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JPH081980B2 - Printed wiring board and manufacturing method thereof - Google Patents
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JPH081980B2 - Printed wiring board and manufacturing method thereof - Google Patents

Printed wiring board and manufacturing method thereof

Info

Publication number
JPH081980B2
JPH081980B2 JP29550693A JP29550693A JPH081980B2 JP H081980 B2 JPH081980 B2 JP H081980B2 JP 29550693 A JP29550693 A JP 29550693A JP 29550693 A JP29550693 A JP 29550693A JP H081980 B2 JPH081980 B2 JP H081980B2
Authority
JP
Japan
Prior art keywords
plating
electroless
nickel plating
wiring board
palladium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP29550693A
Other languages
Japanese (ja)
Other versions
JPH07147478A (en
Inventor
攻一 小倉
文明 岩倉
和夫 堤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DAINICHI INDUSTRIES CO., LTD.
Original Assignee
DAINICHI INDUSTRIES CO., LTD.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DAINICHI INDUSTRIES CO., LTD. filed Critical DAINICHI INDUSTRIES CO., LTD.
Priority to JP29550693A priority Critical patent/JPH081980B2/en
Publication of JPH07147478A publication Critical patent/JPH07147478A/en
Publication of JPH081980B2 publication Critical patent/JPH081980B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/24Reinforcing of the conductive pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/4007Surface contacts, e.g. bumps

Landscapes

  • Parts Printed On Printed Circuit Boards (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Structure Of Printed Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、プリント配線板及びそ
の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a printed wiring board and its manufacturing method.

【0002】[0002]

【発明の背景】電子部品が搭載されるプリント配線板に
おいては、 高密度であること、 メッキ用リード線の引回しが困難、 接点や端子のコネクター部と部品実装部が混在す
る、 部品のころびが起きる、 実装用リフロー炉を数回通す といった理由から、無電解ニッケルメッキを施した後、
置換型無電解金メッキを施し、銅の導体パターン上にニ
ッケルメッキ皮膜、そしてニッケルメッキ皮膜上に金メ
ッキ皮膜を設けることが行われている。
BACKGROUND OF THE INVENTION In a printed wiring board on which electronic parts are mounted, the density is high, it is difficult to route the lead wire for plating, the connector part of the contact or terminal and the part mounting part are mixed, and the parts fall. Occurs, and after passing through the mounting reflow furnace several times, after applying electroless nickel plating,
Substitution type electroless gold plating is performed to form a nickel plating film on a copper conductor pattern and a gold plating film on the nickel plating film.

【0003】しかしながら、自己触媒型無電解ニッケル
メッキ皮膜上に置換型無電解金メッキを施す従来の技術
では、はんだ付け特性が悪く、特に、一度でも熱履歴が
加わると著しくはんだ付け特性(はんだの濡れ性)が低
下するといった欠点が有る。この為、部品の実装工程に
おいて、アセンブリ条件やフラックス条件に厳しい管理
が要求され、それだけ生産コストが高く付いている。
However, the conventional technique of performing substitutional electroless gold plating on a self-catalytic electroless nickel plating film has poor soldering characteristics, and in particular, even if heat history is applied even once, the soldering characteristics (solder wetting) are significantly increased. There is a defect that the (sex) is deteriorated. For this reason, strict control of assembly conditions and flux conditions is required in the component mounting process, resulting in higher production costs.

【0004】又、銅の導体パターン上に無電解ニッケル
メッキを施した後、自己触媒型無電解パラジウムメッキ
を施し、無電解ニッケルメッキ皮膜上に所定の厚さを有
するパラジウム層を形成し、このパラジウム層上に金メ
ッキ皮膜を設けるといった三層(Ni層−Pd層−Au
層)構造の技術が提案されている。このものは、前記二
層構造(Ni−Au)の技術によるものに比べ、はんだ
付け特性が良好なとの報告が有るものの、パラジウムメ
ッキや金メッキの管理は難しく、コストも極めて高く付
いている為、実用化には至っていない。
Further, after electroless nickel plating is applied on the copper conductor pattern, autocatalytic electroless palladium plating is applied to form a palladium layer having a predetermined thickness on the electroless nickel plating film. Three layers (Ni layer-Pd layer-Au) such as providing a gold plating film on the palladium layer.
Layer) construction techniques have been proposed. Although it has been reported that this product has better soldering characteristics than the two-layer structure (Ni-Au) technique, it is difficult to control palladium plating and gold plating and the cost is extremely high. , Has not been put to practical use.

