板集合体の各
センサ部の失活部に直接または基板を介して間接に接触
し、所定範囲を失活させる。なおこの際、緩衝部17内に
収納してあるコイルバネ18の弾性により加熱部材16は基
板集合体19に対して所定の圧力で接触する。
Next, the controller 26 turns on the heat source 14 to heat the heating member 16. During this time, the control device 26 controls the temperature of the upper end portion 16a of the heating member 16 that directly or indirectly contacts the deactivating portion by the temperature sensor 2
We are monitoring at 5. When the upper end 16a reaches a predetermined temperature, the substrate assembly 9 is placed on the heating unit 10 and the pressing member 15 is further placed thereon. When the position sensors 23 and 24 detect that the board assembly 9 and the pressing member 15 are installed, the control device 26 issues a signal for rotating the motor 22 and also has a built-in timer 26a.
Works. The rotation of the cam 20 raises the entire heating member 16 via the buffer portion 17, and the upper end portion 16a of the heating member 16 directly contacts the deactivating portion of each sensor portion of the substrate assembly or indirectly through the substrate, and a predetermined range is set. Deactivate. At this time, the heating member 16 comes into contact with the substrate assembly 19 at a predetermined pressure due to the elasticity of the coil spring 18 housed in the buffer portion 17.

前記したタイマ26aには予め接触時間がセットしてあ
り、この所定時間経過と共にモータ22を再度作動させ、
加熱部材16を下降させ、以て一つの失活工程を終了す
る。
The contact time is set in advance in the timer 26a described above, and the motor 22 is operated again with the lapse of this predetermined time,
The heating member 16 is lowered to complete one deactivating step.

なお、冷却状態の加熱部材を予め基板集合体に接触さ
せ、次に、加熱部材を加熱するよう工程を編成し、温度
センサ25からの温度情報をタイマ26a作動の補正値とし
て利用する等の作動方法をとることももとより可能であ
る。また当然のことながら、制御装置に代えて各部分の
制御を手動により行うことも可能である。さらに図示の
加熱部材昇降装置はカム機構としたが、その機構構成を
限定する趣旨ではなく例えばエアシリンダ等を用いて作
動させるようにしてもよい。
It should be noted that the heating member in the cooled state is brought into contact with the substrate assembly in advance, then the process is organized to heat the heating member, and the temperature information from the temperature sensor 25 is used as a correction value for the operation of the timer 26a. It is also possible to take a method. Further, as a matter of course, instead of the control device, it is possible to manually control each part. Further, although the heating member elevating / lowering device shown in the drawing is a cam mechanism, it is not intended to limit the mechanism structure, and it may be operated by using an air cylinder or the like.

以上本発明を酵素電極を例に説明したが、もとより酵
素電極に限定するものではなく、イオン選択性電界効果
型トランジスタ(ISFET)等、要するに酵素皮膜の部分
的失活を行う場合には全て本発明を応用することが可能
である。
Although the present invention has been described above by taking an enzyme electrode as an example, the present invention is not limited to the enzyme electrode, and it is necessary to use an ion selective field effect transistor (ISFET), etc. It is possible to apply the invention.

〔効果〕〔effect〕

本発明は以上にその構成を詳細に説明した如く、電極
の所定部分の酵素固定化部を失活する方法として、この
失活対象部分に対して直接または間接に熱源を接触配置
し、この熱源の熱を熱伝導により酵素固定化部の所定部
分に集中的に伝達して酵素の部分的な失活を行う方法と
したので、電磁波を発生させる大掛かりな機械および精
密なフォトマスクが等が不要で装置を安価且つ小型に形
成することができる。
INDUSTRIAL APPLICABILITY As described in detail above, the present invention provides a method for deactivating an enzyme-immobilized part of a predetermined part of an electrode, in which a heat source is placed directly or indirectly in contact with the part to be deactivated. Since the heat is transferred to the specific part of the enzyme immobilization part by heat conduction to partially deactivate the enzyme, a large machine for generating electromagnetic waves and a precise photomask are unnecessary. Thus, the device can be formed inexpensively and compactly.

