JPH0819519B2 - Laser vapor deposition equipment - Google Patents

Description

Description: TECHNICAL FIELD The present invention relates to a laser vapor deposition apparatus for vapor-depositing a ceramic or the like on a substrate by using a laser, and particularly to a vapor deposition material of an optical system housed in a vacuum chamber. It concerns the solution of pollution problems.

[Conventional technology]

FIG. 2 is a schematic configuration diagram showing a conventional laser vapor deposition apparatus disclosed in, for example, Japanese Patent Laid-Open No. 56-116373. In the figure, reference numeral 1 is a parallel laser beam emitted from a laser oscillator (not shown), and the laser beam 1 is converted into a horizontal optical path by a plane mirror 2 and then passed through a condenser lens 3 and a transmission window 4. It is introduced into the vacuum chamber 5.

In this way, the laser light introduced into the vacuum chamber 5 is changed in its optical path by the plane mirror 6 again, and then radiated in the tangential direction to the outer peripheral surface of the ring-shaped object 7 to be irradiated. . Therefore, the focal length and the arrangement position of the condenser lens 3 are selected so that the light is focused in the vicinity of the irradiation point on the irradiation target 7. Further, the ring-shaped irradiation target 7 has a structure in which the central portion of the irradiation target 7 rotates at an arbitrary speed and further swings in the direction of the central axis by the thickness of the irradiation target 7. The light 1 is uniformly irradiated.

In the laser vapor deposition apparatus configured as described above, when the laser light 1 emitted from the laser light source (not shown) is subjected to horizontal optical path conversion in the plane mirror 2, it is condensed by the condenser lens 3 located in this portion. . Then, the condensed laser light is introduced into the vacuum chamber 5 through the transmission window 4, so that the plane mirror 6 positioned inside the vacuum chamber 5 is introduced.
The optical path is changed again by and the outer peripheral surface of the irradiation object 7 is irradiated. Here, when the laser beam 1 that has been converged to the outer peripheral surface of the irradiation target 7 and has high energy is irradiated, this irradiation region evaporates and the evaporated particles fly out in the direction of the substrate 8 and onto the substrate 8. Evaporate and deposit. Further, when the object to be irradiated 7 is a material that is apt to cause thermal peeling, a preheating heater 10 is provided in the vicinity of the outer peripheral portion of the object to be irradiated 7, and the object to be irradiated 7 is preheated by the preheating heater 10. Thus, the irradiation target 7 is prevented from being damaged.

[Problems to be solved by the invention]

Since the conventional laser vapor deposition apparatus is configured as described above, a part of the vaporized particles vaporized from the irradiation target 7 adheres to the optical components such as the transmission window 4 and the reflecting mirror 6. As a result, the laser light is absorbed or scattered, the intensity of the laser light with which the irradiation target 7 is irradiated is reduced, and the vapor deposition conditions are changed accordingly, which makes it difficult to perform stable vapor deposition work. Have

The present invention has been made to solve the above problems, and an object of the present invention is to obtain a laser vapor deposition apparatus capable of always performing stable vapor deposition while keeping the intensity of the laser beam applied to the irradiation target constant. It is intended.

[Means for solving problems]

The laser vapor deposition apparatus according to the present invention detects the intensity of the laser light guided into the vacuum chamber as necessary, and controls so that the intensity of the laser light is always constant.

[Operation] Since the laser vapor deposition apparatus in the present invention controls the intensity of the laser light guided into the vacuum chamber to a constant value, even if some of the vaporized particles adhere to the optical system, the irradiation target Since the intensity of the incident laser beam is feedback-controlled so that the intensity of the laser beam applied to the object is kept at a constant value, suitable vapor deposition conditions are always maintained and a stable vapor deposition film can be obtained.