【0005】[0005]

【発明の開示】前記の問題点に対する検討を鋭意推し進
めて行った結果、無電解ニッケルメッキ皮膜上にパラジ
ウム層を形成するのではなく、PdとAuとが多島海状
(無電解メッキの分野では、多島海状のような構造はポ
ーラス構造とも称される)のように混在構成させている
と、このものは耐摩耗特性に富んでおり、かつ、はんだ
付け特性が良好であり、しかもこの一つ一つの技術は従
来から確立されているものを利用でき、極めて簡単なも
のであり、コストは低廉であることが判って来た。
DISCLOSURE OF THE INVENTION As a result of earnestly studying the above-mentioned problems, as a result of forming a palladium layer on an electroless nickel plating film, Pd and Au are in a multi-island sea shape (in the field of electroless plating). Then, a structure such as a multi-island sea-like structure is also called a porous structure), and this structure is rich in abrasion resistance and has good soldering characteristics. It has been found that each of these techniques can utilize existing ones, is extremely simple, and has a low cost.

【0006】このような知見に基づいて本発明が達成さ
れたものであり、本発明の目的は、耐摩耗特性に富み、
かつ、はんだ付け特性が良好なプリント配線板を低コス
トで得られる技術を提供することである。この本発明の
目的は、基板に設けられた導体パターン上にニッケルメ
ッキ膜が構成され、このニッケルメッキ膜上に島状構造
の金及び島状構造のパラジウムが混在構成されてなるこ
とを特徴とするプリント配線板によって達成される。
The present invention has been achieved based on such knowledge, and an object of the present invention is to provide excellent wear resistance characteristics.
Moreover, it is an object of the present invention to provide a technique capable of obtaining a printed wiring board having good soldering characteristics at low cost. An object of the present invention is that a nickel plating film is formed on a conductor pattern provided on a substrate, and gold having an island structure and palladium having an island structure are mixedly formed on the nickel plating film. Is achieved by a printed wiring board.

【0007】又、導体パターンが設けられた基板に対し
て無電解ニッケルメッキを施す工程と、無電解ニッケル
メッキが施された基板に対して置換型無電解金メッキを
施す工程と、無電解ニッケルメッキが施された基板に対
して置換型無電解パラジウムメッキを施す工程とを具備
することを特徴とするプリント配線板の製造方法によっ
て達成される。
Further, a step of electroless nickel plating a substrate provided with a conductor pattern, a step of performing substitutional electroless gold plating on a substrate plated with electroless nickel, and an electroless nickel plating And a step of performing substitutional electroless palladium plating on the substrate subjected to the above step.

【0008】以下、本発明を詳しく説明する。プリント
配線板は、一般的には、フェノール樹脂やエポキシ樹脂
などのプラスチックやセラミック製の基板に銅箔で所定
のパターンが形成されたものである。そして、この銅箔
パターンに、前述のような理由により、金メッキが施さ
れている。本発明においても、金メッキが施される。
Hereinafter, the present invention will be described in detail. The printed wiring board is generally a plastic or ceramic substrate such as phenol resin or epoxy resin, on which a predetermined pattern is formed with copper foil. Then, this copper foil pattern is gold-plated for the above-mentioned reason. Also in the present invention, gold plating is applied.

【0009】しかしながら、金メッキが施される前に、
塩化ニッケルや硫酸ニッケルのようなニッケル塩などを
溶解させた浴を用いた無電解ニッケルメッキの手段によ
って銅箔パターン上にニッケルメッキ膜が構成される。
この無電解ニッケルメッキの手段は従来からも良く知ら
れており、その技術を利用することが出来る。尚、この
無電解ニッケルメッキに前以て置換型無電解パラジウム
メッキを施すことも有る。
However, before being plated with gold,
A nickel plating film is formed on the copper foil pattern by means of electroless nickel plating using a bath in which a nickel salt such as nickel chloride or nickel sulfate is dissolved.
This electroless nickel plating means has been well known in the past, and the technique can be used. The electroless nickel plating may be preceded by substitutional electroless palladium plating.