また失活に必要な加熱時間は僅か数秒であり、電磁波
を用いた失活方法に比較して僅か数百分の一という驚異
的短時間で簡単に所定部分を失活させることができ、電
極の生産性を大幅に向上させることができる。
In addition, the heating time required for deactivation is only a few seconds, and it is possible to easily deactivate a predetermined part in a surprisingly short time of only a few hundredth compared to the deactivation method using electromagnetic waves. The productivity of can be greatly improved.

更に熱伝導による方法は、被加熱対象が熱源以上の温
度には昇温しないため、失活時間等の制御も電磁波を用
いる方法に比較して制御の許容度が大きく、また熱源も
電気抵抗による発熱等制御の容易なものを利用できるた
め、多数連設した酵素電極の各々の失活部分に対してこ
れら熱源を正確に位置させる構成を用いることにより、
高性能のセンサを大量かつ安価に提供することが可能と
なる。
Furthermore, the method using heat conduction does not raise the temperature of the object to be heated to a temperature above the heat source, so the control of deactivation time and the like has a higher degree of control tolerance than the method using electromagnetic waves, and the heat source depends on electrical resistance. Since it is possible to use an easily controlled one such as heat generation, by using a configuration in which these heat sources are accurately positioned with respect to each inactivated portion of a large number of enzyme electrodes connected in series,
It becomes possible to provide a large amount of high-performance sensors at low cost.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明方法の実施例を示す酵素電極の平面図、
第2図は第1図I−I線による断面を用いて第1図に示
す酵素電極の失活方法の一例を示す図、第3図は加熱部
構成の別の例を示す酵素電極の平面部分図、第4図は失
活を行わない状態の電極のサイクリックボルタモグラ
ム、第5図は一方の作用極を失活させた場合の電極のサ
イクリックボルタモグラム、第6図は基板集合体の平面
図、第7図は加熱ユニットの平面図、第8図は押さえ部
材、基板集合体および加熱ユニットの配置状態を示すこ
れら各部材の断面図、第9図は第8図のイ部詳細図、第
10図は加熱部材の別の構成例を示す加熱ユニットの断面
部分図である。 1、2……作用極、2′……導電パターン 3……参照極、5……基板 6……酵素皮膜、6a……酵素固定化部 6b……失活部、7……熱源 8……加熱部、9……基板集合体 10……加熱ユニット、11……加熱部 12、16……加熱部材 12a、16a……加熱部材上端部 14……熱源、15……押さえ部材 17……緩衝部材、18……コイルバネ 25……制御装置、A……本体側接続部 B……絶縁部、C……検出部
FIG. 1 is a plan view of an enzyme electrode showing an embodiment of the method of the present invention,
FIG. 2 is a diagram showing an example of a method for deactivating the enzyme electrode shown in FIG. 1 by using a cross section taken along the line I-I in FIG. 1, and FIG. 3 is a plan view of the enzyme electrode showing another example of the heating section configuration. Partial view, FIG. 4 is a cyclic voltammogram of the electrode without deactivation, FIG. 5 is a cyclic voltammogram of the electrode when one working electrode is deactivated, and FIG. 6 is a plan view of the substrate assembly. FIG. 7 is a plan view of the heating unit, FIG. 8 is a cross-sectional view of each member showing the arrangement state of the pressing member, the substrate assembly and the heating unit, and FIG. 9 is a detailed view of a part of FIG. First
FIG. 10 is a partial sectional view of a heating unit showing another configuration example of the heating member. 1, 2 ... Working electrode, 2 '... Conductive pattern 3 ... Reference electrode, 5 ... Substrate 6 ... Enzyme film, 6a ... Enzyme immobilization part 6b ... Deactivation part, 7 ... Heat source 8 ... … Heating part, 9 …… Substrate assembly 10 …… Heating unit, 11 …… Heating part 12, 16 …… Heating member 12a, 16a …… Heating member upper end 14 …… Heat source, 15 …… Pressing member 17 …… Cushioning member, 18 ... Coil spring 25 ... Control device, A ... Main body side connection part B ... Insulation part, C ... Detection part