Example of Invention

An embodiment of the present invention will be described below with reference to the drawings. In FIG. 1, reference numeral 11 denotes a laser detection sensor, which is a lower inner wall portion of the transmission window 4 provided in the vacuum chamber 5, and which is a preheating heater in which vapor deposition particles of the irradiation object 7 are not directly vaporized. It is fixed on the back side of 10. Then, in this case, the distance between the plane mirror 6 and the laser detection sensor 11 is set sufficiently shorter than the distance between the plane mirror 6 and the irradiation target 7, so that the laser light 1 is transmitted to the laser detection sensor 11. The laser detection sensor 11 is prevented from being damaged due to the increase in energy due to the convergence. Reference numeral 12 denotes a plane mirror driving mechanism for rotating the plane mirror 6, which reflects and supplies the laser beam 1 supplied through the transmission window 4 to the irradiation object 7 and the laser detection sensor 11.
Normally, the laser beam 1 is reflected toward the irradiation target 7, and if necessary, the rotation is controlled so as to be reflected toward the laser detection sensor 11. Reference numeral 13 is a drive controller for controlling the flat mirror drive mechanism, and 14 is a control device, for example, by supplying a control signal to the drive controller 13 for a predetermined time every 30 minutes to 1 hour every time the work is finished, Drive mechanism 12
Thus, the plane mirror 6 is rotated to reflect the laser light 1 toward the laser detection sensor 11, and measurement control for measuring the intensity of the laser light 1 is executed. Further, the control device 14 is a laser oscillator control signal according to the output of the laser detection sensor 11.
By generating 15 and supplying it to a laser oscillator (not shown), control is performed to control the intensity of the laser light reflected from the plane mirror 6 by feedback control to be constant.

In the laser vapor deposition apparatus configured as described above, the plane mirror 6 in the normal state is positioned as shown in FIG. 1, and the laser light entering the inside of the vacuum chamber 5 through the transmission window 4 is guided by the plane mirror 6. It is reflected and supplied to the surface of the irradiation target 7. In this way, the laser light 1 condensed by the condenser lens 3 is concentratedly supplied to the minute range on the surface of the irradiation object 7. Then, since the surface of the irradiation target 7 is irradiated with the laser beam having high energy by condensing, the irradiation target in this portion evaporates, and the evaporated particles adhere to and deposit on the surface of the substrate 8. As a result, vapor deposition is performed.

Then, if such a vapor deposition operation is continued, the irradiation target 7
Since the vaporized particles evaporating from the above adhere to and are deposited on the transmission window 4 and the plane mirror 6, the laser light 1 is absorbed and scattered by the attached deposit. As a result, the energy of the laser beam 1 with which the irradiation target 7 is irradiated decreases, and the irradiation target cannot be evaporated sufficiently, which deteriorates the characteristics of the vapor deposition film.

Here, the controller 14 executes the laser light measurement mode every time the vapor deposition work is completed. In this laser light measurement mode, the control device 14 supplies a control signal to the drive controller 13 for a certain period of time to drive the plane mirror drive mechanism 12 to rotate the plane mirror 6 toward the laser detection sensor 11 side. Then, the laser light 1 entering through the transmission window 4 is reflected by the plane mirror 6
Will be reflected by the laser detection sensor 11 toward the laser detection sensor 11 as indicated by the dotted line.The laser detection sensor 11 receives the laser light in the low energy state before it is sufficiently condensed, and has a level corresponding to the received light energy. The detection signal of is output. Therefore, the detection signal output from the laser detection sensor 11 corresponds to the energy of the laser light with which the irradiation target 7 is irradiated, so that the value of the detection signal is kept constant. It is sufficient to control the oscillation output. Then, this detection signal is compared with the reference value in the control device 14, and the difference value is supplied to the laser oscillator (not shown) as the laser oscillation output control signal 15. As a result, the oscillation output of the laser oscillator is the laser detection sensor 11
Since the feedback control is performed in accordance with the output of the laser beam 1, the intensity of the laser beam 1 applied to the irradiation target 7 is always kept constant, and accordingly, the influence of the deposits attached to the optical system is affected. It can be lost.