【0010】本発明において、無電解ニッケルメッキの
手段によって構成されるニッケルメッキ膜は、その膜厚
が約1〜7μm、望ましくは約3〜5μm程度である。
この後、パラジウム塩を溶解したメッキ浴が用いられて
置換型無電解パラジウムメッキが施される。このメッキ
浴としては、例えば塩化パラジウム、塩酸などの酸、そ
の他必要に応じて還元剤や安定剤が添加されたものが用
いられる。メッキ浴の温度は約10℃以上にコントロー
ルされ、そして約10秒以上の時間をかけて行われる。
そうすると、ニッケルメッキ膜上に多島海状の島のよう
に凸高さが約1/100〜10/100μm程度のPd
が析出する。すなわち、連続したフィルムのようなPd
層ではなく、斑点状のPdがニッケルメッキ膜上に形成
されるのである。
In the present invention, the nickel plating film formed by means of electroless nickel plating has a film thickness of about 1 to 7 μm, preferably about 3 to 5 μm.
After that, substitution type electroless palladium plating is performed using a plating bath in which a palladium salt is dissolved. As the plating bath, for example, an acid such as palladium chloride or hydrochloric acid, and optionally a reducing agent and a stabilizer are added. The temperature of the plating bath is controlled at about 10 ° C. or higher, and the time is about 10 seconds or longer.
Then, Pd having a convex height of about 1/100 to 10/100 μm, like a multi-island sea island, is formed on the nickel-plated film.
Is deposited. That is, Pd like a continuous film
Instead of a layer, spotted Pd is formed on the nickel plating film.

【0011】次に、シアン化金カリのような錯塩が溶解
されてなる金メッキ浴が用いられて置換型無電解金メッ
キが施される。このメッキ浴としては、例えばシアン化
金カリ、クエン酸のような有機酸の塩、その他必要に応
じて安定剤が添加されたものが用いられる。メッキ浴の
温度は約70℃以上にコントロールされ、そして約12
0秒以上の時間をかけて行われる。そうすると、ニッケ
ルメッキ膜上における多島海状の島のように形成された
Pdの間に多島海状の島のように凸高さが約1/100
〜10/100μm程度のAuが析出する。すなわち、
連続したフィルムのようなAu層ではなく、ニッケルメ
ッキ膜上における斑点状のPdの隙間にAuが斑点状に
形成されるのである。
Next, displacement type electroless gold plating is performed using a gold plating bath in which a complex salt such as potassium cyanide is dissolved. As the plating bath, for example, potassium cyanide, a salt of an organic acid such as citric acid, and a stabilizer added if necessary are used. The temperature of the plating bath is controlled above about 70 ° C, and about 12
It takes 0 seconds or more. Then, between the Pd formed like the archipelago on the nickel plating film, the convex height is about 1/100 like the archipelago.
Au of about 10/100 μm is deposited. That is,
Instead of the Au layer like a continuous film, Au is formed in spots in the spots of Pd on the nickel plating film.

【0012】無電解ニッケルメッキの後に行われる置換
型無電解パラジウムメッキと置換型無電解金メッキと
は、どちらが先に行われても良い。すなわち、無電解ニ
ッケルメッキ→置換型無電解パラジウムメッキ→置換型
無電解金メッキの順であっても、無電解ニッケルメッキ
→置換型無電解金メッキ→置換型無電解パラジウムメッ
キの順であっても良い。つまり、どちらが先であって
も、置換型無電解金メッキで形成されるAuや置換型無
電解パラジウムメッキで形成されるPdは斑点状のもの
としているから、一方によって他方が覆われてしまうも
のではなく、AuとPdが共に表面に露出したものとな
っている。尚、下地のNi層はAuとPdとによって覆
われていて、露出していない状態のものとなっているこ
とが好ましい。
Either of the substitution type electroless palladium plating and the substitution type electroless gold plating performed after the electroless nickel plating may be performed first. That is, electroless nickel plating → substitution type electroless palladium plating → substitution type electroless gold plating or electroless nickel plating → substitution type electroless gold plating → substitution type electroless palladium plating may be performed in this order. . That is, whichever comes first, Au formed by the substitution electroless gold plating and Pd formed by the substitution electroless palladium plating are spotted, so that one is not covered by the other. However, both Au and Pd are exposed on the surface. The underlying Ni layer is preferably covered with Au and Pd and is not exposed.