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】基板に対して形成した参照極および一対の
作用極を酵素皮膜で覆い、かつ一対の作用極のうち一方
の作用極を覆う酵素皮膜を加熱して当該加熱部分の酵素
皮膜を失活させることにより酵素電極を製造する方法に
おいて、失活が行われるべき酵素皮膜に対して直接に、
または基板を介して間接に熱源を接触配置することによ
り熱源が配置された酵素皮膜部分に対して当該熱源から
の熱を熱伝導により伝熱して加熱し、これにより酵素皮
膜の加熱部分を失活させるようにしたことを特徴とする
酵素電極の製造方法。
1. A reference electrode and a pair of working electrodes formed on a substrate are covered with an enzyme film, and an enzyme film covering one working electrode of a pair of working electrodes is heated to form an enzyme film of the heated portion. In the method of producing an enzyme electrode by deactivating, directly against the enzyme film to be deactivated,
Alternatively, by indirectly arranging the heat source in contact with the substrate, the heat from the heat source is transferred to the enzyme film portion where the heat source is arranged by heat conduction to heat, thereby deactivating the heated portion of the enzyme film. A method for producing an enzyme electrode, which is characterized in that
【請求項2】複数個の加熱部材を有する加熱ユニット
と、この加熱ユニットに係合する押さえ部材とからな
り、酵素センサとなる部分を複数個有するように形成し
た基板集合体をこの加熱ユニットに対し、押さえ部材を
用いて配置固定し、基板集合体の各酵素センサとなるべ
き部分のうち、酵素皮膜を失活させるべき部分の各々に
対して前記加熱部材を直接または間接に接触させること
により当該接触部分に対して加熱部材の熱を熱伝導によ
り伝熱するよう構成したことを特徴とする酵素電極の製
造装置。
2. A heating unit comprising a heating unit having a plurality of heating members and a pressing member engaging with the heating unit, the substrate assembly having a plurality of portions serving as enzyme sensors. On the other hand, by arranging and fixing using a pressing member, by directly or indirectly contacting the heating member with each of the portions of the substrate assembly that are to be enzyme sensors and are to be inactivated of the enzyme film. An apparatus for manufacturing an enzyme electrode, which is configured to transfer heat of a heating member to the contact portion by heat conduction.
JP1118600A 1989-05-15 1989-05-15 Enzyme electrode manufacturing method and enzyme electrode manufacturing apparatus Expired - Lifetime JPH0814563B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1118600A JPH0814563B2 (en) 1989-05-15 1989-05-15 Enzyme electrode manufacturing method and enzyme electrode manufacturing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1118600A JPH0814563B2 (en) 1989-05-15 1989-05-15 Enzyme electrode manufacturing method and enzyme electrode manufacturing apparatus

Publications (2)

Publication Number Publication Date
JPH02298856A JPH02298856A (en) 1990-12-11
JPH0814563B2 true JPH0814563B2 (en) 1996-02-14

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Country Status (1)

Country Link
JP (1) JPH0814563B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1882745A1 (en) * 2006-07-25 2008-01-30 The Swatch Group Research and Development Ltd. Electrochemical system for dosing of a biological compound by an enzyme
JP5001220B2 (en) * 2008-05-23 2012-08-15 株式会社エイアンドティー Substrate concentration measuring apparatus, method and program

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2548695B2 (en) * 1985-07-11 1996-10-30 オムロン株式会社 Digital lighting
JPH0623719B2 (en) * 1986-04-08 1994-03-30 エヌオーケー株式会社 Method for manufacturing enzyme sensor

Also Published As

Publication number Publication date
JPH02298856A (en) 1990-12-11

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