In the above embodiment, as the laser light intensity measuring means for measuring the intensity of the laser light that has passed through the optical system in the vacuum chamber, the case where the plane mirror is rotated and the reflected laser light is supplied to the laser detection sensor As described above, it goes without saying that any configuration may be used as long as the intensity of the laser beam that has passed through the optical system can be detected as necessary. Further, in the above embodiment, the case where the intensity of the laser beam is measured off-line every hour from 30 minutes after each vapor deposition operation is described, but the flat mirror driving mechanism is controlled at high speed,
By pulse-controlling the laser light, the measurement time interval can be further shortened, so that the irradiation intensity of the laser light on the object to be irradiated can be made constant with higher accuracy. Further, in the above embodiment, only the case where the oscillation output of the laser oscillator is controlled has been described, but by controlling the attenuation amount of the attenuator inserted in the optical path of the laser light, the laser light incident on the vacuum chamber is controlled. The intensity may be controlled.

〔The invention's effect〕

As described above, according to the laser vapor deposition apparatus of the present invention, the intensity of the laser beam that has passed through the optical system in the vacuum chamber is measured as necessary, and the measured value is kept at a predetermined value. Since it is controlled to be stable, the vapor deposition work becomes stable, and with this, the vapor deposition film having stable characteristics can be obtained, which is an excellent effect.

Further, the laser detection sensor is provided on the back side of the preheating heater where vapor deposition particles of the irradiation target are not directly vaporized, and the laser beam irradiation area or the laser detection sensor of the irradiation target is controlled by a plane mirror that can be driven. Since it is configured to be able to select, the laser detection sensor is irradiated with the laser beam before irradiation of the irradiation object while detecting the intensity of the laser beam while maintaining the vapor deposition operation of the vapor deposition particles on the substrate. There is an effect that the constant control of the laser light intensity can be accurately performed without depositing vapor deposition particles on the sensor, and thus without lowering the detection accuracy.

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram showing an embodiment of a laser vapor deposition apparatus according to the present invention, and FIG. 2 is a schematic configuration diagram showing a conventional laser vapor deposition apparatus. 1 is a laser beam, 2 and 6 are plane mirrors, 3 is a condenser lens, 4 is a transmission window, 5 is a vacuum chamber, 7 is an object to be irradiated, 8 is a substrate,
10 is a preheat heater, 11 is a laser detection sensor, 12 is a plane mirror drive mechanism, 13 is a drive controller, and 14 is a controller. In the drawings, the same reference numerals indicate the same or corresponding parts.

Front Page Continuation (72) Inventor Omine En 8-3-1 Tsukaguchi Honcho, Amagasaki City, Hyogo Prefecture, Sanritsu Electric Co., Ltd. Production Technology Laboratory (56) Reference JP-A-55-94477 (JP, A) Sho 61-79765 (JP, A)

Claims (2)

[Claims] 1. An object to be irradiated which is disposed in a vacuum chamber and is partially covered with a preheat heater, and a laser beam irradiation area which is in the vacuum chamber and is not covered by the preheat heater of the object to be irradiated. A substrate disposed at a position where vapor deposition particles of the irradiated object to be emitted are deposited, and a laser beam emitted from a laser oscillator is converged through a transmission window provided in a part of the vacuum chamber. Inside the vacuum chamber, an optical system for entering the inside of the vacuum chamber, a laser detection sensor provided inside the vacuum chamber and on the back surface of the preheater where vapor deposition particles of the irradiation target are not directly deposited, And a plane mirror for selectively irradiating the laser beam incident through the transmission window to the laser beam irradiation region of the object to be irradiated or the laser detection sensor, and the plane mirror. The plane mirror driving mechanism to be driven is controlled, and the laser oscillator is controlled so that the intensity of the laser light detected by the laser detection sensor becomes constant according to the intensity of the laser light detected by the laser detection sensor. A laser deposition apparatus including a control device. 2. The laser vapor deposition apparatus according to claim 1, wherein the control device controls the plane mirror driving mechanism so that the laser light is emitted to the laser detection sensor each time the vapor deposition process is completed. .