【0013】そして、プリント配線板の導体パターン上
の表面構造がNiをベースとし、その表面にAuとPd
とが斑点状のように混在してなるものは、耐摩耗特性に
富み、かつ、耐蝕性にも富み、更には、はんだ付け特性
が良好なものであった。しかも、本発明で実施される一
つ一つのメッキ技術そのものは確立されている技術であ
って、何ら難しいものではなく、容易に実施でき、生産
性高く、かつ、低廉なコストで実施できる。
The surface structure on the conductor pattern of the printed wiring board is based on Ni, and Au and Pd are formed on the surface.
Those having a mixture of and like spots were rich in wear resistance and corrosion resistance, and further had good soldering characteristics. Moreover, each plating technique itself carried out in the present invention is a well-established technique, and it is not difficult at all, and it can be easily implemented, has high productivity, and can be implemented at low cost.

【0014】以下、実施例により本発明をさらに具体的
に説明するが、本発明はこれに限られるものではない。
Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited thereto.

【0015】[0015]

【実施例】【Example】

〔実施例1〜6〕図1は、本発明になるプリント配線板
の概略図である。同図中、1はプリント配線板の基板、
2は所定のパターンに形成された銅箔である。
[Examples 1 to 6] FIG. 1 is a schematic view of a printed wiring board according to the present invention. In the figure, 1 is a printed circuit board substrate,
2 is a copper foil formed in a predetermined pattern.

【0016】3は、銅箔2の上に置換型無電解パラジウ
ムメッキによって形成されたPdである。4は、置換型
無電解パラジウムメッキの工程の後に実施された無電解
ニッケルメッキによって形成された約3〜5μmの厚さ
のNiメッキ層である。そして、Niメッキ層4が形成
されたプリント配線板を下記の組成からなるパラジウム
メッキ浴に浸漬した。
Numeral 3 is Pd formed on the copper foil 2 by substitutional electroless palladium plating. Reference numeral 4 is a Ni plating layer having a thickness of about 3 to 5 μm formed by electroless nickel plating performed after the step of substitutional electroless palladium plating. Then, the printed wiring board on which the Ni plating layer 4 was formed was immersed in a palladium plating bath having the following composition.

【0017】〔パラジウムメッキ浴〕 塩化パラジウム 60〜120ppm 塩酸(35%) 60〜120cc/l 還元剤 0.5〜2g/l 安定剤 0.2〜2g/l 〔パラジウムメッキ条件〕 浴温 25〜35℃ 時間 15〜120秒 このような置換型無電解パラジウムメッキによって、N
iメッキ層4の表面にPd5が多島海状(斑点状)に形
成される。
[Palladium plating bath] Palladium chloride 60 to 120 ppm Hydrochloric acid (35%) 60 to 120 cc / l Reducing agent 0.5 to 2 g / l Stabilizer 0.2 to 2 g / l [Palladium plating conditions] Bath temperature 25 to 35 ° C. time 15 to 120 seconds By such substitution type electroless palladium plating, N
Pd5 is formed on the surface of the i-plated layer 4 in the form of a multi-island sea (spots).

【0018】そして、Pd5が形成されたプリント配線
板を水洗した後、下記の組成からなる金メッキ浴に浸漬
した。 〔金メッキ浴〕 シアン化金カリ 1〜4g/l クエン酸塩 80〜120g/l 安定剤 0.1〜1g/l 〔金メッキ条件〕 浴温 90〜100℃ 時間 180〜300秒 このような置換型無電解金メッキによって、Niメッキ
層4の表面における多島海状Pd5の隙間にAu6が多
島海状(斑点状)に形成され、表面がPdとAuとによ
って実質上覆われた本発明になるプリント配線板が得ら
れる。
The printed wiring board on which Pd5 was formed was washed with water and then immersed in a gold plating bath having the following composition. [Gold plating bath] Potassium cyanide 1 to 4 g / l Citrate 80 to 120 g / l Stabilizer 0.1 to 1 g / l [Gold plating conditions] Bath temperature 90 to 100 ° C. Time 180 to 300 seconds By the electroless gold plating, Au6 is formed in the inter-island sea-like (spot-like) shape in the interstices of the multi-island sea-like Pd5 on the surface of the Ni-plated layer 4, and the surface is substantially covered with Pd and Au. A printed wiring board is obtained.

【0019】〔比較例1〕実施例1において、無電解ニ
ッケルメッキ工程の後に行った置換型無電解パラジウム
メッキ工程を省略した他は同様に行い、プリント配線板
を得た。 〔特性〕上記の各例で得られたプリント配線板につい
て、150℃で5時間保持し、この後ハンダ濡れ性を調
べたので、その結果を下記の表−1に示す。
Comparative Example 1 A printed wiring board was obtained in the same manner as in Example 1 except that the substitutional electroless palladium plating step performed after the electroless nickel plating step was omitted. [Characteristics] The printed wiring boards obtained in each of the above examples were held at 150 ° C for 5 hours, and the solder wettability was examined thereafter. The results are shown in Table 1 below.

【0020】 表−1 パラジウムメッキ時間 金メッキ時間 ハンダ濡れ性 実施例1 15秒 180秒 良好 実施例2 30秒 180秒 良好 実施例3 60秒 180秒 良好 実施例4 120秒 180秒 良好 実施例5 60秒 240秒 良好 実施例6 60秒 300秒 良好 比較例1 0 180秒 不良Table-1 Palladium plating time Gold plating time Solder wettability Example 1 15 seconds 180 seconds Good Example 2 30 seconds 180 seconds Good Example 3 60 seconds 180 seconds Good Example 4 120 seconds 180 seconds Good Example 5 60 Second 240 seconds Good Example 6 60 seconds 300 seconds Good Comparative example 1 0 180 seconds Poor

【0021】[0021]

【効果】本発明によれば、耐摩耗特性に富み、かつ、は
んだ付け特性が良好なプリント配線板を低コストで得ら
れる。
According to the present invention, it is possible to obtain a printed wiring board having excellent wear resistance and good soldering properties at low cost.

【図面の簡単な説明】[Brief description of drawings]

【図1】プリント配線板の概略図である。FIG. 1 is a schematic view of a printed wiring board.

【符号の説明】[Explanation of symbols]

1 基板 2 銅箔 4 約3〜5μmの厚さのNiメッキ層 5 多島海状(斑点状)のPd 6 多島海状(斑点状)のAu DESCRIPTION OF SYMBOLS 1 Substrate 2 Copper foil 4 Ni plating layer with a thickness of about 3 to 5 μm 5 Multi-island sea-shaped (spotted) Pd 6 Multi-island sea-shaped (spotted) Au

フロントページの続き (56)参考文献 特開 昭63−224290(JP,A) 特開 平5−327187(JP,A) 特開 平6−350227(JP,A)Continuation of front page (56) References JP-A-63-224290 (JP, A) JP-A-5-327187 (JP, A) JP-A-6-350227 (JP, A)

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 基板に設けられた導体パターン上にニッ
ケルメッキ膜が構成され、このニッケルメッキ膜上に島
状構造の金及び島状構造のパラジウムが混在構成されて
なることを特徴とするプリント配線板。
1. A print characterized in that a nickel plating film is formed on a conductor pattern provided on a substrate, and gold having an island structure and palladium having an island structure are mixedly formed on the nickel plating film. Wiring board.
【請求項2】 導体パターンが設けられた基板に対して
無電解ニッケルメッキを施す工程と、無電解ニッケルメ
ッキが施された基板に対して置換型無電解金メッキを施
す工程と、無電解ニッケルメッキが施された基板に対し
て置換型無電解パラジウムメッキを施す工程とを具備す
ることを特徴とするプリント配線板の製造方法。
2. A step of performing electroless nickel plating on a substrate provided with a conductor pattern, a step of performing substitutional electroless gold plating on a substrate subjected to electroless nickel plating, and electroless nickel plating And a step of performing substitutional electroless palladium plating on the substrate subjected to the above step.
JP29550693A 1993-11-25 1993-11-25 Printed wiring board and manufacturing method thereof Expired - Fee Related JPH081980B2 (en)

Priority Applications (1)

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JP29550693A JPH081980B2 (en) 1993-11-25 1993-11-25 Printed wiring board and manufacturing method thereof

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Application Number Priority Date Filing Date Title
JP29550693A JPH081980B2 (en) 1993-11-25 1993-11-25 Printed wiring board and manufacturing method thereof

Publications (2)

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JPH07147478A JPH07147478A (en) 1995-06-06
JPH081980B2 true JPH081980B2 (en) 1996-01-10

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11330652A (en) * 1997-06-10 1999-11-30 Canon Inc Substrate and method of manufacturing the same

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4869461B2 (en) * 1999-05-17 2012-02-08 イビデン株式会社 Printed wiring board
WO2006112215A1 (en) * 2005-04-01 2006-10-26 Nippon Mining & Metals Co., Ltd. Plated base material

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11330652A (en) * 1997-06-10 1999-11-30 Canon Inc Substrate and method of manufacturing the same

Also Published As

Publication number Publication date
JPH07147478A (en) 1995-06-06

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